JP3292060B2 - Deoxygenation method of scandium metal - Google Patents
Deoxygenation method of scandium metalInfo
- Publication number
- JP3292060B2 JP3292060B2 JP26979096A JP26979096A JP3292060B2 JP 3292060 B2 JP3292060 B2 JP 3292060B2 JP 26979096 A JP26979096 A JP 26979096A JP 26979096 A JP26979096 A JP 26979096A JP 3292060 B2 JP3292060 B2 JP 3292060B2
- Authority
- JP
- Japan
- Prior art keywords
- scandium
- metal
- alloy
- oxygen
- halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 55
- 239000002184 metal Substances 0.000 title claims description 51
- 229910052706 scandium Inorganic materials 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 37
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 title claims description 31
- 238000006392 deoxygenation reaction Methods 0.000 title claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 35
- 239000001301 oxygen Substances 0.000 claims description 35
- 229910052760 oxygen Inorganic materials 0.000 claims description 35
- 229910045601 alloy Inorganic materials 0.000 claims description 31
- 239000000956 alloy Substances 0.000 claims description 31
- 238000002844 melting Methods 0.000 claims description 29
- 230000008018 melting Effects 0.000 claims description 25
- -1 scandium halide Chemical class 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 239000002893 slag Substances 0.000 claims description 7
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 6
- 239000001110 calcium chloride Substances 0.000 claims description 6
- 229910001628 calcium chloride Inorganic materials 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 229910052714 tellurium Inorganic materials 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 229910052793 cadmium Inorganic materials 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- OEKDNFRQVZLFBZ-UHFFFAOYSA-K scandium fluoride Chemical group F[Sc](F)F OEKDNFRQVZLFBZ-UHFFFAOYSA-K 0.000 claims description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 229910000743 fusible alloy Inorganic materials 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 229910000542 Sc alloy Inorganic materials 0.000 description 8
- 239000011575 calcium Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 7
- 229910052715 tantalum Inorganic materials 0.000 description 7
- 239000011701 zinc Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910001297 Zn alloy Inorganic materials 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229910052761 rare earth metal Inorganic materials 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- 229910009378 Zn Ca Inorganic materials 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 159000000007 calcium salts Chemical group 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229910021397 glassy carbon Inorganic materials 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229940123973 Oxygen scavenger Drugs 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 238000011005 laboratory method Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、金属スカンジウム
の脱酸素方法に関する。The present invention relates to a method for deoxidizing scandium metal.
【0002】[0002]
【従来技術と問題点】スカンジウム(Sc)は、触媒や蛍
光体あるいは熱伝導材料の原料として幅広い応用が期待
されている元素である。また、アルミニウム(Al)にS
cを0.01〜1%程度含有させるとその強度が改善さ
れるため、最近ではAl系ターゲット材に添加して半導
体のゲート電極や配線の材料としても利用されている。2. Description of the Related Art Scandium (Sc) is an element which is expected to be widely used as a raw material for a catalyst, a phosphor or a heat conductive material. In addition, S (Al)
If c is contained in an amount of about 0.01 to 1%, the strength is improved. Therefore, c is recently added to an Al-based target material and used as a material for a gate electrode or a wiring of a semiconductor.
【0003】現在、スカンジウムの一般的な製造方法と
しては、スカンジウム鉱石から得られる酸化スカンジウ
ム(Sc2O3)をフッ酸で処理して難溶性のフッ化スカン
ジウム(ScF3)を沈殿させ、これを濾過し乾燥後、カ
ルシウムで還元する方法が行なわれている。しかし、ス
カンジウムは酸素との親和力が強いため、上記の製造方
法で得られる金属スカンジウムは最低でも2000ppm
程度の酸素を含有している。At present, as a general method for producing scandium, scandium oxide (Sc 2 O 3 ) obtained from scandium ore is treated with hydrofluoric acid to precipitate hardly soluble scandium fluoride (ScF 3 ). Is filtered, dried and then reduced with calcium. However, since scandium has a strong affinity for oxygen, the metal scandium obtained by the above-mentioned production method is at least 2000 ppm.
Contains about oxygen.
【0004】しかし、スカンジウム中の酸素濃度が高い
とその性質に悪影響が出る場合が多い。例えば、配線材
料として用いる場合に、高酸素含有量は抵抗の増大を招
き、信号遅延や断線の原因となる。そこで、金属スカン
ジウム中の酸素濃度を低減する方法が求められている。However, when the oxygen concentration in scandium is high, its properties are often adversely affected. For example, when used as a wiring material, a high oxygen content causes an increase in resistance, which causes signal delay and disconnection. Therefore, there is a need for a method for reducing the oxygen concentration in scandium metal.
【0005】実験室的な方法としては、金属スカンジウ
ムをその融点(約1400℃)以上の1500℃程度まで加熱
し、真空中で蒸留する方法がある(F.H.Spedding et a
l. "The resistivity of scandium sigle crystals",
J. Less-Common Metals, 23, 263-270 (1971)) 。しか
し、このような方法は設備コストの点でもエネルギーコ
ストの点でも不利であり工業的な脱酸素方法としては適
さない。As a laboratory method, there is a method in which metal scandium is heated to about 1500 ° C. above its melting point (about 1400 ° C.) and distilled in a vacuum (FHSpedding et al.).
l. "The resistivity of scandium sigle crystals",
J. Less-Common Metals, 23 , 263-270 (1971)). However, such a method is disadvantageous in terms of equipment cost and energy cost, and is not suitable as an industrial deoxygenation method.
【0006】スカンジウム以外の希土類元素に対して
は、希土類金属に対して対応する希土類フッ化物および
アルカリ土類フッ化物を添加して不活性ガス中または真
空中で加熱溶融し脱酸素を図る方法が提案されている
(特公平5-83622号)。しかし、上記文献においてもス
カンジウムはその対象外とされている。また、この方法
では、1500℃程度の高温でフッ化物を扱うため、た
とえ耐熱性の高いルツボ、例えば黒鉛ルツボやタンタル
ルツボを用いたとしても、ルツボの材料(例えば、Cや
Ta)が侵されて希土類金属中に混入するという新たな
問題が生じる。For a rare earth element other than scandium, there is a method of adding a corresponding rare earth fluoride and alkaline earth fluoride to the rare earth metal and heating and melting in an inert gas or vacuum to deoxygenate. It has been proposed (Japanese Patent Publication No. 5-83622). However, scandium is not included in the above literature. Further, in this method, since fluoride is handled at a high temperature of about 1500 ° C., even if a crucible having high heat resistance, such as a graphite crucible or a tantalum crucible, is used, the material of the crucible (eg, C or Ta) is attacked. A new problem of mixing in rare earth metals.
【0007】[0007]
【発明の解決課題】本発明は、従来の金属スカンジウム
における上記問題を解決したものであり、効率的かつコ
スト的に有利な金属スカンジウムの脱酸素方法を提供す
るものである。SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems in the conventional metal scandium, and provides an efficient and cost-effective method for deoxidizing metal scandium.
【0008】すなわち、本発明によれば以下の構成から
なる金属スカンジウムの脱酸素方法が提供される。 (1)金属スカンジウムを低融点合金化し、予め加熱下
でハロゲンガス雰囲気にして酸素を除いたハロゲン化ス
カンジウムを、上記金属スカンジウムの低融点合金融液
に接触させることにより、合金中の酸素をハロゲン化ス
カンジウムに吸収させて酸素濃度を低減することを特徴
とする金属スカンジウムの脱酸素方法。 (2)金属スカンジウムに添加して低融点合金を形成す
る金属として、Mg、Al、Ga、In、Se、Te、
Zn、Cdから選択される少なくとも1種の金属を用い
る上記(1)の脱酸素方法。 (3)金属スカンジウムの低融点合金融液に接触させる
ハロゲン化スカンジウムが、予めハロゲン化スカンジウ
ムに塩化カルシウムおよび/またはフッ化カルシウムを
添加し、加熱溶融下で、この混合融液に塩素ガスを導入
して酸素を除いたものである上記(1)または(2)の脱酸素
方法。 (4)上記(1)、(2)または(3)の方法で脱酸処理した後
に、スラグ層と合金層を分離し、この合金を真空中で約
1000〜1100℃に加熱することにより、スカンジ
ウムに添加した金属元素を揮発分離して精製金属スカン
ジウムを得る方法。 (5) ハロゲン化スカンジウムがフッ化スカンジウム
(ScF3)である上記(1)〜(4)のいずれかに記載する方
法。That is, according to the present invention, there is provided a method for deoxidizing metal scandium having the following constitution. (1) Metallic scandium is alloyed with a low melting point, and the scandium halide, from which oxygen has been removed in advance in a halogen gas atmosphere under heating, is brought into contact with the low-melting liquid of the metal scandium to convert oxygen in the alloy into halogen. A method for deoxidizing metal scandium, comprising reducing the oxygen concentration by causing the metal to be absorbed by scandium halide. (2) Mg, Al, Ga, In, Se, Te, Mg, Al, Ga, In, Se, Te
The deoxidation method according to the above (1), wherein at least one metal selected from Zn and Cd is used. (3) The scandium halide to be brought into contact with the low-melting liquid of scandium metal is prepared by adding calcium chloride and / or calcium fluoride to the scandium halide in advance, and introducing chlorine gas into the mixed melt under heating and melting. The deoxygenation method according to the above (1) or (2), wherein the oxygen is removed from the mixture. (4) After deoxidation by the method of (1), (2) or (3), the slag layer and the alloy layer are separated, and the alloy is heated to about 1000 to 1100 ° C. in vacuum, A method of obtaining purified metal scandium by volatilizing and separating a metal element added to scandium. (5) Scandium halide is scandium fluoride
The method according to any one of the above (1) to (4), which is (ScF 3 ).
【0009】[0009]
【具体的な説明】(I)金属スカンジウム 本発明で処理する金属スカンジウム(金属Scと略記)は
どのような精練法により得られたものでもよい。上述し
た一般的製法、即ち、鉱石から得たSc2O3をフッ酸で
処理して難溶性のScF3を沈殿させ、これを濾過し乾
燥後、Ca等で還元する方法により得たものでも良く、
Sc2O3をフッ素以外のハロゲン化物、例えば塩化物に
転化した後、これを溶融塩電解して得たものでも良い。
また、イオン交換樹脂等を用いて回収したものでも良
く、或いは、これら以外の方法によるものでも良い。更
に、本発明の方法により酸素濃度を低減させた精製金属
Scからさらに酸素を除くことも可能である。[Specific description] (I) Metal scandium Metal scandium (abbreviated as metal Sc) to be treated in the present invention may be obtained by any scouring method. Above general procedure, i.e., the Sc 2 O 3 obtained from the ore is treated with hydrofluoric acid to precipitate ScF 3 of poorly soluble, after which was filtered dried, be those obtained by the method of reduction with Ca or the like well,
After converting Sc 2 O 3 to a halide other than fluorine, for example, a chloride, it may be obtained by subjecting it to molten salt electrolysis.
Further, a material recovered using an ion exchange resin or the like may be used, or a method other than these methods may be used. Further, it is possible to further remove oxygen from the purified metal Sc whose oxygen concentration has been reduced by the method of the present invention.
【0010】(II)合金形成元素 低融点スカンジウム合金を製造するために金属Scに添
加される合金形成元素(Y)は、脱酸素処理後に容易に金
属Scから除去することができる元素、またはScの使
用目的に鑑みて有害とならない金属元素である。前者の
例としては、Mg、Se、Te、Zn、Cd等が挙げら
れる。例えば、Mg(沸点:約1102℃)は真空蒸留により
揮発除去することができる。Zn(沸点:約907℃)等も
同様である。また、後者の例としては、Al、Ga、I
n等が挙げられる。例えば、Alに添加してターゲット
材に用いる場合には、Alの混入は通常は許容される。 (II) Alloy-forming element The alloy-forming element (Y) added to the metal Sc for producing the low-melting scandium alloy is an element that can be easily removed from the metal Sc after the deoxidation treatment, or Sc It is a metal element that is not harmful in view of its intended use. Examples of the former include Mg, Se, Te, Zn, Cd and the like. For example, Mg (boiling point: about 1102 ° C.) can be volatilized and removed by vacuum distillation. The same applies to Zn (boiling point: about 907 ° C.). Examples of the latter include Al, Ga, I
n and the like. For example, when used as a target material by being added to Al, mixing of Al is usually allowed.
【0011】(III)脱酸素方法 本発明の脱酸素方法は、(イ)低融点Sc合金の形成によ
る溶融化工程、(ロ)ScX3の予備処理工程、(ハ)脱酸素
工程、および必要に応じて行なわれる(ニ)脱合金化工程
を含む。(イ)合金形成による溶融化工程 金属Scに上記合金元素を添加することにより低融点S
c合金を生成させる。Scに対する添加量は、添加金属
の種類、あるいはScの使用目的などによって異なる
が、通常は、合金化した後の融点が900〜1300℃
程度まで低下するような量である。一般的には、重量で
50〜90%、好ましくは70〜80%の範囲である。
添加元素の量が少なすぎると融点が十分に低下しない。
過剰であると後工程での除去または脱酸素後の使用に問
題を生じる。 (III) Deoxidizing Method The deoxidizing method of the present invention comprises (a) a melting step by forming a low melting point Sc alloy, (b) a pretreatment step of ScX 3 , (c) a deoxidizing step, and (D) a dealloying step performed in accordance with (A) Melting step by alloy formation Low melting point S by adding the above alloying element to metal Sc
A c alloy is formed. The amount of addition to Sc differs depending on the type of the added metal or the purpose of use of Sc, but usually, the melting point after alloying is 900 to 1300 ° C.
The amount is reduced to the extent. Generally, it is in the range of 50-90%, preferably 70-80% by weight.
If the amount of the added element is too small, the melting point will not be sufficiently reduced.
If the amount is excessive, it causes a problem in use after removal or deoxidation in a later step.
【0012】これらの金属は、予め精練により得られた
金属Scに加えてその合金化を図ってもよいが、金属S
cの製造プロセスにおいて、金属Scを単離することな
く、これらの金属元素との合金を製造しても良い。図1
にこのような例を示す。These metals may be alloyed in addition to the metal Sc obtained by refining in advance.
In the manufacturing process of c, an alloy with these metal elements may be manufactured without isolating the metal Sc. FIG.
Shows such an example.
【0013】図1に示す例では、原料となるSc2O3を
まず塩酸で溶解する。次いでこの溶液に1〜3M程度の
フッ酸を添加しScF3を生成させる。易溶性のScC
l3と異なりScF3は難溶性であるため沈殿するので、
これを濾別し乾燥する。しかる後、ScF3に低融点S
c合金を形成するためのZn-Ca合金をCaCl2と共
に添加し(図1の右上の工程)、溶融還元してSc-Zn
合金の融液を得る。このSc-Zn合金をそのまま脱酸
素工程(図1下の工程)に導くことにより、金属Scの製
造プロセス全体が簡略化できると共に溶融・凝固を繰返
す必要がないのでエネルギーコストの無駄が解消され
る。In the example shown in FIG. 1, Sc 2 O 3 as a raw material is first dissolved with hydrochloric acid. Then to produce ScF 3 was added hydrofluoric acid of about 1~3M to the solution. Highly soluble ScC
Unlike l 3 , ScF 3 is hardly soluble and precipitates.
This is filtered off and dried. Then, low melting point S was added to ScF 3.
A Zn-Ca alloy for forming a c-alloy is added together with CaCl 2 (step at the upper right of FIG. 1), and is melt-reduced to obtain Sc-Zn.
Obtain a melt of the alloy. By leading this Sc—Zn alloy directly to the deoxidizing step (the lower step in FIG. 1), the entire manufacturing process of the metal Sc can be simplified, and there is no need to repeat melting and solidification, thereby eliminating waste of energy costs. .
【0014】なお、上記プロセスにおいて、CaCl2
は主として原料のScF3の融点を低下させるための添
加剤であり、通常はScF3に対して50〜90重量%
添加すればよい。CaCl2に代えて塩化マグネシウ
ム、フッ化カルシウムなどを用いてもよい。また、合金
形成材料として用いたZn-Ca合金は、低融点Sc合
金を形成する合金形成元素(Y)と原料のScF3に対し
て還元力を有する金属元素(Z)との組合わせであれば良
く、合金化したものに限らず、これらの金属元素Y、Z
を個々に共存させて用いても良い。合金形成元素(Y)は
先に述べたとおりであり、またScF3に対して還元力
を有する金属元素(Z)としてはCaの他にマグネシウム
(Mg)やリチウム(Li)などが用いられる。還元性金属(Z)
の添加量としては、原料のScF31当量に対して1.5
〜4当量程度が適当である。In the above process, CaCl 2
Is an additive mainly for lowering the melting point of the raw material ScF 3 , usually 50 to 90% by weight based on ScF 3
What is necessary is just to add. Magnesium chloride, calcium fluoride, etc. may be used instead of CaCl 2 . The Zn-Ca alloy used as the alloy-forming material may be a combination of an alloy-forming element (Y) for forming a low-melting-point Sc alloy and a metal element (Z) having a reducing power for the raw material ScF 3 . It is sufficient that these metal elements Y and Z are not limited to alloyed ones.
May be used individually. The alloy forming element (Y) is as described above, and the metal element (Z) having a reducing power for ScF 3 is magnesium in addition to Ca.
(Mg) or lithium (Li) is used. Reducing metal (Z)
Is added to 1.5 equivalents of ScF 3 as a raw material.
About 4 equivalents is appropriate.
【0015】(ロ)ScX3の予備処理工程 上記低融点Sc合金の融液にScX3を接触させること
により脱酸素が行なわれるが、これに先立ち、ScX3
をハロゲンガスによって予備処理し、ScX3中の酸素
を除去ないし低減しておくことが好ましい。一般に純粋
なScX3の合成は難しく、次亜ハロゲン酸塩(ScOx)
等が混在してしまう。このようなScX3を用いると、
金属Sc中の酸素量を1000ppm程度以下に低減する
のは難しい。そこで、脱酸素剤であるScX3に予めハ
ロゲンガス(塩素ガスあるいはフッ素ガス)を導入して次
亜ハロゲン酸塩等の酸素をガス化して離脱させる。[0015] While oxygen is carried out by contacting the SCX 3 to melt pretreatment step the low-melting Sc alloy (b) SCX 3, Prior to this, SCX 3
Is preferably pretreated with a halogen gas to remove or reduce oxygen in ScX 3 . In general, the synthesis of pure ScX 3 is difficult, and hypohalite (ScOx)
Are mixed. With such a SCX 3,
It is difficult to reduce the amount of oxygen in the metal Sc to about 1000 ppm or less. Therefore, a halogen gas (chlorine gas or fluorine gas) is previously introduced into ScX 3 as an oxygen scavenger, and oxygen such as hypohalite is gasified and desorbed.
【0016】例えば、塩素ガスによる脱酸素は、乾燥し
た塩素ガス雰囲気下、800〜900℃程度に加熱し
た、ScX3を30〜60分程度維持することにより行
なうことができる。好ましくは、ScX3に対して70
〜90重量%のCaCl2および/またはCaF2を添加
して加熱(900〜1000℃程度)溶融し、これに乾燥した塩
素ガスを導入する。この混合物は、ScX3とCaCl2
ないしCaX2の混合融液であるが、そのまま脱酸素工
程に用いることが可能である。これらのカルシウム塩
は、脱酸素終了後、ScX3等を含むスラグ層を金属S
c層から剥離し易くする。For example, deoxidation with chlorine gas can be performed by maintaining ScX 3 heated to about 800 to 900 ° C. in a dry chlorine gas atmosphere for about 30 to 60 minutes. Preferably, 70 against SCX 3
About 90% by weight of CaCl 2 and / or CaF 2 is added, melted by heating (about 900 to 1000 ° C.), and dry chlorine gas is introduced therein. This mixture comprises ScX 3 and CaCl 2
Although it is a mixed melt of CaX 2 , it can be used as it is in the deoxygenation step. After completion of deoxidation, these calcium salts form a slag layer containing ScX 3 or the like on the metal S.
It is easy to peel off from the c layer.
【0017】(ハ)脱酸素工程 Sc低融点合金の融液とScX3とを接触させることに
より、Sc低融点合金中の酸素を除去する。該合金中の
酸素は、次式に示すように純粋なScX3に吸収され、
ScOXとなって除去される。 O+ScX3 → ScOX + X2 Sc低融点合金融液とScX3との接触は任意の方法に
より行なうことができる。例えば、固体の上記Sc低融
点合金とScX3とを混合した上で加熱溶融してもよ
く、或いは該Sc低融点合金を加熱溶融後、ScX3を
添加してもよい。エネルギーコストの点からは、上記
(イ)の工程において調製したSc合金を溶融状態のまま
脱酸素工程に導き、これに(ロ)の工程において調製した
ScX3(好ましくは、ScX3-CaCl2-CaF2)融液を加えて
ヘリウム等の不活性ガス雰囲気下に混合・撹拌すること
が好ましい。 (C) Deoxygenation Step By bringing the melt of the Sc low melting point alloy into contact with ScX 3 , oxygen in the Sc low melting point alloy is removed. The oxygen in the alloy is absorbed by pure ScX 3 as shown in the following formula:
It becomes ScOX and is removed. O + ScX 3 → ScOX + X 2 Sc The contact between the low melting point combined liquid and ScX 3 can be carried out by any method. For example, the solid Sc low melting point alloy and ScX 3 may be mixed and then heated and melted, or ScX 3 may be added after the Sc low melting point alloy is heated and melted. In terms of energy costs,
Lead to Sc alloy prepared in step (b) leave deoxidation step in the molten state, (preferably, ScX 3 -CaCl 2 -CaF 2) ScX 3 prepared in the step (b) to this added melt It is preferable to mix and stir in an atmosphere of an inert gas such as helium.
【0018】ScX3とSc低融点合金との混合比(S
cX3:Sc低融点合金)は、好ましくは2:3〜4:
1、より好ましくは1:1〜2:1程度である。なおS
cX3が上記カルシウム塩との混合物である場合には混
合物中のScX3の対して上記範囲のSc低融点合金が
適当である。この混合比が2:3未満では酸素除去効果
が十分に発揮されない。4:1を超えると効果が飽和
し、しかも反応容器等の設備のスケールに対して十分な
処理効果が発揮されない。The mixing ratio of ScX 3 and Sc low melting point alloy (S
cX 3 : Sc low melting point alloy) is preferably 2: 3 to 4:
1, more preferably about 1: 1 to 2: 1. Note that S
When cX 3 is a mixture with the above calcium salt, an Sc low melting point alloy in the above range is suitable for ScX 3 in the mixture. When the mixing ratio is less than 2: 3, the oxygen removing effect is not sufficiently exhibited. When the ratio exceeds 4: 1, the effect is saturated, and a sufficient treatment effect is not exhibited on the scale of equipment such as a reaction vessel.
【0019】本発明の方法によれば、低融点Sc合金を
用いることにより、900〜1300℃程度の温度で脱
酸素処理を行なうことができる。この結果、黒鉛ルツボ
やTaルツボのような通常のルツボを用いてもルツボ成
分による汚染が進行することがない。また、上述のよう
に酸素を実質的に完全に除いたScX3を用いることに
より、金属Sc中の酸素濃度を500ppm程度以下まで
低減することが可能である。吸湿性が少なく取扱いが容
易であることから、ScX3としてはフッ化スカンジウ
ム(ScF3)が好ましい。According to the method of the present invention, the deoxidizing treatment can be performed at a temperature of about 900 to 1300 ° C. by using the low melting point Sc alloy. As a result, even if an ordinary crucible such as a graphite crucible or a Ta crucible is used, contamination by the crucible component does not progress. Further, by using ScX 3 from which oxygen is substantially completely removed as described above, the oxygen concentration in the metal Sc can be reduced to about 500 ppm or less. Scandium fluoride (ScF 3 ) is preferred as ScX 3 because of its low hygroscopicity and easy handling.
【0020】(ニ)脱合金化工程 合金形成元素がMg、Se、Te、ZnまたはCdから
選択される少なくとも1種の金属である場合には、通
常、上記脱酸素工程で得られた低酸素Sc合金からこれ
らの金属元素を真空分離によって容易に除去することが
できる。真空分離は上記Sc合金を真空中で約1000
〜1100℃に加熱することにより行う。真空分離によ
り合金成分のうちScを除く上記金属元素が揮発し、ス
ポンジ状の精製金属Scが得られる。 (D) Dealloying Step When the alloy forming element is at least one metal selected from Mg, Se, Te, Zn or Cd, the low oxygen content obtained in the deoxidizing step is usually These metal elements can be easily removed from the Sc alloy by vacuum separation. Vacuum separation of the Sc alloy above about 1000 in vacuum
Performed by heating to ~ 1100 ° C. The above-mentioned metal elements excluding Sc in the alloy components are volatilized by vacuum separation, and a sponge-like purified metal Sc is obtained.
【0021】[0021]
【実施例および比較例】実施例1 酸化Sc粉末(純度:99.9%)37.8gを特級試薬の塩
酸250mlに溶解した後、イオン交換水を添加して30
0mlの塩化Sc水溶液とした。これに半導体級純度のフ
ッ化水素酸100mlを添加し、フッ化Sc沈殿を生成さ
せ、これを濾過回収後、300℃で乾燥してフッ化Sc
粉末53gを得た。このフッ化Sc粉末40gを用い、
金属カルシウム16g、亜鉛94g、塩化カルシウム8
8gと共に内容積500mlのタンタルルツボに入れ、ア
ルゴンガス雰囲気下に950℃で1時間反応させた。反
応終了後、同雰囲気内にて室温まで放冷して内容物を取
り出し、スラグ層(フラックス層)と合金層(Sc-Zn合金)
とを分離した。一方、同様にして得られたフッ化Sc3
0gを塩化カルシウム88gと共にグラッシーカーボン
ルツボに入れ、900℃に加熱して溶融し、この融体に
塩素ガスを200ml/minの割合で2時間吹き込み反応さ
せた。反応終了後、室温にてルツボを取り出し、フッ化
Sc-塩化Ca混合物を取り出した。さらに、上記Sc-
Zn合金とこのフッ化Sc-塩化Ca混合物とを内容積
500mlのタンタルルツボに入れ、再びアルゴンガス雰
囲気の反応容器内にて950℃で1時間反応させた。反
応終了後、室温にてルツボを取り出し、スラグ層とSc
-Zn合金層とを分離した。次いでアルゴン雰囲気のグ
ローブボックス中で上記合金92gを1cm程度に粉砕
し、再度タンタルルツボに入れて真空容器内で1000
℃で5時間加熱してZnを除去し、精製金属Scを得
た。原料Scと精製Sc中の酸素濃度を燃焼赤外吸収法
により測定したところ、原料中では2000ppmであっ
た酸素濃度が本発明の処理により450ppmまで低減で
きたことが確認された。EXAMPLES AND COMPARATIVE EXAMPLES Example 1 37.8 g of oxidized Sc powder (purity: 99.9%) was dissolved in 250 ml of a special grade reagent, hydrochloric acid, and ion-exchanged water was added.
0 ml of an aqueous Sc chloride solution was obtained. 100 ml of semiconductor-grade pure hydrofluoric acid was added thereto to generate a Sc fluoride precipitate, which was collected by filtration, dried at 300 ° C., and dried at 300 ° C.
53 g of a powder were obtained. Using 40 g of this fluorinated Sc powder,
Metallic 16g, zinc 94g, calcium chloride 8
The mixture was placed in a 500 ml tantalum crucible together with 8 g, and reacted at 950 ° C. for 1 hour under an argon gas atmosphere. After the reaction is completed, the contents are taken out by cooling to room temperature in the same atmosphere, and the slag layer (flux layer) and alloy layer (Sc-Zn alloy)
And separated. On the other hand, the fluorinated Sc3
0 g was put in a glassy carbon crucible together with 88 g of calcium chloride, heated to 900 ° C. and melted, and chlorine gas was blown into the melt at a rate of 200 ml / min for 2 hours to cause a reaction. After the reaction was completed, the crucible was taken out at room temperature, and a fluorinated Sc-Ca chloride mixture was taken out. Furthermore, the Sc-
The Zn alloy and this fluorinated Sc-Ca chloride mixture were placed in a 500 ml tantalum crucible and reacted again at 950 ° C. for 1 hour in a reaction vessel in an argon gas atmosphere. After the reaction is completed, the crucible is taken out at room temperature, and the slag layer and Sc are removed.
-Separated from the Zn alloy layer. Next, 92 g of the above alloy was crushed to about 1 cm in a glove box in an argon atmosphere, put again in a tantalum crucible, and placed in a vacuum vessel at 1000 g.
The solution was heated at a temperature of 5 ° C. for 5 hours to remove Zn and obtain a purified metal Sc. The oxygen concentration in the raw material Sc and the purified Sc was measured by a combustion infrared absorption method. As a result, it was confirmed that the oxygen concentration in the raw material, which was 2000 ppm, could be reduced to 450 ppm by the treatment of the present invention.
【0022】実施例2 実施例1と同様に調製したフッ化Sc粉末を40g、金
属カルシウム粒6g、純度99.999%のアルミニウム10
0g、塩化カルシウム120gと共に内容積500mlの
タンタルルツボに入れ、アルゴンガス雰囲気下に950
℃で1時間反応させた。反応終了後、同雰囲気内にて室
温まで放冷して内容物を取り出し、スラグ層(フラック
ス層)と合金層とを分離した。一方、同様にして得たフ
ッ化Sc30gを塩化カルシウム88gと共にグラッシ
ーカーボンルツボに入れ、900℃にて塩素ガスを20
0ml/minの割合で2時間融体に吹き込み反応させた。反
応終了後、室温にてルツボを取り出し、フッ化Sc-塩
化Ca混合物を取り出した。さらに、前述した合金層と
フッ化Sc-塩化Ca混合物とを内容積500mlのタン
タルルツボに入れ、再びアルゴンガス雰囲気の反応容器
内にて950℃で1時間反応させた。反応終了後、室温
にてルツボを取り出し、スラグ層と合金層とを分離し、
精製Sc-Al合金110gを得た。精製Sc-Al合金
中の酸素濃度を実施例1と同様にして測定したところ、
酸素濃度は700ppmであった。 Example 2 40 g of Sc fluoride powder prepared in the same manner as in Example 1, 6 g of calcium metal particles, and aluminum 10 having a purity of 99.999%
0 g and 120 g of calcium chloride together with a tantalum crucible having an inner volume of 500 ml.
The reaction was carried out at a temperature of 1 hour. After the completion of the reaction, the content was taken out by cooling to room temperature in the same atmosphere, and the slag layer (flux layer) and the alloy layer were separated. On the other hand, 30 g of Sc fluoride obtained in the same manner was put into a glassy carbon crucible together with 88 g of calcium chloride.
The melt was blown into the melt at a rate of 0 ml / min for 2 hours to cause a reaction. After the reaction was completed, the crucible was taken out at room temperature, and a fluorinated Sc-Ca chloride mixture was taken out. Further, the alloy layer and the fluorinated Sc-Ca chloride mixture were placed in a tantalum crucible having an inner volume of 500 ml, and reacted again at 950 ° C. for 1 hour in a reaction vessel in an argon gas atmosphere. After the reaction, take out the crucible at room temperature, separate the slag layer and the alloy layer,
110 g of a purified Sc-Al alloy was obtained. When the oxygen concentration in the purified Sc-Al alloy was measured in the same manner as in Example 1,
The oxygen concentration was 700 ppm.
【0023】実施例3 純度99.999%のアルミニウム300gに実施例1で得た
精製金属Sc3.6gを添加し、真空中800℃で溶融
し、鋳造した。得られた鋳塊を520℃で10時間保持
した後、圧延率80%の冷間圧延を施し、さらに420
℃で30分間の熱処理を施した。得られた素材を用いて
直径120mmφ、厚さ2mmのスパッタリングターゲット
を作成した。このターゲットを用い、スパッタリング法
およびリソグラフィー法により配線パターンを形成し
た。配線パターン中の各配線の幅は2μm、長さ3mm、
厚さ1μmとし、各試料ターゲット毎に10本づつの配
線を選定した。各配線に通電して加速信頼性試験を行な
った。試験条件は基板温度150℃、電流密度5×10
6 A/cm2とした。各試料ターゲットから得られる配線の
それぞれについて、断線が発生した本数の全体本数に対
する比率を算定し、配線の信頼性を評価した。結果を表
1に示す。 Example 3 3.6 g of the purified metal Sc obtained in Example 1 was added to 300 g of aluminum having a purity of 99.999%, melted at 800 ° C. in a vacuum, and cast. After keeping the obtained ingot at 520 ° C. for 10 hours, it was subjected to cold rolling at a rolling reduction of 80%, and further 420
Heat treatment was performed at 30 ° C. for 30 minutes. Using the obtained material, a sputtering target having a diameter of 120 mmφ and a thickness of 2 mm was prepared. Using this target, a wiring pattern was formed by a sputtering method and a lithography method. The width of each wiring in the wiring pattern is 2μm, length 3mm,
The thickness was 1 μm, and ten wirings were selected for each sample target. Each wiring was energized to perform an accelerated reliability test. Test conditions were: substrate temperature 150 ° C, current density 5 × 10
6 A / cm 2 . For each wiring obtained from each sample target, the ratio of the number of broken wires to the total number of wires was calculated, and the reliability of the wiring was evaluated. Table 1 shows the results.
【0024】実施例4 実施例2で得た精製Sc-Al合金1.5gと純度99.999
%のアルミニウム300gとを真空中800℃で溶融し
た後、実施例3と同様にして配線を製造し、その信頼性
を調べた。結果を表1に示す。 Example 4 1.5 g of the purified Sc—Al alloy obtained in Example 2 and a purity of 99.999
% Of aluminum was melted in a vacuum at 800 ° C., and a wiring was manufactured in the same manner as in Example 3, and the reliability was examined. Table 1 shows the results.
【0025】比較例1 市販の金属Sc(酸素濃度:2000ppm)を用いた他は実施例
3と同様の方法により配線の信頼性を試験した。結果を
表1に示す。COMPARATIVE EXAMPLE 1 The reliability of wiring was tested in the same manner as in Example 3 except that commercially available metal Sc (oxygen concentration: 2000 ppm) was used. Table 1 shows the results.
【0026】 [0026]
【0027】この結果から明らかなように、本発明の酸
素含有量の少ない金属Scを用いたAl−Sc配線材料
は従来品に比べて断線発生率が半分以下であり、信頼性
に優れることがわかる。As is apparent from the results, the Al-Sc wiring material of the present invention using the metal Sc having a low oxygen content has a disconnection occurrence rate of half or less as compared with the conventional product, and is excellent in reliability. Understand.
【0028】[0028]
【発明の効果】本発明によれば従来法では達成できなか
った数百ppm 程度の低い酸素濃度を容易に実現できるの
で、金属Scの本来の特徴を損なうことなく幅広い応用
が可能となる。特にAl−Sc配線材料として使用した
場合には従来品に比べて断線発生率や信号遅延が著しく
改善され、信頼性が高く電気特性に優れた製品が得られ
る。According to the present invention, a low oxygen concentration of about several hundred ppm, which cannot be achieved by the conventional method, can be easily realized, so that a wide range of applications can be achieved without impairing the original characteristics of the metal Sc. In particular, when used as an Al-Sc wiring material, the rate of disconnection and signal delay are remarkably improved as compared with conventional products, and a product having high reliability and excellent electrical characteristics can be obtained.
【図1】本発明による低酸素Scの製造プロセスを模式
的に示した流れ図。FIG. 1 is a flowchart schematically showing a process for producing low oxygen Sc according to the present invention.
フロントページの続き (56)参考文献 特開 平7−90411(JP,A) 特開 昭63−161130(JP,A) 特開 平1−116038(JP,A) 特公 平5−85627(JP,B2) (58)調査した分野(Int.Cl.7,DB名) C22B 1/00 - 61/00 Continuation of the front page (56) References JP-A-7-90411 (JP, A) JP-A-63-161130 (JP, A) JP-A-1-116038 (JP, A) JP-B-5-85627 (JP) , B2) (58) Field surveyed (Int. Cl. 7 , DB name) C22B 1/00-61/00
Claims (5)
め加熱下でハロゲンガス雰囲気にして酸素を除いたハロ
ゲン化スカンジウムを、上記金属スカンジウムの低融点
合金融液に接触させることにより、合金中の酸素をハロ
ゲン化スカンジウムに吸収させて酸素濃度を低減するこ
とを特徴とする金属スカンジウムの脱酸素方法。1. A method according to claim 1, wherein the metal scandium is alloyed with a low melting point, and the scandium halide from which oxygen has been removed in advance in a halogen gas atmosphere under heating is brought into contact with the low-melting alloy liquid of the metal scandium, thereby obtaining oxygen in the alloy. Deoxygenation of metal scandium by absorbing oxygen into scandium halide to reduce the oxygen concentration.
を形成する金属として、Mg、Al、Ga、In、S
e、Te、Zn、Cdから選択される少なくとも1種の
金属を用いる請求項1の脱酸素方法。2. As a metal added to scandium metal to form a low melting point alloy, Mg, Al, Ga, In, S
2. The deoxidation method according to claim 1, wherein at least one metal selected from e, Te, Zn, and Cd is used.
触させるハロゲン化スカンジウムが、予めハロゲン化ス
カンジウムに塩化カルシウムおよび/またはフッ化カル
シウムを添加し、加熱溶融下で、この混合融液に塩素ガ
スを導入して酸素を除いたものである請求項1または2
の脱酸素方法。3. A scandium halide to be brought into contact with a low-melting-point metallurgical solution of scandium metal is prepared by adding calcium chloride and / or calcium fluoride to scandium halide in advance, and adding chlorine gas to the mixed melt under heating and melting. 3. The method according to claim 1, wherein oxygen is introduced to remove oxygen.
Deoxygenation method.
処理した後に、スラグ層と合金層を分離し、この合金を
真空中で約1000〜1100℃に加熱することによ
り、スカンジウムに添加した金属元素を揮発分離して精
製金属スカンジウムを得る方法。4. After deoxidizing by the method of claim 1, 2 or 3, the slag layer and the alloy layer are separated, and the alloy is heated to about 1000 to 1100 ° C. in a vacuum to convert the alloy into scandium. A method of obtaining purified metal scandium by volatilizing and separating the added metal element.
ジウム(ScF3)である請求項1〜4のいずれかに記載
する方法。5. The method according to claim 1, wherein the scandium halide is scandium fluoride (ScF 3 ).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26979096A JP3292060B2 (en) | 1996-10-11 | 1996-10-11 | Deoxygenation method of scandium metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26979096A JP3292060B2 (en) | 1996-10-11 | 1996-10-11 | Deoxygenation method of scandium metal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10121164A JPH10121164A (en) | 1998-05-12 |
| JP3292060B2 true JP3292060B2 (en) | 2002-06-17 |
Family
ID=17477202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26979096A Expired - Fee Related JP3292060B2 (en) | 1996-10-11 | 1996-10-11 | Deoxygenation method of scandium metal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3292060B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102220502B (en) * | 2011-05-26 | 2012-11-21 | 中国地质科学院矿产综合利用研究所 | Method for preparing aluminum-scandium intermediate alloy by thermal reduction of aluminum-calcium alloy |
| CN102220503B (en) * | 2011-05-26 | 2012-11-21 | 中国地质科学院矿产综合利用研究所 | Method for preparing aluminum-scandium intermediate alloy by calcium thermal reduction method |
| AU2016200868B2 (en) | 2015-02-10 | 2021-05-13 | Scandium International Mining Corporation | Systems and processes for recovering scandium values from laterite ores |
-
1996
- 1996-10-11 JP JP26979096A patent/JP3292060B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10121164A (en) | 1998-05-12 |
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