[go: up one dir, main page]

JP2871111B2 - Cooling method in vacuum furnace - Google Patents

Cooling method in vacuum furnace

Info

Publication number
JP2871111B2
JP2871111B2 JP41234690A JP41234690A JP2871111B2 JP 2871111 B2 JP2871111 B2 JP 2871111B2 JP 41234690 A JP41234690 A JP 41234690A JP 41234690 A JP41234690 A JP 41234690A JP 2871111 B2 JP2871111 B2 JP 2871111B2
Authority
JP
Japan
Prior art keywords
main heating
chamber
heating chamber
article
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP41234690A
Other languages
Japanese (ja)
Other versions
JPH04221013A (en
Inventor
雅知 中村
英明 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP41234690A priority Critical patent/JP2871111B2/en
Publication of JPH04221013A publication Critical patent/JPH04221013A/en
Application granted granted Critical
Publication of JP2871111B2 publication Critical patent/JP2871111B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Furnace Details (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は被処理品を真空状態で加
熱する為の前室と、被処理品を前室よりも高真空状態で
かつ前室よりも高温に加熱する為の主加熱室とを備え、
前室は被処理品を受け入れる為の入口を有する一方、主
加熱室は被処理品を送り出す為の出口を有し、前室と主
加熱室は前室内の被処理品を主加熱室に移す為に開閉自
在の扉を介して連なっている真空炉において、主加熱室
内で加熱した被処理品を主加熱室から送り出した後、前
室内の被処理品を主加熱室に入れる為に主加熱室を冷却
する真空炉における冷却方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pre-chamber for heating an article to be processed in a vacuum state and a main heating for heating the article to be processed in a higher vacuum than the front chamber and a higher temperature than the front chamber. Room,
The front chamber has an inlet for receiving the article to be processed, the main heating chamber has an outlet for sending out the article to be processed, and the front chamber and the main heating chamber move the article in the front chamber to the main heating chamber. In a vacuum furnace connected via a door that can be opened and closed, the workpiece heated in the main heating chamber is sent out from the main heating chamber, and then the main heating is performed to put the workpiece in the front chamber into the main heating chamber. The present invention relates to a cooling method in a vacuum furnace for cooling a chamber.

【0002】[0002]

【従来の技術】上記のような真空炉においては、前室内
での被処理品の加熱と主加熱室内での被処理品の加熱と
を連続性良く行なえるという効果がある。そのような加
熱の過程において主加熱室から被処理品を送り出した後
前室内の被処理品を主加熱室内に移すに当っては、被処
理品が俄かに主加熱室内の高温に晒されることの防止の
為に、主加熱室内を前室内と同程度の温度まで冷却する
ことが行なわれる。その冷却の場合、従来は主加熱室内
を真空状態に放置して冷却する方法が行なわれていた。
2. Description of the Related Art In a vacuum furnace as described above, there is an effect that heating of a workpiece in a front chamber and heating of a workpiece in a main heating chamber can be performed with good continuity. In the course of such heating, when the article to be treated in the front chamber is transferred to the main heating chamber after the article to be treated is sent out from the main heating chamber, the article to be treated is suddenly exposed to the high temperature in the main heating chamber. In order to prevent this, the main heating chamber is cooled to the same temperature as the front chamber. In the case of the cooling, conventionally, a method of cooling by leaving the main heating chamber in a vacuum state has been performed.

【0003】[0003]

【発明が解決しようとする課題】この従来の真空炉にお
ける冷却方法では主加熱室内が所定の温度まで下がるの
に長時間を要し、真空炉の稼動率が低くなるという問題
点があった。また主加熱室内にガスを導入して冷却しよ
うとすると、そのガスが前室へ漏れてそこの真空状態を
悪化させるという問題点や、主加熱室を冷却した後、前
室内の高温の被処理品を主加熱室内に入れた場合に、そ
の被処理品が主加熱室内にあるガスに触れて傷み品質が
悪化するという問題点が生ずる悩みがあった。
In the conventional cooling method in a vacuum furnace, there is a problem that it takes a long time to lower the temperature of the main heating chamber to a predetermined temperature, thereby lowering the operating rate of the vacuum furnace. In addition, when introducing gas into the main heating chamber and trying to cool it, the gas leaks into the front chamber and deteriorates the vacuum state there. When an article is placed in the main heating chamber, the article to be treated comes into contact with the gas in the main heating chamber, causing a problem that the quality is deteriorated.

【0004】本願発明は上記従来技術の問題点(技術的
課題)を解決する為になされたもので、水素、ヘリウム
又はそれらを含むガスを、主加熱室から前室への漏れが
防止される範囲内の圧力で主加熱室に導入して主加熱室
を冷却することによって、主加熱室内を短時間で所定の
温度まで冷却でき、しかもそのようにガスを入れても、
前室の真空状態の悪化を防止できると共に、前室内の被
処理品を主加熱室内に入れた場合における被処理品の品
質悪化も防止できるようにした真空炉における冷却方法
を提供することを目的としている。
The present invention has been made to solve the above-mentioned problems (technical problems) of the prior art, and prevents leakage of hydrogen, helium or a gas containing them from the main heating chamber to the front chamber. By introducing the main heating chamber to the main heating chamber at a pressure within the range and cooling the main heating chamber, the main heating chamber can be cooled to a predetermined temperature in a short time, and even if such gas is introduced,
An object of the present invention is to provide a cooling method in a vacuum furnace, which can prevent deterioration of a vacuum state in a front chamber and prevent deterioration of quality of a processing target when a processing target in the front chamber is put into a main heating chamber. And

【0005】[0005]

【課題を解決するための手段】上記目的を達成する為
に、本願発明における真空炉における冷却方法は、被処
理品を真空状態で加熱する為の前室と、被処理品を前室
よりも高真空状態でかつ前室よりも高温に加熱する為の
主加熱室とを備え、前室は被処理品を受け入れる為の入
口を有する一方、主加熱室は被処理品を送り出す為の出
口を有し、前室と主加熱室は前室内の被処理品を主加熱
室に移す為に開閉自在の扉を介して連なっている真空炉
において、主加熱室内で加熱した被処理品を主加熱室か
ら送り出した後、前室内の被処理品を主加熱室に入れる
為に主加熱室を冷却するに当っては、水素、ヘリウム又
はそれらを含むガスを、主加熱室から前室への漏れが防
止される範囲内の圧力で主加熱室に導入して、主加熱室
を冷却するものである。
Means for Solving the Problems To achieve the above object, a cooling method in a vacuum furnace according to the present invention comprises a front chamber for heating a workpiece in a vacuum state, and A main heating chamber for heating to a higher temperature than the front chamber in a high vacuum state, and the front chamber has an inlet for receiving the article to be processed, while the main heating chamber has an outlet for sending out the article to be processed. The front chamber and the main heating chamber are mainly heated in the main heating chamber in a vacuum furnace connected via an openable / closable door in order to transfer the workpiece in the front chamber to the main heating chamber. After cooling out the main heating chamber after sending it out of the chamber, the hydrogen, helium or gas containing them leaks from the main heating chamber to the front heating chamber when cooling the main heating chamber to put the workpiece in the front chamber into the main heating chamber. Is introduced into the main heating chamber at a pressure within the range where .

【0006】[0006]

【作用】被処理品は前室に入れられ、そこにおいて真空
状態で加熱される。続いて被処理品は主加熱室に移さ
れ、そこにおいてより高真空状態でより高温まで加熱さ
れる。その後、主加熱室で加熱された被処理品が主加熱
室から送り出される。
The object to be treated is placed in the front chamber, where it is heated in a vacuum. Subsequently, the workpiece is transferred to a main heating chamber where it is heated to a higher temperature in a higher vacuum. Thereafter, the article heated in the main heating chamber is sent out from the main heating chamber.

【0007】上記のように主加熱室内の被処理品を送り
出した後、前室内の次の被処理品を主加熱室内に移す場
合は次のように行なわれる。主加熱室から被処理品が送
り出された後、主加熱室内には水素、ヘリウム又はそれ
らを含むガスが導入される。主加熱室内はそれらのガス
の対流によって迅速に冷却される。主加熱室内が前室内
と同程度の温度になると、扉が開かれ、前室内の被処理
品が主加熱室内に移される。
After the article to be processed in the main heating chamber is sent out as described above, the next article to be processed in the front chamber is transferred to the main heating chamber in the following manner. After the article to be processed is sent out from the main heating chamber, hydrogen, helium, or a gas containing them is introduced into the main heating chamber. The main heating chamber is rapidly cooled by the convection of these gases. When the temperature of the main heating chamber reaches the same level as that of the front chamber, the door is opened, and the article to be processed in the front chamber is moved to the main heating chamber.

【0008】[0008]

【実施例】以下本願の実施例を示す図面について説明す
る。図1において、1は真空炉で、前室2(予熱室とも
呼ばれる)と、主加熱室3(単に加熱室とも呼ばれる)
と、冷却室4を有する。前室2は被処理品を受け入れる
為の入口5を有し、そこには開閉装置6によって操作さ
れる扉7が備わっている。又内部には被処理品Aを加熱
する為のヒータ8例えば電気ヒータが備えられ、又該前
室2は図示外の真空排気装置に接続してある。前室2と
主加熱室3との間及び主加熱室3と冷却室4との間は夫
々隔壁10,11で仕切られている。隔壁10には前室
2内の被処理品Aを主加熱室3内に入れる為の入口12
が設けられ、又隔壁11には主加熱室3内の被処理品A
を冷却室4に出す為の出口13が設けてある。それらの
入口12及び出口13には夫々開閉装置14,16で操
作される扉15,17が備わっている。それらの扉1
5,17は主加熱室3が前室2或いは冷却室4よりも高
真空状態で操業される為、前室2或いは冷却室4の側か
ら上記入口12及び出口13を閉じるようになってい
る。主加熱室3の内部においては被処理品Aを前室2よ
りも高温に加熱する為に断熱壁18が備わっている。断
熱壁18における入口側の部分19と出口側の部分20
とは夫々前記扉15,17に取付けられて、それらの扉
15,17と一体に開閉するようになっている。21は
被処理品を加熱する為のヒータで、例えば電気ヒータが
用いてある。尚上記主加熱室3は、図示はしないが周知
の真空排気装置に接続してある。次に冷却室4は出口2
3を有し、そこには開閉装置24によって操作される扉
25が備わっている。26は冷却室4内において冷却用
のガスを攪拌する為のファンを示す。尚冷却室4には冷
却用のガスを送入する為の図示外のガス供給手段が接続
してある。次に27は前室2、主加熱室3、冷却室4を
通して設けられた搬送手段で、例えばローラーハースが
利用してある。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. In FIG. 1, reference numeral 1 denotes a vacuum furnace, which is a front chamber 2 (also called a preheating chamber) and a main heating chamber 3 (also simply called a heating chamber).
And a cooling chamber 4. The front chamber 2 has an entrance 5 for receiving the article to be treated, and is provided with a door 7 operated by an opening / closing device 6. Further, a heater 8 for heating the article to be processed A, for example, an electric heater is provided therein, and the front chamber 2 is connected to a vacuum exhaust device (not shown). The space between the front chamber 2 and the main heating chamber 3 and the space between the main heating chamber 3 and the cooling chamber 4 are partitioned by partition walls 10 and 11, respectively. The partition 10 has an inlet 12 through which the article A to be treated in the front chamber 2 is introduced into the main heating chamber 3.
Is provided on the partition 11, and the processing target A in the main heating chamber 3 is provided.
An outlet 13 is provided for taking the air into the cooling chamber 4. The entrances 12 and the exits 13 are provided with doors 15, 17 operated by opening and closing devices 14, 16, respectively. Those doors 1
Since the main heating chamber 3 is operated in a higher vacuum state than the front chamber 2 or the cooling chamber 4, the inlets 12 and the outlets 13 are closed from the front chamber 2 or the cooling chamber 4 side. . Inside the main heating chamber 3, a heat insulating wall 18 is provided to heat the article to be processed A to a higher temperature than the front chamber 2. Inlet part 19 and outlet part 20 of the heat insulating wall 18
Are attached to the doors 15 and 17, respectively, and open and close integrally with the doors 15 and 17. Reference numeral 21 denotes a heater for heating the article to be processed, for example, an electric heater. The main heating chamber 3 is connected to a well-known vacuum exhaust device (not shown). Next, the cooling chamber 4 is the outlet 2
3 provided with a door 25 operated by an opening / closing device 24. Reference numeral 26 denotes a fan for stirring the cooling gas in the cooling chamber 4. The cooling chamber 4 is connected to a gas supply means (not shown) for supplying a cooling gas. Next, reference numeral 27 denotes a conveying means provided through the front chamber 2, the main heating chamber 3, and the cooling chamber 4, and uses, for example, a roller hearth.

【0009】上記のような真空炉1は例えば粉末金属成
形品の焼結の為に用いられる。被処理品A例えば粉末金
属成形品は先ず前室2内に入れられ、そこを例えば10
−3Torr程度の真空にした状態で例えば600℃程
度に加熱され、脱ワックスが行われる。次にその被処理
品Aは主加熱室3内に入れられ、そこを前室2よりも高
真空状態例えば10−5Torr程度の真空にした状態
で、前室よりも高温例えば1200℃まで加熱され、粉
末金属の焼結が行われる。焼結が完了すると被処理品A
は冷却室4に入れられ、そこで通常の低い温度まで冷却
され、その後出口23から送出される。
The above-described vacuum furnace 1 is used, for example, for sintering a powder metal molded product. An article A to be treated, for example, a powdered metal molded article, is first put into the front chamber 2 and is placed therein, for example, for 10 minutes.
The substrate is heated to, for example, about 600 ° C. in a vacuum of about −3 Torr to perform dewaxing. Next, the article to be processed A is put into the main heating chamber 3 and heated to a higher temperature than the front chamber, for example, 1200 ° C. in a vacuum state higher than that of the front chamber 2, for example, about 10 −5 Torr. Then, sintering of the powder metal is performed. When sintering is completed, the product A
Is placed in a cooling chamber 4 where it is cooled to a normal low temperature and then discharged from outlet 23.

【0010】上記のような操業の場合において、主加熱
室3内で加熱した被処理品Aを主加熱室3から送り出し
た後前室2内の次の被処理品Aを主加熱室3に移すに当
たっては、主加熱室3内が次のようにして冷却される。
即ち扉15,17が閉じられた状態において主加熱室3
内には冷却用の雰囲気ガスが導入される。上記雰囲気ガ
スとしては比較的低い圧力下でも冷却効果の高いガス、
例えば水素、ヘリウム又はそれらを含むガスが用いられ
る。又その導入する圧力は、主加熱室3から前室2或い
は冷却室4への雰囲気ガスの漏れが防止される範囲内の
圧力、即ち扉15や扉17の密閉状態が保たれる範囲内
の圧力例えば200Torr以下の圧力にされる。この
ようなガスを導入した状態において主加熱室3が放置さ
れ、そこの冷却が行われる。この場合上記導入された雰
囲気ガスの対流によって主加熱室3は迅速に冷却され
る。このような冷却により主加熱室3内の温度が前室2
内の温度と同程度となると、次に扉15を開いて前室2
内の被処理品Aが主加熱室3内に移される。
In the above-described operation, the article A heated in the main heating chamber 3 is sent out from the main heating chamber 3 and then the next article A in the front chamber 2 is transferred to the main heating chamber 3. In transferring, the inside of the main heating chamber 3 is cooled as follows.
That is, when the doors 15 and 17 are closed, the main heating chamber 3 is closed.
An atmosphere gas for cooling is introduced therein. As the atmosphere gas, a gas having a high cooling effect even under a relatively low pressure,
For example, hydrogen, helium, or a gas containing them is used. The pressure to be introduced is within a range where the leakage of the atmospheric gas from the main heating chamber 3 to the front chamber 2 or the cooling chamber 4 is prevented, that is, within a range where the doors 15 and 17 are kept in a sealed state. The pressure is set to, for example, 200 Torr or less. The main heating chamber 3 is left in a state where such a gas is introduced, and the main heating chamber 3 is cooled. In this case, the main heating chamber 3 is rapidly cooled by the convection of the introduced atmospheric gas. By such cooling, the temperature in the main heating chamber 3 becomes
When the temperature becomes about the same as the inside temperature, the door 15 is opened and the front room 2 is opened.
The article to be processed A is moved into the main heating chamber 3.

【0011】次に図2は主加熱室3内の温度の変化の一
例を示すもので、前室2内の被処理品Aを主加熱室3に
導入する場合には温度は例えば600℃程度である。被
処理品Aが移された後主加熱室3の加熱が開始され、例
えば60分程度で1200℃の温度まで到達する。その
状態で例えば90分間保持される。そして前記のように
被処理品Aを送り出した後前記の如く雰囲気ガスが導入
されて主加熱室3の冷却が例えば60分程度の時間で行
われる。この時間は、前記従来技術のように主加熱室3
を真空状態に放置して同様の600℃まで冷却する(破
線で示される温度変化)のに要する時間90分よりも著
しく短い時間である。
Next, FIG. 2 shows an example of a change in the temperature in the main heating chamber 3. When the article A in the front chamber 2 is introduced into the main heating chamber 3, the temperature is, for example, about 600 ° C. It is. After the article A is transferred, the heating of the main heating chamber 3 is started, and reaches a temperature of 1200 ° C. in about 60 minutes, for example. In that state, for example, it is held for 90 minutes. After the article to be processed A is sent out as described above, the atmospheric gas is introduced as described above, and the main heating chamber 3 is cooled, for example, for about 60 minutes. This time is, as in the prior art, the main heating chamber 3
This is a time significantly shorter than the time required for cooling to 600 ° C. (temperature change indicated by a dashed line) by leaving the device in a vacuum state.

【0012】上記の処理は、たとえば、図3のように被
処理品によっては主加熱室内で1200℃の温度で所定
時間保持した後、所定温度まで徐冷して後、被処理品A
を主加熱室から送り出し、その後主加熱室3内に雰囲気
ガスを導入して主加熱室3を冷却することも行われる。
さらに、別の被処理品によっては主加熱室3内で加熱
後、図4のように被処理品を雰囲気ガスにより冷却して
後、被処理品Aを主加熱室3から送り出し、そのまま主
加熱室3を冷却することもできるし、主加熱室3内の雰
囲気ガスが不足する場合は被処理品Aを主加熱室3から
送り出した後さらに主加熱室3内に雰囲気ガスを導入し
て主加熱室3を冷却することもできる。そして、上記の
他にも本発明の主加熱室3内での被処理品の加熱条件に
ついては種々の加熱条件が広く適用されるものである。
また、主加熱室へ導入するガス圧は前室内の圧力よりも
低いこと(高真空状態)が望ましいが、前室と主加熱室
3との間の扉を操作する開閉装置からの力を越えない圧
力であれば、本願発明の効果は得られるものである。
In the above-described processing, for example, as shown in FIG. 3, depending on the article to be treated, the article is held at a temperature of 1200 ° C. for a predetermined time in the main heating chamber, gradually cooled to a predetermined temperature, and then treated.
Is sent out from the main heating chamber, and then the ambient gas is introduced into the main heating chamber 3 to cool the main heating chamber 3.
Further, depending on another article to be treated, after the article to be treated is cooled in the main heating chamber 3 as shown in FIG. The chamber 3 can be cooled, and when the atmospheric gas in the main heating chamber 3 is insufficient, the processing object A is sent out from the main heating chamber 3 and then the atmospheric gas is further introduced into the main heating chamber 3 to supply the main gas. The heating chamber 3 can be cooled. In addition to the above, various heating conditions are widely applied as the heating conditions of the article to be processed in the main heating chamber 3 of the present invention.
Further, it is desirable that the gas pressure introduced into the main heating chamber is lower than the pressure in the front chamber (high vacuum state), but exceeds the force from the opening / closing device that operates the door between the front chamber and the main heating chamber 3. If there is no pressure, the effect of the present invention can be obtained.

【0013】次に上記雰囲気ガスの種類と、圧力と、上
記のような冷却に要する時間との一例を示せば、水素ガ
スの場合10Torrで60分、ヘリウムガスの場合7
Torrで60分である。尚ちなみに窒素ガスの場合8
0Torrで60分である。
Next, an example of the type, the pressure, and the time required for the cooling as described above of the atmosphere gas will be described. For example, hydrogen gas is used for 10 minutes at 10 Torr, and helium gas is used for 7 minutes.
It is 60 minutes in Torr. By the way, in case of nitrogen gas 8
It is 60 minutes at 0 Torr.

【0014】[0014]

【発明の効果】以上のように本願発明にあっては、主加
熱室3内で加熱された被処理品Aを主加熱室3から送り
出した後、前室2内の被処理品Aを主加熱室3に入れる
為に主加熱室3を前室2内の温度と同程度の温度まで冷
却する場合、主加熱室3内にガスを導入するから、主加
熱室3内で対流が生じて短時間で所定の温度まで冷却で
きる効果がある。
As described above, according to the present invention, after the article A heated in the main heating chamber 3 is sent out from the main heating chamber 3, the article A in the front chamber 2 is mainly removed. When the main heating chamber 3 is cooled down to the same temperature as the temperature in the front chamber 2 to enter the heating chamber 3, gas is introduced into the main heating chamber 3, so that convection occurs in the main heating chamber 3. This has the effect of cooling to a predetermined temperature in a short time.

【0015】しかもそのようにガスを導入するもので
も、ガスとしては水素、ヘリウム又はそれらを含むガス
を用いるから、そのガス圧は低い圧力であっても、上記
対流による大きな冷却効果をもたらすことができ、主加
熱室3から前室2へのガスの漏れを防止した状態での上
記冷却の短時間化を可能にできる効果がある。
In addition, even when the gas is introduced as described above, since hydrogen, helium or a gas containing them is used as the gas, even if the gas pressure is low, a large cooling effect by the convection can be brought about. Thus, there is an effect that the cooling can be shortened in a state in which gas leakage from the main heating chamber 3 to the front chamber 2 is prevented.

【0016】さらにその上、上記のようなガスを用いる
から、前室2内の被処理品Aを主加熱室3内に入れたと
き、そこに上記のガスがあっても、被処理品Aに対する
上記ガスの悪影響は何ら生ぜず、被処理品Aの品質を保
持できる効果もある。
Furthermore, since the above-mentioned gas is used, when the article A in the front chamber 2 is put in the main heating chamber 3, even if the above-mentioned gas is present therein, the article A There is no effect of the above-mentioned gas on the object A, and there is also an effect that the quality of the article A to be treated can be maintained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】真空炉の略示縦断面図。FIG. 1 is a schematic vertical sectional view of a vacuum furnace.

【図2】主加熱室の温度変化の一例を示すグラフ。FIG. 2 is a graph showing an example of a temperature change in a main heating chamber.

【図3】主加熱室の温度変化の異なる例を示すグラフ。FIG. 3 is a graph showing a different example of a change in the temperature of the main heating chamber.

【図4】主加熱室の温度変化の更に異なる例を示すグラ
フ。
FIG. 4 is a graph showing still another example of a temperature change in the main heating chamber.

【符号の説明】[Explanation of symbols]

A 被処理品 1 前室 3 主加熱室 15 扉 A Products to be processed 1 Front room 3 Main heating room 15 Door

フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C21D 1/773 F27D 7/06 B22F 3/10 F27B 5/04,9/04,14/04 Continuation of the front page (58) Field surveyed (Int.Cl. 6 , DB name) C21D 1/773 F27D 7/06 B22F 3/10 F27B 5 / 04,9 / 04,14 / 04

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 被処理品を真空状態で加熱する為の前室
と、被処理品を前室よりも高真空状態でかつ前室よりも
高温に加熱する為の主加熱室とを備え、前室は被処理品
を受け入れる為の入口を有する一方、主加熱室は被処理
品を送り出す為の出口を有し、前室と主加熱室は前室内
の被処理品を主加熱室に移す為に開閉自在の扉を介して
連なっている真空炉において、主加熱室内で加熱した被
処理品を主加熱室から送り出した後、前室内の被処理品
を主加熱室に入れる為に主加熱室を冷却するに当って
は、水素、ヘリウム又はそれらを含むガスを、主加熱室
から前室への漏れが防止される範囲内の圧力で主加熱室
に導入して、主加熱室を冷却することを特徴とする真空
炉における冷却方法。
A first chamber for heating the article to be processed in a vacuum state; and a main heating chamber for heating the article to be processed in a higher vacuum than the front chamber and at a higher temperature than the front chamber, The front chamber has an inlet for receiving the article to be processed, the main heating chamber has an outlet for sending out the article to be processed, and the front chamber and the main heating chamber move the article in the front chamber to the main heating chamber. In a vacuum furnace connected via a door that can be opened and closed, the workpiece heated in the main heating chamber is sent out from the main heating chamber, and then the main heating is performed to put the workpiece in the front chamber into the main heating chamber. In cooling the chamber, hydrogen, helium or a gas containing them is introduced into the main heating chamber at a pressure within a range that prevents leakage from the main heating chamber to the front chamber, thereby cooling the main heating chamber. A cooling method in a vacuum furnace.
JP41234690A 1990-12-19 1990-12-19 Cooling method in vacuum furnace Expired - Fee Related JP2871111B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP41234690A JP2871111B2 (en) 1990-12-19 1990-12-19 Cooling method in vacuum furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP41234690A JP2871111B2 (en) 1990-12-19 1990-12-19 Cooling method in vacuum furnace

Publications (2)

Publication Number Publication Date
JPH04221013A JPH04221013A (en) 1992-08-11
JP2871111B2 true JP2871111B2 (en) 1999-03-17

Family

ID=18521196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP41234690A Expired - Fee Related JP2871111B2 (en) 1990-12-19 1990-12-19 Cooling method in vacuum furnace

Country Status (1)

Country Link
JP (1) JP2871111B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117702259A (en) * 2024-02-06 2024-03-15 宁波合盛新材料有限公司 Method for quickly cooling PVT furnace

Also Published As

Publication number Publication date
JPH04221013A (en) 1992-08-11

Similar Documents

Publication Publication Date Title
JP3149206B2 (en) Heat treatment equipment
US7313931B2 (en) Method and device for heat treatment
JPH0141684B2 (en)
JP2871111B2 (en) Cooling method in vacuum furnace
JP2000017305A (en) Degreasing sintering furnace
JP2859704B2 (en) Vacuum heat treatment furnace
JP3196305B2 (en) Vacuum furnace
JP3211356B2 (en) In-line type plasma CVD equipment
JPH0248618B2 (en)
JP5428032B2 (en) Carburizing method
JP2572017B2 (en) Cooling method of treated material in Matsufuru furnace
JPH09111309A (en) Continuous sintering furnace
JPH04297025A (en) Semiconductor production device
JP3547700B2 (en) Continuous vacuum carburizing furnace
JP3082362B2 (en) Operating method of continuous annealing furnace
JPS5792127A (en) Continuous bright heat treatment of metal in furnace containing gaseous atmosphere
JPH05148650A (en) Thin film treating device
JP2628264B2 (en) Heat treatment equipment
JPS5839702A (en) Continuous reduced pressure atmosphere sintering furnace
JPH0599572A (en) Continuous vacuum furnace
JPS61285381A (en) Vacuum furnace with partial section heating chamber
JP2003171717A (en) Two-chamber type heat treatment furnace
JP3103905B2 (en) Furnace pressure adjustment method of batch type atmosphere furnace
JPH05157461A (en) Heating furnace
JPS61243115A (en) Vacuum heat treatment device

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090108

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 10

Free format text: PAYMENT UNTIL: 20090108

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100108

Year of fee payment: 11

LAPS Cancellation because of no payment of annual fees