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JP2866386B2 - Shading masking film - Google Patents

Shading masking film

Info

Publication number
JP2866386B2
JP2866386B2 JP1009451A JP945189A JP2866386B2 JP 2866386 B2 JP2866386 B2 JP 2866386B2 JP 1009451 A JP1009451 A JP 1009451A JP 945189 A JP945189 A JP 945189A JP 2866386 B2 JP2866386 B2 JP 2866386B2
Authority
JP
Japan
Prior art keywords
light
resin
shielding
plasticizer
masking film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1009451A
Other languages
Japanese (ja)
Other versions
JPH02188755A (en
Inventor
達三 谷先
聡 安香
孝司 清水
修二 甲田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP1009451A priority Critical patent/JP2866386B2/en
Publication of JPH02188755A publication Critical patent/JPH02188755A/en
Application granted granted Critical
Publication of JP2866386B2 publication Critical patent/JP2866386B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は写真製版において、所望の図型をカッティン
グし、不要部分を剥離、除去し、マスク版の作成あるい
はネガもしくはポジの版下を作成するために使用される
遮光性マスキングフィルムに関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] In the present invention, in photoengraving, a desired pattern is cut, unnecessary portions are peeled and removed, and a mask plate or a negative or positive plate is prepared. The present invention relates to a light-shielding masking film used for forming a mask.

[従来の技術及び発明が解決すべき課題] 従来から写真製版において使用される遮光性マスキン
グフィルムは、塩ビシート、ポリエステルフィルム等か
ら成る透明支持体に(a)遮光性剥離層を直接設けたも
の、(b)粘着剤を介して遮光性剥離層を設けたもの等
があった。これらの遮光性マスキングフィルムを所望の
図型にカッティングし、不要部分を剥離して版下を作製
する際、自動図化装置の普及に伴いハンドカッティング
から自動図化装置によるカッティングが主流に成って来
た。そして自動図化装置により効率よく、しかも精度の
高い版下作製が可能となって来たがそれに伴い遮光性マ
スキングフィルム自体も高品質化が要求されるようにな
った。従来からある(a)遮光性剥離層を直接、支持体
に積層したものはカッティング刃による切り口部分が約
0.5mm程度或いはそれ以上開いてしまうという欠点があ
った。これは刃先の応力が直接被膜に作用するため残留
歪みが生じ、カッティングラインが開くことに起因し
た。この現像は自動図化装置でのカッティングだけでな
く、ハンドカッティングの際にも、オーバーランした所
の切り口の開きが、焼き付けの際に露光されてしまう。
あるいは毛抜き合わせの際に完全に合わせることができ
ないなどの欠点があった。また、(b)粘着剤を介して
遮光性剥離層を支持体に積層したものは粘着剤層の存在
により切り口部分の開口は多少減少するが完全にカット
ラインが閉じるという事はなかった。部分的にはカッテ
ィング直後、閉じている状態であっても経時と共に開い
てしまった。また、粘着剤を用いた遮光性剥離層は樹脂
組成物としてヒマシ油、セルロース等が主成分であるた
め被膜強度が弱く剥離作業時に何回となく被膜が切れて
しまった。不要部分を除去する剥離作業は自動図化装置
を用いてカッティングを行っても、手作業でナイフ又は
ピーラー等で不要部分の被膜の端部を持ち上げ剥離して
行う、いわゆるピックアップ性が悪いため非常に作業効
率が悪かった。その上、被膜が途中で切れてしまうと再
三ナイフ又はピーラーで不要被膜端部を持ち上げ剥離し
なければならず、ピックアップ性も悪く、事によると支
持体まで傷付けて写真適性を損う事が多々あった。
[Problems to be solved by the prior art and the invention] Conventionally, a light-shielding masking film used in photoengraving is obtained by directly providing (a) a light-shielding release layer on a transparent support made of a PVC sheet, a polyester film, or the like. And (b) those provided with a light-shielding release layer via an adhesive. When these light-shielding masking films are cut into a desired pattern, and unnecessary portions are peeled off to produce a block, cutting from hand cutting to automatic plotting with the spread of automatic plotting has become mainstream. Came. The automatic plotting apparatus has made it possible to produce an underlay efficiently and with high accuracy, but with this, a high quality of the light shielding masking film itself has been required. Conventionally, (a) a light-shielding release layer directly laminated on a support has a cut edge formed by a cutting blade.
There was a drawback that it opened about 0.5 mm or more. This was due to the fact that the stress at the cutting edge acts directly on the coating, resulting in residual strain and opening of the cutting line. In this development, not only in the cutting with the automatic plotting apparatus but also in the hand cutting, the opening of the cut portion where the overrun occurs is exposed at the time of printing.
Alternatively, there is a drawback such that it is not possible to completely match when removing the hair. (B) In the case where the light-shielding release layer was laminated on the support via the pressure-sensitive adhesive, the opening at the cut portion was slightly reduced by the presence of the pressure-sensitive adhesive layer, but the cut line was not completely closed. Immediately after cutting, it opened over time, even if it was closed. Further, since the light-shielding release layer using the pressure-sensitive adhesive was mainly composed of castor oil, cellulose and the like as a resin composition, the film strength was weak and the film was cut several times during the peeling operation. The peeling work to remove unnecessary parts is performed by lifting the edge of the coating of the unnecessary parts with a knife or a peeler, etc. manually, even if cutting is performed using an automatic plotter. Work efficiency was poor. In addition, if the film breaks in the middle, it is necessary to lift up the end of the unnecessary film with a repeated knife or peeler and peel it off, and the pick-up property is also poor, possibly damaging the support and impairing the photographic suitability in many cases. there were.

本発明はカッティングラインの切り口がカッティング
直後に閉じ経時的にも開かず、また不要部分の被膜の剥
離時にも途中で切れることなく連続して剥離可能な被膜
強度の強い遮光性剥離層を有する遮光性マスキングフィ
ルムを作製し、地図製版、グラフィックアーツあるいは
シルクスクリーン印版用プリント回路版下等複雑なパタ
ーンを作成するのに適した遮光性マスキングフィルムを
提供することを目的とする。
The present invention provides a light-shielding layer having a strong light-shielding release layer that can be continuously cut off without being cut off in the middle of the cut line of the cutting line immediately after cutting, and does not open over time, and also during peeling of an unnecessary portion of the film. An object of the present invention is to provide a light-shielding masking film which is suitable for producing a complex masking film and for creating a complicated pattern such as a map plate, a graphic arts, or a printed circuit board for a silk screen printing plate.

[課題を解決するための手段] 本発明の遮光性マスキングフィルムは、プラスチック
フィルム支持体に、粘着剤層を設け、該粘着剤層上にエ
チレン−酢酸ビニル共重合体樹脂、ニトロセルロース、
遮光性着色剤、可塑剤及び帯電防止剤を含む遮光性剥離
層を設けてなる。前記可塑性は外部可塑剤および/また
は内部可塑剤からなり、前記外部可塑剤は脂肪酸エステ
ル、エポキシ化油脂、エポキシ脂肪酸エステル、フタル
酸エステル系、アジペートエステル及びポリエステル系
であり、前記内部可塑剤は塩化ビニル樹脂、塩化ビ−酢
酸ビニル共重合体樹脂、塩化ビニリデン樹脂、スチレン
樹脂、スチレン化ビニル樹脂、クロルスルホン化樹脂、
ウレタン樹脂及びウレタンエラストマーであって、前記
外部可塑剤及び/または前記内部可塑剤の1種または2
種以上からなる。
[Means for Solving the Problems] The light-shielding masking film of the present invention is provided with an adhesive layer on a plastic film support, and an ethylene-vinyl acetate copolymer resin, nitrocellulose,
A light-shielding release layer containing a light-shielding colorant, a plasticizer, and an antistatic agent is provided. The plasticity comprises an external plasticizer and / or an internal plasticizer, and the external plasticizer is a fatty acid ester, an epoxidized oil, an epoxy fatty acid ester, a phthalate ester, an adipate ester, or a polyester. Vinyl resin, vinyl chloride-vinyl acetate copolymer resin, vinylidene chloride resin, styrene resin, styrenated vinyl resin, chlorosulfonated resin,
A urethane resin and a urethane elastomer, wherein one or two of the external plasticizer and / or the internal plasticizer
Consists of more than species.

本発明の遮光性マスキングフィルムは粘着剤層とよく
マッチした遮光性剥離層を設けたことにより、遮光性剥
離層をカッティングした時カッティングラインが開口す
ることなく完全に閉じた状態となり、更に不要被膜を剥
離する場合も途中切れる事なく連続被膜として剥離でき
るような強度を有する遮光性剥離層を設けたものであ
る。また帯電防止剤を含有させることにより摩擦帯電に
よる遮光性剥離層の作業中のゴミ、チリの付着防止及び
真空プリンタでの真空の引き及び静電気による吸着防止
効果を有するものである。
The light-shielding masking film of the present invention is provided with a light-shielding release layer that matches well with the pressure-sensitive adhesive layer, so that when the light-shielding release layer is cut, the cutting line is completely closed without opening, and further unnecessary coating is achieved. When light is peeled off, a light-shielding release layer having such a strength that it can be peeled off as a continuous film without being cut off is provided. The addition of an antistatic agent has the effect of preventing adhesion of dust and dust during the work of the light-shielding release layer due to triboelectric charging, and the effect of preventing vacuuming by a vacuum printer and adsorption by static electricity.

本発明につき、さらに詳しく説明する。本発明に於け
るプラスチックフィルム支持体は通常マスキングフィル
ム支持体に使用されるものであればよい。ポリエチレン
テレフタレート、ポリブチレンフタレート、ポリオキシ
ベンゾエート等のポリエステル類、ポリカーボネート、
塩ビフィルム等が使用可能であるが、特に伸縮の少ない
透明ポリエチレンテレフタレートフィルムが好適であ
る。フィルムの膜厚は25〜750μであるが特に50〜250μ
が適している。
The present invention will be described in more detail. The plastic film support in the present invention may be any one which is usually used for a masking film support. Polyesters such as polyethylene terephthalate, polybutylene phthalate, polyoxybenzoate, polycarbonate,
Although a polyvinyl chloride film or the like can be used, a transparent polyethylene terephthalate film having little expansion and contraction is particularly preferable. The thickness of the film is 25-750μ, especially 50-250μ
Is suitable.

プラスチックフィルム支持体上に設けられる粘着剤層
は合成樹脂系及びゴム系の粘着剤が使用可能である。合
成樹脂系としてはアクリル酸エステル共重合体、飽和ポ
リエステル共重合体、ポリウレタン等、ゴム系として
は、天然ゴム、クロロプレンゴム、ネオプレンゴム、ニ
トリルゴム、スチレン−イソプレンゴム等が使用可能で
ある。遮光性剥離層の成分であるエチレン−酢酸ビニル
共重合体樹脂、ニトロセルロースと接着性のよい天然ゴ
ムが好適に使用されうる。天然ゴムと他の合成樹脂及び
/又はゴムとの混合物も好適である。膜厚は0.2〜50μ
が使用可能である。膜厚0.2μ以下であると粘着性が維
持できず遮光性剥離層がカッティングで開口する恐れを
生じる。また、膜厚50μ以上であるとカッティング後不
要な遮光性剥離を剥離する場合、粘着剤層の糸引きの発
生あるいは切り口の粘着剤のはみ出しなどが生じ、写真
適性を損なう。膜厚として特に0.6〜5μが好適であ
る。
As the pressure-sensitive adhesive layer provided on the plastic film support, synthetic resin-based and rubber-based pressure-sensitive adhesives can be used. Acrylic ester copolymers, saturated polyester copolymers, polyurethanes and the like can be used as the synthetic resin system, and natural rubber, chloroprene rubber, neoprene rubber, nitrile rubber, styrene-isoprene rubber and the like can be used as the rubber system. Ethylene-vinyl acetate copolymer resin, which is a component of the light-shielding release layer, and natural rubber having good adhesion to nitrocellulose can be suitably used. Mixtures of natural rubber with other synthetic resins and / or rubbers are also suitable. The film thickness is 0.2-50μ
Can be used. When the film thickness is 0.2 μm or less, the adhesiveness cannot be maintained, and the light-shielding release layer may be opened by cutting. Further, when the film thickness is 50 μm or more, when unnecessary light-shielding peeling is peeled off after cutting, stringing of the pressure-sensitive adhesive layer or protrusion of the pressure-sensitive adhesive at the cut edge occurs, which impairs photographic suitability. The thickness is particularly preferably from 0.6 to 5 μm.

粘着剤層上に設けられる本発明の遮光性剥離層は、
(a)エチレン−酢酸ビニル共重合体樹脂、(b)ニト
ロセルロース、(c)遮光性着色剤、(d)可塑剤、
(e)帯電防止剤を含有する。
The light-shielding release layer of the present invention provided on the pressure-sensitive adhesive layer,
(A) ethylene-vinyl acetate copolymer resin, (b) nitrocellulose, (c) light-shielding colorant, (d) plasticizer,
(E) It contains an antistatic agent.

(a)エチレン−酢酸ビニル共重合体質(以下EVAと称
す)は酢酸含有量がエチレン量に対して10〜95wt%のも
のが使用可能であるが、特に20〜70wt%のものが好適で
ある。
(A) As the ethylene-vinyl acetate copolymer (hereinafter referred to as EVA), those having an acetic acid content of 10 to 95% by weight based on the amount of ethylene can be used, and those having an acetic acid content of 20 to 70% by weight are particularly preferable. .

(b)ニトロセルロースはEVAと相溶性があり、EVAと使
用することにより被膜強度の増加及びカッティング時の
被膜の閉じ方に影響を及ぼし、また粘着剤層との接着に
重要な役割を果す。ニトロセルロースは窒素含有量10.7
〜12.2wt%のものが使用可能であるがJISK6703−1964、
ASTMD301−72、ASTMD1343−74の規格に基いたニトロセ
ルロース溶液を使用し、乾燥試料ニトロセルロース12.2
wt%含有の粘度15〜20.0秒、乾燥試料ニトロセルロース
20.0wt%含有の粘度3.0〜9.0秒、乾燥試料ニトロセルロ
ース25.0wt%含有の粘度4.0〜12.2秒のニトロセルロー
ス溶液が好適に用いられる。
(B) Nitrocellulose is compatible with EVA, and when used with EVA, increases the strength of the coating and affects how the coating is closed during cutting, and plays an important role in adhesion to the adhesive layer. Nitrocellulose has a nitrogen content of 10.7
Up to 12.2 wt% can be used, but JISK6703-1964,
Using a nitrocellulose solution based on ASTMD301-72, ASTM D1343-74, dry sample nitrocellulose 12.2
Nitrocellulose with a viscosity of 15% to 20.0 seconds containing wt%, dried sample
A nitrocellulose solution having a viscosity of 3.0 to 9.0 seconds containing 20.0 wt% and a viscosity of 4.0 to 12.2 seconds containing 25.0 wt% of a dried sample nitrocellulose is preferably used.

(c)遮光性着色剤は通常使用されているもので良い
が、基本的には、対象となる感光性材料の感光波長域を
遮光すればよい。例えばジアゾ感光材料にたいしては黄
色、オルソ感光材料にたいしては橙色、但し多重露光を
考慮した場合には赤色が好ましい。また、パンクロマチ
ック感光材料にたいしては、通常の染料でなく、アルミ
ニュウムあるいはカーボンなどの顔料が好ましい。
(C) The light-shielding colorant may be a commonly used one, but basically, it is sufficient to shield the photosensitive wavelength region of the target photosensitive material from light. For example, yellow is preferred for a diazo photosensitive material, orange for an ortho photosensitive material, and red is preferred in consideration of multiple exposure. For panchromatic light-sensitive materials, pigments such as aluminum and carbon are preferable instead of ordinary dyes.

(d)可遮剤は外部可塑剤及び内部可塑剤からなり外部
可塑剤として具体的にはジブトキシエチルアジペート及
びトリオクチルトリメリテート等の脂肪酸エステル,エ
ポキシ化アマニ油及びエポキシ化大豆油等のエポキシ化
油脂,エポキシヘキサヒドロフタル酸−2−エチルヘキ
シル等のエポキシ脂肪酸エステル、ビス(2−エチルヘ
キシル)アジペート、ジブチルフタレート、ジオクチル
フタレート(ビス−2−エチルヘキシル)フタレート、
ジオクチルフチタレート及びビス(2−エチルヘキシ
ル)テレフタレート等のフタル酸エステル、DRAPEX411
(商品名、Witco、USA社製)、DRAPEX429(商品名、Wit
co、USA社製)及びDRAPEX P−1(商品名、Witco、USA
社製)及びDRAPEX409(商品名、Witco、USA社製)等の
ポリエステル系可塑剤である。特に好ましいものはジエ
チルフタレート、ジオクチルテレフタレート、ジオクチ
ルフタレート、DRAPEX409及びエポキシ化アマニ油であ
る。これらの可塑剤の1種または2種以上を使用する。
ジエチルフタレートとジオクチルフタレート及びジオク
チルフタレートとエポキシ化油との組合せが特に好まし
い。
(D) The shielding agent comprises an external plasticizer and an internal plasticizer. Specific examples of the external plasticizer include fatty acid esters such as dibutoxyethyl adipate and trioctyl trimellitate, epoxidized linseed oil, and epoxidized soybean oil. Epoxidized oils and fats, epoxy fatty acid esters such as epoxyhexahydrophthalic acid-2-ethylhexyl, bis (2-ethylhexyl) adipate, dibutyl phthalate, dioctyl phthalate (bis-2-ethylhexyl) phthalate,
Phthalates such as dioctyl phthalate and bis (2-ethylhexyl) terephthalate, DRAPEX411
(Trade name, Witco, USA), DRAPEX429 (trade name, Wit
co, USA) and DRAPEX P-1 (trade name, Witco, USA)
And DRAPEX409 (trade name, manufactured by Witco, USA). Particularly preferred are diethyl phthalate, dioctyl terephthalate, dioctyl phthalate, DRAPEX 409 and epoxidized linseed oil. One or more of these plasticizers are used.
Particular preference is given to combinations of diethyl phthalate with dioctyl phthalate and of dioctyl phthalate with epoxidized oils.

内部可塑剤は遮光性剥離層に弾性を持たせて被膜をカ
ッティングする時に発生する内部応力を減少させる目的
で添加するものであり、カッティング時の切り口の開き
を防止する効果を有する。この内部可塑剤としては塩化
ビニル樹脂、塩ビ−酢酸ビニル共重合体樹脂、塩化ビニ
リデン樹脂、スチレン樹脂、スチレン化ビニル樹脂、ク
ロルスルホン化樹脂、ウレタンゴム、ワックス類(ステ
アリン酸系、カルナウバワックス系、ビスアミド系)等
であり、これらのうち1種または2種添加する。
The internal plasticizer is added for the purpose of imparting elasticity to the light-shielding release layer to reduce internal stress generated when the coating is cut, and has an effect of preventing an opening at the time of cutting. Examples of the internal plasticizer include vinyl chloride resin, vinyl chloride-vinyl acetate copolymer resin, vinylidene chloride resin, styrene resin, styrenated vinyl resin, chlorosulfonated resin, urethane rubber, and waxes (stearic acid type, carnauba wax type). , Bisamides), and one or two of these are added.

(e)帯電防止剤は遮光性剥離層の静電気発生を防止す
るため添加されるものであり、遮光性剥離層の剥離時に
ゴミ、ホコリ付着を防止し写真性能向上を企るものであ
る。帯電防止剤はノニオン系、アニオン系、カオチン系
等が使用可能であるが、本発明には4級化アンモニウ
ム、アクリル樹脂(商品番号PQ50B、綜研化学社製)、
ポリオキシ−8−ステアレート(商品名MYRJ45、ICI Am
erica Inc.、社製)、ATOMER(商品名、ICI America IN
C.、社製)、Modifiede−N−アルキル−ジメチルアン
モニウム塩、N−アルキルジメチルベンジルアンモニウ
ム塩、N−アルキルジメチルエチルベンジルアンモニウ
ム塩(商品名、Staticide,ACL INC.、社製)等が特に好
適である。
(E) An antistatic agent is added to prevent the generation of static electricity in the light-shielding release layer, and prevents dust and dust from adhering when the light-shielding release layer is peeled off to improve photographic performance. As the antistatic agent, a nonionic, anionic, or chaotic agent can be used. In the present invention, a quaternary ammonium, an acrylic resin (product number PQ50B, manufactured by Soken Chemical Co., Ltd.),
Polyoxy-8-stearate (trade name: MYRJ45, ICI Am
erica Inc., ATOMER (brand name, ICI America IN)
C., Inc.), Modified-N-alkyl-dimethylammonium salt, N-alkyldimethylbenzylammonium salt, N-alkyldimethylethylbenzylammonium salt (trade name, Staticide, ACL INC., Inc.) and the like are particularly preferable. It is.

遮光性剥離層を成形するこれらの成分比は、通常
(a)エチレン−酢酸ビニル共重合体樹脂と(b)ニト
ロセルロースの重量比は(15:85)〜(85:15)であり、
好ましくは(30:70)〜(70:30)である。(c)遮光性
着色剤は(a)エチレン−酢酸ビニル共重合体樹脂及び
(b)ニトロセルロース樹脂固形分100重量部に対して
0.1〜50重量部、好ましくは3〜10重量部が適する。
(d)可塑剤は(a)エチレン−酢酸ビニル共重合体樹
脂及び(b)ニトロセルロース樹脂固形分100重量部に
対して0.1〜50重量部、好ましくは0.5〜25重量部の範囲
が適する。(e)帯電防止剤は(a)エチレン−酢酸ビ
ニル共重合体樹脂及び(b)ニトロセルロースの樹脂固
形分100重量部に対して0.01〜30重量部、好ましくは0.0
3〜10重量部が適する。
These component ratios for forming the light-shielding release layer are usually (a) an ethylene-vinyl acetate copolymer resin and (b) a nitrocellulose weight ratio of (15:85) to (85:15),
Preferably it is (30:70)-(70:30). (C) The light-shielding colorant is based on 100 parts by weight of (a) ethylene-vinyl acetate copolymer resin and (b) nitrocellulose resin solid content.
0.1 to 50 parts by weight, preferably 3 to 10 parts by weight are suitable.
The plasticizer (d) is used in an amount of 0.1 to 50 parts by weight, preferably 0.5 to 25 parts by weight, per 100 parts by weight of the solid content of the (a) ethylene-vinyl acetate copolymer resin and (b) the nitrocellulose resin. (E) The antistatic agent is 0.01 to 30 parts by weight, preferably 0.03 parts by weight, based on 100 parts by weight of the resin solid content of (a) the ethylene-vinyl acetate copolymer resin and (b) nitrocellulose.
3 to 10 parts by weight are suitable.

[実施例] 本発明の実施例を以下に説明する。[Example] An example of the present invention will be described below.

粘着剤を成形するため表1に示す成分を混合し、粘着
剤塗布液1及び2を作製した。
The components shown in Table 1 were mixed to form the pressure-sensitive adhesive, and pressure-sensitive adhesive coating solutions 1 and 2 were prepared.

遮光性剥離層を成形するため表2に示す成分を混合
し、遮光性剥離層塗布液1、2及び3を作成した。
The components shown in Table 2 were mixed to form a light-shielding release layer, and coating solutions 1, 2 and 3 for light-shielding release layers were prepared.

以下のような粘着剤塗布液及び遮光剥離層塗布液を用
いて本発明の遮光性マスキングフィルムは以下のように
して作成し、表3に示すような結果を得た。
The light-shielding masking film of the present invention was prepared as described below using the following pressure-sensitive adhesive coating liquid and light-shielding release layer coating liquid, and the results shown in Table 3 were obtained.

(A)ポリエチレンテレフタレートフィルム膜厚100μ
上に粘着剤塗布液1の溶解液を、メイヤーバーにて塗布
し、100℃1分乾燥し、粘着剤層を得た。更にこの粘着
剤層上に、遮光性剥離塗布液1の溶解液を、塗布し120
℃6分乾燥し遮光性剥離層膜厚32μを得た。結果を表3
に示す。
(A) Polyethylene terephthalate film thickness 100μ
A solution of the pressure-sensitive adhesive coating solution 1 was applied thereon with a Meyer bar, and dried at 100 ° C. for 1 minute to obtain a pressure-sensitive adhesive layer. Further, a solution of the light-shielding release coating solution 1 is applied on the adhesive layer.
After drying at 6 ° C. for 6 minutes, a light-shielding release layer thickness of 32 μm was obtained. Table 3 shows the results
Shown in

(B)ポリエチレンテレフタレートフィルム125μ上に
粘着剤塗布液2の溶解液を、メイヤーバーにて塗布し、
100℃1分乾燥し、粘着剤層を得た。更にこの粘着剤層
上に、(A)と、同様に遮光性剥離塗層塗布液1の溶解
液を塗布し120℃6分乾燥し膜厚35μの遮光性剥離層を
得た。結果を表3に示す。
(B) A solution of the pressure-sensitive adhesive coating solution 2 is applied on a polyethylene terephthalate film 125μ with a Mayer bar,
After drying at 100 ° C. for 1 minute, an adhesive layer was obtained. Further, a solution of the light-shielding release coating layer coating solution 1 was applied to the pressure-sensitive adhesive layer in the same manner as in (A), and dried at 120 ° C. for 6 minutes to obtain a light-shielding release layer having a thickness of 35 μm. Table 3 shows the results.

(C)ポリエチレンテレフタレートフィルム膜厚75μ上
に粘着剤層塗布液1の溶解液を、メイヤーバーにて塗布
し、100℃1分乾燥し粘着剤層膜厚2μを得た。更にこ
の粘着剤層上に、遮光性剥離層塗布液2の溶解液を塗布
し、120℃6分乾燥し膜厚30μの遮光性剥離層を得た。
結果を表3に示す。
(C) A solution of the pressure-sensitive adhesive layer coating solution 1 was applied on a polyethylene terephthalate film having a thickness of 75 µm with a Mayer bar, and dried at 100 ° C for 1 minute to obtain a pressure-sensitive adhesive layer thickness of 2 µm. Further, a solution of the light-shielding release layer coating solution 2 was applied on the pressure-sensitive adhesive layer, and dried at 120 ° C. for 6 minutes to obtain a light-shielding release layer having a thickness of 30 μm.
Table 3 shows the results.

(D)ポリエチレンテレフタレートフィルム膜厚188μ
上に粘着剤層塗布液2の溶解液を、メイヤーバーにて塗
布し、100℃1分乾燥し粘着剤層膜厚1.0μを得た。更に
この粘着剤層上に遮光性剥離層塗布液2の溶解液をリバ
ースコータで塗布し120℃6分乾燥し膜厚40μの遮光性
剥離層を得た。結果を表3に示す。
(D) Polyethylene terephthalate film thickness 188μ
A solution of the pressure-sensitive adhesive layer coating solution 2 was applied thereon with a Meyer bar, and dried at 100 ° C. for 1 minute to obtain a pressure-sensitive adhesive layer thickness of 1.0 μm. Further, a solution of the light-shielding release layer coating solution 2 was applied on the adhesive layer with a reverse coater and dried at 120 ° C. for 6 minutes to obtain a light-shielding release layer having a thickness of 40 μm. Table 3 shows the results.

(E)ポリエチレンテレフタレートフィルム膜厚100μ
上に粘着剤層塗布液1の溶解液を、メイヤーバーにて塗
布し、100℃1分乾燥し粘着剤層約厚1μを得た。更に
この粘着剤層上に遮光性剥離層塗布液3の溶解液を塗布
し120℃6分乾燥し膜厚35μの遮光性剥離層を得た。結
果を表3に示す。
(E) Polyethylene terephthalate film thickness 100μ
A solution of the pressure-sensitive adhesive layer coating solution 1 was applied thereon with a Meyer bar, and dried at 100 ° C. for 1 minute to obtain a pressure-sensitive adhesive layer having a thickness of about 1 μm. Further, a solution of the light-shielding release layer coating solution 3 was applied on the adhesive layer and dried at 120 ° C. for 6 minutes to obtain a light-shielding release layer having a thickness of 35 μm. Table 3 shows the results.

(F)ポリエチレンテレフタレートフィルム膜厚100μ
上に粘着剤層塗布液2の溶解液を、メイヤーバーにて塗
布し、100℃1分乾燥し粘着剤層膜厚0.5μを得た。更に
この粘着剤層上に遮光性剥離層塗布液3の溶解液を塗布
し膜厚35μの遮光性剥離層を得た。結果を表3に示す。
(F) Polyethylene terephthalate film thickness 100μ
The solution of the pressure-sensitive adhesive layer coating liquid 2 was applied thereon with a Meyer bar, and dried at 100 ° C. for 1 minute to obtain a pressure-sensitive adhesive layer thickness of 0.5 μm. Further, a solution of the light-shielding release layer coating solution 3 was applied onto the pressure-sensitive adhesive layer to obtain a light-shielding release layer having a thickness of 35 μm. Table 3 shows the results.

(G)<比較例>ポリエチレンテレフタレートフィルム
上に粘着剤層を、介せず直接、遮光性剥離塗布液処方、
3の溶解液を塗布し120℃6分乾燥し膜厚35μの遮光性
剥離層を得た。結果を表3に示す。
(G) <Comparative Example> A light-shielding release coating solution formulation directly on a polyethylene terephthalate film without an adhesive layer interposed therebetween,
The solution of No. 3 was applied and dried at 120 ° C. for 6 minutes to obtain a light-shielding release layer having a thickness of 35 μm. Table 3 shows the results.

以上の結果より粘着剤層を介して遮光性剥離性を設け
た本発明の遮光性マスキングフィルムは接着強度も良好
であり、自動図化装置(WTID TA 30)でカッティングす
る際もプロッター荷重も軽く、プロッターの加速度に基
く慣性力によるオーバーラン部分の引きつれも解消され
た。また切り口の開きも無くカッティングラインは経時
後も閉じていた。さらに遮光性剥離層の剥離作業時間も
遮光性剥離層のピックアップ性及び剥離性が良好で連続
被膜として剥離可能であった。加えて通常の写真作業に
基く返し作業に於いても摩擦帯電によるゴミ、ホコリ等
の付着がなく、焼き付け時のプリンターでの真空の引き
も良く、露光後のプリンターからの取り除きも非常にし
やすくなった。
From the above results, the light-shielding masking film of the present invention provided with the light-shielding release property via the pressure-sensitive adhesive layer has a good adhesive strength and a light plotter load even when cutting with an automatic plotter (WTID TA 30). Also, the pulling of the overrun due to the inertial force based on the acceleration of the plotter has been eliminated. Also, there was no opening in the cut, and the cutting line was closed after a lapse of time. In addition, the light-shielding release layer was peeled off as a continuous film because the light-shielding release layer had good pick-up and release properties. In addition, there is no adhesion of dust, dust, etc. due to triboelectric charging even in the reversing work based on normal photographic work, the vacuum in the printer at the time of printing is good, and it is very easy to remove from the printer after exposure. Was.

[発明の効果] 以上の説明のように本発明の遮光性マスキングフィル
ムは自動図化装置によりカッティングを行ってもカッテ
ィングラインが開口することなく、剥離作業も連続被膜
として剥離可能なため、短時間で処理が行われるように
なり効率がよくなると共にフィルムを損傷するこなく、
さらに剥離時に付着するゴミ、ホコリ等も防止可能なた
め、写真性も非常に向上できた。
[Effects of the Invention] As described above, the light-shielding masking film of the present invention can be peeled off as a continuous film without the opening of the cutting line even when the cutting is performed by the automatic plotter, so that it can be peeled off in a short time. The processing is performed, and the efficiency is improved and the film is not damaged,
Further, since dust, dust and the like adhering at the time of peeling can be prevented, photographic properties can be greatly improved.

フロントページの続き (72)発明者 甲田 修二 埼玉県与野市鈴谷4丁目6番35号 株式 会社きもと中央研究所内 (56)参考文献 特開 昭54−104902(JP,A) 特開 昭60−159853(JP,A) 特開 昭61−143758(JP,A) 特開 昭58−108537(JP,A) (58)調査した分野(Int.Cl.6,DB名) G03F 1/00 - 1/06Continuation of front page (72) Inventor Shuji Koda 4-6-35 Suzuya, Yono-shi, Saitama Pref. Kimoto Central Research Laboratory Co., Ltd. (56) References JP-A-54-104902 (JP, A) JP-A-60-159854 (JP, A) JP-A-61-143758 (JP, A) JP-A-58-108537 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) G03F 1/00-1 / 06

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】プラスチックフィルム支持体に、粘着剤層
を設け、該粘着剤層上にエチレン−酢酸ビニル共重合体
樹脂、ニトロセルロース、遮光性着色剤、可塑剤及び帯
電防止剤を含む遮光性剥離層を設けてなることを特徴と
する遮光性マスキングフィルム。
An adhesive layer is provided on a plastic film support, and a light-shielding layer containing an ethylene-vinyl acetate copolymer resin, nitrocellulose, a light-shielding colorant, a plasticizer and an antistatic agent is provided on the adhesive layer. A light-shielding masking film comprising a release layer.
【請求項2】前記エチレン−酢酸ビニル共重合体樹脂及
びニトロセルロースは、重量比で85:15〜15:85の範囲で
あることを特徴とする請求項1記載の遮光性マスキング
フィルム。
2. The light-shielding masking film according to claim 1, wherein the weight ratio of the ethylene-vinyl acetate copolymer resin and nitrocellulose is in the range of 85:15 to 15:85.
【請求項3】前記可塑剤は、前記エチレン−酢酸ビニル
共重合体樹脂及びニトロセルロースの樹脂固形分100重
量部に対し、0.1〜50重量部含有されることを特徴とす
る請求項1又は2記載の遮光性マスキングフィルム。
3. The method according to claim 1, wherein the plasticizer is contained in an amount of 0.1 to 50 parts by weight based on 100 parts by weight of the resin solid content of the ethylene-vinyl acetate copolymer resin and nitrocellulose. The light-shielding masking film according to the above.
【請求項4】前記可塑剤は、外部可塑剤および/または
内部可塑剤からなり、前記外部可塑剤は脂肪酸エステ
ル、エポキシ化油脂、エポキシ脂肪酸エステル、フタル
酸エステル系、アジペートエステルおよびポリエステル
系から選ばれる1種又は2種以上であり、前記内部可塑
剤は塩化ビニル樹脂、塩化ビニル−酢酸ビニル共重合体
樹脂、塩化ビニリデン樹脂、スチレン樹脂、スチレン化
ビニル樹脂、クロルスルホン化樹脂、ウレタン樹脂及び
ウレタンエラストマーから選ばれる1種又は2種以上で
ある請求項1ないし3項記載の遮光性マスキングフィル
ム。
4. The plasticizer comprises an external plasticizer and / or an internal plasticizer, and the external plasticizer is selected from fatty acid esters, epoxidized oils and fats, epoxy fatty acid esters, phthalic acid esters, adipate esters and polyesters. One or more kinds of the internal plasticizers, wherein the internal plasticizer is a vinyl chloride resin, a vinyl chloride-vinyl acetate copolymer resin, a vinylidene chloride resin, a styrene resin, a styrenated vinyl resin, a chlorosulfonated resin, a urethane resin, and a urethane resin. 4. The light-shielding masking film according to claim 1, which is at least one member selected from elastomers.
JP1009451A 1989-01-18 1989-01-18 Shading masking film Expired - Lifetime JP2866386B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1009451A JP2866386B2 (en) 1989-01-18 1989-01-18 Shading masking film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1009451A JP2866386B2 (en) 1989-01-18 1989-01-18 Shading masking film

Publications (2)

Publication Number Publication Date
JPH02188755A JPH02188755A (en) 1990-07-24
JP2866386B2 true JP2866386B2 (en) 1999-03-08

Family

ID=11720656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1009451A Expired - Lifetime JP2866386B2 (en) 1989-01-18 1989-01-18 Shading masking film

Country Status (1)

Country Link
JP (1) JP2866386B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4827282B2 (en) * 2000-07-31 2011-11-30 日立化成ポリマー株式会社 Release agent composition and release material

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846011B2 (en) * 1978-02-01 1983-10-13 ダイセル化学工業株式会社 Light-shielding masking film
JPS58108537A (en) * 1981-12-22 1983-06-28 Daicel Chem Ind Ltd Light shading masking film
JPS60159853A (en) * 1984-01-31 1985-08-21 Rokuou Shoji Kk Light shielding masking film
JPS61143758A (en) * 1984-12-17 1986-07-01 Kimoto & Co Ltd Light interrupting masking film

Also Published As

Publication number Publication date
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