JP2018168405A - Electrolytic device and electrolysis method using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To perform an electrolytic treatment by suppressing the winding up of an electrolytic cell while increasing the amount of an electrolytic solution supplied by a simple structure which does not require a dedicated device or the like, and making the concentration of the electrolytic solution uniform in the electrolytic cell. Do. SOLUTION: This is an electrolytic device in which an electrolytic solution is supplied from one end side in the longitudinal direction in an electrolytic cell provided with an electrode plate by an electrolytic solution supply unit, and the electrolytic solution is discharged from the other end side in the longitudinal direction in the electrolytic cell. Therefore, the electrode plates are provided so that a plurality of anode plates and a plurality of cathode plates are alternately provided at intervals in the plate thickness direction, and the lower end of the electrode plates is provided at a predetermined interval from the bottom surface of the electrolytic cell. It is suspended in an electrolytic cell, and the electrolytic solution supply port of the electrolytic solution supply unit is provided at a depth position of up to ± 100 mm with respect to the depth position of the lower end of the electrode plate. Electrolytic device. [Selection diagram] Fig. 1

Description

  The present invention relates to an electrolysis apparatus and an electrolysis method using the same.

  In the conventional electrolyzer, the electrolyte is supplied from the lower part of one end in the longitudinal direction of the electrolytic cell, and the electrolytic solution is supplied and discharged, which is called a bottom-up / upper discharge method, drained from the upper part of the other end of the electrolytic cell. It has been broken. Maintaining a uniform liquid composition and additive concentration in the electrolytic cell is an important technique for improving the quality or electrolytic performance, for example, in the purification of electrolytic copper, and various methods have been studied so far. .

  For example, Patent Document 1 proposes a method of supplying an electrolytic solution from an upper part and a lower part. Patent Document 2 proposes a method in which an electrolytic solution is supplied from the upper part of one end in the longitudinal direction of the electrolytic cell toward the side surface and discharged from the lower part of the other end. As completely different methods, Patent Document 3 and Patent Document 4 propose a method of supplying an electrolytic solution from the bottom of the electrolytic cell or from the side of the electrolytic cell.

JP 2007-204779 A JP2015-209550A JP 2014-189851 A Japanese Patent No. 5227404

  In electrolysis, increasing the amount of electrolyte supplied is important for making the electrolyte composition uniform and increasing the current density. However, as disclosed in Patent Document 1, when the electrolyte solution is supplied from the upper part and the lower part in order to make the electrolyte composition and additive concentration uniform, the amount of electrolyte supplied is increased, and the electrolyte is deposited at the bottom of the electrolytic cell. There is a risk that the porcelain (anode slime) will be rolled up, and the quality of the product may be deteriorated due to contamination of a refined product (eg, product copper) or a bump.

  Further, in Patent Document 2, since 3 to 5% of the amount of electrolyte supplied is supplied from above, when the amount of supplied liquid is increased, winding up of the electrolytic material occurs as in Patent Document 1.

  Moreover, in patent document 3, when electrolysis progresses, the density nonuniformity by a specific gravity difference of a liquid will arise in an electrolytic cell. Specifically, for example, in electrolytic refining of electrolytic copper, the lower the electrolytic cell, the lower the copper concentration and the higher the specific gravity, the lower the copper concentration in the electrolytic solution. Since the supplied electrolyte has a lower copper concentration and a lower specific gravity than the electrolyte in the lower part of the electrolytic cell, the newly supplied electrolyte does not reach the lower part of the electrode particularly on the liquid supply side.

  Moreover, in patent document 4, it is necessary to install piping and an exclusive device in an electrolytic vessel, and if the piping and device scale, it will not be supplied with liquid.

  Therefore, the present invention has a simple structure that does not require a dedicated device or the like, while suppressing the hoisting of the electrolytic deposit while increasing the amount of supply of the electrolytic solution, and makes the concentration of the electrolytic solution in the electrolytic cell uniform. It is an object of the present invention to provide an electrolytic apparatus capable of performing an electrolytic treatment and an electrolytic method using the same.

  As a result of intensive studies to solve the above problems, the inventor of the present invention can easily eliminate the need for a dedicated device or the like by controlling the position of the liquid supply port of the electrolytic solution supply unit for supplying the electrolytic solution to the electrolytic cell. The present inventors have found that the electrolytic treatment can be performed by increasing the amount of electrolyte supplied while suppressing the winding of the electrolyte and making the concentration of the electrolyte in the electrolytic cell uniform.

  The present invention completed on the basis of the above knowledge, in one aspect, the electrolyte solution is supplied from one end side in the longitudinal direction in the electrolytic cell provided with the electrode plate by the electrolytic solution supply unit, and the longitudinal direction in the electrolytic cell is An electrolytic apparatus for discharging the electrolytic solution from the other end side, wherein the electrode plate is provided with a plurality of anode plates and a plurality of cathode plates alternately spaced in the plate thickness direction, and the electrode The lower end of the plate is suspended in the electrolytic cell so that a predetermined interval is spaced from the bottom surface of the electrolytic cell, and the electrolytic solution supply port of the electrolytic solution supply unit is at a depth position at the lower end of the electrode plate. In contrast, the electrolysis apparatus is provided at a depth of up to ± 100 mm.

  In one embodiment of the electrolytic apparatus of the present invention, the supply flow rate of the electrolytic solution by the electrolytic solution supply unit in the electrolytic cell is 30 to 90 L / min.

  In another embodiment of the electrolytic device of the present invention, a plurality of electrolytic solution supply ports of the electrolytic solution supply unit are provided at intervals in the depth direction of the electrolytic cell, and the plurality of electrolytic solution supplies Among the mouths, the electrolyte supply port provided at the deepest position is provided at a depth position of ± 100 mm with respect to the depth position of the lower end of the electrode plate.

  In yet another embodiment of the electrolysis apparatus of the present invention, the plurality of electrolyte solution supply ports of the electrolyte solution supply unit are provided in directions in which the electrolyte solution is supplied to both sides of the electrode plate, respectively.

  In still another embodiment of the electrolysis apparatus of the present invention, the liquid temperature in the vicinity of the lower end of the electrode plate in the electrolytic cell is controlled to 60 ° C. or higher.

  In another aspect of the present invention, there is provided an electrolysis method characterized in that a metal is electrodeposited on the plurality of cathode plates by electrolyzing the electrolytic solution using the electrolytic device of the present invention.

  According to the present invention, with a simple structure that does not require a dedicated device or the like, it is possible to suppress the hoisting of the electrolytic product while increasing the amount of supply of the electrolytic solution, and to make the concentration of the electrolytic solution in the electrolytic cell uniform. An electrolysis apparatus capable of performing electrolysis treatment and an electrolysis method using the same can be provided.

(A) is a schematic diagram of the electrolyzer shown in one Embodiment of this invention. (B) is a schematic diagram of a conventional electrolytic cell. It is a Nernst diffusion layer model diagram. It is a graph which shows the relationship of the time-Ni density | concentration ratio measured on the drainage side of Example 1, the middle, and the liquid supply side, respectively. It is a graph which shows the relationship of the time-Ni density | concentration ratio each measured in the drainage side of Example 2, the middle, and the liquid supply side. It is a graph which shows the relationship of the time-Ni density | concentration ratio each measured by the drainage side of the comparative example 1, the middle, and the liquid supply side. It is a graph which shows the relationship of the time-Ni density | concentration ratio measured by the drainage side of the comparative example 2, the middle, and the liquid supply side, respectively.

[Electrolysis equipment]
FIG. 1A is a schematic diagram of an electrolysis apparatus shown in one embodiment of the present invention. FIG. 1B is a schematic diagram of a conventional electrolytic cell.
An electrolysis apparatus shown in an embodiment of the present invention supplies an electrolytic solution from one end side in a longitudinal direction in a rectangular parallelepiped electrolytic cell provided with an electrode plate by an electrolytic solution supply unit. The electrolyte is discharged from the electrolyte outlet on the end side. As an example of the size of the electrolytic cell, the length (distance in the longitudinal direction) of the rectangular parallelepiped electrolytic cell is 5200 to 5900 mm, the width is 1095 to 1111 mm, and the depth is 1275 to 1510 mm.

  The electrode plate is provided with a plurality of anode plates and a plurality of cathode plates alternately spaced in the thickness direction, and the lower end of the electrode plate is spaced from the bottom surface of the electrolytic cell by a predetermined distance. It is suspended inside and immersed in the electrolyte stored in the electrolytic cell. The lower end of the electrode plate can be provided from the bottom surface of the electrolytic cell so that a gap of 140 to 370 mm is provided, for example.

  The configurations of the electrolytic cell and the electrode plate are not particularly limited. The anode plate serves as an anode when performing electric smelting, and is made of a crude metal plate. For example, when refining crude copper, the anode plate can be made of a crude copper plate having a purity of about 99 mass%. The cathode plate serves as a cathode when performing electric smelting and is made of a plate-like metal having excellent conductivity, such as a copper plate having a purity of about 99.99 mass%.

  The electrolytic solution stored in the electrolytic cell is an acidic aqueous solution containing a metal to be purified, and may contain an additive for smoothing the surface of the metal electrodeposited on the cathode plate surface. When electrolytically refining copper, an electrolytic solution obtained by mixing an aqueous solution of copper sulfate and sulfuric acid with an additive such as glue or thiourea can be used.

  An electrolytic solution discharge port is formed at the upper part of the other end on the side opposite to the one end side where the electrolytic solution supply port of the electrolytic cell is provided. The electrolytic solution supplied from the electrolytic solution supply port of the electrolytic solution supply unit proceeds through the electrolytic bath, overflows from the vicinity of the electrolytic solution level, and is discharged from the electrolytic solution discharge port.

  The electrolyzer is provided with a not-shown electrolyte reflux mechanism. The reflux mechanism adds additives such as glue and thiourea to the electrolytic solution discharged from the electrolytic solution outlet of the electrolytic cell, and performs necessary component adjustment and temperature adjustment. In the electrolytic solution reflux mechanism, the electrolytic solution inflow side is connected to the electrolytic solution discharge port of the electrolytic cell, and the electrolytic solution outflow side is connected to the electrolytic solution supply port of the electrolytic solution supply unit of the electrolytic cell.

  The electrolysis apparatus is provided with a power supply mechanism (not shown). The power supply mechanism includes a power supply device that applies a direct current between an anode plate and a cathode plate, and wiring.

  The electrolyte solution supply port of the electrolyte solution supply unit is provided at a depth position up to ± 100 mm with respect to the depth position of the lower end of the electrode plate. That is, the electrolytic solution supply port of the electrolytic solution supply unit is provided at a depth position between a position of 100 mm upward and a position of 100 mm downward with respect to the depth position of the lower end of the electrode plate. When the supply amount of the electrolytic solution is large, the flow of the electrolytic solution in the vicinity of the electrode plate is accelerated, and the thickness of the diffusion layer in the vicinity of the electrode plate is reduced. Thus, by thinning the diffusion layer, the electrolysis current can be increased to speed up the reaction (high current density). However, the conventional electrolyzer as shown in FIG. 1 (B) is provided with the electrolyte supply port of the electrolyte supply unit at the bottom of the electrolytic cell, so if the amount of electrolyte supplied is large, There is a possibility that a problem will arise in carrying out a good electrolytic treatment by rolling up the temple and mixing impurities in the electrolytic solution of the electrolytic cell. On the other hand, in the present invention, as described above, the electrolyte supply port of the electrolyte supply unit is provided at a depth position up to ± 100 mm with respect to the depth position of the lower end of the electrode plate. Even if the amount is increased, the bottom of the electrolytic cell is not rolled up, and the concentration of the electrolytic solution in the electrolytic cell can be made uniform to perform good electrolytic treatment. Further, a special dedicated device or the like for supplying the electrolytic solution at that time becomes unnecessary, and an electrolytic apparatus having a simple structure can be obtained. In addition, the electrolyte supply port of the electrolyte supply unit is preferably provided at a position 40 mm or more away from the bottom of the electrolytic cell in the height direction in order to satisfactorily suppress the winding of the bottom of the electrolytic cell.

The “diffusion layer” is a layer in the immediate vicinity of the electrode, which is often represented by the Nernst diffusion layer model shown in FIG. The thickness of the diffusion layer is defined as the distance from the electrode plate surface until the reaction component concentration reaches the bulk concentration (constant concentration).
At the cathode (the side on which copper is electrodeposited), the copper in the electrolyte is reduced and deposited as metallic copper. However, when the diffusion layer is thick, the supply of ions to the cathode surface cannot catch up, so that no matter how much the current is increased, the deposition rate reaches its peak and the reaction cannot be accelerated.

  The electrolyte supply port of the electrolyte supply unit is preferably provided at a depth position up to ± 80 mm with respect to the depth position of the lower end of the electrode plate, and is provided at a depth position up to ± 50 mm. Is more preferable.

  It is preferable that the supply flow rate of the electrolytic solution by the electrolytic solution supply unit in the electrolytic cell is 30 to 90 L / min. If the electrolyte supply flow rate is less than 30 L / min, the electrodeposition amount of metal onto the electrode plate may be insufficient, and if the electrolyte supply flow rate exceeds 90 L / min, the problem of winding up the rod on the anode surface arises. There is a fear. The supply flow rate of the electrolytic solution from the electrolytic solution supply unit in the electrolytic cell is more preferably 40 to 80 L / min, and even more preferably 50 to 80 L / min.

  A plurality of electrolyte solution supply ports of the electrolyte solution supply unit are provided at intervals in the depth direction of the electrolytic cell, and the electrolyte solution supply port provided at the deepest position among the plurality of electrolyte solution supply ports Is preferably provided at a depth position of ± 100 mm with respect to the depth position of the lower end of the electrode plate. According to such a configuration, the electrolytic solution can be supplied to the electrolytic cell from the plurality of electrolytic solution supply ports, so that the concentration of the electrolytic solution flowing in the electrolytic cell is made more uniform.

  It is preferable that the plurality of electrolyte solution supply ports of the electrolyte solution supply unit are respectively provided in a direction in which the electrolyte solution is supplied to both sides of the electrode plate. According to such a configuration, it is possible to induce the flow of the electrolytic solution that can be expected to wrap around the electrolytic solution from both sides of the electrode plate (that is, from the outside of the electrode plate (electrolyzer wall side)). . For this reason, the density | concentration of the electrolyte solution which flows through the inside of an electrolytic vessel is made more uniform.

[Electrolysis method]
A plurality of cathode plates can be electrodeposited with metal by electrolyzing the electrolytic solution using the electrolytic apparatus of the present invention. As an example of electrolyzing an electrolytic solution using the electrolytic apparatus of the present invention, a case of refining crude copper will be described.
First, for example, a thick copper plate having a purity of about 99 mass% is used as an anode plate, a copper thin plate material having a purity of about 99.99 mass% or a stainless plate is used as a cathode plate, and a plurality of anode plates and a plurality of cathode plates are alternately arranged. The electrode plate is suspended in the electrolytic cell so that the lower end of the electrode plate is spaced from the bottom surface of the electrolytic cell by a predetermined distance.

  Next, fill the electrolytic bath with an electrolytic solution containing additives such as glue and thiourea to the mixed aqueous solution of copper sulfate and sulfuric acid from the electrolytic solution supply port of the electrolytic solution supply unit, and fill the electrode plate. Immerse in the electrolyte stored in the tank.

  Next, the reflux mechanism is operated, the electrolytic solution is circulated, and a direct current is applied between the anode plate and the cathode plate from the feeding mechanism, so that the copper of the anode plate is eluted into the electrolytic solution as ions, and the cathode plate To electrodeposit. At this time, it is preferable to control the liquid temperature in the vicinity of the lower end of the electrode plate in the electrolytic cell to 60 ° C. or higher. Thus, a favorable electrodeposition state is obtained by controlling the liquid temperature in the vicinity of the lower end portion of the electrode plate to 60 ° C. or higher. The liquid temperature in the vicinity of the lower end portion of the electrode plate in the electrolytic cell may be controlled to 60 to 70 ° C or may be controlled to 65 to 70 ° C. The liquid temperature in the vicinity of the lower end of the electrode plate in the electrolytic cell is such that the temperature of the electrolytic solution supplied from the electrolytic solution supply port of the electrolytic solution supply unit is 60 ° C. or higher, and the liquid temperature of the electrolytic solution in the electrolytic cell is By controlling and adjusting the temperature, it can be maintained at 60 ° C. or higher.

  The electrolytic solution used for electrolysis overflows from the vicinity of the liquid surface and is discharged from the electrolytic solution discharge port. The electrolyte discharged from the electrolyte discharge port enters the reflux mechanism. Thereafter, if necessary, an additive is added to the electrolytic solution, and after adjusting necessary components and temperature, the electrolytic solution is supplied again from the electrolytic solution supply port of the electrolytic solution supply unit into the electrolytic cell.

  In such an electrolysis method of the present invention, the electrolyte solution supply port of the electrolyte solution supply unit is provided at a depth position of ± 100 mm with respect to the depth position of the lower end of the electrode plate. For this reason, even if the supply amount of the electrolytic solution is increased, the bottom of the electrolytic cell is not rolled up, and the concentration of the electrolytic solution in the electrolytic cell can be made uniform to perform good electrolytic treatment. Further, a special dedicated device or the like for supplying the electrolytic solution at that time becomes unnecessary, and an electrolytic apparatus having a simple structure can be obtained.

Examples of the present invention will be described below, but the examples are for illustrative purposes and are not intended to limit the invention.
As Examples 1 and 2 and Comparative Examples 1 and 2, a transparent electrolytic cell having the following configuration was prepared, and while raising the amount of electrolyte supplied, curling up the electrolytic deposit was suppressed, and the inside of the electrolytic cell It was investigated whether or not the electrolytic treatment can be carried out by making the concentration of the electrolyte solution uniform.

Example 1
An electrolyzer as shown in FIG. 1A was prepared. The electrolytic cell was made of a transparent material so that the color of the internal electrolyte could be distinguished. In the electrolysis apparatus of Example 1, an electrolyte solution is supplied from one end side in a longitudinal direction in a rectangular parallelepiped electrolytic cell provided with an electrode plate, and electrolysis is performed on the other end side in the longitudinal direction in the electrolytic cell. The electrolyte is discharged from the liquid outlet. The size of the electrolytic cell was 1/10 of the scale of the actual machine, and the length (distance in the longitudinal direction) of the rectangular parallelepiped electrolytic cell was 620 mm, the width was 110 mm, and the depth was 150 to 170 mm.

  The electrode plate is provided with a plurality of anode plates and a plurality of cathode plates alternately spaced in the thickness direction, and the lower end of the electrode plate is spaced from the bottom surface of the electrolytic cell by a predetermined distance. It is suspended inside and immersed in the electrolyte stored in the electrolytic cell. The lower end of the electrode plate was provided so as to have a space of 30 to 50 mm from the bottom surface of the electrolytic cell.

  The anode plate was a copper plate having a purity of about 99.99 mass%, and the cathode plate was a stainless plate having a thickness of 2 mm.

  An electrolytic solution discharge port was provided at the upper part of the other end on the side opposite to the one end side where the electrolytic solution supply port of the electrolytic cell was provided. The electrolytic solution supplied from the electrolytic solution supply port of the electrolytic solution supply unit proceeds through the electrolytic bath, overflows from the vicinity of the electrolytic solution level, and is discharged from the electrolytic solution discharge port. The electrolysis apparatus was provided with a reflux mechanism and a power feeding mechanism.

  The electrolyte supply port of the electrolyte supply unit was provided at a position 10 mm higher than the depth position of the lower end of the electrode plate (100 mm in terms of actual machine). Further, a PVC pipe having a pipe diameter of 10 mmφ was used as the electrolyte supply path of the electrolyte supply section, and the diameter of the electrolyte supply port was 3 mmφ.

  As an electrolytic solution, a mixed aqueous solution of copper sulfate and sulfuric acid colored with methyl orange was used. The purpose of this example is to conduct a test for confirming the mixed state of the liquid in the electrolytic cell. Ni is dissolved as a tracer in the electrolytic solution, and the mixed state of the liquid is evaluated by confirming the Ni concentration in the liquid.

  The reflux mechanism was operated and the electrolyte was circulated. The supply flow rate of the electrolytic solution from the electrolytic solution supply unit in the electrolytic cell was 150 mL / min (88 L / min in terms of actual machine). Further, the liquid temperature in the vicinity of the lower end portion of the electrode plate in the electrolytic cell was controlled to 60 ° C. or higher. The electrolytic solution used for electrolysis overflowed from the vicinity of the liquid surface and was discharged from the electrolytic solution discharge port. Here, the supply flow rate of the electrolytic solution by the electrolytic solution supply unit in the electrolytic bath is a numerical value adjusted so as to be “the supply flow rate of the electrolytic solution = the amount of electrolytic solution in the electrolytic bath / the liquid residence time in the electrolytic bath”. . In addition, the actual machine conversion is based on the formula of "the actual electrolyte supply flow rate = the actual electrolyte supply amount in the electrolytic cell x the supply flow rate of the electrolyte used in the example / the electrolytic solution amount used in the example". Can be calculated.

Thereafter, for each elapsed time, the electrolytic solution in the electrolytic cell was sampled and the Ni concentration ratio (%) was measured. The Ni concentration ratio indicates the ratio of the Ni concentration of the electrolytic solution in the electrolytic cell after the start of supplying the electrolytic solution to the Ni concentration of the supplied electrolytic solution. Electrolyte sampling is performed on the electrode plate on the electrolyte supply side (near the electrolyte supply port), in the middle of the electrolyzer (in the middle of the length direction), and on the drain side of the electrolyte (near the electrolyte supply port). The upper part (near the liquid surface), the middle part (depth in the middle of the electrode plate), and the lower part (depth at the lower end of the electrode plate).
FIG. 3 shows the relationship between the time from the start of supply of the electrolytic solution obtained in the test and the Ni concentration ratio (%) in the electrolytic solution in the electrolytic cell.
In FIG. 3, when the Ni concentration ratio is seen, there is little variation in the upper part (near the liquid surface), the middle part (depth in the middle of the electrode plate), and the lower part (depth of the lower end of the electrode plate) between the electrode plates. The mixing condition of the liquid was good, and it was expected that the hoist would not be rolled up even in the actual machine.

(Example 2)
As the electrolytic apparatus of Example 2, in the electrolytic apparatus used in Example 1, two electrolytic solution supply ports of the electrolytic solution supply unit are provided at intervals in the depth direction of the electrolytic cell, and these Of the electrolyte supply port, the same configuration is used except that the electrolyte solution supply port provided at a deep position is provided at a position higher by 10 mm (100 mm in terms of actual machine) than the depth position at the lower end of the electrode plate. The experiment was conducted.
FIG. 4 shows the relationship between the time from the start of supply of the electrolytic solution obtained in the test and the Ni concentration ratio (%) in the electrolytic solution in the electrolytic cell.
In FIG. 4, when the Ni concentration ratio is seen, the variation between the upper part (near the liquid surface), the middle part (depth in the middle of the electrode plate), and the lower part (depth at the lower end of the electrode plate) between the electrode plates is small. The mixed state of the electrolyte solution was better than in Example 1, and it was predicted that no hoisting of the temple occurred even in the actual machine.

(Comparative Example 1)
As an electrolytic apparatus of Comparative Example 1, in the electrolytic apparatus used in Example 1, the electrolytic solution supply port of the electrolytic solution supply unit is deeper than the depth position of the lower end of the electrode plate by 15 mm (150 mm in terms of actual machine). The experiment was performed in the same manner except that the flow rate of the electrolyte supplied by the electrolyte supply unit in the electrolytic cell was 60 mL / min (35 L / min in terms of actual machine).
FIG. 5 shows the relationship between the time from the start of supply of the electrolytic solution obtained in the test and the Ni concentration ratio (%) in the electrolytic solution in the electrolytic cell.
In FIG. 5, the Ni concentration ratio shows large variations between the upper part (near the liquid surface), the middle part (depth in the middle of the electrode plate), and the lower part (depth at the lower end of the electrode plate) between the electrode plates. The mixed state of the liquid was poor.

(Comparative Example 2)
As an electrolytic device of Comparative Example 2, in the electrolytic device used in Example 1, the electrolytic solution supply port of the electrolytic solution supply unit is deeper than the depth position of the lower end of the electrode plate by 15 mm (150 mm in terms of actual machine). The experiment was conducted in the same manner with the same configuration except that it was provided.
FIG. 6 shows the relationship between the time from the start of supply of the electrolytic solution obtained in the test and the Ni concentration ratio (%) in the electrolytic solution in the electrolytic cell.
In FIG. 6, when the Ni concentration ratio is seen, the variation in the upper part (near the liquid surface), the middle part (depth in the middle of the electrode plate), and the lower part (depth of the lower end of the electrode plate) between the electrode plates is Comparative Example 1. Although it was improved more, the mixed state of the electrolyte was still poor, and it was expected that the hoisting of the temple would occur even in the actual machine.

Claims (6)

An electrolytic apparatus for supplying an electrolytic solution from one end side in a longitudinal direction in an electrolytic cell provided with an electrode plate by an electrolytic solution supply unit and discharging the electrolytic solution from the other end side in the longitudinal direction in the electrolytic cell. ,
The electrode plate is provided with a plurality of anode plates and a plurality of cathode plates alternately spaced in the thickness direction, and the lower end of the electrode plate is spaced from the bottom surface of the electrolytic cell by a predetermined distance. Suspended in the electrolytic cell,
The electrolytic apparatus, wherein the electrolytic solution supply port of the electrolytic solution supply unit is provided at a depth position up to ± 100 mm with respect to the depth position of the lower end of the electrode plate.   2. The electrolytic apparatus according to claim 1, wherein a supply flow rate of the electrolytic solution from the electrolytic solution supply unit in the electrolytic tank is 30 to 90 L / min.   A plurality of electrolyte solution supply ports of the electrolyte solution supply unit are provided at intervals in the depth direction of the electrolytic cell, and the electrolyte solution provided at the deepest position among the plurality of electrolyte solution supply ports 3. The electrolysis apparatus according to claim 1, wherein the supply port is provided at a depth position of ± 100 mm with respect to the depth position of the lower end of the electrode plate.   The electrolytic device according to claim 3, wherein a plurality of electrolytic solution supply ports of the electrolytic solution supply unit are provided in directions in which the electrolytic solution is supplied to both sides of the electrode plate, respectively.   5. The electrolysis apparatus according to claim 1, wherein the liquid temperature in the vicinity of the lower end portion of the electrode plate in the electrolytic cell is controlled to 60 ° C. or more.   6. An electrolysis method, wherein a metal is electrodeposited on the plurality of cathode plates by electrolyzing the electrolytic solution using the electrolysis apparatus according to any one of claims 1 to 5.