JP2016066393A - Work clamp jig and work-piece polishing method - Google Patents
Work clamp jig and work-piece polishing method Download PDFInfo
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- JP2016066393A JP2016066393A JP2014193803A JP2014193803A JP2016066393A JP 2016066393 A JP2016066393 A JP 2016066393A JP 2014193803 A JP2014193803 A JP 2014193803A JP 2014193803 A JP2014193803 A JP 2014193803A JP 2016066393 A JP2016066393 A JP 2016066393A
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- 238000005498 polishing Methods 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000000919 ceramic Substances 0.000 claims abstract description 17
- 239000013013 elastic material Substances 0.000 claims abstract description 9
- 235000012431 wafers Nutrition 0.000 description 5
- 238000003825 pressing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
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- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Magnetic Heads (AREA)
Abstract
Description
本発明は、磁気ヘッド素子の研磨加工時に生じる残留応力によるねじれ精度の低下を防止することができるワーククランプ治具及びワーク研磨方法に関する。 The present invention relates to a workpiece clamping jig and a workpiece polishing method capable of preventing a reduction in torsional accuracy due to residual stress generated during polishing of a magnetic head element.
近年の磁気ディスク装置に使用される磁気ヘッド素子は、図4(a)に示す如く、半導体製造技術により円板状のウェハ2に多数のワーク(ロウバーともいう。)3が配置されるように製造され、図4(b)に示す如く、ウェハ2から切断したワーク3をワーク固定具4と強固に固定し、図4(c)に示す如く、ワーク固定具4に取り付けたワーク3を把持するクランプ治具5によって矢印D方向に回転する定盤6に押しつけると共に矢印E方向に往復移動させることによって、磁気ヘッド浮上面を研磨して製造される。 As shown in FIG. 4A, a magnetic head element used in a recent magnetic disk apparatus has a large number of works (also referred to as row bars) 3 arranged on a disk-shaped wafer 2 by a semiconductor manufacturing technique. The workpiece 3 manufactured and cut from the wafer 2 is firmly fixed to the workpiece fixture 4 as shown in FIG. 4B, and the workpiece 3 attached to the workpiece fixture 4 is gripped as shown in FIG. The magnetic head flying surface is polished by being pressed against the surface plate 6 rotating in the arrow D direction by the clamping jig 5 and reciprocating in the arrow E direction.
なお、従来技術による磁気ヘッド加工装置に関する技術が記載された文献としては、下記の特許文献1が挙げられ、下記の特許文献1には、ワークの浮上面に一定間隔に複数の切り込みを形成することによって、研磨加工時の内部応力を緩和する技術が記載されている。 In addition, as a document describing a technique related to a magnetic head machining apparatus according to the prior art, the following Patent Document 1 can be cited. Thus, a technique for relieving internal stress during polishing is described.
前記の図4に示した磁気ヘッド素子用のワーク研磨方法は、加工前のワーク3が僅かに湾曲し、ワーク固定具4が前記湾曲を矯正した状態でワーク3の研磨加工を行うため、加工後のワーク3に残留応力が残り、数ナノ程度のねじれ精度が低下するという課題があった。 In the workpiece polishing method for the magnetic head element shown in FIG. 4, the workpiece 3 is polished while the workpiece 3 is slightly curved and the workpiece fixture 4 corrects the curvature. There was a problem that residual stress remained in the subsequent workpiece 3 and the torsional accuracy of several nanometers was lowered.
前記の特許文献1に記載された技術は、ワークの浮上面に設けた複数の切り込みによって研磨加工時の内部応力を緩和することができるものの、高精度に複数の切り込み加工が困難であると共に切り込み加工時の内部応力がワークに残留してしまう可能性があるという課題があった。 Although the technique described in Patent Document 1 can relieve internal stress during polishing by a plurality of cuts provided on the air bearing surface of the workpiece, it is difficult to perform a plurality of cuts with high accuracy and There was a problem that internal stress during processing may remain on the workpiece.
本発明の目的は、前述の従来技術による課題を解決しようとするものであり、残留応力によるねじれ精度の低下を防止することができるワーククランプ治具及びワーク研磨方法を提供することである。 An object of the present invention is to solve the above-described problems caused by the prior art, and to provide a workpiece clamping jig and a workpiece polishing method capable of preventing a reduction in torsional accuracy due to residual stress.
前記の目的を達成するために請求項1に記載の発明は、セラミックス層と回路層の熱膨張率差によって湾曲したワークを把持するワーククランプ治具であって、ネジ孔が開口され前記ワークを下端に保持するワーク固定具と、ネジ孔が開口され平面から突出する一対の弾性材を有する一方のクランプ具と、平面の中央から突出する突起部を有する他方のクランプ具と、該一方及び他方のクランプ具とワーク固定具のネジ孔を貫通して一方及び他方のクランプ具を固定するネジとを備え、前記一方及び他方の突起部によりワークを複数点支持し、一方のクランプ具がワークの回路層と接し、他方のクランプ具がワークのセラミックス層の湾曲に接するようにワークを支持するように構成されていることを特徴とし、
請求項2記載の発明は、前記特徴のワーククランプ治具において、前記複数の構成を可能とする突起部がワークの湾曲に沿って点支持であることを特徴とする。
In order to achieve the above object, the invention described in claim 1 is a work clamping jig for gripping a workpiece curved by a difference in thermal expansion coefficient between a ceramic layer and a circuit layer, wherein a screw hole is opened to remove the workpiece. A workpiece fixing tool held at the lower end, one clamp tool having a pair of elastic members that are open from the plane and have screw holes, the other clamp tool having a protrusion protruding from the center of the plane, the one and the other And a screw that passes through the screw hole of the workpiece fixing tool and fixes one and the other clamping tool, and supports the workpiece at a plurality of points by the one and the other protrusions, and the one clamping tool is used for the workpiece. It is configured to contact the circuit layer and to support the workpiece so that the other clamping tool contacts the curvature of the ceramic layer of the workpiece,
The invention described in claim 2 is characterized in that, in the workpiece clamping jig of the above feature, the projections that enable the plurality of configurations are point supports along the curvature of the workpiece.
請求項3に記載の発明は、ネジ孔が開口されセラミックス層と回路層の熱膨張率差によって湾曲したワークを下端に保持するワーク固定具と、ネジ孔が開口され平面から突出する一対の弾性材を有する一方のクランプ具と、平面の中央から突出する突起部を有する他方のクランプ具と、該一方及び他方のクランプ具とワーク固定具のネジ孔を貫通して一方及び他方のクランプ具を固定するネジとを備えたワーククランプ治具を用い、該ワーククランプ治具の下端を回転定盤により研磨するワーク研磨方法であって、前記ワーククランプ治具が、一方のクランプ具がワークの回路層と接し、他方のクランプ具がワークのセラミックス層の湾曲に接するようにワークを支持し、定盤を回転させながら定盤半径方向に往復移動させることを特徴とし、
請求項4に記載の発明は、前記複数の構成を可能とする突起部がワークの湾曲に沿って点支持とすることを特徴とする。
According to a third aspect of the present invention, there is provided a work fixture for holding a work bent at a lower end by a difference in thermal expansion coefficient between a ceramic layer and a circuit layer and a pair of elastic members having a screw hole opened and projecting from a plane. One clamp tool having a material, the other clamp tool having a protrusion protruding from the center of the plane, and the one and the other clamp tool through the screw holes of the one and the other clamp tool and the work fixing tool. A work polishing method in which a work clamp jig provided with a fixing screw is used, and a lower end of the work clamp jig is polished by a rotating surface plate, wherein the work clamp jig is a circuit of a work piece. The workpiece is supported so that the other clamp is in contact with the curvature of the ceramic layer of the workpiece, and the plate is reciprocated in the radial direction of the platen while rotating the platen.
The invention according to claim 4 is characterized in that the plurality of projecting portions that enable the plurality of configurations are point supports along the curvature of the workpiece.
本発明によるワーククランプ治具及びワーク研磨方法は、一方のクランプ具が弾性材によりワークの回路層と接し、他方のクランプ具がワークのセラミックス層の湾曲に接するようにワークを支持し、定盤を回転させながら定盤半径方向に往復移動させることによって、ワークの湾曲を矯正することなく研磨を行うため、矯正による残留応力が発生することがなく、ねじれ精度の低下を防止することができる。 The workpiece clamping jig and the workpiece polishing method according to the present invention support a workpiece such that one clamping tool is in contact with the circuit layer of the workpiece by an elastic material, and the other clamping tool is in contact with the curvature of the ceramic layer of the workpiece. By reciprocating in the radial direction of the platen while rotating, the polishing is performed without correcting the curvature of the workpiece. Therefore, no residual stress is generated by the correction, and a reduction in torsional accuracy can be prevented.
以下、本発明によるワーククランプ治具及びワーク研磨方法の一実施形態の図面を参照して詳細に説明する。
本実施形態によるワーククランプ治具5は、図1(a)に示す如く、ネジ孔が開口され、下面に回路素子(回路層)が形成されたワーク3を保持するワーク固定具4と、ネジ孔が開口され平面から突出する一対の弾性材21(図3)を有するクランプ具5Aと、平面の中央から突出する突起部20(図3)を有するクランプ具5Bと、該クランプ具5A及び5Bとワーク固定具4のネジ孔を貫通してクランプ具5A及び5Bを固定するネジ7とから構成され、図1(b)に示す如く、クランプ具5A及び5Bをワーク3の下端が下から露出するように挟み込んだ状態でネジ7を螺旋止めすることによって組み立てられる。この挟み込んだ状態で突起部20によりワーク3を変形させずに保持することを本発明では把持という。
Hereinafter, a workpiece clamping jig and a workpiece polishing method according to an embodiment of the present invention will be described in detail with reference to the drawings.
As shown in FIG. 1A, the workpiece clamping jig 5 according to the present embodiment includes a workpiece fixing tool 4 for holding a workpiece 3 having a screw hole opened and a circuit element (circuit layer) formed on the lower surface, and a screw. Clamping tool 5A having a pair of elastic members 21 (FIG. 3) that are open from the plane and projecting from a plane, Clamping tool 5B having a projection 20 (FIG. 3) that projects from the center of the plane, and the clamping tools 5A and 5B And a screw 7 that passes through the screw hole of the workpiece fixing tool 4 and fixes the clamping tools 5A and 5B. As shown in FIG. 1 (b), the lower end of the workpiece 3 is exposed from the bottom of the clamping tool 5A and 5B. It is assembled by screwing the screw 7 in a state of being sandwiched. Holding the workpiece 3 without being deformed by the protruding portion 20 in the sandwiched state is referred to as gripping in the present invention.
前記ワーククランプ治具5は、組み立て状態の下面を示す図2の如く、クランプ具5Bがワーク3の中央部分をクランプ具5Aに向かって押圧する押圧力を印加するように構成される。この押圧力は、クランプ具5A及び5Bとワーク3のみ抽出拡大した図3に示す如く、平らな平面から突出する弾性材21を有するクランプ具5Aと、平らな平面の中央から突出するセラミックス材の突起部20を有するクランプ具5Bとの間にワーク3を挟み込み、両端及び中央位置の3点ABCによって極力負荷をかけない状態でワーク3を固定することによって付加される。なお、前記弾性材21は、ワーク3に接しない状態では平坦形状で有り、ワーク3に押しつけられたとき、ワーク3の形状に沿って弾性変形するものである。
即ち、本実施形態によるワーククランプ治具5は、ワーク3の湾曲を維持した状態においてワーク3の両端位置及び中央位置を3点支持するように構成されている。
As shown in FIG. 2 showing the lower surface in the assembled state, the workpiece clamping jig 5 is configured such that the clamping tool 5B applies a pressing force that presses the central portion of the workpiece 3 toward the clamping tool 5A. As shown in FIG. 3 in which only the clamp tools 5A and 5B and the workpiece 3 are extracted and enlarged, the pressing force is obtained by the clamp tool 5A having the elastic material 21 protruding from the flat plane and the ceramic material protruding from the center of the flat plane. The workpiece 3 is sandwiched between the clamp tool 5B having the protruding portion 20 and the workpiece 3 is fixed in a state where no load is applied as much as possible by the three points ABC at both ends and the center position. The elastic material 21 has a flat shape when not in contact with the work 3 and is elastically deformed along the shape of the work 3 when pressed against the work 3.
In other words, the workpiece clamping jig 5 according to the present embodiment is configured to support the two positions and the center position of the workpiece 3 in a state where the curvature of the workpiece 3 is maintained.
なお、図示の例ではクランプ具5Aの弾性材21及び5Bの突起部20がワーク3を3点支持する例を説明したが、本発明は3点支持に限られるものではなく、5点以上の奇数の突起部によってワーク3の湾曲を維持した状態で点支持するように構成しても良い。 In the illustrated example, the elastic material 21 of the clamp tool 5A and the protruding portion 20 of the 5B support the workpiece 3 at three points. However, the present invention is not limited to the three-point support, and five or more points are supported. You may comprise so that it may be point-supported in the state which maintained the curvature of the workpiece | work 3 with the odd-numbered protrusion part.
前記ウェハ2は、セラミック層の上に磁気ヘッド素子を含む回路層を半導体形成技術により薄膜成長させて製造するものであり、このためウェハ2を切断したワーク3の湾曲(反り)は、図5に示す断面の如く、前記薄膜を成長させる際、セラミックス層3Bと回路層3Aの熱膨張率差によって生じるものであり、湾曲方向は回路層が延びセラミックス層が縮むことが知られている。 The wafer 2 is manufactured by growing a circuit layer including a magnetic head element on a ceramic layer by thin film growth using a semiconductor forming technique. For this reason, the curvature (warping) of the work 3 cut from the wafer 2 is shown in FIG. As shown in the cross section, it is known that when the thin film is grown, it is caused by a difference in thermal expansion coefficient between the ceramic layer 3B and the circuit layer 3A, and in the bending direction, the circuit layer extends and the ceramic layer contracts.
このため、本実施形態によるワーククランプ治具5は、複数の点接触を可能とする突起部20と弾性材21を用い、ワーク3の回路層側をクランプ具5Aと接触させ、セラミックス層側をクランプ具5Bの突起部20により接触させて湾曲したワーク3を支持する。 For this reason, the workpiece clamping jig 5 according to the present embodiment uses the protrusion 20 and the elastic material 21 that allow a plurality of point contacts, the circuit layer side of the workpiece 3 is brought into contact with the clamp tool 5A, and the ceramic layer side is The curved workpiece 3 is supported by being brought into contact with the projection 20 of the clamp 5B.
本実施形態によるワーク研磨方法は、前述のワーククランプ治具5が、複数の点接触を可能とする突起部20と弾性材21によって、クランプ具5Aがワーク3の回路層と接し、クランプ具5Bがワーク3のセラミックス層の湾曲と接するようにワーク3を3点支持した状態で、定盤を回転させながら定盤半径方向に往復移動させるように動作する。 In the workpiece polishing method according to the present embodiment, the above-described workpiece clamping jig 5 is brought into contact with the circuit layer of the workpiece 3 by the projection 20 and the elastic material 21 that allow a plurality of point contacts, and the clamping tool 5B. In the state where the workpiece 3 is supported at three points so as to be in contact with the curvature of the ceramic layer of the workpiece 3, it operates to reciprocate in the radial direction of the platen while rotating the platen.
従って、本実施形態により研磨されたワーク3は、ワーク3に内在する湾曲を矯正することなくワーク湾曲を許容した状態で研磨を行うため、湾曲矯正による残留応力が発生することがなく、ねじれ精度の低下を防止することができる。 Therefore, since the workpiece 3 polished according to the present embodiment is polished in a state in which the workpiece is allowed to be curved without correcting the curvature inherent in the workpiece 3, no residual stress is generated by the curvature correction, and the torsional accuracy is not generated. Can be prevented.
2 ウェハ、3 ワーク、3A 回路層、3B セラミック層、
4 ワーク固定具、5 ワーククランプ治具、5A クランプ具、
5B クランプ具、6 定盤、7 ネジ、20 突起部、21 弾性材
2 wafers, 3 workpieces, 3A circuit layer, 3B ceramic layer,
4 Work fixing tool, 5 Work clamp jig, 5A Clamp tool,
5B Clamping tool, 6 Surface plate, 7 Screw, 20 Projection, 21 Elastic material
Claims (4)
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002331452A (en) * | 2001-03-08 | 2002-11-19 | Hitachi Ltd | Polishing apparatus, magnetic head, and method of manufacturing the same |
| JP2004136441A (en) * | 2003-11-17 | 2004-05-13 | Tdk Corp | Processing device and method for workpiece |
| JP2004268248A (en) * | 2003-01-29 | 2004-09-30 | Mitsubishi Rayon Co Ltd | Work input device, input jig, gripping device and gripping jig |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002331452A (en) * | 2001-03-08 | 2002-11-19 | Hitachi Ltd | Polishing apparatus, magnetic head, and method of manufacturing the same |
| JP2004268248A (en) * | 2003-01-29 | 2004-09-30 | Mitsubishi Rayon Co Ltd | Work input device, input jig, gripping device and gripping jig |
| JP2004136441A (en) * | 2003-11-17 | 2004-05-13 | Tdk Corp | Processing device and method for workpiece |
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