JP2013051239A - Supporting structure for member, exposure apparatus, method for manufacturing flat panel display, and device manufacturing method - Google Patents

Abstract

An object of the present invention is to control a tilting operation of a substrate with respect to a horizontal plane with high accuracy.
[Solution]
The leveling device 40 includes a leveling diamond 42 that can be tilted with respect to a horizontal plane integrally with a substrate holder that holds a substrate, and a plurality of air bearings 46 that support the leveling diamond 42 from below. By the action of the spherical bearing 58 and / or the hinge portion 54, the leveling diamond 42 can be swung in accordance with the posture change. When the leveling control is performed during the exposure operation or the like, the air bearing 46 is restricted in the operation of the spherical bearing 58 and swings only by the action of the hinge portion 54. And it swings by the action of the hinge part 54.
[Selection] Figure 5

Description

  The present invention relates to a member support structure, an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method, and more specifically, a member support structure that supports a predetermined member in a swingable manner, and the member support structure. The present invention relates to an exposure apparatus, a flat panel display manufacturing method using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

  Conventionally, in a lithography process for manufacturing an electronic device (microdevice) such as a liquid crystal display element, a semiconductor element (such as an integrated circuit), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or a wafer (hereinafter referred to as “mask”). Step-and-scan exposure in which the pattern formed on the mask is transferred onto the substrate using an energy beam while the substrate is collectively moved along a predetermined scanning direction (scanning direction). The device is used.

  In this type of exposure apparatus, in order to accurately position the substrate surface within the depth of focus of the projection optical system, the substrate holder that holds the substrate is tilted with respect to the horizontal plane using a plurality of linear motors (for example, voice coil motors). Thus, there is known one that controls the amount of tilt (rotation amount) of the substrate holder with respect to the horizontal plane (see, for example, Patent Document 1).

  Here, as an exposure apparatus, an apparatus capable of controlling the tilt amount of the substrate with higher accuracy is required with the recent miniaturization of patterns.

US Patent Application Publication No. 2010/0018950

  The present invention has been made under the circumstances described above. From the first viewpoint, the first member having the first surface portion and the second member having the second surface portion disposed to face the first surface portion. A support structure for a member that allows a relative posture change of the first and second members by the relative movement of the second surface portion along the first surface portion. The two members are a first swing support device that swingably supports the second surface portion, and a second swing support that swingably supports the second surface portion and the first swing support device. And a support device.

  According to this, in the second member, the second surface portion is swingably supported via the first swing support device, and the second surface portion and the first swing support device are the second swing support device. Is supported so as to be swingable. Since the second surface portion can be oscillated by the action of the first oscillating support device and / or the second oscillating support device, it is possible to perform an oscillating operation in a minute range and an oscillating operation in a wide range with high accuracy. .

  From the second viewpoint, the present invention provides an object holding member for holding a predetermined object, and support of the member according to the first aspect of the present invention in which the first or second member is connected to the object holding member. An exposure apparatus comprising: a structure; and a pattern forming apparatus that forms a predetermined pattern on the object held by the object holding member using an energy beam.

  According to a third aspect of the present invention, there is provided a flat panel display comprising: exposing the object using the exposure apparatus according to the second aspect of the present invention; and developing the exposed object. It is a manufacturing method.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: exposing the object using the exposure apparatus according to the second aspect of the present invention; and developing the exposed object. is there.

It is a figure which shows schematically the structure of the liquid-crystal exposure apparatus of one Embodiment. FIG. 2 is a partial cross-sectional view of a substrate stage device included in the liquid crystal exposure apparatus of FIG. 1. 3A is a view of the leveling device included in the substrate stage apparatus of FIG. 2 as viewed from below, and FIG. 3B is a cross-sectional view taken along line 3B-3B of FIG. 4A and 4B are diagrams (part 1 and part 2) for explaining the operation of the leveling device. 5A is a diagram illustrating a state in which only the hinge portion is operated in the leveling device, and FIG. 5B is a diagram illustrating a state in which the hinge portion and the spherical bearing are operated in the leveling device. (C) is a figure which shows the state which only the spherical bearing act | operated in the leveling apparatus. FIGS. 6A and 6B are views (No. 1 and No. 2) for explaining the configuration and operation of the leveling device according to the first modification. FIGS. 7A and 7B are views (No. 1 and No. 2) for explaining the configuration and operation of the leveling device according to the second modification. FIG. 8A is a plan view of a rolling guide device included in the leveling device according to the second modification, and FIG. 8B illustrates an example of an assembly procedure of the leveling device according to the second modification. FIG. 8C is a cross-sectional view of the rolling guide device included in the leveling device according to the second modification. FIG. 9A is a diagram illustrating a leveling device according to a third modification, and FIG. 9B is a diagram for explaining an example of an assembly procedure of the leveling device according to the third modification. is there. FIGS. 10A and 10B are views (No. 1 and No. 2) for explaining the configuration and operation of the leveling device according to the fourth modified example. FIGS. 11A and 11B are views (No. 1 and No. 2) for explaining the configuration and operation of the elastic hinge device included in the leveling device according to the fourth modification. It is sectional drawing of the leveling apparatus which concerns on a 5th modification.

  Hereinafter, an embodiment will be described with reference to FIGS. 1 to 5C.

  FIG. 1 schematically shows a configuration of a liquid crystal exposure apparatus 10 according to an embodiment. The liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object. A projection exposure apparatus, a so-called scanner.

  The liquid crystal exposure apparatus 10 holds an illumination system 12, a mask stage 14 that holds a mask M, a projection optical system 16, and a substrate P on which a resist (sensitive agent) is applied on the surface (the surface facing the + Z side in FIG. 1). Including a substrate stage device 20 and a control system thereof. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is defined as the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, the X-axis, and the Y-axis. The description will be made with the orthogonal direction as the Z-axis direction. Further, the positions in the X-axis, Y-axis, and Z-axis directions will be described as the X position, Y position, and Z position, respectively. Further, the position in the X axis direction (θx direction) will be referred to as the θx position, the position in the Y axis direction (θy direction) as the θy position, and the position in the Z axis direction (θz direction) as the θz position.

  The illumination system 12 is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331. The illumination system 12 irradiates the mask M with illumination light IL for exposure. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used.

  The mask stage 14 holds the mask M on which a predetermined circuit pattern is formed, for example, by vacuum suction. The mask stage 14 is driven with a predetermined long stroke in the scanning direction (X-axis direction) by a mask stage driving system (not shown) including a linear motor, for example, and is also slightly driven in the Y-axis direction and the θz direction as appropriate. . Position information of the mask stage 14 in the XY plane (including rotation amount information in the θz direction) is obtained by a mask interferometer system including a laser interferometer (not shown).

  The projection optical system 16 is disposed below the mask stage 14. The projection optical system 16 is configured similarly to the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system 16 is a so-called multi-lens projection optical system including, for example, a plurality of optical systems that form an erect image with a bilateral telecentric equal magnification system, and is a single rectangular shape having a longitudinal direction in the Y-axis direction. Functions in the same way as a projection optical system having an image field.

  For this reason, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light IL that has passed through the mask M causes the circuit of the mask M in the illumination area to pass through the projection optical system 16. A projected image of the pattern is formed in the irradiation region of the illumination light IL conjugate to the illumination region on the substrate P. Then, the mask M is driven in the scanning direction with respect to the illumination area (illumination light IL), and the substrate P is driven in the scanning direction with respect to the exposure area (illumination light IL). The pattern formed on the mask M is transferred to one shot area.

  The substrate stage apparatus 20 includes a stage base 22, a base frame 24, a Y coarse movement stage 26, an X coarse movement stage 28, a Y step guide 30, a weight cancellation apparatus 32, and a fine movement stage 34.

  The stage pedestal 22 is made of a rectangular plate-like member in plan view (as viewed from the + Z axis side), and is installed on the floor 11 of the clean room via a vibration isolator (not shown). The stage base 22 constitutes a part of the apparatus main body (body) of the liquid crystal exposure apparatus 10. The projection optical system 16 and the mask stage 14 are supported by the apparatus main body and are vibrationally separated from the floor 11.

  The base frame 24 is composed of a plate-like member parallel to the YZ plane extending in the Y-axis direction. The + X side and the −X side of the stage base 22 (the base frame 24 on the −X side overlaps in the depth direction of the drawing) It is arranged with a predetermined clearance with respect to the stage base 22. The base frame 24 is installed on the floor 11 so that the height position (Z position) can be adjusted via a plurality of adjuster devices 24a.

  The Y coarse movement stage 26 is mounted on the base frame 24. The Y coarse movement stage 26 has a pair of X beams 26a. The pair of X beams 26a are each made of a member having a rectangular YZ section extending in the X-axis direction, and are arranged in parallel to each other at a predetermined interval in the Y-axis direction. The pair of X beams 26a are connected to each other in the vicinity of the + X side end by a rectangular plate-like member extending in the Y-axis direction called a Y carriage 26b. Although not shown in FIG. 1 because it overlaps in the depth direction of the drawing, the vicinity of the −X side ends of the pair of X beams 26a is also connected by the Y carriage.

  The Y coarse movement stage 26 is linearly moved in the Y-axis direction on the base frame 24 by a Y linear guide device including a Y linear guide 23a fixed to the base frame 24 and a Y slide member 23b fixed to the Y carriage 26b. Guided. The Y coarse movement stage 26 has a predetermined length in the Y-axis direction on the base frame 24 by a feed screw device including a screw portion 25a attached to the base frame 24 and a nut portion 25b fixed to the Y carriage 26b. Driven by stroke. The type of Y actuator for driving the Y coarse movement stage 26 in the Y-axis direction is not limited to the feed screw device, and may be, for example, a linear motor, a belt driving device, or the like.

  The X coarse movement stage 28 is made of a plate member having a rectangular shape in plan view, and is mounted on the Y coarse movement stage 26. The X coarse movement stage 28 includes a plurality of X linear guide devices including a plurality of X linear guides 27a fixed to the Y coarse movement stage 26 and a plurality of X slide members 27b fixed to the X coarse movement stage 28. Guided straight in the X-axis direction on the Y coarse movement stage 26. The X coarse movement stage 28 includes a plurality of X stators 29a (for example, magnet units) fixed to the Y coarse movement stage 26 and a plurality of X movers 29b (for example, coil units) fixed to the X coarse movement stage 28. Are driven with a predetermined long stroke in the X-axis direction on the Y coarse movement stage 26. Further, the X coarse movement stage 28 moves in the Y axis direction integrally with the Y coarse movement stage 26 by the action of the X linear guide device. That is, the Y coarse movement stage 26 and the X coarse movement stage 28 constitute a so-called gantry type XY axis stage apparatus.

  The Y step guide 30 is made of a member having a rectangular YZ section extending in the X-axis direction, and is disposed between the pair of X beams 26a. The Y step guide 30 is connected to each of the pair of X beams 26a via the flexure device 30a, and moves in the Y axis direction integrally with the Y coarse movement stage 26. The Y step guide 30 is linearly moved in the Y-axis direction on the stage base 22 by a Y linear guide device including a Y linear guide 31 a fixed to the stage base 22 and a Y slide member 31 b fixed to the Y step guide 30. Guided. The lower surface of the X beam 26a is located on the + Z side with respect to the upper surface of the Y linear guide 31a, and the Y coarse movement stage 26 and the Y step guide 30 are vibrating except for the portion connected by the flexure device 30a. Have been separated.

  The weight canceling device 32 supports the fine movement stage 34 from below. The weight cancellation apparatus 32 of this embodiment is configured in the same way as the weight cancellation apparatus disclosed in, for example, US Patent Application Publication No. 2010/0018950. That is, as shown in FIG. 2, the weight cancellation device 32 includes a cylindrical housing 32a, an air spring 32b accommodated in the housing 32a, and a plurality of parallel leaf spring devices 32c with respect to the housing 32a. And a Z slide member 32d connected so as to be movable with a small stroke in the Z-axis direction. The weight canceling device 32 uses the air spring 32b to apply a force having substantially the same magnitude as the weight of the fine movement stage 34 (downward force due to weight acceleration (−Z direction)) to the fine movement stage 34 in the upward direction of gravity (+ Z direction). Act against.

  The weight cancellation device 32 is inserted into an opening 28 a formed at the center of the X coarse movement stage 28. The weight cancellation device 32 is mechanically connected to the X coarse movement stage 28 via a plurality of flexure devices 32e, and moves integrally with the X coarse movement stage 28 in the X axis direction and / or the Y axis direction. .

  The weight cancellation device 32 is mounted on the Y step guide 30 in a non-contact state via a plurality of air bearings 32f attached to the lower surface thereof. The Y step guide 30 is set to have a length in the longitudinal direction (X-axis direction) somewhat longer than the movable distance in the X-axis direction of the weight cancellation device 32. The weight canceling device 32 moves on the Y step guide 30 when moving in the X-axis direction integrally with the X coarse movement stage 28. Further, when the weight canceling device 32 moves in the Y axis direction integrally with the X coarse movement stage 28, the Y step guide 30 moves in the Y axis direction integrally with the Y coarse movement stage 26, so that the weight cancellation is performed. The device 32 does not fall off from the Y step guide 30.

  As shown in FIG. 1, the fine movement stage 34 includes a main body 36, a substrate holder 38, and a leveling device 40. As shown in FIG. 2, the main body 36 is a hollow rectangular parallelepiped (box-shaped) member having a low height. An opening 36a is formed in the lower surface of the main body 36, and the leveling device 40 is accommodated in the main body 36 through the opening 36a.

  Returning to FIG. 1, the substrate holder 38 is made of a plate-like member having a rectangular shape in plan view, and is fixed to the upper surface of the main body 36. A substrate P is placed on the upper surface of the substrate holder 38, and the substrate holder 38 holds the substrate P by suction, for example, by vacuum suction. The leveling device 40 is a device for allowing the posture change (tilting in the θx and / or θy directions) of the main body 36 with respect to the weight cancellation device 32. The configuration of the leveling device 40 will be described later.

  The fine movement stage 34 is in a direction of three degrees of freedom (X axis, Y axis, θz direction) with respect to the X coarse movement stage 28 by a fine movement stage drive system as disclosed in, for example, US Patent Application Publication No. 2010/0018950. ) Is slightly driven. The fine movement stage drive system includes a plurality of voice coil motors including a stator fixed to the X coarse movement stage 28 and a movable element fixed to the main body 36. The plurality of voice coil motors include a plurality of Y voice coil motors 39y that generate thrust in the Y-axis direction (overlapping in the depth direction in FIG. 1), and a plurality of X voice coils that generate thrust in the X-axis direction. A motor (not shown) is included. The fine movement stage 34 is guided to the X coarse movement stage 28 by the thrust generated by the plurality of voice coil motors, and thereby, with the X coarse movement stage 28, with a predetermined stroke in the X axis direction and / or the Y axis direction. Moving. Further, the fine movement stage 34 is appropriately finely driven in the three degrees of freedom direction with respect to the X coarse movement stage 28 by the plurality of voice coil motors.

  Further, the fine movement stage drive system has a plurality of Z voice coil motors 39z for minutely driving the main body 36 in the three degrees of freedom in the θx, θy, and Z-axis directions. The plurality of Z voice coil motors 39z are arranged at locations corresponding to the four corners of the main body 36 (in FIG. 1, only two of the four Z voice coil motors 39z are shown, and the other two are Hidden in the depth direction of the page). As long as the main body 36 can be slightly driven in the θx and θy directions, the arrangement of the plurality of Z voice coil motors 39z is not limited to this, and may be arranged, for example, at three locations that are not on the same straight line. An upward force in the direction of gravity by the weight canceling device 32 acts on the fine movement stage 34, and the plurality of Z voice coil motors 39z can drive the main body 36 with a relatively small force.

  In the liquid crystal exposure apparatus 10, for example, during the exposure operation, surface position (Z position, θx position, and θy position) information on the surface of the substrate P is obtained by a sensor (not shown) attached to the apparatus body (body). Then, based on the output of the sensor, the Z position, θx position, and θy position of the fine movement stage 34 are controlled so that the surface position of the surface of the substrate P is within the depth of focus of the projection optical system 16 (so-called autofocusing). Control). For this reason, the rotation angle when the main body 36 is rotated in the θx and θy directions by the plurality of Z voice coil motors 39z is a minute angle, and is, for example, 1 mrad (milliradian) or less in the present embodiment.

  The position information (including the rotation amount information in the θz direction) of the main body 36 in the XY plane is obtained by a bar mirror 35b fixed to the main body 36 via a mirror base 35a by a substrate interferometer system including a laser interferometer (not shown). It is calculated using. The laser interferometer includes an X laser interferometer for obtaining X position information of fine movement stage 34 and a Y laser interferometer for obtaining Y position information of fine movement stage 34. Further, an X bar mirror corresponding to the X laser interferometer and a Y bar mirror corresponding to the Y laser interferometer are respectively fixed to the main body 36, but only the Y bar mirror is representatively shown in FIG. .

  Further, the position information of the fine movement stage 34 in the θx, θy, and Z-axis directions is armed to the weight cancellation device 32 by a plurality of Z sensors 37a fixed to the lower surface of the main body 36, as shown in FIG. It is calculated | required using the target 37c fixed through the shape-shaped support member 37b. Note that the Z sensor 37a of this embodiment includes an absolute position measurement sensor and a relative position measurement sensor, but only a relative position measurement sensor may be used. In addition, the Z sensor 37a may not be provided, and the θx position, θy position, and Z position of the main body 36 may be controlled based on the output of the autofocus control sensor.

  The leveling device 40 includes a leveling diamond 42 fixed to the ceiling surface of the main body 36, a leveling cup 44 supported from below by the weight cancellation device 32, and a plurality of air bearings 46 attached to the leveling cup 44. Including.

  As shown in FIG. 3 (A), the leveling diamond 42 is made of a member (polyhedral member) having a shape obtained by cutting off the tops of the triangular pyramids. As shown in FIG. It is fixed on the ceiling. In FIG. 3A, the leveling cup 44 and a flexure device 50 described later are not shown.

  As shown in FIG. 3B, the leveling cup 44 is composed of a cup-shaped member that opens to the + Z side, and the leveling cup 44 is located near the lower end (the top of the triangular pyramid) of the leveling diamond 42 through the opening. 44 is inserted. As shown in FIG. 2, the leveling cup 44 has a flat bottom surface. As shown in FIG. 2, the leveling cup 44 is attached to the weight cancellation device 32 via a plurality of air bearings 41 attached to the top surface of the Z slide member 32 d of the weight cancellation device 32. Supported from below. The leveling cup 44 floats with a predetermined clearance from the weight canceling device 32 due to the static pressure of the pressurized gas ejected from the air bearing 41, and the leveling device 40 and the weight canceling device 32 are in the X axis. And / or relative movement within a very small range in the Y-axis direction.

  A plurality of air bearings 46 (in this embodiment, for example, three corresponding to the inclined surfaces of the leveling diamond 42) are arranged at substantially equal intervals around the Z axis, as shown in FIG. Has been. One surface (bearing surface) of each of the plurality of air bearings 46 is disposed to face a corresponding inclined surface of the leveling diamond 42, and a pressurized gas (for example, air) is jetted onto the inclined surface. The main body 36, the substrate holder 38 (not shown in FIG. 3A, see FIG. 1), and the leveling diamond 42 are fixed to the leveling cup 44 by the static pressure of the gas ejected from the plurality of air bearings 46. It has surfaced through a certain clearance. A conical recess 48 is formed at the center of the other surface of the air bearing 46. In the present embodiment, the bearing surface of the air bearing 46 is circular, but may be other shapes (for example, rectangular). Moreover, the recessed part 48 may be formed in the member containing a bearing surface, and may be a member different from the member containing a bearing surface.

  Here, as shown in FIG. 3B, the plurality of air bearings 46 are respectively attached to the leveling cup 44 via the flexure device 50. The flexure device 50 includes a mounting bolt 52, a hinge portion 54, and a spherical portion 56. For example, three flexure devices 50 are provided at equal intervals (120 ° intervals) around the Z axis corresponding to the three air bearings 46 (in FIG. 3B, for example, three flexure devices). One of 50 is not shown).

  In the leveling cup 44, a plurality of screw holes (for example, three corresponding to the air bearing 46) for mounting the flexure device 50 are formed around the Z axis, and the mounting bolt 52 is screwed into the screw hole. Match. The mounting bolt 52 has one end protruding toward the inner peripheral surface of the leveling cup 44 and the other end protruding toward the outer peripheral surface of the leveling cup 44. The attachment bolt 52 is attached to the leveling cup 44 at an angle of, for example, about 45 ° with respect to the horizontal plane (XY plane).

  A loosening prevention nut 53 (lock nut) is screwed to the other end of the mounting bolt 52. The mounting bolt 52 is a so-called stud bolt capable of arbitrarily adjusting the mounting position with respect to the leveling cup 44. However, the mounting bolt 52 is not limited thereto, and may be a bolt having a flange that defines the mounting position with respect to the leveling cup 44, for example. good. Further, as long as the mounting bolt 52 can be securely fixed to the leveling cup 44, the nut 53 for preventing loosening is not necessarily used.

  The hinge portion 54 is formed of a member having a shape in which a circumferential groove is formed on the outer peripheral surface of the central portion in the longitudinal direction of the rod-shaped member (a rod-shaped member having a narrowed central portion in the longitudinal direction). A spherical portion 56 is fixed to one end and the other end. The hinge portion 54 is formed of, for example, a heat-treated spring rope (for example, nickel, chromium, molybdenum steel), and the other end side can swing (swing) with respect to the one end side by elastic deformation. .

  The spherical portion 56 is formed of a hemispherical member (a member having a constant curvature), and the bottom surface is fixed to the other end of the hinge portion 54. The spherical portion 56 is inserted into the concave portion 48 of the air bearing 46, and the outer peripheral surface and the inner wall surface of the concave portion 48 are in line contact with each other, and constitutes a spherical bearing 58 together with the concave portion 48. Therefore, the air bearing 46 can slide along the outer peripheral surface of the spherical portion 56 around the center of curvature of the spherical portion 56 (the center when the spherical portion is assumed to be a perfect sphere). It has become. Since the spherical portion 56 and the hinge portion 54 are subjected to a large bending stress, it is desirable that they are integrally processed and molded.

  Here, in the flexure device 50, the curvature of the spherical surface portion 56 (or of the hinge portion 54) is such that the center of curvature of the spherical surface portion 56 and the swing center of the hinge portion 54 during the swinging motion are substantially the same. Dimension) is set. For this reason, in the flexure device 50, when the posture of the air bearing 46 is changed by the action of the spherical bearing 58 (at the time of swinging), it is assumed that the spherical portion 56 and the air bearing 46 are fixed. The operation when the posture of the air bearing 46 is changed (during swinging) by the action of 54 (swinging operation) is substantially the same.

  Hereinafter, as an example, the main body 36 (not shown in FIG. 3B, see FIG. 2) is driven in the θx direction by a plurality of Z voice coil motors 39z (not shown in FIG. 3B, see FIG. 2). The operation of the leveling device 40 will be described.

  4A and 4B schematically show the leveling device 40 shown in FIG. 3B. 4A shows the leveling device 40 in a state where the upper surface of the substrate holder 38 (not shown in FIG. 4A, see FIG. 1) is parallel to the horizontal plane. In the state shown in FIG. 4A, each of the plurality of air bearings 46 is located at a neutral position in the swingable range. The bearing surfaces of the plurality of air bearings 46 are opposed to the corresponding inclined surfaces of the leveling diamond 42 via a predetermined clearance.

  When the main body 36 (not shown in FIGS. 4A and 4B, see FIG. 2) is driven in the θx direction from the state shown in FIG. 4A, it is shown in FIG. 4B. As shown, the posture of the leveling diamond 42 changes. The air bearing 46 is pressed in a non-contact manner through a gas film (gas layer) formed between the inclined surface of the corresponding leveling diamond 42 and the bearing surface, so that the hinge portion 54 and / or the spherical bearing is provided. 58 (not shown in FIG. 4B, respectively, see FIG. 3B), the leveling diamond 42 is parallel to the inclined surface 42 while keeping the clearance with respect to the corresponding inclined surface of the leveling diamond 42 constant. Move relative to it. In FIG. 4B, the amount of movement of the air bearing 46 is shown larger than the actual amount for easy understanding.

  As described above, the tilt angle in the θx direction and θy direction of the main body 36 (not shown in FIGS. 4A and 4B, see FIG. 2) is a minute angle (for example, 1 mrad or less). The fine movement stage 34 can be operated in the same manner as being rotated around one point (in this embodiment, the center of gravity position CG of the fine movement stage 34 (not shown in FIG. 4B; see FIG. 1)) (ie, In the leveling device 40, the mounting angles (elevation angles) of the plurality of air bearings 46 are set so that the rotation center of the fine movement stage 34 substantially coincides with the gravity center position CG). Thereby, the leveling device 40 can function in the same manner as the spherical bearing device.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded onto the mask stage 14 by a mask loader (not shown) under the control of a main controller (not shown). At the same time, the substrate P is loaded onto the substrate holder 38 by a substrate loader (not shown). After that, alignment measurement is performed by the main controller using an alignment detection system (not shown), and after the alignment measurement, a step-and-scan exposure operation is sequentially performed on a plurality of shot areas set on the substrate. Is done. Since this exposure operation is the same as a conventional step-and-scan exposure operation, a detailed description thereof will be omitted.

  In the substrate stage apparatus 20 according to the present embodiment, the fine movement stage 34 is appropriately driven in the θx direction and / or the θy direction in order to perform the above-described autofocus control during the alignment operation, the exposure operation, and the like (hereinafter, referred to as the following) The control is referred to as leveling control).

  Here, in the leveling device 40, the flexure device 50 has two mechanisms of a spherical bearing 58 and a hinge portion 54 as a mechanism that allows the air bearing 46 to swing. In the leveling device 40, when performing the leveling control, the frictional force (the concave portion 48 is set so that the spherical bearing 58 does not operate due to the frictional force acting on the contact portion between the wall surface defining the concave portion 48 and the spherical portion 56. The coefficient of friction between the wall surface to be defined and the spherical surface portion 56) is set. Thereby, in the leveling device 40, during the leveling control during the alignment operation and the exposure operation, the air bearing 46 is allowed to swing only by the action of the hinge portion 54, as shown in FIG. . This is because the swinging due to the deformation of the hinge part 54 without friction is higher in positioning accuracy than the spherical bearing 58 that swings due to friction. As the hinge portion 54, a portion that can be elastically deformed within a range assumed at the time of leveling control is used.

  On the other hand, when the fine movement stage 34 (see FIG. 1) tilts beyond the assumed range due to some trouble during the leveling control, the leveling device 40, as shown in FIG. The air bearing 46 is tilted by the action of the spherical bearing 58 together with 54. Even in this case, since the leveling diamond 42 rotates around the center of gravity position CG, the fine movement stage 34 (not shown in FIG. 5B, see FIG. 1) is relatively horizontal with respect to the weight cancellation device 32. Do not move. Thereby, the leveling device 40 (that is, the fine movement stage 34) is prevented from dropping from the weight canceling device 32. In addition, it is possible to prevent an excessive bending stress from acting on the hinge portion 54 and to prevent the hinge portion 54 from being damaged or plastically deformed.

  Next, returning to FIG. 2, an assembly procedure of the substrate stage apparatus 20 will be described. In the substrate stage apparatus 20, the Y coarse movement stage 26, the X coarse movement stage 28, the Y step guide 30, and the weight cancellation apparatus 32 are assembled so as to have the arrangement shown in FIG. 2 (the order is not particularly limited). Next, the fine movement stage 34 is disposed above the X coarse movement stage 28. At this time, the horizontal position (X position, Y position, and θz position) of the fine movement stage 34 with respect to the weight cancellation device 32 is positioned so that the leveling device 40 is supported by the weight cancellation device 32 from below. When the substrate stage apparatus 20 is assembled, the leveling cup 44 is supported by being suspended from the ceiling surface of the main body 36 by a suspension member (not shown).

  A plurality of Z actuators 60 attached to the X coarse movement stage 28 are used for positioning the fine movement stage 34 with respect to the X coarse movement stage 28. The type of the Z actuator 60 is not particularly limited, but it is desirable that the Z actuator 60 can generate a large force in the + Z direction. In this embodiment, an air cylinder device in which a ball is attached to the rod tip is used. The Z actuators 60 are arranged at, for example, three points that are not on the same straight line (in FIG. 2, for example, one of the three Z actuators 60 is not shown).

  Further, abutting members 62 a and 62 b are fixed to the lower surface of the main body 36 and the portions facing the plurality of Z actuators 60, respectively. The contact member 62a is formed with a conical groove that opens downward, whereas the contact member 62b is formed in a flat plate shape. The contact member 62 a is provided corresponding to two of the three Z actuators 60, and the contact member 62 b is provided corresponding to the remaining one Z actuator 60. In the substrate stage apparatus 20, the fine movement stage 34 can be easily positioned with respect to the X coarse movement stage 28 by inserting the ball of the Z actuator 60 into the conical groove of the contact member 62 a. Further, since fine movement stage 34 is supported by the plurality of Z actuators 60 together with weight cancellation device 32 from below, positioning of fine movement stage 34 in the θx and θy directions is performed using the plurality of Z actuators 60. Can do.

  At this time, in the fine movement stage 34, a system including a plurality of support objects of the air bearings 46 included in the leveling device 40, that is, a leveling diamond 42, a main body 36, a substrate holder 38 (not shown in FIG. 2, refer to FIG. 1) and the like. The load acting on the plurality of air bearings 46 is reduced by the force in the + Z direction by the plurality of Z actuators 60 as compared to when performing the above-described exposure operation. At this time, it is preferable to balance the force by reducing the pressure in the air spring 32b and reducing the force in the + Z direction that the weight cancellation device 32 acts on the fine movement stage 34 as compared with the leveling control (during exposure operation).

  Here, in a state in which a force in the + Z direction by the plurality of Z actuators 60 acts on the main body portion 36, the frictional force between the spherical surface portion 56 and the inner wall surface that defines the recess 48 is reduced. In the leveling device 40, the main body 36 is arranged such that the upper surface of the substrate holder 38 (see FIG. 1) is parallel to the horizontal plane in a state where the force in the + Z direction by the plurality of Z actuators 60 acts on the main body 36. Is adjusted with respect to the X coarse movement stage 28 (hereinafter referred to as initial position adjustment).

  When the main body 36 moves in the θx direction and the θy direction during initial position adjustment, in the leveling device 40, the air bearing 46 is pressed in a non-contact manner by the leveling diamond 42 as in the leveling control. 46 swings. In the leveling device 40, during the initial adjustment (in a state where + Z-direction force is applied to the main body 36 by the plurality of Z actuators 60), as shown in FIG. The friction coefficient between the spherical surface portion 56 and the inner wall surface that defines the recess 48 is set so that the inner wall surface that defines 48 slides. As a result, even if the main body portion 36 is appropriately moved in the θx and θy directions with respect to the weight cancellation device 32 and the initial position adjustment is performed, the flexure device 50 does not elastically deform the hinge portion 54 (or can be ignored). Small deformation).

  Therefore, in a state where the upper surface of the substrate holder 38 after the initial position adjustment is parallel to the horizontal plane (a state in which the fine movement stage 34 is positioned at a neutral position within the tiltable range), the hinge portion 54 is also in a neutral position within the elastically deformable range. Is located. As described above, in the substrate stage apparatus 20, the swingable movable range of the air bearing 46 is suppressed from being narrowed, and leveling control can be performed stably.

  In the substrate stage apparatus 20, when the plurality of substrates P are continuously exposed, the initial position adjustment can be appropriately performed using the plurality of Z actuators 60 as in the above assembly. As a result, the leveling control performed during exposure can suppress the stress that repeatedly acts on the hinge portion 54 from remaining (accumulating) in the hinge portion 54, so that the hysteresis phenomenon hardly occurs and the durability of the leveling device 40 is improved. improves.

  In the present embodiment, in the initial position adjustment, the fine movement stage 34 is partially supported by the air bearing 46 of the leveling device 40 by using a plurality of Z actuators 60 included in the X coarse movement stage 28. Although the load which acts is reduced, it is not restricted to this, Another jig | tool (It may be detachable with respect to the X coarse movement stage 28, and may be installed in the floor 11). May be used.

  The configuration of the leveling device 40 described in the above embodiment can be modified as appropriate. For example, in the above embodiment, as shown in FIG. 2, a force in the + Z direction is applied to the leveling diamond 42 via the main body 36 using the Z actuator 60 attached to the X coarse movement stage 28. However, the present invention is not limited to this, and the Z actuator 64 may be attached to the leveling cup 44 as in the leveling device 40a of the first modified example shown in FIG. The type of the Z actuator 64 is not particularly limited, but the leveling device 40a uses an air cylinder with the rod tip facing the + Z side. Further, a recess 42 a into which the rod tip of the Z actuator 64 is inserted is formed at the lower end of the leveling diamond 42. The inner diameter dimension of the recess 42a is set to be larger than the outer diameter dimension of the rod tip, and the leveling diamond 42 can move relative to the leveling cup 44 as shown in FIG. 6B. In the leveling device 40a, a force in the + Z direction can be applied to the leveling diamond 42 regardless of the relative position of the X coarse movement stage 28 and the fine movement stage 34, and the initial position adjustment can be performed at an arbitrary timing. . Note that a force in the + Z direction may be applied to the leveling diamond 42 using the Z actuator 64 at all times to reduce the load applied to the air bearing 46 and the flexure device 50.

  Further, as shown in FIG. 3B, the leveling device 40 of the above-described embodiment supports the leveling diamond 42 in a non-contact manner using a plurality of air bearings 46, but is not limited thereto. For example, FIG. You may support in a contact state using the rolling guide apparatus 70 like the leveling apparatus 40b of the 2nd modification shown by A). The rolling guide device 70 includes a plurality of balls 74 held by a ball retainer 72 as shown in FIG. The ball retainer 72 is urged by a plurality of tension springs 76 so as to be positioned at the center of the support pad 46a. As shown in FIG. 7B, the configuration and operation of the flexure device 50 that supports the support pad 46a are the same as in the above embodiment. In the leveling device 40b, the rigidity of the rolling guide device 70 (the rigidity in the normal direction of the inclined surface of the leveling diamond 42) is higher than that of the gas film formed by the air bearing 46 (see FIG. 3B) of the above embodiment. Since it is high, the support pad 46a can be made smaller than the air bearing 46. Moreover, since it is not necessary to supply pressurized gas to the leveling apparatus 40b, piping and a pressurized gas supply apparatus are unnecessary, and cost is low.

  When the support pad 46a is attached to the leveling cup 44, if there is a possibility that the ball 74 may fall off, as shown in FIG. 8B, the rolling guide device is interposed between the guide plate 78 and the support pad 46a. The support pad 46a may be attached to the leveling cup 44 with the assembly plate 77 fixing the guide plate 78 to the support pad 46a. In this case, by fixing the guide plate 78 to the leveling diamond 42 with bolts 79, for example, by using a steel material whose surface is hardened by heat treatment or the like, the leveling diamond 42 is made of a lightweight material such as an aluminum alloy. A material can be used and the leveling device 40c can be reduced in weight. Further, as shown in FIG. 8C, the ball retainer 72 of the rolling guide device 70 has a configuration in which the ball 74 is sandwiched between a pair of plate members in which a plurality of holes smaller in diameter than the ball 74 are formed. A thing may be used.

  In the leveling device 40b of the second modified example, the rolling guide device 70 is attached to the support pad 46a. However, the leveling device 40b is not limited to this, and for example, the leveling device of the third modified example shown in FIG. The rolling guide device 70 may be attached to the leveling diamond 42 as in 40c. In this case, as shown in FIG. 9B, the rolling guide device 70 can be attached to the leveling diamond 42 in a state where the main body portion 36 is turned upside down, so that assembly is easy.

  Further, since the rotation angle of the leveling diamond 42 is a slight angle, the leveling diamond 42 and the support pad 46a are connected to the elastic hinge device 80 as in the leveling device 40d of the fourth modified example shown in FIG. You may connect with. The elastic hinge device 80 includes a plurality of hinge portions 81 as shown in FIGS. 11 (A) and 11 (B). The hinge portion 81 has two constricted portions spaced in the normal direction of the inclined surface of the leveling diamond 42 (see FIG. 10A), and as shown in FIG. Relative movement between the leveling diamond 42 and the support pad 46a in a direction parallel to the rotation is allowed.

  In the above-described embodiment, the flexure device 50 has the spherical portion 56 that is a part of the spherical bearing 58 attached to the mounting bolt 52 via the hinge portion 54 as shown in FIG. The air bearing 46 is not limited to this as long as the air bearing 46 can be swingably attached to the leveling cup 44 via two swing mechanisms. For example, a leveling device 40e of the fifth modification shown in FIG. A concave portion 48 may be formed at one end of the mounting bolt 52, and a spherical portion 56 constituting the spherical bearing 58 together with the concave portion 48 may be attached to the other surface of the air bearing 46 via the hinge portion 54.

  In addition, the support structure of the air bearing 46 (or the support pad 46a) in the above-described embodiment (and its modification) is not limited to the leveling device 40, and other air bearings (for example, air bearings 32f and 41 of the weight cancellation device 32). You may apply to this support structure. In this case, the swinging centers of the hinge portion 54 and the spherical bearing 58 are not necessarily the same.

  The number and arrangement of the air bearings 46 (or support pads 46a) for supporting the leveling diamond 42 can be changed as appropriate. For example, the leveling diamond 42 is formed in a quadrangular pyramid shape and four air bearings 46 are arranged. Also good. The spherical bearing 58 has a pivot bearing structure in which the spherical portion 56 makes line contact with the wall surface defining the recess 48 (conical groove). However, the spherical bearing 58 is not limited to this and may have a surface contact structure in which spherical surfaces slide. Further, in the leveling device 40 of the above embodiment, the leveling diamond 42 is fixed to the main body 36 and the leveling cup 44 is supported by the weight canceling device 32. However, the arrangement of the leveling diamond 42 and the leveling cup 44 is the above embodiment. May be upside down (the leveling diamond 42 is supported by the weight canceling device 32 and the leveling cup 44 is fixed to the main body 36).

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  In the above embodiment, the case of the multi-lens projection optical system 16 including a plurality of projection optical units has been described. However, the number of projection optical units is not limited to this, and one or more projection optical units may be used. The projection optical system is not limited to a multi-lens type projection optical system, and may be a projection optical system using an Offner type large mirror, for example. In the above embodiment, the case where the projection optical system 16 has a projection magnification of the same magnification has been described. However, the present invention is not limited to this, and the projection optical system may be either a reduction system or an enlargement system.

  In the above embodiment, a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive mask substrate is used. As disclosed in US Pat. No. 6,778,257, based on electronic data of a pattern to be exposed, an electronic mask (variable shaping mask) that forms a transmission pattern or a reflection pattern, or a light emission pattern, for example, You may use the variable shaping | molding mask using DMD (Digital Micro-mirror Device) which is 1 type of a non-light-emitting type image display element (it is also called a spatial light modulator).

  As an exposure apparatus, a substrate having a size (including at least one of an outer diameter, a diagonal length, and one side) of 500 mm or more, for example, a large substrate for a flat panel display such as a liquid crystal display element is used as an exposure object. It is particularly suitable for an exposure apparatus.

  The exposure apparatus can also be applied to a step-and-repeat type exposure apparatus and a step-and-stitch type exposure apparatus. In the exposure apparatus, the object carried out by the carry-out apparatus is not limited to the substrate that is the object to be exposed, and may be a pattern holder (original) such as a mask.

  Further, the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus that transfers a liquid crystal display element pattern onto a square glass plate. For example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, and a DNA chip The present invention can also be widely applied to an exposure apparatus for manufacturing the above. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. Moreover, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member).

  For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) A lithography step for transferring a mask (reticle) pattern to a glass substrate by the exposure apparatus and the exposure method of each embodiment described above, a development step for developing the exposed glass substrate, and a portion where the resist remains. It is manufactured through an etching step for removing the exposed member of the portion by etching, a resist removing step for removing a resist that has become unnecessary after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .

  As described above, the member support structure of the present invention is suitable for relatively changing the posture of the first member and the second member. The exposure apparatus of the present invention is suitable for exposing an object. Moreover, the manufacturing method of the flat panel display of this invention is suitable for manufacture of a flat panel display. The device manufacturing method of the present invention is suitable for manufacturing micro devices.

  DESCRIPTION OF SYMBOLS 10 ... Liquid crystal exposure apparatus, 20 ... Substrate stage apparatus, 26 ... Y coarse movement stage, 28 ... X coarse movement stage, 32 ... Weight cancellation apparatus, 34 ... Fine movement stage, 40 ... Leveling apparatus, 42 ... Leveling diamond, 44 ... Leveling Cup, 46 ... Air bearing, 50 ... Flexure device, 54 ... Hinge, 58 ... Spherical bearing, P ... Substrate.

Claims (15)

Including a first member having a first surface portion and a second member having a second surface portion disposed to face the first surface portion, and the second surface portion relatively moves along the first surface portion. According to the present invention, there is provided a support structure for a member that allows a relative posture change of the first and second members,
The second member is
A first swing support device for swingably supporting the second surface portion;
A member support structure comprising: a second swing support device that supports the second surface portion and the first swing support device so as to swing together. The first member has a plurality of the first surface portions,
The plurality of first surface portions are arranged in different directions,
The member support structure according to claim 1, wherein the second member has a plurality of the second surface portions corresponding to the plurality of first surface portions. The first swing support device supports the second surface portion so as to be swingable around a first swing center,
The second swing support device supports the second surface portion and the first swing support device so as to be swingable about a second swing center,
The member support structure according to claim 1, wherein the first and second oscillation centers coincide with each other.   The member support structure according to claim 1, wherein the first swing support device is a spherical bearing device.   The member support structure according to claim 4, wherein the second swing support device is an elastic hinge device.   In a state where a predetermined load in a direction approaching each other is applied between the first and second members, the second surface portion swings through the elastic hinge device, and in a state where the load is reduced, 6. The member support structure according to claim 5, wherein a coefficient of friction between members in frictional contact in the spherical bearing device is set so that the second surface portion swings through the spherical bearing device.   The member according to claim 6, wherein a device for applying a force in a direction in which the first and second members are separated from each other to one of the first and second members is provided on the other of the first and second members. Support structure.   The said 2nd surface part moves to a pair along the said 1st surface part in a non-contact state by the static pressure of the pressurized gas supplied between the said 1st surface part. The support structure of the member of description.   The member support structure according to claim 1, further comprising a rolling bearing device including a rolling element between the first surface portion and the second surface portion.   The member support structure according to any one of claims 1 to 7, further comprising a hinge member provided between the first surface portion and the second surface portion. An object holding member for holding a predetermined object;
The member support structure according to any one of claims 1 to 10, wherein the first or second member is connected to the object holding member.
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern on the object held by the object holding member using an energy beam.   The exposure apparatus according to claim 11, wherein the object is a substrate used in a flat panel display device.   The exposure apparatus according to claim 12, wherein the substrate has a length of at least one side or a diagonal length of 500 mm or more. Exposing the object using the exposure apparatus according to claim 12 or 13,
Developing the exposed object. A method of manufacturing a flat panel display. Exposing the object using the exposure apparatus of claim 11;
Developing the exposed object.

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