JP2012098161A - Marker for measurement and manufacturing method thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a marker for measurement having a position measurement pattern that can be observed from an optional direction without incorporating a light source, and for which the production steps are reduced than before while maintaining manufacturing accuracy of the measurement pattern, and to provide a manufacturing method thereof.SOLUTION: A marker 1A for measurement includes a base material 11, a retroreflective material 10 that is pasted on the base material 11 and retroreflects radiation light l, and a transparent base material 12 on which a pattern having a plurality of openings 14 transmitting the radiation light lis printed, and which is pasted on the retroreflective material 10.

Description

  The present invention relates to a measurement marker and a method for manufacturing the same.

  There has been proposed a technique for reading the position of a land by transmitted light that transmits an area other than a land and a light shielding pattern provided on the substrate.

  As a technology related to this, Patent Document 1 discloses a land provided through an insulating plate that transmits light, and a light-shielding pattern formed on the surface of the insulating plate by providing a gap around the land. An image of transmitted light that is transmitted through the substrate is obtained by irradiating the substrate having light from one surface side of the substrate with a light source and photographing the other surface side of the substrate, and an image stored in advance A position measurement system that reads the position of a land by collating is disclosed.

JP-A-9-92942

  An object of the present invention is a measurement marker having a position measurement pattern that can be observed from an arbitrary direction without a built-in light source, and reduces the number of manufacturing steps compared to the prior art while maintaining the measurement pattern production accuracy. Another object of the present invention is to provide a measurement marker and a method for manufacturing the same.

[1] a plate-like substrate;
A retroreflective material that is provided on the base material and retroreflects irradiation light;
A measurement marker comprising a pattern having a plurality of openings provided by printing on the retroreflective material and transmitting the irradiation light.

[2] It further has a transparent substrate provided on the retroreflective material,
The said pattern is a marker for measurement as described in said [1] provided on the said transparent base material.

[3] The measurement marker according to [1] or [2], wherein the printed pattern covers at least a side surface portion of the retroreflective member in plan view.

[4] A step of providing a retroreflective material that retroreflects the irradiation light on a plate-shaped substrate;
Printing a pattern having a plurality of openings that transmit the irradiation light on a transparent substrate;
Providing the transparent base material on which the pattern is printed on the retroreflective material provided on the base material.

[5] A step of printing a pattern having a plurality of openings that transmit the irradiation light on a retroreflective material that retroreflects the irradiation light;
And a step of providing the retroreflective material on which the pattern is printed on a plate-like base material.

  According to the first and fourth aspects of the invention, in the measurement marker having the position measurement pattern that can be observed from any direction without the built-in light source, the manufacturing accuracy of the measurement pattern is maintained and compared with the conventional case. The manufacturing process can be reduced.

  According to the second and fifth aspects of the invention, the measurement pattern can be formed by a simpler method than in the first and fourth aspects.

  According to the invention which concerns on Claim 3, the irregular reflection by the side part of a retroreflection material can be suppressed.

FIG. 1 is a schematic diagram illustrating a configuration example of a position measurement system according to the first embodiment. FIG. 2 is a cross-sectional view illustrating a configuration example of the measurement marker. FIG. 3 is a cross-sectional view showing an example of a process of the manufacturing method of the measurement marker. FIG. 4 is a cross-sectional view illustrating a configuration example of a measurement marker according to the second embodiment. FIG. 5 is a cross-sectional view showing an example of the steps of the manufacturing method of the measurement marker.

[First Embodiment]
(Configuration of position measurement system)
FIG. 1 is a schematic diagram illustrating a configuration example of a position measurement system according to the first embodiment.

The position measurement system 5 includes a measurement marker 1A including a plurality of openings 14 for exposing a retroreflecting material (10, FIG. 2) that reflects light, an LED (Light Emitting Diode), and the like, and irradiation light l _e. The reflected light l _r of the irradiated light l _e reflected by the retroreflecting material exposed to the opening 14 of the measurement marker 1A, which includes a light source 2 that irradiates the measurement marker 1A, a CCD (Charge Coupled Device), and the like. The camera 3 to be photographed and the position measuring device 4 for recognizing the pattern of the plurality of openings 14 of the measurement marker 1A from the image photographed by the camera 3 and measuring the position and orientation of the measurement marker 1A.

The measurement marker 1 </ b> A has a print pattern 13 on a retroreflective material 10 to be described later, and has an unprinted portion as an opening 14. The retroreflective member 10 reflects the irradiation light l _e as reflected light l _{r in the} same direction as the incident direction (hereinafter referred to as “retro reflection”). Note that the measurement marker 1A is shown as a single unit in the figure, but a plurality of measurement markers may be prepared.

For example, the light source 2 is directly fixed to the camera 3 so as to irradiate the irradiation light l _e in a direction that matches the shooting direction of the camera 3. This is to maximize the intensity of the reflected light l _r by the retroreflecting material 10 that is directly incident on the camera 3.

The camera 3 captures visible light, but may detect only the wavelength of the reflected light l _r or may include a filter that transmits only the wavelength of the reflected light l _r .

  The position measurement device 4 includes an electronic component such as a CPU (Central Processing Unit) having a function for processing information and a storage unit, processes an image photographed by the camera 3, and determines the position of the measurement marker 1A. This is an information processing device for calculating the attitude. The position measuring device 4 is, for example, a personal computer, and a PDA (Personal Digital Assistant), a mobile phone, or the like can also be used.

(Configuration of measurement marker)
FIG. 2 is a cross-sectional view showing a configuration example of the measurement marker 1A.

  The measurement marker 1 </ b> A is configured by laminating a retroreflective material 10, a base material 11, a transparent base material 12, and a print pattern 13 so as to overlap each other. Here, the bonding of the members 10 to 13 is performed by bonding using an adhesive as described later, fusion between members, pressure bonding, or the like, and the method is not particularly limited.

  The retroreflective material 10 is, for example, a prism type retroreflective material that reflects incident light in the same direction, and has a thickness of about 0.3 to 0.5 mm. The retroreflective member 10 is bonded to the base material 11 with an adhesive 11a.

  The base material 11 is made of, for example, polyethylene, polypropylene, or the like, and has a thickness, for example, 5 mm, necessary to ensure sufficient rigidity so that the relative positions of the plurality of openings 14 do not change by deformation. In addition, as the base material 11, desirably, a plate-like base material having a flat surface without distortion is used.

The transparent substrate 12 is an OHP sheet or the like that can be printed by a printer or the like, and has a thickness of, for example, about 0.1 to 0.3 mm. The transparent substrate 12 is bonded to the retroreflective material 10 by an adhesive 10a that is transparent to the irradiation light l _e and the reflection light l _r .

The print pattern 13 is a pattern having an opening 14 printed on the transparent substrate 12 by a printer or the like, and is opaque to the irradiation light l _e and the reflection light l _r .

  The opening 14 has a circular shape with a diameter of about 6 mm. Further, the printing accuracy of the patterns of the plurality of openings 14 is suppressed to an error of less than 1% (for example, about 0.7%) by printing using a general printer.

  The printed pattern 13 covers the side surface of the retroreflective material 10 and suppresses irregular reflection by the side surface of the retroreflective material 10.

(Measurement marker manufacturing method)
Below, an example of the manufacturing method of the marker 1A for measurement is demonstrated, referring FIGS.

  FIG. 3 is a cross-sectional view showing an example of a process of the manufacturing method of the measurement marker 1A.

  First, as shown in FIG. 3 (a1), a plate-like substrate 11 is prepared.

  Next, the adhesive 11a is applied to the surface of the retroreflective material 10 of the base material 11, and the retroreflective material 10 is adhered as shown in FIG. 3 (b1).

  Further, as shown in FIG. 3 (a2), a transparent substrate 12 is prepared.

  Next, as shown in FIG. 3 (b2), a print pattern 13 is formed on the surface of the transparent substrate 12 by means of xerography, ink jet or the like using a printer or the like.

  Next, the transparent base material 12 on which the printed pattern 13 shown in FIG. 3 (b2) is formed on the base material 11 to which the retroreflective material 10 shown in FIG. 3 (b1) is bonded is shown in FIG. 3 (c). As shown, the measurement marker 1A is bonded by an adhesive 10a.

[Second Embodiment]
FIG. 4 is a cross-sectional view illustrating a configuration example of a measurement marker according to the second embodiment.

  The measurement marker 1 </ b> B is configured by laminating a retroreflective material 10, a base material 11, and a print pattern 13.

The print pattern 13 is a pattern having an opening 15 printed directly on the retroreflective member 10 by a printer or the like, and is opaque to the irradiation light l _e and the reflection light l _r .

  Further, the print pattern 13 is formed using an inkjet having a higher ink viscosity than xerography in order to cover the side surface of the retroreflective material 10 that causes irregular reflection. The irregular reflection by the side surface portion of the retroreflective member 10 decreases the accuracy with which the position measuring device 4 recognizes the pattern of the opening 15, and as a result, decreases the calculation accuracy of the position and orientation of the measurement marker 1 </ b> B.

(Measurement marker manufacturing method)
Hereinafter, an example of a method for manufacturing the measurement marker 1B will be described with reference to FIGS.

  FIG. 5 is a cross-sectional view showing an example of a process of the manufacturing method of the measurement marker 1B.

  First, as shown in FIG. 5A, a retroreflective material 10 is prepared.

  Next, as shown in FIG. 5B, a print pattern 13 is formed on the surface of the retroreflective member 10 by means of ink jet or the like using a printer or the like. For this reason, the retroreflective material 10 has a thickness equal to or smaller than a thickness that can be used by a printer that forms the print pattern 13.

  Next, the retroreflective material 10 on which the printed pattern 13 shown in FIG. 5B is formed is bonded to the base material 11 with an adhesive 11a as shown in FIG. 5C to form the measurement marker 1B.

[Other embodiments]
The present invention is not limited to the above embodiment, and various modifications can be made without departing from the gist of the present invention. For example, the size, shape, material, and the like of each member are not limited to the above embodiment. The print pattern 13 may be formed by applying a resist and using a technique such as photolithography.

  Moreover, you may perform each process of the manufacturing method of the marker for measurement demonstrated in FIG.3 and FIG.5, changing the order.

DESCRIPTION OF SYMBOLS 1A, 1B ... Measurement marker 2 ... Light source 3 ... Camera 4 ... Position measuring device 5 ... Position measuring system 10 ... Retroreflective material 10a ... Adhesive 11 ... Base material 11a ... Adhesive 12 ... Transparent base material 13 ... Print pattern 14 ... opening 15 ... opening l _e ... irradiated light l _r ... reflected light

Claims (5)

A plate-like substrate;
A retroreflective material that is provided on the base material and retroreflects irradiation light;
A measurement marker comprising a pattern having a plurality of openings provided by printing on the retroreflective material and transmitting the irradiation light. It further has a transparent substrate provided on the retroreflective material,
The measurement marker according to claim 1, wherein the pattern is provided on the transparent substrate.   The measurement marker according to claim 1 or 2, wherein the printed pattern covers at least a side surface portion of the retroreflective member in a plan view. Providing a retroreflective material for retroreflecting the irradiation light on a plate-like substrate;
Printing a pattern having a plurality of openings that transmit the irradiation light on a transparent substrate;
Providing the transparent base material on which the pattern is printed on the retroreflective material provided on the base material. Printing a pattern having a plurality of openings that transmit the irradiation light on a retroreflective material that retroreflects the irradiation light;
And a step of providing the retroreflective material on which the pattern is printed on a plate-like base material.

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