JP2009046339A - シリコン鋳造装置 - Google Patents
シリコン鋳造装置 Download PDFInfo
- Publication number
- JP2009046339A JP2009046339A JP2007212708A JP2007212708A JP2009046339A JP 2009046339 A JP2009046339 A JP 2009046339A JP 2007212708 A JP2007212708 A JP 2007212708A JP 2007212708 A JP2007212708 A JP 2007212708A JP 2009046339 A JP2009046339 A JP 2009046339A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- crucible
- beryllium
- cooling crucible
- casting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 82
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 82
- 239000010703 silicon Substances 0.000 title claims abstract description 82
- 238000005266 casting Methods 0.000 title claims abstract description 67
- 238000001816 cooling Methods 0.000 claims abstract description 70
- 229910052790 beryllium Inorganic materials 0.000 claims abstract description 33
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims abstract description 25
- 230000006698 induction Effects 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 230000005674 electromagnetic induction Effects 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 22
- 238000002844 melting Methods 0.000 abstract description 14
- 230000008018 melting Effects 0.000 abstract description 14
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- 239000010949 copper Substances 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 230000006866 deterioration Effects 0.000 description 9
- 238000011109 contamination Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000007711 solidification Methods 0.000 description 4
- 230000008023 solidification Effects 0.000 description 4
- 238000009749 continuous casting Methods 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910017532 Cu-Be Inorganic materials 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000003483 aging Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009291 secondary effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/001—Continuous growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Continuous Casting (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
【解決手段】軸方向の一部が周方向で複数に分割された導電性の無底冷却ルツボと、この冷却ルツボを取り囲む誘導コイルを有し、前記誘導コイルによる電磁誘導加熱により溶融したシリコンを下方に引き下げて凝固させるシリコン鋳造装置において、前記冷却ルツボの材質を、ベリリウムを含有する銅合金とする。前記銅合金のベリリウム含有量は、0.1〜5質量%とするのが望ましい。
【選択図】なし
Description
2:遮断手段
3:インゴット
4:引出し口
5:不活性ガス導入口
6:真空吸引口
7:冷却ルツボ
8:誘導コイル
9:アフターヒーター
10:原料導入管
11:シリコン原料
12:溶融シリコン
13:補助ヒーター
14:ガスシール部
15:引き抜き装置
16:ダイヤモンド切断機
Claims (2)
- 軸方向の一部が周方向で複数に分割された導電性の無底冷却ルツボと、この冷却ルツボを取り囲む誘導コイルを有し、前記誘導コイルによる電磁誘導加熱により溶融したシリコンを下方に引き下げて凝固させるシリコン鋳造装置において、
前記冷却ルツボの材質がベリリウムを含有する銅合金であることを特徴とするシリコン鋳造装置。 - 前記銅合金がベリリウムを0.1〜5質量%含有するものであることを特徴とする請求項1に記載のシリコン鋳造装置。
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007212708A JP5040521B2 (ja) | 2007-08-17 | 2007-08-17 | シリコン鋳造装置 |
| US12/222,743 US20090044926A1 (en) | 2007-08-17 | 2008-08-15 | Silicon casting apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007212708A JP5040521B2 (ja) | 2007-08-17 | 2007-08-17 | シリコン鋳造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009046339A true JP2009046339A (ja) | 2009-03-05 |
| JP5040521B2 JP5040521B2 (ja) | 2012-10-03 |
Family
ID=40362040
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007212708A Expired - Fee Related JP5040521B2 (ja) | 2007-08-17 | 2007-08-17 | シリコン鋳造装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20090044926A1 (ja) |
| JP (1) | JP5040521B2 (ja) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011104799A1 (ja) * | 2010-02-25 | 2011-09-01 | 株式会社Sumco | シリコンインゴットの連続鋳造方法 |
| WO2012011159A1 (ja) * | 2010-07-21 | 2012-01-26 | 株式会社Sumco | シリコンインゴットの連続鋳造方法 |
| WO2012011160A1 (ja) * | 2010-07-21 | 2012-01-26 | 株式会社Sumco | シリコンインゴットの電磁鋳造装置 |
| WO2012023165A1 (ja) * | 2010-08-16 | 2012-02-23 | 株式会社Sumco | シリコンの電磁鋳造装置 |
| WO2012046673A1 (ja) * | 2010-10-08 | 2012-04-12 | Jx日鉱日石金属株式会社 | シリコンインゴット製造用容器 |
| WO2012046674A1 (ja) * | 2010-10-08 | 2012-04-12 | Jx日鉱日石金属株式会社 | シリコンインゴット製造用容器 |
| JP2012533516A (ja) * | 2009-07-20 | 2012-12-27 | ピラー エルティーディー. | 誘導法により多結晶シリコンインゴットを製造するための装置 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5141020B2 (ja) * | 2007-01-16 | 2013-02-13 | 株式会社Sumco | 多結晶シリコンの鋳造方法 |
| US8562325B2 (en) * | 2009-07-03 | 2013-10-22 | Inductotherm Corp. | Remote cool down of a purified directionally solidified material from an open bottom cold crucible induction furnace |
| AU2009355442A1 (en) | 2009-11-20 | 2012-05-31 | Consarc Corporation | Electromagnetic casting apparatus for silicon |
| JP2012036056A (ja) * | 2010-08-11 | 2012-02-23 | Sumco Corp | シリコンの電磁鋳造装置 |
| CN102161090B (zh) * | 2010-12-23 | 2012-11-07 | 中国科学院金属研究所 | 一种提高厚大断面铸坯自补缩能力的方法 |
| JP2012166979A (ja) * | 2011-02-14 | 2012-09-06 | Sumco Corp | 多結晶シリコンの電磁鋳造方法および電磁鋳造装置 |
| CN104169475B (zh) * | 2012-03-26 | 2018-01-12 | 胜高股份有限公司 | 多晶硅及其铸造方法 |
| EP3691814B1 (en) * | 2017-10-05 | 2024-02-21 | Lam Research Corporation | Electromagnetic casting system and method including furnaces and molds for producing silicon tubes |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01264920A (ja) * | 1988-04-15 | 1989-10-23 | Osaka Titanium Co Ltd | シリコン鋳造装置 |
| JPH03294043A (ja) * | 1990-04-12 | 1991-12-25 | Dowa Mining Co Ltd | ベリリウム銅合金の連続鋳造方法 |
| JPH04305353A (ja) * | 1991-03-29 | 1992-10-28 | Ngk Insulators Ltd | ベリリウム銅合金の鋳造方法 |
| JPH08310898A (ja) * | 1995-05-15 | 1996-11-26 | Sumitomo Sitix Corp | シリコン鋳造装置 |
| JPH10101319A (ja) * | 1996-09-24 | 1998-04-21 | Sumitomo Sitix Corp | シリコン鋳造方法 |
| JPH10204559A (ja) * | 1997-01-20 | 1998-08-04 | Daido Steel Co Ltd | 低導電性Cu基合金 |
| JP2000264775A (ja) * | 1999-03-23 | 2000-09-26 | Sumitomo Sitix Amagasaki:Kk | 電磁誘導鋳造装置 |
| JP2002062054A (ja) * | 2000-08-18 | 2002-02-28 | Shinko Electric Co Ltd | 誘導加熱溶解炉 |
| JP2003160830A (ja) * | 2001-11-21 | 2003-06-06 | Km Europ Metal Ag | 鋳型製造用材料としての時効硬化性銅合金 |
| JP2004278882A (ja) * | 2003-03-14 | 2004-10-07 | Shinko Electric Co Ltd | 誘導加熱溶解炉 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4377424A (en) * | 1980-05-26 | 1983-03-22 | Chuetsu Metal Works Co., Ltd. | Mold of precipitation hardenable copper alloy for continuous casting mold |
| EP1254861B1 (en) * | 2000-12-28 | 2008-01-30 | Sumco Corporation | Silicon continuous casting method |
-
2007
- 2007-08-17 JP JP2007212708A patent/JP5040521B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-15 US US12/222,743 patent/US20090044926A1/en not_active Abandoned
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01264920A (ja) * | 1988-04-15 | 1989-10-23 | Osaka Titanium Co Ltd | シリコン鋳造装置 |
| JPH03294043A (ja) * | 1990-04-12 | 1991-12-25 | Dowa Mining Co Ltd | ベリリウム銅合金の連続鋳造方法 |
| JPH04305353A (ja) * | 1991-03-29 | 1992-10-28 | Ngk Insulators Ltd | ベリリウム銅合金の鋳造方法 |
| JPH08310898A (ja) * | 1995-05-15 | 1996-11-26 | Sumitomo Sitix Corp | シリコン鋳造装置 |
| JPH10101319A (ja) * | 1996-09-24 | 1998-04-21 | Sumitomo Sitix Corp | シリコン鋳造方法 |
| JPH10204559A (ja) * | 1997-01-20 | 1998-08-04 | Daido Steel Co Ltd | 低導電性Cu基合金 |
| JP2000264775A (ja) * | 1999-03-23 | 2000-09-26 | Sumitomo Sitix Amagasaki:Kk | 電磁誘導鋳造装置 |
| JP2002062054A (ja) * | 2000-08-18 | 2002-02-28 | Shinko Electric Co Ltd | 誘導加熱溶解炉 |
| JP2003160830A (ja) * | 2001-11-21 | 2003-06-06 | Km Europ Metal Ag | 鋳型製造用材料としての時効硬化性銅合金 |
| JP2004278882A (ja) * | 2003-03-14 | 2004-10-07 | Shinko Electric Co Ltd | 誘導加熱溶解炉 |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012533516A (ja) * | 2009-07-20 | 2012-12-27 | ピラー エルティーディー. | 誘導法により多結晶シリコンインゴットを製造するための装置 |
| WO2011104799A1 (ja) * | 2010-02-25 | 2011-09-01 | 株式会社Sumco | シリコンインゴットの連続鋳造方法 |
| WO2012011159A1 (ja) * | 2010-07-21 | 2012-01-26 | 株式会社Sumco | シリコンインゴットの連続鋳造方法 |
| WO2012011160A1 (ja) * | 2010-07-21 | 2012-01-26 | 株式会社Sumco | シリコンインゴットの電磁鋳造装置 |
| WO2012023165A1 (ja) * | 2010-08-16 | 2012-02-23 | 株式会社Sumco | シリコンの電磁鋳造装置 |
| WO2012046673A1 (ja) * | 2010-10-08 | 2012-04-12 | Jx日鉱日石金属株式会社 | シリコンインゴット製造用容器 |
| WO2012046674A1 (ja) * | 2010-10-08 | 2012-04-12 | Jx日鉱日石金属株式会社 | シリコンインゴット製造用容器 |
| JP5788892B2 (ja) * | 2010-10-08 | 2015-10-07 | Jx日鉱日石金属株式会社 | シリコンインゴット製造用容器 |
| JP5788891B2 (ja) * | 2010-10-08 | 2015-10-07 | Jx日鉱日石金属株式会社 | シリコンインゴット製造用容器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5040521B2 (ja) | 2012-10-03 |
| US20090044926A1 (en) | 2009-02-19 |
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