JP2008168173A - Reaction apparatus and reaction method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To more enhance reaction efficiency by increasing the contact areas per unit volume of both first and second reactants without contracting the dimensions in the layer thickness of the introducing passages of the first and second reactants. <P>SOLUTION: In this reaction apparatus, a flow channel 4a includes: a first introducing passage 10 into which the first reactant is introduced; a second introducing passage 12 into which the second reactant is introduced; a confluent passage 14 for allowing the first reactant flowing through the introducing passage 10 and the second reactant flowing through the second introducing passage 12 to meet with each other in a mutually separated layered flow state; and the reaction flow passage 16 connected to the confluent passage 14 on the downstream side thereof for allowing the layered flow of the first reactant and the layered flow of the second reactant to flow in the mutual contact state of both reactants to react both reactants in the mutual contact interface of them. The dimension d3 in the layer thickness direction vertical to the contact interface of the reaction flow channel 16 is set to become smaller than the sum of the dimension d1 in the layer thickness direction of the first introducing passage 10 and the dimension d2 in the layer thickness direction of the second introducing passage 12. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a reaction apparatus and a reaction method.

Conventionally, two reactants, a first reactant and a second reactant, are brought into contact with each other, and both reactants are reacted at their contact interface. In this case, in order to improve the reaction efficiency of both reactants, the contact area per unit volume of both reactants is increased by bringing both reactants into contact with each other while flowing in layers. For example, in the reaction apparatus disclosed in Patent Document 1 below as an example, the first and second reactants are circulated in a thin film reaction channel in layers, and the two reactants are brought into contact with each other. It is made to react and the desired reaction product is produced | generated. Specifically, an introduction path for introducing the reactant into the reaction channel is provided in the reactor of Patent Document 1, and this introduction path is divided into two vertically by a rectifying plate. . Then, the first reactant is caused to flow in one of the introduction paths partitioned by the rectifying plate and the second reactant is caused to flow in the other, and these two reactants are moved up and down in the reaction channel located downstream of the introduction path. They are in contact with each other in the state of laminar flow separated into two, and both reactants react at the contact interface.
JP 2004-290971 A

  In the reaction apparatus disclosed in Patent Document 1, the first reactant introduced into one of the introduction paths and the second reactant introduced into the other overlap with each other in the reaction channel while maintaining almost the same layer thickness. By the way, there is a limit in the formation process in order to make the layer thickness of the upper and lower portions in the introduction path partitioned by the rectifying plate small, resulting in the layer thickness of the first reactant and the layer of the second reactant. There is a limit to reducing the thickness. For this reason, in the structure of the said patent document 1, there exists a limit also in the increase in the contact area per unit volume of both the reactants in a reaction channel, and a limit arises in the improvement of reaction efficiency.

  The present invention has been made to solve the above-described problems, and the object of the present invention is to reduce the size of both the reactants without reducing the dimension in the layer thickness direction of the introduction path of the first reactant and the second reactant. It is to increase the contact area per unit volume to further improve the reaction efficiency.

  In order to achieve the above object, a reaction apparatus according to the present invention is a reaction apparatus for reacting a first reactant and a second reactant while circulating them, extending in a specific direction, and extending along the direction. A flow path structure having a flow path through which one reactant and the second reactant are circulated is provided. The flow path is disposed on the inlet side of the flow path and the first introduction path into which the first reactant is introduced and the first wall sandwiching the partition wall provided in the flow path structure. The second introduction path disposed apart from the introduction path and connected to the downstream side of the first introduction path and the second introduction path through which the second reactant is introduced, and flows through the first introduction path. 1 reactant and the second reactant flowing through the second introduction channel are joined together in a laminar flow state separated from each other, connected to the downstream side of the joined channel, the laminar flow of the first reactant and the A laminar flow of the second reactant in a state where both the reactants are in contact with each other and a reaction channel for reacting both the reactants at each other's contact interface, and perpendicular to the contact interface of the reaction channel The dimension in the layer thickness direction is the same as the dimension in the layer thickness direction of the first introduction path. Serial are set to be smaller than the sum of the layer thickness dimension of the second introduction path.

  In this reaction apparatus, the dimension in the layer thickness direction perpendicular to the contact interface between the first reactant and the second reactant in the reaction channel is such that the dimension in the layer thickness direction of the first introduction path and the layer in the second introduction path. Since it is set to be smaller than the sum of the dimensions in the thickness direction, the first and second reactants are brought into contact with each other in a thin film shape in the reaction channel than in the first and second introduction channels. be able to. For this reason, the layer thicknesses of both the reactants in the reaction channel can be reduced without reducing the dimension in the layer thickness direction of the first introduction channel and the second introduction channel. The contact area per unit volume can be increased. Therefore, in this reaction apparatus, the contact area per unit volume of both the reactants can be increased and the reaction efficiency can be further improved without reducing the dimension in the layer thickness direction of the first introduction path and the second introduction path. it can.

  In the reaction apparatus, the first introduction path and the reaction flow path are formed using a single flow path that extends linearly and has a uniform dimension in the layer thickness direction. The laminar flow of the second reactant flowing from the second introduction channel is merged from the layer thickness direction with the laminar flow of the first reactant flowing linearly from the first introduction channel to the reaction channel. It is preferably configured to be introduced. If comprised in this way, in addition to the 1st reactant which flows through the 1st introduction way in the reaction channel which has the size of the above-mentioned layer thickness direction equal to the 1st introduction way, the 2nd reactant which flows through the 2nd introduction way Since they can be made to flow together, the contact area per unit volume of both reactants can be reliably increased in the reaction channel without reducing the dimension in the layer thickness direction of both introduction paths. Further, in this configuration, since the flow of the first reactant can be prevented from being bent in the layer thickness direction in the process from the first introduction passage to the reaction passage, the resistance applied to the flow of the first reactant is reduced. And the first reactant can be distributed smoothly. Further, in this configuration, since the flow path from the first introduction path to the reaction flow path can be formed linearly in the flow path structure, compared to the case where the flow path of this portion is bent, The formation process can be simplified.

  In the reaction apparatus, the flow path structure includes an intermediate substrate, a front substrate and a back substrate sandwiching the intermediate substrate from both front and back sides in the layer thickness direction, and the intermediate substrate has a surface in a specific direction. A front surface side groove portion is formed, and a back surface side groove portion extending in the specific direction is formed at a position corresponding to the front surface side groove portion on a back surface of the intermediate substrate, and an opening portion of the front surface side groove portion is the front side The first introduction path is formed by being covered by the substrate, and the second introduction path is formed by covering the opening of the back surface side groove by the back side substrate. It is preferable that a region sandwiched between the front surface side groove portion and the back surface side groove portion is used as the partition wall.

  As a method of forming the first introduction path and the second introduction path in a state separated from each other in the flow path structure, after forming a single flow path in the flow path structure, the flow path is placed in the middle in the layer thickness direction. It is also conceivable to form both introduction paths by partitioning with separate partition plates. However, in this method, when the dimension in the thickness direction of the channel structure is small and the dimension in the layer thickness direction of the channel is very small, the operation of attaching the partition plate to partition the channel is very complicated. It will be a thing. On the other hand, according to the above configuration, after the partition wall is first formed on the intermediate substrate, the intermediate substrate is sandwiched between the front substrate and the back substrate from both the front and back sides in the layer thickness direction. Since the side groove portion can be used as the first introduction passage and the back side groove portion on the back side of the partition wall can be used as the second introduction passage, the dimension in the thickness direction of the flow channel structure is small, and the layer thickness of the flow channel Even when the direction dimension is very small, the first introduction path and the second introduction path can be easily formed. Therefore, in the above configuration, the first introduction path and the second introduction path can be easily formed even when the dimension in the thickness direction of the flow path structure is small.

  In the reaction apparatus, the combined flow path is formed such that a length along a flow direction of the first reactant and the second reactant is larger than a dimension of the partition wall in the layer thickness direction. It is preferable. With this configuration, when the first reactant flows from the first introduction path into the combined flow path and the second reactant flows from the second introduction path and merges, the layer thickness direction of the flow of the first reactant And / or the movement of the second reactant in the layer thickness direction can be reduced, and both the reactants can be smoothly merged along the flow direction. As a result, the first reactant and the second reactant can be easily joined together in a laminar flow state separated from each other.

  In this case, for example, the combined flow path is formed such that the length along the flow direction of the first reactant and the second reactant is at least 10 times the dimension of the partition wall in the layer thickness direction. It is preferable.

  In the above reaction apparatus, it is preferable that the flow path structure has a dividing wall that divides the flow path into a plurality of parts in a width direction orthogonal to a flow direction of the first reactant and the second reactant. In this way, while ensuring a constant flow rate of the reactants as a whole flow path, the difference between the dimension in the width direction of the reaction flow path and the dimension in the layer thickness direction is reduced in each divided flow path. Can do. This prevents a decrease in the reaction efficiency between the two reactants in the reaction channel even when the channel structure is installed inclined in the width direction of the channel while ensuring a constant reaction efficiency for the entire channel. can do. That is, when the flow channel structure is installed inclined in the width direction of the flow channel, the contact interface of both the reactants formed in the reaction flow channel is between the both side surfaces in the layer thickness direction of the reaction flow channel. It may be formed in a form that connects. In this case, in the structure in which the channel is not divided in the width direction and the dimension in the layer thickness direction is considerably smaller than the dimension in the width direction of the reaction channel, the contact interface is not tilted. However, the reduction in the area of the contact interface from the state where the two are formed so as to connect both side surfaces in the width direction of the reaction channel is considerably increased. In this case, the reaction efficiency between the two reactants is significantly reduced. In contrast, if the difference between the dimension in the width direction of the reaction channel and the dimension in the layer thickness direction becomes small as in the above configuration, the channel structure is inclined and the contact interface is in the layer thickness direction of the reaction channel. Even if it is formed so as to connect the two side surfaces, the reduction in the area of the contact interface can be reduced. For this reason, in the said structure, even when a flow path structure is inclined and installed in the width direction of a flow path, the fall of the reaction efficiency between both the reactants in a reaction flow path can be suppressed.

  In the reaction apparatus, it is preferable that a plurality of the flow path structures are stacked. If comprised in this way, since it can be made to react, distribute | circulating more 1st reactants and 2nd reactants, the production | generation efficiency of the reaction product in the whole reaction apparatus can be improved more.

  The reaction method according to the present invention is a reaction method using any one of the above reaction apparatuses, wherein the first reactant is introduced into the first introduction path and the second reactant is introduced into the second introduction path, The first reactant and the second reactant are joined together in a laminar flow state separated from each other in the joint channel, and then the joined laminar flow of the first reactant and laminar flow of the second reactant are both. While the reactants are in contact with each other, the reactants are allowed to flow through the reaction channel, and the two reactants are reacted at the contact interface with each other.

  In this reaction method, the first reactant and the second reactant that are circulated using the above-described reaction apparatus are reacted, so that the dimension in the layer thickness direction of the introduction path of the first reactant and the second reactant is reduced. In addition, the contact area per unit volume of both the reactants can be increased to further improve the reaction efficiency.

  As described above, according to the present invention, the contact area per unit volume of both the reactants can be increased without reducing the dimension in the layer thickness direction of the introduction path of the first reactant and the second reactant. The reaction efficiency can be further improved.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a perspective view of a flow path structure 2 constituting a reaction apparatus according to an embodiment of the present invention, and FIG. 2 is an exploded perspective view of the flow path structure 2 shown in FIG. 3 is a cross-sectional view taken along the flow path 4a of the flow path structure 2 shown in FIG. 1, and FIG. 4 shows the flow state of the first and second reactants in the flow path 4a. FIG. 4 is a cross-sectional view corresponding to FIG. 3. First, with reference to FIGS. 1-4, the structure of the reaction apparatus by one Embodiment of this invention is demonstrated.

  The reaction apparatus according to the present embodiment reacts the two reactants with each other while allowing the two reactants, the first reactant and the second reactant, to flow through the reaction channel 16 described later, thereby producing a desired reaction product. Is to be generated. This reaction apparatus includes a flow channel structure 2 shown in FIG.

  The flow path structure 2 has a flat rectangular parallelepiped outer shape, and is installed so that its longitudinal direction is horizontal. Inside the flow channel structure 2, a flow channel 4 is provided for circulating the first and second reactants. The flow path 4 is divided into three flow paths 4 a in the width direction by a dividing wall 2 a provided in the flow path structure 2. That is, three flow paths 4 a having the same configuration are provided at equal intervals in the width direction of the flow path structure 2. Each flow path 4a extends in the longitudinal direction of the flow path structure 2, and the flow path 4a extends in the horizontal direction in a state where the flow path structure 2 is installed. As shown in FIG. 3, each flow path 4 a includes a first introduction path 10, a second introduction path 12, a combined flow path 14, and a reaction flow path 16.

  The first introduction path 10 and the second introduction path 12 are both arranged on the inlet side of the flow path 4a. The first introduction path 10 and the second introduction path 12 are each formed to have a rectangular cross section, and have the same width and the same length. The first introduction path 10 and the second introduction path 12 are spaced apart from each other across the partition wall 2b provided in the flow path structure 2, and extend in parallel and in the horizontal direction. The first introduction path 10 is a part where the first reactant is introduced, and the second introduction path 12 is a part where the second reactant is introduced.

  The joint channel 14 is connected to the downstream side of the first introduction channel 10 and the second introduction channel 12. As shown in FIG. 4, the joint channel 14 is a portion that joins the first reactant flowing through the first introduction passage 10 and the second reactant flowing through the second introduction passage 12 in a laminar flow state separated from each other. . The combined flow path 14 has a length l (see FIG. 3) along the flow direction of the first and second reactants of the dimension t (see FIG. 3) in the layer thickness direction of the partition wall 2b. It is formed to be 10 times or more. The combined flow path 14 has a width equal to the width of the first introduction path 10 and the second introduction path 12 and is formed in a rectangular cross section.

  In addition, the combined flow path 14 is configured so that the laminar flow of the second reactant flowing from the second introduction path 12 is compared with the first reactant and the second reaction with respect to the laminar flow of the first reactant flowing linearly from the first introduction path 10. It is comprised so that it may join from the layer thickness direction perpendicular | vertical to the contact interface of an agent. Specifically, the sealing wall 2d of the flow path structure 2 is provided on the downstream side of the combined flow path 14 located on the extension line of the second introduction path 12 up to the same height as the upper surface of the partition wall 2b. The combined flow path 14 is formed in a region between the sealing wall 2d and the downstream end of the partition wall 2b. Then, the flow of the second reactant hits the sealing wall 2d, moved upward through the space between the downstream end of the partition wall 2b and the sealing wall 2d, and flowed from the first introduction path 10 into the combined flow path 14. It merges with the laminar flow of the first reactant.

  The reaction flow path 16 is connected to the downstream side of the combined flow path 14 so that the first and second reactants merged in the combined flow path 14 flow in. The reaction channel 16 allows the laminar flow of the first reactant and the laminar flow of the second reactant to flow in a state where both the reactants are in contact with each other and causes both the reactants to react at the contact interface with each other. is there. In the present embodiment, as shown in FIG. 3, the dimension d3 in the layer thickness direction perpendicular to the contact interface of the reaction channel 16 is equal to the dimension d1 in the layer thickness direction of the first introduction path 10 and the second introduction path. 12 is set to be smaller than the sum of the dimension d2 in the layer thickness direction. Specifically, the reaction channel 16 extends linearly with the first introduction channel 10 and is formed using a single channel having a uniform dimension in the layer thickness direction. That is, the dimension d3 of the reaction channel 16 in the layer thickness direction and the dimension d1 of the first introduction channel 10 in the layer thickness direction are equal to each other. Then, in addition to the first reactant flowing linearly from the first introduction path 10 in the reaction flow path 16 having the same dimension in the layer thickness direction as the first introduction path 10, the second flow flowing from the second introduction path 12. The two reactants join together and flow. The reaction channel 16 is formed in a rectangular cross section having the same width as the first introduction channel 10 and the combined channel 14.

  Next, a specific structure of the above-described flow path structure 2 will be described.

  As shown in FIG. 2, the flow path structure 2 includes an intermediate substrate 2e, and a front substrate 2f and a rear substrate 2g that sandwich the intermediate substrate 2e from both front and back sides in the layer thickness direction. The intermediate substrate 2e, the front substrate 2f, and the back substrate 2g are all made of stainless steel. Then, the front surface of the intermediate substrate 2e and the back surface of the front substrate 2f are diffusion bonded, and the back surface of the intermediate substrate 2e and the front surface of the back substrate 2g are diffusion bonded. 2 is formed.

  Both the front substrate 2f and the back substrate 2g are flat plates whose front and back surfaces are formed in a flat shape. A surface-side groove 2h is formed on the surface of the intermediate substrate 2e over the entire longitudinal direction thereof. Three front side grooves 2h are formed at equal intervals in the width direction of the intermediate substrate 2e. The surface side groove 2h is for forming the first introduction path 10, the upper part of the combined flow path 14, and the reaction flow path 16, and the dimension d1 in the layer thickness direction of the first introduction path 10 and the reaction. The channel 16 is formed with a depth equal to the dimension d3 in the layer thickness direction. The first introduction passage 10 and the reaction passage 16 are formed by covering the opening of the surface side groove 2h with the front substrate 2f.

  Further, a back surface side groove 2i is formed along the longitudinal direction of the back surface of the intermediate substrate 2e. The back surface side groove 2i is formed at a position corresponding to each front surface side groove 2h. The back surface side groove 2 i forms the second introduction path 12 and the lower part of the combined flow path 14, and is formed in a range of the combined length of the second introduction path 12 and the combined flow path 14. And the back surface side groove part 2i is formed in the depth equal to the dimension d2 of the said layer thickness direction of the said 2nd introduction path 12. FIG. The second introduction path 12 is formed by covering the opening of the back-side groove 2i with the back-side substrate 2g.

  The partition wall 2b is formed by a region sandwiched between the front surface side groove 2h and the back surface side groove 2i of the intermediate substrate 2e. A part of the partition wall 2b corresponding to the formation region of the joining channel 14 is opened so as to penetrate in the layer thickness direction, and the joining is performed by covering the part from the front and back sides with the front side substrate 2f and the back side substrate 2g. A path 14 is formed. And the said sealing wall 2d is comprised by the part which has the wall surface which is located in the reaction flow path 16 side of the opening which comprises this combined flow path 14, and extends in the said layer thickness direction. Further, a portion left between adjacent pairs of the front surface side groove portion 2h and the back surface side groove portion 2i is used as the dividing wall 2a.

  As a method for processing the intermediate substrate 2e, first, the surface side groove 2h is formed by etching on the surface of a flat plate-like stainless steel substrate over the entire longitudinal direction. And the said back surface side groove part 2i is formed in the position corresponding to each surface side groove part 2h along the longitudinal direction of the back surface of the stainless steel substrate by an etching. At this time, the back surface side groove portion 2i is formed in a range of a length in which the second introduction path 12 and the combined flow path 14 are combined. Thereafter, the portion corresponding to the formation region of the joint channel 14 is removed by etching in the partition wall 2b sandwiched between the front surface side groove portion 2h and the back surface side groove portion 2i so as to penetrate in the layer thickness direction. Let Thereby, the joint channel 14 is formed. In this way, the structure of the intermediate substrate 2e is formed.

  Next, the reaction method using the reaction apparatus according to the present embodiment will be described with reference to FIGS.

  First, as shown in FIG. 3, the first reactant is introduced into the first introduction path 10 and the second reactant is introduced into the second introduction path 12. As a result, the first reactant flows into the combined flow path 14 through the first introduction path 10, and the second reactant flows into the combined flow path 14 through the second introduction path 12.

  At this time, in the joining channel 14, the first reactant and the second reactant join together in a laminar flow state separated from each other in the layer thickness direction. Here, since the path from the first introduction path 10 to the reaction path 16 via the combined path 14 is linearly connected, the laminar flow of the first reactant flows linearly. On the other hand, the path from the second introduction path 12 to the reaction flow path 16 is bent upward in the portion of the combined flow path 14, that is, to the flow path side of the first reactant. For this reason, the second reactant moves upward (first reactant side) in the layer thickness direction while hitting the sealing wall 2d at the portion of the combined flow path 14, and merges with the laminar flow of the first reactant.

  At this time, in this embodiment, the length l (see FIG. 3) along the flow direction of the first reactant and the second reactant of the combined channel 14 is between the first introduction channel 10 and the second introduction channel 12. The movement of the laminar flow of the second reactant in the layer thickness direction is downstream of the dimension t (see FIG. 3) of the partition wall 2b that partitions the partition wall 2b. It is very small compared to the movement to the side. Thus, the second reactant smoothly joins the laminar flow of the first reactant in a laminar flow state.

  The combined laminar flow of the first reactant and laminar flow of the second reactant are introduced into the reaction channel 16 in that state. Then, both the reactants react with each other at the contact interface while flowing through the reaction flow path 16 to generate a desired reaction product. As described above, the reaction between the first reactant and the second reactant according to the present embodiment is performed.

  As described above, in the present embodiment, the dimension d3 of the reaction channel 16 in the layer thickness direction is equal to the dimension d1 of the first introduction channel 10 in the layer thickness direction and the dimension of the second introduction channel 12 in the layer thickness direction. Since the reaction channel 16 is set to be smaller than the sum of d2 and d2, the first reactant and the second reactant are brought into contact with each other in a thin film form in the first introduction channel 10 and the second introduction channel 12. be able to. For this reason, the layer thicknesses of both the reactants in the reaction channel 16 can be reduced without reducing the dimension of the first introduction path 10 and the second introduction path 12 in the layer thickness direction. The contact area per unit volume of both reactants can be increased. Therefore, in this embodiment, the contact area per unit volume of both reactants is increased and the reaction efficiency is further improved without reducing the dimension of the first introduction path 10 and the second introduction path 12 in the layer thickness direction. be able to.

  In the present embodiment, the first introduction channel 10 and the reaction channel 16 are formed using a single channel that extends linearly and has a uniform dimension in the layer thickness direction. The passage 14 joins the laminar flow of the second reactant from the second introduction passage 12 to the laminar flow of the first reactant that flows linearly from the first introduction passage 10 from the layer thickness direction, thereby reacting the reaction passage 16. It is configured to be introduced. Thereby, in addition to the first reactant flowing through the first introduction passage 10 in the reaction passage 16 having the same dimension in the layer thickness direction as the first introduction passage 10, the second reactant flowing through the second introduction passage 12 is added. Since they can be combined and flowed, the contact area per unit volume of both the reactants can be reliably increased in the reaction channel 16 without reducing the dimension in the layer thickness direction of both introduction paths. Furthermore, with the above configuration, the flow of the first reactant can be prevented from being bent in the layer thickness direction in the process from the first introduction channel 10 to the reaction channel 16, so that the resistance applied to the first reactant flow is reduced. And the first reactant can be smoothly distributed. In addition, since the flow path from the first introduction path 10 to the reaction flow path 16 can be formed in a straight line in the flow path structure 2, compared with the case where the flow path of this portion is bent. The formation process can be simplified.

  In the present embodiment, the first introduction path 10 is formed by covering the opening of the surface side groove 2h of the intermediate substrate 2e constituting the flow path structure 2 with the front substrate 2f, and the intermediate substrate 2e. The second introduction path 12 is formed by covering the opening of the back surface side groove 2i with the back side substrate 2g, and the region sandwiched between the front surface side groove 2h and the back surface side groove 2i of the intermediate substrate 2e is partitioned. Used as the wall 2b.

  As a method of forming the two introduction paths in the flow path structure in a separated state, a single flow path is formed in the flow path structure, and then the flow path is divided into a separate member in the middle of the layer thickness direction. It is also conceivable to form both introduction paths by partitioning them with each other. However, in this method, when the dimension in the thickness direction of the channel structure is small and the dimension in the layer thickness direction of the channel is very small, the operation of attaching the partition plate to partition the channel is very complicated. It will be a thing. On the other hand, according to the above configuration, after the partition wall 2b is formed on the intermediate substrate 2e, the intermediate substrate 2e is sandwiched between the front substrate 2f and the back substrate 2g from the front and back sides in the layer thickness direction. Since the front-side groove 2h on the front side of the partition wall 2b can be used as the first introduction path 10, and the back-side groove 2i on the back side of the partition wall 2b can be used as the second introduction path 12, the flow path structure 2 The first introduction path 10 and the second introduction path 12 can be easily formed even when the dimension in the thickness direction is small and the dimension in the layer thickness direction of the flow path 4a is very small. Therefore, even when the dimension of the flow path structure 2 in the thickness direction is small, the first introduction path 10 and the second introduction path 12 can be easily formed.

  Further, in the present embodiment, the length l along the flow direction of the first reactant and the second reactant in the combined flow path 14 is configured to be 10 times or more the dimension t in the layer thickness direction of the partition wall 2b. Therefore, when the first reactant flows into the combined flow path 14 from the first introduction path 10 and the second reactant flows into the combined flow path 12 and merges, the layer thickness of the flow of the second reactant is The movement in the direction can be reduced, and both the reactants can be smoothly joined along the flow direction. Thereby, it can be made easy to join the 1st reactant and the 2nd reactant in the state of laminar flow which mutually separated.

  In the present embodiment, since the flow path structure 2 has the dividing wall 2a that divides the flow path 4 in the width direction, the flow path 4 as a whole is divided while securing a constant flow rate of the reactant. In each channel 4a, the difference between the width of the reaction channel 16 and the dimension d3 in the layer thickness direction can be reduced. Thus, the reaction efficiency between the two reactants in the reaction channel 16 is ensured even when the channel structure 2 is installed inclined in the width direction of the channel 4 while ensuring a certain reaction efficiency for the entire channel 4. Can be suppressed.

  That is, when the flow channel structure 2 is installed inclined in the width direction of the flow channel 4, the reaction flow channel 16 is similarly inclined in the width direction. 5 to 10 show a cross section perpendicular to the flow direction of the reactant in the reaction channel 16. Of these drawings, FIGS. 5 to 7 show the reaction channel 16 as the inclination angle θ in the width direction of the reaction channel 16 increases when the channel 4 is not divided in the width direction. It shows how the contact interface between the first and second reactants of the inner surface changes. On the other hand, FIGS. 8 to 10 show changes in the contact interface corresponding to FIGS. 5 to 7 when the flow path 4 is divided in the width direction as in the present embodiment.

  When the flow path 4 is not divided in the width direction, the width of the reaction flow path 16 is very large as compared with the dimension in the layer thickness direction as shown in FIG. In this case, when the inclination angle θ of the reaction channel 16 gradually increases from the state of FIG. 5 through the state of FIG. 6 to the state of FIG. 7, the reaction channel 16 in the state of FIG. The contact interface is formed so as to connect between both side surfaces of the reaction channel 16 in the layer thickness direction. In this case, the area of the contact interface is greatly reduced as compared with the state of FIG. 6 in which the contact interface connects both side surfaces of the reaction channel 16 in the width direction.

  On the other hand, when the flow path 4 is divided by the dividing wall 2a as in the present embodiment, the difference between the width of the reaction flow path 16 and the dimension in the layer thickness direction in each divided flow path 4a. It is smaller than the case where the flow path 4 is not divided. In this case, as shown in FIGS. 8 to 10, even if the inclination angle θ of the reaction channel 16 increases as described above, the contact interface between the two reactants is between the side surfaces in the width direction of the reaction channel 16. The connected state is maintained, and the area of the contact interface is hardly reduced. Furthermore, even if the reaction channel 16 is inclined more than the inclination angle θ of FIG. 10 and the contact interface is formed to connect both side surfaces of the reaction channel 16 in the layer thickness direction, Since the difference between the width and the dimension in the layer thickness direction is small, the reduction rate of the area of the contact interface from the state of FIG. 10 can be suppressed small. For this reason, in the configuration of the present embodiment, even when the flow channel structure 2 is installed to be inclined in the width direction of the flow channel 4, it is possible to suppress a decrease in reaction efficiency between the two reactants in the reaction flow channel 16. it can.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is shown not by the above description of the embodiments but by the scope of claims for patent, and further includes meanings equivalent to the scope of claims for patent and all modifications within the scope.

  For example, in the above-described embodiment, the length l along the flow direction of the first reactant and the second reactant in the combined channel 14 is configured to be 10 times or more the dimension t in the layer thickness direction of the partition wall 2b. However, the configuration is not limited to this. That is, the length l along the flow direction of the first reactant and the second reactant in the combined channel 14 may be any length as long as it is larger than the dimension t of the partition wall 2b in the layer thickness direction.

  Further, in the above embodiment, the case where the reaction apparatus has only a single flow path structure 2 has been described as an example. However, the present invention is not limited to this, and a plurality of devices such as the first modification of the above embodiment shown in FIG. These flow path structures may be laminated. If comprised in this way, since it can be made to react, distribute | circulating more 1st reactants and 2nd reactants, the production | generation efficiency of the reaction product in the whole reaction apparatus can be improved more.

  Further, not limited to the configuration of the above embodiment, the reaction flow channel 16 is on the extension line of the first introduction channel 10 in the layer thickness direction like the flow channel structure 22 according to the second modification of the above embodiment shown in FIG. It may be shifted from the position. That is, the reaction channel 16 may be formed in an intermediate region between the first introduction channel 10 and the second introduction channel 12 in the layer thickness direction. Also in this case, the dimension d3 of the reaction channel 16 in the layer thickness direction is based on the sum of the dimension d1 of the first introduction channel 10 in the layer thickness direction and the dimension d2 of the second introduction channel 12 in the layer thickness direction. Is set to be smaller. With this configuration, the area of the contact interface per unit volume of the first reactant and the second reactant can be increased in the reaction channel 16, so the first introduction channel 10 and the second introduction channel 12. Without reducing the dimension in the layer thickness direction, it is possible to increase the contact area per unit volume of both the reactants and obtain the same effect as in the above-described embodiment in which the reaction efficiency can be further improved.

  Further, when the reaction channel 16 is provided at the intermediate position in the thickness direction of the channel structure 32 as in the channel structure 32 according to the third modification shown in FIG. The front surface side and the back surface side of the end portion 33 may be formed in a slope shape so that the thickness of the partition wall 2b gradually decreases toward the downstream side. Further, in this configuration, the region 34 corresponding to the downstream end of the combined flow path 14 of the front substrate 2f and the area 35 corresponding to the downstream end of the combined flow path 14 of the back substrate 2g are arranged in the layer toward the downstream side. You may form in the slope shape which inclines in the direction which mutually approaches in the thickness direction. With this configuration, the laminar flow of the first reactant flowing through the first introduction path 10 and the laminar flow of the second reactant flowing through the second introduction path 12 can be smoothly merged in the merge path 14. The combined laminar flow can be smoothly introduced into the reaction channel 16.

  Further, like the flow path structure 42 according to the fourth modification shown in FIG. 14, the rear surface of the end portion 43 on the side of the combined flow path 14 of the partition wall 2b is made the surface toward the downstream side in the same configuration as the above embodiment. You may form in the slope shape which inclines so that it may approach. Further, in this configuration, the wall surface of the sealing wall 2d on the side of the combined flow path 14 may be formed in a slope shape that is inclined so as to approach the surface side of the flow path structure 42 as it goes downstream. In this case, the laminar flow of the second reactant flowing through the second introduction channel 12 is smoothly introduced into the reaction channel 16 while being merged more smoothly with the laminar flow of the first reactant in the merged channel 14. Can do.

  Further, like the flow path structure 52 according to the fifth modification shown in FIG. 15, both the front and back sides of the end portion 53 on the side of the combined flow path 14 of the partition wall 2b in the same configuration as the second modification shown in FIG. These corners may be formed with roundness, and the corners of the region corresponding to the downstream end of the combined channel 14 in the front substrate 2f and the back substrate 2g may be formed with roundness.

  Further, like the flow path structure 62 according to the sixth modification shown in FIG. 16, the corners on both the front and back sides of the end 63 on the side of the combined flow path 14 of the partition wall 2b are formed with roundness in the same configuration as the above embodiment. In addition, the corners on the surface side of the sealing wall 2d may be rounded.

  Further, like the flow path structure 72 according to the seventh modification shown in FIG. 17, both the front and back sides of the end 73 on the side of the combined flow path 14 of the partition wall 2b in the same configuration as the third modification shown in FIG. These corners may be formed with roundness, and the corners of the region corresponding to the downstream end of the combined channel 14 in the front substrate 2f and the back substrate 2g may be formed with roundness.

  Further, like the flow path structure 82 according to the eighth modification shown in FIG. 18, the back surface side of the end portion 83 on the side of the combined flow path 14 of the partition wall 2b in the same configuration as the fourth modification shown in FIG. The corners may be rounded and the corners on the surface side of the sealing wall 2d may be rounded.

  By rounding each corner as in the fifth to eighth modifications, the merging of the laminar flow of the first reactant and the laminar flow of the second reactant in the merging channel 14 becomes smoother. The introduction of both the reactants from the combined channel 14 to the reaction channel 16 becomes smoother.

  Moreover, in the said embodiment, although the intermediate | middle board | substrate 2e, the front side board | substrate 2f, and the back side board | substrate 2g which comprise the flow-path structure 2 were all made from stainless steel, you may form these each board | substrate with another material. For example, each substrate may be formed using a material such as titanium, glass, ceramics, or resin.

  In the above embodiment, the intermediate substrate 2e, the front side substrate 2f, and the back side substrate 2g constituting the flow path structure 2 are joined by diffusion bonding, but the present invention is not limited to this configuration. In other words, the substrates may be joined by a joining method other than diffusion joining such as brazing, welding, or joining using an adhesive.

  Moreover, in the said embodiment, although formation of the surface side groove part 2h and the back surface side groove part 2i of the intermediate substrate 2e, and the opening of the partition wall 2b for forming the combined flow path 14 were all performed by etching, formation of these each part is etched. Other processing methods may be used. For example, the above portions may be formed on the intermediate substrate 2e by a processing method such as machining, laser processing, or electrolytic polishing.

  Moreover, in the said embodiment, although the 1st introduction path 10, the 2nd introduction path 12, the combined flow path 14, and the reaction flow path 16 were all formed in the cross-sectional rectangular shape, this invention is not limited to this structure. For example, these portions may be formed to have a cross-sectional shape other than a circular shape or other rectangular shapes.

  Further, the first introduction path 10, the second introduction path 12, and the reaction flow path 16 may be formed such that the width and the dimension in the layer thickness direction have an arbitrary dimension ratio. For example, the first introduction path 10, the second introduction path 12, and the reaction flow path 16 are formed into a thin film shape in which the dimension in the layer thickness direction is very small with respect to the width or a shape in which the width and dimension in the layer thickness direction are substantially equal. May be formed respectively.

  Moreover, although the said embodiment demonstrated taking the example of the structure by which the 1st introduction path 10 and the 2nd introduction path 12 were arrange | positioned up and down, this invention is not limited to this. That is, the present invention can also be applied to a configuration in which the first introduction path 10 and the second introduction path 12 are spaced apart from each other in various directions other than the vertical direction with the partition wall 2b interposed therebetween. For example, the present invention can be applied to a configuration in which the first introduction path 10 and the second introduction path 12 are spaced apart in the left-right direction. Moreover, you may form the flow-path structure 2 by arrange | positioning the structure of the said embodiment reversely (front and back). That is, the first introduction path 10 and the reaction channel 16 linearly connected to the first introduction path 10 are arranged on the back surface side of the channel structure 2, while the second introduction path 12 is arranged on the surface side, 2 The laminar flow of the second reactant flowing from the introduction path 12 is merged with the laminar flow of the first reactant flowing linearly from the first introduction path 10 while moving to the back side in the layer thickness direction, and the reaction flow It may be introduced into the road 16.

It is a perspective view of the channel structure which constitutes the reaction device by one embodiment of the present invention. It is a disassembled perspective view of the flow-path structure shown in FIG. It is a longitudinal cross-sectional view along the flow path of the flow-path structure shown in FIG. It is sectional drawing corresponding to FIG. 3 which showed the distribution | circulation state of the 1st reactant and the 2nd reactant in a flow path. Sectional drawing perpendicular | vertical to the distribution direction of the reaction flow path which showed the state of the contact interface of the 1st reactant and the 2nd reactant when a flow passage is a horizontal state when a flow path is not divided | segmented into the width direction It is. FIG. 6 is a cross-sectional view showing a state in which the inclination angle in the width direction of the reaction channel in FIG. 5 is increased. FIG. 7 is a cross-sectional view showing a state where the inclination angle in the width direction of the reaction flow channel of FIG. 6 is further increased. Reaction channel showing the state of the contact interface between the first reactant and the second reactant when the reaction channel is in a horizontal state when the channel is divided in the width direction as in one embodiment of the present invention It is sectional drawing perpendicular | vertical to the distribution direction. It is sectional drawing which showed the state which the inclination angle in the width direction of the reaction flow path of FIG. 8 increased. FIG. 10 is a cross-sectional view showing a state where the inclination angle in the width direction of the reaction channel in FIG. 9 is further increased. It is the disassembled perspective view which showed the structure of the flow-path structure of the reaction apparatus by the 1st modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 2nd modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 3rd modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 4th modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 5th modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 6th modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 7th modification of one Embodiment of this invention. It is sectional drawing along the flow path of the flow-path structure which comprises the reaction apparatus by the 8th modification of one Embodiment of this invention.

Explanation of symbols

2, 22, 32, 42, 52, 62, 72, 82 Channel structure 2a Partition wall 2b Partition wall 2e Intermediate substrate 2f Front side substrate 2g Back side substrate 2h Front side groove 2i Back side groove 4a Channel 10 First introduction path 12 Second introduction path 14 Joint flow path 16 Reaction flow path

Claims (8)

A reaction device for reacting a first reactant and a second reactant while circulating them,
A flow path structure having a flow path extending in a specific direction and flowing the first reactant and the second reactant along the direction,
The flow path is disposed on the inlet side of the flow path and the first introduction path into which the first reactant is introduced, and the first introduction path with a partition wall provided in the flow path structure interposed therebetween The first reaction that is disposed apart from the first introduction path, is connected to the downstream side of the first introduction path and the second introduction path, and flows through the first introduction path. A combined flow path for joining the agent and the second reactant flowing through the second introduction path in a laminar flow state separated from each other, and connected to the downstream side of the combined flow path, the laminar flow of the first reactant and the second flow path A reaction flow path for causing a laminar flow of reactants to flow in a state in which both reactants are in contact with each other and reacting both the reactants at each other's contact interface;
The dimension in the layer thickness direction perpendicular to the contact interface of the reaction channel is smaller than the sum of the dimension in the layer thickness direction of the first introduction path and the dimension in the layer thickness direction of the second introduction path. The reactor is set up as follows. The first introduction channel and the reaction channel are formed using a single channel that extends linearly and has a uniform dimension in the layer thickness direction,
The joint flow path joins the laminar flow of the second reactant flowing from the second introduction passage from the layer thickness direction to the laminar flow of the first reactant flowing linearly from the first introduction passage. The reaction apparatus according to claim 1, wherein the reaction apparatus is configured to be introduced into the reaction flow path. The flow path structure is configured by an intermediate substrate, and a front substrate and a back substrate sandwiching the intermediate substrate from both front and back sides in the layer thickness direction,
A surface-side groove extending in a specific direction is formed on the surface of the intermediate substrate, and a back-side groove extending in the specific direction is formed at a position corresponding to the surface-side groove on the back surface of the intermediate substrate. ,
The first introduction path is formed by covering the opening of the front side groove with the front substrate, and the second introduction path is formed by covering the opening of the back side groove with the back substrate. Formed,
The reaction apparatus according to claim 1 or 2, wherein a region sandwiched between the front surface side groove portion and the back surface side groove portion of the intermediate substrate is used as the partition wall.   The said combined flow path is formed so that the length along the flow direction of the said 1st reactant and the said 2nd reactant may become larger than the dimension of the said layer thickness direction of the said partition wall. The reactor of any one of -3.   The joint channel is formed so that a length along a flow direction of the first reactant and the second reactant is 10 times or more a dimension of the partition wall in the layer thickness direction. Item 5. The reaction apparatus according to Item 4.   The said flow path structure has any one partition wall which divides | segments the said flow path into plurality in the width direction orthogonal to the flow direction of the said 1st reactant and the said 2nd reactant. A reactor according to 1.   The reaction apparatus according to claim 1, wherein a plurality of the flow channel structures are stacked. A reaction method using the reaction apparatus according to any one of claims 1 to 7,
A laminar flow in which the first reactant is introduced into the first introduction channel and the second reactant is introduced into the second introduction channel, and the first reactant and the second reactant are separated from each other in the combined channel. Then, the combined laminar flow of the first reactant and the laminar flow of the second reactant are circulated through the reaction channel in a state where the two reactants are in contact with each other, and the two reactants are mutually exchanged. The reaction method of making it react in the contact interface of.

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