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JP2007299511A5 - - Google Patents

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Publication number
JP2007299511A5
JP2007299511A5 JP2007101225A JP2007101225A JP2007299511A5 JP 2007299511 A5 JP2007299511 A5 JP 2007299511A5 JP 2007101225 A JP2007101225 A JP 2007101225A JP 2007101225 A JP2007101225 A JP 2007101225A JP 2007299511 A5 JP2007299511 A5 JP 2007299511A5
Authority
JP
Japan
Prior art keywords
atomic percent
adhesive layer
thickness
less
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007101225A
Other languages
English (en)
Other versions
JP2007299511A (ja
JP5396597B2 (ja
Filing date
Publication date
Priority claimed from US11/400,957 external-priority patent/US7495865B2/en
Application filed filed Critical
Publication of JP2007299511A publication Critical patent/JP2007299511A/ja
Publication of JP2007299511A5 publication Critical patent/JP2007299511A5/ja
Application granted granted Critical
Publication of JP5396597B2 publication Critical patent/JP5396597B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (10)

  1. 装置であって
    金属基板と、
    金属基板上に形成された非晶質接着層であって、約8Å未満の厚さであり、かつ炭素ケイ素炭化物及び炭素ケイ素窒化物からなる群から選ばれた組成をもつ接着層と、
    接着層上に形成された保護DLC層を含む装置。
  2. DLC層が、約15Å以下の厚さである請求項1に記載の装置。
  3. 接着層の厚さが約7Å未満である請求項1に記載の装置。
  4. 接着層の厚さが約6Å未満である請求項1に記載の装置。
  5. 接着層の厚さが約4Å未満である請求項1に記載の装置。
  6. 接着層の組成が、約65から85原子%の炭素、及び約15から35原子%のケイ素である請求項1に記載の装置。
  7. 接着層の組成が、約70から80原子%の炭素、及び約20から30原子%のケイ素である請求項6に記載の装置。
  8. 接着層の組成が、約10から25原子%の炭素、約30から50原子%のケイ素、及び約25から55原子%の窒素である請求項1に記載の装置。
  9. 接着層の組成が、約15原子%の炭素、約45原子%のケイ素、及び約40原子%の窒素である請求項8に記載の装置。
  10. 前記装置は、磁気読取り/書き込みヘッドである、請求項1に記載の装置。
JP2007101225A 2006-04-10 2007-04-09 保護被膜のための接着層 Expired - Fee Related JP5396597B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/400,957 2006-04-10
US11/400,957 US7495865B2 (en) 2006-04-10 2006-04-10 Adhesion layer for protective overcoat

Publications (3)

Publication Number Publication Date
JP2007299511A JP2007299511A (ja) 2007-11-15
JP2007299511A5 true JP2007299511A5 (ja) 2010-05-27
JP5396597B2 JP5396597B2 (ja) 2014-01-22

Family

ID=38574974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007101225A Expired - Fee Related JP5396597B2 (ja) 2006-04-10 2007-04-09 保護被膜のための接着層

Country Status (4)

Country Link
US (1) US7495865B2 (ja)
JP (1) JP5396597B2 (ja)
CN (2) CN104616669A (ja)
SG (1) SG136897A1 (ja)

Families Citing this family (12)

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US20100053817A1 (en) * 2008-09-04 2010-03-04 Robert Glenn Biskeborn Coated magnetic head and methods for fabrication thereof
JP2010108532A (ja) * 2008-10-28 2010-05-13 Toshiba Storage Device Corp ヘッドスライダ
US20110058279A1 (en) * 2009-07-31 2011-03-10 Flint Eric Overcoat having a low silicon/carbon ratio
US20110032640A1 (en) * 2009-08-10 2011-02-10 Hitachi Global Storage Technologies Netherlands B.V. Multi-layer, thin film overcoat for magnetic media disk
US8611043B2 (en) 2011-06-02 2013-12-17 International Business Machines Corporation Magnetic head having polycrystalline coating
US8472134B2 (en) 2011-08-02 2013-06-25 HGST Netherlands B.V. Air bearing surface overcoat with soft intermediate film, and methods of producing the same
WO2014017376A1 (ja) * 2012-07-25 2014-01-30 Nok株式会社 フッ素樹脂製シールリング
US9093102B1 (en) 2013-03-12 2015-07-28 Western Digital Technologies, Inc. Systems and methods for tuning seed layer hardness in components of magnetic recording systems
US9570101B2 (en) 2013-08-28 2017-02-14 Seagate Technology Llc Magnetic adhesion layer and method of forming same
US9805748B1 (en) * 2014-06-24 2017-10-31 Western Digital (Fremont), Llc System and method for providing a protective layer having a graded intermediate layer
CN110564334B (zh) * 2018-06-05 2022-01-04 德莎欧洲股份公司 低温反应固化型粘合剂的耐湿热性和耐化学试剂腐蚀性的提高
US10971176B2 (en) 2019-02-21 2021-04-06 International Business Machines Corporation Tunnel magnetoresistive sensor with adjacent gap having chromium alloy seed layer and refractory material layer

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US4130847A (en) * 1977-03-31 1978-12-19 International Business Machines Corporation Corrosion resistant thin film head assembly and method for making
US4647494A (en) * 1985-10-31 1987-03-03 International Business Machines Corporation Silicon/carbon protection of metallic magnetic structures
US5175658A (en) * 1990-12-27 1992-12-29 International Buiness Machines Corporation Thin film magnetic head having a protective coating and method for making same
US5271802A (en) * 1990-12-27 1993-12-21 International Business Machines Corporation Method for making a thin film magnetic head having a protective coating
US5159508A (en) * 1990-12-27 1992-10-27 International Business Machines Corporation Magnetic head slider having a protective coating thereon
EP0689233B1 (en) * 1994-06-24 2008-10-15 Sumitomo Electric Industries, Limited Wafer and method of producing same
KR100276752B1 (ko) * 1994-12-19 2001-01-15 윌리암 엘. 허드슨 디스크 드라이브용 헤드 및 그 제조 방법
US5948532A (en) * 1996-12-10 1999-09-07 International Business Machines Corporation Cermet adhesion layer with carbonaceous wear layer for head/disk interfaces
US5858182A (en) * 1997-03-20 1999-01-12 Headway Technoloies, Inc. Bilayer carbon overcoating for magnetic data storage disks and magnetic head/slider constructions
US6184572B1 (en) * 1998-04-29 2001-02-06 Novellus Systems, Inc. Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices
US6136421A (en) * 1998-07-21 2000-10-24 Seagate Technology Llc Magneto-resistance recording media comprising multilayered protective overcoats
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US6580170B2 (en) * 2000-06-22 2003-06-17 Texas Instruments Incorporated Semiconductor device protective overcoat with enhanced adhesion to polymeric materials
US6638608B1 (en) * 2001-03-16 2003-10-28 Seagate Technology Llc Protection overcoat for recording media
US6664685B2 (en) * 2001-11-16 2003-12-16 Seagate Technology Llc High adhesion, wear resistant coatings for spindle motors in disk drive/storage applications
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JP3585917B2 (ja) * 2002-07-11 2004-11-10 Tdk株式会社 薄膜磁気ヘッド、その製造方法及びそれを用いた磁気ディスク装置
US7279239B2 (en) * 2002-08-07 2007-10-09 Kabushiki Kaisha Toyota Chuo Kenkyusho Laminating product including adhesion layer and laminate product including protective film
WO2004075177A1 (ja) * 2003-02-19 2004-09-02 Fujitsu Limited 磁気ヘッドスライダ
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