JP2007038089A - Processing liquid feeder - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a processing liquid feeder of a processing liquid recovery type which allows effective prevention of leakage of the processing liquid from the enclosure during processing of a substrate even when the upper and lower enclosures are made of a hydrophobic material and are long in both the width direction and the substrate-carrying direction. <P>SOLUTION: An upper wing 25 and a lower wing 35 are arranged on each outside surface of upper and lower nozzle blocks 22 and 32 arranged in the upper and lower enclosures, respectively, so as to protrude in the substrate-carrying direction and allow the substrate B to pass through. The upper and lower wings 25 and 35 are located so that the distance between their opposing surfaces is shorter than that between the opposing surfaces of the upper bottom plate 21 and the lower top plate 34. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a liquid-saving processing solution used for wet processing such as cleaning, etching, development, and peeling of single-wafer substrates such as liquid crystal panels and other display panels and glass substrates used in various applications. The present invention relates to an improvement of the supply device.

  2. Description of the Related Art Conventionally, a processing liquid (cleaning liquid) supply device commonly known as a processing liquid recovery type as described in Patent Document 1 is known. This processing liquid supply device is configured such that a box-shaped upper casing and a lower casing are arranged to face each other, a substrate processing path is formed between the upper and lower casings, and the substrate passes through the substrate processing path. ing. Then, the processing liquid is supplied toward the substrate processing path from the downstream side of the upper and lower casings in the substrate transport direction, and the processing liquid after being subjected to the substrate processing is discharged from the upstream side of the upper and lower casings in the substrate transport direction. It is made like that.

According to the processing liquid supply apparatus having such a configuration, the substrate is subjected to predetermined processing with a necessary and sufficient amount of processing liquid supplied to the substrate processing path while passing through the substrate processing path between the upper and lower housings. Therefore, it is possible to reduce the amount of processing liquid compared to the method of spraying the processing liquid on the front and back surfaces of the substrate being transferred, thereby reducing the running cost as well as the processing liquid supply device. Can be made more compact, contributing to a reduction in equipment costs.
JP 2003-53283 A

  However, in the processing liquid supply apparatus as described in Patent Document 1, the width dimension (dimension in the direction orthogonal to the substrate conveyance direction) of the upper and lower casings is larger than the length dimension (dimension in the substrate conveyance direction). The processing liquid introduced into the substrate processing path between the upper and lower casings is not suitable for cases such as when a hydrophobic material (for example, a synthetic resin material) is applied as a material constituting the casing. Inconveniently leaks to the outside from the end on the processing liquid supply side and the end on the processing liquid discharge side.

  The present invention has been made in view of such a situation, and is intended for a treatment liquid recovery type, in which the upper and lower casings are formed of a hydrophobic material and are long in the substrate width direction. However, an object of the present invention is to provide a processing liquid supply apparatus that can effectively prevent the processing liquid from leaking between the casings during the substrate processing.

  According to the first aspect of the present invention, there is provided an upper liquid supply passage section which is provided at the downstream end of the upper bottom plate facing the upper surface of the substrate passing therethrough and in the substrate transport direction of the upper bottom plate, And an upper processing section provided at an upstream end and provided with an upper liquid discharge passage section that sucks and discharges the supplied processing liquid from the lower surface side of the upper bottom plate, and is disposed opposite to and passes through the upper processing section. A lower top plate facing the lower surface of the substrate, provided at the downstream end of the lower top plate in the substrate transport direction, provided at a lower liquid supply passage section for supplying a processing liquid to the upper surface side of the lower top plate, and provided at an upstream end A processing liquid supply apparatus including a lower processing section provided with a lower liquid discharge path section that sucks and discharges the supplied processing liquid from the upper surface side of the lower top plate. On each outer surface, facing the substrate transfer direction The wings are arranged to face each other, and each wing has at least a part where the distance between the opposing surfaces is shorter than the distance between the opposing surfaces of the upper bottom plate and the lower top plate. To do.

  According to such a configuration, the substrate carried between the upper bottom plate of the upper processing unit and the lower top plate of the lower processing unit from the upstream end in the substrate transport direction has an upper liquid surface on the downstream side in the substrate transport direction. The processing is performed by the processing liquid supplied from the supply path to the upper processing section, and the lower surface is processed by the processing liquid supplied from the lower liquid supply path at the downstream end to the lower processing section, and the front and back surfaces are processed. In this state, it is carried out from the processing liquid supply device.

  On the other hand, the processing liquid supplied from the upper liquid supply path section flows down while coming into contact with the substrate from the downstream end toward the upstream end while being processed on the upper surface of the substrate in the upper processing section, and then upstream. The processing liquid supplied from the lower liquid supply path section is sucked and discharged by the upper liquid discharge path section provided at the end, and flows down from the downstream end toward the upstream end while the lower processing section is directed to the lower surface of the substrate. After the treatment, the liquid is sucked and discharged by the lower liquid discharge path provided at the upstream end.

  As described above, the substrate is brought into the processing liquid supply apparatus from the upstream end and conveyed toward the downstream end, so that the substrate is counter-contacted with the processing liquid supplied from the downstream end and flowing down toward the upstream end. Since the back surface is processed, it is possible to reduce the amount of the processing liquid while ensuring reliable processing as compared with the conventional method of spraying the processing liquid on the substrate.

  The outer surfaces of the upper and lower liquid supply passages are each provided with a wing projecting in the substrate transport direction and allowing the substrate to pass therethrough, and each wing is a distance between the opposing surfaces. Since the installation position is set to be shorter than the distance between the opposing surfaces of the upper bottom plate and the lower top plate, the processing liquid supplied from the upper and lower liquid supply passages to the substrate obstructs these wings. In rare cases, the surface tension increases to improve the liquid tightness, thereby improving the processing efficiency for the substrate and suppressing the amount of leakage accompanying the substrate from the processing liquid supply apparatus.

  The invention according to claim 2 is the invention according to claim 1, wherein the wing extends horizontally from a flange fixed to each outer surface of the upper and lower liquid supply passages, and an end of the flange. A horizontal extending portion facing the surface of the substrate being transported, and having a step portion formed by cutting out a corner portion on the outer surface side at the coupling position of the flange portion and the horizontal extending portion. It is characterized by that.

  According to such a configuration, the pair of upper and lower wings are fixed to the upper and lower liquid supply parts, respectively, so that each horizontal extension projects horizontally toward the processing liquid supply apparatus. Installed. Then, in the pair of wings facing each other in the upper and lower sides, the stepped portions are formed by notching the corners on the outer surface side at the coupling positions of the flanges and the horizontal extending portions, so that they are taken along with the substrate. The momentum of the processing liquid that is about to be reduced can be mitigated by this stepped portion, thereby preventing the leakage of the processing liquid accompanying the substrate more effectively.

  According to a third aspect of the present invention, in the first or second aspect of the invention, the upper and lower wings are symmetrically set up and down.

  According to such a configuration, it is possible to correspond to the upper and lower liquid supply units by one type of wing having the same shape, which contributes to a reduction in manufacturing cost.

  According to a fourth aspect of the present invention, there is provided an upper liquid supply passage section that is provided at the downstream end of the upper bottom plate facing the upper surface of the substrate passing therethrough and in the substrate transport direction of the upper bottom plate, And an upper processing section provided at an upstream end and provided with an upper liquid discharge passage section that sucks and discharges the supplied processing liquid from the lower surface side of the upper bottom plate, and is disposed opposite to and passes through the upper processing section. A lower top plate facing the lower surface of the substrate, provided at the downstream end of the lower top plate in the substrate transport direction, provided at a lower liquid supply passage section for supplying a processing liquid to the upper surface side of the lower top plate, and provided at an upstream end A processing liquid supply apparatus comprising a lower processing section provided with a lower liquid discharging path section for sucking and discharging the supplied processing liquid from the upper surface side of the lower top plate, wherein the upper liquid discharging path section has a lower surface There is a suction hole for sucking the processing solution opened to , The lower surface of the suction holes, is characterized in that projects downward from the lower surface of the upper bottom plate.

  According to such a configuration, the processing of the substrate with the processing liquid has the same function as that of the invention of claim 1, and the upper liquid discharge passage portion has the lower surface of the suction hole protruding downward from the lower surface of the upper bottom plate. (That is, the installation position is set so that the lower surface of the discharge path portion is at a lower level than the lower surface of the upper bottom plate), the upper processing portion formed on the upper surface side of the substrate is directed from the downstream end to the upstream end. The treatment liquid that flows down collides with the discharge path portion where the installation position is set so that the lower surface is at a lower level than the lower surface of the upper bottom plate, thereby preventing the inconvenience of being discharged out of the treatment liquid supply device. And is reliably sucked into the upper liquid discharge path.

  In this way, by causing the lower surface of the suction hole to protrude downward from the lower surface of the upper bottom plate, it is possible to effectively suppress leakage of the processing liquid from the upstream end of the processing liquid supply device to the outside, even though the configuration is extremely simple. Is possible.

  According to the first aspect of the present invention, the outer surfaces of the upper and lower liquid supply passages are each provided with a wing projecting in the substrate transport direction and allowing the passage of the substrate. Since the installation position is set so that the distance between the opposed surfaces is shorter than the distance between the opposed surfaces of the upper bottom plate and the lower top plate, the processing supplied to the substrate from the upper and lower liquid supply passages The liquid is hindered by these wings to increase the surface tension, thereby improving liquid tightness, thereby improving the processing efficiency for the substrate and leaking from the processing liquid supply device accompanying the substrate. This makes it possible to reduce the amount and contribute to the reduction of the processing cost.

  Further, even in the initial liquid-tight generation where the substrate does not pass, the amount of leakage can be suppressed and the flow of the processing liquid to the suction / discharge side can be promoted.

  According to invention of Claim 2, the level | step-difference part is each formed by notching the corner | angular part of the outer surface side in the coupling | bonding position of each collar part and each horizontal extension part of a pair of wing which faced up and down. Therefore, the momentum of the processing liquid to be taken along with the substrate can be relieved at this step portion, and thereby leakage of the processing liquid accompanying the substrate can be more effectively prevented.

  According to the invention described in claim 3, since the upper and lower wings are symmetrically set in the upper and lower directions, it becomes possible to correspond to the upper and lower liquid supply portions by the same shape wing, thereby reducing the manufacturing cost. Can contribute.

  According to the fourth aspect of the present invention, the processing liquid leaks to the outside from the upstream end of the processing liquid supply device while having a very simple configuration by projecting the lower surface of the suction hole downward from the lower surface of the upper bottom plate. This can be effectively suppressed.

  A processing liquid supply apparatus according to the present invention is provided in the middle of a transport path for transporting a substrate in a horizontal posture, and supplies the processing liquid in a counter current from the upper and lower housings to the front and back surfaces of the substrate with respect to the substrate being transported. The present invention relates to an improvement of a so-called process liquid recovery type apparatus configured to perform a predetermined process and recover a processed process liquid through upper and lower casings.

  FIG. 1 is an exploded perspective view showing an embodiment of a processing liquid supply apparatus according to the present invention, and FIG. 2 is an assembled perspective view thereof. 3 is a cross-sectional view taken along line AA in FIG. In the circle in FIG. 3, the front upper wing 251 and the front lower wing 351 are shown enlarged. Incidentally, these drawings are so-called principle diagrams in which the processing liquid supply apparatus is shown in principle by removing design-related parts in order to facilitate understanding of the processing liquid supply apparatus according to the present invention. 1 to 3, the XX direction is referred to as the left-right direction, and the Y-Y direction is referred to as the front-rear direction. In particular, the -X direction is leftward, the + X direction is rightward, the -Y direction is forward, and the + Y direction is forwarded. It is called the back.

  In these drawings, the substrate B (in this embodiment, a glass substrate) is conveyed from the rear to the front, whereas the processing liquid is supplied to the substrate B from the front to the rear. Thus, the substrate B is contacted with the processing liquid in a counter current in the processing liquid supply apparatus 10 and subjected to a predetermined processing.

  As shown in FIG. 1 to FIG. 3, the processing liquid supply apparatus 10 is arranged at the upper part of a substrate transport path 51 that extends in the front-rear direction and has a plurality of transport rollers 511 (see FIG. 8). An upper case (upper processing unit) 20 provided, and a basic unit provided with a lower case (lower processing unit) 30 disposed opposite to the lower portion of the upper case 20 while facing the upper case 20 It has a configuration.

  The upper casing 20 has an upper bottom plate 21 that has a rectangular shape in plan view, and an upper nozzle block (upper liquid supply passage portion) 22 that extends integrally in the front edge of the upper bottom plate 21 and extends in the left-right direction. An upper drain block (upper liquid discharge passage) 23 having the same length as the upper nozzle block 22 erected integrally with the rear edge of the upper bottom plate 21, and the upper nozzle block 22 and the upper drain block. 23, and the same length as the upper nozzle block 22 and the upper drainage block 23 fixed to the front surface of the upper nozzle block 22 and the rear surface of the upper drainage block 23, respectively. And a pair of upper and lower wings 25 in the front-rear direction.

  The lower housing 30 includes a lower bottom plate 31 that has a rectangular shape in plan view, and a lower nozzle block (lower liquid supply passage portion) 32 that is provided integrally with a front edge of the lower bottom plate 31 and extends in the left-right direction. A lower drainage block (lower liquid discharge passage) 33 having the same length as the lower nozzle block 32 erected integrally with the rear edge of the lower bottom plate 31, and the lower nozzle block 32 and the lower drainage block The same length as that of the lower nozzle block 32 and the lower drainage block 33 respectively fixed to the lower top plate 34 laid between the upper edge portions of the 33 and the front surface of the lower nozzle block 32 and the rear surface of the lower drainage block 33. And a pair of lower and lower wings 35 in the front-rear direction.

  A pair of left and right side plates 40 is employed as a common member of the upper and lower housings 20 and 30, and the members for the upper housing 20 and the lower housings 30 in which the pair of side plates 40 are arranged to face each other vertically. The processing liquid supply apparatus 10 including the upper casing 20 and the lower casing 30 is formed by sandwiching the members and fixing them with bolts. Then, with the processing liquid supply apparatus 10 formed, the substrate is being transferred along the substrate transfer path 51 between the upper bottom plate 21 of the upper casing 20 and the lower top plate 34 of the lower casing 30. A substrate processing space V for processing the substrate B with a predetermined processing liquid is formed.

  The vertical dimension of the substrate processing space V is set to be considerably larger than the thickness dimension of the substrate B (approximately 6 mm in the present embodiment), thereby along the front and back surfaces of the substrate B being transported in the substrate processing space V. Then, the processing liquid discharged from the upper and lower nozzle blocks 22 and 32 flows down to the upper and lower drainage blocks 23 and 33 in a counter current with the substrate B, and during this time, the front and back surfaces of the substrate B are processed by the processing liquid. It has become. The distance between the upper nozzle block 22 and the upper drain block 23 is set equal to the distance between the lower nozzle block 32 and the lower drain block 33.

  FIG. 4 is a partially cutaway perspective view showing an embodiment of the upper nozzle block 22 and the lower nozzle block 32. (A) shows the upper nozzle block 22 and (B) shows the lower nozzle block 32. Show. In addition, the direction display by X and Y in FIG. 4 (X is a left-right direction (-X: leftward, + X: rightward), Y is the front-back direction (-Y: front, + Y: back)) is the case of FIG. It is the same.

  First, as shown in FIG. 4A, the upper nozzle block 22 is made of a predetermined synthetic resin material and has a rectangular parallelepiped shape that is long in the left-right direction. The upper nozzle block 22 has a screw hole 221 screwed at the center position on the front surface, and the inner part of the screw hole 221 is formed so as to extend over substantially the entire length in the left-right direction within the upper nozzle block 22. The treated liquid supply passage 222 is communicated with. A plurality of nozzle holes 223 having openings on the lower surface of the upper nozzle block 22 drilled at an equal pitch over the entire length in the left-right direction are connected to the processing liquid supply passage 222.

  In addition, a fluid coupling C attached to the distal end side of a processing liquid supply pipe 522 to be described later is screwed into the screw hole 221. Accordingly, when the processing liquid is supplied through the processing liquid supply pipe 522 in a state where the processing liquid supply pipe 522 is connected to the screw hole 221 through the fluid coupling C, the processing liquid is supplied to the processing liquid supply passage. The ink is discharged downward from each nozzle hole 223 through 222.

  Next, as shown in FIG. 4B, the lower nozzle block 32 is basically configured in the same manner as the upper nozzle block 22, but the nozzle hole 323 is directed upward from the processing liquid supply passage 322. The branched point is different from the upper nozzle block 22. Then, the processing liquid supplied from the processing liquid supply pipe 522 to the processing liquid supply passage 322 via the fluid coupling C and the screw hole 321 is directed upward from the plurality of nozzle holes 323 branched from the processing liquid supply passage 322. It is designed to be discharged.

  FIG. 5 is a partially cutaway perspective view showing an embodiment of the lower top plate 34, and FIG. 6 is a cross-sectional view taken along the line DD of FIG. 5 and 6 are the same as those in FIG. 1 (X is the left-right direction (-X: leftward, + X: rightward), Y is the front-rear direction (-Y: forward, + Y: backward)).

  First, as shown in FIG. 5, the lower top plate 34 has a slightly thicker top plate body 341 that has a rectangular shape in plan view, and the planar shape laminated on the upper surface of the top plate body 341 is the same as the top plate body 341. The laminated plate 348 is configured.

  The top plate body 341 is provided with a plurality of concave portions 342 having a rectangular shape in plan view, each set at a predetermined equal pitch in both the front-rear direction and the left-right direction. (Rotating supports) 343 are respectively mounted. In the present embodiment, a total of 32 recesses 342 are provided, four in the front-rear direction and eight in the left-right direction, but the number of recesses 342 is not limited to 32. The optimal number is appropriately set according to the scale of the processing liquid supply apparatus 10 and the type and size of the substrate B to be processed.

  The laminated plate 348 is formed with square holes 349 at positions facing the respective concave portions 342, and a part of the peripheral surface of the rollers 343 passes through the square holes 349 with the rollers 343 mounted in the concave portions 342. It is designed to protrude outside.

  As shown in FIG. 6, the roller 343 includes a roller shaft 344 and a circular roller body 345 that is concentrically and integrally fitted to the central portion of the roller shaft 344 in the axial direction. The roller body 345 is set to have a thickness that is slightly thinner than the length of the roller shaft 344, so that the roller shaft 344 protrudes from the roller body 345 in opposite directions.

  On the other hand, as shown in FIG. 6, the top plate main body 341 has the roller shaft from the upper surface side at the center of each opposing edge extending in the front-rear direction facing each other (the left-right direction of the paper in FIG. 6). A pair of axially extending bearing grooves 346 formed by cutting the same dimension as the diameter of 344 are recessed, and both ends of the roller shaft 344 are fitted into these bearing grooves 346 so that the roller 343 is connected to the roller shaft 344. The concave portion 342 is mounted so as to be rotatable around. The roller shaft 344 is prevented from being removed when the laminated plate 348 is put on the top plate body 341 in a state where the roller shaft 344 is mounted in the bearing groove 346.

  Therefore, the substrate B carried into the substrate processing space V is smoothly supported in the substrate processing space V without being bent while being guided by the rotation of the rollers 343 while being supported by the rollers 343. Become.

  A liquid draining hole (liquid draining path) 347 extending downward is formed in the bottom of the recess 342, and a part of the processing liquid flowing down the substrate processing space V is this liquid draining hole. Particles generated when the back surface of the substrate B introduced into the substrate processing space V is brought into sliding contact with the peripheral surface of the roller main body 345 are discharged along with the extracted processing liquid. As a result, the substrate B is led out from the substrate processing space V with particles adhering thereto, thereby preventing the occurrence of inconvenience that the contamination state of the substrate B is maintained.

  FIG. 7 is a partially cutaway perspective view showing an embodiment of the upper drainage block 23 and the lower drainage block 33. (A) shows the upper drainage block 23 and (B) shows the lower drainage block. Each block 33 is shown. In addition, the direction display by X and Y in FIG. 7 (X is a left-right direction (-X: leftward, + X: rightward), Y is the front-back direction (-Y: front, + Y: back)) is the case of FIG. It is the same.

  First, the upper drainage block 23 is structurally configured in the same manner as the upper nozzle block 22, and is formed of a predetermined synthetic resin material as shown in FIG. It has a rectangular parallelepiped shape. The upper drainage block 23 is screwed with a screw hole 231 at the center position on the front surface, and the inner part (front) of the screw hole 231 extends substantially in the left-right direction within the upper drainage block 23. Are communicated with a treatment liquid discharge passage 232 formed to extend. Connected to the processing liquid discharge passage 232 are a plurality of processing liquid suction holes 233 having openings on the lower surface of the upper drain block 23 formed at equal pitches over the entire length in the left-right direction.

  In addition, a fluid coupling C attached to the distal end side of a drainage pipe 532 described later is screwed into the screw hole 231. Accordingly, the drainage pipe 532 is connected to the screw hole 231 through the fluid coupling C, so that a plurality of processing liquids after processing the substrate B in the substrate processing space V are present at the downstream end of the substrate processing space V. The liquid is sucked from the processing liquid suction hole 233 and is collected through the processing liquid discharge passage 232 through the drain pipe 532.

  Next, as shown in FIG. 7B, the lower drainage block 33 is basically configured in the same manner as the upper drainage block 23. However, the processing liquid suction hole 333 extends from the processing liquid discharge passage 332. The upper branch block 23 is different from the upper drain block 23 in that it is branched upward. Then, the processed processing liquid (drainage) that has been subjected to the predetermined processing on the substrate B sucked by the processing liquid suction hole 333 is drained through the processing liquid discharge passage 332, the screw hole 331, and the fluid coupling C. It is collected through a tube 532.

  Further, the upper and lower processing liquid suction holes 233 and 333 are not provided at the left end and the right end of the upper and lower drainage blocks 23 and 33, respectively, and thereby the nozzle holes 223 of the upper and lower nozzle blocks 22 and 32 are provided. , 323, the number of holes is reduced. This is because when the amount of processing liquid in the substrate processing space V decreases due to the removal of the processing liquid by the substrate B being transported in the substrate processing space V, the processing liquid suction hole 233 at the end of the air is used. , 333 may be sucked into the upper and lower drainage blocks 23, 33 in order to prevent such air from being sucked.

  In the present embodiment, the upper drainage block 23 is set to have a vertical dimension such that the lower end surface is located slightly below the lower surface of the upper bottom plate 21 (1 mm in the present embodiment). Accordingly, a part of the processing liquid flowing in the substrate processing space V counter-currently along the surface of the substrate B interferes with the lower end portion of the upper draining block 23, and the processing liquid is discharged into the upper drainage by suppressing the flow rate. The block 23 is effectively sucked, and the amount of the processing liquid carried along with the surface of the substrate B and carried out of the substrate processing space V can be reduced.

  Incidentally, the upper end surface of the lower drainage block 33 is set flush with the upper surface of the lower top plate 34. This is because in the case of the lower drainage block 33, in particular, the processing that flows down in the substrate processing space V without causing the upper end surface of the lower drainage block 33 to protrude above the upper surface of the lower top plate 34. This is because the liquid flows into the processing liquid discharge passage 332 of the lower drain block 33 by gravity.

  Subsequently, the upper and lower wings 25 and 35 (FIGS. 1 to 3) are arranged so that the processing liquid supplied from the upper and lower nozzle blocks 22 and 32 into the substrate processing space V is along the front and back surfaces of the substrate B. This is to prevent leakage from the substrate toward the substrate conveyance direction. In the present embodiment, the upper and lower casings 20 and 30 are basically formed of a synthetic resin material such as PVC (polyvinyl chloride) or PTFE (polytetrafluoroethylene). Since such a synthetic resin material has hydrophobicity, when the aqueous processing liquid is supplied to the substrate processing space V, it is repelled by the surrounding hydrophobic environment. This is to prevent leakage of the processing liquid, although there is a risk of leakage in the substrate transport direction through the gap between the top surfaces of the upper and lower nozzle blocks 22 and 32.

  In this embodiment, the upper and lower wings 25 and 35 are made of synthetic resin (for example, made of fluororesin such as PTFE). However, in the present invention, the upper and lower wings 25 and 35 are It is not limited to being made of synthetic resin, and may be made of metal such as stainless steel.

  The upper wing 25 includes a front upper wing 251 that is integrally attached to the front side of the upper nozzle block 22 and a rear upper wing 252 that is integrally attached to the rear side of the upper drainage block 23.

  As shown in FIG. 1, the front upper wing 251 protrudes forward from a lower end of the mounting plate 253 and a mounting plate (a flange) 253 having a long plate shape in the left-right direction. The mounting plate portion 253 and the wing main body (horizontal extension portion) 254 having the same length are provided. The mounting plate portion 253 is for fixing to the front side of the upper nozzle block 22 via a seal member (not shown).

  The front upper wing 251 has a corner portion where the mounting plate portion 253 and the wing main body 254 are joined so as to be orthogonal to each other, as shown in a circle in FIG. And a stepped portion 255 formed by being cut out like a bowl in a side view over the entire length in the direction). The upper surface of the stepped portion 255 is a horizontal surface, and the front surface is a vertical surface.

  The rear upper wing 252 is basically configured in the same manner as the front upper wing 251, and as shown in FIGS. 1 and 3, a mounting plate portion 253 having a long plate shape in the left-right direction, and the mounting plate The mounting plate portion 253 projecting rearward from the lower end portion of the portion 253 and the wing body 254 having the same length are configured, but the step portion 255 as formed in the front upper wing 251 is formed. Is not provided.

  The lower wing 35 includes a front lower wing 351 integrally attached to the front surface side of the lower nozzle block 32 and a rear lower wing 352 integrally attached to the rear surface side of the lower drainage block 33.

  The front lower wing 351 is formed in line symmetry with the front upper wing 251 in a side view, as shown in a circle of FIG. The front lower wing 351 includes a mounting plate portion (saddle portion) 353 similar to the mounting plate portion 253 of the front upper wing 251, and the mounting plate portion projecting forward from the upper end portion of the mounting plate portion 353. 353 and a wing main body (horizontal extension) 354 having the same length as 353. The front lower wing 351 is also provided with a stepped portion 355 similar to the stepped portion 255 of the front upper wing 251.

  The rear lower wing 352 is basically configured in the same manner as the front lower wing 351, and as shown in FIG. 1, a mounting plate portion 353 having a long plate shape in the left-right direction, and the mounting plate portion 353. The mounting plate portion 353 projecting rearward from the upper end portion and the wing body 354 having the same length are provided, but the step portion 355 as formed in the front lower wing 351 is provided. Not.

  The front upper wing 251 and the front lower wing 351 have such a dimension that the gap between the wing bodies 254 and 354 is smaller than the vertical dimension of the substrate processing space V and the substrate B can pass through without contact. The installation position is set as follows. This is because the upper and lower casings 20 and 30 are both made of a synthetic resin material that is hydrophobic, so that the processing liquid discharged from the upper and lower nozzle blocks 22 and 32 is repelled by the synthetic resin material. This is to prevent leakage from the substrate processing space V toward the downstream side in the substrate transport direction.

  That is, by providing step portions 255 and 355 on the front upper wing 251 and the front lower wing 351, the processing liquid discharged from the upper and lower nozzle blocks 22 and 32 is blocked on the vertical walls of the upper and lower step portions 255 and 355, respectively. Therefore, the processing liquid is effectively prevented from leaking from the substrate processing space V toward the downstream side in the substrate transport direction.

  In the present embodiment, the gap between the wing bodies 254 and 354 of the upper and lower wings 25 and 35 is set to approximately 4 mm, but the present invention is not limited to the gap being 4 mm. The optimal gap size is appropriately set depending on the type and size of the substrate B and the processing conditions using the processing liquid.

  In the present embodiment, the portion where the distance between the opposed surfaces of the upper and lower wings according to the present invention is shorter than the distance between the opposed surfaces of the upper bottom plate 21 and the lower top plate 34 is the wing body 254 of the front upper wing 251. Correspond to the lower surface of the wing body and the upper surface of the wing body 354 of the front lower wing 351.

  As shown in FIGS. 1 and 2, the side plate 40 is shared by the left and right side surfaces of the upper and lower casings 20 and 30, and plays a role of connecting the upper and lower casings 20 and 30 to each other in a predetermined separated state. ing.

  The side plate 40 has upper and lower parts in a state where the members excluding the upper wing 25 constituting the upper casing 20 and the members excluding the lower wing 35 constituting the lower casing 30 are arranged facing each other at a predetermined interval. The side plate main body 41 having a rectangular shape corresponding to the member, and the shape of the upper and lower front wings 25 and 35 and the upper and lower rear wings 25 and 35 projecting from the front and rear edge portions of the side plate main body 41 are in the shape of the end view. It comprises a pair of front and rear projecting portions 42. Then, the side plates 40 are respectively bolted to the left and right side surfaces via seal members (not shown) in a state where the members constituting the upper and lower casings 20 and 30 are arranged to face each other in a predetermined separated state. Thereby, as shown in FIG. 2, the processing liquid supply apparatus 10 is completed.

  In the present embodiment, the processing liquid supply apparatus 10 has a front-rear dimension set to approximately 90 mm and a left-right dimension set to approximately 400 mm, thereby supporting processing of a large substrate B having a long left-right dimension. It has come to be able to do. The dimensions of the processing liquid supply apparatus 10 are not limited to the front-rear dimension being set to about 90 mm and the left-right dimension being set to about 400 mm, and are appropriately determined according to the type and size of the substrate, processing conditions, and the like. Optimal dimensions are set. Incidentally, in FIG. 1 and FIG. 2, the dimension in the left-right direction of the processing liquid supply apparatus 10 is shown slightly shorter than the actual size for the sake of space.

  Further, in the present embodiment, not only the side plate 40 but also the joining between the members constituting the processing liquid supply apparatus 10 is performed by bolting via a seal member. The joining between the members is not limited to the bolting, and the joining may be performed by an adhesive treatment using a predetermined adhesive.

  Hereinafter, a substrate processing apparatus to which the processing liquid supply apparatus 10 having such a configuration is applied will be described with reference to FIG. FIG. 8 is an explanatory view in a side view showing an embodiment of a substrate processing apparatus using the processing liquid supply apparatus 10. As shown in FIG. 8, a substrate processing apparatus 50 includes a processing liquid supply apparatus 10 according to the present invention, a horizontally extending substrate transport path 51 disposed so as to penetrate the processing liquid supply apparatus 10, and a processing liquid. A processing liquid supply system 52 for supplying a processing liquid to the supply apparatus 10; a processing liquid recovery system 53 for recovering a processing liquid (processed liquid) after a predetermined process is performed on the substrate B by the processing liquid supply apparatus 10; Has a basic configuration.

  In the present embodiment, the substrate transport path 51 is formed by a plurality of transport rollers 511 arranged in parallel along the substrate transport direction, and rotates around the axis of each transport roller 511 by driving of a driving means (not shown). Thus, the substrate B placed on the transport roller 511 is transported.

  In the processing liquid supply apparatus 10, the center line extending in the horizontal direction of the substrate B transported by the substrate transport path 51 is the center in the vertical direction of the substrate processing space V formed between the upper and lower housings 20 and 30. The substrate transport path 51 is installed so as to penetrate the substrate processing space V in a state where the height level is set so as to be located at the position. Accordingly, the substrate B that has been transported along the substrate transport path 51 by driving the transport roller 511 is introduced into the substrate processing space V of the processing liquid supply apparatus 10, and the upper and lower nozzles move while moving in the substrate processing space V. Predetermined processing is performed on the front and back surfaces by the processing liquid supplied countercurrently from the blocks 22 and 32.

  The processing liquid supply system 52 includes a processing liquid storage tank 521 that stores the processing liquid, a processing liquid supply pipe 522 that is piped from the processing liquid storage tank 521 toward the upper and lower nozzle blocks 22 and 32, and the processing liquid. A treatment liquid supply pump 523 provided in the supply pipe 522 is provided. The processing liquid supply pipe 522 is branched into two on the downstream side, and one is connected to the upper nozzle block 22 and the other is connected to the lower nozzle block 32. Accordingly, the processing liquid derived from the processing liquid storage tank 521 by driving the processing liquid supply pump 523 is supplied to the upper and lower nozzle blocks 22 and 32 through the processing liquid supply pipe 522.

  The processing liquid recovery system 53 includes a processing liquid recovery tank 531 that recovers and stores processing liquid after processing the substrate B, processing liquid leaked from the substrate processing space V during processing, and upper and lower drainage blocks 23. , 33 are connected to each other, and after being joined, the downstream end is connected to the processing liquid recovery tank 531 and the drain pipe 532 for the processed processing liquid drain, and the drain pump provided in the drain pipe 532 533, a drainage pipe (common path) 534 that is connected to a plurality of drainage holes 347 provided in the top plate body 341 (FIG. 5), and a position below the lower housing 30. And a liquid receiving pan 535 that receives the processing liquid leaked from the substrate processing space V of the processing liquid supply apparatus 10.

  The liquid drain pipe 534 is connected at its downstream end to the processing liquid recovery tank 531, whereby the processing liquid extracted from the substrate processing space V is recovered to the processing liquid recovery tank 531 by its own weight. The liquid draining pipe 534 is provided with a liquid draining valve 536, and the amount of liquid draining can be adjusted by changing the opening degree of the liquid draining valve 536. The liquid receiving pan 535 is formed in a funnel shape so as to receive the processing liquid leaked from the upstream end opening and the downstream end opening in the substrate transport direction in the processing liquid supply apparatus 10. The leaked processing liquid received by the liquid receiving pan 535 and collected at the bottom is recovered to the processing liquid recovery tank 531.

  According to the substrate processing apparatus 50 having such a configuration, the processing liquid supplied to the upper and lower nozzle blocks 22 and 32 through the processing liquid supply pipe 522 by driving the processing liquid supply pump 523 is supplied to the respective nozzle holes 223 and 323 ( It is supplied into the substrate processing space V via FIG. After the processing liquid supplied in the substrate processing space V fills the substrate processing space V, the processing liquid suction holes 233 of the upper and lower drainage blocks 23 and 33 are attracted by the suction force by driving the drainage pump 533. , 333 to the drainage pipe 532, whereby a processing liquid flow is formed in the substrate processing space V in the direction opposite to the substrate transport direction.

  In this state, when the substrate B is carried into the substrate processing space V of the processing liquid supply apparatus 10 along the substrate transport path 51 by the driving rotation of the transport roller 511, the substrate B moves in the substrate processing space V in the roller 343. The substrate B is moved forward and is contacted with the processing liquid in countercurrent, whereby the front and back surfaces of the substrate B are processed with the processing liquid.

  Then, the processing liquid introduced into the substrate processing space V from the upper and lower nozzle blocks 22 and 32 is supplied to the upper upper wing 251 and the lower front wing 351 attached to the upper and lower nozzle blocks 22 and 32, respectively. Since the gap dimension is set smaller than the vertical dimension of the substrate processing space V, leakage of the processing liquid toward the downstream side in the substrate transport direction is effectively prevented. In particular, when the substrate B passes between the front upper wing 251 and the front lower wing 351, the size of the gap between these and the front and back surfaces of the substrate is very small. Carrying out can be reduced.

  Further, the processing liquid flowing down along the surface side of the substrate B collides with the lower end portion of the upper drainage block 23 protruding downward from the upper bottom plate 21, and then the lower end surface of the upper drainage block 23 and the substrate B Since the liquid is sucked into the processing liquid suction hole 233 through the narrow gap, the leakage of the processing liquid from the upper drain block 23 side is effectively suppressed.

  Further, before the substrate B is carried into the substrate processing space V, the substrate processing space V is repelled by a hydrophobic environment so that the processing liquid leaks in the substrate transport direction. Make dense generation difficult.

  However, since the gap dimension between the wing bodies 254 and 354 of the front upper wing 251 and the front lower wing 351 is set smaller than the vertical dimension of the substrate processing space V, leakage of the processing liquid toward the downstream side in the substrate transport direction is caused. Thus, the flow of the processing liquid to the suction / discharge side is promoted, and liquid tightness is efficiently generated.

  As described above in detail, the processing liquid supply apparatus 10 according to the present invention is provided at the upper bottom plate 21 of the upper housing 20 facing the upper surface of the substrate passing therethrough, and at the downstream end of the upper bottom plate 21 in the substrate B transport direction. The upper nozzle block 22 that supplies the processing liquid to the lower surface side of the upper bottom plate 21 and the upper discharge that sucks and discharges the supplied processing liquid provided at the upstream end of the upper bottom plate 21 in the substrate transport direction from the lower surface side of the upper bottom plate 21. An upper casing 20 including a liquid block 23 is provided, a lower top plate 34 facing the lower surface of the substrate B that is disposed opposite to the upper bottom plate 21 and passes through, and a downstream end of the lower top plate 34 in the substrate transport direction. The lower nozzle block 32 that supplies the processing liquid to the upper surface side of the lower top plate 34, and the processing liquid that is provided and supplied to the upstream end of the lower top plate 34 in the substrate transport direction from the upper surface side of the lower top plate 34. Suction discharge Assuming that a lower housing 30 comprising a lower drainage block 33 is disposed opposite to the lower portion of the upper housing 20, the outer surfaces of the upper and lower nozzle blocks 22, 32 are directed toward the substrate transport direction. An upper wing 25 and a lower wing 35 that are respectively provided so as to allow passage of the substrate B are provided, and the upper and lower wings 25, 35 have a distance between their opposed surfaces of the upper bottom plate 21 and the lower top plate 34. The installation position is set to be shorter than the distance between the opposing surfaces.

  Therefore, the substrate B loaded between the upper bottom plate 21 and the lower top plate 34 from the upstream side in the substrate transport direction is processed by the processing liquid supplied from the upper nozzle block 22 at the upper end side of the substrate B. At the same time, the lower surface side is processed by the processing liquid supplied from the lower nozzle block 32 at the downstream end, and is transported out of the processing liquid supply apparatus 10 with the front and back surfaces processed.

  On the other hand, the processing liquid supplied from the upper nozzle block 22 is processed on the upper surface of the substrate B while flowing down from the downstream side in the substrate transport direction toward the upstream side in the substrate transport direction, and then the upper drain block. 23, the processing liquid supplied from the lower nozzle block 32 is processed toward the lower surface of the substrate B while flowing down from the downstream side in the substrate transport direction to the upstream side, and then in the substrate transport direction. Is sucked and discharged by the lower drainage block 33 provided on the upstream side.

  In this way, the substrate B is supplied from the downstream side to the processing liquid supply apparatus 10 from the upstream side in the substrate transport direction and is transported toward the downstream side, whereby the substrate B is flowed toward the upstream side. Since the front and back surfaces are processed by countercurrent contact with the liquid, the amount of the processing liquid is reduced while ensuring a reliable processing as compared with the conventional method of spraying the processing liquid on the substrate B. Can do.

  A front upper wing 251 and a front lower wing 351 are provided on the outer surfaces of the upper and lower nozzle blocks 22 and 32 respectively so as to project in the substrate transport direction and allow the passage of the substrate B. Since the installation positions of the wings 251 and 351 are set so that the distance between the opposed surfaces thereof is shorter than the distance between the opposed surfaces of the upper bottom plate 21 and the lower top plate 34, the upper and lower nozzle blocks 22 and 32 The processing liquid supplied toward the substrate B is obstructed by the upper and lower wings 251 and 351 and the surface tension is increased to improve the liquid tightness, thereby improving the processing efficiency for the substrate B. In addition, the amount of leakage from the processing liquid supply apparatus 10 accompanying the substrate B can be suppressed, thereby contributing to reduction in processing costs. It can be.

  Further, since the upper drainage block 23 is set such that the lower surface thereof is at a lower level than the lower surface of the upper bottom plate 21, the process of flowing the upper surface of the substrate B toward the upstream side in the substrate transport direction. The liquid collides with the lower end portion of the upper drainage block 23, thereby preventing an inconvenience that the liquid is immediately discharged out of the substrate processing space V, and is reliably sucked into the upper drainage block 23.

  In this way, by setting the lower surface of the upper drainage block 23 at a lower level than the lower surface of the upper bottom plate 21, the processing liquid is upstream in the substrate transport direction in the substrate processing space V with a very simple configuration. It is possible to effectively suppress leakage from the side to the outside, and to increase the residence time of the processing liquid in the substrate processing space V, thereby improving the processing efficiency of the processing liquid with respect to the substrate B by the processing liquid. it can.

  The present invention is not limited to the above embodiment, and includes the following contents.

  (1) In the above embodiment, the processing liquid flowing down in the substrate processing space V along the upper surface of the substrate B toward the upstream side in the substrate transport direction protrudes downward from the upper bottom plate 21. Although it is made to collide with the lower end part of the liquid block 23, this invention is not limited to setting the lower end surface of the upper drainage block 23 to a lower level rather than the upper bottom board 21, and back upper wing The height level of the lower surface of the wing body 254 of 252 may be lower than the height level of the lower surface of the upper bottom plate 21.

  (2) In the above embodiment, the front upper wing 251 and the front lower wing 351 are provided with stepped portions 255 and 355, respectively, but in the present invention, the stepped portions 255 and 355 are provided on the upper and lower wings 251 and 351, respectively. It is not limited to providing, and it does not need to provide in particular. In this case, if the installation positions of the upper wing 25 and the lower wing 35 are set so that the wing main bodies 254 and 354 enter the substrate processing space V, the mounting plate portions 253 and 353 can be formed without the step portions 255 and 355. Leakage of the processing liquid can be prevented by the rear surface.

  That is, regarding the stepped portion formed at the downstream end in the substrate transport direction of the substrate processing space V, these stepped portions 255, 255, as long as they perform substantially the same function as the stepped portions 255, 355 of the above-described embodiment. Various structures similar to 355 can be employed.

  (3) In the above embodiment, a high frequency may be applied to the processing liquid flowing in the substrate processing space V. By doing so, since the processing liquid flowing in the substrate processing space V vibrates at a high cycle, the processing effect on the substrate B can be improved.

  (4) FIG. 9 is a cross-sectional view showing another embodiment of the roller 343 ′ attached to the lower top plate 34. The attachment structure of the roller 343 'shown in FIG. 9 is basically the same as that shown in FIG. That is, a recess 342 for loading a roller 343 'is formed on the upper surface side of the top plate body 341. Roller shafts that pivotally support the roller 343' on both side walls in the left-right direction of the recess 342. A bearing portion 342a for horizontally supporting 344 'is formed, and an insertion guide groove for inserting and removing the roller shaft 344' from the upper end of the both side walls to the bearing portion 342a is formed. The bottom portion 342b of the recess 342 has a substantially horizontal plane, and a small-diameter liquid drain hole 347 extending downward is formed in the center thereof.

  The roller 343 ′ has a required short width on the outer periphery, and in particular, the center thereof is formed in a spindle shape (convex shape) in the left-right direction. Since the contact area with the substrate B is reduced by the spindle shape, the contact damage of the substrate can be reduced. This spindle shape can be similarly applied to the roller 343 shown in FIG.

  A liquid hole 341a is formed in the thickness of the top plate body 341 to communicate the bearing portion 342a with the outside (the side surface or the lower surface side of the top plate body 341). Further, a concentric liquid hole 344a is formed in the middle of the roller shaft 344 'to the middle in the longitudinal direction, and a through-fluid hole 344b passing through the center in the radial direction is formed at the middle position in the longitudinal direction of the roller shaft 344'. Has been. Accordingly, the liquid hole 344a and the penetrating liquid hole 344b communicate with each other, and the liquid hole 341a of the top plate body 341 communicates with the liquid hole 344a of the rotating shaft. As a result, the liquid hole 341a and the penetrating liquid hole 344b communicate with each other. The The inner diameter of the roller 343 ′ is set so that a gap is formed between the inner peripheral wall surface of the roller 343 ′ and the outer peripheral surface of the roller shaft 344 ′ so that the processing liquid can flow through the gap. In addition, the external opening side of the liquid hole 341a is connected to the cleaning liquid tank via a supply pump (not shown). By driving this supply pump, the cleaning liquid is sprayed onto the inner peripheral wall surface of the roller 343 '. It can be supplied.

  According to this configuration, as in the case of FIG. 6, the lower surface of the substrate B carried into the processing liquid supply apparatus 10 is supported by the rollers 343 ′ and bent downward to come into contact with the top plate body 341. Disappear. Further, the roller 343 'is driven by the transport force of the substrate B and smoothly transfers the substrate B. Even if particles or the like are generated due to frictional rotation between the roller 343 ′ and the roller shaft 344 ′, the particles are sucked through the liquid drain hole 347, and together with the cleaning liquid through the liquid drain pipe 534 (FIG. 8). Since it is recovered in the processing liquid recovery tank 531, it does not go around the top surface of the top plate main body 341 and mix with the cleaning liquid being cleaned, thereby reducing the cleaning effect and damaging the back surface of the substrate B. Further, since the cleaning liquid is jetted and supplied to the inner peripheral wall surface of the roller 343 ', even if particles or the like are generated due to frictional rotation with the roller shaft 344', the particles can be washed out more effectively. . In addition, after the substrate processing is completed, the inner peripheral side wall of the roller 343 'to which the processing liquid is attached can be cleaned, and the processing liquid (in the case where the processing liquid is not a cleaning water but a chemical liquid is used). Can be effectively prevented from adhering to the surface, and crystals due to drying can be effectively prevented, and the smooth rotation of the roller 343 'can be ensured over a long period of time.

It is a disassembled perspective view which shows one Embodiment of the process liquid supply apparatus which concerns on this invention. It is an assembly perspective view of the processing liquid supply apparatus shown in FIG. It is the sectional view on the AA line of FIG. It is a partially cutaway perspective view showing an embodiment of an upper nozzle block and a lower nozzle block. (A) shows the upper nozzle block and (B) shows the lower nozzle block. It is a partially notched perspective view which shows one Embodiment of a lower top plate. It is the DD sectional view taken on the line of FIG. It is a partially cutaway perspective view showing an embodiment of an upper drainage block and a lower drainage block. (A) shows an upper drainage block and (b) shows a lower drainage block. It is explanatory drawing of the side view which shows one Embodiment of the substrate processing apparatus with which the processing liquid supply apparatus which concerns on this invention was applied. It is sectional drawing which shows other embodiment of the roller with which a lower top plate is mounted | worn.

Explanation of symbols

10 Processing Solution Supply Device 20 Upper Case (Upper Processing Unit)
21 Upper bottom plate 22 Upper nozzle block (upper liquid supply path)
221 Screw hole 222 Treatment liquid supply passage 223 Nozzle hole 23 Upper drainage block (upper liquid discharge passage)
231 Screw hole 232 Processing liquid discharge passage 233 Processing liquid suction hole 24 Upper top plate 25 Upper wing 251 Front upper wing 252 Rear upper wing 253 Mounting plate (saddle)
254 Wing body (horizontal extension)
255 Stepped portion 30 Lower housing (lower processing portion)
31 Lower bottom plate 32 Lower nozzle block (lower liquid supply path)
321 Screw hole 322 Treatment liquid supply passage 323 Nozzle hole 33 Lower drain block (lower liquid discharge passage)
331 Screw hole 332 Treatment liquid discharge passage 333 Treatment liquid suction hole 34 Lower top plate 341 Top plate body 341a Liquid hole 342 Recess 342a Bearing portion 342b Bottom portion 343, 343 ′ Roller (rotating support)
344, 344 'roller shaft 344a liquid hole 344b penetrating liquid hole 345 roller body 346 bearing groove 347 liquid drain hole (liquid drain passage)
348 Laminated plate 349 Square hole 35 Lower wing 351 Front lower wing 352 Rear lower wing 353 Mounting plate portion (saddle)
354 Wing body (horizontal extension)
355 Stepped portion 40 Side plate 50 Substrate processing apparatus 51 Substrate transport path 511 Transport roller 52 Processing liquid supply system 521 Processing liquid storage tank 522 Processing liquid supply pipe 523 Processing liquid supply pump 53 Processing liquid recovery system 531 Processing liquid recovery tank 532 Drainage pipe 533 Drainage pump 534 Drain pipe (common path)
535 Liquid pan 536 Liquid drain valve B Substrate C Fluid coupling V Substrate processing space

Claims (4)

The upper bottom plate facing the upper surface of the substrate passing therethrough, provided at the downstream end of the upper bottom plate in the substrate transport direction, provided at the upper liquid supply passage for supplying the processing liquid to the lower surface side of the upper bottom plate, and provided at the upstream end, An upper processing section provided with an upper liquid discharge passage section for sucking and discharging the supplied processing liquid from the lower surface side of the upper bottom plate, and a lower ceiling facing the lower surface of the substrate passing through the upper processing section. A lower liquid supply path section that is provided at a downstream end in the substrate transport direction of the plate, the lower top plate, supplies a processing liquid to the upper surface side of the lower top plate, and an upper end, and the supplied processing liquid is In a processing liquid supply apparatus including a lower processing section provided with a lower liquid discharge passage section that sucks and discharges from the upper surface side of the lower top plate,
Wings projecting toward the substrate transport direction are arranged oppositely on the outer surfaces of the upper and lower liquid supply path portions,
Each of the wings has at least part of a portion where the distance between the opposing surfaces is shorter than the distance between the opposing surfaces of the upper bottom plate and the lower top plate.   The wing includes a flange fixed to each outer surface of the upper and lower liquid supply passages, and a horizontal extending portion that extends horizontally from an end of the flange and faces the surface to be processed of the substrate being transferred. 2. The processing liquid supply apparatus according to claim 1, further comprising a step portion formed by cutting out a corner portion on an outer surface side at a coupling position between the flange portion and the horizontal extension portion. .   The processing liquid supply apparatus according to claim 1, wherein the upper and lower wings are symmetrically set up and down. The upper bottom plate facing the upper surface of the substrate passing therethrough, provided at the downstream end of the upper bottom plate in the substrate transport direction, provided at the upper liquid supply passage for supplying the processing liquid to the lower surface side of the upper bottom plate, and provided at the upstream end, An upper processing section provided with an upper liquid discharge passage section for sucking and discharging the supplied processing liquid from the lower surface side of the upper bottom plate, and a lower ceiling facing the lower surface of the substrate passing through the upper processing section. Plate, a lower liquid supply path section that is provided at a downstream end of the lower top plate in the substrate transport direction, supplies a processing liquid to the upper surface side of the lower top plate, and an upstream end, and the supplied processing liquid is In a processing liquid supply apparatus including a lower processing section provided with a lower liquid discharge passage section that sucks and discharges from the upper surface side of the lower top plate,
The upper liquid discharge path part has a suction hole for sucking the processing liquid opened toward the lower surface,
The processing liquid supply apparatus according to claim 1, wherein a lower surface of the suction hole protrudes downward from a lower surface of the upper bottom plate.

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