JP2006301396A - Charging device for direct drawing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To materialize a charging device for a direct drawing device for the purpose of enabling users to easily introduce the direct drawing device with which a picture is directly drawn on an object for drawing. <P>SOLUTION: The charging device 1 is provided for the direct drawing device 2 in which a drawing data generated based on a layout design data and necessitated for drawing processing is supplied to a drawing engine 3 during drawing processing in real time, and a drawing pattern is formed on the object for drawing relative to which the drawing engine 3 is moving, based on the drawing data. The charging device 1 is equipped with: a counting means 11 to count the number of frames in the drawing data supplied to the drawing engine 3, with respect to the drawing data, packetized and formed into one frame, of the data of the amount necessary for one batch drawing processing with a drawing head in the drawing engine 3; and a charged amount determining means 12 to determine the charged amount corresponding to the number of the frames counted with the counting means 11. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a charging apparatus for a direct drawing apparatus that draws directly on a drawing object.

  In general, the wiring pattern of a wiring board is obtained by exposing and developing a photoresist provided on the board based on layout design data relating to the wiring pattern, developing a desired pattern on the board, and performing etching. Formed with. A photomask is usually used for this exposure process.

  On the other hand, in recent years, a patterning method by direct drawing that does not use a photomask has been developed and put into practical use. According to this method, the correction or deformation (that is, auto scaling) of the drawing pattern for dealing with the above-described expansion / contraction, distortion, displacement, etc. of the substrate can be performed in advance at the stage of drawing data generation, or in real time. As a result, significant improvements are brought about in terms of improved manufacturing accuracy, improved yield, shorter delivery times, reduced manufacturing costs, and the like.

  As a patterning method by direct drawing, for example, there are a method of forming an exposure pattern by maskless exposure processing using a digital micromirror device (DMD) or an electron beam exposure machine, a method of ink jet drawing, and the like.

  Among these, one conventional example of a patterning method by maskless exposure using DMD is as follows. That is, when directly exposing a photoresist formed on an exposure target substrate, pattern data corresponding to a pattern to be exposed is created, and this pattern data is input to a digital micromirror device (DMD), and a plurality of patterns in the DMD are input. By tilting the micromirror (micromirror) according to the pattern data, the direction of the reflected light from each micromirror obtained by projecting light onto the DMD is changed as appropriate, and the resist on the exposure target substrate is irradiated with the pattern. An exposure pattern corresponding to the data is formed (see, for example, Patent Document 1).

  FIG. 3 is a diagram schematically showing a general maskless exposure system.

  The maskless exposure system 100 includes an exposure apparatus 101 and a computer 102 connected to the exposure apparatus 101. The computer 102 supplies exposure data to the exposure apparatus 101 and controls the exposure apparatus 101. The exposure apparatus 101 includes a stage 110 on which an exposure target substrate 151 is placed, and an exposure unit 111 that relatively moves above the exposure target substrate 151 in the direction of the arrow in the drawing. The exposure unit 111 includes at least one exposure engine (not shown) that is assigned an area to be exposed on the substrate surface of the exposure target substrate 151 and that executes an exposure process in parallel. In the exposure engine, a plurality of exposure elements (not shown) for modulating the light source are two-dimensionally arranged. For example, when the maskless exposure system 100 uses a DMD, a DMD micromirror corresponds to the exposure element.

  FIG. 4 is a diagram showing the principle of operation of a general maskless exposure apparatus.

  The exposure means 111 that relatively moves on the exposure target substrate 151 has a plurality of exposure engines # 1 to #N (reference number 130) (where N is a natural number) in a direction orthogonal to the direction of relative movement of the exposure target substrate 151. Is provided. The stage controller 129 moves the exposure target substrate 151 relative to the exposure engines # 1 to #N (reference numeral 130) at a speed Vex.

The exposure target substrate 151 is virtually divided into N areas referred to as “strips # 1 to #N” (reference numeral 132). Each exposure engine # 1 to #N (reference numeral 130) exposes the corresponding strip # 1 to #N (reference numeral 132) while moving relative to the exposure target substrate 151 at the speed Vex. Here, the length of the exposure target substrate 151 in the relative movement direction, that is, the length of the strips # 1 to #N (reference numeral 132) is L _Y (hereinafter referred to as “strip length”). Further, the length in the direction perpendicular to the relative movement direction of the exposure target substrate 151 (hereinafter referred to as “the width of the exposure target substrate”) is L _X.

An area where exposure engines # 1 to #N (reference numeral 130) can be exposed at a time is limited. With regard to the direction orthogonal to the relative movement direction of the exposure target substrate 151, the exposure width W that can be exposed by one exposure engine corresponds to the width W of the illustrated strips # 1 to #N (reference numeral 132). Here, the relationship L _X = N × W is established. As the exposure width in the orthogonal direction that can be exposed by one DMD is larger, the exposure range of the exposure target substrate can be covered with a smaller number of DMDs, so that the cost of the exposure apparatus body can be reduced and the productivity can be reduced. Will improve.

Further, the range of the relative movement direction of the exposure target substrate 151 that can be exposed by one exposure engine is shorter than the strip length L _Y. Accordingly, each of the strips # 1 to #N (reference numeral 132) further includes M (where M is a natural number) “exposure block (i, j)” (where 1 ≦ i ≦ N, 1 ≦ j). ≦ M) ”(reference numeral 133), and the exposure engine sequentially exposes the exposure blocks (i, j). Here, the exposure block (i, j) when the relative movement direction of the length of the [Delta] Y, between the strip length L _Y relative movement direction of the length [Delta] Y of the exposure block (i, j) is, L _Y = M × ΔY relationship holds.

  The exposure data supplied to the exposure engines # 1 to #N (reference numeral 130) is typically data based on bitmap data. Since the bitmap data has a very large amount of data, it is not preferable to generate and store the bitmap data in advance before executing the exposure process because a large amount of memory resources are required. Therefore, in order to save memory resources, for each of the exposure engines # 1 to #N (reference numeral 130), the exposure data in bitmap format is based on layout design data (typically Gerber format data). In real time during the exposure process, every exposure engine # 1 to #N (reference numeral 130), that is, every strip # 1 to #N (reference numeral 132) and in each strip # 1 to #N (reference numeral 132) For each exposure block (i, j), it is virtually divided and generated, temporarily stored in the memory, and then sequentially supplied to the corresponding exposure engines # 1 to #N (reference numeral 130). Therefore, the exposure engines # 1 to #N (reference numeral 130) execute the maskless exposure process based on the exposure data in the bitmap data format for each supplied exposure block (i, j).

  Also, the light source in the exposure engine is turned on and off independently for each light source once every predetermined time. This predetermined time is referred to as a “frame”, and this switching speed is referred to as a frame rate. That is, the exposure engine can update the light irradiation pattern to the exposure target substrate once every frame. In other words, the exposure head in the exposure engine can execute one exposure process with the same irradiation pattern in one frame. For example, when the exposure apparatus uses a DMD, the switching speed of the micromirror angle (that is, the modulation speed of the DMD) is the frame rate, and the angle of each micromirror is controlled for each frame.

  The exposure data supplied to the exposure engine is packetized (encapsulated) for each data amount necessary for one exposure process, and the packetized data is sequentially supplied for each frame.

  As described above, since the exposure data in the bitmap format has a very large data capacity, in order to save memory resources, the exposure data is predetermined for each exposure block based on the layout design data in real time during the exposure process. And is supplied to the corresponding exposure engine. The generation of exposure data is performed by a data generation board (DGB). The exposure data for each exposure block “produced” in real time is sequentially “consumed” at a predetermined frame rate for each exposure block by the corresponding exposure engine.

  There is an example in which such a direct exposure system is connected to a local area network or an external network to perform network control from the vendor side to the user side (see, for example, Patent Document 2).

  Similarly, when each exposure apparatus on the user side is connected to a management apparatus such as a computer on the vendor side and is network-controlled, when the management apparatus downloads a processing algorithm to each exposure apparatus, a service fee is charged to the user side. A system has been proposed (see, for example, Patent Document 3).

  Similarly, when each device manufacturing apparatus on the user side is connected to a management apparatus such as a computer on the vendor side and is network-controlled, a system in which the network control is applied to field support and maintenance has been proposed (for example, patents). Reference 4). In this system, the field support is charged through the network, and consumable parts of the device manufacturing apparatus are managed.

JP-A-10-112579 JP 2002-57101 A JP 2003-142382 A JP 2003-318085 A

  As described above, according to a direct drawing apparatus that does not use a photomask, correction of a drawing pattern to cope with expansion / contraction, distortion, deviation, etc. of a drawing object can be performed in advance at the stage of drawing data generation. Alternatively, since it can be performed in real time, significant improvements are brought about in terms of improvement in manufacturing accuracy, improvement in yield, shortening of delivery time, and reduction in manufacturing cost.

  However, the direct drawing apparatus that has just been developed has not yet been widely used in the industry, and the initial investment for introducing the direct drawing apparatus is very high at present. For this reason, printed circuit board manufacturers and IC package manufacturers cannot be introduced easily, and direct drawing device manufacturers (or vendors) have limited sales of direct drawing devices themselves. Therefore, it is difficult to reduce the price due to the mass production effect of the direct drawing device.

  A direct writing apparatus that does not use a photomask has the advantages that conventional exposure apparatuses that use a photomask do not have, and thus can bring dramatic changes to the entire semiconductor industry. However, it has not been popularized for the above reasons.

  Even if a direct drawing apparatus is introduced, in order to recover the high initial investment required for the introduction, it is necessary to pass a certain amount of price on the product manufactured by the direct drawing apparatus. As a result, the product manufactured by the direct drawing apparatus is more expensive than the product manufactured by the conventional exposure apparatus using the photomask, and the price competitiveness is weak. This is one of the factors that impairs the desire to introduce a direct drawing apparatus by printed circuit board manufacturers and IC package manufacturers.

  Accordingly, in view of the above problems, an object of the present invention is to provide a charging apparatus for a direct drawing apparatus so that a user can easily introduce a direct drawing apparatus that directly draws on a drawing object. It is in.

  In order to achieve the above object, in the present invention, by renting a drawing apparatus directly to a user and setting an appropriate billing system, the initial investment amount for introducing the direct drawing apparatus is suppressed as much as possible. Funding is also ensured for the vendor (or manufacturer) of the drawing apparatus.

  FIG. 1 is a block diagram showing the principle of a charging apparatus for a direct drawing apparatus according to the present invention.

  According to the present invention, the drawing data required for the drawing process generated based on the layout design data is supplied to the drawing engine 3 in real time during the drawing process, and the drawing engine 3 is relative to the drawing engine 3 based on the drawing data. The charging device 1 for the direct drawing device 2 that forms a drawing pattern on a moving drawing object packetizes the amount of data required for one drawing process by the drawing head in the drawing engine 3 into one frame. With respect to the drawn data, the counting means 11 for counting the number of frames in the drawing data supplied to the drawing engine 3 and the charge amount determining means for determining the charge amount according to the number of frames counted by the count means 11 12.

  The charging amount determination means 12 may determine the charging amount in consideration of various charging parameters in addition to the number of frames.

  According to the present invention, when a direct drawing apparatus is rented directly to a user, an appropriate charging system is set to suppress the initial investment amount for introducing the direct drawing apparatus as much as possible, and the direct drawing apparatus vendor (manufacturer) ) Can also ensure the recovery of funds. The user can easily introduce the direct drawing apparatus at a low cost without having to purchase the direct drawing apparatus at a great expense. Therefore, the possibility that the direct drawing apparatus is widely spread in the semiconductor industry is increased, and as a result, the price of the main body of the direct drawing apparatus can be reduced due to the mass production effect of the direct drawing apparatus. Moreover, the price competitiveness of the product manufactured with the direct drawing apparatus is increased.

  In addition, for example, the charge amount can be set according to the design rule or position accuracy of the drawing pattern, and a higher charging system can be set for the drawing process for the high value-added product. The generated manufacturing cost can be passed on to the product price without difficulty.

  Furthermore, according to the present invention, it is possible to arrange the drawing element and the substitute part of the light source at the optimum timing by predicting the lifetime of the expensive drawing element and the light source. In addition, it is possible to minimize the risk of production line stoppage due to malfunction of the light source, and it is possible to compress the inventory of substitute parts of the vendor (manufacturer) of the direct drawing apparatus.

  As an embodiment of the present invention, a direct drawing apparatus forms a desired exposure pattern by irradiating a desired spot on an exposure target substrate, in which a plurality of exposure elements arranged along the direction of relative movement move relative thereto, with light. A case where the maskless exposure apparatus is used will be described. In this embodiment, a DMD (digital micromirror device) is used as an exposure engine of a maskless exposure apparatus. That is, in the maskless exposure apparatus according to the present embodiment, the exposure data necessary for the exposure process generated based on the bitmap data is supplied to the DMD in real time during the exposure process, and the DMD is based on this exposure data. A drawing pattern is formed on the object to be moved relatively.

  FIG. 2 is a block diagram illustrating a billing apparatus according to an embodiment of the present invention. The components of the maskless exposure apparatus 2 in the present embodiment are as follows.

  A data processing computer 20 that performs data processing of the maskless exposure apparatus 2-1 includes bitmap generation software 21 and communication means 22. The data processing computer 20 receives layout design data (typically Gerber format data) as its input, and performs bitmap processing after performing correction processing such as auto scaling in real time by the bitmap generation software 21, if necessary. Generate data. The generated bitmap data is sent to the exposure data generating means 10-1 in the data generation board 30.

  The exposure data generation means 10-1 in the data generation board 30 generates exposure data at a predetermined frame rate based on the bitmap data in real time during the exposure process. The generated exposure data is sent to the DMD (reference numeral 50).

  The accounting apparatus 1 according to the present embodiment is provided in the data generation board 30. The charging apparatus 1 includes a counting unit 11 and a charging amount determining unit 12. The billing amount determination unit 12 includes a billing amount calculation unit 33 that calculates a billing amount, and a non-volatile memory 34 that stores billing amount data calculated by the billing amount calculation unit 33 in a nonvolatile manner with time. Further, the charge amount determination means 12 may determine the charge amount according to not only the number of frames but also various charging parameters, and the memory 36 is for storing these various charging parameters. A specific example of the charging parameter will be described later.

  The light irradiated to the micromirror in the DMD 50 is generated by the laser light source unit 40 in which a plurality of laser diodes are arranged. In this embodiment, the laser light source unit 40 nonvolatilely stores the integrated values of the laser diode drive circuit 41 provided for each laser diode and the optical energy of the laser diode together with the time of the integration. Memory 42 and communication means 43 are provided.

Each of the communication unit 35 and the communication unit 43 communicates with the communication unit 22 and the memory 36.
The main computer 4 is connected to the data processing computer 20 via the Internet line, wireless communication or telephone line, etc., and enables remote monitoring or remote operation for calculation of billing charges and lifetime prediction of the laser light source unit. Is.

  Next, the operation of the charging apparatus 1 for the maskless exposure apparatus 2-1 will be described.

  A data processing computer 20 that performs data processing of the maskless exposure apparatus 2-1 receives layout design data (typically Gerber format data), and performs correction processing such as auto scaling by the bitmap generation software 21 if necessary. After being executed in real time, data (typically bitmap data) to be input to the data generation board 30 is generated.

  The exposure data generation means 10-1 in the data generation board 30 converts the received bitmap data into the amount of data necessary for one exposure process by the exposure element in the DMD 50, that is, the direction of the micro mirror in the DMD 50 once. Exposure data is generated by packetizing the data necessary for the switching operation into one frame. The exposure data generated by the exposure data generation means 10-1 is sent to the DMD 50.

  The counting means 11 in the accounting apparatus 1 counts the number of frames in the exposure data generated by the exposure data generating means 10-1.

  The charge amount calculation means 33 in the charge amount determination means 12 calculates the charge amount according to the number of frames counted by the count means 11. As a specific example, calculation such as “increase the charge amount by 1 every time 10 million frames are counted” is performed. Here, the number of frames in the exposure data is considered as follows. Expression (1) represents the number F of exposure data frames required to expose the length of the distance L when the distance in the relative movement direction to be exposed on the exposure target substrate is L [mm]. Is.

  That is, the number F of frames is the relative movement direction distance L [mm] to be exposed on the exposure target substrate, relative to the exposure target substrate by the exposure engine during one exposure process by the exposure element in the exposure engine. It is determined by dividing by the step size S [μm] which is the moving distance.

  Here, the step size S is a parameter depending on the bitmap resolution r in the layout design data. If α is an operation speed coefficient (dimensionless number) of the data generation board 30, it is expressed as S = αr. For example, when the bitmap resolution r = 0.5 [μm] and α = 1 is set, the bitmap data with the bitmap resolution r = 0.5 [μm] is used to set the exposure target substrate to 0. Exposure is possible with an accuracy of 5 [μm]. For example, when α = 2 is set, the exposure target substrate can be exposed with an accuracy of 1.0 [μm] using bitmap data with a bitmap resolution r = 0.5 [μm]. This means that bitmap data having a bitmap resolution r = 0.5 [μm] is used for exposure processing every other bit. For example, when α = 3, the exposure target substrate can be exposed with an accuracy of 1.5 [μm] using bitmap data with a bitmap resolution r = 0.5 [μm]. This means that bitmap data having a bitmap resolution r = 0.5 [μm] is used for exposure processing every two bits. When the value of the operation speed coefficient α of the data generation board 30 is increased, the exposure accuracy becomes rough as described above, but the exposure speed is increased.

  As described above, in this embodiment, charging is performed according to the number of exposure data frames. Under the same operating speed coefficient α, high-precision exposure is possible when the bitmap resolution r of the bitmap data is small, but at this time, the number of frames F is large as can be seen from equation (1). On the other hand, when the bitmap resolution r of the bitmap data is constant, the exposure speed becomes higher as the operation speed coefficient α is larger, but the exposure accuracy becomes rougher. In this case, as can be seen from Equation (1), the number F of frames is small. In other words, according to the present embodiment, which is charged according to the number of frames of exposure data, it is possible to realize a charging system in which “the higher the accuracy, the higher the charge”.

  When the charging amount is calculated by the charging amount calculation means 33, when various charging parameters are considered in addition to the number of frames, the charging amount is calculated in consideration of the charging parameters. Here, some specific examples of charging parameters will be described.

  The switching speed of the micromirrors in the DMD 50 is one of important parameters that represents not only the mechanical performance of the DMD but also the productivity of the maskless exposure apparatus 2-1. For a DMD capable of high-speed operation, a high-performance data generation board 30 adapted to the switching speed of the micromirror is required. The time T [sec] required to expose the length of the distance L when the operation speed of the data generation board 30, that is, the frame rate is Fmax [frame / sec] is expressed by Expression (2).

  From formula (2), it can be seen that the time T required for exposure is shorter as the frame rate Fmax of the data generation board 30 is larger. That is, productivity increases as the frame rate Fmax of the data generation board 30 increases. Therefore, in this embodiment, the frame rate Fmax of the data generation board 30 is set as one of the charging parameters. That is, as the frame rate Fmax of the data generation board 30 is larger, a higher charge amount is set. In accordance with the specific example given above, for example, calculation is performed such that “the billing amount is increased by 1 every time 5 million frames are counted”.

  In the case where the exposure process is performed with a plurality of DMDs arranged in a direction orthogonal to the relative movement direction of the exposure target substrate, the larger the exposure width W [mm] in the orthogonal direction that can be exposed by one DMD, the more Since the exposure range of the exposure target substrate can be covered with a small number of DMDs, the cost of the exposure apparatus main body can be reduced, and the productivity is improved. Therefore, in this embodiment, the exposure width W in the orthogonal direction that can be exposed by one DMD is set as one charging parameter. That is, as the exposure width W of one DMD is larger, a higher charge amount is set. According to the specific example given above, for example, calculation is performed such that “if the exposure width is double, the charge amount is increased by 1 every time 5 million frames are counted”. If the exposure widths of the DMDs arranged in a plurality are different, the charge amount may be set according to each exposure width.

  The critical difference between the maskless exposure apparatus 2-1 and the conventional exposure apparatus using a photomask is that exposure data can be corrected (or deformed) in real time, that is, it has an autoscaling function. However, when the wiring pattern to be drawn is simple, it may not be necessary to use the auto scaling function. Even in such a case, it is harsh to the user to charge the same amount as when the auto scaling function is used. Therefore, in the present embodiment, the generated exposure data is whether the layout design data is corrected in real time during the exposure processing of the exposure apparatus, that is, whether the auto scaling function is executed. Is one of the charging parameters. In this specification, this charging parameter is expressed as B1 for convenience. In other words, when the autoscaling function is used, it can be considered that a product with high added value is manufactured. Therefore, a higher unit of charge is set than when the autoscaling function is not used. To do. Whether or not the autoscaling function is used can be determined by the bitmap data generation software 21 in the data processing computer 20. For example, information on whether or not the autoscaling function is used is used as the data generation board. It may be added to the header of the bitmap data to be transmitted to 30.

  In the maskless exposure apparatus, it is also possible to perform only the generation of exposure data and not the actual exposure process for adjustment. In this way, it is harsh for the user to charge even when exposure data is generated for adjustment. Therefore, in this embodiment, when the generation of exposure data is only for adjustment and the actual exposure process is not performed, the charge amount calculation is stopped and the charge amount is not determined. That is, in this case, the number of frames counted by the counting means 11 is ignored. In this specification, this charging parameter is expressed as B2 for convenience. For example, when the purpose of generating the exposure data is to verify the correctness of the exposure data generated by the exposure data generating means 10-1, it is not necessary to light the laser diode of the laser light source unit 40. Therefore, if the lighting state of the laser diode is monitored, that is, the driving state of the laser diode driving circuit 41 is monitored through the communication means 43, it can be determined whether or not the actual exposure processing is being performed.

  Summarizing the various charging parameters described above, the calculation of the charging amount M by the charging amount calculation means 33 is expressed by a function represented by Expression (3).

  Note that it is not always necessary to introduce all the accounting parameters, and the accounting parameters may be appropriately selected according to the use state of the maskless exposure apparatus, the contract with the user, or the like. Further, the above charging parameter is an example, and other charging parameters may be set. For example, a discount is given to users who use multiple maskless exposure apparatuses, a discount is given when the user is an educational institution or a public research institution, and a customer discount is given to long-term users. A billing system may be set. Alternatively, a charging system that provides a free payout (mileage) may be set according to the period of use of the maskless exposure apparatus. Alternatively, a billing system may be set in which an extra charge is charged if there is any special use.

  Each charging parameter described above is stored in the memory 36 of FIG. Recording of the charging parameters in the memory 36 is performed by the data processing computer 20 via the communication means 22 and 35 or further by the main computer 4.

  The billing amount calculation means 33 calculates the billing amount based on the equation (3) in accordance with the number of frames and possibly considering the billing parameter.

  The charge amount calculated by the charge amount calculation means 33 is stored in the nonvolatile memory 34 together with the calculated time. By recording information about the calculated time, for example, periodic charging becomes possible. The billing amount data stored in the nonvolatile memory 34 is periodically transmitted to the data processing computer 20 via the communication means 22 and 35.

  In addition to billing based on the number of frames in the exposure data and billing considering the billing parameter, the usage record of the laser light source unit 40 may be billed. In this case, the energy of the light generated by the laser diode is integrated for each laser diode, and is stored in the nonvolatile memory 42 as nonvolatile information together with the integration time.

  Information stored in the nonvolatile memory 42 is transmitted to the memory 36 via the communication means 43. Accordingly, the billing amount calculation means 33 can calculate the billing amount by regarding the use record of the laser diode stored in the memory 36 as one of the billing parameters. The charge amount P relating to the use record of the laser diode is expressed by a function represented by the equation (4).

  Here, p1, p2, p3,..., Pn represent the amount of light energy (watt × time) generated by the n laser diodes constituting the laser light source unit 40.

  Further, as described above, since the use record of each laser diode can be grasped, the life of each laser diode may be predicted. In this case, it is only necessary to transmit information related to the use record of each laser diode to the data processing computer 20 via the communication means 22 and 43 and cause the data processing computer 20 to execute the prediction calculation. As a result, it is possible to arrange replacement parts for the laser diode at the optimum timing, so that the risk of production line stoppage due to malfunction of the laser diode of the user of the maskless exposure apparatus 2-1 can be minimized. In addition, it is possible to compress the inventory of substitute parts of the vendor (manufacturer) of the maskless exposure apparatus 2-1.

  The charge amount calculated by the charge amount calculation means 33 is stored in the nonvolatile memory 34 together with the calculated time. By recording information about the calculated time, it is possible to charge periodically. The charge amount data stored in the nonvolatile memory 34 is periodically transmitted to the data processing computer 20 via the communication means 22 and 35. Accordingly, it is possible to execute charging according to the transmitted charging amount data based on the contract with the user. Note that the definition of the function represented by the above formulas (3) and (4) may be changed for each user according to the contract with each user.

  The billing data sent to the data processing computer 20 may be further transmitted to the main computer 4 located outside via the Internet line, wireless communication or telephone line. For example, when a plurality of maskless exposure apparatuses 2-1 are provided, a plurality of data processing computers 20 are provided correspondingly. However, a plurality of data processing computers 20 are connected to one main computer 4. If it is connected so as to be communicable, it is possible to count the charge amount data relating to each maskless exposure apparatus. Further, for example, if the main computer 4 is placed under the control of the manufacturer (vendor) of the maskless exposure apparatus 2-1 that is the billing business executor or its agent, remote monitoring and collection become easy, and maskless exposure. Efficient operation of equipment rental business is also possible.

  As described above, the maskless exposure apparatus has been described as an example. However, a direct drawing apparatus in which a plurality of other drawing heads are arranged at predetermined intervals and a drawing object moves relative to the drawing head to perform drawing processing. The exact same principle can be applied. Examples of such a direct drawing apparatus include a ink jet drawing apparatus or a printing apparatus such as a laser printer.

  Among these, in an ink jet drawing apparatus using ink jet technology, a plurality of ink jet nozzles are arranged in an ink jet head at a predetermined design interval, and a drawing object moves relative to the ink jet head and is ejected from the ink jet head. A drawing pattern is directly drawn (patterned) on a substrate with a conductive paste.

  The ink jet technique is a technique for ejecting droplets from a nozzle having a small hole. In general, this ink jet technology is often used in printers, but when applied to ink jet patterning on a wiring board, the liquid droplets ejected from the nozzle are made into a conductive paste such as a liquid containing metal fine particles or a metal oxide material. do it. Inkjet technology uses a piezoelectric element that deforms when a voltage is applied, and instantaneously increases the fluid pressure in the ink chamber to push droplets out of the nozzle, and a heater attached to the head creates bubbles in the liquid. And is divided roughly into a thermal type that extrudes a liquid, and both cases are applicable to the present invention.

  When the present invention is applied to an ink jet drawing apparatus, the exposure head in the above-described embodiment of the present invention may be replaced with an ink jet head. That is, the discharge amount of the conductive paste by the ink jet head is integrated for each ink jet head, and is stored in the nonvolatile memory 42 as nonvolatile information together with the calculated time. The charge amount calculation means 33 can calculate the charge amount in accordance with the number of frames and the discharge amount of the conductive paste by the ink jet head found from the nonvolatile information. Further, it is possible to predict the replenishment time of the conductive paste to each inkjet head based on the nonvolatile information.

  In the present invention, drawing data required for drawing processing generated based on layout design data is supplied to a drawing engine in real time during drawing processing, and the drawing engine moves relative to the drawing data based on the drawing data. The present invention can be applied as a charging apparatus for a direct drawing apparatus that forms a drawing pattern on an object. The present invention can be applied to either a direct drawing apparatus that is a maskless exposure apparatus or an inkjet drawing apparatus.

  According to the present invention, rather than letting the user purchase an expensive direct drawing device, rather than renting it, the possibility that the direct drawing device is widely spread in the semiconductor industry is increased, and as a result, from the mass production effect of the direct drawing device, The body price of the direct drawing apparatus can be reduced. In addition, the price competitiveness of the product will increase. In particular, according to the present invention, it is possible to easily construct an appropriate charging system, so that the initial investment amount for introducing the direct drawing apparatus can be suppressed as much as possible, and the direct drawing apparatus vendor can surely recover the funds. Can be.

  In addition, the charge amount can be set according to the design rule of the drawing pattern, the position accuracy, and the like. For example, a higher charging system can be set for the drawing process for a high value-added product. The user can pass the generated manufacturing cost to the product price without difficulty.

  Also, by predicting the lifetime of expensive drawing elements, it is possible to arrange replacement parts at the optimal timing, so that the risk of production line stoppage due to defective drawing element operation is minimized for direct drawing device users. On the other hand, it is possible to reduce the inventory of substitute parts for the vendor of the direct drawing apparatus.

  According to the direct drawing apparatus, high-accuracy wiring can be designed, inspected, and formed easily and at high speed, and a margin for alignment is reduced, so that the wiring mounting density is increased. Therefore, it can sufficiently cope with future ultra-fine wiring. In addition, there is an advantage that design data is appropriately processed and correction information is accumulated, correction and routing can be executed dynamically, and design changes can be flexibly handled. According to the present invention, such an advantage can be easily enjoyed by the user without much investment.

It is a principle block diagram of the accounting apparatus in the direct drawing apparatus for this invention. It is a block diagram explaining the charging device by the Example of this invention. It is a figure which shows a general maskless exposure system schematically. It is a figure which shows the principle of operation of a general maskless exposure apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Accounting apparatus 2 Direct drawing apparatus 2-1 Maskless exposure apparatus 3 Drawing engine 4 Main computer 9 Data generation board 10 Drawing data generation means 10-1 Exposure data generation means 11 Count means 12 Charge amount determination means 20 Data processing computer 21 Bitmap data generation software 22 Communication means 30 Data generation board 33 Charge amount calculation means 34 Non-volatile memory 35 Communication means 36 Memory 40 Laser light source unit 41 Laser diode drive circuit 42 Non-volatile memory 43 Communication means 50 DMD

Claims (15)

The drawing data required for the drawing process generated based on the layout design data is supplied to the drawing engine in real time during the drawing process, and the drawing engine moves on the drawing object relative to the drawing data based on the drawing data. A charging device for a direct drawing device for forming a drawing pattern,
The number of frames in the drawing data supplied to the drawing engine is counted with respect to the drawing data obtained by packetizing an amount of data necessary for one drawing process by the drawing head in the drawing engine into one frame. Counting means;
Charge amount determining means for determining a charge amount according to the number of frames counted by the counting means;
A billing apparatus for a direct drawing apparatus, comprising:   The number of frames is the relative movement direction distance to be drawn on the drawing object, and the distance that the drawing engine moves relative to the drawing object during one drawing process by the drawing head in the drawing engine. The charging apparatus according to claim 1, wherein the charging apparatus is determined by dividing by a step size.   The billing apparatus according to claim 2, wherein the step size depends on a bitmap resolution in the layout design data.   The billing apparatus according to claim 1, wherein the billing amount determination unit determines the billing amount according to a frame rate that is a supply speed of the drawing data to the drawing engine in addition to the number of frames.   The charge amount determining means determines the charge amount according to a width in a direction perpendicular to a relative movement direction of an exposure object that can be drawn by one drawing engine in addition to the number of frames. The charging device described in 1.   2. The charge amount determination unit according to claim 1, wherein the charge amount determination unit determines the charge amount in accordance with whether or not layout design data is corrected in real time during a drawing process of the direct drawing apparatus in addition to the number of frames. Billing device.   The billing apparatus according to claim 1, wherein the billing amount determining means adds a desired premium billing to a billing amount determined according to the number of frames.   The billing apparatus according to claim 1, wherein the billing amount determination means subtracts a desired discount billing from a billing amount determined according to the number of frames. The billing amount determining means includes
Determination means for determining whether or not the drawing process of the exposure engine based on the generated drawing data is actually executed;
A stop means for stopping the determination of the charge amount when the determination means determines that the drawing process is not executed;
The charging device according to claim 1, comprising: The direct drawing apparatus is a maskless exposure apparatus that irradiates a desired spot on an exposure target substrate, in which a plurality of exposure elements arranged in the direction of relative movement relatively move, and forms a desired exposure pattern. The charging device according to claim 9, wherein
The determination unit is a billing apparatus that determines whether or not the drawing process of the exposure engine is actually executed by monitoring whether or not the exposure element is turned on. The direct drawing apparatus is a maskless exposure apparatus that irradiates a desired spot on an exposure target substrate, in which a plurality of exposure elements arranged in the direction of relative movement relatively move, and forms a desired exposure pattern. The charging device according to claim 1,
Storage means for integrating the amount of energy of light generated during maskless exposure for each of the exposure elements, and holding this as nonvolatile information;
Predicting means for predicting the lifetime of each of the exposure elements based on the nonvolatile information;
A charging device comprising: The direct drawing apparatus is a maskless exposure apparatus that irradiates a desired spot on an exposure target substrate, in which a plurality of exposure elements arranged in the direction of relative movement relatively move, and forms a desired exposure pattern. The charging device according to claim 1,
It further comprises storage means for holding the amount of light energy generated during maskless exposure as nonvolatile information,
The charge amount determining means determines the charge amount in accordance with the number of frames used and the actual usage of the exposure element determined from the non-volatile information. Ink-jet direct drawing in which the direct drawing device discharges a conductive paste to a desired spot on a drawing target substrate on which a plurality of ink-jet heads arranged along the direction of relative movement move relative thereto, thereby forming a desired drawing pattern The charging device according to claim 1, wherein the charging device is a device.
Storage means for integrating the discharge amount of the conductive paste by the ink jet head for each ink jet head and holding this as nonvolatile information;
Prediction means for predicting the replenishment time of the conductive paste to each inkjet head based on the nonvolatile information;
A charging device comprising: Ink-jet direct drawing in which the direct drawing device discharges a conductive paste to a desired spot on a drawing target substrate on which a plurality of ink-jet heads arranged along the direction of relative movement move relative thereto, thereby forming a desired drawing pattern The charging device according to claim 1, wherein the charging device is a device.
A storage unit that holds the discharge amount of the conductive paste by the inkjet head as nonvolatile information;
The billing amount determining means determines the billing amount according to the number of frames and the discharge amount of the conductive paste by the inkjet head found from the non-volatile information. The charging device according to any one of claims 1 to 14, wherein the charging device is for a plurality of the direct drawing devices.
The counting unit and the billing amount determining unit are provided for each of the direct drawing devices,
A charging device comprising a totaling unit that totals the charging amount for each of the direct drawing devices determined by the charging amount determination unit.

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