JP2006010901A5 - - Google Patents

Claims (9)

In a gray tone mask for forming a desired pixel pattern on a substrate for a display device, the gray tone mask having a pattern including a light shielding portion, a light transmitting portion, and a gray tone portion.
Including a drawing step of performing pattern drawing on a photosensitive material layer formed on a mask blank having a light-shielding film on a transparent substrate;
The drawing step draws performs an energy beam irradiation, in the feed direction of the energy beam, with a given beam intensity by combining a plurality of beam intensity, so that the same beam intensity at both ends of the pattern to be drawn In addition, a method for producing a gray-tone mask is characterized in that drawing is performed by combining the beam intensities .   2. The gray tone mask according to claim 1, wherein the gray tone portion is a region where a light shielding pattern having a resolution lower than a resolution limit of an exposure device used for performing exposure using the gray tone mask is formed. Production method. In the energy beam feed direction, a condition for combining a plurality of different beam intensities in stages is selected so that the beam intensity is equal at both ends with respect to the line width of the pattern to be drawn , and the condition can be selected. The method for manufacturing a gray-tone mask according to claim 1 , wherein the drawing position is selected and drawn . 4. The combination of the beam intensities, wherein a maximum beam intensity among a plurality of beam intensities that are different in stages is used in the center, and a beam intensity smaller than the center is used in combination at both ends thereof. Gray tone mask manufacturing method.   3. The method of manufacturing a gray-tone mask according to claim 1, wherein a plurality of equivalent beam intensities are combined with respect to a line width of a pattern to be drawn in the energy beam feeding direction. In order to be able to select a combination of equal beam intensities at both ends of the pattern to be drawn, drawing is performed using design data in which a line width different from the desired line width is set in advance. the method according to claim 1 or 2 gray-tone mask, wherein to make adjustments to the.   7. The method of manufacturing a gray tone mask according to claim 6, wherein the step after the drawing is an etching step. 3. The method of manufacturing a gray tone mask according to claim 1, wherein the gray tone portion is a region where a pattern corresponding to a channel portion of a thin film transistor substrate is formed.   A method for manufacturing a substrate for a liquid crystal display device, comprising using a gray-tone mask by the manufacturing method according to claim 1.