JP2006008641A - Process for producing optically active dihydropyrrole and tetrahydropyridine derivatives - Google Patents
Process for producing optically active dihydropyrrole and tetrahydropyridine derivatives Download PDFInfo
- Publication number
- JP2006008641A JP2006008641A JP2004191766A JP2004191766A JP2006008641A JP 2006008641 A JP2006008641 A JP 2006008641A JP 2004191766 A JP2004191766 A JP 2004191766A JP 2004191766 A JP2004191766 A JP 2004191766A JP 2006008641 A JP2006008641 A JP 2006008641A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- optically active
- same
- represented
- sodium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- VSWICNJIUPRZIK-UHFFFAOYSA-N 2-piperideine Chemical class C1CNC=CC1 VSWICNJIUPRZIK-UHFFFAOYSA-N 0.000 title claims abstract description 23
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 21
- -1 amino acid ester Chemical class 0.000 claims abstract description 47
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 28
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 22
- 150000002148 esters Chemical class 0.000 claims abstract description 16
- 125000006239 protecting group Chemical group 0.000 claims abstract description 13
- 238000002955 isolation Methods 0.000 claims abstract description 10
- 239000002253 acid Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 150000001768 cations Chemical class 0.000 claims abstract description 5
- 125000005396 acrylic acid ester group Chemical group 0.000 claims abstract description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims abstract 2
- 150000001875 compounds Chemical class 0.000 claims description 25
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 20
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 14
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 10
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 10
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 9
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- 238000006297 dehydration reaction Methods 0.000 claims description 6
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 claims description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 6
- 238000007363 ring formation reaction Methods 0.000 claims description 5
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 4
- 239000012312 sodium hydride Substances 0.000 claims description 4
- 229910000104 sodium hydride Inorganic materials 0.000 claims description 4
- ZFFBIQMNKOJDJE-UHFFFAOYSA-N 2-bromo-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(Br)C(=O)C1=CC=CC=C1 ZFFBIQMNKOJDJE-UHFFFAOYSA-N 0.000 claims description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 claims description 3
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical compound [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 claims description 3
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 claims description 3
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 claims description 3
- 229910052808 lithium carbonate Inorganic materials 0.000 claims description 3
- 229910000103 lithium hydride Inorganic materials 0.000 claims description 3
- HQRPHMAXFVUBJX-UHFFFAOYSA-M lithium;hydrogen carbonate Chemical compound [Li+].OC([O-])=O HQRPHMAXFVUBJX-UHFFFAOYSA-M 0.000 claims description 3
- 239000002798 polar solvent Substances 0.000 claims description 3
- 229910000028 potassium bicarbonate Inorganic materials 0.000 claims description 3
- 235000015497 potassium bicarbonate Nutrition 0.000 claims description 3
- 239000011736 potassium bicarbonate Substances 0.000 claims description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 3
- 235000011181 potassium carbonates Nutrition 0.000 claims description 3
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 claims description 3
- 229910000105 potassium hydride Inorganic materials 0.000 claims description 3
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 claims description 3
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 3
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 claims description 3
- WRIKHQLVHPKCJU-UHFFFAOYSA-N sodium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([Na])[Si](C)(C)C WRIKHQLVHPKCJU-UHFFFAOYSA-N 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 claims 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 48
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 17
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 16
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 239000010410 layer Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 12
- 238000003756 stirring Methods 0.000 description 12
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 11
- 239000002585 base Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 8
- 239000012044 organic layer Substances 0.000 description 8
- 229920006395 saturated elastomer Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000001816 cooling Methods 0.000 description 6
- 239000012043 crude product Substances 0.000 description 6
- 239000000543 intermediate Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000003814 drug Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 4
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229940024606 amino acid Drugs 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- YLYYGPXCIWHLPP-YFKPBYRVSA-N (2s)-2-(prop-2-enoxycarbonylamino)propanoic acid Chemical compound OC(=O)[C@H](C)NC(=O)OCC=C YLYYGPXCIWHLPP-YFKPBYRVSA-N 0.000 description 3
- 0 *C1C(*)=C(*)CC*1* Chemical compound *C1C(*)=C(*)CC*1* 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 239000003242 anti bacterial agent Substances 0.000 description 3
- 229940088710 antibiotic agent Drugs 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- LQQKDSXCDXHLLF-UHFFFAOYSA-N 1,3-dibromopropan-2-one Chemical compound BrCC(=O)CBr LQQKDSXCDXHLLF-UHFFFAOYSA-N 0.000 description 2
- BSIMZHVOQZIAOY-SCSAIBSYSA-N 1-carbapenem-3-carboxylic acid Chemical group OC(=O)C1=CC[C@@H]2CC(=O)N12 BSIMZHVOQZIAOY-SCSAIBSYSA-N 0.000 description 2
- OMGHIGVFLOPEHJ-UHFFFAOYSA-N 2,5-dihydro-1h-pyrrol-1-ium-2-carboxylate Chemical class OC(=O)C1NCC=C1 OMGHIGVFLOPEHJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- NMPVEAUIHMEAQP-UHFFFAOYSA-N alpha-bromo-acetaldehyde Natural products BrCC=O NMPVEAUIHMEAQP-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- IUBQJLUDMLPAGT-UHFFFAOYSA-N potassium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([K])[Si](C)(C)C IUBQJLUDMLPAGT-UHFFFAOYSA-N 0.000 description 2
- 239000012264 purified product Substances 0.000 description 2
- 238000013094 purity test Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- FTVLMFQEYACZNP-UHFFFAOYSA-N trimethylsilyl trifluoromethanesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)C(F)(F)F FTVLMFQEYACZNP-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- UTQNKKSJPHTPBS-UHFFFAOYSA-N 2,2,2-trichloroethanone Chemical group ClC(Cl)(Cl)[C]=O UTQNKKSJPHTPBS-UHFFFAOYSA-N 0.000 description 1
- 125000000453 2,2,2-trichloroethyl group Chemical group [H]C([H])(*)C(Cl)(Cl)Cl 0.000 description 1
- CELGZUZZTJEZAF-UHFFFAOYSA-N 2,3-dihydro-1h-pyrrole-5-carboxylic acid Chemical class OC(=O)C1=CCCN1 CELGZUZZTJEZAF-UHFFFAOYSA-N 0.000 description 1
- ZNOVTXRBGFNYRX-UHFFFAOYSA-N 2-[[4-[(2-amino-5-methyl-4-oxo-1,6,7,8-tetrahydropteridin-6-yl)methylamino]benzoyl]amino]pentanedioic acid Chemical compound C1NC=2NC(N)=NC(=O)C=2N(C)C1CNC1=CC=C(C(=O)NC(CCC(O)=O)C(O)=O)C=C1 ZNOVTXRBGFNYRX-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 239000002879 Lewis base Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003862 amino acid derivatives Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- YNNGZCVDIREDDK-UHFFFAOYSA-N aminocarbamodithioic acid Chemical compound NNC(S)=S YNNGZCVDIREDDK-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000005098 aryl alkoxy carbonyl group Chemical group 0.000 description 1
- 125000005099 aryl alkyl carbonyl group Chemical group 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000001589 carboacyl group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- RYPWQHONZWFXBN-UHFFFAOYSA-N dichloromethyl(methylidene)-$l^{3}-chlorane Chemical compound ClC(Cl)Cl=C RYPWQHONZWFXBN-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 150000002084 enol ethers Chemical class 0.000 description 1
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- USZLCYNVCCDPLQ-UHFFFAOYSA-N hydron;n-methoxymethanamine;chloride Chemical compound Cl.CNOC USZLCYNVCCDPLQ-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 150000007527 lewis bases Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- NXPHGHWWQRMDIA-UHFFFAOYSA-M magnesium;carbanide;bromide Chemical compound [CH3-].[Mg+2].[Br-] NXPHGHWWQRMDIA-UHFFFAOYSA-M 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- VDCLSGXZVUDARN-UHFFFAOYSA-N molecular bromine;pyridine;hydrobromide Chemical compound Br.BrBr.C1=CC=NC=C1 VDCLSGXZVUDARN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- KPADFPAILITQBG-UHFFFAOYSA-N non-4-ene Chemical compound CCCCC=CCCC KPADFPAILITQBG-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000005633 phthalidyl group Chemical group 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- KPIIGXWUNXGGCP-UHFFFAOYSA-N pyridine-4-carbothioamide Chemical compound NC(=S)C1=CC=NC=C1 KPIIGXWUNXGGCP-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- BEOOHQFXGBMRKU-UHFFFAOYSA-N sodium cyanoborohydride Chemical compound [Na+].[B-]C#N BEOOHQFXGBMRKU-UHFFFAOYSA-N 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Pyrrole Compounds (AREA)
Abstract
【課題】 下記式(IV) で表される光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体の製造法。
【解決手段】 式(I):
[式中、R1は水素原子あるいはアミノ基の保護基を、R2は置換されていても良い炭素数1〜6の低級アルキル基を、R3は炭素数1〜3の低級アルキル基を表す。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これにアクリル酸エステルまたは4-ハロゲノブタン酸エステルを反応させ、閉環して得られたエノラート体(II):
[式中、R1とR2は前掲に同じ。Rはエステル残基を、mは1または2を、Mは一価の金属陽イオンを表す。]
を単離することなく還元して式(III):
[式中、R1、R2、Rおよびmは前掲に同じ。]
で表されるβ-ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IV):
[式中、R1、R2、Rおよびmは前掲に同じ。]
で表される光学活性なジヒドロピロールまたはテトラヒドロピリジン誘導体の製造法。
【選択図】なし
PROBLEM TO BE SOLVED: To produce an optically active dihydropyrrole and tetrahydropyridine derivative represented by the following formula (IV):
SOLUTION: Formula (I):
[In the formula, R 1 represents a hydrogen atom or amino protecting group, R 2 represents an optionally substituted lower alkyl group having 1 to 6 carbon atoms, and R 3 represents a lower alkyl group having 1 to 3 carbon atoms. To express. ]
An enolate (II) obtained by ring-closing by reacting an acrylic acid ester or 4-halogenobutanoic acid ester in the presence of a base with an optically active amino acid ester represented by the following:
[Wherein R 1 and R 2 are the same as described above. R represents an ester residue, m represents 1 or 2, and M represents a monovalent metal cation. ]
Can be reduced without isolation to formula (III):
[Wherein, R 1 , R 2 , R and m are the same as described above. ]
Formula (IV) characterized in that after being converted to a β-hydroxyester represented by the formula (IV):
[Wherein, R 1 , R 2 , R and m are the same as described above. ]
A process for producing an optically active dihydropyrrole or tetrahydropyridine derivative represented by the formula:
[Selection figure] None
Description
本発明は、各種医薬品の合成中間体化合物として重要な、光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体の製造法に関する。 The present invention relates to a method for producing optically active dihydropyrrole and tetrahydropyridine derivatives, which are important as synthetic intermediate compounds for various pharmaceuticals.
従来からジヒドロピロールおよびテトラヒドロピリジン誘導体は各種医薬品の合成中間体として用いられてきている。例えば、本発明が提供する製造法により得られるジヒドロピロールおよびテトラヒドロピリジン誘導体は、優れた抗菌活性を有するカルバペネム系抗生物質の2位の側鎖原料として利用されている(特許文献1、非特許文献1)。しかしながら、例えばテトラヒドロピリジン誘導体を製造するに当たって用いられているディークマン閉環条件は反応時間が1分と極端に短いなど大量製造には用い難い。(特許文献1、非特許文献1)しかも、特許文献1の方法では、得られる化合物の光学純度についてもさらに検討の余地があった。
ジヒドロピロールおよびテトラヒドロピリジン誘導体の他の製造法については例えば特許文献2,3,4および非特許文献2などに開示されている。しかしながら、特許文献2では光学純度については明確に言及されておらず、非特許文献2はラセミ混合物の合成のみが記載されている。さらに、光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体の製法としては3−ピロリン−2−カルボン酸誘導体(特許文献3)あるいは2−ピロリン−2−カルボン酸誘導体(特許文献4)について言及されているのみであり、置換様式を異にする本発明によって得られる3−ピロリン−2−カルボン酸誘導体成績体についての報告はない。また、式(I)から、式(II)あるいは式(III)を単離しないで、式(IV)まで1ポットで製造できるとの報告もない。
Other methods for producing dihydropyrrole and tetrahydropyridine derivatives are disclosed in, for example, Patent Documents 2, 3, 4 and Non-Patent Document 2. However, Patent Document 2 does not explicitly mention optical purity, and Non-Patent Document 2 describes only the synthesis of a racemic mixture. Furthermore, as a method for producing optically active dihydropyrrole and tetrahydropyridine derivatives, only 3-pyrroline-2-carboxylic acid derivatives (Patent Document 3) or 2-pyrroline-2-carboxylic acid derivatives (Patent Document 4) are mentioned. However, there are no reports on 3-pyrroline-2-carboxylic acid derivative products obtained by the present invention with different substitution patterns. Further, there is no report that from formula (I), formula (II) or formula (III) can be produced in one pot up to formula (IV) without isolation.
本発明が解決しようとする課題は、各種医薬品の合成中間体化合物として重要な、光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体を高い光学純度で、効率的に、大量に製造できる方法を提供することである。 The problem to be solved by the present invention is to provide a method capable of efficiently and efficiently producing optically active dihydropyrrole and tetrahydropyridine derivatives with high optical purity, which are important as synthetic intermediate compounds for various pharmaceuticals. is there.
本発明者らは種々の検討を行った結果、光学活性なアミノ酸エステルを出発物質とし、これに低温で塩基の存在下にアクリル酸エステルあるいは4−ハロゲノブタン酸エステルを反応させ、閉環して得られたエノラート体を単離することなく還元してβ−ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする光学純度の高いジヒドロピロールおよびテトラヒドロピリジン誘導体の効率的で大量合成可能な製造方法を完成した。
すなわち本発明は、
(1)式(I):
[式中、R1は水素原子あるいはアミノ基の保護基を、R2は置換されていてもよい炭素数1〜6の低級アルキル基を、R3は炭素数1〜3の低級アルキル基を表す。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これにアクリル酸エステルまたは4−ハロゲノブタン酸エステルを反応させ、閉環して得られたエノラート体(II):
[式中、R1とR2は前掲に同じ。Rはエステル残基を、mは1または2を、Mは一価の金属陽イオンを表す。]
を単離することなく還元して式(III):
[式中、R1、R2、Rおよびmは前掲に同じ。]
で表されるβ−ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IV):
[式中、R1、R2、Rおよびmは前掲に同じ。]
で表される光学活性なジヒドロピロールまたはテトラヒドロピリジン誘導体の製造法。
As a result of various studies, the present inventors have obtained an optically active amino acid ester as a starting material, which is reacted at low temperature with an acrylate ester or 4-halogenobutanoic acid ester in the presence of a base, followed by ring closure. An efficient and large amount of dihydropyrrole and tetrahydropyridine derivatives with high optical purity, characterized in that the enolate is reduced to a β-hydroxy ester without isolation and then subjected to a dehydration reaction. A production method capable of synthesis was completed.
That is, the present invention
(1) Formula (I):
[Wherein R 1 represents a hydrogen atom or an amino-protecting group, R 2 represents an optionally substituted lower alkyl group having 1 to 6 carbon atoms, and R 3 represents a lower alkyl group having 1 to 3 carbon atoms. To express. ]
An enolate (II) obtained by ring-closing by reacting an acrylate ester or 4-halogenobutanoic acid ester in the presence of a base with an optically active amino acid ester represented by the following formula:
[Wherein R 1 and R 2 are the same as described above. R represents an ester residue, m represents 1 or 2, and M represents a monovalent metal cation. ]
Can be reduced without isolation to formula (III):
[Wherein, R 1 , R 2 , R and m are the same as described above. ]
Formula (IV) characterized in that after being converted to a β-hydroxyester represented by the formula (IV):
[Wherein, R 1 , R 2 , R and m are the same as described above. ]
A process for producing an optically active dihydropyrrole or tetrahydropyridine derivative represented by the formula:
(2)式(I):
[式中、R1、R2およびR3は前記1に同じ。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これにアクリル酸エステルを反応させ、閉環して得られたエノラート体(IIa):
[式中、R1、R2、RおよびMは前記1に同じ。]
を単離することなく還元して式(IIIa):
[式中、R1、R2およびRは前記1に同じ。]
で表されるβ−ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IVa):
[式中、R1、R2、Rおよびmは前記1に同じ。]
で表される光学活性なジヒドロピロール誘導体の製造法。
(2) Formula (I):
[Wherein, R 1 , R 2 and R 3 are the same as those in 1 above. ]
An enolate (IIa) obtained by ring-closing by reacting an acrylate ester in the presence of a base with an optically active amino acid ester represented by
[Wherein, R 1 , R 2 , R and M are the same as the above 1. ]
Can be reduced without isolation to formula (IIIa):
[Wherein, R 1 , R 2 and R are the same as those in 1 above. ]
Formula (IVa) characterized in that after being converted to a β-hydroxyester represented by the formula (IVa):
[Wherein, R 1 , R 2 , R and m are the same as those in 1 above. ]
The manufacturing method of the optically active dihydropyrrole derivative represented by these.
(3)式(I):
[式中、R1、R2およびR3は前記1に同じ。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これに4−ハロゲノブタン酸エステルを反応させ、閉環して得られたエノラート体(IIb):
[式中、R1、R2、RおよびMは前記1に同じ。]
を単離することなく還元して式(IIIb):
[式中、R1、R2およびRは前記1に同じ。]
で表されるβ−ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IVb):
[式中、R1、R2、Rおよびmは前記1に同じ。]
で表される光学活性なテトラヒドロピリジン誘導体の製造法。
(3) Formula (I):
[Wherein, R 1 , R 2 and R 3 are the same as those in 1 above. ]
The enolate (IIb) obtained by cyclization by reacting 4-halogenobutanoic acid ester in the presence of a base with an optically active amino acid ester represented by the following formula:
[Wherein, R 1 , R 2 , R and M are the same as the above 1. ]
Can be reduced without isolation to formula (IIIb):
[Wherein, R 1 , R 2 and R are the same as those in 1 above. ]
Formula (IVb) characterized in that after being converted to a β-hydroxyester represented by the formula (IVb):
[Wherein, R 1 , R 2 , R and m are the same as those in 1 above. ]
The manufacturing method of the optically active tetrahydropyridine derivative represented by these.
(4)R2が置換されていてもよいメチルである前記1に記載の光学活性なジヒドロピロールまたはテトラヒドロピリジン誘導体の製造法。
(5)R2が置換されていてもよいメチルである前記2に記載の光学活性なジヒドロピロール誘導体の製造法。
(6)R2が置換されていてもよいメチルである前記3に記載の光学活性なテトラヒドロピリジン誘導体の製造法。
(7)閉環反応に用いる溶媒としてジメチルホルムアミド、1−メチル−2−ピロリドン、ジメチルスルホキシド、ヘキサメチルりん酸トリアミドのような非プロトン性極性溶媒から選ばれる少なくとも1種を用いる前記1〜6のいずれかに記載の製造法。
(8)閉環反応に用いる塩基として水素化リチウム、水素化ナトリウム、水素化カリウム、リチウムアミド、ナトリウムアミド、カリウムアミド、リチウムジイソプロピルアミド、リチウムヘキサメチルジシラジド、ナトリウムヘキサメチルジシラジド、カリウムヘキサメチルジシラジド、ナトリウムメトキシド、ナトリウムエトキシド、カリウムt−ブトキシド、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸水素リチウム、炭酸水素ナトリウムおよび炭酸水素カリウムから選ばれる少なくとも1種を用いる前記1〜7のいずれかに記載の製造法。
(4) The process for producing an optically active dihydropyrrole or tetrahydropyridine derivative as described in 1 above, wherein R 2 is optionally substituted methyl.
(5) The process for producing an optically active dihydropyrrole derivative as described in 2 above, wherein R 2 is optionally substituted methyl.
(6) The process for producing an optically active tetrahydropyridine derivative as described in 3 above, wherein R 2 is optionally substituted methyl.
(7) Any one of the above 1 to 6, wherein at least one selected from aprotic polar solvents such as dimethylformamide, 1-methyl-2-pyrrolidone, dimethyl sulfoxide, and hexamethylphosphoric triamide is used as a solvent for the ring-closing reaction. The production method described in 1.
(8) Lithium hydride, sodium hydride, potassium hydride, lithium amide, sodium amide, potassium amide, lithium diisopropylamide, lithium hexamethyldisilazide, sodium hexamethyldisilazide, potassium hexa Methyl disilazide, sodium methoxide, sodium ethoxide, potassium t-butoxide, lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, lithium bicarbonate, sodium bicarbonate and potassium bicarbonate The manufacturing method in any one of said 1-7 using at least 1 sort (s) chosen from.
本発明によれば、各種医薬品の合成中間体化合物として重要な、光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体を高い光学純度で、効率的に、大量に製造できるため、工業的に有利な製造方法である。 According to the present invention, optically active dihydropyrrole and tetrahydropyridine derivatives, which are important as synthetic intermediate compounds for various pharmaceuticals, can be produced efficiently and in large quantities with high optical purity. is there.
以下本発明を詳しく説明する。本発明に係る光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体の製造方法の反応スキームは以下のとおりである。
光学活性なアミノ酸誘導体である化合物(I)に塩基の存在下アクリル酸エステルあるいは4−ハロゲノブタン酸エステルを反応させると窒素原子上でアルキル化が起こってジエステル体が生成すると同時にディークマン閉環反応が進行し、エノラート体である化合物(II)が生成する(第一工程)。化合物(II)は単離することなく還元してβ−ヒドロキシエステルである化合物(III)へと容易に変換することが可能である(第二工程)。引き続いて化合物(III)を脱水反応に付することによって所望の光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体である化合物(IV)を高い光学純度で製造することができる(第三工程)。化合物(IV)は例えば優れた抗菌活性を有するカルバペネム系抗生物質の2位の側鎖原料として有用であり、本発明方法はこれらの中間体の製造方法として用いるのに好適である。
The present invention will be described in detail below. The reaction scheme of the method for producing optically active dihydropyrrole and tetrahydropyridine derivatives according to the present invention is as follows.
When compound (I), which is an optically active amino acid derivative, is reacted with an acrylate ester or 4-halogenobutanoate in the presence of a base, alkylation occurs on the nitrogen atom to form a diester, and at the same time, the Diekman ring closure reaction proceeds. Thus, compound (II) which is an enolate form is formed (first step). Compound (II) can be easily converted to compound (III) which is a β-hydroxy ester by reduction without isolation (second step). Subsequently, compound (IV) which is a desired optically active dihydropyrrole and tetrahydropyridine derivative can be produced with high optical purity by subjecting compound (III) to a dehydration reaction (third step). Compound (IV) is useful, for example, as a side chain raw material at the 2-position of carbapenem antibiotics having excellent antibacterial activity, and the method of the present invention is suitable for use as a method for producing these intermediates.
以下に化合物(I)、(II)、(III)および(IV)で表される化合物の置換基について説明する。
R1における「アミノ基の保護基」の例としては、常法により容易に除去し得るものであれば特に制約が無く、例えばT.W.Greene,P.G.M.Wuts: Protective Groups in Organic Synthesis;第3版,Wiley,New York (1999年)あるいはP.Kocienski,Protecting Groups,Thieme,Stuttgart(1994年)を参照することができる。好適には例えば、ホルミル、アセチル、プロピオニル等の炭素数1〜5の低級アルカノイル、クロロアセチル、トリクロロアセチル、トリフロロアセチル等の炭素数2〜5のハロゲノアルカノイル、ベンゾイル、2−ピリジルカルボキシ、3−ピリジルカルボキシ等のアリールカルボニル、フェニルアセチル、3−フェニルプロピオニル等のアラルキルカルボニル、tert−ブチルオキシカルボニル等の(炭素数1〜5の低級アルキル)オキシカルボニル、例えば2−ヨウ化エチルオキシカルボニル、2,2,2−トリクロロエチルオキシカルボニル等の(炭素数1〜5のハロゲノアルキル)オキシカルボニル、例えばアリルオキシカルボニル等の置換または無置換の(炭素数3〜7の低級アルケニル)オキシカルボニル、例えばベンジルオキシカルボニル、p−メチルオキシベンジルオキシカルボニル、o−ニトロベンジルオキシカルボニル、p−ニトロベンジルオキシカルボニル等のアラルキルオキシカルボニル、例えばトリメチルシリル、トリエチルシリル、tert−ブチルジメチルシリル等のトリアルキルシリル等が挙げられる。さらに生体内で加水分解されてアミノ基を再生する各種保護基を用いることも可能であって、好適には例えば、(5−メチル−1,3−ジオキソレン−2−オン−4−イル)メチルオキシカルボニル等が挙げられる。
The substituents of the compounds represented by compounds (I), (II), (III) and (IV) will be described below.
Examples of the “amino-protecting group” in R 1 are not particularly limited as long as they can be easily removed by a conventional method. W. Greene, P.M. G. M.M. Wuts: Protective Groups in Organic Synthesis; 3rd edition, Wiley, New York (1999) or P.W. Reference can be made to Kocienski, Protecting Groups, Thimeme, Stuttgart (1994). Suitably, for example, lower alkanoyl having 1 to 5 carbon atoms such as formyl, acetyl, propionyl, etc., halogenoalkanoyl having 2 to 5 carbon atoms such as chloroacetyl, trichloroacetyl, trifluoroacetyl, benzoyl, 2-pyridylcarboxy, 3- Arylcarbonyl such as pyridylcarboxy, aralkylcarbonyl such as phenylacetyl, 3-phenylpropionyl, (lower alkyl having 1 to 5 carbon atoms) oxycarbonyl such as tert-butyloxycarbonyl, for example, 2-iodoethyloxycarbonyl, 2, (Halogenoalkyl having 1 to 5 carbon atoms) oxycarbonyl such as 2,2-trichloroethyloxycarbonyl, for example, substituted or unsubstituted (lower alkenyl having 3 to 7 carbon atoms) oxycarbonyl such as allyloxycarbonyl, such as benzyloxy Examples thereof include aralkyloxycarbonyl such as carbonyl, p-methyloxybenzyloxycarbonyl, o-nitrobenzyloxycarbonyl, p-nitrobenzyloxycarbonyl and the like, for example, trialkylsilyl such as trimethylsilyl, triethylsilyl, tert-butyldimethylsilyl and the like. Furthermore, various protecting groups that can be hydrolyzed in vivo to regenerate the amino group can be used. For example, (5-methyl-1,3-dioxolen-2-one-4-yl) methyl is preferable. And oxycarbonyl.
R2における「炭素数1〜6の低級アルキル基」としてはメチル、エチル、n−プロピル、イソプロピル、n−ブチル、sec−ブチル、tert−ブチル、n−ペンチル、ネオペンチル、n−ヘキシル等の直鎖状または分枝鎖状で炭素数1〜6の低級アルキルがあげられる。「置換されていてもよい炭素数1〜6の低級アルキル基」の置換基としては、例えばヒドロキシ、メルカプト、(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)オキシ、(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)チオ、ホルミル、(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)カルボニル、ホルミルオキシ、(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)カルボニルオキシ、カルボキシル、(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)オキシカルボニル、炭素数3〜7の低級シクロアルキル、ハロゲン原子、シアノ、アミノ、モノ−あるいはジ−(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)アミノ、カルバモイル、モノ−あるいはジ−(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)アミド、カルバモイルオキシ、モノ−あるいはジ−(直鎖状または分枝鎖状で炭素数1〜5の低級アルキル)アミノカルボニルオキシ、グアニジノ、4−イミダゾリル、フェニル、4−ヒドロキシフェニル、3−インドリル等が挙げられる。これらの置換基は適当な保護基により保護されていてもよい。その際に用いられる保護基は常法により容易に除去し得るものであれば特に制約が無く、例えばT.W.Greene,P.G.M.Wuts: Protective Groups in Organic Synthesis;第3版,Wiley,New York (1999年)あるいはP.Kocienski,Protecting Groups,Thieme,Stuttgart(1994年)を参照することができる。また、置換基の置換位置は化学的に可能な位置であれば制限はなく、一箇所あるいは複数箇所の置換が可能である。 Examples of the “lower alkyl group having 1 to 6 carbon atoms” in R 2 include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-pentyl, neopentyl, n-hexyl and the like. Examples thereof include lower alkyl having 1 to 6 carbon atoms in the form of a chain or a branched chain. Examples of the substituent of the “optionally substituted lower alkyl group having 1 to 6 carbon atoms” include, for example, hydroxy, mercapto, (straight or branched lower alkyl having 1 to 5 carbon atoms) oxy, ( Linear or branched lower alkyl having 1 to 5 carbon atoms) thio, formyl, (linear or branched lower alkyl having 1 to 5 carbon atoms) carbonyl, formyloxy, (linear Alternatively, branched and lower alkyl having 1 to 5 carbon atoms) carbonyloxy, carboxyl, (straight or branched lower alkyl having 1 to 5 carbon atoms) oxycarbonyl, and lower cyclo having 3 to 7 carbon atoms Alkyl, halogen atom, cyano, amino, mono- or di- (linear or branched lower alkyl having 1 to 5 carbon atoms) amino, carbamoyl, mono- or di- (linear or branched) 1 carbon number 5 lower alkyl) amide, carbamoyloxy, mono- or di- (linear or branched lower alkyl having 1 to 5 carbon atoms) aminocarbonyloxy, guanidino, 4-imidazolyl, phenyl, 4-hydroxyphenyl , 3-indolyl and the like. These substituents may be protected by a suitable protecting group. The protecting group used in this case is not particularly limited as long as it can be easily removed by a conventional method. W. Greene, P.M. G. M.M. Wuts: Protective Groups in Organic Synthesis; 3rd edition, Wiley, New York (1999) or P.W. Reference can be made to Kocienski, Protecting Groups, Thimeme, Stuttgart (1994). Further, the substitution position of the substituent is not limited as long as it is chemically possible, and substitution at one place or plural places is possible.
R3における「炭素数1〜3の低級アルキル基」としてはメチル、エチル、n−プロピル、イソプロピル等の直鎖状または分枝鎖状で炭素数1〜3の低級アルキルがあげられる。好適なものとしてメチルおよびエチルがあげられる。
アクリル酸エステル、4−ハロゲノブタン酸エステルおよびRにおけるエステル残基の例としては、カルボキシル基の保護基となりうるエステル残基があげられる。その際に用いられる保護基は常法により容易に除去し得るものであれば特に制約が無く、例えばT.W.Greene,P.G.M.Wuts: Protective Groups in Organic Synthesis;第3版,Wiley,New York (1999年)あるいはP.Kocienski,Protecting Groups,Thieme,Stuttgart(1994年)を参照することができる。好適には例えばメチル、エチル、イソプロピル、tert−ブチル等の直鎖状または分枝鎖状で炭素数1〜5の低級アルキル、例えば2−ヨウ化エチル、2,2,2−トリクロロエチル等の炭素数1〜5のハロゲノ低級アルキル、例えばメチルオキシメチル、エチルオキシメチル、イソブチルオキシメチル等の炭素数1〜5の低級アルキルオキシメチル、例えばアセチルオキシメチル、プロピオニルオキシメチル、ブチリルオキシメチル,ピバロイルオキシメチル等の炭素数1〜5の低級脂肪族アシルオキシメチル、例えば1−エチルオキシカルボニルオキシエチル等の1−(炭素数1〜5の)低級アルキルオキシカルボニルオキシエチル、例えばベンジル、p−メチルオキシベンジル、o−ニトロベンジル、p−ニトロベンジル等のアラルキル基、例えばアリル、3−メチルアリル等の炭素数3〜7の低級アルケニル、ベンズヒドリル、フタリジル等が挙げられる。
4−ハロゲノブタン酸エステルにおける「ハロゲノ」としては好適には例えば、クロロ、ブロモ、ヨードが挙げられる。
Examples of the “lower alkyl group having 1 to 3 carbon atoms” in R 3 include linear or branched lower alkyl groups having 1 to 3 carbon atoms such as methyl, ethyl, n-propyl, isopropyl and the like. Preferred are methyl and ethyl.
Examples of the ester residue in acrylic acid ester, 4-halogenobutanoic acid ester and R include an ester residue which can be a protective group for a carboxyl group. The protecting group used in this case is not particularly limited as long as it can be easily removed by a conventional method. W. Greene, P.M. G. M.M. Wuts: Protective Groups in Organic Synthesis; 3rd edition, Wiley, New York (1999) or P.W. Reference can be made to Kocienski, Protecting Groups, Thimeme, Stuttgart (1994). Preferably, for example, linear or branched lower alkyl having 1 to 5 carbon atoms such as methyl, ethyl, isopropyl, tert-butyl, such as 2-ethyl iodide, 2,2,2-trichloroethyl, etc. Halogeno lower alkyl having 1 to 5 carbon atoms, for example, lower alkyloxymethyl having 1 to 5 carbon atoms such as methyloxymethyl, ethyloxymethyl, isobutyloxymethyl, such as acetyloxymethyl, propionyloxymethyl, butyryloxymethyl, C1-C5 lower aliphatic acyloxymethyl such as valoyloxymethyl, 1- (C1-5) lower alkyloxycarbonyloxyethyl such as 1-ethyloxycarbonyloxyethyl, such as benzyl, p- Aralkyl groups such as methyloxybenzyl, o-nitrobenzyl, p-nitrobenzyl Examples thereof include lower alkenyl having 3 to 7 carbon atoms such as allyl and 3-methylallyl, benzhydryl, phthalidyl and the like.
The “halogeno” in the 4-halogenobutanoic acid ester preferably includes, for example, chloro, bromo and iodo.
本発明の第一工程で用いられる塩基としては、Mで表される一価の金属陽イオンからなるものが挙げられ、好適な金属陽イオンとしてはリチウム、ナトリウム、カリウムが挙げられる。さらに具体的には水素化リチウム、水素化ナトリウム、水素化カリウム、リチウムアミド、ナトリウムアミド、カリウムアミド、リチウムジイソプロピルアミド、リチウムヘキサメチルジシラジド、ナトリウムヘキサメチルジシラジド、カリウムヘキサメチルジシラジド、ナトリウムメトキシド、ナトリウムエトキシド、カリウムt−ブトキシド、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸水素リチウム、炭酸水素ナトリウムおよび炭酸水素カリウムなどを挙げることができる。また、これら塩基は単独でも複数の組み合わせでも使用することができる。その使用量は、化合物(I)の1モルに対して0.1〜5.0モル用いることができるが、好ましくは0.5〜3.0モルである。一方、アクリル酸エステルあるいは4−ハロゲノブタン酸エステルの使用量は、化合物(I)の1モルに対して0.1〜20モル用いることができるが、好ましくは0.5〜10モルである。第一工程の反応は、冷却〜室温下で実施できるが、好ましくは冷却下、例えば−40℃〜+10℃で好適に実施できる。また、この反応は溶媒中で実施することができ、溶媒としては反応に悪影響を及ぼさないものであれば特に制約が無いが、好ましいものとしてはジメチルホルムアミド、1−メチル−2−ピロリドン、ジメチルスルホキシド、ヘキサメチルりん酸トリアミドのような非プロトン性極性溶媒が挙げられる。また、これら溶媒は単独でも複数の組み合わせでも使用することができる。
本発明の第二工程で用いられる還元剤としては水素化ホウ素ナトリウム、シアン化水素化ホウ素ナトリウムなどの水素化金属化合物が用いられる。その使用量は、化合物(II)に対して0.1〜5.0当量用いることができるが、好ましくは0.5〜3.0当量である。第二工程の反応は、冷却〜室温下で実施できるが、好ましくは冷却下、例えば−15℃〜+10℃で好適に実施できる。この反応は溶媒中で実施することができ、溶媒としては反応に悪影響を及ぼさないものであれば特に制約が無いが、好ましいものとしては水、メタノール、エタノールなどのプロトン性極性溶媒が挙げられる。また、これら溶媒は単独でも複数の組み合わせでも使用することができる。
Examples of the base used in the first step of the present invention include those composed of a monovalent metal cation represented by M, and suitable metal cations include lithium, sodium, and potassium. More specifically, lithium hydride, sodium hydride, potassium hydride, lithium amide, sodium amide, potassium amide, lithium diisopropylamide, lithium hexamethyldisilazide, sodium hexamethyldisilazide, potassium hexamethyldisilazide , Sodium methoxide, sodium ethoxide, potassium t-butoxide, lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, lithium bicarbonate, sodium bicarbonate and potassium bicarbonate Can do. These bases can be used alone or in combination. The amount to be used can be 0.1 to 5.0 mol, preferably 0.5 to 3.0 mol, per 1 mol of compound (I). On the other hand, the amount of acrylic acid ester or 4-halogenobutanoic acid ester used can be 0.1 to 20 mol, preferably 0.5 to 10 mol, per 1 mol of compound (I). The reaction in the first step can be carried out under cooling to room temperature, but is preferably carried out preferably under cooling, for example at −40 ° C. to + 10 ° C. Further, this reaction can be carried out in a solvent, and there are no particular restrictions on the solvent as long as it does not adversely affect the reaction, but preferred are dimethylformamide, 1-methyl-2-pyrrolidone, dimethyl sulfoxide. And aprotic polar solvents such as hexamethylphosphoric triamide. These solvents can be used alone or in combination.
As the reducing agent used in the second step of the present invention, metal hydride compounds such as sodium borohydride and sodium cyanoborohydride are used. The amount used can be 0.1 to 5.0 equivalents relative to compound (II), but preferably 0.5 to 3.0 equivalents. The reaction in the second step can be carried out under cooling to room temperature, but is preferably carried out under cooling, for example, at −15 ° C. to + 10 ° C. This reaction can be carried out in a solvent, and the solvent is not particularly limited as long as it does not adversely affect the reaction, and preferred examples include protic polar solvents such as water, methanol, ethanol and the like. These solvents can be used alone or in combination.
本発明の第二工程で用いられる脱水反応としては例えば硫酸、りん酸、蓚酸等の酸触媒を用いる方法、アルミナ、シリカゲル、モンモリノライト等の固体触媒を用いる方法、硫酸鉄(II)、硫酸銅(II)、硫酸ニッケル(II)等の金属触媒を用いる方法等が知られている(例えば、新実験化学講座、14巻、119頁)。化合物(III)のようなβ−ヒドロキシエステルが基質である場合には、水酸化カリウム、ナトリウムメトキシド等の強塩基触媒を用いても脱離反応が進行することが知られている(例えば、Journal of the American Chemical Society,第70巻, 1895−1898頁 (1948年)あるいはJournal of the American Chemical Society,第81巻, 2822−2826頁(1959年)など)。また、オキシ塩化りん、塩化チオニル、塩化メタンスルホニル、塩化p−トルエンスルホニル等のハロゲン化剤、スルホニル化剤等を用いてヒドロキシ基を適当な脱離基に変換した後に、穏和な条件下で脱離反応する方法も知られる(例えば、新実験化学講座、14巻、122頁)。さらには、適当なルイス酸とルイス塩基の組み合わせで脱水反応を実施することもできる(例えば、特開2004−107288号)。好適なものとして塩化メタンスルホニル、塩化p−トルエンスルホニル等のスルホニル化剤等を用いてヒドロキシ基を適当な脱離基に変換した後に、塩基で処理する方法が挙げられる。この際に用いられる塩基としては、有機アミン化合物を挙げることができる。好ましくは、例えばトリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミンなどのトリ(炭素数1〜4アルキル)アミンあるいは1,8−ジアザビシクロ[5.4.0]ウンデカ−7−エンや1,5−ジアザビシクロ[4.3.0]ノン−5−エンなどの二環性アミジン化合物を挙げることができる。この反応は溶媒中で実施することができ、溶媒としては反応に悪影響を及ぼさないものであれば特に制約が無いが、好ましいものとしては例えば、ヘキサン、ヘプタン、オクタンなどの脂肪族炭化水素、塩化メチレン、クロロホルム、四塩化炭素、1,2−ジクロロエタンなどのハロゲン化脂肪族炭化水素、ベンゼン、トルエン、キシレンなどの芳香族炭化水素、モノクロロベンゼン、ジクロロベンゼンなどのハロゲン化芳香族炭化水素が挙げられる。また、これら溶媒は単独でも複数の組み合わせでも使用することができる。 Examples of the dehydration reaction used in the second step of the present invention include a method using an acid catalyst such as sulfuric acid, phosphoric acid and succinic acid, a method using a solid catalyst such as alumina, silica gel and montmorinolite, iron (II) sulfate, sulfuric acid Methods using metal catalysts such as copper (II) and nickel (II) sulfate are known (for example, New Experimental Chemistry Course, Vol. 14, p. 119). In the case where a β-hydroxy ester such as compound (III) is a substrate, it is known that the elimination reaction proceeds even when a strong base catalyst such as potassium hydroxide or sodium methoxide is used (for example, Journal of the American Chemical Society, 70, 1895-1898 (1948) or Journal of the American Chemical Society, 81, 2822-2826 (1959). In addition, after converting the hydroxy group to a suitable leaving group using a halogenating agent such as phosphorus oxychloride, thionyl chloride, methanesulfonyl chloride, p-toluenesulfonyl chloride, sulfonylating agent, etc., it is removed under mild conditions. A method of releasing reaction is also known (for example, New Experimental Chemistry Course, Volume 14, p. 122). Furthermore, the dehydration reaction can be carried out with a combination of an appropriate Lewis acid and Lewis base (for example, JP-A-2004-107288). Preferable examples include a method in which a hydroxy group is converted into an appropriate leaving group using a sulfonylating agent such as methanesulfonyl chloride or p-toluenesulfonyl chloride and then treated with a base. Examples of the base used in this case include organic amine compounds. Preferably, tri (amine having 1 to 4 carbon atoms) such as triethylamine, tributylamine, diisopropylethylamine, or 1,8-diazabicyclo [5.4.0] undec-7-ene or 1,5-diazabicyclo [4.3.0] Bicyclic amidine compounds such as non-5-ene can be mentioned. This reaction can be carried out in a solvent, and the solvent is not particularly limited as long as it does not adversely affect the reaction. Preferred examples include aliphatic hydrocarbons such as hexane, heptane, and octane, chloride Halogenated aliphatic hydrocarbons such as methylene, chloroform, carbon tetrachloride and 1,2-dichloroethane, aromatic hydrocarbons such as benzene, toluene and xylene, and halogenated aromatic hydrocarbons such as monochlorobenzene and dichlorobenzene . These solvents can be used alone or in combination.
次に実施例を挙げて本発明を更に具体的に説明するが、本発明はもちろんこれらによって何ら限定されるものではない。
なお以下の実施例で用いている略号の意味は次の通りである。
ALOC:アリルオキシカルボニル
DBU:1,8−ジアザビシクロ[5.4.0]ウンデカ−7−エン
DMF:ジメチルホルムアミド
Me:メチル
THF:テトラヒドロフラン
EXAMPLES Next, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these examples.
The meanings of the abbreviations used in the following examples are as follows.
ALOC: Allyloxycarbonyl
DBU: 1,8-diazabicyclo [5.4.0] undec-7-ene
DMF: Dimethylformamide
Me: methyl
THF: tetrahydrofuran
実施例1
1−アリル 3−メチル (5S)−5−メチル−2,5−ジヒドロ−1H−ピロール−1,3−ジカルボキシレート
氷冷・窒素雰囲気下に60%水素化ナトリウム(1.01g、25.3mmol)を乾燥DMF(25ml)に懸濁し、アクリル酸メチル(11.5g、134mmol)を注加した。内温を−5〜0℃に保ちながらN−(アリルオキシカルボニル)−L−アラニンメチルエステル(純分5.00g、26.7mmol)の乾燥DMF(25ml)溶液を1時間で滴下した。0℃で1.5時間攪拌を継続した後、光学純度検定用に反応液(1 ml)をサンプリングした。内温を0〜+5℃に保ちながら予め冷却したイオン交換水(150ml)を20分間で滴下した。リン酸を加えて反応液のpHを7.24に調整した。メタノール(6ml)を加えた後、内温を−6〜−3℃に保ちながら水素化ホウ素ナトリウム(0.30g、7.9mmol)のイオン交換水(6ml)溶液を15分間で滴下した。この際同時に6N塩酸を滴下してpHを6.5〜7.5に保った。0℃で1時間攪拌を継続した後、予め冷却したヘプタン(100ml)を加えて抽出・分液した。一部析出物を含む水層に酢酸エチル(200ml)を加えて抽出・分液した。水層を酢酸エチル(100ml)で再抽出後、酢酸エチル層を合わせて飽和食塩水(100ml)洗浄・無水硫酸マグネシウム乾燥・減圧濃縮してアルコール体の粗製品(9.25g、プロトンNMR純度=73.0%)を得た。このものをトルエン(65ml)に溶解し、氷冷した。内温4〜5℃でトリエチルアミン(5.4g、53.4mmol)を滴下し、引き続いて内温を1〜6℃に保ちながら塩化メタンスルホニル(4.59g、40.1mmol)を12分間で滴下した。内温3〜5℃で1.5時間攪拌した後、DBU(12.2g、80.1mmol)を内温5〜13℃で滴下した。内温を30℃に加熱した後、同温度で140分間攪拌を継続した後、内温を4℃まで冷却した。内温4〜6℃で氷水(65ml)を12分間で滴下し、抽出・分液した。トルエン層を冷1N塩酸(39ml)・冷飽和重曹水(39ml)・冷飽和食塩水(39ml)の順に用いて洗浄後、無水硫酸マグネシウム乾燥・減圧濃縮して標題化合物の粗製品(7.30g、残存トルエンを除いた見かけ収率は88%)を得た。
(光学純度検定)
最初の反応(ディークマン反応)でサンプリングした反応液(1 ml)にジメチル硫酸(3滴)を加え、室温で10分間攪拌した。酢酸エチル(5 ml)と水(5 ml)で希釈し、抽出・分液した。有機層を無水硫酸ナトリウム乾燥・減圧濃縮して得られた下記構造のエノールエーテルをシリカゲル薄層クロマトグラフィーで精製した。
このものを以下に示す光学活性カラムを用いた高速液体クロマトグラフィーで分析したところ光学純度は99%e.e.以上であった。
カラム:ダイセル CHIRALCEL OJ−R (4.6mmφ×15cm)
移動相:水 / メタノール = 3 / 7
測定波長:254 nm
流量:0.5ml/分
保持時間:13.3分
Example 1
1-allyl 3-methyl (5S) -5-methyl-2,5-dihydro-1H-pyrrole-1,3-dicarboxylate
Under ice-cooling and nitrogen atmosphere, 60% sodium hydride (1.01 g, 25.3 mmol) was suspended in dry DMF (25 ml), and methyl acrylate (11.5 g, 134 mmol) was added thereto. While maintaining the internal temperature at −5 to 0 ° C., a dry DMF (25 ml) solution of N- (allyloxycarbonyl) -L-alanine methyl ester (pure content 5.00 g, 26.7 mmol) was added dropwise over 1 hour. After stirring for 1.5 hours at 0 ° C., the reaction solution (1 ml) was sampled for optical purity test. While maintaining the internal temperature at 0 to + 5 ° C., ion-cooled water (150 ml) cooled in advance was added dropwise over 20 minutes. Phosphoric acid was added to adjust the pH of the reaction solution to 7.24. After adding methanol (6 ml), a solution of sodium borohydride (0.30 g, 7.9 mmol) in ion-exchanged water (6 ml) was added dropwise over 15 minutes while maintaining the internal temperature at −6 to −3 ° C. At the same time, 6N hydrochloric acid was added dropwise to maintain the pH at 6.5 to 7.5. After stirring at 0 ° C. for 1 hour, heptane (100 ml) cooled in advance was added to perform extraction and liquid separation. Ethyl acetate (200 ml) was added to the aqueous layer containing a part of the precipitate, followed by extraction and liquid separation. The aqueous layer was re-extracted with ethyl acetate (100 ml), and the ethyl acetate layers were combined, washed with saturated brine (100 ml), dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give a crude alcohol product (9.25 g, proton NMR purity = 73.0 %). This was dissolved in toluene (65 ml) and cooled on ice. Triethylamine (5.4 g, 53.4 mmol) was added dropwise at an internal temperature of 4-5 ° C., and methanesulfonyl chloride (4.59 g, 40.1 mmol) was subsequently added dropwise over 12 minutes while maintaining the internal temperature at 1-6 ° C. After stirring at an internal temperature of 3 to 5 ° C. for 1.5 hours, DBU (12.2 g, 80.1 mmol) was added dropwise at an internal temperature of 5 to 13 ° C. After the internal temperature was heated to 30 ° C, stirring was continued at the same temperature for 140 minutes, and then the internal temperature was cooled to 4 ° C. Ice water (65 ml) was added dropwise over 12 minutes at an internal temperature of 4 to 6 ° C., followed by extraction and liquid separation. The toluene layer was washed with cold 1N hydrochloric acid (39 ml), cold saturated aqueous sodium bicarbonate (39 ml), and cold saturated brine (39 ml) in this order, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give the crude title compound (7.30 g, The apparent yield excluding residual toluene was 88%).
(Optical purity test)
Dimethyl sulfate (3 drops) was added to the reaction solution (1 ml) sampled in the first reaction (Diekmann reaction), and the mixture was stirred at room temperature for 10 minutes. Diluted with ethyl acetate (5 ml) and water (5 ml), extracted and separated. The enol ether having the following structure obtained by drying the organic layer over anhydrous sodium sulfate and concentrating under reduced pressure was purified by silica gel thin layer chromatography.
When this product was analyzed by high performance liquid chromatography using the optically active column shown below, the optical purity was 99% ee or higher.
Column: Daicel CHIRALCEL OJ-R (4.6mmφ × 15cm)
Mobile phase: water / methanol = 3/7
Measurement wavelength: 254 nm
Flow rate: 0.5ml / min Retention time: 13.3 minutes
実施例2
1−アリル 3−メチル (5S)−5−メチル−2,5−ジヒドロ−1H−ピロール−1,3−ジカルボキシレート
実施例1と同様にしてN−(アリルオキシカルボニル)−L−アラニンメチルエステル(純分125g、667.5mmol)からアルコール体の粗製品(185g、プロトンNMR純度=87.0%)を得た。このうち4.60gを用いて標題化合物の粗製品を得た後、シリカゲルカラムクロマトグラフィー精製して標題化合物の精製品(2.63g、収率71%)を得た。実施例1と同様にディークマン反応後の光学純度を検定したところ光学純度は99%e.e.以上であった。
Example 2
1-allyl 3-methyl (5S) -5-methyl-2,5-dihydro-1H-pyrrole-1,3-dicarboxylate N- (allyloxycarbonyl) -L-alanine methyl as in Example 1 The crude alcohol product (185 g, proton NMR purity = 87.0%) was obtained from the ester (pure content 125 g, 667.5 mmol). A crude product of the title compound was obtained using 4.60 g of this, and then purified by silica gel column chromatography to obtain a purified product of the title compound (2.63 g, yield 71%). When the optical purity after the Diekman reaction was tested in the same manner as in Example 1, the optical purity was 99% ee or higher.
実施例3
1−アリル 3−メチル (5S)−5−メチル−2,5−ジヒドロ−1H−ピロール−1,3−ジカルボキシレート
実施例1と同様に、N−(アリルオキシカルボニル)−L−アラニンメチルエステルから得たアルコール体(500mg、プロトンNMR純度=80.1%)をジクロロメタン(10ml)に溶解し、内温0〜5℃で塩化メタンスルホニル(353mg、3.1mmol)、引き続いてトリエチルアミン(520mg、5.1mmol)を滴下し、そのままの温度で30分間撹拌した。反応混合物に酢酸エチルを加え、飽和炭酸水素ナトリウム水溶液、飽和食塩水で順次洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下に溶媒を留去した。残渣をトルエン(5ml)に溶解し、トリエチルアミン(1.04g、10.3mmol)を滴下し、90℃で5時間撹拌した。室温に冷却後、反応混合物に酢酸エチルを加え、飽和炭酸水素ナトリウム水溶液、飽和食塩水で順次洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下に溶媒を留去した。残渣をシリカゲルカラムクロマトグラフィー精製して標題化合物の精製品(282mg、収率76%)を得た。
Example 3
1-allyl 3-methyl (5S) -5-methyl-2,5-dihydro-1H-pyrrole-1,3-dicarboxylate N- (allyloxycarbonyl) -L-alanine methyl as in Example 1 The alcohol obtained from the ester (500 mg, proton NMR purity = 80.1%) was dissolved in dichloromethane (10 ml), and methanesulfonyl chloride (353 mg, 3.1 mmol) was added at an internal temperature of 0 to 5 ° C., followed by triethylamine (520 mg, 5.1 mmol). ) Was added dropwise and stirred at the same temperature for 30 minutes. Ethyl acetate was added to the reaction mixture, and the mixture was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous magnesium sulfate, and the solvent was evaporated under reduced pressure. The residue was dissolved in toluene (5 ml), triethylamine (1.04 g, 10.3 mmol) was added dropwise, and the mixture was stirred at 90 ° C. for 5 hours. After cooling to room temperature, ethyl acetate was added to the reaction mixture, washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous magnesium sulfate, and the solvent was evaporated under reduced pressure. The residue was purified by silica gel column chromatography to obtain a purified product of the title compound (282 mg, yield 76%).
参考例1
アリル(2S)−2−メチル−4−(2−メルカプト−1,3−チアゾール−4−イル)−2,5−ジヒドロ−1H−ピロール−1−カルボキシレート
実施例2で得られた1−アリル 3−メチル (5S)−5−メチル−2,5−ジヒドロ−1H−ピロール−1,3−ジカルボキシレートはWO02/38564に開示されている方法(上記のスキーム)に従って、標題化合物へ誘導することができた。物性データはWO02/38564の参考例1で開示されているものに一致した。
Reference example 1
Allyl (2S) -2-methyl-4- (2-mercapto-1,3-thiazol-4-yl) -2,5-dihydro-1H-pyrrole-1-carboxylate
1-allyl 3-methyl (5S) -5-methyl-2,5-dihydro-1H-pyrrole-1,3-dicarboxylate obtained in Example 2 was prepared according to the method disclosed in WO02 / 38564 (above To the title compound. The physical property data agreed with that disclosed in Reference Example 1 of WO02 / 38564.
参考例2
アリル(2S)−2−メチル−4−(2−メルカプト−1,3−チアゾール−4−イル)−2,5−ジヒドロ−1H−ピロール−1−カルボキシレート
a) 実施例2と同様にして得られた1−アリル 3−メチル (5S)−5−メチル−2,5−ジヒドロ−1H−ピロール−1,3−ジカルボキシレート(45g、200mmol)のTHF(450ml)溶液を氷冷した。1N水酸化ナトリウム(220ml、220mmol)を滴下した。内温を3〜5℃に保ちながら2時間攪拌を続けた。減圧濃縮して大部分のTHFを留去し、クロロホルム(90ml)を用いて抽出・分液した。水層に6N塩酸を加えてpHを2に調整した後、クロロホルム(113ml)を用いて抽出・分液した。水層をさらにクロロホルム(113ml)を用いて抽出・分液し、有機層を合わせて、無水硫酸マグネシウム乾燥・減圧濃縮してカルボン酸の粗製品(43.8g、見かけ収率は定量的)を得た。
Reference example 2
Allyl (2S) -2-methyl-4- (2-mercapto-1,3-thiazol-4-yl) -2,5-dihydro-1H-pyrrole-1-carboxylate
a) THF of 1-allyl 3-methyl (5S) -5-methyl-2,5-dihydro-1H-pyrrole-1,3-dicarboxylate (45 g, 200 mmol) obtained as in Example 2 (450 ml) The solution was ice-cooled. 1N sodium hydroxide (220 ml, 220 mmol) was added dropwise. Stirring was continued for 2 hours while maintaining the internal temperature at 3 to 5 ° C. Concentrated under reduced pressure to remove most of the THF, and extracted and separated using chloroform (90 ml). 6N Hydrochloric acid was added to the aqueous layer to adjust the pH to 2, followed by extraction and liquid separation using chloroform (113 ml). The aqueous layer was further extracted and separated using chloroform (113 ml), and the organic layers were combined, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain a crude product of carboxylic acid (43.8 g, apparent yield is quantitative). It was.
b) 工程a)で得られたカルボン酸(43.8g)のTHF(1050ml)溶液を−20℃まで冷却した。トリエチルアミン(52.4g、518mmol)、クロロギ酸エチル(27g、248mmol)の順に滴下し、−20℃で45分間攪拌を続けた。N,O−ジメチルヒドロキシルアミン塩酸塩(60.6g、622mmol)とトリエチルアミン(63g、622mmol)を乾燥DMF(394ml)に懸濁し、先に調製した混合酸無水物溶液中へ加えた。−15℃で0.5時間、室温で1.5時間攪拌を続けた後、析出した塩を濾別し、THF(200ml)で二回洗浄した。濾液・洗液を合わせて、6N塩酸を加えてpHを2に調整した後、飽和食塩水(1200ml)を加えてから大部分のTHFを留去し、酢酸エチル(400ml)を用いて抽出・分液した。水層をさらに酢酸エチル(400ml)を用いて抽出・分液し、有機層を合わせてから1N塩酸(200ml)で二回、飽和重曹水(200ml)で一回洗浄した。有機層を無水硫酸マグネシウム乾燥・減圧濃縮してWeinrebアミドの粗製品(46.4g)を得た。 b) A solution of the carboxylic acid (43.8 g) obtained in step a) in THF (1050 ml) was cooled to -20 ° C. Triethylamine (52.4 g, 518 mmol) and ethyl chloroformate (27 g, 248 mmol) were added dropwise in this order, and stirring was continued at −20 ° C. for 45 minutes. N, O-dimethylhydroxylamine hydrochloride (60.6 g, 622 mmol) and triethylamine (63 g, 622 mmol) were suspended in dry DMF (394 ml) and added to the previously prepared mixed anhydride solution. Stirring was continued for 0.5 hours at −15 ° C. and 1.5 hours at room temperature, and then the precipitated salt was filtered off and washed twice with THF (200 ml). Combine the filtrate and washings, add 6N hydrochloric acid to adjust the pH to 2, add saturated brine (1200 ml), then evaporate most of the THF and extract with ethyl acetate (400 ml). Liquid separation was performed. The aqueous layer was further extracted and separated using ethyl acetate (400 ml), and the organic layers were combined and washed twice with 1N hydrochloric acid (200 ml) and once with saturated aqueous sodium hydrogen carbonate (200 ml). The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain a crude product of Weinreb amide (46.4 g).
c) 工程b)で得られたWeinrebアミド(46.4g)のTHF(464ml)溶液を氷冷した。1M臭化メチルマグネシウム/THF溶液(274ml、274mmol)を滴下し、内温を2〜4℃に保ちながら1.5時間攪拌を続けた。飽和塩化アンモニウム水溶液(90ml)を滴下して反応を停止した後、水(767ml)と酢酸エチル(1534ml)を加えて、抽出・分液した。水層をさらに酢酸エチル(384ml)を用いて抽出・分液し、有機層を合わせて無水硫酸マグネシウム乾燥・減圧濃縮してメチルケトンの粗製品(39.4g)を得た。
d) 工程c)で得られたメチルケトン(39.4g)のアセトニトリル(788ml)溶液を氷冷した。トリエチルアミン(28.6g、283mmol)、トリフルオロメタンスルホン酸トリメチルシリルエステル(50.2g、226mmol)の順に滴下し、内温を2〜4℃に保ちながら1.5時間攪拌を続けた。トリフルオロメタンスルホン酸トリメチルシリルエステル(4.18g、18.8mmol)を追加した後、さらに同温度で1時間攪拌を続けた。ピリジニウムブロミドペルブロミド(60.9g、190mmol)を加えた後、さらに同温度で1.5時間攪拌を続けた。飽和重曹水(900ml)と酢酸エチル(800ml)を加えて、抽出・分液した。水層をさらに酢酸エチル(200ml)を用いて抽出・分液し、有機層を合わせて2N塩酸(400ml)で洗浄した。有機層を無水硫酸マグネシウム乾燥・減圧濃縮した残渣物(98g)を酢酸エチル(400ml)に溶解し、1N塩酸(200ml)で一回、水(200ml)で三回洗浄した。酢酸エチル層を無水硫酸マグネシウム乾燥・減圧濃縮した残渣物(48.6g)を酢酸エチル(400ml)に溶解し、飽和重曹水(200ml)、2N塩酸(200ml)、飽和重曹水(200ml)、2N塩酸(200ml)、水(200ml)の順に用いて洗浄した。酢酸エチル層を無水硫酸マグネシウム乾燥・減圧濃縮してブロモメチルケトンの粗製品(42.3g)を得た。
c) A solution of Weinreb amide (46.4 g) obtained in step b) in THF (464 ml) was ice-cooled. A 1M methylmagnesium bromide / THF solution (274 ml, 274 mmol) was added dropwise, and stirring was continued for 1.5 hours while maintaining the internal temperature at 2 to 4 ° C. Saturated aqueous ammonium chloride solution (90 ml) was added dropwise to stop the reaction, water (767 ml) and ethyl acetate (1534 ml) were added, and the mixture was extracted and separated. The aqueous layer was further extracted and separated using ethyl acetate (384 ml), and the organic layers were combined, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain a crude product of methyl ketone (39.4 g).
d) A solution of methyl ketone (39.4 g) obtained in step c) in acetonitrile (788 ml) was ice-cooled. Triethylamine (28.6 g, 283 mmol) and trifluoromethanesulfonic acid trimethylsilyl ester (50.2 g, 226 mmol) were added dropwise in this order, and stirring was continued for 1.5 hours while maintaining the internal temperature at 2 to 4 ° C. After adding trifluoromethanesulfonic acid trimethylsilyl ester (4.18 g, 18.8 mmol), stirring was further continued at the same temperature for 1 hour. After pyridinium bromide perbromide (60.9 g, 190 mmol) was added, stirring was continued at the same temperature for 1.5 hours. Saturated aqueous sodium hydrogen carbonate (900 ml) and ethyl acetate (800 ml) were added, and the mixture was extracted and separated. The aqueous layer was further extracted and separated using ethyl acetate (200 ml), and the organic layers were combined and washed with 2N hydrochloric acid (400 ml). The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue (98 g) was dissolved in ethyl acetate (400 ml) and washed once with 1N hydrochloric acid (200 ml) and three times with water (200 ml). The ethyl acetate layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue (48.6 g) was dissolved in ethyl acetate (400 ml), saturated aqueous sodium hydrogen carbonate (200 ml), 2N hydrochloric acid (200 ml), saturated aqueous sodium hydrogen carbonate (200 ml), 2N hydrochloric acid. (200 ml) followed by water (200 ml) for washing. The ethyl acetate layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain a crude product of bromomethyl ketone (42.3 g).
e) 工程d)で得られたブロモメチルケトン(42.3g)のメタノール(1692ml)溶液にチオイソニコチンアミド(203mg、1.47mmol)を加えて氷冷した。内温を3〜6℃に保ちながらジチオカルバミン酸アンモニウム(24.2g、220mmol)を加えた後、さらに同温度で0.5時間攪拌を続けた。昇温して2時間加熱還流した後、減圧濃縮した。残渣物にクロロホルム(787ml)と1N水酸化ナトリウム(787ml)を加えて、抽出・分液した。アルカリ水層をクロロホルム(393ml)を用いて再度洗浄してから、6N塩酸を加えてpHを2に調整した後、クロロホルム(590ml)を用いて抽出・分液した。水層をさらにクロロホルム(295ml)を用いて抽出・分液し、有機層を合わせて無水硫酸マグネシウム乾燥・減圧濃縮して標題化合物の粗製品(22.0g、残存クロロホルムを除いた見かけ収率は36%)を得た。このものの物性データはWO02/38564の参考例1で開示されているものに一致した。 e) Thioisonicotinamide (203 mg, 1.47 mmol) was added to a solution of the bromomethyl ketone (42.3 g) obtained in step d) in methanol (1692 ml), and the mixture was ice-cooled. Ammonium dithiocarbamate (24.2 g, 220 mmol) was added while maintaining the internal temperature at 3 to 6 ° C., and stirring was further continued at the same temperature for 0.5 hour. The mixture was heated to reflux for 2 hours and then concentrated under reduced pressure. Chloroform (787 ml) and 1N sodium hydroxide (787 ml) were added to the residue, and the mixture was extracted and separated. The alkaline aqueous layer was washed again with chloroform (393 ml), 6N hydrochloric acid was added to adjust the pH to 2, and the mixture was extracted and separated with chloroform (590 ml). The aqueous layer was further extracted and separated using chloroform (295 ml), and the organic layers were combined, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give a crude product of the title compound (22.0 g, apparent yield excluding residual chloroform was 36 %). The physical property data of this product coincided with that disclosed in Reference Example 1 of WO02 / 38564.
本発明が解決しようとする課題は、各種医薬品の合成中間体化合物として重要な、光学活性なジヒドロピロールおよびテトラヒドロピリジン誘導体を高い光学純度で、効率的に、大量に製造できる方法を提供することである。
The problem to be solved by the present invention is to provide a method capable of efficiently and efficiently producing optically active dihydropyrrole and tetrahydropyridine derivatives with high optical purity, which are important as synthetic intermediate compounds for various pharmaceuticals. is there.
Claims (8)
[式中、R1は水素原子あるいはアミノ基の保護基を、R2は置換されていても良い炭素数1〜6の低級アルキル基を、R3は炭素数1〜3の低級アルキル基を表す。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これにアクリル酸エステルまたは4-ハロゲノブタン酸エステルを反応させ、閉環して得られたエノラート体(II):
[式中、R1とR2は前掲に同じ。Rはエステル残基を、mは1または2を、Mは一価の金属陽イオンを表す。]
を単離することなく還元して式(III):
[式中、R1、R2、Rおよびmは前掲に同じ。]
で表されるβ-ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IV):
[式中、R1、R2、Rおよびmは前掲に同じ。]
で表される光学活性なジヒドロピロールまたはテトラヒドロピリジン誘導体の製造法。 Formula (I):
[In the formula, R 1 represents a hydrogen atom or amino protecting group, R 2 represents an optionally substituted lower alkyl group having 1 to 6 carbon atoms, and R 3 represents a lower alkyl group having 1 to 3 carbon atoms. To express. ]
An enolate (II) obtained by ring-closing by reacting an acrylic acid ester or 4-halogenobutanoic acid ester in the presence of a base with an optically active amino acid ester represented by the following:
[Wherein R 1 and R 2 are the same as described above. R represents an ester residue, m represents 1 or 2, and M represents a monovalent metal cation. ]
Can be reduced without isolation to formula (III):
[Wherein, R 1 , R 2 , R and m are the same as described above. ]
Formula (IV) characterized in that after being converted to a β-hydroxyester represented by the formula (IV):
[Wherein, R 1 , R 2 , R and m are the same as described above. ]
A process for producing an optically active dihydropyrrole or tetrahydropyridine derivative represented by the formula:
[式中、R1、R2およびR3は請求項1に同じ。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これにアクリル酸エステルを反応させ、閉環して得られたエノラート体(IIa):
[式中、R1、R2、RおよびMは請求項1に同じ。]
を単離することなく還元して式(IIIa):
[式中、R1、R2およびRは請求項1に同じ。]
で表されるβ-ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IVa):
[式中、R1、R2、Rおよびmは請求項1に同じ。]
で表される光学活性なジヒドロピロール誘導体の製造法。 Formula (I):
[Wherein R 1 , R 2 and R 3 are the same as in claim 1. ]
An enolate (IIa) obtained by ring-closing by reacting an acrylate ester in the presence of a base with an optically active amino acid ester represented by
[Wherein R 1 , R 2 , R and M are the same as in claim 1. ]
Can be reduced without isolation to formula (IIIa):
[Wherein R 1 , R 2 and R are the same as in claim 1. ]
Formula (IVa), characterized in that it is converted to a β-hydroxyester represented by the following formula and subsequently subjected to a dehydration reaction:
[Wherein R 1 , R 2 , R and m are the same as in claim 1. ]
The manufacturing method of the optically active dihydropyrrole derivative represented by these.
[式中、R1、R2およびR3は請求項1に同じ。]
で表される光学活性なアミノ酸エステルを出発物質とし、塩基の存在下これに4-ハロゲノブタン酸エステルを反応させ、閉環して得られたエノラート体(IIb):
[式中、R1、R2、RおよびMは請求項1に同じ。]
を単離することなく還元して式(IIIb):
[式中、R1、R2およびRは請求項1に同じ。]
で表されるβ-ヒドロキシエステルに変換した後、引き続いてこれを脱水反応に付することを特徴とする式(IVb):
[式中、R1、R2、Rおよびmは請求項1に同じ。]
で表される光学活性なテトラヒドロピリジン誘導体の製造法。 Formula (I):
[Wherein R 1 , R 2 and R 3 are the same as in claim 1. ]
An enolate compound (IIb) obtained by cyclization by reacting 4-halogenobutanoic acid ester in the presence of a base with an optically active amino acid ester represented by the formula:
[Wherein R 1 , R 2 , R and M are the same as in claim 1. ]
Can be reduced without isolation to formula (IIIb):
[Wherein R 1 , R 2 and R are the same as in claim 1. ]
Formula (IVb), characterized in that it is converted to a β-hydroxyester represented by the following formula and subsequently subjected to a dehydration reaction:
[Wherein R 1 , R 2 , R and m are the same as in claim 1. ]
The manufacturing method of the optically active tetrahydropyridine derivative represented by these.
Lithium hydride, sodium hydride, potassium hydride, lithium amide, sodium amide, potassium amide, lithium diisopropylamide, lithium hexamethyldisilazide, sodium hexamethyldisilazide, potassium hexamethyldisila Selected from zido, sodium methoxide, sodium ethoxide, potassium t-butoxide, lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, lithium bicarbonate, sodium bicarbonate and potassium bicarbonate The production method according to claim 1, wherein at least one kind is used.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008208056A (en) * | 2007-02-26 | 2008-09-11 | Dainippon Sumitomo Pharma Co Ltd | Method for producing mercaptothiazole and production intermediate |
| JP2008208057A (en) * | 2007-02-26 | 2008-09-11 | Dainippon Sumitomo Pharma Co Ltd | Method for producing carboxylic acid and intermediate thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01233270A (en) * | 1988-03-14 | 1989-09-19 | Shionogi & Co Ltd | Pyrroline and tetrahydropyridine derivative |
| WO2002038564A1 (en) * | 2000-11-08 | 2002-05-16 | Sumitomo Pharmaceuticals Company, Limited | NOVEL β-LACTAM COMPOUNDS AND PROECSS FOR PRODUCING THE SAME |
-
2004
- 2004-06-29 JP JP2004191766A patent/JP2006008641A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01233270A (en) * | 1988-03-14 | 1989-09-19 | Shionogi & Co Ltd | Pyrroline and tetrahydropyridine derivative |
| WO2002038564A1 (en) * | 2000-11-08 | 2002-05-16 | Sumitomo Pharmaceuticals Company, Limited | NOVEL β-LACTAM COMPOUNDS AND PROECSS FOR PRODUCING THE SAME |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008208056A (en) * | 2007-02-26 | 2008-09-11 | Dainippon Sumitomo Pharma Co Ltd | Method for producing mercaptothiazole and production intermediate |
| JP2008208057A (en) * | 2007-02-26 | 2008-09-11 | Dainippon Sumitomo Pharma Co Ltd | Method for producing carboxylic acid and intermediate thereof |
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