JP2003160665A - Method of manufacturing polyimide precursor - Google Patents
Method of manufacturing polyimide precursorInfo
- Publication number
- JP2003160665A JP2003160665A JP2001360419A JP2001360419A JP2003160665A JP 2003160665 A JP2003160665 A JP 2003160665A JP 2001360419 A JP2001360419 A JP 2001360419A JP 2001360419 A JP2001360419 A JP 2001360419A JP 2003160665 A JP2003160665 A JP 2003160665A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide precursor
- dianhydride
- organic group
- bis
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 68
- 239000004642 Polyimide Substances 0.000 title claims abstract description 65
- 239000002243 precursor Substances 0.000 title claims abstract description 64
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 75
- 239000002253 acid Substances 0.000 claims abstract description 40
- 125000000962 organic group Chemical group 0.000 claims abstract description 31
- 150000004985 diamines Chemical class 0.000 claims abstract description 27
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 239000003054 catalyst Substances 0.000 claims abstract description 11
- 230000018044 dehydration Effects 0.000 claims abstract description 11
- 238000006297 dehydration reaction Methods 0.000 claims abstract description 11
- 150000003949 imides Chemical group 0.000 claims abstract description 5
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 18
- 229910052731 fluorine Inorganic materials 0.000 claims description 18
- 239000011737 fluorine Substances 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 7
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 5
- 229910052805 deuterium Inorganic materials 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- CNPURSDMOWDNOQ-UHFFFAOYSA-N 4-methoxy-7h-pyrrolo[2,3-d]pyrimidin-2-amine Chemical compound COC1=NC(N)=NC2=C1C=CN2 CNPURSDMOWDNOQ-UHFFFAOYSA-N 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 230000000379 polymerizing effect Effects 0.000 claims description 3
- 150000003512 tertiary amines Chemical class 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 3
- 150000001721 carbon Chemical group 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 22
- 150000001408 amides Chemical class 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- -1 tetracarboxylic acid diester Chemical class 0.000 description 51
- 239000002904 solvent Substances 0.000 description 44
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 30
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 27
- 239000000203 mixture Substances 0.000 description 24
- 230000003287 optical effect Effects 0.000 description 22
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- 239000000126 substance Substances 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 14
- 238000007639 printing Methods 0.000 description 14
- 229940124530 sulfonamide Drugs 0.000 description 13
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 239000000843 powder Substances 0.000 description 12
- 238000003756 stirring Methods 0.000 description 11
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 150000002148 esters Chemical group 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 9
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 9
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical group CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000012299 nitrogen atmosphere Substances 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000002798 polar solvent Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical group FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 6
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 6
- 229920005575 poly(amic acid) Polymers 0.000 description 6
- 238000001291 vacuum drying Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- APXJLYIVOFARRM-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 APXJLYIVOFARRM-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- DRSHXJFUUPIBHX-UHFFFAOYSA-N COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 Chemical compound COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 DRSHXJFUUPIBHX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- NLFBCYMMUAKCPC-KQQUZDAGSA-N ethyl (e)-3-[3-amino-2-cyano-1-[(e)-3-ethoxy-3-oxoprop-1-enyl]sulfanyl-3-oxoprop-1-enyl]sulfanylprop-2-enoate Chemical compound CCOC(=O)\C=C\SC(=C(C#N)C(N)=O)S\C=C\C(=O)OCC NLFBCYMMUAKCPC-KQQUZDAGSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 238000007142 ring opening reaction Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- FWOLORXQTIGHFX-UHFFFAOYSA-N 4-(4-amino-2,3,5,6-tetrafluorophenyl)-2,3,5,6-tetrafluoroaniline Chemical compound FC1=C(F)C(N)=C(F)C(F)=C1C1=C(F)C(F)=C(N)C(F)=C1F FWOLORXQTIGHFX-UHFFFAOYSA-N 0.000 description 2
- CMMNSASDJHKAOD-UHFFFAOYSA-N 4-[2-(3,4-dicarboxy-2,5,6-trifluorophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-3,5,6-trifluorophthalic acid Chemical compound FC1=C(C(O)=O)C(C(=O)O)=C(F)C(F)=C1C(C(F)(F)F)(C(F)(F)F)C1=C(F)C(F)=C(C(O)=O)C(C(O)=O)=C1F CMMNSASDJHKAOD-UHFFFAOYSA-N 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- CDMCLELUDINUDU-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexylbenzene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1=CC=CC=C1 CDMCLELUDINUDU-UHFFFAOYSA-N 0.000 description 1
- OFXSBTTVJAFNSJ-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7-tetradecafluoro-n,n'-diphenylheptane-1,7-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 OFXSBTTVJAFNSJ-UHFFFAOYSA-N 0.000 description 1
- VITYLMJSEZETGU-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5-decafluoro-n,n'-diphenylpentane-1,5-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 VITYLMJSEZETGU-UHFFFAOYSA-N 0.000 description 1
- JLTHXLWCVUJTFW-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octafluoro-n,n'-diphenylbutane-1,4-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 JLTHXLWCVUJTFW-UHFFFAOYSA-N 0.000 description 1
- UMMYYBOQOTWQTD-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoro-n,n'-diphenylpropane-1,3-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 UMMYYBOQOTWQTD-UHFFFAOYSA-N 0.000 description 1
- SBHHKGFHJWTZJN-UHFFFAOYSA-N 1,3-dimethylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1(C)C(C(O)=O)C(C)(C(O)=O)C1C(O)=O SBHHKGFHJWTZJN-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- FVFYRXJKYAVFSB-UHFFFAOYSA-N 2,3,5,6-tetrafluorobenzene-1,4-diamine Chemical compound NC1=C(F)C(F)=C(N)C(F)=C1F FVFYRXJKYAVFSB-UHFFFAOYSA-N 0.000 description 1
- FXGQUGCFZKMIJW-UHFFFAOYSA-N 2,4,5,6-tetrafluorobenzene-1,3-diamine Chemical compound NC1=C(F)C(N)=C(F)C(F)=C1F FXGQUGCFZKMIJW-UHFFFAOYSA-N 0.000 description 1
- HFXFYWMYAYUJAA-UHFFFAOYSA-N 2,5-diaminobenzenesulfonamide Chemical compound NC1=CC=C(N)C(S(N)(=O)=O)=C1 HFXFYWMYAYUJAA-UHFFFAOYSA-N 0.000 description 1
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- 238000000576 coating method Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 150000004683 dihydrates Chemical class 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- ZMKUUQIKLRGIBF-UHFFFAOYSA-N fluoro 2,2,3,3,3-pentafluoropropanoate Chemical compound FOC(=O)C(F)(F)C(F)(F)F ZMKUUQIKLRGIBF-UHFFFAOYSA-N 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000003948 formamides Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical compound C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 150000008301 phosphite esters Chemical class 0.000 description 1
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoramidic acid Chemical compound NP(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、溶媒溶解性が高
く、貯蔵安定性に優れ印刷やフォトリソグラフィーなど
によりパターン形成が可能であり光学用材料、光学用部
品、半導体素子用保護膜、多層配線基板用絶縁膜などの
形成に適するポリイミド前駆体の製造方法に関する。TECHNICAL FIELD The present invention relates to an optical material, an optical component, a protective film for a semiconductor element, a multilayer wiring, which has a high solvent solubility, is excellent in storage stability, and can form a pattern by printing or photolithography. The present invention relates to a method for producing a polyimide precursor suitable for forming an insulating film for a substrate and the like.
【0002】[0002]
【従来の技術】特公昭55−30207号公報に、ポリ
アミド酸分子中のカルボキシル基に感光基をエステル結
合させたものが提案されている。この感光性ポリイミド
前駆体は、テトラカルボン酸二無水物に光反応性を有す
る炭素一炭素不飽和結合を含有するアルコールを反応さ
せてテトラカルボン酸ジエステルを生成し、このジエス
テル中の遊離カルボキシル基を酸クロリド基に変換し、
得られたジエステル−ビス−酸クロリドをジアミンと重
縮合反応させることによって製造される。しかし、ポリ
イミド前駆体はすべての部分がアミド酸エステル構造で
あり、ポリイミド化時の体積変化が大きく問題があり、
また感光性のエステル結合を必要とする点で汎用性に欠
けたり、溶媒溶解性の向上は望めなかったりする。2. Description of the Related Art JP-B-55-30207 proposes a polyamic acid molecule in which a photosensitive group is ester-bonded to a carboxyl group. This photosensitive polyimide precursor is reacted with an alcohol containing a carbon-carbon unsaturated bond having photoreactivity to tetracarboxylic dianhydride to produce a tetracarboxylic acid diester, and a free carboxyl group in the diester is converted into a dicarboxylic acid. Converted to the acid chloride group,
It is produced by subjecting the obtained diester-bis-acid chloride to a polycondensation reaction with a diamine. However, all parts of the polyimide precursor have an amic acid ester structure, and there is a large problem in volume change during polyimidization,
In addition, it lacks general versatility in that it requires a photosensitive ester bond, or cannot improve solvent solubility.
【0003】特開平6−102667号公報にテトラカ
ルボン酸二無水物にアルコールを開環付加させてテトラ
カルボン酸エステル無水物を形成し、次いで、該テトラ
カルボン酸エステル無水物または、該テトラカルボン酸
エステル無水物とテトラカルボン酸二無水物の混合液に
ジアミンを開環付加させることによって末端エステル化
ポリアミド酸を形成し、その後、光重合開始剤を混合さ
せることによって感光性ポリイミド前駆体を製造する方
法が提案されている。In JP-A-6-102667, ring-opening addition of alcohol to tetracarboxylic acid dianhydride to form tetracarboxylic acid ester anhydride, and then the tetracarboxylic acid ester anhydride or the tetracarboxylic acid anhydride is carried out. A terminally esterified polyamic acid is formed by ring-opening addition of a diamine to a mixed solution of an ester anhydride and a tetracarboxylic dianhydride, and then a photopolymerization initiator is mixed to prepare a photosensitive polyimide precursor. A method has been proposed.
【0004】しかし、該方法にてもポリイミド前駆体は
すべての部分がアミド酸エステル構造であり、ポリイミ
ド化時の体積変化が大きく問題がある。However, even in this method, all parts of the polyimide precursor have an amic acid ester structure, and there is a problem that the volume change during polyimidization is large.
【0005】特開平9−59379にはポリアミド酸オ
リゴマーにアルコールを開環付加させることにより、分
子末端の少なくとも一方がアルコールの酸エステルにな
っているポリアミド酸を得る方法が開示されている。し
かし、該方法ではポリアミド酸構造が大部分をしめるた
め貯蔵安定性に欠けたり、溶媒溶解性に問題があった。Japanese Unexamined Patent Publication No. 9-59379 discloses a method of obtaining a polyamic acid in which at least one of the molecular terminals is an acid ester of alcohol by ring-opening addition of alcohol to a polyamic acid oligomer. However, in this method, since the polyamic acid structure is mostly occupied, storage stability is poor and solvent solubility is a problem.
【0006】また脂肪族ジアミンを用いるポリイミド合
成では、特定の脂肪族カルボン酸二無水物をジメチルエ
ステルとした後、酸クロリドに導き重合する方法が提案
されている(ハイ・パフォーマンス・ポリマー、10
巻、11(1998年))。In polyimide synthesis using an aliphatic diamine, a method has been proposed in which a specific aliphatic carboxylic acid dianhydride is converted to a dimethyl ester, which is then introduced into an acid chloride for polymerization (high performance polymer, 10
Vol. 11, 11 (1998)).
【0007】しかし、該方法にてもポリイミド前駆体は
すべての部分がアミド酸エステル構造であり、ポリイミ
ド化時の体積変化が大きく問題がある。また、特定の脂
肪族カルボン酸二無水物に限定されているため、汎用性
にかける。However, even in this method, all parts of the polyimide precursor have an amic acid ester structure, and there is a problem in that the volume change during polyimidization is large. Moreover, since it is limited to a specific aliphatic carboxylic acid dianhydride, it is not versatile.
【0008】また同様に特開2001−72768には
脂環式カルボン酸二無水物とビスシリル化ジアミンとの
重合検討例が開示されているがポリイミド前駆体はすべ
ての部分がアミド酸エステル構造であり、ポリイミド化
時の体積変化が大きく問題がある。また、特定の脂肪族
カルボン酸二無水物に限定されているため、汎用性にか
ける。Similarly, Japanese Unexamined Patent Publication No. 2001-72768 discloses an example of studying polymerization of an alicyclic carboxylic acid dianhydride and a bissilylated diamine. However, all parts of a polyimide precursor have an amic acid ester structure. However, there is a problem in that the volume change during polyimidization is large. Moreover, since it is limited to a specific aliphatic carboxylic acid dianhydride, it is not versatile.
【0009】上記のように溶媒溶解性、貯蔵安定性に優
れるポリアミドエステル構造とポリイミド構造が共重合
された構造のポリイミド前駆体を簡便に製造する方法は
なかった。As described above, there has been no method for easily producing a polyimide precursor having a structure in which a polyamide ester structure and a polyimide structure are copolymerized, which are excellent in solvent solubility and storage stability.
【0010】[0010]
【発明が解決しようとする課題】以上の従来技術の問題
点を解決すべく、印刷等による簡易な加工方法が可能で
あり用途として光導波路などの材料として有用である溶
媒溶解性、耐熱性、貯蔵安定性に優れるポリイミド前駆
体の製造方法を提供することにある。In order to solve the above-mentioned problems of the prior art, a simple processing method such as printing is possible and is useful as a material for optical waveguides and the like in solvent solubility, heat resistance, It is to provide a method for producing a polyimide precursor having excellent storage stability.
【0011】[0011]
【課題を解決するための手段】すなわち(a)下記一般
式(1):Means for Solving the Problems (a) The following general formula (1):
【0012】[0012]
【化4】
で表される化合物(ただしR1は4価の有機基、R2は炭
素数1以上の1価の有機基、R3はOHまたはClを示
す。)と(b)酸二無水物と(c)ジアミンまたはジシ
アナートを重合させ脱水閉環剤および/または触媒を添
加しアミド酸部分をイミド化することを特徴としたポリ
イミド前駆体の製造方法。(請求項1)
(a)(b)(c)の少なくともいずれかにフッ素を含
有する請求項1記載のポリイミド前駆体の製造方法。
(請求項2)
ジアミンが下記一般式(2):[Chemical 4] (Wherein R 1 is a tetravalent organic group, R 2 is a monovalent organic group having 1 or more carbon atoms, R 3 is OH or Cl), and (b) an acid dianhydride. c) A method for producing a polyimide precursor, which comprises polymerizing a diamine or dicyanate and adding a dehydration ring-closing agent and / or a catalyst to imidize an amic acid moiety. (Claim 1) The method for producing a polyimide precursor according to claim 1, wherein at least one of (a), (b) and (c) contains fluorine.
(Claim 2) The diamine has the following general formula (2):
【0013】[0013]
【化5】
(ここで式中R4は同一または異なっていてもよく、水
素、重水素、フッ素、パーフルオロアルキル基から選ば
れる少なくとも一種である)で表される請求項1〜2記
載のポリイミド前駆体の製造方法。(請求項3)
酸二無水物が下記一般式(3):[Chemical 5] (Wherein R 4 may be the same or different and is at least one selected from hydrogen, deuterium, fluorine and perfluoroalkyl groups). Production method. (Claim 3) The acid dianhydride has the following general formula (3):
【0014】[0014]
【化6】
(ここで式中R4は同一または異なっていてもよく、水
素、重水素、フッ素、パーフルオロアルキル基から選ば
れる少なくとも一種である)で表される請求項1〜3記
載のポリイミド前駆体の製造方法。(請求項4)
一般式(1)においてR2が炭素数1〜6の炭化水素基
である請求項1〜4記載のポリイミド前駆体の製造方
法。(請求項5)
〔R2OC(=O)〕2−R1−(COCl)2とジアミン
を反応させたうえで酸ニ無水物を加えて重合させる請求
項1〜5記載のポリイミド前駆体の製造方法(R 1は、
4価の有機基、R2は炭素数1以上の1価の有機基を示
す。)。(請求項6)
〔R2OC(=O)〕2−R1−(COCl)2とアミン末
端のイミドオリゴマーを重合させる請求項1〜6記載の
ポリイミド前駆体の製造方法(R1は、4価の有機基、
R2は炭素数1以上の1価の有機基を示す。)。(請求
項7)
〔R2OC(=O)〕2−R1−(COOH)2とアミン末
端のイミドオリゴマーと縮合剤の存在下で重合させる請
求項1〜6記載のポリイミド前駆体の製造方法(R
1は、4価の有機基、R2は炭素数1以上の1価の有機基
を示す。)。(請求項8)
〔R2OC(=O)〕2−R1−(COOH)2とジアミン
を縮合剤の存在下で反応させたうえで酸ニ無水物を加え
て重合させる請求項1〜5記載のポリイミド前駆体の製
造方法(R1は、4価の有機基、R2は炭素数1以上の1
価の有機基を示す。)。(請求項9)
〔R2OC(=O)〕2−R1−(COOH)2と酸二無水
物とジシアナートを反応させることを請求項1〜5記載
のポリイミド前駆体の製造方法(R1は、4価の有機
基、R2は炭素数1以上の1価の有機基を示す。)。
(請求項10)
脱水閉環剤および/または触媒が無水酢酸と3級アミン
である請求項1〜10記載のポリイミド前駆体の製造方
法。(請求項11)である。[Chemical 6]
(Where R in the formulaFourMay be the same or different, water
Selected from elemental, deuterium, fluorine and perfluoroalkyl groups
Is at least one of the following).
A method for producing the above-mentioned polyimide precursor. (Claim 4)
R in the general formula (1)2Is a hydrocarbon group having 1 to 6 carbon atoms
The method for producing the polyimide precursor according to claim 1.
Law. (Claim 5)
[R2OC (= O)]2-R1-(COCl)2And diamine
Reacting and then adding acid dianhydride to polymerize
Item 1. A method for producing a polyimide precursor according to items 1 to 5 (R 1Is
Tetravalent organic group, R2Represents a monovalent organic group having 1 or more carbon atoms
You ). (Claim 6)
[R2OC (= O)]2-R1-(COCl)2And amine powder
The imide oligomer at the end is polymerized.
Method for producing polyimide precursor (R1Is a tetravalent organic group,
R2Represents a monovalent organic group having 1 or more carbon atoms. ). (Claim
(Item 7)
[R2OC (= O)]2-R1-(COOH)2And amine powder
Contract to polymerize in the presence of a condensation agent with the imide oligomer at the edge
The method for producing a polyimide precursor according to claim 1 to 6 (R
1Is a tetravalent organic group, R2Is a monovalent organic group having 1 or more carbon atoms
Indicates. ). (Claim 8)
[R2OC (= O)]2-R1-(COOH)2And diamine
Is reacted in the presence of a condensing agent, and then acid dianhydride is added.
Of the polyimide precursor according to claim 1, wherein the polyimide precursor is polymerized.
Build method (R1Is a tetravalent organic group, R2Is 1 with 1 or more carbons
Indicates a valent organic group. ). (Claim 9)
[R2OC (= O)]2-R1-(COOH)2And dianhydride
6. Reacting a dicyanate with an object
Method for producing polyimide precursor of (R1Is a tetravalent organic
Group, R2Represents a monovalent organic group having 1 or more carbon atoms. ).
(Claim 10)
Dehydration ring-closing agent and / or catalyst is acetic anhydride and tertiary amine
The method for producing the polyimide precursor according to claim 1, wherein
Law. (Claim 11)
【0015】[0015]
【発明の実施の形態】本発明におけるポリイミド前駆体
成分は、下記一般式(4)BEST MODE FOR CARRYING OUT THE INVENTION The polyimide precursor component in the present invention has the following general formula (4):
【0016】[0016]
【化7】
で表される(ただしR5、R8は4価の有機基、R6は炭
素数1以上の1価の有機基、R7、R9は2価の有機基、
n、mは1以上の正数、kは1以上の正数を示す。)繰
り返し単位を有するポリイミド前駆体の製造方法に関す
る。前記一般式の構造を有するポリイミド前駆体は、溶
媒溶解性、貯蔵安定性が高く印刷等の加工に優れる。[Chemical 7] (Wherein R 5 and R 8 are tetravalent organic groups, R 6 is a monovalent organic group having 1 or more carbon atoms, R 7 and R 9 are divalent organic groups,
n and m are positive numbers of 1 or more, and k is a positive number of 1 or more. ) A method for producing a polyimide precursor having a repeating unit. The polyimide precursor having the structure of the general formula has high solvent solubility and storage stability and is excellent in processing such as printing.
【0017】フッ素が含まれる事が吸湿率を低くする
点、溶媒溶解性を高める、光学特性がすぐれる点で好ま
しく、特にアルキル基における水素がフッ素などに置換
されている場合、近赤外域での光損失の原因となるアル
キル基等のC−H結合に基づく振動吸収が小さくなり好
ましい。ただし、ベンゼン環に直接結合する水素原子の
C−H結合に基づく吸収は、その吸収が少なく、本発明
の効果に影響を与えないと考えられるため、ベンゼン環
に直接結合する水素を含有していてもかまわないが、す
べての水素が、重水素、フッ素、パーフルオロアルキル
基から選ばれる少なくとも一種以上で置換されている方
が好ましい。The presence of fluorine is preferable in that it lowers the moisture absorption rate, enhances solvent solubility and has excellent optical properties. Especially, when hydrogen in the alkyl group is replaced with fluorine, etc., in the near infrared region. The vibration absorption based on the C—H bond of an alkyl group or the like, which causes the light loss, is small, which is preferable. However, since absorption due to the C—H bond of the hydrogen atom directly bonded to the benzene ring is considered to have little absorption and does not affect the effect of the present invention, it does not contain hydrogen directly bonded to the benzene ring. Although it does not matter, it is preferable that all hydrogens are substituted with at least one selected from deuterium, fluorine and perfluoroalkyl groups.
【0018】本発明における前駆体の原料となる(a)
下記一般式(1):(A) used as a raw material of the precursor in the present invention
The following general formula (1):
【0019】[0019]
【化8】
であらわされる化合物(ただしR1は4価の有機基、R2
は炭素数1以上の1価の有機基、R3はOHまたはCl
を示す。)はどのような経路で製造してもよい。[Chemical 8] A compound represented by the formula (wherein R 1 is a tetravalent organic group, R 2
Is a monovalent organic group having 1 or more carbon atoms, R 3 is OH or Cl
Indicates. ) May be produced by any route.
【0020】R3がOHであるジエステル化合物は例え
ば以下の方法で製造することができる。すなわち酸二無
水物を溶媒に溶解させたのち炭素数1〜6のアルコール
と混合し加熱し還流下に置く。0.2時間から24時
間、還流下で反応させたのち、溶媒を除去し反応物を得
る。これを必要な場合、再結晶、カラムクロマトグラフ
ィー分割等の一般的な精製法で精製する。The diester compound in which R 3 is OH can be produced, for example, by the following method. That is, the acid dianhydride is dissolved in a solvent, then mixed with an alcohol having 1 to 6 carbon atoms, heated and placed under reflux. After reacting under reflux for 0.2 to 24 hours, the solvent is removed to obtain a reaction product. If necessary, this is purified by a general purification method such as recrystallization or column chromatography resolution.
【0021】R3がClであるジクロリド化合物は例え
ば以下の方法で製造する事が出来る。すなわち上記エス
テル化合物を酢酸エチル等の溶媒に懸濁し、エステル化
合物の2倍当量以上のオキサリルクロリドを加え(必要
に応じて数回に分ける)、少量のジメチルホルムアミド
を加える。この溶液を例えば40℃〜還流下に0.5時
間〜48時間加熱し、必要な場合さらに0.5時間〜4
8時間還流下において反応を完結させる。この後溶媒を
減圧下で除去し、必要であればさらに減圧下で乾燥す
る。必要に応じて再結晶等の一般的な精製法で精製す
る。The dichloride compound in which R 3 is Cl can be produced, for example, by the following method. That is, the above ester compound is suspended in a solvent such as ethyl acetate, oxalyl chloride in an amount equal to or more than twice the ester compound is added (if necessary, divided into several times), and a small amount of dimethylformamide is added. This solution is heated, for example, at 40 ° C. to reflux for 0.5 hour to 48 hours, and if necessary, further 0.5 hour to 4 hours.
The reaction is completed under reflux for 8 hours. After this, the solvent is removed under reduced pressure and, if necessary, further dried under reduced pressure. If necessary, it is purified by a general purification method such as recrystallization.
【0022】一般式(化20)においてR8が炭素数7
以上の場合、原料に汎用性が無くなる、前駆体印刷後の
膜減りが大きい等の問題がある。In the general formula (Formula 20), R8 has 7 carbon atoms.
In the above cases, there are problems that the versatility of the raw material is lost and that the film loss after printing the precursor is large.
【0023】(a)の原料となる酸ニ無水物および
(b)の酸ニ無水物は同一でも異なっていても良い。以
下にこの例を記する。The acid dianhydride as the raw material of (a) and the acid dianhydride of (b) may be the same or different. This example is described below.
【0024】前記フッ素を含む酸ニ無水物成分として
は、例えば、(トリフルオロメチル)ピロメリット酸二
無水物、ジ(トリフルオロメチル)ピロメリット酸二無
水物、ジ(ヘプタフルオロプロピル)ピロメリット酸二
無水物、ペンタフルオロエチルピロメリット酸二無水
物、ビス{3,5−ジ(トリフルオロメチル)フェノキ
シ}ピロメリット酸二無水物、2,2−ビス(3,4−
ジカルボキシフェニル)ヘキサフルオロプロパン二無水
物、5,5′−ビス(トリフルオロメチル)−3,
3′,4,4′−テトラカルボキシビフェニル二無水
物、2,2′,5,5′−テトラキス(トリフルオロメ
チル)−3,3′,4,4′−テトラカルボキシビフェ
ニル二無水物、5,5′−ビス(トリフルオロメチル)
−3,3′,4,4′−テトラカルボキシジフェニルエ
ーテル二無水物、5,5′−ビス(トリフルオロメチ
ル)−3,3′,4,4′−テトラカルボキシベンゾフ
ェノン二無水物、ビス{(トリフルオロメチル)ジカル
ボキシフェノキシ}ベンゼン二無水物、ビス{(トリフ
ルオロメチル)ジカルボキシフェノキシ}トリフルオロ
メチルベンゼン二無水物、ビス(ジカルボキシフェノキ
シ)トリフルオロメチルベンゼン二無水物、ビス(ジカ
ルボキシフェノキシ)ビス(トリフルオロメチル)ベン
ゼン二無水物、ビス(ジカルボキシフェノキシ)テトラ
キス(トリフルオロメチル)ベンゼン二無水物、2,2
−ビス{(4−(3,4−ジカルボキシフェノキシ)フ
ェニル}ヘキサフルオロプロパン二無水物、ビス{(ト
リフルオロメチル)ジカルボキシフェノキシ}ビフェニ
ル二無水物、ビス{(トリフルオロメチル)ジカルボキ
シフェノキシ}ビス(トリフルオロメチル)ビフェニル
二無水物、ビス{(トリフルオロメチル)ジカルボキシ
フェノキシ}ジフェニルエーテル二無水物、ビス(ジカ
ルボキシフェノキシ)ビス(トリフルオロメチル)ビフ
ェニル二無水物等が挙げられる。Examples of the acid dianhydride component containing fluorine include (trifluoromethyl) pyromellitic dianhydride, di (trifluoromethyl) pyromellitic dianhydride and di (heptafluoropropyl) pyromellitic. Acid dianhydride, pentafluoroethylpyromellitic dianhydride, bis {3,5-di (trifluoromethyl) phenoxy} pyromellitic dianhydride, 2,2-bis (3,4-
Dicarboxyphenyl) hexafluoropropane dianhydride, 5,5′-bis (trifluoromethyl) -3,
3 ', 4,4'-tetracarboxybiphenyl dianhydride, 2,2', 5,5'-tetrakis (trifluoromethyl) -3,3 ', 4,4'-tetracarboxybiphenyl dianhydride, 5 , 5'-bis (trifluoromethyl)
-3,3 ', 4,4'-tetracarboxydiphenyl ether dianhydride, 5,5'-bis (trifluoromethyl) -3,3', 4,4'-tetracarboxybenzophenone dianhydride, bis {( Trifluoromethyl) dicarboxyphenoxy} benzene dianhydride, bis {(trifluoromethyl) dicarboxyphenoxy} trifluoromethylbenzene dianhydride, bis (dicarboxyphenoxy) trifluoromethylbenzene dianhydride, bis (dicarboxy Phenoxy) bis (trifluoromethyl) benzene dianhydride, bis (dicarboxyphenoxy) tetrakis (trifluoromethyl) benzene dianhydride, 2,2
-Bis {(4- (3,4-dicarboxyphenoxy) phenyl} hexafluoropropane dianhydride, bis {(trifluoromethyl) dicarboxyphenoxy} biphenyl dianhydride, bis {(trifluoromethyl) dicarboxyphenoxy } Bis (trifluoromethyl) biphenyl dianhydride, bis {(trifluoromethyl) dicarboxyphenoxy} diphenyl ether dianhydride, bis (dicarboxyphenoxy) bis (trifluoromethyl) biphenyl dianhydride, and the like.
【0025】また分子内のアルキル基等のみでなく、フ
ェニル環等の炭素に結合するすべての1価元素をフッ
素、又はパーフルオロアルキル基としたものであればよ
り近赤外領域での吸収が小さく好ましい。このような酸
二無水物を得るには、テトラカルボン酸またはその誘導
体を通常の方法で無水物とし、例えば100℃以上に加
熱すれば所望の全フッ素酸ニ水物が得られる。このよう
な酸無水物、酸塩化物等としては:2,5−ジフルオロ
ピロメリット酸、2−トリフルオロメチル−5−フルオ
ロピロメリット酸、2,5−ジ(トリフルオロメチル)
ピロメリット酸、2,5−ジ(ペンタフルオロエチル)
ピロメリット酸、ヘキサフルオロ−3,3′,4,4′
−ビフェニルテトラカルボン酸、ヘキサフルオロ−3,
3′,4,4′−ベンゾフェノンテトラカルボン酸、
2,2−ビス(3,4−ジカルボキシトリフルオロフェ
ニル)ヘキサフルオロプロパン、1,3−ビス(3,4
−ジカルボキシトリフルオロフェニル)ヘキサフルオロ
プロパン、1,4−ビス(3,4−ジカルボキシトリフ
ルオロフェノキシ)テトラフルオロベンゼン、ヘキサフ
ルオロ−3,3′(又は4,4′)−オキシビスフタル
酸などが挙げられる。If not only the alkyl group in the molecule but all monovalent elements bonded to carbon such as phenyl ring are fluorine or perfluoroalkyl group, absorption in the near-infrared region will be improved. Small and preferable. In order to obtain such an acid dianhydride, tetracarboxylic acid or a derivative thereof is converted into an anhydride by a usual method and heated to, for example, 100 ° C. or higher to obtain a desired perfluorinated dihydrate. Such acid anhydrides, acid chlorides, etc. are: 2,5-difluoropyromellitic acid, 2-trifluoromethyl-5-fluoropyromellitic acid, 2,5-di (trifluoromethyl)
Pyromellitic acid, 2,5-di (pentafluoroethyl)
Pyromellitic acid, hexafluoro-3,3 ', 4,4'
-Biphenyltetracarboxylic acid, hexafluoro-3,
3 ', 4,4'-benzophenone tetracarboxylic acid,
2,2-bis (3,4-dicarboxytrifluorophenyl) hexafluoropropane, 1,3-bis (3,4
-Dicarboxytrifluorophenyl) hexafluoropropane, 1,4-bis (3,4-dicarboxytrifluorophenoxy) tetrafluorobenzene, hexafluoro-3,3 '(or 4,4')-oxybisphthalic acid And so on.
【0026】フッ素を含まない酸ニ無水物成分を用いて
もよく、例えば、タンテトラカルボン酸二無水物、1,
2,3,4−シクロブタンテトラカルボン酸二無水物、
1,3−ジメチル−1,2,3,4−シクロブタンテト
ラカルボン酸、1,2,3,4−シクロペンタンテトラ
カルボン酸二無水物、2,3,5−トリカルボキシシク
ロペンチル酢酸二無水物、3,5,6−トリカルボキシ
ノルボナン−2−酢酸二無水物、2,3,4,5−テト
ラヒドロフランテトラカルボン酸二無水物、5−(2,
5−ジオキソテトラヒドロフラル)−3−メチル−3−
シクロヘキセン−1,2−ジカルボン酸二無水物、ビシ
クロ[2,2,2]−オクト−7−エン−2,3,5,
6−テトラカルボン酸二無水物等の脂肪族または脂環式
テトラカルボン酸二無水物;ピロメリット酸二無水物、
3,3‘,4,4’−ベンゾフェノンテトラカルボン酸
二無水物、3,3‘,4,4’−ビフェニルスルホンテ
トラカルボン酸二無水物、1,4,5,8−ナフタレン
テトラカルボン酸二無水物、2,3,6,7−ナフタレ
ンテトラカルボン酸二無水物、3,3‘,4,4’−ビ
フェニルエーテルテトラカルボン酸二無水物、3,
3‘,4,4’−ジメチルジフェニルシランテトラカル
ボン酸二無水物、3,3‘,4,4’−テトラフェニル
シランテトラカルボン酸二無水物、1,2,3,4−フ
ランテトラカルボン酸二無水物、4,4‘−ビス(3,
4−ジカルボキシフェノキシ)ジフェニルスルフィド二
無水物、4,4‘−ビス(3,4−ジカルボキシフェノ
キシ)ジフェニルスルホン二無水物、4,4‘−ビス
(3,4−ジカルボキシフェノキシ)ジフェニルプロパ
ン二無水物、3,3’,4,4‘−パーフルオロイソプ
ロピリデンジフタル酸二無水物、3,3’,4,4‘−
ビフェニルテトラカルボン酸二無水物、ビス(フタル
酸)フェニルホスフィンオキサイド二無水物、p−フェ
ニレン−ビス(トリフェニルフタル酸)二無水物、m−
フェニレン−ビス(トリフェニルフタル酸)二無水物、
ビス(トリフェニルフタル酸)−4,4’−ジフェニル
エーテル二無水物、ビス(トリフェニルフタル酸)−
4,4’−ジフェニルメタン二無水物等の芳香族テトラ
カルボン酸二無水物;パラ−ターフェニル−3,4,
3″,4″−テトラカルボン酸二無水物、3,3′,
4,4′−ベンゾフェノンテトラカルボン酸二無水物、
1,4−ヒドロキノンジベンゾエ−ト−3.3’,4,
4’−テトラカルボン酸二無水物、3,3′,4,4′
−ビフェニルテトラカルボン酸二無水物、3,3′,
4,4′−ビフェニルエーテルテトラカルボン酸二無水
物、1,2,5,6−ナフタレンテトラカルボン酸二無
水物、2,3,6,7−ナフタレンテトラカルボン酸二
無水物、2,3,5,6−ピリジンテトラカルボン酸二
無水物、1,4,5,8−ナフタレンテトラカルボン酸
二無水物、3,4,9,10−ペリレンテトラカルボン
酸二無水物、4,4′−スルホニルジフタル酸二無水
物、3,3′,4,4′−テトラフェニルシランテトラ
カルボン酸二無水物、メタ−ターフェニル−3,3″,
4,4″−テトラカルボン酸二無水物、3,3′,4,
4′−ジフェニルエーテルテトラカルボン酸二無水物、
1,3−ビス(3,4−ジカルボキシフェニル)−1,
1,3,3−テトラメチルジシロキサン二無水物、1−
(2,3−ジカルボキシフェニル)−3−(3,4−ジ
カルボキシフェニル)−1,1,3,3−テトラメチル
ジシロキサン二無水物、1,3,3a,4,5,9b−
ヘキサヒドロ−2,5−ジオキソ−3−フラニル)−ナ
フト[1,2−c]フラン−1,3−ジオン、1,3,
3a,4,5,9b−ヘキサヒドロ−5−メチル−5−
(テトラヒドロ−2,5−ジオキソ−3−フラニル)−
ナフト[1,2−c]フラン−1,3−ジオン、1,
3,3a,4,5,9b−ヘキサヒドロ−8−メチル−
5−(テトラヒドロ−2,5−ジオキソ−3−フラニ
ル)−ナフト[1,2−c]フラン−1,3−ジオン等
が挙げられる。An acid dianhydride component containing no fluorine may be used, for example, tan tetracarboxylic dianhydride, 1,
2,3,4-cyclobutanetetracarboxylic dianhydride,
1,3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic acid, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 2,3,5-tricarboxycyclopentylacetic acid dianhydride, 3,5,6-tricarboxynorbonane-2-acetic acid dianhydride, 2,3,4,5-tetrahydrofuran tetracarboxylic dianhydride, 5- (2,2
5-dioxotetrahydrofural) -3-methyl-3-
Cyclohexene-1,2-dicarboxylic dianhydride, bicyclo [2,2,2] -oct-7-ene-2,3,5
Aliphatic or alicyclic tetracarboxylic dianhydride such as 6-tetracarboxylic dianhydride; pyromellitic dianhydride,
3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyl sulfone tetracarboxylic dianhydride, 1,4,5,8-naphthalene tetracarboxylic dianhydride Anhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyl ether tetracarboxylic dianhydride, 3,3'
3 ', 4,4'-dimethyldiphenylsilanetetracarboxylic dianhydride, 3,3', 4,4'-tetraphenylsilanetetracarboxylic dianhydride, 1,2,3,4-furantetracarboxylic acid Dianhydride, 4,4'-bis (3,3
4-dicarboxyphenoxy) diphenyl sulfide dianhydride, 4,4'-bis (3,4-dicarboxyphenoxy) diphenylsulfone dianhydride, 4,4'-bis (3,4-dicarboxyphenoxy) diphenylpropane Dianhydride, 3,3 ', 4,4'-perfluoroisopropylidene diphthalic acid dianhydride, 3,3', 4,4'-
Biphenyltetracarboxylic dianhydride, bis (phthalic acid) phenylphosphine oxide dianhydride, p-phenylene-bis (triphenylphthalic acid) dianhydride, m-
Phenylene-bis (triphenylphthalic acid) dianhydride,
Bis (triphenylphthalic acid) -4,4'-diphenylether dianhydride, bis (triphenylphthalic acid)-
Aromatic tetracarboxylic dianhydrides such as 4,4'-diphenylmethane dianhydride; para-terphenyl-3,4
3 ", 4" -tetracarboxylic dianhydride, 3,3 ',
4,4'-benzophenone tetracarboxylic acid dianhydride,
1,4-hydroquinone dibenzoate-3.3 ′, 4
4'-tetracarboxylic dianhydride, 3,3 ', 4,4'
-Biphenyltetracarboxylic dianhydride, 3,3 ',
4,4'-biphenyl ether tetracarboxylic dianhydride, 1,2,5,6-naphthalene tetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride, 2,3,3 5,6-Pyridinetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 4,4'-sulfonyl Diphthalic dianhydride, 3,3 ', 4,4'-tetraphenylsilane tetracarboxylic dianhydride, meta-terphenyl-3,3 ",
4,4 "-tetracarboxylic dianhydride, 3,3 ', 4,
4'-diphenyl ether tetracarboxylic dianhydride,
1,3-bis (3,4-dicarboxyphenyl) -1,
1,3,3-tetramethyldisiloxane dianhydride, 1-
(2,3-Dicarboxyphenyl) -3- (3,4-dicarboxyphenyl) -1,1,3,3-tetramethyldisiloxane dianhydride, 1,3,3a, 4,5,9b-
Hexahydro-2,5-dioxo-3-furanyl) -naphtho [1,2-c] furan-1,3-dione, 1,3
3a, 4,5,9b-hexahydro-5-methyl-5-
(Tetrahydro-2,5-dioxo-3-furanyl)-
Naphtho [1,2-c] furan-1,3-dione, 1,
3,3a, 4,5,9b-hexahydro-8-methyl-
5- (tetrahydro-2,5-dioxo-3-furanyl) -naphtho [1,2-c] furan-1,3-dione and the like can be mentioned.
【0027】本発明におけるポリイミド前駆体を製造す
る時に使用するジアミンはフッ素を含むジアミンが溶媒
溶解性、吸湿率を下げる意味で好適である。またアルキ
ル基、アリル基、プロパルギル基、水酸基の水素原子を
含まない場合、近赤外光の光損失が低位であり好まし
い。フッ素を含むジアミン成分としては4−(1H,1
H,11H−エイコサフルオロウンデカノキシ)−1,
3−ジアミノベンゼン、4−(1H,1H−パーフルオ
ロ−1−ブタノキシ)−1,3−ジアミノベンゼン、4
−(1H,1H−パーフルオロ−1−ヘプタノキシ)−
1,3−ジアミノベンゼン、4−(1H,1H−パーフ
ルオロ−1−オクタノキシ)−1,3−ジアミノベンゼ
ン、4−ペンタフルオロフェノキシ−1,3−ジアミノ
ベンゼン、4−(2,3,5,6−テトラフルオロフェ
ノキシ)−1,3−ジアミノベンゼン、4−(4−フル
オロフェノキシ)−1,3−ジアミノベンゼン、4−
(1H,1H,2H,2H−パーフルオロ−1−ヘキサ
ノキシ)−1,3−ジアミノベンゼン、4−(1H,1
H,2H,2H−パーフルオロ−1−ドデカノキシ)−
1,3−ジアミノベンゼン、(2,5)−ジアミノベン
ゾトリフルオライド、ビス(トリフルオロメチル)フェ
ニレンジアミン、ジアミノテトラ(トリフルオロメチ
ル)ベンゼン、ジアミノ(ペンタフルオロエチル)ベン
ゼン、2,5−ジアミノ(パーフルオロヘキシル)ベン
ゼン、2,5−ジアミノ(パーフルオロブチル)ベンゼ
ン、2,2′−ビス(トリフルオロメチル)−4,4′
−ジアミノビフェニル、3,3′−ビス(トリフルオロ
メチル)−4,4′−ジアミノビフェニル、オクタフル
オロベンジジン、4,4′−ジアミノジフェニルエーテ
ル、2,2−ビス(4−アミノフェニル)ヘキサフルオ
ロプロパン、1,3−ビス(アニリノ)ヘキサフルオロ
プロパン、1,4−ビス(アニリノ)オクタフルオロブ
タン、1,5−ビス(アニリノ)デカフルオロペンタ
ン、1,7−ビス(アニリノ)テトラデカフルオロヘプ
タン、2,2′−ビス(トリフルオロメチル)−4,
4′−ジアミノジフェニルエーテル、3,3′−ビス
(トリフルオロメチル)−4,4′−ジアミノジフェニ
ルエーテル、3,3′,5,5′−テトラキス(トリフ
ルオロメチル)−4,4′−ジアミノジフェニルエーテ
ル、3,3′−ビス(トリフルオロメチル)−4,4′
−ジアミノベンゾフェノン、4,4′−ジアミノ−p−
テルフェニル、1,4−ビス(p−アミノフェニル)ベ
ンゼン、p−(4−アミノ−2−トリフルオロメチルフ
ェノキシ)ベンゼン、ビス(アミノフェノキシ)ビス
(トリフルオロメチル)ベンゼン、ビス(アミノフェノ
キシ)テトラキス(トリフルオロメチル)ベンゼン、
2,2−ビス{4−(4−アミノフェノキシ)フェニ
ル}ヘキサフルオロプロパン、2,2−ビス{4−(3
−アミノフェノキシ)フェニル}ヘキサフルオロプロパ
ン、2,2−ビス{4−(2−アミノフェノキシ)フェ
ニル}ヘキサフルオロプロパン、2,2−ビス{4−
(4−アミノフェノキシ)−3,5−ジメチルフェニ
ル}ヘキサフルオロプロパン、2,2−ビス{4−(4
−アミノフェノキシ)−3,5−ジトリフルオロメチル
フェニル}ヘキサフルオロプロパン、4,4′−ビス
(4−アミノ−2−トリフルオロメチルフェノキシ)ビ
フェニル、4,4′−ビス(4−アミノ−3−トリフル
オロメチルフェノキシ)ビフェニル、4,4′−ビス
(4−アミノ−2−トリフルオロメチルフェノキシ)ジ
フェニルスルホン、4,4′−ビス(3−アミノ−5−
トリフルオロメチルフェノキシ)ジフェニルスルホン、
2,2−ビス{4−(4−アミノ−3−トリフルオロメ
チルフェノキシ)フェニル}ヘキサフルオロプロパン、
ビス{(トリフルオロメチル)アミノフェノキシ}ビフ
ェニル、ビス〔{(トリフルオロメチル)アミノフェノ
キシ}フェニル〕ヘキサフルオロプロパン、ビス{2−
〔(アミノフェノキシ)フェニル〕ヘキサフルオロイソ
プロピル}ベンゼン、4,4′−ビス(4−アミノフェ
ノキシ)オクタフルオロビフェニル等が挙げられる。As the diamine used for producing the polyimide precursor in the present invention, a diamine containing fluorine is suitable in the sense that solvent solubility and moisture absorption are lowered. Further, it is preferable that the compound does not contain a hydrogen atom such as an alkyl group, an allyl group, a propargyl group, or a hydroxyl group, because the light loss of near infrared light is low. As the diamine component containing fluorine, 4- (1H, 1
H, 11H-eicosafluoroundecaneoxy) -1,
3-diaminobenzene, 4- (1H, 1H-perfluoro-1-butanoxy) -1,3-diaminobenzene, 4
-(1H, 1H-perfluoro-1-heptanoxy)-
1,3-diaminobenzene, 4- (1H, 1H-perfluoro-1-octanoxy) -1,3-diaminobenzene, 4-pentafluorophenoxy-1,3-diaminobenzene, 4- (2,3,5 , 6-Tetrafluorophenoxy) -1,3-diaminobenzene, 4- (4-fluorophenoxy) -1,3-diaminobenzene, 4-
(1H, 1H, 2H, 2H-perfluoro-1-hexanoxy) -1,3-diaminobenzene, 4- (1H, 1
H, 2H, 2H-perfluoro-1-dodecanoxy)-
1,3-diaminobenzene, (2,5) -diaminobenzotrifluoride, bis (trifluoromethyl) phenylenediamine, diaminotetra (trifluoromethyl) benzene, diamino (pentafluoroethyl) benzene, 2,5-diamino ( Perfluorohexyl) benzene, 2,5-diamino (perfluorobutyl) benzene, 2,2′-bis (trifluoromethyl) -4,4 ′
-Diaminobiphenyl, 3,3'-bis (trifluoromethyl) -4,4'-diaminobiphenyl, octafluorobenzidine, 4,4'-diaminodiphenyl ether, 2,2-bis (4-aminophenyl) hexafluoropropane , 1,3-bis (anilino) hexafluoropropane, 1,4-bis (anilino) octafluorobutane, 1,5-bis (anilino) decafluoropentane, 1,7-bis (anilino) tetradecafluoroheptane, 2,2'-bis (trifluoromethyl) -4,
4'-diaminodiphenyl ether, 3,3'-bis (trifluoromethyl) -4,4'-diaminodiphenyl ether, 3,3 ', 5,5'-tetrakis (trifluoromethyl) -4,4'-diaminodiphenyl ether , 3,3'-bis (trifluoromethyl) -4,4 '
-Diaminobenzophenone, 4,4'-diamino-p-
Terphenyl, 1,4-bis (p-aminophenyl) benzene, p- (4-amino-2-trifluoromethylphenoxy) benzene, bis (aminophenoxy) bis (trifluoromethyl) benzene, bis (aminophenoxy) Tetrakis (trifluoromethyl) benzene,
2,2-bis {4- (4-aminophenoxy) phenyl} hexafluoropropane, 2,2-bis {4- (3
-Aminophenoxy) phenyl} hexafluoropropane, 2,2-bis {4- (2-aminophenoxy) phenyl} hexafluoropropane, 2,2-bis {4-
(4-Aminophenoxy) -3,5-dimethylphenyl} hexafluoropropane, 2,2-bis {4- (4
-Aminophenoxy) -3,5-ditrifluoromethylphenyl} hexafluoropropane, 4,4'-bis (4-amino-2-trifluoromethylphenoxy) biphenyl, 4,4'-bis (4-amino-3) -Trifluoromethylphenoxy) biphenyl, 4,4'-bis (4-amino-2-trifluoromethylphenoxy) diphenyl sulfone, 4,4'-bis (3-amino-5-
Trifluoromethylphenoxy) diphenyl sulfone,
2,2-bis {4- (4-amino-3-trifluoromethylphenoxy) phenyl} hexafluoropropane,
Bis {(trifluoromethyl) aminophenoxy} biphenyl, bis [{(trifluoromethyl) aminophenoxy} phenyl] hexafluoropropane, bis {2-
Examples include [(aminophenoxy) phenyl] hexafluoroisopropyl} benzene and 4,4′-bis (4-aminophenoxy) octafluorobiphenyl.
【0028】分子内のアミノ基を除くアルキル基、フェ
ニル環等の炭素に結合するすべての1価元素をフッ素、
又はパーフルオロアルキル基としたものであればより近
赤外の吸収が小さく好ましい。例えば3,4,5,6−
テトラフルオロ−1,2−フェニレンジアミン、2,
4,5,6−テトラフルオロ−1,3−フェニレンジア
ミン、2,3,5,6−テトラフルオロ−1,4−フェ
ニレンジアミン、4,4′−ジアミノオクタフルオロビ
フェニル、ビス(2,3,5,6−テトラフルオロ−4
−アミノフェニル)エーテル、ビス(2,3,5,6−
テトラフルオロ−4−アミノフェニル)スルホン、ヘキ
サフルオロ−2,2′−ビス(トリフルオロメチル)−
4,4′−ジアミノビフェニル等が挙げられる。All monovalent elements bonded to carbon such as alkyl groups other than amino groups in the molecule and phenyl rings are fluorine,
Alternatively, a perfluoroalkyl group is preferable because it has a smaller near infrared absorption. For example 3,4,5,6-
Tetrafluoro-1,2-phenylenediamine, 2,
4,5,6-Tetrafluoro-1,3-phenylenediamine, 2,3,5,6-tetrafluoro-1,4-phenylenediamine, 4,4'-diaminooctafluorobiphenyl, bis (2,3,3 5,6-tetrafluoro-4
-Aminophenyl) ether, bis (2,3,5,6-)
Tetrafluoro-4-aminophenyl) sulfone, hexafluoro-2,2'-bis (trifluoromethyl)-
4,4'-diaminobiphenyl and the like can be mentioned.
【0029】また、合成分としてフッ素を含まないジア
ミン成分を含有していてもよく、例えば、4,4′−ジ
アミノジフェニルエーテル、4,4′−ジアミノジフェ
ニルスルホン、4,4′−ジアミノジフェニルスルフィ
ド、ベンジジン、メタフェニレンジアミン、、パラフェ
ニレンジアミン、1,5−ナフタレンジアミン、2,6
−ナフタレンジアミン、ビス−(4−アミノフェノキシ
フェニル)スルホン、ビス−(4−アミノフェノキシフ
ェニル)スルフィド、ビス−(4−アミノフェノキシフ
ェニル)ビフェニル、1,4−ビス−(4−アミノフェ
ノキシ)ベンゼン、1,3−ビス−(4−アミノフェノ
キシ)ベンゼン、3,4′−ジアミノジフェニルエーテ
ル、4,4′−ジアミノジフェニルエーテル−3−スル
ホンアミド、3,4′−ジアミノジフェニルエーテル−
4−スルホンアミド、3,4′−ジアミノジフェニルエ
ーテル−3′−スルホンアミド、3,3′−ジアミノジ
フェニルエーテル−4−スルホンアミド、4,4′−ジ
アミノジフェニルスルホン−3−スルホンアミド、3,
4′−ジアミノジフェニルスルホン−4−スルホンアミ
ド、3,4′−ジアミノジフェニルスルホン−3′−ス
ルホンアミド、3,3′−ジアミノジフェニルスルホン
−4−スルホンアミド、4,4′−ジアミノジフェニル
サルファイド−3−スルホンアミド、3,4′−ジアミ
ノジフェニルサルファイド−4−スルホンアミド、3,
3′−ジアミノジフェニルサルファイド−4−スルホン
アミド、3,4′−ジアミノジフェニルサルファイド−
3′−スルホンアミド、1,4−ジアミノベンゼン−2
−スルホンアミド、4,4′−ジアミノジフェニルエー
テル−3−カルボンアミド、3,4′−ジアミノジフェ
ニルエーテル−4−カルボンアミド、3,4′−ジアミ
ノジフェニルエーテル−3′−カルボンアミド、3,
3′−ジアミノジフェニルエーテル−4−カルボンアミ
ド、4,4′−ジアミノジフェニルメタン−3−カルボ
ンアミド、3,4′−ジアミノジフェニルメタン−4−
カルボンアミド、3,4′−ジアミノジフェニルメタン
−3′−カルボンアミド、3,3′−ジアミノジフェニ
ルメタン−4−カルボンアミド、4,4′−ジアミノジ
フェニルスルホン−3−カルボンアミド、3,4′−ジ
アミノジフェニルスルホン−4−カルボンアミド、3,
4′−ジアミノジフェニルスルホン−3′−カルボンア
ミド、3,3′−ジアミノジフェニルスルホン−4−カ
ルボンアミド、4,4′−ジアミノジフェニルサルファ
イド−3−カルボンアミド、3,4′−ジアミノジフェ
ニルサルファイド−4−カルボンアミド、3,3′−ジ
アミノジフェニルサルファイド−4−カルボンアミド、
3,4′−ジアミノジフェニルサルファイド−3′−ス
ルホンアミド、1,4−ジアミノベンゼン−2−カルボ
ンアミド、4,4′−ビス(4−アミノフェノキシ)ビ
フェニル、ビス{4−(3−アミノフェノキシ)フェニ
ル}スルホン等が挙げられる。上記の酸無水物成分及び
ジアミン成分はそれぞれ2種以上を組み合わせて用いて
もよい。As a synthetic component, a diamine component containing no fluorine may be contained, for example, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfide, Benzidine, metaphenylenediamine, paraphenylenediamine, 1,5-naphthalenediamine, 2,6
-Naphthalenediamine, bis- (4-aminophenoxyphenyl) sulfone, bis- (4-aminophenoxyphenyl) sulfide, bis- (4-aminophenoxyphenyl) biphenyl, 1,4-bis- (4-aminophenoxy) benzene , 1,3-bis- (4-aminophenoxy) benzene, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether-3-sulfonamide, 3,4'-diaminodiphenyl ether-
4-sulfonamide, 3,4'-diaminodiphenyl ether-3'-sulfonamide, 3,3'-diaminodiphenyl ether-4-sulfonamide, 4,4'-diaminodiphenyl sulfone-3-sulfonamide, 3,
4'-diaminodiphenylsulfone-4-sulfonamide, 3,4'-diaminodiphenylsulfone-3'-sulfonamide, 3,3'-diaminodiphenylsulfone-4-sulfonamide, 4,4'-diaminodiphenylsulfide- 3-sulfonamide, 3,4'-diaminodiphenyl sulfide-4-sulfonamide, 3,
3'-diaminodiphenyl sulfide-4-sulfonamide, 3,4'-diaminodiphenyl sulfide-
3'-sulfonamide, 1,4-diaminobenzene-2
-Sulfonamide, 4,4'-diaminodiphenyl ether-3-carbonamide, 3,4'-diaminodiphenyl ether-4-carbonamide, 3,4'-diaminodiphenyl ether-3'-carbonamide, 3,
3'-diaminodiphenyl ether-4-carbonamide, 4,4'-diaminodiphenylmethane-3-carbonamide, 3,4'-diaminodiphenylmethane-4-
Carbonamide, 3,4'-diaminodiphenylmethane-3'-carbonamide, 3,3'-diaminodiphenylmethane-4-carbonamide, 4,4'-diaminodiphenylsulfone-3-carbonamide, 3,4'-diamino Diphenylsulfone-4-carbonamide, 3,
4'-diaminodiphenylsulfone-3'-carbonamide, 3,3'-diaminodiphenylsulfone-4-carbonamide, 4,4'-diaminodiphenylsulfide-3-carbonamide, 3,4'-diaminodiphenylsulfide- 4-carbonamide, 3,3'-diaminodiphenyl sulfide-4-carbonamide,
3,4'-diaminodiphenyl sulfide-3'-sulfonamide, 1,4-diaminobenzene-2-carbonamide, 4,4'-bis (4-aminophenoxy) biphenyl, bis {4- (3-aminophenoxy) ) Phenyl} sulfone and the like. The above-mentioned acid anhydride component and diamine component may be used in combination of two or more kinds.
【0030】本発明では上記(a)化合物または(b)
酸ニ無水物または(c)ジアミンのどれかまたはすべて
に含フッ素化合物を含むことが好ましい。In the present invention, the above-mentioned compound (a) or (b)
It is preferable to include a fluorine-containing compound in any or all of the acid dianhydride or the (c) diamine.
【0031】特にこの好ましい組み合わせとしては
(a)化合物としてジクロリド化合物、ジエステル化合
物として2,2−ビス(3,4−ジカルボキシフェニ
ル)ヘキサフルオロプロパン二無水物、ピロメリット酸
二無水物、2,2′−ビス(トリフルオロメチル)−
4,4′−ジアミノビフェニルより合成したジエステル
化合物、ジクロリド化合物およびこれらの混合物、
(b)酸ニ無水物として2,2−ビス(3,4−ジカル
ボキシフェニル)ヘキサフルオロプロパン二無水物、ピ
ロメリット酸二無水物、2,2′−ビス(トリフルオロ
メチル)−4,4′−ジアミノビフェニルまたはこの混
合物、ジアミンとしては4,4′−ジアミノジフェニル
エーテルが好ましい。特に2,2−ビス(3,4−ジカ
ルボキシフェニル)ヘキサフルオロプロパン二無水物と
ピロメリット酸二無水物または2,2−ビス(3,4−
ジカルボキシフェニル)ヘキサフルオロプロパン二無水
物から合成したジクロリド化合物、ジエステル化合物と
混合して共重合させることで屈折率、線膨張係数等を所
望の値にすることが可能であり、ポリイミド前駆体の溶
媒溶解性、ジクロリド化合物、ジエステル化合物の合成
の容易さの点で好ましい。Particularly preferable combinations are (a) compound as dichloride compound, diester compound as 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, pyromellitic dianhydride, 2,2. 2'-bis (trifluoromethyl)-
Diester compounds synthesized from 4,4′-diaminobiphenyl, dichloride compounds and mixtures thereof,
(B) 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, pyromellitic dianhydride, 2,2'-bis (trifluoromethyl) -4, as an acid dianhydride 4'-Diaminobiphenyl or a mixture thereof, and as the diamine, 4,4'-diaminodiphenyl ether is preferable. Particularly, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride and pyromellitic dianhydride or 2,2-bis (3,4-
Dicarboxyphenyl) difluoro compound synthesized from hexafluoropropane dianhydride, by mixing with a diester compound and copolymerized, it is possible to bring the refractive index, linear expansion coefficient, etc. to desired values. It is preferable in terms of solvent solubility and ease of synthesis of dichloride compound and diester compound.
【0032】ポリイミド前駆体は得るための重合体を含
む溶液は、(a)化合物と(b)酸ニ無水物の合計のモ
ル数と(c)ジアミンまたはジシアナートのモル数が実
質的に等モルになるように使用し重合して得られる。The solution containing the polymer for obtaining the polyimide precursor is such that the total number of moles of the compound (a) and the acid anhydride (b) and the number of moles of the diamine or dicyanate (c) are substantially equimolar. It can be obtained by polymerizing by using
【0033】(a)化合物がジクロリド化合物の場合は
好ましくはアルゴン、窒素などの不活性雰囲気中におい
て、ジアミン及びジクロリド化合物、カルボン酸二無水
物を有機極性溶媒中に溶解または拡散させて得られる。
また、トリエチルアミンやピリジン等を少量混合するこ
とが一般的である。各モノマーの添加順序は特に限定さ
れず、ジクロリド化合物と酸二無水物を有機極性溶媒中
に先に加えておき、ジアミン成分を添加し、重合体の溶
液としても良いし、ジアミン成分を有機極性溶媒中に先
に適量加えて、次にジクロリド化合物と酸二無水物を加
えても良い。好ましい方法としてはジアミン成分とジク
ロリド化合物を先に反応させ次に酸ニ無水物を加えて重
合体とする方法が反応を制御しやすく、重合度が上がり
良好なポリイミド前駆体を得られやすい。When the compound (a) is a dichloride compound, it is preferably obtained by dissolving or diffusing a diamine, a dichloride compound and a carboxylic acid dianhydride in an organic polar solvent in an inert atmosphere such as argon or nitrogen.
Further, it is general to mix a small amount of triethylamine, pyridine, or the like. The addition order of each monomer is not particularly limited, and the dichloride compound and the acid dianhydride may be previously added to the organic polar solvent, and the diamine component may be added to prepare a polymer solution. An appropriate amount may be added to the solvent first, and then the dichloride compound and the acid dianhydride may be added. As a preferred method, a method in which a diamine component and a dichloride compound are first reacted and then an acid dianhydride is added to form a polymer is easy to control the reaction, and the degree of polymerization is increased, and a good polyimide precursor is easily obtained.
【0034】(a)化合物がジエステル化合物の場合
は、好ましくはアルゴン、窒素などの不活性雰囲気中に
おいて、ジアミン及びジエステル化合物とカルボン酸二
無水物を有機極性溶媒中に溶解または拡散させて得られ
る。また、ジエステル化合物と2倍当量以上の縮合剤を
混合することが一般的である。各モノマーの添加順序は
特に限定されず、ジエステル化合物と酸二無水物を有機
極性溶媒中に先に加えておき、ジアミン成分を添加し、
ポリアミドエステルの溶液としても良いし、ジアミン成
分を有機極性溶媒中に先に適量加えて、次にエステル化
合物と酸二無水物を加えても良い。また縮合剤を使用せ
ずに上記のジアミンをジイソシアナートとして高温(4
0℃〜200℃)で混合して、重合しても良い。When the compound (a) is a diester compound, it is preferably obtained by dissolving or diffusing a diamine and a diester compound and a carboxylic acid dianhydride in an organic polar solvent in an inert atmosphere such as argon or nitrogen. . In addition, it is common to mix the diester compound and a condensing agent in an amount of 2 times or more. The order of addition of each monomer is not particularly limited, the diester compound and the acid dianhydride are first added to the organic polar solvent, and the diamine component is added.
A solution of the polyamide ester may be used, or an appropriate amount of the diamine component may be first added to the organic polar solvent, and then the ester compound and the acid dianhydride may be added. In addition, the above diamine was used as a diisocyanate without using a condensing agent at high temperature (4
You may mix and polymerize at 0 degreeC-200 degreeC).
【0035】前記使用される縮合剤はポリアミドの縮合
合成に使用される物が一般的に使用できる。例えば亜リ
ン酸エステル、リン塩化物、リン酸アミド、リン酸エス
テル、リン酸無水物等があげられる。亜リン酸エステル
として、亜リン酸トリフェニル及びその誘導体、リン塩
化物としては三塩化リン、オキシ塩化リン、リン酸アミ
ドとしては2,3−ジヒドロ−2−チオキソ−3−ベン
ゾオキサゾリルホスホン酸等があげられる。縮合剤はエ
ステル化合物の2〜3倍当量、好ましくは2.1〜2.
3倍当量の量を加える。必要により縮合反応の活性を高
めるためにピリジン、トリエチルアミン等を添加する。
添加量は通常、縮合剤とほば当量である。As the condensing agent used above, those used in the condensation synthesis of polyamide can be generally used. Examples thereof include phosphite ester, phosphorus chloride, phosphoric acid amide, phosphoric acid ester, phosphoric acid anhydride and the like. Triphenyl phosphite and its derivatives as phosphite, phosphorus trichloride and phosphorus oxychloride as phosphorus chloride, and 2,3-dihydro-2-thioxo-3-benzoxazolylphosphone as phosphorus amide. Examples include acids. The condensing agent is 2 to 3 times the equivalent of the ester compound, preferably 2.1 to 2.
Add 3 equivalents. If necessary, pyridine, triethylamine and the like are added to enhance the activity of the condensation reaction.
The addition amount is usually about the same amount as the condensing agent.
【0036】上記の反応により得られた重合体の溶液に
脱水閉環剤および/または触媒を添加しアミド酸部分を
イミド化することが必要である。脱水閉環剤は、例えば
脂肪族酸無水物、芳香族酸無水物、N,N ' - ジアルキル
カルボジイミド、低級脂肪族ハロゲン化物、ハロゲン化
低級脂肪族ハロゲン化物、ハロゲン化低級脂肪酸無水
物、アリールホスホン酸ジハロゲン化物、チオニルハロ
ゲン化物またはそれら2種以上の混合物が挙げられる。
それらのうち、無水酢酸、無水プロピオン酸、無水ラク
酸等の脂肪族無水物またはそれらの2種以上の混合物
が、好ましく用い得る。これらの脱水閉環剤は重合体溶
液中のアミド酸部位のモル数に対して1〜10倍量、好
ましくは1〜7倍量、より好ましくは2〜5倍量を添加
するのが好ましい。また、イミド化を効果的に行うため
には、脱水閉環剤に触媒を同時に用いることが好まし
い。触媒としては脂肪族第三級アミン、芳香族第三級ア
ミン、複素環式第三級アミン等が用いられる。それらの
うち複素環式第三級アミンから選択されるものが特に好
ましく用い得る。具体的にはキノリン、イソキノリン、
β−ピコリン、ピリジン等が好ましく用いられる。これ
らの触媒は脱水閉環剤のモル数に対して1/20〜10
倍量、好ましくは1/15〜5倍量、より好ましくは1
/10〜2倍量のモル数を添加する。これらの、脱水閉
環剤及び触媒は、量が少ないとイミド化が効果的に進行
せず、逆に多すぎるとポリイミド前駆体に残りやすくし
いては光導波路の光損失等が大きくなる場合がある。It is necessary to add a dehydration ring-closing agent and / or a catalyst to the solution of the polymer obtained by the above reaction to imidize the amic acid moiety. Examples of the dehydration ring-closing agent include aliphatic acid anhydride, aromatic acid anhydride, N, N'-dialkylcarbodiimide, lower aliphatic halide, halogenated lower aliphatic halide, halogenated lower fatty acid anhydride, arylphosphonic acid. Examples thereof include dihalides, thionyl halides, and mixtures of two or more thereof.
Among them, aliphatic anhydrides such as acetic anhydride, propionic anhydride, and lactic acid anhydride, or a mixture of two or more thereof can be preferably used. It is preferable to add 1 to 10 times, preferably 1 to 7 times, and more preferably 2 to 5 times the amount of these dehydrating and cyclizing agents with respect to the number of moles of amic acid sites in the polymer solution. Further, in order to effectively carry out imidization, it is preferable to simultaneously use a catalyst for the dehydration ring-closing agent. Aliphatic tertiary amines, aromatic tertiary amines, heterocyclic tertiary amines and the like are used as the catalyst. Among them, those selected from heterocyclic tertiary amines can be particularly preferably used. Specifically, quinoline, isoquinoline,
β-picoline, pyridine and the like are preferably used. These catalysts are 1/20 to 10 relative to the number of moles of the dehydration ring-closing agent.
Double amount, preferably 1/15 to 5 times amount, more preferably 1
/ 10 to 2 times the number of moles is added. Of these, the dehydration ring-closing agent and the catalyst, if the amount is small, imidization does not proceed effectively, and conversely, if it is too large, it tends to remain in the polyimide precursor, and optical loss of the optical waveguide may increase. .
【0037】脱水閉環剤および/または触媒を使用した
イミド化の温度は150℃〜−10℃であることが好ま
しい。150℃を上回るとエステル部分までがイミド化
し所望のポリイミド前駆体を得られない場合があり、−
10℃より低い場合はイミド化に時間がかかれずぎる場
合がある。The temperature of imidization using a dehydration ring-closing agent and / or a catalyst is preferably 150 ° C to -10 ° C. If the temperature exceeds 150 ° C, the ester portion may be imidized and a desired polyimide precursor may not be obtained.
If the temperature is lower than 10 ° C, imidization may take a long time.
【0038】前記ポリイミド前駆体の生成反応に用いら
れる有機極性溶媒としては、例えば、ジメチルスルホキ
シド、ジエチルスルホキシド等のスルホキシド系溶媒、
N,N−ジメチルホルムアミド、N,N−ジエチルホル
ムアミド等のホルムアミド系溶媒、N,N−ジメチルア
セトアミド、N,N−ジエチルアセトアミド等のアセト
アミド系溶媒、N−メチル−2−ピロリドン等のピロリ
ドン系溶媒、フェノール、o−,p−,m−またはp−
クレゾール、キシノール、ハロゲン化フェノール、カテ
コール等のフェノール系溶媒、あるいはヘキサメチルホ
スホルアミド、γ−ブチロラクトン等を挙げることがで
きる。更に必要に応じて、これらの有機極性溶媒とキシ
レンあるいはトルエン等の芳香族炭化水素とを組み合わ
せて用いることもできる。その溶液の濃度は5〜40重
量%(10〜25重量%であることが好ましい)、また
前記ポリマー溶液の回転粘度(25℃)は、50〜50
00ポアズであることが好適である。(a)化合物がジ
クロリド化合物の場合はN,N−ジメチルアセトアミ
ド、N,N−ジエチルアセトアミド等のアセトアミド系
溶媒、N−メチル−2−ピロリドン等のピロリドン系溶
媒が副反応がおこりにくく好ましい。The organic polar solvent used in the reaction for producing the polyimide precursor is, for example, a sulfoxide-based solvent such as dimethyl sulfoxide or diethyl sulfoxide,
Formamide solvents such as N, N-dimethylformamide and N, N-diethylformamide, acetamide solvents such as N, N-dimethylacetamide and N, N-diethylacetamide, and pyrrolidone solvents such as N-methyl-2-pyrrolidone. , Phenol, o-, p-, m- or p-
Phenol solvents such as cresol, xynol, halogenated phenol and catechol, hexamethylphosphoramide, γ-butyrolactone and the like can be mentioned. Furthermore, if necessary, these organic polar solvents may be used in combination with an aromatic hydrocarbon such as xylene or toluene. The concentration of the solution is 5 to 40% by weight (preferably 10 to 25% by weight), and the rotational viscosity (25 ° C.) of the polymer solution is 50 to 50%.
It is preferably 00 poise. When the compound (a) is a dichloride compound, acetamide-based solvents such as N, N-dimethylacetamide and N, N-diethylacetamide, and pyrrolidone-based solvents such as N-methyl-2-pyrrolidone are preferable because side reactions do not easily occur.
【0039】前記ポリイミド前駆体は上記のように合成
されるがポリイミド前駆体はその溶媒溶解性の高さ、貯
蔵安定性の良さから印刷によるパターン形成が可能であ
る。また、光開始剤等を添加することにより、感光性を
持たせフォトリソグラフィーによりパターンを形成する
ことも可能である。The polyimide precursor is synthesized as described above, but the polyimide precursor can form a pattern by printing because of its high solvent solubility and good storage stability. Further, by adding a photoinitiator or the like, it is possible to impart photosensitivity and form a pattern by photolithography.
【0040】印刷に使用する場合、適当な溶媒に溶解さ
せてポリイミド前駆体組成物とする。When it is used for printing, it is dissolved in a suitable solvent to obtain a polyimide precursor composition.
【0041】例えば上記反応溶液を脱イオン水、アルコ
ール等に投入し析出させ、必要により脱イオン水、アル
コールでさらに洗浄し、減圧下で乾燥させる。このポリ
イミド前駆体に溶媒を添加しポリイミド前駆体組成物を
得る。また析出等を実施しないで合成された溶媒を必要
により一部除去し、ポリイミド前駆体組成物としてもか
まわない。For example, the above reaction solution is poured into deionized water, alcohol or the like to cause precipitation, and if necessary, further washed with deionized water or alcohol and dried under reduced pressure. A solvent is added to this polyimide precursor to obtain a polyimide precursor composition. In addition, the solvent synthesized without performing precipitation or the like may be partially removed as needed to form a polyimide precursor composition.
【0042】このとき溶媒としてはポリイミド前駆体が
溶解する範囲で種種の溶媒を使用することができる。例
えばメタノール、エタノール、プロパノール、イソプロ
パノール、ブタノール、ペンタノール等のアルコール溶
媒、アセトン、ジメチルエーテル、メチルエチルケト
ン、酢酸エチル、テトラヒドロフラン、ジオキサン、ア
セトニトリル等、トルエン、キシレン等の芳香族炭化水
素系溶媒、ヘキサン、ヘプタン、オクタン、シクロヘキ
サン等の脂肪族炭化水素系溶媒、塩化メチレン等のハロ
ゲン化炭化水素系溶媒、ジメチルスルホキシド、ジエチ
ルスルホキシド等のスルホキシド系溶媒、N,N−ジメ
チルホルムアミド、N,N−ジエチルホルムアミド等の
ホルムアミド系溶媒、N,N−ジメチルアセトアミド、
N,N−ジエチルアセトアミド等のアセトアミド系溶
媒、N−メチル−2−ピロリドン等のピロリドン系溶
媒、フェノール、o−,p−,m−またはp−クレゾー
ル、キシノール、ハロゲン化フェノール、カテコール等
のフェノール系溶媒、あるいはヘキサメチルホスホルア
ミド、γ−ブチロラクトン等などである。またこれらの
溶媒を2種以上組合せても良いし、場合により脱イオン
水を混合させても良い。At this time, as the solvent, various kinds of solvents can be used within a range in which the polyimide precursor is dissolved. For example, methanol, ethanol, propanol, isopropanol, butanol, alcohol solvents such as pentanol, acetone, dimethyl ether, methyl ethyl ketone, ethyl acetate, tetrahydrofuran, dioxane, acetonitrile and the like, toluene, aromatic hydrocarbon solvents such as xylene, hexane, heptane, Aliphatic hydrocarbon solvents such as octane and cyclohexane, halogenated hydrocarbon solvents such as methylene chloride, sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamides such as N, N-dimethylformamide and N, N-diethylformamide. System solvent, N, N-dimethylacetamide,
Acetamide-based solvents such as N, N-diethylacetamide, pyrrolidone-based solvents such as N-methyl-2-pyrrolidone, phenol, phenols such as o-, p-, m- or p-cresol, xynol, halogenated phenol, and catechol. Examples include system solvents, hexamethylphosphoramide, γ-butyrolactone, and the like. Further, two or more kinds of these solvents may be combined, and deionized water may be optionally mixed.
【0043】上記、ポリイミド前駆体組成物の固形分濃
度は30重量部以上95重量部以下が好ましく30重量
部以上80重量部以下がさらに好ましい。固形分濃度が
95重量部より大きい場合組成物の粘度が上がりすぎて
印刷に適さない場合があり、30重量未満の場合、粘度
が小さすぎて印刷に適さない場合や、膜減りが大きく表
面があれる場合がある。The solid content concentration of the polyimide precursor composition is preferably 30 parts by weight or more and 95 parts by weight or less, more preferably 30 parts by weight or more and 80 parts by weight or less. If the solid content concentration is higher than 95 parts by weight, the viscosity of the composition may be too high to be suitable for printing. If it is less than 30 parts by weight, the viscosity may be too low to be suitable for printing, or the film may be greatly reduced and the surface There are cases where it will happen.
【0044】印刷用として使用する場合、印刷の方法は
特には問わないが、スクリーン印刷、インクジェット印
刷、凸板印刷、平板印刷、凹板印刷等が有る。When used for printing, the printing method is not particularly limited, but there are screen printing, ink jet printing, convex plate printing, flat plate printing, concave plate printing and the like.
【0045】前記ポリイミド前駆体はすべての部分をイ
ミド化しポリイミドとすることによって、高い耐熱性
(260℃以上)を持たせることができる。By imidizing all parts of the polyimide precursor to form a polyimide, high heat resistance (260 ° C. or higher) can be provided.
【0046】加熱は200℃〜500℃の間で実施する
のが好ましい。200℃以下である場合イミド化しない
場合があり、500℃以上の場合劣化する場合がある。
また段階的に温度を上げて加熱することがパターンがだ
れにくい、機械的強度が向上する場合が多く好ましい。
この時の加熱時間は、0.1〜10時間とすることが好
ましい。また加熱の雰囲気は窒素、ヘリウム、アルゴン
等の不活性ガス下であるか、真空下がのぞましい。Heating is preferably carried out between 200 ° C and 500 ° C. When the temperature is 200 ° C. or lower, imidization may not occur, and when the temperature is 500 ° C. or higher, deterioration may occur.
In addition, it is preferable that the temperature is raised stepwise for heating in many cases because the pattern is less likely to sag and the mechanical strength is improved.
The heating time at this time is preferably 0.1 to 10 hours. The heating atmosphere is preferably under an inert gas such as nitrogen, helium, or argon, or under vacuum.
【0047】前期ポリイミド前駆体は種々の用途に使用
できる。中でもフッ素が含まれる構造では光学用材料、
光学用部品がその光損失の低さ、低吸湿性から好まし
い。例えば光ファイバー、光導波路、光半導体、封止
材、接着剤、レンズ、液晶用光学材料、光学フィルム、
光配線板、光集積回路、1/4λ板、1/2λ板、グレ
ーティング、光学フィルター、光アイソレーター、光ス
イッチ、光結合器、光分派器、光増幅器、光合分波器、
光導波路および、光導波路を使用した部品、素子等に使
用できる。The precursor polyimide precursor can be used in various applications. Above all, in the structure containing fluorine, an optical material,
Optical parts are preferable because of their low light loss and low hygroscopicity. For example, optical fiber, optical waveguide, optical semiconductor, sealing material, adhesive, lens, optical material for liquid crystal, optical film,
Optical wiring board, optical integrated circuit, 1 / 4λ plate, 1 / 2λ plate, grating, optical filter, optical isolator, optical switch, optical coupler, optical splitter, optical amplifier, optical multiplexer / demultiplexer,
It can be used for optical waveguides, parts and devices using the optical waveguides.
【0048】また、半導体チップコーティング用や高密
度の実装基板材料等にも使用できる。Further, it can also be used for coating semiconductor chips, as a high density mounting substrate material, and the like.
【0049】[0049]
【実施例】以下、本発明を実施例により更に具体的に説
明するが、本発明はこれら実施例に限定されない。EXAMPLES The present invention will now be described in more detail with reference to examples, but the present invention is not limited to these examples.
【0050】使用原料は市販品を使用した。各原料の入
手先を示す。2,2′−ビス(トリフルオロメチル)−
4,4′−ジアミノビフェニル(セントラルガラス社
製)、ジメチルアセトアミド(和光純薬社製)、ピロメ
リット酸二無水物(和光純薬社製)、2,2−ビス
(3,4−ジカルボキシフェニル)ヘキサフルオロプロ
パン酸二無水物(クラリアントジャパン社製)、4,
4′−ジアミノジフェニルエーテル(和光純薬社製)、
メタノール(和光純薬社製)、エタノール(和光純薬
社製)イソプロパノール(和光純薬社製)酢酸エチル
(和光純薬社製)、塩化チオニル(和光純薬社製)、ヘ
キサン(和光純薬社製)
なお、実施例中、光損失、加熱5重量%減量温度、屈折
率は以下の方法にて測定した。
光損失:フィルム状のサンプルを分光光度計(島津社製
UV−3100)にて測定した。
加熱5重量%減量温度:フィルム状サンプルを熱重量測
定装置(セイコー電子社製TG/DTA200)にて測
定した。
屈折率:フィルム状サンプルを精密アッベ屈折率計3T
(アタゴ社製NAR−3T)にて測定した。
(酸クロリド化合物Iの合成)還流管をとりつけた三つ
口フラスコにピロメリット酸二無水物10.0g(46
mmol)にエタノール50mlを加え窒素雰囲気下で
撹拌を続けながら加熱し還流撹拌を3時間おこなった。
室温に冷却した後、エバポレーターにより溶媒を除去
し、さらに真空乾燥をおこない粉末を得た。この粉末を
酢酸エチル60mlに溶解させジメチルホルムアミドを
0.2g加え塩化チオニルを13.1g(110.4m
mol)を加え60℃で2時間加熱しさらに環流下で2
時間加熱した。室温に冷却した後、エバポレーターによ
り溶媒を除去し、さらに真空乾燥をおこない粉末を得
た。この粉末をヘキサンにて再結晶し、12.5gの酸
クロリド化合物を得た。
(酸クロリド化合物IIの合成)還流管をとりつけた三
つ口フラスコにピロメリット酸二無水物10.0g(4
6mmol)にイソプロパノ-ル50mlを加え窒素雰
囲気下で撹拌を続けながら加熱し還流撹拌を3時間おこ
なった。室温に冷却した後、エバポレーターにより溶媒
を除去し、さらに真空乾燥をおこない粉末を得た。この
粉末を酢酸エチル60mlに溶解させジメチルホルムア
ミドを0.2g加え塩化チオニルを13.1g(11
0.4mmol)を加え60℃で2時間加熱しさらに環
流下で2時間加熱した。室温に冷却した後、エバポレー
ターにより溶媒を除去し、さらに真空乾燥をおこない粘
長な液体を含む粉末を得た。この粉末をヘキサンにて再
結晶し、3.5gの酸クロリド化合物IIを得た。
(酸クロリド化合物IIIの合成)還流管をとりつけた三
つ口フラスコに1,4−ヒドロキノンジベンゾエ−ト−
3.3’,4,4’−テトラカルボン酸二無水物20g
にメタノール50ml、N−メチルミロリドンを加え窒
素雰囲気下で撹拌を続けながら加熱し還流撹拌を3時間
おこなった。室温に冷却した後、エバポレーターにより
溶媒を除去し、水70重量%、メタノール30重量%に
て再結晶を実施したのち、さらに真空乾燥をおこない1
8.7gの粉末を得た。この粉末10.4g(20mm
ol)を酢酸エチル60mlに溶解させジメチルホルム
アミドを0.2g加え塩化チオニルを5.7g(48m
mol)を加え60℃で2時間加熱しさらに環流下で2
時間加熱した。室温に冷却した後、エバポレーターによ
り溶媒を除去し、さらに真空乾燥をおこない10.6g
の酸クロリド化合物IIIを得た。The raw materials used were commercial products. The source of each raw material is shown. 2,2'-bis (trifluoromethyl)-
4,4'-diaminobiphenyl (Central Glass Co., Ltd.), dimethylacetamide (Wako Pure Chemical Industries, Ltd.), pyromellitic dianhydride (Wako Pure Chemical Industries, Ltd.), 2,2-bis (3,4-dicarboxy) Phenyl) hexafluoropropanoic acid dianhydride (Clariant Japan), 4,
4'-diaminodiphenyl ether (manufactured by Wako Pure Chemical Industries, Ltd.),
Methanol (Wako Pure Chemical Industries, Ltd.), Ethanol (Wako Pure Chemical Industries, Ltd.) Isopropanol (Wako Pure Chemical Industries, Ltd.) Ethyl acetate (Wako Pure Chemical Industries, Ltd.), Thionyl chloride (Wako Pure Chemical Industries, Ltd.), Hexane (Wako Pure Chemical Industries, Ltd.) In the examples, light loss, heating 5% by weight weight loss temperature, and refractive index were measured by the following methods. Light loss: A film sample was measured with a spectrophotometer (UV-3100 manufactured by Shimadzu Corporation). Heating 5 wt% weight loss temperature: The film sample was measured by a thermogravimetric measuring device (TG / DTA200 manufactured by Seiko Denshi KK). Refractive index: Film sample is a precision Abbe refractometer 3T
(NAR-3T manufactured by Atago Co., Ltd.) (Synthesis of Acid Chloride Compound I) In a three-necked flask equipped with a reflux tube, 10.0 g of pyromellitic dianhydride (46
Ethanol (50 ml) was added to (mmol) and heated under a nitrogen atmosphere while continuing stirring, and the mixture was refluxed and stirred for 3 hours.
After cooling to room temperature, the solvent was removed by an evaporator and vacuum drying was performed to obtain a powder. This powder was dissolved in 60 ml of ethyl acetate, 0.2 g of dimethylformamide was added, and 13.1 g (110.4 m) of thionyl chloride was added.
mol) and heated at 60 ° C. for 2 hours, and further refluxed for 2 hours.
Heated for hours. After cooling to room temperature, the solvent was removed by an evaporator and vacuum drying was performed to obtain a powder. This powder was recrystallized from hexane to obtain 12.5 g of an acid chloride compound. (Synthesis of Acid Chloride Compound II) In a three-necked flask equipped with a reflux tube, 10.0 g of pyromellitic dianhydride (4
(6 mmol) was added with 50 ml of isopropanol, and the mixture was heated in a nitrogen atmosphere with continuous stirring and refluxed for 3 hours. After cooling to room temperature, the solvent was removed by an evaporator and vacuum drying was performed to obtain a powder. This powder was dissolved in 60 ml of ethyl acetate, 0.2 g of dimethylformamide was added, and 13.1 g of thionyl chloride (11
0.4 mmol) was added and the mixture was heated at 60 ° C. for 2 hours and further heated under reflux for 2 hours. After cooling to room temperature, the solvent was removed by an evaporator and further vacuum drying was performed to obtain a powder containing a viscous liquid. This powder was recrystallized from hexane to obtain 3.5 g of acid chloride compound II. (Synthesis of Acid Chloride Compound III) In a three-necked flask equipped with a reflux tube, 1,4-hydroquinone dibenzoate-
20 g of 3.3 ', 4,4'-tetracarboxylic dianhydride
50 ml of methanol and N-methylmyrrolidone were added to and heated under reflux with stirring under a nitrogen atmosphere for 3 hours. After cooling to room temperature, the solvent was removed by an evaporator, recrystallization was carried out with 70% by weight of water and 30% by weight of methanol, and then vacuum drying was performed 1
8.7 g of powder was obtained. 10.4g of this powder (20mm
is dissolved in 60 ml of ethyl acetate, 0.2 g of dimethylformamide is added, and 5.7 g of thionyl chloride (48 m) is added.
mol) and heated at 60 ° C. for 2 hours, and further refluxed for 2 hours.
Heated for hours. After cooling to room temperature, the solvent was removed by an evaporator, and vacuum drying was performed to give 10.6 g.
The acid chloride compound III was obtained.
【0051】(実施例1)(ポリイミド前駆体Iの合
成)窒素雰囲気下の容器中で2,2′−ビス(トリフル
オロメチル)−4,4′−ジアミノビフェニル(3.2
0g、10mmol)をジメチルアセトアミド(35
g)に溶解した後、トリエチルアミン(1.06g、1
0.5mmol)を加えさらに化合物I(1.74g、
5mmol)を加え容器を氷冷し2時間撹拌しさらに室
温(約20℃)で24時間撹拌した。この溶液に2,
2′−ビス(トリフルオロメチル)−4,4′−ジアミ
ノビフェニル酸二無水物2.22g(5mmol)を加
え氷冷し2時間撹拌しさらに室温(約20℃)で24時
間撹拌した。この溶液にケミカルキュア剤としてβ−ピ
コリン0.93g(10mmol)、無水酢酸6.12
5g(60mmol)を加え室温で1時間攪拌し、70
℃で3時間攪拌後室温まで冷却した。次にメタノールに
上記溶液を混合し沈殿物を濾過後、8時間メタノールに
てソックスレイ処理をしたのち真空乾燥しポリイミド前
駆体Iを得た。(Example 1) (Synthesis of Polyimide Precursor I) 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (3.2) in a container under a nitrogen atmosphere.
0 g, 10 mmol) was added to dimethylacetamide (35
g), followed by triethylamine (1.06 g, 1
0.5 mmol) was added and the compound I (1.74 g,
5 mmol) was added, the container was ice-cooled, stirred for 2 hours, and further stirred at room temperature (about 20 ° C.) for 24 hours. 2, in this solution
2.22 g (5 mmol) of 2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl dianhydride was added, and the mixture was ice-cooled, stirred for 2 hours, and further stirred at room temperature (about 20 ° C) for 24 hours. 0.93 g (10 mmol) of β-picoline as a chemical curing agent and 6.12 of acetic anhydride were added to this solution.
Add 5 g (60 mmol) and stir at room temperature for 1 hour.
After stirring at ℃ for 3 hours, it was cooled to room temperature. Next, the above solution was mixed with methanol, the precipitate was filtered, subjected to Soxhlet treatment with methanol for 8 hours, and then vacuum dried to obtain a polyimide precursor I.
【0052】(実施例2)(ポリイミド前駆体IIの合
成)窒素雰囲気下の容器中で2,2′−ビス(トリフル
オロメチル)−4,4′−ジアミノビフェニル(3.2
0g、10mmol)をジメチルアセトアミド(35
g)に溶解した後、トリエチルアミン(1.06g、1
0.5mmol)を加えさらに化合物II(1.86g、
5mmol)を加え容器を氷冷し2時間撹拌しさらに室
温(約20℃)で24時間撹拌した。この溶液に2,
2′−ビス(トリフルオロメチル)−4,4′−ジアミ
ノビフェニル酸二無水物2.22g(5mmol)を加
え氷冷し2時間撹拌しさらに室温(約20℃)で24時
間撹拌した。この溶液にケミカルキュア剤としてβ−ピ
コリン0.93g(10mmol)、無水酢酸6.12
5g(60mmol)を加え室温で1時間攪拌し、70
℃で3時間攪拌後室温まで冷却した。次にメタノールに
上記溶液を混合し沈殿物を濾過後、8時間メタノールに
てソックスレイ処理をしたのち真空乾燥しポリイミド前
駆体IIを得た。Example 2 (Synthesis of Polyimide Precursor II) 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (3.2) in a container under a nitrogen atmosphere.
0 g, 10 mmol) was added to dimethylacetamide (35
g), followed by triethylamine (1.06 g, 1
0.5 mmol) was added and compound II (1.86 g,
5 mmol) was added, the container was ice-cooled, stirred for 2 hours, and further stirred at room temperature (about 20 ° C.) for 24 hours. 2, in this solution
2.22 g (5 mmol) of 2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl dianhydride was added, and the mixture was ice-cooled, stirred for 2 hours, and further stirred at room temperature (about 20 ° C) for 24 hours. 0.93 g (10 mmol) of β-picoline as a chemical curing agent and 6.12 of acetic anhydride were added to this solution.
Add 5 g (60 mmol) and stir at room temperature for 1 hour.
After stirring at ℃ for 3 hours, it was cooled to room temperature. Next, the above solution was mixed with methanol, the precipitate was filtered, subjected to Soxhlet treatment with methanol for 8 hours and then vacuum dried to obtain a polyimide precursor II.
【0053】(実施例3)(ポリイミド前駆体IIIの合
成)窒素雰囲気下の容器中で2,2′−ビス(トリフル
オロメチル)−4,4′−ジアミノビフェニル(3.2
0g、10mmol)をジメチルアセトアミド(35
g)に溶解した後、トリエチルアミン(1.06g、1
0.5mmol)を加えさらに化合物III(2.78
g、5mmol)を加え容器を氷冷し2時間撹拌しさら
に室温(約20℃)で24時間撹拌した。この溶液に
2,2′−ビス(トリフルオロメチル)−4,4′−ジ
アミノビフェニル酸二無水物2.22g(5mmol)
を加え氷冷し2時間撹拌しさらに室温(約20℃)で2
4時間撹拌した。この溶液にケミカルキュア剤としてβ
−ピコリン0.93g(10mmol)、無水酢酸6.
125g(60mmol)を加え室温で1時間攪拌し、
70℃で3時間攪拌後室温まで冷却した。次にメタノー
ルに上記溶液を混合し沈殿物を濾過後、8時間メタノー
ルにてソックスレイ処理をしたのち真空乾燥しポリイミ
ド前駆体IIIを得た。
(実施例1に対する評価)ポリイミド前駆体をジメチル
ホルムアミド(DMF)、テトラヒドロフラン(TH
F)にたいする溶媒溶解性を確認した。(Example 3) (Synthesis of Polyimide Precursor III) 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (3.2) in a container under a nitrogen atmosphere.
0 g, 10 mmol) was added to dimethylacetamide (35
g), followed by triethylamine (1.06 g, 1
0.5 mmol) was added and compound III (2.78) was added.
g, 5 mmol) was added, the container was ice-cooled, stirred for 2 hours, and further stirred at room temperature (about 20 ° C.) for 24 hours. 2.22 g (5 mmol) of 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl dianhydride was added to this solution.
Add ice and stir for 2 hours at room temperature (about 20 ° C).
Stir for 4 hours. Β as a chemical curing agent in this solution
-Picoline 0.93 g (10 mmol), acetic anhydride 6.
125 g (60 mmol) was added and stirred at room temperature for 1 hour,
After stirring at 70 ° C. for 3 hours, the mixture was cooled to room temperature. Next, the above solution was mixed with methanol, the precipitate was filtered, subjected to Soxhlet treatment with methanol for 8 hours, and then vacuum dried to obtain a polyimide precursor III. (Evaluation for Example 1) Polyimide precursor was used as dimethylformamide (DMF), tetrahydrofuran (TH
The solvent solubility of F) was confirmed.
【0054】またポリイミド前駆体I1gにジメチルホ
ルムアミド1gをくわえたところ問題なく溶解し組成物
Iを得た。この組成物を50μ幅のパターンを持つスク
リーンにてアルミ板上にスクリーン印刷を実施した。こ
れを真空化で80℃で100℃で10分、150℃で1
0分、200℃で10分、250℃で10分、300℃
で10分、350℃で10分、400℃で10分間加熱
したところ良好なレリーフ構造を得た。またスクリーン
印刷をおこなわないでアルミ板上に組成物Iを均一に塗
布し真空化で80℃で100℃で10分、150℃で1
0分、200℃で10分、250℃で10分、300℃
で10分、350℃で10分、400℃で10分間加熱
し50μmのポリイミドフィルムも作製した。加熱5重
量%減量温度を測定した。結果を表1に示す。また組成
物Iを2ヶ月室温(15℃〜30℃)放置後、同様にポ
リイミドフィルムを作製した。評価結果を表1に示す。When 1 g of dimethylformamide was added to 1 g of the polyimide precursor I, it was dissolved without any problem to obtain a composition I. This composition was screen-printed on an aluminum plate with a screen having a pattern with a width of 50 μm. This is evacuated at 80 ° C for 10 minutes at 100 ° C and 1 hour at 150 ° C.
0 minutes, 200 ° C for 10 minutes, 250 ° C for 10 minutes, 300 ° C
After heating for 10 minutes at 350 ° C. for 10 minutes and at 400 ° C. for 10 minutes, a good relief structure was obtained. Further, the composition I was uniformly applied onto an aluminum plate without screen printing, and it was vacuumized at 80 ° C. for 100 minutes at 100 ° C. for 1 minute at 150 ° C.
0 minutes, 200 ° C for 10 minutes, 250 ° C for 10 minutes, 300 ° C
10 minutes, 350 ° C. for 10 minutes, and 400 ° C. for 10 minutes to produce a 50 μm polyimide film. The heating 5 wt% weight loss temperature was measured. The results are shown in Table 1. After leaving the composition I for 2 months at room temperature (15 ° C. to 30 ° C.), a polyimide film was prepared in the same manner. The evaluation results are shown in Table 1.
【0055】(実施例2に対する評価)ポリイミド前駆
体IIを使用したこと以外は実施例1と同様に評価を実施
した。評価結果を表1に示す。(Evaluation for Example 2) Evaluation was performed in the same manner as in Example 1 except that the polyimide precursor II was used. The evaluation results are shown in Table 1.
【0056】(実施例3にたいする評価)ポリイミド前
駆体IIを使用したこと以外は実施例1と同様に評価を実
施した。評価結果を表1に示す。
(比較例1)窒素雰囲気下の容器中で2,2′−ビス
(トリフルオロメチル)−4,4′−ジアミノビフェニ
ル(3.20g、10mmol)をジメチルアセトアミ
ド(36.9g)に溶解した後、ピロメリット酸二無水
物(1.09g、5mmol)および2,2′−ビス
(トリフルオロメチル)−4,4′−ジアミノビフェニ
ル酸二無水物2.22g(5mmol)を加え容器を氷
冷しながら5時間撹拌した。次に20℃まで上げてさら
に5時間攪拌しポリアミド酸組成物I(固形分15重量
%、)を得た。この組成物を2ヶ月間室温(15〜30
℃)に放置したところ粘度が低下して良好なポリイミド
を得ることができなかった。(Evaluation for Example 3) Evaluation was performed in the same manner as in Example 1 except that the polyimide precursor II was used. The evaluation results are shown in Table 1. Comparative Example 1 2,2′-bis (trifluoromethyl) -4,4′-diaminobiphenyl (3.20 g, 10 mmol) was dissolved in dimethylacetamide (36.9 g) in a container under a nitrogen atmosphere. , Pyromellitic dianhydride (1.09 g, 5 mmol) and 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl dianhydride 2.22 g (5 mmol) were added, and the container was ice-cooled. While stirring, the mixture was stirred for 5 hours. Next, the temperature was raised to 20 ° C. and the mixture was further stirred for 5 hours to obtain a polyamic acid composition I (solid content: 15% by weight). This composition is allowed to stand at room temperature (15-30
When left to stand at (° C.), the viscosity was lowered and a good polyimide could not be obtained.
【0057】[0057]
【表1】
表の結果からわかるように実施例1〜3は溶媒溶解性が
高く、また2ヶ月と長期室温保存してもポリイミドフィ
ルムが問題なく作製できる。比較例1は長期保存では実
用にたえない。また、実施例1、と2に見られるように
エステル部分の種類を変えて重合しても良好な物性を得
ることができる。実施例3のようにジクロリド化合物の
構造を変化ることも可能である。[Table 1] As can be seen from the results in the table, Examples 1 to 3 have high solvent solubility, and polyimide films can be produced without problems even when stored at room temperature for a long period of 2 months. Comparative Example 1 is not practical for long-term storage. Further, as shown in Examples 1 and 2, good physical properties can be obtained even if polymerization is performed by changing the kind of ester moiety. It is possible to change the structure of the dichloride compound as in Example 3.
【0058】[0058]
【発明の効果】本発明のポリイミド前駆体の製造方法に
使用する事により印刷等に好適なポリイミド前駆体を得
る事が可能である。EFFECT OF THE INVENTION By using the method for producing a polyimide precursor of the present invention, it is possible to obtain a polyimide precursor suitable for printing and the like.
フロントページの続き Fターム(参考) 4J043 PA01 PA19 PC075 QB21 QB23 QB24 QB26 QB33 RA08 RA31 RA34 RA35 SA06 TA11 TA12 TA21 TA22 TA25 TA26 TA31 TA32 TA47 UA11 UA13 UB01 UB03 UB05 UB06 UB12 UB22 UB29 UB30 XA01 XA11 XA13 XA16 XA17 XA19 XB11 XB12 XB13 XB16 XB19 YA05 YA07 ZA12 ZA21 ZA51 ZA52 ZB02 ZB21 ZB23 ZB25 ZB50Continued front page F-term (reference) 4J043 PA01 PA19 PC075 QB21 QB23 QB24 QB26 QB33 RA08 RA31 RA34 RA35 SA06 TA11 TA12 TA21 TA22 TA25 TA26 TA31 TA32 TA47 UA11 UA13 UB01 UB03 UB05 UB06 UB12 UB22 UB29 UB30 XA01 XA11 XA13 XA16 XA17 XA19 XB11 XB12 XB13 XB16 XB19 YA05 YA07 ZA12 ZA21 ZA51 ZA52 ZB02 ZB21 ZB23 ZB25 ZB50
Claims (11)
素数1以上の1価の有機基、R3はOHまたはClを示
す。)と(b)酸二無水物と(c)ジアミンまたはジシ
アナートを重合させ脱水閉環剤および/または触媒を添
加しアミド酸部分をイミド化することを特徴としたポリ
イミド前駆体の製造方法。(A) The following general formula (1): (Wherein R 1 is a tetravalent organic group, R 2 is a monovalent organic group having 1 or more carbon atoms, R 3 is OH or Cl), and (b) an acid dianhydride. c) A method for producing a polyimide precursor, which comprises polymerizing a diamine or dicyanate and adding a dehydration ring-closing agent and / or a catalyst to imidize an amic acid moiety.
にフッ素を含有する請求項1記載のポリイミド前駆体の
製造方法。2. The method for producing a polyimide precursor according to claim 1, wherein at least one of (a), (b) and (c) contains fluorine.
素、重水素、フッ素、パーフルオロアルキル基から選ば
れる少なくとも一種である)で表される請求項1〜2記
載のポリイミド前駆体の製造方法。3. A diamine has the following general formula (2): (Wherein R 4 may be the same or different and is at least one selected from hydrogen, deuterium, fluorine and perfluoroalkyl groups). Production method.
素、重水素、フッ素、パーフルオロアルキル基から選ば
れる少なくとも一種である)で表される請求項1〜3記
載のポリイミド前駆体の製造方法。4. An acid dianhydride is represented by the following general formula (3): (Wherein R 4 may be the same or different and is at least one selected from hydrogen, deuterium, fluorine and perfluoroalkyl groups). Production method.
の炭化水素基である請求項1〜4記載のポリイミド前駆
体の製造方法。5. R 2 in the general formula (1) has 1 to 6 carbon atoms.
5. The method for producing a polyimide precursor according to claim 1, wherein the polyimide precursor is a hydrocarbon group.
l)2とジアミンを反応させたうえで酸ニ無水物を加え
て重合させる請求項1〜5記載のポリイミド前駆体の製
造方法(R1は、4価の有機基、R2は炭素数1以上の1
価の有機基を示す。)。6. [R 2 OC (═O)] 2 —R 1 — (COC
l) 2 and a diamine are reacted, and then an acid dianhydride is added thereto for polymerization, wherein the method for producing a polyimide precursor (R 1 is a tetravalent organic group, R 2 is a carbon number 1). Above 1
Indicates a valent organic group. ).
l)2とアミン末端のイミドオリゴマーを重合させる請
求項1〜6記載のポリイミド前駆体の製造方法(R
1は、4価の有機基、R2は炭素数1以上の1価の有機基
を示す。)。7. [R 2 OC (═O)] 2 —R 1 — (COC
l) 2 and an amine-terminated imide oligomer are polymerized.
1 represents a tetravalent organic group, and R 2 represents a monovalent organic group having 1 or more carbon atoms. ).
H)2とアミン末端のイミドオリゴマーと縮合剤の存在
下で重合させる請求項1〜6記載のポリイミド前駆体の
製造方法(R1は、4価の有機基、R2は炭素数1以上の
1価の有機基を示す。)。8. [R 2 OC (═O)] 2 —R 1 — (COO
H) 2 is polymerized in the presence of an amine-terminated imide oligomer and a condensing agent (R 1 is a tetravalent organic group, R 2 is a C 1 or more carbon atom). Indicates a monovalent organic group.).
H)2とジアミンを縮合剤の存在下で反応させたうえで
酸ニ無水物を加えて重合させる請求項1〜5記載のポリ
イミド前駆体の製造方法(R1は、4価の有機基、R2は
炭素数1以上の1価の有機基を示す。)。9. [R 2 OC (═O)] 2 —R 1 — (COO
H) 2 and diamine are reacted in the presence of a condensing agent, and then an acid dianhydride is added to carry out polymerization, wherein R 1 is a tetravalent organic group, R 2 represents a monovalent organic group having 1 or more carbon atoms.).
H)2と酸二無水物とジシアナートを反応させることを
請求項1〜5記載のポリイミド前駆体の製造方法(R1
は、4価の有機基、R2は炭素数1以上の1価の有機基
を示す。)。10. [R 2 OC (═O)] 2 —R 1 — (COO
H) 2 is reacted with acid dianhydride and dicyanate. The method for producing a polyimide precursor according to claims 1 to 5 (R 1
Represents a tetravalent organic group, and R 2 represents a monovalent organic group having 1 or more carbon atoms. ).
酸と3級アミンである請求項1〜10記載のポリイミド
前駆体の製造方法。11. The method for producing a polyimide precursor according to claim 1, wherein the dehydration ring-closing agent and / or the catalyst are acetic anhydride and a tertiary amine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001360419A JP2003160665A (en) | 2001-11-27 | 2001-11-27 | Method of manufacturing polyimide precursor |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001360419A JP2003160665A (en) | 2001-11-27 | 2001-11-27 | Method of manufacturing polyimide precursor |
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| Publication Number | Publication Date |
|---|---|
| JP2003160665A true JP2003160665A (en) | 2003-06-03 |
Family
ID=19171229
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| Country | Link |
|---|---|
| JP (1) | JP2003160665A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112961349A (en) * | 2021-04-14 | 2021-06-15 | 吉林奥来德光电材料股份有限公司 | High-performance transparent polyimide, polyimide film and preparation method thereof |
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2001
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| CN112961349A (en) * | 2021-04-14 | 2021-06-15 | 吉林奥来德光电材料股份有限公司 | High-performance transparent polyimide, polyimide film and preparation method thereof |
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