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JP2003014569A - Package for pressure detector - Google Patents

Package for pressure detector

Info

Publication number
JP2003014569A
JP2003014569A JP2001195876A JP2001195876A JP2003014569A JP 2003014569 A JP2003014569 A JP 2003014569A JP 2001195876 A JP2001195876 A JP 2001195876A JP 2001195876 A JP2001195876 A JP 2001195876A JP 2003014569 A JP2003014569 A JP 2003014569A
Authority
JP
Japan
Prior art keywords
electrode
insulating plate
semiconductor element
insulating
capacitance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001195876A
Other languages
Japanese (ja)
Other versions
JP4794073B2 (en
Inventor
Koji Kinomura
浩司 木野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001195876A priority Critical patent/JP4794073B2/en
Publication of JP2003014569A publication Critical patent/JP2003014569A/en
Application granted granted Critical
Publication of JP4794073B2 publication Critical patent/JP4794073B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Measuring Fluid Pressure (AREA)

Abstract

(57)【要約】 【課題】 絶縁板の撓み量が大きく、小さな圧力の変化
も良好に検出することが可能な高感度でかつ小型の圧力
検出装置を提供すること。 【解決手段】 一方の主面に半導体素子3が搭載される
絶縁基体1と、この絶縁基体1に配設され、半導体素子
3の電極が電気的に接続される複数の配線導体5と、絶
縁基体1の他方の主面との間に略円板形状の密閉空間S
を形成するように可撓な状態で絶縁基体1に接合された
絶縁板2と、絶縁基体1の他方の主面に被着され、配線
導体5の一つ5aに電気的に接続された静電容量形成用
の第一電極7と、絶縁板2の内側主面に第一電極7と対
向するように被着され、配線導体5の他の一つ5bに電
気的に接続された静電容量形成用の第二電極8とを具備
する圧力検出装置用パッケージにおいて、絶縁板2に密
閉空間Sの外周に沿ってうねりを設けた。
(57) [Problem] To provide a high-sensitivity and small-sized pressure detecting device capable of detecting a small change in pressure with a large amount of deflection of an insulating plate. SOLUTION: An insulating base 1 on which a semiconductor element 3 is mounted on one main surface, a plurality of wiring conductors 5 provided on the insulating base 1 and electrically connected to electrodes of the semiconductor element 3, are provided. A substantially disk-shaped closed space S between the other main surface of the base 1
An insulating plate 2 joined to the insulating base 1 in a flexible state so as to form a wiring conductor 5, and a static conductive member 2 attached to the other main surface of the insulating base 1 and electrically connected to one of the wiring conductors 5 a. A first electrode 7 for forming a capacitance and an electrostatic capacitor attached to the inner main surface of the insulating plate 2 so as to face the first electrode 7 and electrically connected to the other one 5b of the wiring conductor 5 In a package for a pressure detecting device including a second electrode 8 for forming a capacitance, the insulating plate 2 is provided with undulations along the outer periphery of the closed space S.

Description

【発明の詳細な説明】 【0001】 【発明の属する技術分野】本発明は、圧力を検出するた
めの圧力検出装置に使用される圧力検出装置用パッケー
ジに関するものである。 【0002】 【従来の技術】従来、圧力を検出するための圧力検出装
置として静電容量型の圧力検出装置が知られている。こ
の静電容量型の圧力検出装置は、例えば図3に断面図で
示すように、セラミックス材料や樹脂材料から成る配線
基板21上に、静電容量型の感圧素子22と、パッケージ28
に収容された演算用の半導体素子29とを備えている。感
圧素子22は、例えばセラミックス材料等の電気絶縁材料
から成り、上面中央部に静電容量形成用の一方の電極23
が被着された凹部を有する絶縁基体24と、この絶縁基体
24の上面に絶縁基体24との間に密閉空間を形成するよう
にして可撓な状態で接合され、下面に静電容量形成用の
他方の電極25が被着された絶縁板26と、各静電容量形成
用の電極23・25をそれぞれ外部に電気的に接続するため
の外部リード端子27とから構成されており、外部の圧力
に応じて絶縁板26が撓むことにより各静電容量形成用の
電極23・25間に形成される静電容量が変化する。そし
て、この静電容量の変化を演算用の半導体素子29により
演算処理することにより外部の圧力を検出することがで
きる。 【0003】 【発明が解決しようとする課題】しかしながら、この従
来の圧力検出装置によると、感圧素子22と半導体素子29
とを配線基板21上に個別に実装していることから、圧力
検出装置が大型化してしまうとともに圧力検出用の電極
23・25と半導体素子29との間の配線が長いものとなり、
この長い配線間に不要な静電容量が形成されるため感度
が低いという問題点を有していた。 【0004】そこで、本願出願人は、先に特願2000-178
618において、一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、この絶縁基体の表面および内
部に配設されており、半導体素子の各電極が電気的に接
続される複数の配線導体と、絶縁基体の他方の主面の中
央部に被着されており、配線導体の一つに電気的に接続
された静電容量形成用の第一電極と、絶縁基体の他方の
主面に、この主面の中央部との間に密閉空間を形成する
ように可撓な状態で接合された絶縁板と、この絶縁板の
内側主面に第一電極に対向して被着されており、配線導
体の他の一つに電気的に接続された静電容量形成用の第
二電極とを具備する圧力検出装置用パッケージを提案し
た。この圧力検出装置用パッケージによると、一方の主
面に半導体素子が搭載される搭載部を有する絶縁基体の
他方の主面に静電容量形成用の第一電極を設けるととも
に、この第一電極に対向する静電容量形成用の第二電極
を内側面に有する絶縁板を、絶縁基体の他方の主面との
間に密閉空間を形成するようにして可撓な状態で接合さ
せたことから、半導体素子を収容するパッケージに感圧
素子が一体に形成され、その結果、圧力検出装置を小型
とすることができるとともに圧力検出用の電極と半導体
素子とを接続する配線を短いものとして、これらの配線
間に発生する不要な静電容量を小さなものとすることが
できる。 【0005】しかしながら、この特願2000-178618で提
案した圧力検出装置用パッケージによると、絶縁板は可
撓性の低いセラミックス材料から成り、かつ平板である
ことから撓み量が少なく、そのため小さな圧力の変化を
検出しにくいという問題点を有していた。 【0006】本発明は、かかる上述の問題点に鑑み完成
されたものであり、その目的は、絶縁板の撓み量が大き
く、小さな圧力の変化も良好に検出することが可能な高
感度でかつ小型の圧力検出装置を提供することにある。 【0007】 【課題を解決するための手段】本発明の圧力検出装置用
パッケージは、一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、この絶縁基体の表面および内
部に配設されており、半導体素子の各電極が電気的に接
続される複数の配線導体と、絶縁基体の他方の主面との
間に略円板形状の密閉空間を形成するように可撓な状態
で絶縁基体に接合された絶縁板と、絶縁基体と絶縁板と
の間の密閉空間内における絶縁基体の他方の主面に被着
されており、配線導体の一つに電気的に接続された静電
容量形成用の第一電極と、絶縁板の内側主面に第一電極
と対向するように被着されており、配線導体の他の一つ
に電気的に接続された静電容量形成用の第二電極とを具
備する圧力検出装置用パッケージであって、絶縁板は密
閉空間の外周に沿ってうねりを有していることを特徴と
するものである。 【0008】本発明の圧力検出装置用パッケージによれ
ば、絶縁板は密閉空間の外周に沿ってうねりを有してい
ることから、このうねりによってその撓み量が大きくな
る。 【0009】 【発明の実施の形態】次に、本発明を添付の図面を基に
詳細に説明する。図1は、本発明の圧力検出装置用パッ
ケージの実施の形態の一例を示す断面図であり、図中、
1は絶縁基体、2は絶縁板、3は半導体素子である。 【0010】絶縁基体1は、下面中央部に半導体素子3
を収容するための凹部1aを有するとともに上面中央部
に後述する絶縁板2との間に略円板状の密閉空間Sを形
成するための略円形の凹部1cを有する酸化アルミニウ
ム質焼結体や窒化アルミニウム質焼結体・ムライト質焼
結体・ガラス−セラミックス等のセラミックス材料から
成る積層体であり、例えば酸化アルミニウム質焼結体か
ら成る場合であれば、酸化アルミニウム・酸化珪素・酸
化マグネシウム・酸化カルシウム等のセラミック原料粉
末に適当な有機バインダ・溶剤・可塑剤・分散剤を添加
混合して泥漿状となすとともにこれを従来周知のドクタ
ブレード法を採用してシート状に成形することにより複
数枚のセラミックグリーンシートを得、しかる後、これ
らのセラミックグリーンシートに適当な打ち抜き加工・
積層加工・切断加工を施すことにより絶縁基体1用の生
セラミック成形体を得るとともにこの生セラミック成形
体を後述する絶縁板2用のセラミックグリーンシートと
ともに約1600℃の温度で焼成することにより製作され
る。 【0011】絶縁基体1は、その下面中央部に形成され
た凹部1aの底面中央部が半導体素子3が搭載される搭
載部1bとなっており、この搭載部1bに半導体素子3
を搭載するとともに凹部1a内に例えばエポキシ樹脂等
の樹脂製封止材4を充填することにより半導体素子3が
封止される。なお、この例では半導体素子3は樹脂製封
止材4を凹部1a内に充填することにより封止される
が、半導体素子3は絶縁基体1の下面に金属やセラミッ
クスから成る蓋体を凹部1aを塞ぐように接合させるこ
とにより封止されてもよい。 【0012】また、搭載部1bには半導体素子3の各電
極に接続される複数の配線導体5が導出しており、この
配線導体5と半導体素子3の各電極をボンディングワイ
ヤ6等の電気的接続手段を介して接続することにより半
導体素子3の各電極と各メタライズ配線導体5とが電気
的に接続される。なお、この例では、半導体素子3の電
極と配線導体5とはボンディングワイヤ6を介して接続
されるが、半導体素子3の電極と配線導体5とは半田バ
ンプ等の他の種類の電気的接続手段により接続されても
よい。 【0013】配線導体5は、半導体素子3の各電極を外
部電気回路および後述する第一電極7・第二電極8に電
気的に接続するための導電路として機能し、その一部は
絶縁基体1の外周下面に導出し、別の一部は絶縁基体1
の上面に導出して第一電極7や第二電極8に電気的に接
続されている。そして、半導体素子3の各電極をこれら
の配線導体5に電気的接続手段を介して電気的に接続す
るとともに半導体素子3を樹脂製封止材4等で封止した
後、配線導体5の絶縁基体1外周下面に導出した部位を
外部電気回路基板の配線導体に半田等の電気的接続手段
を介して接続することにより、内部に収容する半導体素
子3が外部電気回路に電気的に接続されることとなる。 【0014】このような配線導体5は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤等を添加混合して得たメタライズペー
ストを従来周知のスクリーン印刷法を採用して絶縁基体
1用のセラミックグリーンシートに所定のパターンに印
刷塗布し、これを絶縁基体1用の生セラミック成形体と
ともに焼成することによって絶縁基体1の内部および表
面に所定のパターンに形成される。なお、配線導体5の
露出表面には、配線導体5が酸化腐食するのを防止する
とともに配線導体5と半田等の電気的接続手段との接続
を良好なものとするために、通常であれば、厚みが1〜
10μm程度のニッケルめっき層と厚みが0.1〜3μm程
度の金めっき層とが順次被着されている。 【0015】また、絶縁基体1の上面中央部に形成され
た凹部1c底面には静電容量形成用の第一電極7が被着
されている。この第一電極7は、後述する絶縁板2の第
二電極8とともに感圧素子用の静電容量を形成するため
のものである。そして、この第一電極7には配線導体5
の一つ5aが接続されており、それによりこの配線導体
5aに半導体素子3の電極をボンディングワイヤ6等の
電気的接続手段を介して接続すると半導体素子3の電極
と第一電極7とが電気的に接続されるようになってい
る。 【0016】このような第一電極7は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁基体1
用のセラミックグリーンシートに印刷塗布し、これを絶
縁基体1用の生セラミック成形体とともに焼成すること
によって絶縁基体1の上面中央部に所定のパターンに形
成される。 【0017】また、絶縁基体1の上面には凹部1cを覆
う絶縁板2が絶縁基板1の上面との間に略円板状の密閉
空間Sを形成するようにして可撓な状態で絶縁基体1に
焼結一体化されて接合されている。絶縁板2は、酸化ア
ルミニウム質焼結体や窒化アルミニウム質焼結体・ムラ
イト質焼結体・ガラス−セラミックス等のセラミックス
材料から成る厚みが0.01〜5mmの略四角または略八角
あるいは円形等の板状であり、外部の圧力に応じて撓む
圧力検出用のダイアフラムとして機能する。 【0018】このような絶縁板2は、例えば酸化アルミ
ニウム質焼結体から成る場合であれば、酸化アルミニウ
ム・酸化珪素・酸化マグネシウム・酸化カルシウム等の
セラミック原料粉末に適当な有機バインダ・溶剤・可塑
剤・分散剤を添加混合して泥漿状となすとともにこれを
従来周知のドクタブレード法を採用してシート状に成形
することにより絶縁板2用のセラミックグリーンシート
を得、しかる後、このセラミックグリーンシートに適当
な打ち抜き加工や切断加工を施すとともに絶縁基体1用
の生セラミック成形体上に積層し、これを絶縁基体1用
の生セラミック成形体とともに約1600℃の温度で焼成
し、絶縁基体1と焼結一体化することにより製作され
る。 【0019】また、絶縁板2の下面には静電容量形成用
の略円形の第二電極8が第一電極7と対向するようにし
て被着されている。この第二電極8は、前述の第一電極
7とともに感圧素子用の静電容量を形成するための電極
として機能する。そして、第二電極8には配線導体5の
他の一つ5bが接続されており、それにより配線導体5
bに半導体素子3の電極をボンディングワイヤ6等の電
気的接続手段を介して接続すると半導体素子3の電極と
第二電極8とが電気的に接続されるようになっている。 【0020】このとき、第一電極7と第二電極8とは、
絶縁基体1と絶縁板2との間に形成された密閉空間Sを
挟んで対向しており、これらの間には、第一電極7や第
二電極8の面積および第一電極7と第二電極8との間隔
に応じて所定の静電容量が形成される。そして、絶縁板
2の上面に外部の圧力が印加されると、その圧力に応じ
て絶縁板2が絶縁基体1側に撓んで第一電極7と第二電
極8との間隔が変わり、それにより第一電極7と第二電
極8との間の静電容量が変化するので、外部の圧力の変
化を静電容量の変化として感知する感圧素子として機能
する。そして、この静電容量の変化を凹部1a内に収容
した半導体素子3に配線導体5a・5bを介して伝達
し、これを半導体素子3で演算処理することによって外
部の圧力の大きさを知ることができる。 【0021】なお、第二電極8は、タングステンやモリ
ブデン・銅・銀等の金属粉末メタライズから成り、タン
グステン等の金属粉末に適当な有機バインダ・溶剤・可
塑剤・分散剤を添加混合して得たメタライズペーストを
従来周知のスクリーン印刷法を採用して絶縁板2用のセ
ラミックグリーンシートに印刷塗布し、これを絶縁板2
用のセラミックグリーンシートとともに焼成することに
よって絶縁板2の下面に第一電極7と対向する所定の形
状に形成される。 【0022】またさらに、絶縁板2はその上面外周部に
内周が略円形で密閉空間Sの外周部に対応する位置まで
延在するうねり形成用のダミーのメタライズ層9が被着
されており、それにより密閉空間Sの外周にそってその
中央部が凹み外周部が盛り上がるようなうねりが形成さ
れている。ダミーのメタライズ層9は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁板2用
のセラミックグリーンシートに印刷塗布し、これを絶縁
板2用のセラミックグリーンシートとともに焼成するこ
とによって絶縁板2の上面外周部に被着される。そし
て、ダミーのメタライズ層9用のメタライズペーストの
焼成収縮率を絶縁板2用のセラミックグリーンシートの
焼成収縮率より小さいものとしておくことにより両者の
焼成収縮率の差によって絶縁板2の中央部が凹み外周部
が盛り上がるようなうねりが密閉空間Sの外周に沿って
形成される。 【0023】本発明においては、このように絶縁板2に
密閉空間Sの外周に沿ってうねりが形成されていること
が重要である。本発明の圧力検出装置用パッケージによ
れば、絶縁板2に密閉空間Sの外周に沿ってうねりが形
成されていることから、このうねりによって絶縁板2の
撓み量が大きなものとなる。したがって、絶縁板2に圧
力が印加されるとその圧力に応じて絶縁板2が大きく撓
んで小さな圧力の変化を感度よく検出することができ
る。なお、このようなうねりは、その高さが50μm未満
では、絶縁板2を大きく撓ますことが困難となる。した
がって、うねりの高さは50μm以上であることが好まし
い。 【0024】なお、うねりの高さは、ダミーのメタライ
ズ層9の形状や厚み、ダミーのメタライズ層9用のメタ
ライズペーストの焼成収縮率と絶縁板2用のセラミック
グリーンシートの焼成収縮率との差を変えることにより
制御可能である。例えば、絶縁板2が焼成収縮率15%の
セラミックグリーンシートを焼成した大きさ10mm角で
厚み0.3mmの酸化アルミニウム質焼結体から成り、密
閉空間Sの直径が8mmの場合、絶縁板2の上面に中央
部に直径が5mmで厚みが15〜20μmのタングステンメ
タライズから成るダミーのメタライズ層9を、このダミ
ーのメタライズ層9用のメタライズペーストの焼成収縮
率を絶縁板2用のセラミックグリーンシートの焼成収縮
率よりも0.5〜1.0%程度小さいものとして形成すれば、
中央部が凹み外周部が盛り上がるような高さが80〜120
μm程度のうねりを形成することができる。この場合、
ダミーのメタライズ層用のメタライズペーストの焼成収
縮率と絶縁板2用のセラミックグリーンシートの焼成収
縮率との差が大きい程、うねりの高さは大きくなり、ま
たダミーのメタライズ層9の厚みが厚い程、うねりの高
さは大きくなる。 【0025】このように、本発明の圧力検出装置用パッ
ケージによれば、一方の主面に半導体素子3が搭載され
る絶縁基体1の他方の主面に静電容量形成用の第一電極
7を設けるとともに、この第一電極7に対向する静電容
量形成用の第二電極8を内側面に有する絶縁板2を絶縁
基体1の他方の主面との間に密閉空間Sを形成するよう
に可撓な状態で絶縁基体1に接合させたことから、半導
体素子3を収容する容器と感圧素子とが一体となり、そ
の結果、圧力検出装置を小型化することができる。ま
た、静電容量形成用の第一電極7および第二電極8を、
絶縁基体1に設けた配線導体5a・5bを介して半導体
素子3に接続することから、第一電極7および第二電極
8を短い距離で半導体素子3に接続することができ、そ
の結果、これらの配線導体5a・5b間に発生する不要
な静電容量を小さなものとして感度の高い圧力検出装置
を提供することができる。 【0026】かくして、上述の圧力検出装置用パッケー
ジによれば、搭載部1bに半導体素子3を搭載するとと
もに半導体素子3の各電極と配線導体5とを電気的に接
続し、しかる後、半導体素子3を封止することによって
小型でかつ感度が高い圧力検出装置となる。 【0027】なお、本発明は、上述の実施の形態の一例
に限定されるものではなく、本発明の要旨を逸脱しない
範囲であれば種々の変更は可能であり、例えば上述の実
施の形態の一例では、絶縁板2の中央部が凹み外周部が
盛り上がるようなうねりが形成されていたが、図2に断
面図で示すように、絶縁板2の中央部が盛り上がり外周
部が凹むようなうねりが形成されていても良い。この場
合、ダミーのメタライズ層9用のメタライズペーストの
焼成収縮率を絶縁板2用のセラミックグリーンcとの焼
成収縮率よりも大きくしておけばよい。また、上述の実
施の形態例では絶縁板2の上面外周部にうねり形成用の
ダミーのメタライズ層9を設けることによって絶縁板2
にうねりを形成したが、例えば絶縁板2用のセラミック
グリーンシートにプレス加工を施すことによりうねりを
形成しても良い。さらに、上述の実施形態の一例では、
絶縁基体1と絶縁板2とを焼結一体化させることにより
接合したが、絶縁基体1と絶縁板2とはろう付けにより
接合してもよい。 【0028】 【発明の効果】以上、説明したように、本発明の圧力検
出装置用パッケージによれば、一方の主面に半導体素子
が搭載される絶縁基体の他方の主面に静電容量形成用の
第一電極を設けるとともに、この第一電極に対向する静
電容量形成用の第二電極を有する絶縁板を絶縁基体の他
方の主面との間に密閉空間を形成するように可撓な状態
で接合したことから、半導体素子を収容する容器と感圧
素子とが一体となり、その結果、圧力検出装置を小型と
することができるとともに圧力検出用の電極と半導体素
子とを接続する配線を短いものとして、これらの配線間
に発生する不要な静電容量を小さなものとすることがで
きる。さらに、絶縁板に密閉空間の外周に沿ってうねり
が形成されていることから、このうねりによって絶縁板
が大きく撓みやすい。したがって、小さな圧力の変化を
良好に検出することが可能な圧力検出装置を提供するこ
とができる。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pressure detecting device package used for a pressure detecting device for detecting pressure. 2. Description of the Related Art Conventionally, a capacitance type pressure detecting device has been known as a pressure detecting device for detecting pressure. As shown in a sectional view of FIG. 3, for example, a capacitance type pressure sensing device 22 and a package 28 are provided on a wiring board 21 made of a ceramic material or a resin material.
And a semiconductor element 29 for arithmetic operation housed in the computer. The pressure-sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material.
An insulating substrate 24 having a concave portion to which
An insulating plate 26, which is joined in a flexible state on the upper surface of the insulating substrate 24 so as to form a sealed space between the insulating substrate 24 and the other electrode 25 for forming a capacitance on the lower surface, Each of the electrodes 23 and 25 for forming a capacitance includes an external lead terminal 27 for electrically connecting the electrode to the outside, and each of the capacitances is formed by bending the insulating plate 26 according to an external pressure. The capacitance formed between the forming electrodes 23 and 25 changes. An external pressure can be detected by subjecting this change in capacitance to arithmetic processing by the semiconductor element 29 for arithmetic operation. [0003] However, according to this conventional pressure detecting device, the pressure-sensitive element 22 and the semiconductor element 29 are not provided.
Are individually mounted on the wiring board 21, which increases the size of the pressure detection device and the pressure detection electrode.
The wiring between 23 and 25 and the semiconductor element 29 becomes longer,
There is a problem that the sensitivity is low because an unnecessary capacitance is formed between the long wires. Accordingly, the applicant of the present application has previously filed Japanese Patent Application No. 2000-178.
618, an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface; and a plurality of insulating bases disposed on and inside the insulating base, each electrode of the semiconductor element being electrically connected. A wiring conductor, a first electrode for forming a capacitance, which is attached to a central portion of the other main surface of the insulating base, and is electrically connected to one of the wiring conductors; An insulating plate joined in a flexible state so as to form a sealed space with the central portion of the main surface, and an inner main surface of the insulating plate is attached to the first main surface so as to face the first electrode. Thus, a pressure detection device package including a second electrode for forming a capacitance electrically connected to another one of the wiring conductors has been proposed. According to this pressure detecting device package, a first electrode for forming a capacitance is provided on the other main surface of the insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and the first electrode is provided on the first electrode. Since the insulating plate having the opposing second electrode for capacitance formation on the inner surface thereof was joined in a flexible state so as to form a sealed space between the other main surface of the insulating base, The pressure-sensitive element is formed integrally with the package containing the semiconductor element. As a result, the pressure detection device can be made small and the wiring connecting the electrode for pressure detection and the semiconductor element is shortened. Unnecessary capacitance generated between the wirings can be reduced. However, according to the package for a pressure detecting device proposed in Japanese Patent Application No. 2000-178618, the insulating plate is made of a ceramic material having low flexibility and has a small amount of bending because it is a flat plate. There was a problem that it was difficult to detect the change. The present invention has been completed in view of the above-described problems, and has as its object to provide a high-sensitivity and high-sensitivity in which the amount of deflection of the insulating plate is large and a small change in pressure can be detected well. An object of the present invention is to provide a small-sized pressure detecting device. A package for a pressure detecting device according to the present invention includes an insulating base having a mounting portion on one side of which a semiconductor element is mounted, and a package disposed on the surface and inside of the insulating base. A plurality of wiring conductors to which each electrode of the semiconductor element is electrically connected, and a flexible state so as to form a substantially disk-shaped closed space between the other main surface of the insulating base. An insulating plate joined to the insulating base at the other end, and is attached to the other main surface of the insulating base in a closed space between the insulating base and the insulating plate, and is electrically connected to one of the wiring conductors. A first electrode for forming a capacitance, and a capacitance formation that is attached to an inner main surface of the insulating plate so as to face the first electrode and is electrically connected to another one of the wiring conductors. And a second electrode for pressure detection, comprising: It is characterized by having undulations along the outer periphery between them. According to the pressure detecting device package of the present invention, since the insulating plate has undulation along the outer periphery of the closed space, the undulation increases the amount of bending. Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view illustrating an example of an embodiment of a package for a pressure detection device according to the present invention.
1 is an insulating base, 2 is an insulating plate, and 3 is a semiconductor element. An insulating base 1 has a semiconductor element 3
Aluminum oxide-based sintered body having a concave portion 1a for accommodating therein and having a substantially circular concave portion 1c for forming a substantially disk-shaped closed space S between the upper surface center portion and an insulating plate 2 described later, A laminate made of a ceramic material such as an aluminum nitride-based sintered body, a mullite-based sintered body, or a glass-ceramic. For example, in the case of an aluminum oxide-based sintered body, aluminum oxide, silicon oxide, magnesium oxide, A ceramic raw material powder such as calcium oxide is mixed with an appropriate organic binder, a solvent, a plasticizer, and a dispersant to form a slurry, which is formed into a sheet by using a conventionally known doctor blade method. The ceramic green sheets are obtained, and then these ceramic green sheets are appropriately punched and processed.
The green ceramic molded body for the insulating base 1 is obtained by performing lamination processing and cutting processing, and the green ceramic molded body is manufactured by firing the green ceramic molded body together with a ceramic green sheet for the insulating plate 2 described later at a temperature of about 1600 ° C. You. The insulating substrate 1 has a mounting portion 1b on which the semiconductor element 3 is mounted at the center of the bottom surface of the concave portion 1a formed at the center of the lower surface thereof.
The semiconductor element 3 is encapsulated by mounting a resin sealing material 4 such as an epoxy resin in the recess 1a. In this example, the semiconductor element 3 is sealed by filling a resin sealing material 4 into the recess 1a. However, the semiconductor element 3 is provided with a lid made of metal or ceramic on the lower surface of the insulating base 1 in the recess 1a. May be sealed by joining them so as to close them. A plurality of wiring conductors 5 connected to the respective electrodes of the semiconductor element 3 are led out to the mounting portion 1b, and the wiring conductor 5 and the respective electrodes of the semiconductor element 3 are electrically connected to each other by a bonding wire 6 or the like. By connecting via the connection means, each electrode of the semiconductor element 3 and each metallized wiring conductor 5 are electrically connected. In this example, the electrodes of the semiconductor element 3 and the wiring conductors 5 are connected via the bonding wires 6, but the electrodes of the semiconductor element 3 and the wiring conductors 5 are connected by another type of electrical connection such as a solder bump. They may be connected by means. The wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to an external electric circuit and a first electrode 7 and a second electrode 8, which will be described later. 1, and another part is an insulating base 1
And is electrically connected to the first electrode 7 and the second electrode 8. The electrodes of the semiconductor element 3 are electrically connected to these wiring conductors 5 via electrical connection means, and the semiconductor element 3 is sealed with a resin sealing material 4 or the like. The semiconductor element 3 housed inside is electrically connected to the external electric circuit by connecting the portion led out to the lower surface of the outer periphery of the base 1 to the wiring conductor of the external electric circuit board via an electric connection means such as solder. It will be. The wiring conductor 5 is made of a metal powder of tungsten, molybdenum, copper, silver or the like.
A metallized paste obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, dispersant, etc. to metal powder such as tungsten is applied to a ceramic green sheet for the insulating substrate 1 by using a conventionally known screen printing method. A predetermined pattern is formed on the inside and on the surface of the insulating substrate 1 by printing and applying the pattern and firing this together with the green ceramic molded body for the insulating substrate 1. In addition, on the exposed surface of the wiring conductor 5, in order to prevent the wiring conductor 5 from being oxidized and corroded and to make the connection between the wiring conductor 5 and an electrical connection means such as solder good, , The thickness is 1
A nickel plating layer having a thickness of about 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially applied. A first electrode 7 for forming a capacitance is attached to the bottom of the concave portion 1c formed at the center of the upper surface of the insulating base 1. The first electrode 7 is to form a capacitance for a pressure-sensitive element together with a second electrode 8 of the insulating plate 2 described later. The first electrode 7 has a wiring conductor 5
When the electrode of the semiconductor element 3 is connected to the wiring conductor 5a via an electrical connection means such as a bonding wire 6, the electrode of the semiconductor element 3 and the first electrode 7 are electrically connected. It is designed to be connected. The first electrode 7 is made of a metal powder of tungsten, molybdenum, copper, silver or the like.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed with an insulating substrate 1 by using a conventionally known screen printing method.
A ceramic green sheet for printing is applied and baked together with a green ceramic molded body for the insulating substrate 1 to form a predetermined pattern at the center of the upper surface of the insulating substrate 1. On the upper surface of the insulating substrate 1, an insulating plate 2 covering the recess 1c forms a substantially disk-shaped closed space S with the upper surface of the insulating substrate 1. 1 and joined together. The insulating plate 2 is made of a ceramic material such as an aluminum oxide-based sintered body, an aluminum nitride-based sintered body, a mullite-based sintered body, or a glass-ceramic, and has a thickness of about 0.01 to 5 mm, and has a thickness of about 0.01 to 5 mm. And functions as a pressure detecting diaphragm that bends in response to external pressure. When the insulating plate 2 is made of, for example, an aluminum oxide sintered body, an organic binder, a solvent, and a plastic suitable for a ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. A ceramic green sheet for the insulating plate 2 is obtained by adding and mixing an agent and a dispersant to form a slurry and forming the slurry into a sheet by employing a conventionally known doctor blade method. The sheet is subjected to an appropriate punching or cutting process and laminated on a green ceramic molded body for the insulating substrate 1, which is fired together with the green ceramic molded body for the insulating substrate 1 at a temperature of about 1600 ° C. It is manufactured by sintering and integration. A substantially circular second electrode 8 for forming a capacitance is attached to the lower surface of the insulating plate 2 so as to face the first electrode 7. The second electrode 8 functions as an electrode for forming a capacitance for a pressure-sensitive element together with the first electrode 7 described above. The other one 5b of the wiring conductor 5 is connected to the second electrode 8 so that the wiring conductor 5
When the electrode of the semiconductor element 3 is connected to the electrode b through an electrical connection means such as a bonding wire 6, the electrode of the semiconductor element 3 and the second electrode 8 are electrically connected. At this time, the first electrode 7 and the second electrode 8
It faces each other across a closed space S formed between the insulating base 1 and the insulating plate 2, and between them, the area of the first electrode 7 and the second electrode 8, and the first electrode 7 and the second A predetermined capacitance is formed according to the distance from the electrode 8. When an external pressure is applied to the upper surface of the insulating plate 2, the insulating plate 2 bends toward the insulating base 1 according to the applied pressure, and the distance between the first electrode 7 and the second electrode 8 changes. Since the capacitance between the first electrode 7 and the second electrode 8 changes, it functions as a pressure-sensitive element that detects a change in external pressure as a change in capacitance. Then, the change in the capacitance is transmitted to the semiconductor element 3 accommodated in the concave portion 1a via the wiring conductors 5a and 5b, and the magnitude of the external pressure is obtained by performing an arithmetic processing on the semiconductor element 3. Can be. The second electrode 8 is made of metallized metal powder such as tungsten, molybdenum, copper or silver, and is obtained by adding a suitable organic binder, solvent, plasticizer or dispersant to metal powder such as tungsten. The metallized paste is printed and applied to the ceramic green sheet for the insulating plate 2 by using a conventionally known screen printing method, and this is applied to the insulating plate 2.
By firing together with the ceramic green sheet for use, a predetermined shape facing the first electrode 7 is formed on the lower surface of the insulating plate 2. Furthermore, a dummy metallization layer 9 for undulation is attached to the outer periphery of the upper surface of the insulating plate 2 and has a substantially circular inner periphery and extends to a position corresponding to the outer periphery of the closed space S. Thus, a swell is formed along the outer periphery of the closed space S such that the central portion thereof is recessed and the outer peripheral portion rises. The dummy metallized layer 9 is made of metal powder metallized tungsten, molybdenum, copper, silver, etc.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed by printing onto a ceramic green sheet for the insulating plate 2 using a conventionally known screen printing method. This is fired together with the ceramic green sheet for the insulating plate 2 to be attached to the outer peripheral portion of the upper surface of the insulating plate 2. By setting the firing shrinkage of the metallized paste for the dummy metallization layer 9 to be smaller than the firing shrinkage of the ceramic green sheet for the insulating plate 2, the difference in firing shrinkage between the two causes the center of the insulating plate 2. A swell is formed along the outer periphery of the closed space S such that the outer periphery of the dent rises. In the present invention, it is important that the swell is formed in the insulating plate 2 along the outer periphery of the closed space S. According to the pressure detecting device package of the present invention, since the undulation is formed along the outer periphery of the closed space S in the insulating plate 2, the amount of bending of the insulating plate 2 is increased by the undulation. Therefore, when pressure is applied to the insulating plate 2, the insulating plate 2 is largely bent according to the pressure, and a small change in pressure can be detected with high sensitivity. If the height of the undulation is less than 50 μm, it is difficult to greatly bend the insulating plate 2. Therefore, the height of the undulation is preferably 50 μm or more. The height of the undulation is determined by the difference between the shape and thickness of the dummy metallized layer 9 and the firing shrinkage of the metallized paste for the dummy metallized layer 9 and the firing shrinkage of the ceramic green sheet for the insulating plate 2. Can be controlled by changing. For example, when the insulating plate 2 is made of a 10 mm square, 0.3 mm thick aluminum oxide sintered body obtained by firing a ceramic green sheet having a firing shrinkage of 15%, and the diameter of the closed space S is 8 mm, the insulating plate 2 A dummy metallization layer 9 made of tungsten metallization having a diameter of 5 mm and a thickness of 15 to 20 μm is formed at the center on the upper surface, and the firing shrinkage rate of the metallization paste for the dummy metallization layer 9 is determined by using the ceramic green sheet If it is formed about 0.5 to 1.0% smaller than the firing shrinkage,
The height is 80 to 120 so that the center part is concave and the outer peripheral part rises
An undulation of about μm can be formed. in this case,
The greater the difference between the firing shrinkage of the metallization paste for the dummy metallization layer and the firing shrinkage of the ceramic green sheet for the insulating plate 2, the greater the undulation and the thicker the metallization layer 9 of the dummy. The higher the swell, the greater the swell. As described above, according to the pressure detecting device package of the present invention, the first electrode 7 for forming a capacitance is formed on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on one main surface. And an insulating plate 2 having a second electrode 8 for forming a capacitance facing the first electrode 7 on the inner surface is formed so as to form a closed space S between the insulating plate 2 and the other main surface of the insulating base 1. Since the pressure sensitive element is joined to the insulating base 1 in a flexible state, the container for accommodating the semiconductor element 3 and the pressure sensitive element are integrated, and as a result, the pressure detecting device can be downsized. Further, the first electrode 7 and the second electrode 8 for forming the capacitance are
Since the semiconductor element 3 is connected to the semiconductor element 3 via the wiring conductors 5a and 5b provided on the insulating base 1, the first electrode 7 and the second electrode 8 can be connected to the semiconductor element 3 over a short distance. The unnecessary capacitance generated between the wiring conductors 5a and 5b can be reduced to provide a highly sensitive pressure detecting device. Thus, according to the above-described package for a pressure detecting device, the semiconductor element 3 is mounted on the mounting portion 1b, and each electrode of the semiconductor element 3 and the wiring conductor 5 are electrically connected. By sealing 3, a pressure detection device that is small and has high sensitivity is obtained. It should be noted that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the present invention. In one example, the undulation was formed such that the central portion of the insulating plate 2 was concave and the outer peripheral portion was raised. However, as shown in the cross-sectional view of FIG. 2, the undulation was such that the central portion of the insulating plate 2 was raised and the outer peripheral portion was concave. May be formed. In this case, the firing shrinkage of the metallized paste for the dummy metallization layer 9 may be set to be larger than the firing shrinkage of the ceramic green c for the insulating plate 2. In the above-described embodiment, the dummy metallized layer 9 for undulation is provided on the outer peripheral portion of the upper surface of the insulating plate 2 so that the insulating plate 2
Although the undulation is formed, the undulation may be formed by, for example, pressing a ceramic green sheet for the insulating plate 2. Further, in an example of the above-described embodiment,
Although the insulating base 1 and the insulating plate 2 are joined by sintering and integration, the insulating base 1 and the insulating plate 2 may be joined by brazing. As described above, according to the pressure detecting device package of the present invention, the capacitance is formed on the other main surface of the insulating base on which the semiconductor element is mounted on one main surface. And an insulating plate having a capacitance-forming second electrode opposed to the first electrode is formed so as to form a closed space between the insulating plate and the other main surface of the insulating base. And the pressure-sensitive element are integrated with the container for accommodating the semiconductor element. As a result, the pressure detection device can be reduced in size and the wiring for connecting the pressure detection electrode and the semiconductor element. Can be reduced, and unnecessary capacitance generated between these wirings can be reduced. Further, since the undulation is formed along the outer periphery of the closed space in the insulating plate, the undulation tends to greatly deflect the insulating plate. Therefore, it is possible to provide a pressure detection device capable of detecting a small change in pressure satisfactorily.

【図面の簡単な説明】 【図1】本発明の圧力検出装置用パッケージの実施の形
態の一例を示す断面図である。 【図2】本発明の圧力検出装置用パッケージの実施の形
態の他の例を示す断面図である。 【図3】従来の圧力検出装置を示す断面図である。 【符号の説明】 1・・・・・絶縁基体 1b・・・・搭載部 2・・・・・絶縁板 3・・・・・半導体素子 5・・・・・配線導体 7・・・・・第一電極 8・・・・・第二電極 9・・・・・ダミーのメタライズ層 S・・・・・密閉空間
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing an example of an embodiment of a package for a pressure detecting device according to the present invention. FIG. 2 is a cross-sectional view showing another example of the embodiment of the pressure detection device package according to the present invention. FIG. 3 is a sectional view showing a conventional pressure detecting device. [Description of Signs] 1 ... Insulating base 1b ... Mounting section 2 ... Insulating plate 3 ... Semiconductor element 5 ... Wiring conductor 7 ... First electrode 8 Second electrode 9 Dummy metallized layer S Sealed space

Claims (1)

【特許請求の範囲】 【請求項1】 一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、該絶縁基体の表面および内部
に配設されており、前記半導体素子の各電極が電気的に
接続される複数の配線導体と、前記絶縁基体の他方の主
面との間に略円板形状の密閉空間を形成するように可撓
な状態で前記絶縁基体に接合された絶縁板と、前記密閉
空間内の前記他方の主面に被着されており、前記配線導
体の一つに電気的に接続された静電容量形成用の第一電
極と、前記絶縁板の内側主面に前記第一電極と対向する
ように被着されており、前記配線導体の他の一つに電気
的に接続された静電容量形成用の第二電極とを具備する
圧力検出装置用パッケージであって、前記絶縁板は、前
記密閉空間の外周に沿ってうねりを有していることを特
徴とする圧力検出装置用パッケージ。
Claims: 1. An insulating base having a mounting portion on one main surface on which a semiconductor element is mounted, and an electrode provided on the surface and inside of the insulating base, wherein each electrode of the semiconductor element is provided. Is electrically connected to the insulating base in a flexible state so as to form a substantially disk-shaped closed space between the plurality of wiring conductors electrically connected to each other and the other main surface of the insulating base. A first electrode for forming a capacitance, which is attached to the other main surface in the closed space and is electrically connected to one of the wiring conductors; A package for a pressure detection device, comprising: a second electrode for forming a capacitance, which is attached to a surface so as to face the first electrode and is electrically connected to another one of the wiring conductors. Wherein the insulating plate has undulations along the outer periphery of the closed space. Package for pressure detection device according to symptoms.
JP2001195876A 2001-06-28 2001-06-28 Package for pressure detection device Expired - Fee Related JP4794073B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005241401A (en) * 2004-02-26 2005-09-08 Kyocera Corp Package for pressure detection device
JP2006126182A (en) * 2004-10-01 2006-05-18 Hitachi Ltd Pressure sensor mixed semiconductor device and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06288852A (en) * 1993-03-30 1994-10-18 Honda Motor Co Ltd Pressure sensor
JPH08159900A (en) * 1994-12-05 1996-06-21 Fuji Electric Co Ltd Method for manufacturing pressure-sensitive diaphragm for pressure sensor
JPH09286659A (en) * 1996-04-22 1997-11-04 Ngk Spark Plug Co Ltd Ceramic diaphragm and its manufacture

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06288852A (en) * 1993-03-30 1994-10-18 Honda Motor Co Ltd Pressure sensor
JPH08159900A (en) * 1994-12-05 1996-06-21 Fuji Electric Co Ltd Method for manufacturing pressure-sensitive diaphragm for pressure sensor
JPH09286659A (en) * 1996-04-22 1997-11-04 Ngk Spark Plug Co Ltd Ceramic diaphragm and its manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005241401A (en) * 2004-02-26 2005-09-08 Kyocera Corp Package for pressure detection device
JP2006126182A (en) * 2004-10-01 2006-05-18 Hitachi Ltd Pressure sensor mixed semiconductor device and manufacturing method thereof

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