JP2002367787A - Organic el display device and its manufacturing method - Google Patents
Organic el display device and its manufacturing methodInfo
- Publication number
- JP2002367787A JP2002367787A JP2001169650A JP2001169650A JP2002367787A JP 2002367787 A JP2002367787 A JP 2002367787A JP 2001169650 A JP2001169650 A JP 2001169650A JP 2001169650 A JP2001169650 A JP 2001169650A JP 2002367787 A JP2002367787 A JP 2002367787A
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- Prior art keywords
- layer
- organic
- color
- electrode
- transport layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000010410 layer Substances 0.000 claims abstract description 272
- 239000012044 organic layer Substances 0.000 claims abstract description 89
- 230000005525 hole transport Effects 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 19
- 239000003086 colorant Substances 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 13
- 238000002347 injection Methods 0.000 abstract description 35
- 239000007924 injection Substances 0.000 abstract description 35
- 230000002950 deficient Effects 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 description 10
- 239000011159 matrix material Substances 0.000 description 10
- 230000007547 defect Effects 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、有機ＥＬ（エレク
トロルミネッセンス）表示装置及びその製造方法に関
し、詳しくは、フルカラー表示を行うための構造を備え
た有機ＥＬ表示装置及びその製造方法に関する。The present invention relates to an organic EL (electroluminescence) display device and a method of manufacturing the same, and more particularly, to an organic EL display device having a structure for performing full-color display and a method of manufacturing the same.
【０００２】[0002]
【従来の技術】有機ＥＬ表示装置は、有機ＥＬ素子を基
本要素とするもので、平面基板上に形成された有機ＥＬ
素子を点灯又は非点灯することで、画像表示を行うもの
である。有機ＥＬ素子とは、所定面積の電極を対向配置
して、一方を正電圧が印加される陽極、他方を負電圧が
印加される陰極とし、この電極間に有機発光材料からな
る発光層を含む有機層を介在させたものであり、電極間
に電圧を印加することで、陰極から電子が、陽極から正
孔がそれぞれ発光層に注入され、この発光層中で電子−
正孔の再結合が起こることにより発光が生じる面発光素
子である。この有機ＥＬ素子を単位面発光要素として平
面基板上にマトリクス状に形成し、これをドットマトリ
クス駆動することにより、高精細な画像が表示できるフ
ラットパネルディスプレイ装置を形成することができ
る。2. Description of the Related Art An organic EL display device has an organic EL element as a basic element, and has an organic EL element formed on a flat substrate.
An image is displayed by turning on or off the element. The organic EL element includes electrodes having a predetermined area opposed to each other, one of which serves as an anode to which a positive voltage is applied, and the other serving as a cathode to which a negative voltage is applied. When a voltage is applied between the electrodes, electrons are injected from the cathode into the light-emitting layer, and holes are injected from the anode into the light-emitting layer.
This is a surface emitting element in which light emission is generated by recombination of holes. By forming the organic EL element as a unit surface light emitting element in a matrix on a flat substrate and driving it in a dot matrix, a flat panel display device capable of displaying a high-definition image can be formed.
【０００３】また、有機発光材料の研究によって、色純
度の高いＲ，Ｇ，Ｂ各発光色を示す有機ＥＬ素子が開発
されたことを受けて、この各色発光素子を画素毎に配設
して、フルカラー表示を行う有機ＥＬ表示装置が開発さ
れている。図４及び図５は、その一例を示すもので、ア
クティブマトリクス駆動によってフルカラー表示を行う
有機ＥＬ表示装置の構造を示している。図４はその構造
を示す説明図であり、図５はそのｘｘ断面の概略図であ
る。Further, in response to the research on organic light emitting materials, the development of organic EL elements exhibiting R, G, and B luminescent colors with high color purity has led to the arrangement of these color light emitting elements for each pixel. An organic EL display device that performs full-color display has been developed. FIGS. 4 and 5 show an example of the structure, and show a structure of an organic EL display device which performs full-color display by active matrix driving. FIG. 4 is an explanatory view showing the structure, and FIG. 5 is a schematic view of the xx section.
【０００４】これらの図において、透明なガラス等から
成る基板１上には、トランジスタ・エリアＴにＴＦＴの
半導体層が形成されており、更にはＩＴＯ等の透明導電
材料からなる複数の第１電極２（陽極）が１画素Ｖ毎に
独立して形成されている。この第１電極２間の基板１上
には、一方向にデータラインＬ１と電源ラインＬ２が形
成されており、これらと直交する方向に走査ラインＬ３
が形成されている。また、これら各ラインが形成された
第１電極２の間には、ポリイミド等からなる絶縁膜３が
形成されている。そして、この第１電極２上に、複数の
有機層４が形成され、その有機層４の上を覆って、Ａｌ
等からなる第２電極（陰極）５が形成されている。In these figures, a TFT semiconductor layer is formed in a transistor area T on a substrate 1 made of transparent glass or the like, and a plurality of first electrodes made of a transparent conductive material such as ITO are formed. 2 (anode) are independently formed for each pixel V. On the substrate 1 between the first electrodes 2, a data line L1 and a power line L2 are formed in one direction, and a scanning line L3 is formed in a direction orthogonal to these.
Are formed. An insulating film 3 made of polyimide or the like is formed between the first electrodes 2 on which these lines are formed. Then, a plurality of organic layers 4 are formed on the first electrode 2, and the organic layers 4 are covered with Al.
A second electrode (cathode) 5 is formed.
【０００５】第１電極２上に形成された有機層４の構造
を図５によって説明すると（ここでは、上述の各ライン
Ｌ１，Ｌ２，Ｌ３を省略している。）、基板１上の第１
電極２及び絶縁膜３上に、正孔注入層４０と正孔輸送層
４１が形成されており、その正孔輸送層４１上に、第１
色目となる第１電極２上の領域が選択されて、その領域
に第１の発光層４２ａ，電子輸送層４３ａ，電子注入層
４４ａが順次形成されている。更に、第２色目として選
択された第１電極２上の領域に、第２の発光層４２ｂ，
電子輸送層４３ｂ，電子注入層４４ｂが順次形成され、
第３色目として選択された第１電極２上の領域には、第
３の発光層４２ｃ，電子輸送層４３ｃ，電子注入層４４
ｃが順次形成されている。そして、このような各色毎に
選択された領域に形成された有機層を連ねて有機層４を
形成しており、この有機層４の上を覆って第２電極５が
形成され、この第２電極５と第１電極２との交差領域に
おいて、各色の発光領域４５ａ，４５ｂ，４５ｃが形成
されている。The structure of the organic layer 4 formed on the first electrode 2 will be described with reference to FIG. 5 (here, the above-described lines L1, L2, and L3 are omitted).
A hole injection layer 40 and a hole transport layer 41 are formed on the electrode 2 and the insulating film 3.
A region on the first electrode 2 to be a color is selected, and a first light emitting layer 42a, an electron transport layer 43a, and an electron injection layer 44a are sequentially formed in that region. Further, the second light emitting layer 42b and the second light emitting layer 42b are formed in the region on the first electrode 2 selected as the second color.
An electron transport layer 43b and an electron injection layer 44b are sequentially formed,
In the region on the first electrode 2 selected as the third color, a third light emitting layer 42c, an electron transport layer 43c, and an electron injection layer 44
c are sequentially formed. Then, the organic layer 4 is formed by connecting the organic layers formed in the region selected for each color, and the second electrode 5 is formed so as to cover the organic layer 4. In the intersection area between the electrode 5 and the first electrode 2, light-emitting areas 45a, 45b, 45c of each color are formed.
【０００６】ここで、上述した有機層４は、発光領域４
５ａ，４５ｂ，４５ｃを完全に包含するために、第１電
極２上だけでなく絶縁膜３上にも重ねて形成しており、
これによって充分な発光量を確保している。そして、有
機層４の上を覆って第２電極５を形成するためには層の
連続性を確保する必要があり、そのために、各色毎に選
択された領域を連ねて連続した層を形成している。Here, the above-mentioned organic layer 4 has a light emitting region 4
In order to completely cover 5a, 45b and 45c, they are formed not only on the first electrode 2 but also on the insulating film 3,
As a result, a sufficient light emission amount is secured. In order to form the second electrode 5 over the organic layer 4, it is necessary to ensure the continuity of the layers. For this purpose, a continuous layer is formed by connecting regions selected for each color. ing.
【０００７】上述の説明では、アクティブマトリクス型
の有機ＥＬ表示装置を例にして説明したが、単純マトリ
クス（パッシブ）型の有機ＥＬ表示装置も、その構造自
体には大きな違いはない。この場合、透明なガラス等か
ら成る基板１上には、ＩＴＯ等の透明導電材料からなる
複数の第１電極２（陽極）がストライプ状に形成され、
これらの第１電極２の間にはポリイミド等からなる絶縁
膜３が形成されている。そして、この第１電極２と直交
して、複数の有機層４がストライプ状に形成され、その
有機層４の上を覆って、Ａｌ等からなる第２電極（陰
極）５がストライプ状に形成されることになる。In the above description, an active matrix type organic EL display device has been described as an example. However, the structure itself of a simple matrix (passive) type organic EL display device does not differ greatly. In this case, a plurality of first electrodes 2 (anodes) made of a transparent conductive material such as ITO are formed in stripes on a substrate 1 made of transparent glass or the like,
An insulating film 3 made of polyimide or the like is formed between the first electrodes 2. A plurality of organic layers 4 are formed in a stripe shape orthogonal to the first electrode 2, and a second electrode (cathode) 5 made of Al or the like is formed in a stripe shape over the organic layer 4. Will be done.
【０００８】[0008]
【発明が解決しようとする課題】上述した有機ＥＬ表示
装置は、色バランスの良いフルカラー表示を行うため
に、赤（Ｒ），緑（Ｇ），青（Ｂ）の各色に対応する、
第１の発光層４２ａ，電子輸送層４３ａ，電子注入層４
４ａ、第２の発光層４２ｂ，電子輸送層４３ｂ，電子注
入層４４ｂ、及び第３の発光層４２ｃ，電子輸送層４３
ｃ，電子注入層４４ｃについて、その膜厚を各色毎に異
ならせて形成している。これは、有機発光材料の発光効
率が色毎に異なることを考慮に入れたもので、発光効率
の低い色に対しては膜厚を厚くして、同一駆動電圧及び
電圧印加時間に対して色毎の発光量に違いが生じないよ
うに設定している。図５に示す例では、発光層及び電子
輸送層の膜厚を異ならせており、第１色目の膜厚ｔａ，
第２色目の膜厚ｔｂ，第３色目の膜厚ｔｃを、各色の発
光効率を考慮して、ｔａ＞ｔｂ＞ｔｃとなるように設定
している。層厚の設定は、形成時の蒸着時間を調整する
ことで行われる。The above-mentioned organic EL display device corresponds to each of red (R), green (G), and blue (B) in order to perform full-color display with good color balance.
First light emitting layer 42a, electron transport layer 43a, electron injection layer 4
4a, the second light emitting layer 42b, the electron transport layer 43b, the electron injection layer 44b, and the third light emitting layer 42c, the electron transport layer 43
c, the electron injection layer 44c is formed so that the film thickness is different for each color. This takes into account the fact that the luminous efficiency of the organic luminescent material differs for each color, and the film thickness is increased for colors with low luminous efficiency, and the color is increased for the same driving voltage and voltage application time. The setting is made so that there is no difference in the light emission amount for each. In the example shown in FIG. 5, the film thicknesses of the light emitting layer and the electron transport layer are different, and the film thickness t a of the first color,
Thickness t b of the second color, the thickness t c of the third color, in consideration of the respective color light emission efficiency, are set such that t a> t b> t c . The setting of the layer thickness is performed by adjusting the vapor deposition time during the formation.
【０００９】このように発光効率に対する調整が行われ
た有機ＥＬ表示装置では、図５のａ １〜ａ４の各部に示
されるように、各色毎に選択された領域の境界部分で有
機層４の表面に段差が生じてしまう。これに対して、有
機層４上に形成する第２電極５は、通常、各有機層の形
成と同様に基板に対して真下に蒸着源を配置して電極材
料を蒸着させているので、段差が形成された境界部分に
は必要な厚さの電極層を形成することができない。In this way, the luminous efficiency is adjusted.
In the organic EL display device shown in FIG. 1~ A4Shown in each part of
At the boundary of the area selected for each color so that
A step occurs on the surface of the mechanical layer 4. In contrast,
The second electrode 5 formed on the organic layer 4 usually has the shape of each organic layer.
Place the deposition source directly below the substrate in the same way as
Material is deposited on the boundary where the step is formed.
Cannot form an electrode layer having a required thickness.
【００１０】このために、この段差が形成された部分で
は、第２電極５の層厚が局部的に薄くなって抵抗値が大
きくなり、各色の発光特性を低下させる原因になり、ま
た、ａ１及びａ４の各部に示すように段差が大きい部分
では、第２電極５に断線が生じ、これによって非発光部
分が形成される原因にもなっていた。具体例を示すと、
発光層をＲ＝４０ｎｍ，Ｇ＝３０ｎｍ，Ｂ＝２５ｎｍ、
電子輸送層をＲ＝４０ｎｍ，Ｇ＝２５ｎｍ，Ｂ＝２０ｎ
ｍと設定して蒸着し、電子注入層を蒸着後に、第２電極
を６０ｎｍに設定して基板の真下に蒸着源を配置して蒸
着を行った場合に、発光不良又は非発光の箇所が確認さ
れた。For this reason, in the portion where the step is formed, the layer thickness of the second electrode 5 is locally reduced, the resistance value is increased, and the light emission characteristics of each color are deteriorated. the partial step is large as shown in each part 1 and a 4, breaking the second electrode 5 is formed, which by have also become a cause of the non-light emitting portion is formed. As a specific example,
R = 40 nm, G = 30 nm, B = 25 nm,
R = 40 nm, G = 25 nm, B = 20 n for the electron transport layer
When the deposition was performed by setting the second electrode to 60 nm after the electron injection layer was deposited and the deposition source was arranged directly below the substrate, and the deposition was performed, a defective light emission or a non-light emitting portion was confirmed. Was done.
【００１１】つまり、従来のフルカラー表示を行う有機
ＥＬ表示装置では、第２電極が形成される有機層の表面
を平坦に形成した場合には、各色の発光層に発光効率の
差があって、要求される色バランスやコントラストを得
にくいという問題があり、これを解消するために、各色
毎の発光層或いは電子輸送層に膜厚の差を形成した場合
には、有機層上に形成される第２電極の膜厚が局所的に
薄くなって、表示不良や画素欠陥が発生するといった不
具合が生じるという問題があることから、充分に質の高
い画像を表示することができなかった。That is, in the conventional organic EL display device for performing full color display, when the surface of the organic layer on which the second electrode is formed is formed flat, there is a difference in luminous efficiency between the light emitting layers of each color. There is a problem that it is difficult to obtain the required color balance and contrast, and in order to solve this problem, when a difference in film thickness is formed in the light-emitting layer or the electron transport layer for each color, it is formed on the organic layer. Since there was a problem that the thickness of the second electrode was locally reduced to cause display defects and pixel defects, a sufficiently high-quality image could not be displayed.
【００１２】本発明は、このような問題に対処するため
に提案されたものであって、高品質のフルカラー表示を
行うための構造を備えた有機ＥＬ表示装置及びその製造
方法を提供することを目的とするものである。The present invention has been proposed to address such a problem, and an object of the present invention is to provide an organic EL display device having a structure for performing high-quality full-color display and a method of manufacturing the same. It is the purpose.
【００１３】[0013]
【課題を解決するための手段】上述した目的を達成する
ために、本発明は以下の特徴を具備する。In order to achieve the above-mentioned object, the present invention has the following features.
【００１４】請求項１に係る発明では、基板上に形成し
た複数の第１電極と、該第１電極上に形成した正孔輸送
層，ＲＧＢ何れかの色を発光する発光層及び電子輸送層
を含む有機層と、該有機層上を覆って形成された第２電
極とからなる有機ＥＬ表示装置において、前記有機層は
各色毎に選択された領域を連ねた層に形成され、前記第
２電極は、その膜厚を前記有機層における発光層と電子
輸送層とを加えた各色膜厚の中での最大値より大きい膜
厚値とすることを特徴とする。According to the first aspect of the present invention, a plurality of first electrodes formed on a substrate, a hole transport layer formed on the first electrode, a light emitting layer emitting any one of RGB colors, and an electron transport layer In an organic EL display device comprising an organic layer containing: and a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, The electrode is characterized in that the thickness of the electrode is larger than the maximum value among the thicknesses of the respective colors including the light emitting layer and the electron transport layer in the organic layer.
【００１５】請求項２に係る発明では、基板上に形成し
た複数の第１電極と、該第１電極上に形成した正孔輸送
層，ＲＧＢ何れかの色を発光する発光層及び電子輸送層
を含む有機層と、該有機層上を覆って形成された第２電
極とからなる有機ＥＬ表示装置において、前記有機層は
各色毎に選択された領域を連ねた層に形成され、前記電
子輸送層は各色毎に選択された領域に形成される第１の
層と各色共通に形成される第２の層とからなることを特
徴とする。According to the second aspect of the present invention, a plurality of first electrodes formed on the substrate, a hole transport layer formed on the first electrode, a light emitting layer emitting any one of RGB colors, and an electron transport layer In an organic EL display device comprising an organic layer containing: and a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, and The layer includes a first layer formed in a region selected for each color and a second layer formed commonly for each color.
【００１６】請求項３に係る発明では、基板上に複数の
第１電極を形成し、該第１電極上に正孔輸送層，ＲＧＢ
何れかの色を発光する発光層及び電子輸送層を含む有機
層を形成し、該有機層上を覆って第２電極を形成する有
機ＥＬ表示装置の製造方法において、前記有機層を各色
毎に選択した領域を連ねた層に形成し、前記第２電極
を、前記有機層における発光層と電子輸送層とを加えた
各色膜厚の中での最大値より大きい膜厚となるように、
前記有機層上に蒸着することを特徴とする。According to a third aspect of the present invention, a plurality of first electrodes are formed on a substrate, and a hole transport layer, RGB
In a method for manufacturing an organic EL display device in which an organic layer including a light emitting layer emitting any color and an electron transporting layer is formed, and a second electrode is formed over the organic layer, the organic layer is provided for each color. The selected region is formed in a continuous layer, and the second electrode is formed to have a thickness larger than the maximum value among the respective color thicknesses of the organic layer plus the light emitting layer and the electron transport layer.
It is characterized in that it is deposited on the organic layer.
【００１７】請求項４に係る発明では、基板上に複数の
第１電極を形成し、該第１電極上に正孔輸送層，ＲＧＢ
何れかの色を発光する発光層及び電子輸送層を含む有機
層を形成し、該有機層上を覆って第２電極を形成する有
機ＥＬ表示装置の製造方法において、前記有機層を各色
毎に選択した領域を連ねた層に形成するにあたって、各
色毎に選択された領域に第１の電子輸送層を蒸着した
後、各色共通に第２の電子輸送層を一様に蒸着すること
を特徴とする。According to the fourth aspect of the present invention, a plurality of first electrodes are formed on a substrate, and a hole transport layer, RGB, and the like are formed on the first electrodes.
In a method for manufacturing an organic EL display device in which an organic layer including a light emitting layer emitting any color and an electron transporting layer is formed, and a second electrode is formed over the organic layer, the organic layer is provided for each color. In forming the selected region as a continuous layer, a first electron transport layer is deposited on the region selected for each color, and then a second electron transport layer is uniformly deposited on each color. I do.
【００１８】請求項５に係る発明では、基板上に複数の
第１電極を形成し、該第１電極上に正孔輸送層，ＲＧＢ
何れかの色を発光する発光層及び電子輸送層を含む有機
層を形成し、該有機層上を覆って第２電極を形成する有
機ＥＬ表示装置の製造方法において、前記有機層を各色
毎に選択した領域を連ねた層に形成するにあたって、各
色毎に選択された領域に第１の電子輸送層を蒸着した
後、各色共通に第２の電子輸送層を一様に蒸着し、前記
第２電極が、前記有機層における発光層と電子輸送層と
を加えた各色膜厚の中での最大値より大きい膜厚となる
ように、前記有機層上に蒸着されることを特徴とする。According to the fifth aspect of the present invention, a plurality of first electrodes are formed on a substrate, and a hole transport layer and an RGB are formed on the first electrodes.
In a method for manufacturing an organic EL display device in which an organic layer including a light emitting layer emitting any color and an electron transporting layer is formed, and a second electrode is formed over the organic layer, the organic layer is provided for each color. In forming the selected area as a continuous layer, a first electron transport layer is deposited on the area selected for each color, and then a second electron transport layer is uniformly deposited on each color in common. An electrode is deposited on the organic layer so that the thickness of the electrode is larger than the maximum value of the thickness of each color of the organic layer plus the light emitting layer and the electron transport layer.
【００１９】請求項６に係る発明では、上述の有機ＥＬ
表示装置の製造方法において、前記第２電極の形成は、
斜め蒸着によってなされることを特徴とする。In the invention according to claim 6, the above-mentioned organic EL is used.
In the method for manufacturing a display device, the formation of the second electrode may include:
It is characterized by being made by oblique deposition.
【００２０】上述の特徴を有する本発明は、以下の作用
を呈するものである。The present invention having the above-mentioned features has the following effects.
【００２１】請求項１及び３に係る発明によると、有機
層に段差が生じた場合でも、その上に形成される第２電
極の膜厚をその段差よりも厚くすることで、段差部分で
電極が切断することを防止している。有機層における発
光量の調整は、主に発光層と電子輸送層の厚さを調整す
ることでなされるので、有機層に形成される段差の最大
値は、発光層と電子輸送層とを加えた各色膜厚の中での
最大値より小さくなる。第２電極の厚さをこの最大値以
上に設定すると、段差を形成する下側の表面上に形成さ
れる電極の厚さが段差を形成する上側の表面より高くな
るので、その上側の表面上に形成される電極層と下側の
表面に形成される電極層とは常に繋がった状態を確保で
きる。第２電極を蒸着によって形成する場合には、蒸着
時間を調整することによって膜厚を上述の厚さに設定す
る。According to the first and third aspects of the present invention, even when a step is formed in the organic layer, the thickness of the second electrode formed on the organic layer is made larger than the step so that the electrode is formed at the step. To prevent disconnection. Since the adjustment of the light emission amount in the organic layer is mainly performed by adjusting the thickness of the light emitting layer and the electron transport layer, the maximum value of the step formed in the organic layer is determined by adding the light emitting layer and the electron transport layer. Smaller than the maximum value among the respective color film thicknesses. When the thickness of the second electrode is set to be equal to or more than this maximum value, the thickness of the electrode formed on the lower surface forming the step becomes higher than the upper surface forming the step, so that the upper surface And the electrode layer formed on the lower surface can be always connected. When the second electrode is formed by vapor deposition, the film thickness is set to the above-described thickness by adjusting the vapor deposition time.
【００２２】請求項２及び４に係る発明によると、有機
層における発光層と第１の電子輸送層を各色毎に異なる
厚さに形成して発光量の調整を行ったものに対して、第
１の電子輸送層として用いた材料と同じ材料又は異なる
材料を用いて、第１の電子輸送層上に各色共通に一様な
第２の電子輸送層を形成しており、各色毎に形成された
発光層及び第１の電子輸送層によって形成された段差
は、第２の電子輸送層を設けることによって段がなだら
かになる。これによって、有機層上に形成される第２電
極の段差はほぼ無くなる。According to the second and fourth aspects of the present invention, the light emitting layer and the first electron transporting layer in the organic layer are formed to have different thicknesses for each color, and the light emitting amount is adjusted. A uniform second electron transport layer for each color is formed on the first electron transport layer using the same material or a different material as the material used for the first electron transport layer. The step formed by the light emitting layer and the first electron transport layer becomes gentler by providing the second electron transport layer. Thereby, the step of the second electrode formed on the organic layer is almost eliminated.
【００２３】請求項５に係る発明は、有機層における正
孔輸送層，発光層及び電子注入層の各層を各色毎に異な
る厚さに形成して発光量の調整を行った場合のように、
有機層に大きな段差が形成されたものに対処するもので
ある。これによると、上述した第２電極の厚さを厚くす
る対処と、各色毎の第１の電子輸送層上に各色共通の第
２の電子輸送層を設ける対処とを併用して、有機層上に
形成される第２電極をほぼ均一な層にしている。According to a fifth aspect of the present invention, as in the case where each of the hole transport layer, the light emitting layer and the electron injection layer in the organic layer is formed to have a different thickness for each color and the amount of light emission is adjusted,
This is to deal with the case where a large step is formed in the organic layer. According to this, the above-described measures for increasing the thickness of the second electrode and the measures for providing a second electron transport layer common to each color on the first electron transport layer for each color are used in combination to increase the thickness of the organic layer. Is formed in a substantially uniform layer.
【００２４】請求項６に係る発明によると、更に、第２
電極の形成に斜め蒸着を採用することで、段差部分に対
しても充分な膜厚を確保している。また、有機層表面に
形成される段差は一方向には形成されない場合もあるの
で、複数の方向性を有する斜め蒸着を採用することが有
効である。According to the invention of claim 6, further, the second
By employing oblique deposition for forming the electrodes, a sufficient film thickness is ensured even at the step portion. In addition, since steps formed on the surface of the organic layer may not be formed in one direction, it is effective to employ oblique deposition having a plurality of directions.
【００２５】上述した各請求項に係る発明は、基板上に
形成した複数の第１電極と、該第１電極上に形成した正
孔輸送層，ＲＧＢ何れかの色を発光する発光層及び電子
輸送層を含む有機層と、該有機層上を覆って形成された
第２電極とからなる有機ＥＬ表示装置及びその製造方法
において、まず、有機層が各色毎に選択された領域を連
ねた層に形成されているので、有機層は第１及び第２電
極間に形成される発光領域を完全に包含するように形成
されており、発光領域を密に形成して高密度化を図った
としても充分な発光量を確保することができる。また、
各色毎に選択された領域において有機層の厚さを異なら
せて発光量の調整を行った場合であっても、上述のよう
に有機層上に形成される第２電極の膜厚は充分な厚さに
形成することができる。したがって、色バランス及びコ
ントラストを良好にでき、表示不良や画素欠陥が生じる
ことが無く、また高密度の表示が可能となるので、高品
質のフルカラー表示を行うことができる。The invention according to each of the above-mentioned claims comprises a plurality of first electrodes formed on a substrate, a hole transport layer formed on the first electrodes, a light emitting layer for emitting any one of RGB colors, and an electron emitting layer. In an organic EL display device including an organic layer including a transport layer and a second electrode formed over the organic layer, and a method for manufacturing the same, first, a layer in which an organic layer connects a region selected for each color Since the organic layer is formed so as to completely cover the light emitting region formed between the first and second electrodes, the light emitting region is formed densely to increase the density. Thus, a sufficient light emission amount can be secured. Also,
Even when the amount of light emission is adjusted by changing the thickness of the organic layer in the region selected for each color, the thickness of the second electrode formed on the organic layer is sufficient as described above. It can be formed to a thickness. Therefore, color balance and contrast can be improved, and display defects and pixel defects do not occur. Further, high-density display can be performed, so that high-quality full-color display can be performed.
【００２６】[0026]
【発明の実施の形態】以下、本発明の実施形態を図面を
参照して説明する（なお、従来と同一の部分には同一の
番号を付して一部重複した説明は省略する。）。図１は
本発明における第１の実施形態に係る有機ＥＬ表示装置
の構造を示す説明図である（ここでは、図５と同様に各
ラインＬ１，Ｌ２，Ｌ３は省略している。）。ガラス等
の透明な基板１の一面には、ＩＴＯ等の透明導電材料か
ら成る第１電極２が複数箇所に形成されている。この第
１電極２間の基板１上には、ポリイミド等から成る絶縁
膜３が、第１電極２の周辺を若干覆うように形成されて
いる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings (the same parts as in the prior art will be denoted by the same reference numerals, and a duplicate description will be omitted). FIG. 1 is an explanatory diagram showing the structure of the organic EL display device according to the first embodiment of the present invention (here, lines L1, L2, and L3 are omitted as in FIG. 5). On one surface of a transparent substrate 1 such as glass, first electrodes 2 made of a transparent conductive material such as ITO are formed at a plurality of locations. On the substrate 1 between the first electrodes 2, an insulating film 3 made of polyimide or the like is formed so as to slightly cover the periphery of the first electrode 2.
【００２７】また、複数の第１電極２間を跨って、第１
電極２及び絶縁膜３上に、正孔注入層４０及び正孔輸送
層４１が形成されている。そして、各色毎の領域６０
ａ，６０ｂ，６０ｃが選択されて、それぞれの領域に、
発光層４２ａ，４２ｂ，４２ｃ、電子輸送層４３ａ，４
３ｂ，４３ｃ、電子注入層４４ａ，４４ｂ，４４ｃが形
成され、これらの正孔注入層，正孔輸送層，発光層，電
子輸送層，電子注入層からなる有機層は、各色毎に選択
された領域６０ａ，６０ｂ，６０ｃを連ねて連続層を形
成している。なお、ここでは、発光層と第１電極間に形
成される層を正孔注入層４０及び正孔輸送層４１の２層
形態としているが、本実施形態及び後述する各実施形態
において、正孔注入層４０及び正孔輸送層４１は、第１
電極からの正孔注入，正孔輸送，発光層への正孔注入を
行う単層の正孔輸送層としたものでもよい。The first electrode 2 extends across the plurality of first electrodes 2.
On the electrode 2 and the insulating film 3, a hole injection layer 40 and a hole transport layer 41 are formed. Then, the area 60 for each color
a, 60b, and 60c are selected, and in each area,
Light emitting layers 42a, 42b, 42c, electron transport layers 43a, 4
3b, 43c and electron injection layers 44a, 44b, 44c are formed, and the organic layers including the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer are selected for each color. A continuous layer is formed by connecting the regions 60a, 60b, and 60c. Here, the layer formed between the light emitting layer and the first electrode has a two-layer structure of the hole injection layer 40 and the hole transport layer 41. However, in this embodiment and each of the embodiments described later, the hole The injection layer 40 and the hole transport layer 41
It may be a single-layer hole transport layer for injecting holes from the electrode, transporting holes, and injecting holes into the light emitting layer.
【００２８】このように形成した有機層において、第１
色目として選択された領域６０ａには、例えば赤色
（Ｒ）発光を得るための発光層４２ａ及び電子輸送層４
３ａがそれぞれ４０ｎｍの膜厚で形成されており、第２
色目として選択された領域６０ｂには、例えば緑色
（Ｇ）発光を得るための発光層４２ｂ及び電子輸送層４
３ｂがそれぞれ３０ｎｍ，２５ｎｍの膜厚で形成されて
おり、第３色目として選択された領域６０ｃには、例え
ば青色（Ｂ）発光を得るための発光層４２ｃ及び電子輸
送層４３ｃがそれぞれ２５ｎｍ，２０ｎｍの膜厚で形成
されている。このように発光層及び電子輸送層を各色毎
に異ならせて形成することで、各色の発光効率の違いを
解消しているが、これによって、上述したように有機層
の表面には、各色毎に選択された領域６０ａ，６０ｂ，
６０ｃの境界において段差が形成されている。In the thus formed organic layer, the first
For example, the light emitting layer 42a for obtaining red (R) light emission and the electron transport layer 4
3a are each formed with a thickness of 40 nm, and the second
For example, the light emitting layer 42b for obtaining green (G) light emission and the electron transport layer 4
3b are formed in thicknesses of 30 nm and 25 nm, respectively, and in a region 60c selected as the third color, for example, a light emitting layer 42c for obtaining blue (B) light emission and an electron transporting layer 43c are respectively 25 nm and 20 nm. Is formed. By forming the light emitting layer and the electron transporting layer differently for each color in this manner, the difference in luminous efficiency of each color is eliminated. However, as described above, the surface of the organic layer is provided for each color. Regions 60a, 60b,
A step is formed at the boundary of 60c.
【００２９】この有機層上には、最上層の電子注入層４
４ａ，４４ｂ，４４ｃを覆うように、Ａｌ等から成り反
射電極として作用する第２電極５０を形成する。そし
て、第１電極２及び第２電極５０間に駆動電圧を印加す
ることによって、各色毎に選択された領域６０ａ，６０
ｂ，６０ｃにおける発光領域４５ａ，４５ｂ，４５ｃか
ら、基板１を介してＲＧＢの各発光色を選択的に得る。On this organic layer, the uppermost electron injection layer 4
A second electrode 50 made of Al or the like and acting as a reflective electrode is formed so as to cover 4a, 44b, and 44c. Then, by applying a driving voltage between the first electrode 2 and the second electrode 50, the regions 60a and 60 selected for each color are applied.
From the light emitting areas 45a, 45b and 45c in b and 60c, respective light emitting colors of RGB are selectively obtained through the substrate 1.
【００３０】ここで、本実施形態においては、第２電極
５０の膜厚ｔeを発光層と電子輸送層とを加えた各色膜
厚の中での最大値ｔｍより大きく設定している。上述し
た各層の設定例に従うと、第２電極５０の膜厚ｔeは、
８０ｎｍより大きく、好ましくは１００ｎｍ程度に設定
される。これにより、有機層上に段差が形成されている
状態においても、第２電極５０の膜厚は段差による影響
が殆どなくなり、局部的に薄い部分や断線箇所が形成さ
れない。[0030] Here, in this embodiment, it is set larger than the maximum value t m of in KakuiromakuAtsu the thickness te of the second electrode 50 plus the light emitting layer and the electron transport layer. According to the setting example of each layer described above, the film thickness te of the second electrode 50 is
It is set to be larger than 80 nm, preferably about 100 nm. Accordingly, even when a step is formed on the organic layer, the thickness of the second electrode 50 is hardly affected by the step, and a locally thin portion or a disconnected portion is not formed.
【００３１】上述した第１実施形態に係る有機ＥＬ表示
装置の製造方法をアクティブ型（アクティブマトリクス
駆動）の装置を例に説明する。The method of manufacturing the organic EL display device according to the first embodiment will be described by taking an active type (active matrix drive) device as an example.
【００３２】（第１電極及び絶縁膜形成工程）透明ガラ
ス製の基板１の一面に対して、透明導電材料、例えばＩ
ＴＯをスパッタリング等の物理的成膜法によって成膜
し、既知のリソグラフィ技術及びエッチング技術によっ
て、画素毎に区画されたの第１電極２を形成する。次
に、この第１電極２の形成領域を選択的に覆った状態で
基板１上に絶縁材料（ポリイミド等）をスピンコート法
等によって塗布し、複数の第１電極２の間に絶縁膜３を
形成する。(Step of Forming First Electrode and Insulating Film) A transparent conductive material such as I
TO is formed by a physical film forming method such as sputtering, and the first electrode 2 partitioned for each pixel is formed by a known lithography technique and etching technique. Next, an insulating material (polyimide or the like) is applied onto the substrate 1 by a spin coating method or the like while selectively covering the formation region of the first electrode 2, and an insulating film 3 is provided between the plurality of first electrodes 2. To form
【００３３】（正孔注入層及び正孔輸送層形成工程）次
いで、所定のマスクを用いて、第１電極２及び絶縁膜３
上に正孔注入層４０を全面蒸着する。また、その正孔注
入層４０上に正孔輸送層４１を全面蒸着する。(Step of Forming Hole Injection Layer and Hole Transport Layer) Next, the first electrode 2 and the insulating film 3 are formed using a predetermined mask.
A hole injection layer 40 is entirely deposited thereon. Further, a hole transport layer 41 is entirely deposited on the hole injection layer 40.
【００３４】（各色発光層，電子輸送層及び電子注入層
形成工程）次いで、第１色目の選択領域が開口したパタ
ーンを有するマスクを基板上にセットし、第１色目、例
えばＲの発光層４２ａを正孔輸送層４１上に蒸着する。
この際、蒸着時間の調整により膜厚を例えば４０ｎｍに
設定する。引き続きマスクを維持して、電子輸送層４３
ａを所望の膜厚、例えば４０ｎｍとなるように蒸着した
後、電子注入層４４ａを所望の膜厚に形成する。その後
は、マスクを変更するか或いは上記のマスクをスライド
させて、第２色目（Ｇ）の領域を選択的に開口させ、発
光層４２ｂを例えば３０ｎｍの膜厚で蒸着させ、電子輸
送層４３ｂを例えば２５ｎｍの膜厚で蒸着させた後、電
子注入層４４ｂを所望の膜厚に形成する。更に、マスク
を変更するか或いは上記のマスクをスライドさせて、第
３色目（Ｂ）の領域を選択的に開口させ、発光層４２ｃ
を例えば２５ｎｍの膜厚で蒸着させ、電子輸送層４３ｃ
を例えば２０ｎｍの膜厚で蒸着させた後、電子注入層４
４ｃを所望の膜厚で形成する。(Step of Forming Light Emitting Layer, Electron Transporting Layer, and Electron Injecting Layer for Each Color) Next, a mask having a pattern in which the selected area of the first color is opened is set on the substrate, and the first color, for example, R light emitting layer 42a Is deposited on the hole transport layer 41.
At this time, the film thickness is set to, for example, 40 nm by adjusting the deposition time. Subsequently, the mask is maintained and the electron transport layer 43 is maintained.
After e is deposited to a desired thickness, for example, 40 nm, the electron injection layer 44a is formed to a desired thickness. After that, the mask is changed or the mask is slid to selectively open the region of the second color (G), the light emitting layer 42b is deposited with a thickness of, for example, 30 nm, and the electron transport layer 43b is formed. For example, after vapor deposition with a thickness of 25 nm, the electron injection layer 44b is formed to a desired thickness. Further, by changing the mask or sliding the mask, the third color (B) region is selectively opened, and the light emitting layer 42c is formed.
Is deposited in a thickness of, for example, 25 nm to form an electron transport layer 43c.
Is deposited to a thickness of, for example, 20 nm, and then the electron injection layer 4 is deposited.
4c is formed with a desired film thickness.
【００３５】（第２電極形成工程）次に、マスクを上述
の正孔注入層及び正孔輸送層形成工程で用いたものと同
様のものに変更して、電子注入層上にＡｌ等の金属材料
を全面蒸着させて第２電極５０を形成する。この際、第
２電極５０の膜厚ｔｍは、上述したように発光層と電子
輸送層とを加えた各色膜厚の中での最大値より大きい膜
厚値に設定され、この膜厚が得られるように蒸着時間が
設定される。また、この第２電極５０の形成には、複数
の方向性を有する斜め蒸着が有効であり、これよって、
段差が形成された箇所においても充分な膜厚の第２電極
層を形成することができる。複数の方向性を有する斜め
蒸着については、既知の各種方法を採用することができ
るが、特に、基板に対して斜め下方に複数の蒸着源を配
置する方法や基板に対して斜め下方に蒸着源を配置して
基板を回転させる方法等をあげることができる。(Second Electrode Forming Step) Next, the mask is changed to the same as that used in the above-described hole injecting layer and hole transporting layer forming step, and a metal such as Al is formed on the electron injecting layer. A second electrode 50 is formed by depositing a material over the entire surface. In this case, the thickness t m of the second electrode 50 is set to a large film thickness value than the maximum value among the KakuiromakuAtsu plus a luminescent layer and an electron transporting layer as described above, the film thickness The deposition time is set so as to be obtained. Also, oblique deposition having a plurality of directions is effective for forming the second electrode 50.
The second electrode layer having a sufficient film thickness can be formed even in a portion where a step is formed. For oblique vapor deposition having a plurality of directions, various known methods can be employed, and in particular, a method of arranging a plurality of vapor deposition sources obliquely downward with respect to the substrate or a method of obliquely depositing the substrate obliquely downward with respect to the substrate. And a method of rotating the substrate by disposing the substrate.
【００３６】次に、図２によって、本発明における第２
の実施形態を説明する。なお、第１の実施形態と同様の
説明箇所については、同一の符号を付して一部重複した
説明を省略する。Next, FIG. 2 shows a second embodiment of the present invention.
An embodiment will be described. The same parts as those in the first embodiment are denoted by the same reference numerals, and the description thereof will not be repeated.
【００３７】本実施形態によると、各色発光層の上に形
成される電子輸送層の構造及び形成方法に特徴があり、
電子輸送層を各色毎に形成される層と各色共通に形成さ
れる層の複数層で形成したものである。つまり、第１色
目の選択領域６０ａには、発光層４２ａ上に第１の電子
輸送層４６ａが例えば２０ｎｍの膜厚で形成されてお
り、第２色目の選択領域６０ｂには、発光層４２ｂ上に
第１の電子輸送層４６ｂが例えば５ｎｍの膜厚で形成さ
れている。また、第３色目の選択領域６０ｃには、第１
の電子輸送層は形成しない。そして、その上に、各色共
通の電子輸送層４７を例えば２０ｎｍの膜厚で一様に形
成し、更にその上に、電子注入層４４及び第２電極５１
を所望の膜厚で形成する。According to the present embodiment, the structure and the method of forming the electron transport layer formed on each color light emitting layer are characterized by
The electron transporting layer is formed by a plurality of layers of a layer formed for each color and a layer formed commonly for each color. That is, in the first color selection region 60a, the first electron transport layer 46a is formed with a thickness of, for example, 20 nm on the light emitting layer 42a, and in the second color selection region 60b, the first electron transport layer 46a is formed on the light emitting layer 42b. The first electron transport layer 46b is formed with a thickness of, for example, 5 nm. Also, the first color selection area 60c includes the first color
No electron transport layer is formed. Then, an electron transport layer 47 common to each color is uniformly formed thereon, for example, with a thickness of, for example, 20 nm, and further thereon, the electron injection layer 44 and the second electrode 51 are formed.
Is formed with a desired film thickness.
【００３８】この実施形態によると、各色毎に必要とな
る電子輸送層の膜厚は、第１の電子輸送層４６ａ，４６
ｂと第２の電子輸送層４７との和によって得られるよう
にしている。そして、第１の電子輸送層４６ａ，４６ｂ
が形成された段階で生じた急峻な段差が、各色共通な第
２の電子輸送層４７を設けることによりなだらかにな
る。これにより、その上に電子注入層４４を介して形成
される第２電極５１は、段差の影響を受け難くなり、局
部的に薄い部分や断線した部分が形成されなくなる。According to this embodiment, the required thickness of the electron transport layer for each color is the first electron transport layer 46a, 46a.
b and the second electron transport layer 47. Then, the first electron transport layers 46a and 46b
The steep step generated at the stage where is formed becomes gentle by providing the second electron transport layer 47 common to each color. As a result, the second electrode 51 formed thereon via the electron injection layer 44 is less likely to be affected by the step, and a locally thin portion or a disconnected portion is not formed.
【００３９】上述の第２実施形態に係る有機ＥＬ表示装
置の製造方法を第１実施形態と同様にアクティブ型の装
置を例に説明する。第１電極及び絶縁膜形成工程，正孔
注入層及び正孔輸送層形成工程は第１実施形態と同様で
ある。その後は、第１色目の選択領域が開口したパター
ンを有するマスクを基板上にセットし、第１色目の発光
層４２ａを正孔輸送層４１上に例えば４０ｎｍの膜厚で
蒸着する。引き続きマスクを維持して、第１の電子輸送
層４６ａを所望の膜厚、例えば２０ｎｍとなるように蒸
着する。その後、マスクを変更するか或いは上記のマス
クをスライドさせて、第２色目の領域を選択的に開口さ
せ、発光層４２ｂを例えば３０ｎｍの膜厚で蒸着させ、
更に第１の電子輸送層４６ｂを例えば５ｎｍの膜厚で蒸
着させる。更に又、マスクを変更するか或いは上記のマ
スクをスライドさせて、第３色目の発光層４２ｃを例え
ば２５ｎｍの膜厚で蒸着させる。The method of manufacturing the organic EL display device according to the second embodiment will be described by taking an active device as an example, as in the first embodiment. The step of forming the first electrode and the insulating film and the step of forming the hole injection layer and the hole transport layer are the same as in the first embodiment. Thereafter, a mask having a pattern in which the first color selection region is opened is set on the substrate, and the first color light emitting layer 42a is deposited on the hole transport layer 41 to a thickness of, for example, 40 nm. Subsequently, while maintaining the mask, the first electron transport layer 46a is deposited to a desired thickness, for example, 20 nm. After that, the mask is changed or the mask is slid to selectively open the region of the second color, and the light emitting layer 42b is deposited with a thickness of, for example, 30 nm,
Further, the first electron transport layer 46b is deposited to a thickness of, for example, 5 nm. Further, by changing the mask or sliding the mask, the third color light emitting layer 42c is deposited to a thickness of, for example, 25 nm.
【００４０】次に、マスクを上述の正孔注入層及び正孔
輸送層形成工程で用いたものと同様のものに変更して、
各色共通の電子輸送層４７を第１の電子輸送層４６ａ，
４６ｂと同様の材料又は異なる材料で例えば２０ｎｍの
膜厚に全面蒸着する。そして、このマスク状態を維持し
て、電子注入層４４及び第２電極５１を所望の膜厚で全
面蒸着する。この第２電極５１の形成には、第１実施形
態と同様に複数の方向性を有する斜め蒸着が有効であ
る。Next, the mask was changed to the same as that used in the above-described hole injection layer and hole transport layer forming step,
An electron transport layer 47 common to each color is formed by a first electron transport layer 46a,
The same material as 46b or a different material is vapor-deposited to a thickness of, for example, 20 nm. Then, while maintaining this mask state, the electron injection layer 44 and the second electrode 51 are vapor-deposited in a desired thickness. For forming the second electrode 51, oblique deposition having a plurality of directions is effective as in the first embodiment.
【００４１】次に、図３によって、本発明における第３
の実施形態を説明する。なお、上述の実施形態と同様の
説明箇所については、同一の符号を付して一部重複した
説明を省略する。Next, FIG. 3 shows a third embodiment of the present invention.
An embodiment will be described. Note that the same parts as those in the above-described embodiment are denoted by the same reference numerals, and a partially duplicated description will be omitted.
【００４２】本実施形態は、有機層に形成される段差が
大きい場合に有効であり、例えば、発光層を形成する材
料の種類によって各色毎の発光効率に大きな差があり、
これを解消するために、各色毎に選択された領域に形成
する有機層を正孔輸送層，発光層，電子輸送層の３層に
おいて各色毎に膜厚を異ならせる必要がある場合等に有
効である。これによると電子輸送層を各色毎に形成され
る層と各色共通に形成される層の複数層で形成する共
に、第２電極の膜厚を発光層と電子輸送層とを加えた値
の最大値より厚く形成したものである。The present embodiment is effective when the step formed in the organic layer is large. For example, there is a large difference in the luminous efficiency of each color depending on the type of the material forming the light emitting layer.
In order to solve this problem, it is effective when the organic layer formed in the region selected for each color needs to have a different thickness for each color in the three layers of the hole transport layer, the light emitting layer, and the electron transport layer. It is. According to this, the electron transport layer is formed of a plurality of layers of a layer formed for each color and a layer formed commonly for each color, and the thickness of the second electrode is set to the maximum value of the sum of the light emitting layer and the electron transport layer. It was formed thicker than the value.
【００４３】つまり、第１色目の選択領域６０ａには、
第１色目の正孔輸送層４１ａが例えば４０ｎｍの膜厚で
形成され、発光層４２ａが４０ｎｍの膜厚で形成され、
その上に第１の電子輸送層４６ａが例えば２０ｎｍの膜
厚で形成されており、第２色目の選択領域６０ｂには、
第２色目の正孔輸送層４１ｂが例えば２５ｎｍの膜厚で
形成され、発光層４２ｂが３０ｎｍの膜厚で形成され、
その上に第１の電子輸送層４６ｂが例えば５ｎｍの膜厚
で形成されている。また、第３色目の選択領域６０ｃに
は、第３色目の正孔輸送層４１ｃが２０ｎｍの膜厚で形
成され、発光層４２ｃは２５ｎｍの膜厚で形成され、こ
こには第１の電子輸送層は形成しない。そして、その上
に、各色共通の電子輸送層４７を例えば２０ｎｍの膜厚
で一様に形成し、更にその上に、電子注入層４４を所望
の膜厚で形成する。That is, in the selection area 60a for the first color,
The first color hole transport layer 41a is formed with a thickness of, for example, 40 nm, the light emitting layer 42a is formed with a thickness of 40 nm,
A first electron transport layer 46a is formed thereon with a thickness of, for example, 20 nm, and a second color selection region 60b has
The hole transport layer 41b of the second color is formed with a thickness of, for example, 25 nm, the light emitting layer 42b is formed with a thickness of 30 nm,
A first electron transport layer 46b is formed thereon with a thickness of, for example, 5 nm. In the third color selection region 60c, the third color hole transport layer 41c is formed with a thickness of 20 nm, and the light emitting layer 42c is formed with a thickness of 25 nm. No layer is formed. Then, an electron transport layer 47 common to each color is uniformly formed thereon with a thickness of, for example, 20 nm, and an electron injection layer 44 is further formed thereon with a desired thickness.
【００４４】ここで、電子注入層４４を覆うように形成
される第２電極５２の膜厚ｔeは発光層と電子輸送層と
を加えた各色膜厚の中での最大値ｔｍより大きく設定さ
れる。上述した各層の設定例に従うと、第２電極５２の
膜厚ｔｍは、８０ｎｍより大きく、好ましくは１００ｎ
ｍ程度に設定される。これにより、有機層上に大きな段
差が形成されている状態においても、第２電極５０の膜
厚は段差による影響が殆どなくなり、局部的に薄い部分
や断線箇所が形成されない。[0044] Here, the film thickness te of the second electrode 52 formed so as to cover the electron injection layer 44 is greater than the maximum value t m of in KakuiromakuAtsu plus the light emitting layer and an electron transport layer Setup Is done. According to setting example of the above-mentioned each layer, the thickness t m of the second electrode 52 is larger than 80 nm, preferably 100n
m. Accordingly, even when a large step is formed on the organic layer, the thickness of the second electrode 50 is hardly affected by the step, and a locally thin portion or a disconnected portion is not formed.
【００４５】上述の第３実施形態に係る有機ＥＬ表示装
置の製造方法を説明すると、正孔輸送層が形成される段
階で各色毎の領域が選択されることを除けば、上記の第
２実施形態における製造方法と同様であり、第２電極５
２を形成する際に、その膜厚が、ｔe＞ｔｍとなるよう
に設定される。なお、当然ながら、本実施形態において
も、第２電極５２の形成には上述の実施形態と同様に複
数の方向性を有する斜め蒸着が有効である。The method of manufacturing the organic EL display device according to the third embodiment will be described. Except that the region for each color is selected at the stage when the hole transport layer is formed, the second embodiment is described. The second electrode 5
In forming the 2, the film thickness thereof is set to be te> t m. Obviously, also in the present embodiment, oblique deposition having a plurality of directions is effective for forming the second electrode 52 as in the above-described embodiment.
【００４６】上述の各実施形態によると、各色毎に選択
される領域６０ａ，６０ｂ，６０ｃを平面基板上でマト
リクス状に配設することによって、フルカラーディスプ
レイを構成することができる。そして、各色毎に選択さ
れる領域６０ａ，６０ｂ，６０ｃは上述のように連続し
た有機層を形成しているので、各画素を高密度に形成で
きると共に充分な発光領域を確保することができ、高輝
度・高精細なディスプレイを形成することができる。ま
た、各色毎の領域においては、各色毎の発光層に発光効
率の違いが有ることを考慮に入れて、発光量に寄与する
有機層（発光層及び電子輸送層、或いは正孔輸送層）の
膜厚を異ならせて形成しているので、各色毎の駆動条件
を調整することなく、色バランス及びコントラストの良
好なフルカラー表示を実行することが可能になる。そし
て、各色毎の有機層膜厚の設定によって形成される有機
層表面の段差に対しては、その段差が有機層表面に形成
される第２電極の膜厚に影響しないように構成している
ので、第２電極に不良抵抗箇所や断線箇所が形成される
ことはなく、表示不良や画素欠陥といった不具合を完全
に無くすことができる。したがって、上述の各実施形態
により構成される有機ＥＬディスプレイ装置は高品質の
フルカラー表示を実行することが可能になる。According to each of the above-described embodiments, a full-color display can be formed by arranging the regions 60a, 60b, and 60c selected for each color in a matrix on a flat substrate. Since the regions 60a, 60b, and 60c selected for each color form a continuous organic layer as described above, each pixel can be formed at a high density and a sufficient light emitting region can be secured. A high-brightness, high-definition display can be formed. In addition, in the region for each color, taking into account the fact that the light emitting layer for each color has a difference in light emission efficiency, the organic layer (light emitting layer and electron transport layer or hole transport layer) that contributes to the amount of light emission is taken into consideration. Since the layers are formed with different film thicknesses, full-color display with good color balance and contrast can be executed without adjusting the driving conditions for each color. The step on the surface of the organic layer formed by setting the thickness of the organic layer for each color does not affect the thickness of the second electrode formed on the surface of the organic layer. Therefore, no defective resistance portion or disconnection portion is formed on the second electrode, and defects such as display defects and pixel defects can be completely eliminated. Therefore, the organic EL display device according to each of the above-described embodiments can execute high-quality full-color display.
【００４７】尚、上述の説明では、主にアクティブ型
（アクティブマトリクス駆動）の装置を例に説明してい
るが、本発明の構造及び製造方法は、これに限定される
ものではなく、ストライプ状の透明電極を平行配置した
パッシブ型（単純マトリクス駆動）の有機ＥＬディスプ
レイにも適用可能である。また、第１電極を透明電極，
第２電極を反射電極として、透明基板を介して表示を行
うものを例にあげて説明しているが、その逆に、第１電
極を反射電極、第２電極を透明電極として、基板と逆側
に表示するものであっても、同様の作用を奏することが
できる。In the above description, an active type (active matrix driving) device is mainly described as an example. However, the structure and manufacturing method of the present invention are not limited to this, and may be in the form of a stripe. It is also applicable to a passive type (simple matrix drive) organic EL display in which transparent electrodes are arranged in parallel. Also, the first electrode is a transparent electrode,
An example in which display is performed through a transparent substrate using the second electrode as a reflective electrode is described as an example. Conversely, the first electrode is used as a reflective electrode, and the second electrode is used as a transparent electrode. The same operation can be achieved even if the information is displayed on the side.
【００４８】[0048]
【発明の効果】本発明は前記のように構成されるので、
基板上に形成した複数の第１電極と、該第１電極上に形
成した正孔輸送層，ＲＧＢ何れかの色を発光する発光層
及び電子輸送層を含む有機層と、該有機層上を覆って形
成された第２電極とからなる有機ＥＬ表示装置及びその
製造方法において、色バランス及びコントラストを良好
にでき、表示不良や画素欠陥が生じることが無く、また
高密度の表示が可能となるので、高品質のフルカラー表
示を行うことが可能になる。Since the present invention is configured as described above,
A plurality of first electrodes formed on the substrate, a hole transport layer formed on the first electrode, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer; In the organic EL display device including the second electrode formed so as to cover and the method of manufacturing the same, color balance and contrast can be improved, display failure and pixel defects do not occur, and high-density display can be performed. Therefore, high-quality full-color display can be performed.
【図１】本発明における第１の実施形態に係る有機ＥＬ
表示装置の構造を示す説明図である。FIG. 1 is an organic EL according to a first embodiment of the present invention.
FIG. 3 is an explanatory diagram illustrating a structure of a display device.
【図２】本発明における第２の実施形態に係る有機ＥＬ
表示装置の構造を示す説明図である。FIG. 2 shows an organic EL according to a second embodiment of the present invention.
FIG. 3 is an explanatory diagram illustrating a structure of a display device.
【図３】本発明における第３の実施形態に係る有機ＥＬ
表示装置の構造を示す説明図である。FIG. 3 is an organic EL according to a third embodiment of the present invention.
FIG. 3 is an explanatory diagram illustrating a structure of a display device.
【図４】アクティブマトリクス駆動によってフルカラー
表示を行う有機ＥＬ表示装置の構造を示す説明図であ
る。FIG. 4 is an explanatory diagram illustrating a structure of an organic EL display device that performs full-color display by active matrix driving.
【図５】図４におけるｘｘ断面の概略図である。FIG. 5 is a schematic view of an xx section in FIG. 4;
１ 基板 ２ 第１電極 ３ 絶縁膜 ４ 有機層 ４０ 正孔注入層 ４１ 正孔輸送層 ４２ａ，４２ｂ，４２ｃ 発光層 ４３ａ，４３ｂ，４３ｃ 電子輸送層 ４４，４４ａ，４４ｂ，４４ｃ 電子注入層 ４５ａ，４５ｂ，４５ｃ 発光領域 ４６ａ，４６ｂ 第１の電子輸送層 ４７ 第２の電子輸送層 ５，５０，５１，５２ 第２電極 ６ 絶縁膜 ６０ａ，６０ｂ，６０ｃ （各色毎に選択された）領域 DESCRIPTION OF SYMBOLS 1 Substrate 2 1st electrode 3 Insulating film 4 Organic layer 40 Hole injection layer 41 Hole transport layer 42a, 42b, 42c Light emitting layer 43a, 43b, 43c Electron transport layer 44,44a, 44b, 44c Electron injection layer 45a, 45b , 45c Light emitting areas 46a, 46b First electron transport layer 47 Second electron transport layer 5, 50, 51, 52 Second electrode 6 Insulating film 60a, 60b, 60c (selected for each color)
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０５Ｂ 33/22 Ｈ０５Ｂ 33/22 Ｄ Ｚ ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat ゛ (Reference) H05B 33/22 H05B 33/22 D Z
Claims (6)
第１電極上に形成した正孔輸送層，ＲＧＢ何れかの色を
発光する発光層及び電子輸送層を含む有機層と、該有機
層上を覆って形成された第２電極とからなる有機ＥＬ表
示装置において、 前記有機層は各色毎に選択された領域を連ねた層に形成
され、前記第２電極は、その膜厚を前記有機層における
発光層と電子輸送層とを加えた各色膜厚の中での最大値
より大きい膜厚値とすることを特徴とする有機ＥＬ表示
装置。1. A plurality of first electrodes formed on a substrate, and a hole transport layer formed on the first electrode, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer, In an organic EL display device including a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, and the second electrode has a film thickness of Is larger than the maximum value among the thicknesses of the respective colors obtained by adding the light emitting layer and the electron transport layer in the organic layer.
第１電極上に形成した正孔輸送層，ＲＧＢ何れかの色を
発光する発光層及び電子輸送層を含む有機層と、該有機
層上を覆って形成された第２電極とからなる有機ＥＬ表
示装置において、 前記有機層は各色毎に選択された領域を連ねた層に形成
され、前記電子輸送層は各色毎に選択された領域に形成
される第１の層と各色共通に形成される第２の層とから
なることを特徴とする有機ＥＬ表示装置。2. A plurality of first electrodes formed on a substrate, an organic layer including a hole transport layer formed on the first electrode, a light emitting layer emitting any one of RGB colors and an electron transport layer, In an organic EL display device including a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, and the electron transport layer is selected for each color. An organic EL display device comprising: a first layer formed in a defined region; and a second layer formed commonly for each color.
１電極上に正孔輸送層，ＲＧＢ何れかの色を発光する発
光層及び電子輸送層を含む有機層を形成し、該有機層上
を覆って第２電極を形成する有機ＥＬ表示装置の製造方
法において、 前記有機層を各色毎に選択した領域を連ねた層に形成
し、前記第２電極を、前記有機層における発光層と電子
輸送層とを加えた各色膜厚の中での最大値より大きい膜
厚となるように、前記有機層上に蒸着することを特徴と
する有機ＥＬ表示装置の製造方法。3. A plurality of first electrodes are formed on a substrate, and a hole transport layer, a light emitting layer emitting any one of RGB colors, and an organic layer including an electron transport layer are formed on the first electrodes, In a method for manufacturing an organic EL display device, wherein a second electrode is formed over the organic layer, the organic layer is formed as a layer formed by connecting regions selected for each color, and the second electrode is formed on the organic layer. A method for manufacturing an organic EL display device, comprising: depositing a film on the organic layer so as to have a film thickness larger than the maximum value among the respective color film thicknesses including the light emitting layer and the electron transport layer.
１電極上に正孔輸送層，ＲＧＢ何れかの色を発光する発
光層及び電子輸送層を含む有機層を形成し、該有機層上
を覆って第２電極を形成する有機ＥＬ表示装置の製造方
法において、 前記有機層を各色毎に選択した領域を連ねた層に形成す
るにあたって、各色毎に選択された領域に第１の電子輸
送層を蒸着した後、各色共通に第２の電子輸送層を一様
に蒸着することを特徴とする有機ＥＬ表示装置の製造方
法。4. A plurality of first electrodes are formed on a substrate, and a hole transport layer, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer are formed on the first electrodes, In a method of manufacturing an organic EL display device, wherein a second electrode is formed over the organic layer, the organic layer is formed as a continuous layer of regions selected for each color. A method for manufacturing an organic EL display device, comprising, after depositing one electron transport layer, uniformly depositing a second electron transport layer for each color.
１電極上に正孔輸送層，ＲＧＢ何れかの色を発光する発
光層及び電子輸送層を含む有機層を形成し、該有機層上
を覆って第２電極を形成する有機ＥＬ表示装置の製造方
法において、 前記有機層を各色毎に選択した領域を連ねた層に形成す
るにあたって、各色毎に選択された領域に第１の電子輸
送層を蒸着した後、各色共通に第２の電子輸送層を一様
に蒸着し、 前記第２電極が、前記有機層における発光層と電子輸送
層とを加えた各色膜厚の中での最大値より大きい膜厚と
なるように、前記有機層上に蒸着されることを特徴とす
る有機ＥＬ表示装置の製造方法。5. A method according to claim 5, wherein a plurality of first electrodes are formed on the substrate, and a hole transport layer, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer are formed on the first electrodes; In a method of manufacturing an organic EL display device, wherein a second electrode is formed over the organic layer, the organic layer is formed as a continuous layer of regions selected for each color. After depositing one electron transport layer, a second electron transport layer is uniformly deposited for each color, and the second electrode has a thickness of each color obtained by adding the light emitting layer and the electron transport layer in the organic layer. A method of manufacturing an organic EL display device, wherein the organic EL display device is deposited on the organic layer so as to have a film thickness larger than the maximum value in the inside.
てなされることを特徴とする請求項３〜５のいずれか１
項に記載の有機ＥＬ表示装置の製造方法。6. The method according to claim 3, wherein the second electrode is formed by oblique deposition.
13. The method for manufacturing an organic EL display device according to item 10.
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|---|---|---|---|
| JP2001169650A JP2002367787A (en) | 2001-06-05 | 2001-06-05 | Organic el display device and its manufacturing method |
| KR1020020027840A KR100789199B1 (en) | 2001-06-05 | 2002-05-20 | Organic electro-luminescent display apparatus and method for manufacturing the same |
| CN02122124A CN1391424A (en) | 2001-06-05 | 2002-05-31 | Organic EL display device and its manufacture |
| TW091111764A TW541856B (en) | 2001-06-05 | 2002-05-31 | Organic electro-luminescent display apparatus and method for manufacturing the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001169650A JP2002367787A (en) | 2001-06-05 | 2001-06-05 | Organic el display device and its manufacturing method |
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|---|---|
| JP2002367787A true JP2002367787A (en) | 2002-12-20 |
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ID=19011697
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|---|---|---|---|
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| Country | Link |
|---|---|
| JP (1) | JP2002367787A (en) |
| KR (1) | KR100789199B1 (en) |
| CN (1) | CN1391424A (en) |
| TW (1) | TW541856B (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN1391424A (en) | 2003-01-15 |
| KR20020092793A (en) | 2002-12-12 |
| TW541856B (en) | 2003-07-11 |
| KR100789199B1 (en) | 2007-12-31 |
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