JP2002356464A5 - - Google Patents
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- JP2002356464A5 JP2002356464A5 JP2001161528A JP2001161528A JP2002356464A5 JP 2002356464 A5 JP2002356464 A5 JP 2002356464A5 JP 2001161528 A JP2001161528 A JP 2001161528A JP 2001161528 A JP2001161528 A JP 2001161528A JP 2002356464 A5 JP2002356464 A5 JP 2002356464A5
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- JP
- Japan
- Prior art keywords
- acid
- purity
- producing
- aminopolycarboxylic
- aminopolycarboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002253 acid Substances 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 4
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000003637 basic solution Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- DCCWEYXHEXDZQW-BYPYZUCNSA-N (2s)-2-[bis(carboxymethyl)amino]butanedioic acid Chemical compound OC(=O)C[C@@H](C(O)=O)N(CC(O)=O)CC(O)=O DCCWEYXHEXDZQW-BYPYZUCNSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- DMQQXDPCRUGSQB-UHFFFAOYSA-N 2-[3-[bis(carboxymethyl)amino]propyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCCN(CC(O)=O)CC(O)=O DMQQXDPCRUGSQB-UHFFFAOYSA-N 0.000 description 1
- UWRBFYBQPCJRRL-UHFFFAOYSA-N 3-[bis(carboxymethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CC(O)=O)CC(O)=O UWRBFYBQPCJRRL-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
【特許請求の範囲】
【請求項１】（１）原料のアミノポリカルボン酸を金属を有しない塩基性溶液に溶解する工程と、（２）次いで、酸により中和晶析する工程を有することを特徴とするナトリウムの含有量が５０ｐｐｍ以下である高純度アミノポリカルボン酸の製造方法。
【請求項２】アミノポリカルボン酸が、エチレンジアミン四酢酸、ニトリロトリ酢酸、プロパンジアミン四酢酸、ジエチレントリアミン五酢酸、β−アラニン−Ｎ，Ｎ−二酢酸、グルタミン酸−Ｎ，Ｎ−二酢酸、エチレンジアミン−Ｎ，Ｎ’−二こはく酸、アスパラギン酸−Ｎ，Ｎ−二酢酸及びα−アラニン−Ｎ，Ｎ−二酢酸からなる群より選ばれた少なくとも１種であることを特徴とする請求項１に記載の高純度アミノポリカルボン酸の製造方法。
【請求項３】 中和晶析後、（３）固液分離し、結晶を洗浄する工程を有することを特徴とする請求項１または２に記載の高純度アミノポリカルボン酸の製造方法。
【請求項４】 （１）の工程の塩基性溶液がアンモニア水溶液であることを特徴とする請求項１乃至３のいずれかに記載の高純度アミノポリカルボン酸の製造方法。
【請求項５】 （２）の工程で使用する酸が鉱酸であることを特徴とする請求項１乃至４のいずれかに記載の高純度アミノポリカルボン酸の製造方法。
【請求項６】 （２）の工程で使用する鉱酸が硝酸であることを特徴とする請求項５に記載の高純度アミノポリカルボン酸の製造方法。
【請求項７】原料のアミノポリカルボン酸水溶液を強酸性イオン交換樹脂に通液することを特徴とするナトリウムの含有量が５０ｐｐｍ以下である高純度アミノポリカルボン酸の製造方法。
【請求項８】 請求項１乃至７のいずれかに記載の製造方法により製造した高純度アミノポリカルボン酸またはその溶液と金属を実質的に含まないアミン誘導体またはその溶液を混合して形成させることを特徴とする高純度アミノポリカルボン酸の塩の製造方法。
【請求項９】 アミン誘導体が下記一般式（１）に記載のアミン誘導体であることを特徴とする請求項８に記載の高純度アミノポリカルボン酸の塩の製造方法。
ＮＲ1Ｒ2Ｒ3 （１）
（式中Ｒ1、Ｒ2、Ｒ3は、それぞれ独立に水素あるいは枝分かれしていてもよくさらに置換基を有していてもよい炭素数１〜１０のアルキル基（但し、置換基は水酸基、アルコキシ基、ＮＲ4Ｒ5（Ｒ4、Ｒ5は、それぞれ独立に水素、枝分かれしていてもよい炭素数１〜４のアルキル基を示す。）、チオール基または枝分かれしていてもよい炭素数１〜４のアルキルチオール基を示す。）を示す。）
【請求項１０】 アミン誘導体が、アンモニア、トリエチルアミン、トリエタノールアミン、エチレンジアミン、ジエチレントリアミンであることを特徴とする請求項９に記載の高純度アミノポリカルボン酸の塩の製造方法。
【請求項１１】 請求項１乃至７のいずれかに記載の製造方法により製造した高純度アミノポリカルボン酸またはその溶液と他の金属を実質的に含まない金属化合物またはその溶液を混合して形成させることを特徴とする高純度アミノポリカルボン酸の金属塩の製造方法。
【請求項１２】 金属化合物またはその溶液の金属がカリウムであることを特徴とする請求項１１に記載の高純度アミノポリカルボン酸の金属塩の製造方法。
[Claims]
1. A process for dissolving a raw material aminopolycarboxylic acid in a basic solution having no metal, and (2) a process of neutralizing and crystallizing with an acid . A method for producing a high-purity aminopolycarboxylic acid having a content of 50 ppm or less .
2. The aminopolycarboxylic acid is ethylenediaminetetraacetic acid, nitrilotriacetic acid, propanediaminetetraacetic acid, diethylenetriaminepentaacetic acid, β-alanine-N, N-diacetate, glutamic acid-N, N-diacetic acid, ethylenediamine-N. , N '- disuccinic acid, aspartic acid -N, N- diacetic acid and α- alanine -N, according to claim 1, characterized in that at least one member selected from the group consisting of N- diacetic acid For producing a high-purity aminopolycarboxylic acid.
3. Neutralization after crystallization, (3) solid-liquid separation, high purity manufacturing method of aminopolycarboxylic acid of claim 1 or 2 characterized by having a step of washing the crystals.
4. (1) high purity method for producing amino polycarboxylic acid according to any one of claims 1 to 3 basic solution process is characterized in that the aqueous ammonia solution.
5. (2) High production method purity aminopolycarboxylic acid according to any one of claims 1 to 4 step acid used in is characterized in that the mineral acid.
6. The method for producing a high-purity aminopolycarboxylic acid according to claim 5 , wherein the mineral acid used in the step (2) is nitric acid.
7. A method for producing a high-purity aminopolycarboxylic acid having a sodium content of 50 ppm or less, characterized by passing an aqueous aminopolycarboxylic acid solution as a raw material through a strongly acidic ion exchange resin.
8. A method comprising mixing a high-purity aminopolycarboxylic acid or a solution thereof produced by the production method according to any one of claims 1 to 7 with an amine derivative or a solution thereof substantially containing no metal. A method for producing a salt of a high-purity aminopolycarboxylic acid, characterized by comprising:
9. The method for producing a salt of a high-purity aminopolycarboxylic acid according to claim 8 , wherein the amine derivative is an amine derivative represented by the following general formula (1).
NR 1 R 2 R 3 (1)
(Wherein R 1 , R 2 , and R 3 are each independently hydrogen or an alkyl group having 1 to 10 carbon atoms which may be branched or further have a substituent (provided that the substituent is a hydroxyl group, An alkoxy group, NR 4 R 5 (R 4 and R 5 each independently represent hydrogen, an optionally branched alkyl group having 1 to 4 carbon atoms), a thiol group or an optionally branched carbon number 1 to 4 alkyl thiol groups.)
10. The method for producing a salt of a high-purity aminopolycarboxylic acid according to claim 9 , wherein the amine derivative is ammonia, triethylamine, triethanolamine, ethylenediamine, or diethylenetriamine.
11. formed by mixing a metal compound or a solution thereof is substantially free of high purity aminopolycarboxylic acid or a solution thereof with other metals produced by the method according to any one of claims 1 to 7 A method for producing a metal salt of a high-purity aminopolycarboxylic acid, characterized in that:
12. The method for producing a metal salt of a high-purity aminopolycarboxylic acid according to claim 11 , wherein the metal of the metal compound or the solution thereof is potassium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001161528A JP2002356464A (en) | 2001-05-30 | 2001-05-30 | High-purity aminopolycarboxylic acid, its salt, and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001161528A JP2002356464A (en) | 2001-05-30 | 2001-05-30 | High-purity aminopolycarboxylic acid, its salt, and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002356464A JP2002356464A (en) | 2002-12-13 |
| JP2002356464A5 true JP2002356464A5 (en) | 2008-06-26 |
Family
ID=19004787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001161528A Pending JP2002356464A (en) | 2001-05-30 | 2001-05-30 | High-purity aminopolycarboxylic acid, its salt, and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002356464A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2176213B1 (en) | 2007-08-17 | 2012-11-14 | Akzo Nobel N.V. | Alkali metal salt of glutamic acid n,n-diacetic acid, a process to prepare such salt, and the use thereof |
| WO2012080299A1 (en) | 2010-12-17 | 2012-06-21 | Akzo Nobel Chemicals International B.V. | Ammonium salts of chelating agents and their use in oil and gas field applications |
| AU2011200525B8 (en) | 2010-12-17 | 2016-10-13 | Akzo Nobel Chemicals International B.V. | Environmentally friendly stimulation fluids, processes to create wormholes in carbonate reservoirs, and processes to remove wellbore damage in carbonate reservoirs |
| WO2014090942A1 (en) | 2012-12-14 | 2014-06-19 | Akzo Nobel Chemicals International B.V. | Crystalline particles of glutamic acid n,n-diacetic acid |
| EP2931700B1 (en) * | 2012-12-14 | 2019-08-28 | Nouryon Chemicals International B.V. | Crystalline particles of salts of glutamic acid n,n-diacetic acid |
| CN103058878B (en) * | 2013-01-14 | 2014-08-13 | 聂世保 | 1, 3-allyl ethylene diamine tetraacetic acid as well as preparation method and application thereof |
| BR112017006799B1 (en) | 2014-10-17 | 2021-11-23 | Halliburton Energy Services, Inc | METHOD OF TREATMENT OF AN UNDERGROUND FORMATION, PROCESS FOR THE SYNTHESIS OF A COMPOUND, AND, SYSTEM FOR CARRYING OUT THE METHOD |
| MX2018014197A (en) | 2016-06-30 | 2019-02-25 | Halliburton Energy Services Inc | Sulfonated iminodialkanoic acids formed from an iminodialkylnitrile and a sultone and methods for use thereof. |
| JP7138626B2 (en) * | 2016-09-27 | 2022-09-16 | カムルス エービー | Mixtures and formulations containing alkylammonium EDTA salts |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3887846B2 (en) * | 1996-07-04 | 2007-02-28 | 三菱化学株式会社 | High-purity ethylenediaminedioltohydroxyphenylacetic acid and surface treatment composition using the same |
| JP3228211B2 (en) * | 1997-01-27 | 2001-11-12 | 三菱化学株式会社 | Surface treatment composition and substrate surface treatment method using the same |
-
2001
- 2001-05-30 JP JP2001161528A patent/JP2002356464A/en active Pending
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