JP2001266644A - Conductive paste - Google Patents
Conductive pasteInfo
- Publication number
- JP2001266644A JP2001266644A JP2000083205A JP2000083205A JP2001266644A JP 2001266644 A JP2001266644 A JP 2001266644A JP 2000083205 A JP2000083205 A JP 2000083205A JP 2000083205 A JP2000083205 A JP 2000083205A JP 2001266644 A JP2001266644 A JP 2001266644A
- Authority
- JP
- Japan
- Prior art keywords
- conductive paste
- solvent
- conductive
- weight
- binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002904 solvent Substances 0.000 claims abstract description 48
- 239000000843 powder Substances 0.000 claims abstract description 44
- 239000011230 binding agent Substances 0.000 claims abstract description 35
- 238000001704 evaporation Methods 0.000 claims abstract description 12
- 230000008020 evaporation Effects 0.000 claims abstract description 12
- 238000009835 boiling Methods 0.000 claims abstract description 9
- 239000003822 epoxy resin Substances 0.000 claims description 20
- 229920000647 polyepoxide Polymers 0.000 claims description 20
- 239000003795 chemical substances by application Substances 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 14
- 239000007787 solid Substances 0.000 claims description 4
- 239000012046 mixed solvent Substances 0.000 claims description 2
- 238000013329 compounding Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 22
- 238000002156 mixing Methods 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 8
- 239000004020 conductor Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- -1 butyl glycidyl ether Chemical compound 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CUVLMZNMSPJDON-UHFFFAOYSA-N 1-(1-butoxypropan-2-yloxy)propan-2-ol Chemical compound CCCCOCC(C)OCC(C)O CUVLMZNMSPJDON-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ZOMATQMEHRJKLO-UHFFFAOYSA-N 1h-imidazol-2-ylmethanol Chemical compound OCC1=NC=CN1 ZOMATQMEHRJKLO-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- MTVLEKBQSDTQGO-UHFFFAOYSA-N 2-(2-ethoxypropoxy)propan-1-ol Chemical compound CCOC(C)COC(C)CO MTVLEKBQSDTQGO-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- YCUKMYFJDGKQFC-UHFFFAOYSA-N 2-(octan-3-yloxymethyl)oxirane Chemical compound CCCCCC(CC)OCC1CO1 YCUKMYFJDGKQFC-UHFFFAOYSA-N 0.000 description 1
- HJEORQYOUWYAMR-UHFFFAOYSA-N 2-[(2-butylphenoxy)methyl]oxirane Chemical compound CCCCC1=CC=CC=C1OCC1OC1 HJEORQYOUWYAMR-UHFFFAOYSA-N 0.000 description 1
- CUFXMPWHOWYNSO-UHFFFAOYSA-N 2-[(4-methylphenoxy)methyl]oxirane Chemical compound C1=CC(C)=CC=C1OCC1OC1 CUFXMPWHOWYNSO-UHFFFAOYSA-N 0.000 description 1
- HPILSDOMLLYBQF-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COC(CCC)OCC1CO1 HPILSDOMLLYBQF-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- KIJZLYJZVNDFSJ-UHFFFAOYSA-N CCC(CCOCCC(CC)OC)OC Chemical compound CCC(CCOCCC(CC)OC)OC KIJZLYJZVNDFSJ-UHFFFAOYSA-N 0.000 description 1
- VQAJOWJEGHKRHX-UHFFFAOYSA-N CCOCC(C)OCC(C)OC(C)C Chemical compound CCOCC(C)OCC(C)OC(C)C VQAJOWJEGHKRHX-UHFFFAOYSA-N 0.000 description 1
- SWCIBYZQKLHRHZ-UHFFFAOYSA-N COCC(C)OCC(C)OC(C)C Chemical compound COCC(C)OCC(C)OC(C)C SWCIBYZQKLHRHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- VIQAPEDAHOSNGW-UHFFFAOYSA-N OC=1C(=C2C(=C3C=CC=CC=13)C1C(COCC3C2O3)O1)O Chemical compound OC=1C(=C2C(=C3C=CC=CC=13)C1C(COCC3C2O3)O1)O VIQAPEDAHOSNGW-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-L adipate(2-) Chemical compound [O-]C(=O)CCCCC([O-])=O WNLRTRBMVRJNCN-UHFFFAOYSA-L 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Conductive Materials (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Paints Or Removers (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ビルドアップ多層
プリント配線板などの層間接続用の貫通孔又は非貫通孔
に埋め込むための導電ペーストに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste for embedding in a through-hole or a non-through-hole for interlayer connection of a build-up multilayer printed wiring board or the like.
【0002】[0002]
【従来の技術】従来の多層プリント配線板は、加熱加圧
による多層化積層工程を経て製造された多層基板に、層
間接続用の貫通孔又は非貫通孔を形成した後、その孔に
めっきを行うか導電ペーストを印刷又は図1に示すよう
に埋め込むなどの方法で製造していた。図1において1
は導電ペースト及び2は銅箔である。2. Description of the Related Art In a conventional multilayer printed wiring board, a through-hole or a non-through-hole for interlayer connection is formed in a multilayer board manufactured through a multi-layer lamination process by heating and pressing, and then plating is performed on the hole. It is manufactured by printing or embedding a conductive paste as shown in FIG. In FIG. 1, 1
Is a conductive paste and 2 is a copper foil.
【0003】一般的に孔埋め導電ペーストは、乾燥、硬
化過程での体積減少による孔の壁面とペースト間にすき
間が生じたり、溶剤の乾燥や樹脂の硬化で発生するガス
によるボイドの発生は好ましくないため、無溶剤で、か
つエポキシ樹脂を主成分とした導電ペーストを用いてい
た。[0003] Generally, it is preferable that the hole-filling conductive paste generate a gap between the wall surface of the hole and the paste due to a decrease in volume during the drying and curing processes, and the generation of voids due to gas generated by drying of the solvent or curing of the resin. Therefore, a conductive paste containing no solvent and containing an epoxy resin as a main component has been used.
【0004】しかし、エポキシ樹脂はフェノール樹脂な
どと比較すると、熱による硬化収縮量が低いため、エポ
キシ樹脂を主成分とする導電ペーストの抵抗は低くなり
にくいという欠点があった。抵抗を低くするためには、
導電ペーストにおける導電粉の割合を多くするか、銀な
ど高導電性の金属粉を使用すればその欠点を補うことは
可能であるが、導電ペーストも高価になってしまう。[0004] However, compared with phenolic resins and the like, epoxy resins have a small amount of heat-induced shrinkage, and thus have the drawback that the resistance of the conductive paste containing epoxy resin as a main component is not easily reduced. To lower the resistance,
If the proportion of the conductive powder in the conductive paste is increased or a highly conductive metal powder such as silver is used, the disadvantage can be compensated for, but the conductive paste also becomes expensive.
【0005】[0005]
【発明が解決しようとする課題】請求項1記載の発明
は、安価でかつ導電性に優れる導電ペーストを提供する
ものである。請求項2、3、4、5及び6記載の発明
は、導電性の向上効果に優れる導電ペーストを提供する
ものである。An object of the present invention is to provide a conductive paste which is inexpensive and has excellent conductivity. The inventions according to claims 2, 3, 4, 5, and 6 provide a conductive paste having an excellent effect of improving conductivity.
【0006】[0006]
【課題を解決するための手段】本発明は、バインダ、導
電粉及び蒸発速度が30以下(0を除く)の溶剤を含有
してなる導電ペーストに関する。また、本発明は、溶剤
の沸点が150〜260℃である導電ペーストに関す
る。また、本発明は、溶剤が、1種又は2種以上の混合
溶剤である導電ペーストに関する。SUMMARY OF THE INVENTION The present invention relates to a conductive paste containing a binder, conductive powder and a solvent having an evaporation rate of 30 or less (excluding 0). Further, the present invention relates to a conductive paste in which the solvent has a boiling point of 150 to 260 ° C. Further, the present invention relates to a conductive paste in which the solvent is one kind or a mixed solvent of two or more kinds.
【0007】また、本発明は、溶剤が、導電ペーストに
対して2〜10重量%含有してなる導電ペーストに関す
る。また、本発明は、バインダが、エポキシ樹脂組成物
及びその硬化剤を含むものからなる導電ペーストに関す
る。さらに、本発明は、バインダと導電粉の配合割合
が、導電ペーストの固形分に対してバインダが5〜15
重量%及び導電粉が85〜95重量%である導電ペース
トに関する。[0007] The present invention also relates to a conductive paste containing a solvent in an amount of 2 to 10% by weight based on the conductive paste. Further, the present invention relates to a conductive paste comprising a binder containing an epoxy resin composition and a curing agent thereof. Further, in the present invention, the mixing ratio of the binder and the conductive powder is such that the binder is 5 to 15 with respect to the solid content of the conductive paste.
% Of the conductive paste and 85 to 95% by weight of the conductive powder.
【0008】[0008]
【発明の実施の形態】一般的に孔埋め導電ペーストには
溶剤を含まない無溶剤型の導電ペーストを用いるが、溶
剤を含有させることにより導電性が向上し、バラツキも
少なくなる。溶剤を含有している導電ペーストは、溶剤
を含有していない導電ペーストより、印刷、塗布したと
きと熱処理を行い硬化させた後の導電ペーストの体積減
少量が溶剤を含んでいる分だけ大きい。また、熱処理を
行う過程で溶剤を含有している導電ペーストの方が、導
電ペーストの粘度が大きく低下し、導電ペーストに含ま
れている導電粉が導電体層内で緻密になる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Generally, a solvent-free conductive paste containing no solvent is used as a conductive paste for filling holes. By including a solvent, conductivity is improved and variation is reduced. The conductive paste containing a solvent has a larger volume reduction than the conductive paste not containing a solvent when printed and applied and after being cured by heat treatment by the amount of the solvent. In the heat treatment process, the viscosity of the conductive paste containing the solvent is significantly reduced in the conductive paste containing the solvent, and the conductive powder contained in the conductive paste becomes dense in the conductive layer.
【0009】これらの要因のため、溶剤を含有している
導電ペーストは、溶剤を含有していない導電ペーストに
比較して、導電性が良好になり、バラツキも少なくなる
ものと考えられる。溶剤は、熱処理時の導電ペーストの
粘度低下が大きい溶剤ほど好ましく、逆に乾燥性が速
く、熱処理時溶剤の乾燥が進み、導電ペーストの粘度低
下が小さい溶剤は好ましくない。Due to these factors, it is considered that the conductive paste containing a solvent has better conductivity and less variation than the conductive paste containing no solvent. The solvent is preferably a solvent having a large decrease in the viscosity of the conductive paste at the time of heat treatment. Conversely, a solvent having a high drying property, drying of the solvent at the time of heat treatment progressing, and a small decrease in the viscosity of the conductive paste is not preferred.
【0010】上記の理由により、本発明に用いられる溶
剤は、蒸発速度が30以下、好ましくは28以下、さら
に好ましくは25以下(いずれも0は含まず)の溶剤を
用いることが必要とされ、30を越える溶剤を用いる
と、導電ペーストの印刷塗布〜熱処理工程中の溶剤の乾
燥が速いため、導電ペーストの粘度低下が小さい。その
ため、導電粉が導電体層内で緻密にならず、熱処理後の
導電性が低下し、バラツキが大きくなる。なお、本発明
において蒸発速度とは、温度が25℃及び相対湿度が5
5%RHの条件のときの酢酸ブチルの単位時間あたりの
重量減少量を100とした場合の相対速度を示す。For the above reasons, it is necessary to use a solvent having an evaporation rate of 30 or less, preferably 28 or less, more preferably 25 or less (both not including 0) as the solvent used in the present invention. When a solvent exceeding 30 is used, since the drying of the solvent during the printing and the heat treatment process of the conductive paste is fast, the decrease in the viscosity of the conductive paste is small. Therefore, the conductive powder does not become dense in the conductor layer, and the conductivity after the heat treatment is reduced, and the dispersion is increased. In the present invention, the evaporation rate means that the temperature is 25 ° C and the relative humidity is 5 ° C.
The relative speed is shown assuming that the weight loss of butyl acetate per unit time under the condition of 5% RH is 100.
【0011】蒸発速度は、本発明で用いる溶剤10gを
直径が90mmのガラスシャーレに滴下し、これを常温常
圧の雰囲気に1時間放置し、1時間後の溶剤乾燥重量減
少量をAとし、また酢酸ブチル10gを前記と同様直径
が90mmガラスシャーレに滴下し、これを常温常圧の雰
囲気に1時間放置し、1時間後の溶剤乾燥重量減少量を
Bとして、数1に示す式により求めることができる。The evaporation rate is determined by dropping 10 g of the solvent used in the present invention into a glass Petri dish having a diameter of 90 mm, leaving it for 1 hour in an atmosphere at normal temperature and normal pressure, and letting the amount of dry weight of the solvent after 1 hour be A, Also, 10 g of butyl acetate was dropped on a glass Petri dish having a diameter of 90 mm in the same manner as described above, and left for 1 hour in an atmosphere at normal temperature and normal pressure. be able to.
【0012】[0012]
【数1】 (Equation 1)
【0013】また、溶剤の沸点は、導電ペーストの粘度
低下の点で、150〜260℃の範囲であることが好ま
しく、170〜240℃の範囲であることがさらに好ま
しい。The boiling point of the solvent is preferably from 150 to 260 ° C., more preferably from 170 to 240 ° C., from the viewpoint of lowering the viscosity of the conductive paste.
【0014】上記の条件に適した溶剤としては、例えば
ジプロピレングリコールメチルエーテル、ジプロピレン
グリコールエチルエーテル、ジプロピレングリコールブ
チルエーテル、ジプロピレングリコールイソプロピルメ
チルエーテル、ジプロピレングリコールイソプロピルエ
チルエーテル、トリプロピレングリコールメチルエーテ
ル、プロピレングリコールターシャリ−ブチルエーテ
ル、プロピレングリコールエチルエーテルアセテート、
エチレングリコールエチルエーテルアセテート、エチレ
ングリコールブチルエーテル、ジエチレングリコールメ
チルエーテル、トリエチレングリコールメチルエーテ
ル、ジエチレングリコールエチルエーテル、エチレング
リコールブチルエーテル、ジエチレングリコールブチル
エーテル、3−メチル−3−メトキシブタノール、3−
メチル−3−メトキシブチルエーテル、乳酸エチル、乳
酸ブチルなどが挙げられる。Examples of the solvent suitable for the above conditions include dipropylene glycol methyl ether, dipropylene glycol ethyl ether, dipropylene glycol butyl ether, dipropylene glycol isopropyl methyl ether, dipropylene glycol isopropyl ethyl ether, and tripropylene glycol methyl ether. , Propylene glycol tert-butyl ether, propylene glycol ethyl ether acetate,
Ethylene glycol ethyl ether acetate, ethylene glycol butyl ether, diethylene glycol methyl ether, triethylene glycol methyl ether, diethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol butyl ether, 3-methyl-3-methoxybutanol, 3-
Examples thereof include methyl-3-methoxybutyl ether, ethyl lactate, and butyl lactate.
【0015】上記に示す溶剤は、1種又は必要に応じて
2種以上の溶剤を混合した溶剤が使用される。溶剤の含
有量は、導電性及び孔埋め充填性の点から導電ペースト
に対して2〜10重量%の範囲であることが好ましく、
2〜7.5重量%の範囲であることがさらに好ましい。As the solvent described above, one kind or a mixture of two or more kinds of solvents as required is used. The content of the solvent is preferably in the range of 2 to 10% by weight with respect to the conductive paste from the viewpoint of conductivity and filling and filling of holes.
More preferably, it is in the range of 2 to 7.5% by weight.
【0016】本発明におけるバインダは、エポキシ樹脂
組成物及びその硬化剤を含むものが用いられる。また、
エポキシ樹脂組成物としては、エポキシ樹脂及び可撓性
付与剤を含むものが用いられる。該エポキシ樹脂は、常
温で液状のものが好ましい。常温で結晶化するものは、
液状物と混合することで結晶化を回避できる。The binder used in the present invention contains an epoxy resin composition and its curing agent. Also,
As the epoxy resin composition, a composition containing an epoxy resin and a flexibility-imparting agent is used. The epoxy resin is preferably liquid at room temperature. What crystallizes at room temperature
Crystallization can be avoided by mixing with a liquid material.
【0017】本発明における常温で液状エポキシ樹脂と
は、例えば常温で固形のものでも常温で液状のエポキシ
樹脂と混合することで常温で安定して液状となるものも
含む。なお、本発明において、常温とは温度が約25℃
を示すものを意味する。The epoxy resin which is liquid at ordinary temperature in the present invention includes, for example, those which are solid at ordinary temperature and which become stable at ordinary temperature when mixed with epoxy resin which is liquid at ordinary temperature. In the present invention, the normal temperature means a temperature of about 25 ° C.
Means the following.
【0018】本発明に用いられるエポキシ樹脂は公知の
ものが用いられ、分子量中にエポキシ基を2個以上含有
する化合物、例えばビスフェノールA、ビスフェノール
AD、ビスフェノールF、ノボラック、クレゾールノボ
ラック類とエピクロルヒドリンとの反応により得られる
ポリグリシジルエーテル、ジヒドロキシナフタレンジグ
リシジルエーテル、ブタンジオールジグリシジルエーテ
ル、ネオペンチルグリコールジグリシジルエーテル等の
脂肪族エポキシ樹脂やジグリシジルヒダントイン等の複
素環式エポキシ、ビニルシクロヘキセンジオキサイド、
ジシクロペンタンジエンジオキサイド、アリサイクリッ
クジエポキシアジペイトのような脂環式エポキシ樹脂が
挙げられる。As the epoxy resin used in the present invention, a known epoxy resin is used, and a compound containing two or more epoxy groups in the molecular weight, for example, bisphenol A, bisphenol AD, bisphenol F, novolak, cresol novolaks and epichlorohydrin is used. Polyglycidyl ether obtained by the reaction, dihydroxynaphthalenediglycidyl ether, butanediol diglycidyl ether, heterocyclic epoxy such as diglycidyl hydantoin and aliphatic epoxy resin such as neopentyl glycol diglycidyl ether, vinyl cyclohexene dioxide,
Alicyclic epoxy resins such as dicyclopentanedienedoxide and alicyclic diepoxy adipate are exemplified.
【0019】可撓性付与剤も公知のものが用いられ、分
子量中にエポキシ基を1個だけ有する化合物、例えばn
−ブチルグリシジルエーテル、バーサティック酸グリシ
ジルエステル、スチレンオキサイド、エチルヘキシルグ
リシジルエーテル、フェニルグリシジルエーテル、クレ
ジルグリシジルエーテル、ブチルフェニルグリシジルエ
ーテル等のような通常のエポキシ樹脂が挙げられる。こ
れらのエポキシ樹脂及び可撓性付与剤は、単独または2
種以上を混合して用いることができる。As the flexibility-imparting agent, known ones are used, and compounds having only one epoxy group in the molecular weight, for example, n
And ordinary epoxy resins such as butyl glycidyl ether, versidic acid glycidyl ester, styrene oxide, ethylhexyl glycidyl ether, phenyl glycidyl ether, cresyl glycidyl ether, butylphenyl glycidyl ether and the like. These epoxy resins and flexibility imparting agents may be used alone or
A mixture of more than one species can be used.
【0020】バインダに添加される硬化剤としては、例
えばメンセンジアミン、イソフオロンジアミン、メタフ
ェニレンジアミン、ジアミノジフェニルメタン、ジアミ
ノジフェニルスルホン、メチレンジアニリン等のアミン
類、無水フタル酸、無水トリメリット酸、無水ピロメリ
ット酸、無水コハク酸、テトラヒドロ無水フタル酸等の
酸無水物、イミダゾール、ジシアンジアミド等の化合物
系硬化剤、ポリアミド樹脂、フェノール樹脂、尿素樹脂
等の樹脂系硬化剤が用いられるが、必要に応じて、潜在
性アミン硬化剤等の硬化剤と併用して用いてもよく、ま
た3級アミン、イミダゾール類、トリフェニルホスフィ
ン、テトラフェニルホスフェニルボレート等といった一
般にエポキシ樹脂とフェノール系硬化剤との硬化促進剤
として知られている化合物を添加してもよい。Examples of the curing agent to be added to the binder include amines such as mensendiamine, isophoronediamine, metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, phthalic anhydride, trimellitic anhydride, and the like. Pyromellitic anhydride, succinic anhydride, acid anhydrides such as tetrahydrophthalic anhydride, compound-based curing agents such as imidazole and dicyandiamide, and resin-based curing agents such as polyamide resins, phenol resins, and urea resins are used. Accordingly, it may be used in combination with a curing agent such as a latent amine curing agent, and generally, a tertiary amine, imidazoles, triphenyl phosphine, tetraphenyl phosphenyl borate, and the like are generally used in combination with an epoxy resin and a phenolic curing agent. Known as a curing accelerator The compound may be added.
【0021】これらの硬化剤の含有量は、導電ペースト
硬化物のガラス転移点(以下Tgとする)の点でエポキ
シ樹脂100重量部に対して0.1〜20重量部の範囲
であることが好ましく、1〜10重量部の範囲であるこ
とがさらに好ましい。The content of these curing agents may be in the range of 0.1 to 20 parts by weight based on 100 parts by weight of the epoxy resin in terms of the glass transition point (hereinafter referred to as Tg) of the cured conductive paste. Preferably, it is more preferably in the range of 1 to 10 parts by weight.
【0022】本発明に用いられるバインダには、上記の
材料以外に必要に応じてチキソ剤、カップリング剤、消
泡剤、粉末表面処理剤、沈降防止剤等を添加して均一に
混合して得られる。必要に応じて添加されるチキソ剤、
カップリング剤、消泡剤、粉末表面処理剤、沈降防止剤
等の含有量は、導電ペーストに対して0.01〜1重量
%の範囲であることが好ましく、0.03〜0.5重量
%の範囲であることがさらに好ましい。To the binder used in the present invention, a thixo agent, a coupling agent, a defoaming agent, a powder surface treating agent, an anti-settling agent, etc. are added, if necessary, in addition to the above-mentioned materials, followed by uniform mixing. can get. Thixotropic agents added as needed,
The content of the coupling agent, the defoaming agent, the powder surface treating agent, the anti-settling agent and the like is preferably in the range of 0.01 to 1% by weight based on the conductive paste, and is preferably 0.03 to 0.5% by weight. % Is more preferable.
【0023】導電粉は、銀粉、銅粉又は銅合金粉を用
い、その粒径は小さいほど好ましく、例えば平均粒径が
1〜20μm、好ましくは1〜10μmの粉体が好まし
い。導電粉は接触点が少ないと抵抗が高くなり易い。導
電粒子同士の接触面積を大きくして高導電性を得るた
め、導電粉に衝撃を与えて粒子の形状を扁平状に変形す
ることが好ましいが、扁平状導電を使用した導電ペース
トは略球状導電粉を使用した導電ペーストに比較して粘
度が高くなり、埋め込み作業が困難になる。作業性及び
導電ペーストを孔に埋め込んだときの孔のY軸方向の導
電性という点からも略球状導電粉を使用した導電ペース
トの方が好ましい。As the conductive powder, silver powder, copper powder or copper alloy powder is used, and the smaller the particle size, the better. For example, a powder having an average particle size of 1 to 20 μm, preferably 1 to 10 μm is preferable. If the conductive powder has few contact points, the resistance tends to increase. In order to obtain high conductivity by increasing the contact area between the conductive particles, it is preferable to apply a shock to the conductive powder to deform the shape of the particles into a flat shape, but the conductive paste using flat conductive is substantially spherical conductive. The viscosity is higher than that of the conductive paste using powder, and the embedding work becomes difficult. A conductive paste using a substantially spherical conductive powder is more preferable in terms of workability and conductivity in the Y-axis direction of the hole when the conductive paste is embedded in the hole.
【0024】本発明における略球状導電粉としては、ア
スペクト比が1〜1.5及び長径の平均粒径が1〜20
μmの導電粉を用いることが好ましく、アスペクト比が
1〜1.3及び長径の平均粒径が1〜10μmの導電粉
を用いることがさらに好ましい。なお上記でいう平均粒
径は、レーザー散乱型粒度分布測定装置により測定する
ことができる。本発明においては、前記装置としてマス
ターサイザー(マルバン社製)を用いて測定した。The substantially spherical conductive powder of the present invention has an aspect ratio of 1 to 1.5 and an average long particle diameter of 1 to 20.
It is preferable to use conductive powder of μm, and it is more preferable to use conductive powder having an aspect ratio of 1 to 1.3 and a long diameter having an average particle diameter of 1 to 10 μm. The average particle size mentioned above can be measured by a laser scattering type particle size distribution measuring device. In the present invention, the measurement was performed using a master sizer (manufactured by Malvern) as the device.
【0025】本発明におけるアスペクト比とは、導電粉
の粒子の長径と短径の比率(長径/短径)をいう。本発
明においては、粘度の低い硬化性樹脂中に導電粉の粒子
をよく混合し、静置して粒子を沈降させるとともにその
まま樹脂を硬化させ、得られた硬化物を垂直方向に切断
し、その切断面に現れる粒子の形状を電子顕微鏡で拡大
して観察し、少なくとも100の粒子について一つ一つ
の粒子の長径/短径を求め、それらの平均値をもってア
スペクト比とする。The aspect ratio in the present invention refers to the ratio of the major axis to the minor axis (major axis / minor axis) of the conductive powder particles. In the present invention, the particles of the conductive powder are mixed well in the curable resin having a low viscosity, and the resin is cured while allowing the particles to settle by standing, and the obtained cured product is cut in the vertical direction. The shape of the particles appearing on the cut surface is observed under magnification with an electron microscope, and the major axis / minor axis of each particle is obtained for at least 100 particles, and the average value thereof is defined as the aspect ratio.
【0026】ここで、短径とは、前記切断面に現れる粒
子について、その粒子の外側に接する二つの平行線の組
み合わせ粒子を挟むように選択し、それらの組み合わせ
のうち最短間隔になる二つの平行線の距離である。一
方、長径とは、前記短径を決する平行線に直角方向の二
つの平行線であって、粒子の外側に接する二つの平行線
の組み合わせのうち、最長間隔になる二つの平行線の距
離である。これらの四つの線で形成される長方形は、粒
子がちょうどその中に納まる大きさとなる。なお、本発
明において行った具体的方法については後述する。Here, the minor axis is selected so that a particle appearing on the cut surface is sandwiched by a combination of two parallel lines contacting the outside of the particle, and two of the combinations having the shortest interval are selected. The distance between the parallel lines. On the other hand, the major axis is the two parallel lines perpendicular to the parallel line that determines the minor axis, and is the distance between the two parallel lines that are the longest among the combinations of the two parallel lines that contact the outside of the particle. is there. The rectangle formed by these four lines is sized to fit the particle exactly inside it. The specific method used in the present invention will be described later.
【0027】バインダと導電粉の配合割合は、導電ペー
ストの固形分に対してバインダが5〜15重量%及び導
電粉が85〜95重量%の範囲が好ましく、バインダが
7〜14重量%及び導電粉が86〜93重量%の範囲が
さらに好ましい。導電粉が85重量%未満の場合、導電
性が低下する傾向があり、導電粉が95重量%を越える
と、接着力及び導電ペーストの強度が低下する傾向があ
る。The mixing ratio of the binder and the conductive powder is preferably in the range of 5 to 15% by weight of the binder and 85 to 95% by weight of the solid content of the conductive paste, and 7 to 14% by weight of the binder and the conductive powder. More preferably, the powder is in the range of 86 to 93 wt%. When the conductive powder is less than 85% by weight, the conductivity tends to decrease, and when the conductive powder exceeds 95% by weight, the adhesive strength and the strength of the conductive paste tend to decrease.
【0028】本発明になる導電ペーストは、上記のバイ
ンダ、導電粉、蒸発速度が30以下(0を除く)の溶剤
等の材料を、らいかい機、ニーダー、三本ロール等を用
いて、均一に混合、分散して得ることができる。The conductive paste according to the present invention is prepared by uniformly mixing the above-mentioned materials such as the binder, the conductive powder, and the solvent having an evaporation rate of 30 or less (excluding 0) by using a grinder, kneader, three rolls or the like. Mixed and dispersed.
【0029】[0029]
【実施例】以下、本発明を実施例により説明する。 実施例1 ビスフェノールA型エポキシ樹脂(油化シェルエポキシ
(株)製、商品名エポコート827)80重量部、脂肪族
ジグリシジルエーテル(旭電化工業(株)製、商品名ED
−503)8重量部、2−フェニル−4−メチル−5−
ヒドロキシメチルイミダゾール(四国化成(株)製、商品
名キュアゾール2P4MHZ)8重量部及びジシアンジ
アミド4重量部を加えて均一に混合してバインダとし
た。The present invention will be described below with reference to examples. Example 1 Bisphenol A type epoxy resin (oiled shell epoxy)
80 parts by weight of an aliphatic diglycidyl ether (trade name: EDOPAT 827, manufactured by Asahi Denka Kogyo KK)
-503) 8 parts by weight, 2-phenyl-4-methyl-5-
8 parts by weight of hydroxymethylimidazole (trade name: Curesol 2P4MHZ, manufactured by Shikoku Chemicals Co., Ltd.) and 4 parts by weight of dicyandiamide were added and uniformly mixed to obtain a binder.
【0030】次にアトマイズ法で作製した平均粒径が
5.1μmの球状銅粉(日本アトマイズ加工(株)製、商
品名SFR−Cu)を希塩酸及び純水で洗浄した後、水
1リットルあたりAgCN80g及びNaCN75g含
むめっき溶液で球状銅粉に対して銀の量が18重量%に
なるように置換めっきを行い、水洗、乾燥して銀めっき
銅粉を得た。Next, spherical copper powder (trade name: SFR-Cu, manufactured by Nippon Atomize Processing Co., Ltd.) having an average particle size of 5.1 μm produced by an atomizing method was washed with dilute hydrochloric acid and pure water, and then washed per liter of water. Substitution plating was performed using a plating solution containing 80 g of AgCN and 75 g of NaCN so that the amount of silver was 18% by weight with respect to the spherical copper powder, washed with water and dried to obtain a silver-plated copper powder.
【0031】この後、2リットルのボールミル容器内に
上記で得た銀めっき銅粉750g及び直径が5mmのジル
コニアボール3kgを投入し、40分間回転させて、ア
スペクト比が平均1.3及び長径の平均粒径が5.5μ
mの略球状銀めっき銅粉を得た。得られた銀めっき銅粉
の粒子を5個取り出し、走査型オージェ電子分光分析装
置で定量分析して銅の露出面積について調べたところ1
0〜50%の範囲で平均が20%であった。Thereafter, 750 g of the silver-plated copper powder obtained above and 3 kg of zirconia balls having a diameter of 5 mm were put into a 2 liter ball mill container, and the mixture was rotated for 40 minutes. 5.5μ average particle size
m of substantially spherical silver-plated copper powder was obtained. Five particles of the obtained silver-plated copper powder were taken out and quantitatively analyzed by a scanning Auger electron spectrometer to examine the exposed area of copper.
The average was 20% in the range of 0-50%.
【0032】上記で得たバインダ65gに、上記で得た
略球状銀めっき銅粉450g及び溶剤として蒸発速度が
0.7で沸点が202℃のジエチレングリコールエチル
エーテル25gを加えて、撹拌らいかい機及び三本ロー
ルで均一に混合、分散して導電ペーストを得た。なお、
溶剤(ジエチレングリコールエチルエーテル)の含有量
は、導電ペーストに対して4.6重量%で、バインダと
導電粉(略球状銀めっき銅粉)の配合割合は、バインダ
が12.6重量%及び導電粉が87.4重量%であっ
た。To 65 g of the binder obtained above, 450 g of the substantially spherical silver-plated copper powder obtained above and 25 g of diethylene glycol ethyl ether having an evaporation rate of 0.7 and a boiling point of 202 ° C. as a solvent were added. The conductive paste was obtained by uniformly mixing and dispersing with a three-roll mill. In addition,
The content of the solvent (diethylene glycol ethyl ether) was 4.6% by weight based on the conductive paste, and the mixing ratio of the binder and the conductive powder (substantially spherical silver-plated copper powder) was 12.6% by weight of the binder and the conductive powder. Was 87.4% by weight.
【0033】次に上記で得た導電ペーストを用いて、予
め168℃でプレシュリンクさせたポリエチレンテレフ
タレートフィルム上に、図2に示すテストパターン3を
印刷し、大気中で80℃で1時間、さらに165℃で1
時間加熱処理を行い配線板を得た。得られた配線板の特
性を評価した結果、導体の比抵抗は最大値が47μΩ・
m、最小値が35μΩ・m及び平均値が39μΩ・mで
あった。Next, using the conductive paste obtained above, a test pattern 3 shown in FIG. 2 was printed on a polyethylene terephthalate film which had been preshrinked at 168 ° C. in advance, and was further heated at 80 ° C. for one hour in air. 1 at 165 ° C
Heat treatment was performed for a time to obtain a wiring board. As a result of evaluating the characteristics of the obtained wiring board, the maximum specific resistance of the conductor was 47 μΩ ·
m, the minimum value was 35 μΩ · m, and the average value was 39 μΩ · m.
【0034】なお、本実施例におけるアスペクト比の具
体的測定法を以下に示す。低粘度のエポキシ樹脂(ビュ
ーラー社製)の主剤(No.10−8130)8gと硬化
剤(No.10−8132)2gを混合し、ここへ導電粉
2gを混合して良く分散させ、そのまま30℃で真空脱
泡した後、10時間30℃で静置して粒子を沈降させ硬
化させた。その後、得られた硬化物を垂直方向に切断
し、切断面を電子顕微鏡で1000倍に拡大して切断面
に現れた150個の粒子について長径/短径を求め、そ
れらの平均値をもって、アスペクト比とした。The specific method of measuring the aspect ratio in this embodiment will be described below. 8 g of a base material (No. 10-8130) of a low-viscosity epoxy resin (manufactured by Buehler) and 2 g of a curing agent (No. 10-8132) are mixed, and 2 g of conductive powder is mixed and dispersed well, and the mixture is left as it is. After defoaming in vacuo at 10 ° C., the particles were allowed to stand at 30 ° C. for 10 hours to settle and harden the particles. Thereafter, the obtained cured product was cut in the vertical direction, the cut surface was magnified 1000 times with an electron microscope, and the long diameter / short diameter of 150 particles that appeared on the cut surface was obtained. Ratio.
【0035】実施例2 実施例1で得たバインダ50gに、実施例1で得た略球
状銀めっき銅粉450g及び溶剤として蒸発速度が7で
沸点が174℃の3−メチル−3−メトキシブタノール
35gを加えて、撹拌らいかい機及び三本ロールで均一
に混合、分散して導電ペーストを得た。なお、溶剤(3
−メチル−3−メトキシブタノール)の含有量は、導電
ペーストに対して6.5重量%で、バインダと導電粉
(略球状銀めっき銅粉)の配合割合は、バインダが10
重量%及び導電粉が90重量%であった。Example 2 To 50 g of the binder obtained in Example 1 was added 450 g of the substantially spherical silver-plated copper powder obtained in Example 1 and 3-methyl-3-methoxybutanol having an evaporation rate of 7 and a boiling point of 174 ° C. as a solvent. 35 g was added, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste. The solvent (3
-Methyl-3-methoxybutanol) was 6.5% by weight with respect to the conductive paste, and the mixing ratio of the binder and the conductive powder (substantially spherical silver-plated copper powder) was 10% for the binder.
% By weight and 90% by weight of conductive powder.
【0036】次に実施例1と同様の工程を経て配線板を
作製し特性を評価した結果、導体の比抵抗は最大値が6
2μΩ・m、最小値が49μΩ・m及び平均値が57μ
Ω・mであった。Next, as a result of fabricating a wiring board through the same steps as in Example 1 and evaluating the characteristics, the maximum specific resistance of the conductor was 6%.
2μΩ ・ m, minimum value is 49μΩ ・ m and average value is 57μ
Ω · m.
【0037】実施例3 実施例1で得たバインダ50gに、実施例1で得た略球
状銀めっき銅粉450g及び溶剤として蒸発速度が25
で沸点が151℃のプロピレングリコールターシャリ−
ブチルエーテル37gを加えて、撹拌らいかい機及び三
本ロールで均一に混合、分散して導電ペーストを得た。
なお、溶剤(プロピレングリコールターシャリ−ブチル
エーテル)の含有量は、導電ペーストに対して6.9重
量%で、バインダと導電粉(略球状銀めっき銅粉)の配
合割合は、バインダが10重量%及び導電粉が90重量
%であった。Example 3 To 50 g of the binder obtained in Example 1 was added 450 g of the substantially spherical silver-plated copper powder obtained in Example 1, and the evaporation rate was 25 as a solvent.
Propylene glycol tertiary with a boiling point of 151 ° C
37 g of butyl ether was added, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste.
The content of the solvent (propylene glycol tertiary butyl ether) was 6.9% by weight with respect to the conductive paste, and the mixing ratio of the binder and the conductive powder (substantially spherical silver-plated copper powder) was 10% by weight of the binder. And 90% by weight of conductive powder.
【0038】次に実施例1と同様の工程を経て配線板を
作製し特性を評価した結果、導体の比抵抗は最大値が7
2μΩ・m、最小値が44μΩ・m及び平均値が63μ
Ω・mであった。Next, a wiring board was manufactured through the same steps as in Example 1 and the characteristics were evaluated. As a result, the maximum specific resistance of the conductor was 7%.
2μΩ ・ m, minimum value is 44μΩ ・ m and average value is 63μ
Ω · m.
【0039】比較例1 実施例1で得たバインダ65gに、実施例1で得た略球
状銀めっき銅粉450gを加えて、撹拌らいかい機及び
三本ロールで均一に混合、分散して導電ペーストを得
た。なお、バインダと導電粉(略球状銀めっき銅粉)の
配合割合は、バインダが12.6重量%及び導電粉が8
7.4重量%であった。Comparative Example 1 450 g of the substantially spherical silver-plated copper powder obtained in Example 1 was added to 65 g of the binder obtained in Example 1, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill. A paste was obtained. The mixing ratio of the binder and the conductive powder (substantially spherical silver-plated copper powder) was 12.6% by weight for the binder and 8 for the conductive powder.
It was 7.4% by weight.
【0040】次に実施例1と同様の工程を経て配線板を
作製し特性を評価した結果、導体の比抵抗はバラツキが
大きく最大値が178μΩ・m、最小値が88μΩ・m
及び平均値が149μΩ・mであった。Next, as a result of fabricating a wiring board through the same steps as in Example 1 and evaluating the characteristics, the specific resistance of the conductor has a large variation and the maximum value is 178 μΩ · m and the minimum value is 88 μΩ · m.
And the average value was 149 μΩ · m.
【0041】比較例2 実施例1で得たバインダ65gに、実施例1で得た略球
状銀めっき銅粉450g及び溶剤として蒸発速度が46
で沸点が146℃のプロピレングリコールメチルエーテ
ルアセテート25gを加えて、撹拌らいかい機及び三本
ロールで均一に混合、分散して導電ペーストを得た。な
お、溶剤(プロピレングリコールメチルエーテルアセテ
ート)の含有量は、導電ペーストに対して4.6重量%
で、バインダと導電粉(略球状銀めっき銅粉)の配合割
合は、バインダが12.6重量%及び導電粉が87.4
重量%であった。COMPARATIVE EXAMPLE 2 450 g of the substantially spherical silver-plated copper powder obtained in Example 1 and a solvent having an evaporation rate of 46 g were added to 65 g of the binder obtained in Example 1.
Then, 25 g of propylene glycol methyl ether acetate having a boiling point of 146 ° C. was added, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste. The content of the solvent (propylene glycol methyl ether acetate) was 4.6% by weight based on the conductive paste.
The mixing ratio of the binder and the conductive powder (substantially spherical silver-plated copper powder) was 12.6% by weight for the binder and 87.4% for the conductive powder.
% By weight.
【0042】次に実施例1と同様の工程を経て配線板を
作製し特性を評価した結果、導体の比抵抗はバラツキが
大きく最大値が211μΩ・m、最小値が125μΩ・
m及び平均値が170μΩ・mであった。Next, as a result of fabricating a wiring board through the same steps as in Example 1 and evaluating the characteristics, the specific resistance of the conductor has a large variation and the maximum value is 211 μΩ · m, and the minimum value is 125 μΩ · m.
m and the average value were 170 μΩ · m.
【0043】比較例3 実施例1で得たバインダ50gに、実施例1で得た略球
状銀めっき銅粉450g及び溶剤として蒸発速度が32
で沸点が135℃のエチレングリコールエチルエーテル
25gを加えて、撹拌らいかい機及び三本ロールで均一
に混合、分散して導電ペーストを得た。なお、溶剤(エ
チレングリコールエチルエーテル)の含有量は、導電ペ
ーストに対して4.6重量%で、バインダと導電粉(略
球状銀めっき銅粉)の配合割合は、バインダが12.6
重量%及び導電粉が87.4重量%であった。Comparative Example 3 450 g of the substantially spherical silver-plated copper powder obtained in Example 1 and a solvent having an evaporation rate of 32 g were added to 50 g of the binder obtained in Example 1.
Then, 25 g of ethylene glycol ethyl ether having a boiling point of 135 ° C. was added, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste. The content of the solvent (ethylene glycol ethyl ether) was 4.6% by weight with respect to the conductive paste, and the mixing ratio of the binder and the conductive powder (substantially spherical silver-plated copper powder) was 12.6 in the binder.
% By weight and 87.4% by weight of conductive powder.
【0044】次に実施例1と同様の工程を経て配線板を
作製し特性を評価した結果、導体の比抵抗はバラツキが
大きく最大値が181μΩ・m、最小値が95μΩ・m
及び平均値が154μΩ・mであった。Next, as a result of fabricating a wiring board through the same steps as in Example 1 and evaluating the characteristics, the specific resistance of the conductor has a large variation and the maximum value is 181 μΩ · m and the minimum value is 95 μΩ · m.
And the average value was 154 μΩ · m.
【0045】[0045]
【発明の効果】請求項1記載の導電ペーストは、安価で
かつ導電性に優れる。請求項2、3、4、5及び6記載
の導電ペーストは、導電性の向上効果に優れる。The conductive paste according to claim 1 is inexpensive and has excellent conductivity. The conductive paste according to claims 2, 3, 4, 5, and 6 is excellent in the effect of improving conductivity.
【図1】多層プリント配線板の層間接続用の貫通孔を導
電ペーストで接続した状態を示す断面図である。FIG. 1 is a cross-sectional view showing a state in which through holes for interlayer connection of a multilayer printed wiring board are connected by a conductive paste.
【図2】ポリエチレンテレフタレートフィルム上に、テ
ストパターンを印刷した状態を示す平面図である。FIG. 2 is a plan view showing a state where a test pattern is printed on a polyethylene terephthalate film.
1 導電ペースト 2 銅箔 3 テストパターン 4 ポリエチレンテレフタレートフィルム DESCRIPTION OF SYMBOLS 1 Conductive paste 2 Copper foil 3 Test pattern 4 Polyethylene terephthalate film
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4E351 BB31 EE16 GG16 4J038 DA002 DA142 DB031 DB071 DB081 DB261 DH002 HA066 JA18 JA26 JA35 JA56 JB04 JB07 JB14 JB32 KA03 KA12 KA20 LA03 MA06 MA09 NA20 PA19 PB09 PC08 5E317 BB12 BB14 BB19 BB25 CC25 CD27 5G301 DA03 DA06 DA57 DD01 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4E351 BB31 EE16 GG16 4J038 DA002 DA142 DB031 DB071 DB081 DB261 DH002 HA066 JA18 JA26 JA35 JA56 JB04 JB07 JB14 JB32 KA03 KA12 KA20 LA03 MA06 MA09 NA20 PA19 PB12 BB19 BB19 BB19 5G301 DA03 DA06 DA57 DD01
Claims (6)
下(0を除く)の溶剤を含有してなる導電ペースト。1. A conductive paste comprising a binder, conductive powder and a solvent having an evaporation rate of 30 or less (excluding 0).
求項1記載の導電ペースト。2. The conductive paste according to claim 1, wherein the solvent has a boiling point of 150 to 260 ° C.
ある請求項1又は2記載の導電ペースト。3. The conductive paste according to claim 1, wherein the solvent is one kind or a mixed solvent of two or more kinds.
重量%含有してなる請求項1、2又は3記載の導電ペー
スト。4. The solvent is used in an amount of 2 to 10 with respect to the conductive paste.
4. The conductive paste according to claim 1, wherein the conductive paste is contained by weight.
の硬化剤を含むものからなる請求項1、2、3又は4記
載の導電ペースト。5. The conductive paste according to claim 1, wherein the binder comprises an epoxy resin composition and a curing agent thereof.
ーストの固形分に対してバインダが5〜15重量%及び
導電粉が85〜95重量%である請求項1、2、3、4
又は5記載の導電ペースト。6. The compounding ratio of the binder and the conductive powder is 5 to 15% by weight of the binder and 85 to 95% by weight of the conductive powder based on the solid content of the conductive paste.
Or the conductive paste according to 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000083205A JP2001266644A (en) | 2000-03-21 | 2000-03-21 | Conductive paste |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000083205A JP2001266644A (en) | 2000-03-21 | 2000-03-21 | Conductive paste |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001266644A true JP2001266644A (en) | 2001-09-28 |
Family
ID=18599883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000083205A Pending JP2001266644A (en) | 2000-03-21 | 2000-03-21 | Conductive paste |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001266644A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004302245A (en) * | 2003-03-31 | 2004-10-28 | Nippon Steel Chem Co Ltd | Resist material for color filter and color filter |
-
2000
- 2000-03-21 JP JP2000083205A patent/JP2001266644A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004302245A (en) * | 2003-03-31 | 2004-10-28 | Nippon Steel Chem Co Ltd | Resist material for color filter and color filter |
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