[go: up one dir, main page]

JP2001152108A - Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method - Google Patents

Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method

Info

Publication number
JP2001152108A
JP2001152108A JP33694999A JP33694999A JP2001152108A JP 2001152108 A JP2001152108 A JP 2001152108A JP 33694999 A JP33694999 A JP 33694999A JP 33694999 A JP33694999 A JP 33694999A JP 2001152108 A JP2001152108 A JP 2001152108A
Authority
JP
Japan
Prior art keywords
circuit
adhesive film
weight
insulating adhesive
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33694999A
Other languages
Japanese (ja)
Inventor
Masayuki Hama
真之 浜
Hiroyuki Fukai
弘之 深井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP33694999A priority Critical patent/JP2001152108A/en
Publication of JP2001152108A publication Critical patent/JP2001152108A/en
Pending legal-status Critical Current

Links

Landscapes

  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To prepare an insulating adhesive film having excellent flexibility without lowering the glass transition temperature, a multi-layer printed-wiring board using the same and its manufacturing method. SOLUTION: The multi-layer printed-wiring board is composed of an insulating adhesive film comprising a polyfunctional epoxy resin having three or more functional groups, a difunctional epoxy resin which is liquid at 25 deg.C and, simultaneously, has a viscosity of <=100 P, and an acrylonitrile butadiene rubber, an inner circuit substrate having an inner circuit, an insulating layer on the inner circuit substrate, an outer circuit formed on the surface of the insulating layer, and a via hole connecting the inner circuit with the outer circuit, The method of manufacturing the multi-layer printed-wiring board comprises laminating a printed-wiring board constituted of an insulating adhesive film to form an insulating layer on an inner circuit substrate having an inner circuit to effect adhesion with the insulating layer, making a via hole reaching the inner circuit, forming an outer layer circuit on the surface of the insulating adhesive film, and effecting electrical connection between the outer circuit and the inner circuit.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ビルドアップ多層
配線板の絶縁材に好適な絶縁接着フィルムとこれを用い
た多層プリント配線板並びにその製造方法に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating adhesive film suitable for an insulating material of a build-up multilayer wiring board, a multilayer printed wiring board using the same, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】半導体チップ等の電子部品は、その集積
密度が非常に高くなって来ており、そのため、半導体チ
ップ等の電子部品を実装するプリント配線板にも、配線
間隔や接続穴間隔の狭小化を行って高密度化が行われて
いる。
2. Description of the Related Art The integration density of electronic components such as semiconductor chips has become extremely high. Therefore, printed wiring boards on which electronic components such as semiconductor chips are mounted are also required to have wiring intervals and connection hole intervals. Higher densities have been achieved by narrowing.

【0003】このプリント配線板の高密度化の方法とし
て、予め複数の基板に導体回路を形成し、ガラスクロス
プリプレグを挟んで、積層一体化し、互いに接合して多
層プリント配線板とする方法があり、より一層の高密度
化を得ることができるようになったが、ガラスプクロス
リプレグは、ガラス布を基材としているので、その厚さ
を薄くするにはガラスクロスに用いるガラス繊維の本数
を減らさなければならず、そうすると、含浸できる樹脂
の量が少なくなり、絶縁性が低下してしまったり、含浸
する樹脂量を無理に増加するとガラス繊維の分布がばら
ついて、場所によって寸法変化率が変化してしまい、多
層プリント配線板にとって重要な、各層間の位置合わせ
が困難になるという問題が発生した。
As a method of increasing the density of the printed wiring board, there is a method in which a conductor circuit is formed on a plurality of substrates in advance, laminated and integrated with a glass cloth prepreg sandwiched therebetween, and joined together to form a multilayer printed wiring board. However, since the glass prepreg is made of glass cloth, it is necessary to reduce the number of glass fibers used for the glass cloth. If so, the amount of resin that can be impregnated will decrease, and insulation will decrease.If the amount of impregnating resin is forcibly increased, the distribution of glass fibers will vary, and the dimensional change rate will vary depending on the location. This has caused a problem that the alignment between the layers becomes difficult, which is important for the multilayer printed wiring board.

【0004】そこで、ガラスクロスプリプレグではな
く、樹脂のみを用いて、内層回路を形成した内層回路基
板に、樹脂層を絶縁層として形成し、内層回路に達する
バイアホールをあけ、絶縁層の表面に外層回路を形成す
ると共に、外層回路と内層回路との電気的接続を行うビ
ルドアップ多層プリント配線板が、開発され、実施され
ている。このビルドアップ多層プリント配線板に用いる
絶縁層は、通常、樹脂を支持フィルムの上にコーティン
グし、加熱・乾燥して半硬化状にした絶縁接着フィルム
が用いられ、その絶縁接着フィルムをラミネートまたは
プレスすることによって形成されている。そして、バイ
アホールとなる箇所を炭酸ガスレーザー等のレーザー光
で穴明けした後に、絶縁層の表面に外層回路を形成する
と共に、外層回路と内層回路との電気的接続を行うに
は、絶縁層上に選択的にめっきをして外層回路と、バイ
アホールの内壁に導体を形成するアディティブ方式が多
く採用されている。
Therefore, a resin layer is formed as an insulating layer on an inner circuit board on which an inner layer circuit is formed, using only a resin instead of a glass cloth prepreg, and a via hole reaching the inner layer circuit is opened. Build-up multilayer printed wiring boards for forming an outer layer circuit and electrically connecting the outer layer circuit and the inner layer circuit have been developed and implemented. The insulating layer used for this build-up multilayer printed wiring board is usually formed by coating a resin on a support film, heating and drying to make a semi-cured insulating adhesive film, and laminating or pressing the insulating adhesive film. It is formed by doing. Then, after forming a via hole with a laser beam such as a carbon dioxide gas laser, an outer layer circuit is formed on the surface of the insulating layer, and an electrical connection between the outer layer circuit and the inner layer circuit is performed. An additive system in which a conductor is selectively formed on an outer layer circuit and an inner wall of a via hole by selectively plating the upper layer is often used.

【0005】[0005]

【発明が解決しようとする課題】このような絶縁接着フ
ィルムには、絶縁性、耐熱性、めっきピール強度の特性
に加え、フィルム形成能やフィルムを巻き取る際や巻き
出すに際のフィルムの割れ防止のために液状材料よりも
優れた可とう性が要求される。そこで、通常は、可とう
性とめっきピール強度の両立が可能なアクリロニトリル
ブタジエンゴムを主成分とし、かつ耐熱性を確保するた
めに、フェノール樹脂でアクリロニトリルブタジエンゴ
ムを架橋し、絶縁性を確保するためにエポキシ樹脂及び
その硬化剤、さらに機械強度補強の目的で無機フィラー
を配合する。
In addition to the properties of insulation, heat resistance, and plating peel strength, such an insulating adhesive film has a film forming ability and a film crack when winding or unwinding the film. It is required to have better flexibility than liquid material for prevention. Therefore, usually, the main component is acrylonitrile butadiene rubber capable of achieving both flexibility and plating peel strength, and in order to ensure heat resistance, acrylonitrile butadiene rubber is cross-linked with a phenol resin to ensure insulation. And an epoxy resin and its curing agent, and an inorganic filler for the purpose of reinforcing mechanical strength.

【0006】絶縁接着フィルムには、エポキシ樹脂10
0重量部に対して25重量部以上のゴム量が必要であ
り、樹脂硬化物のガラス転移温度が低下しやすく、半導
体チップを搭載するパッケージ分野での用途に要求され
る150℃以上のガラス転移温度を得ることは非常に困
難であった。
Epoxy resin 10 is used for the insulating adhesive film.
A rubber amount of 25 parts by weight or more is required with respect to 0 parts by weight, and the glass transition temperature of the cured resin is easily lowered, and the glass transition of 150 ° C. or more required for use in the package field for mounting semiconductor chips. It was very difficult to get the temperature.

【0007】本発明は、ガラス転移温度を低下させるこ
となくかつ、可とう性に優れた絶縁接着フィルムとそれ
を用いた多層プリント配線板並びにその製造方法を提供
することを目的とする。
It is an object of the present invention to provide an insulating adhesive film which is excellent in flexibility without lowering the glass transition temperature, a multilayer printed wiring board using the same, and a method for producing the same.

【0008】[0008]

【課題を解決するための手段】本発明は、以下のことを
特徴とする。 (1)三官能以上の多官能のエポキシ樹脂と、25℃に
おいて液状で、かつ粘度が100ポイズ以下である二官
能のエポキシ樹脂ならびにアクリロニトリルブタジエン
ゴムからなる絶縁接着フィルム。 (2)多官能エポキシ樹脂が30〜60重量%、二官能
エポキシ樹脂が15〜30重量%、アクリロニトリルブ
タジエンゴムが5〜12重量%である(1)に記載の絶
縁接着フィルム。 (3)内層回路を形成した内層回路基板と、その上に形
成した絶縁層と、絶縁層の表面に形成した外層回路と、
内層回路と外層回路とを接続するバイアホールからなる
多層プリント配線板であって、絶縁層が、(1)または
(2)に記載の絶縁接着フィルムで構成されているプリ
ント配線板。 (4)内層回路を形成した内層回路基板に、(1)また
は(2)に記載の絶縁接着フィルムを積層接着し、内層
回路に達するバイアホールをあけ、絶縁接着フィルムの
表面に外層回路を形成すると共に、外層回路と内層回路
との電気的接続を行う多層プリント配線板の製造方法。
The present invention is characterized by the following. (1) An insulating adhesive film comprising a trifunctional or higher polyfunctional epoxy resin, a bifunctional epoxy resin which is liquid at 25 ° C. and has a viscosity of 100 poise or less, and acrylonitrile butadiene rubber. (2) The insulating adhesive film according to (1), wherein the polyfunctional epoxy resin is 30 to 60% by weight, the bifunctional epoxy resin is 15 to 30% by weight, and the acrylonitrile butadiene rubber is 5 to 12% by weight. (3) an inner circuit board on which an inner circuit is formed, an insulating layer formed thereon, an outer circuit formed on the surface of the insulating layer,
A multilayer printed wiring board comprising via holes connecting an inner layer circuit and an outer layer circuit, wherein the insulating layer is made of the insulating adhesive film according to (1) or (2). (4) The insulating adhesive film according to (1) or (2) is laminated and adhered to the inner circuit board on which the inner circuit is formed, a via hole reaching the inner circuit is opened, and an outer circuit is formed on the surface of the insulating adhesive film. And a method of manufacturing a multilayer printed wiring board for electrically connecting an outer layer circuit and an inner layer circuit.

【0009】[0009]

【発明の実施の形態】多官能エポキシ樹脂としては各種
のフェノールノボラック型エポキシ樹脂、クレゾールノ
ボラック型エポキシ樹脂等が使用でき、特に制限はな
い。絶縁樹脂に難燃性を付与するためにこれらを臭素化
したものを用いても良い。その配合量は、30〜60重
量%であることが好ましい。多官能エポキシ樹脂の配合
量が30重量%未満では絶縁硬化物の架橋密度が大きく
低下するためにガラス転移温度が低下するおそれがあ
り、60重量%を越えると絶縁硬化物の可とう性が低下
するおそれがあるためである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS As a polyfunctional epoxy resin, various phenol novolak type epoxy resins, cresol novolak type epoxy resins and the like can be used, and there is no particular limitation. In order to impart flame retardancy to the insulating resin, a brominated product thereof may be used. The compounding amount is preferably 30 to 60% by weight. If the compounding amount of the polyfunctional epoxy resin is less than 30% by weight, the crosslink density of the cured insulating material is greatly reduced, so that the glass transition temperature may be lowered. If it exceeds 60% by weight, the flexibility of the cured insulating material is reduced. This is because there is a risk of doing so.

【0010】液状の二官能エポキシ樹脂としては、各種
ビスフェノールA型エポキシ樹脂、ビスフェノールF型
エポキシ樹脂、脂肪族型エポキシ樹脂等が使用できる
が、25℃条件下の粘度が100ポイズ以下のものを用
いることが必要である。100ポイズを越える粘度の液
状の二官能エポキシ樹脂や常温で固形の二官能エポキシ
樹脂を用いた場合には、フィルムに十分な可とう性を付
与することができない。このような25℃条件下で10
0ポイズ以下の液状の二官能エポキシ樹脂の市販品とし
ては、エピコート801、815、828、834(い
ずれも油化シェルエポキシ株式会社製、商品名)KRM
2110、2410(いずれも旭電化工業株式会社製、
商品名)等がある。また、上述した液状の二官能エポキ
シ樹脂の配合量は、15〜30重量%であることが好ま
しい。配合量が15重量%未満ではフィルムに十分な可
とう性が得られないおそれがあり、30重量%を越える
とガラス転移温度が大きく低下するおそれがあるためで
ある。
As the liquid bifunctional epoxy resin, various bisphenol A epoxy resins, bisphenol F epoxy resins, aliphatic epoxy resins and the like can be used, and those having a viscosity of 100 poise or less at 25 ° C. are used. It is necessary. When a liquid bifunctional epoxy resin having a viscosity exceeding 100 poise or a bifunctional epoxy resin solid at room temperature is used, sufficient flexibility cannot be imparted to the film. Under such 25 ° C. conditions, 10
Commercially available liquid bifunctional epoxy resins of 0 poise or less include Epicoat 801, 815, 828, and 834 (all manufactured by Yuka Shell Epoxy Co., Ltd., trade name) KRM
2110, 2410 (both manufactured by Asahi Denka Kogyo Co., Ltd.
Product name). Further, the compounding amount of the above-mentioned liquid bifunctional epoxy resin is preferably 15 to 30% by weight. If the amount is less than 15% by weight, sufficient flexibility may not be obtained in the film, and if it exceeds 30% by weight, the glass transition temperature may be greatly reduced.

【0011】アクリロニトリルブタジエンゴムは、各種
の分子量のものを用いることができるが、粗化性、弾性
率や他の樹脂との相溶性を考慮して、重量平均分子量
(ゲルパーミエーションクロマトグラフィーにより標準
ポリスチレンの検量線を用いて測定したもの)が500
0〜30000程度のものを用いることが好ましい。ま
た、その配合量は5〜12重量%とする。これはアクリ
ロニトリルブタジエンゴムの配合量が5重量%未満では
粗化時に十分な表面凹凸が形成できずにめっきピール強
度が大きく低下するおそれがあり、12重量%を越える
とガラス転移温度が低下するおそれがあるためである。
Acrylonitrile butadiene rubber of various molecular weights can be used, but in consideration of roughening properties, elastic modulus and compatibility with other resins, the weight average molecular weight (standard by gel permeation chromatography) is used. (Measured using a polystyrene calibration curve) is 500
It is preferable to use one having about 0 to 30,000. Further, the compounding amount is 5 to 12% by weight. If the amount of acrylonitrile-butadiene rubber is less than 5% by weight, sufficient surface irregularities cannot be formed during roughening, and the plating peel strength may be greatly reduced. If it exceeds 12% by weight, the glass transition temperature may be reduced. Because there is.

【0012】多官能及び液状の二官能のエポキシ樹脂の
硬化剤としては、フェノールノボラック、イミダゾー
ル、ポリアミン類等を用いることができ、またアクリロ
ニトリルブタジエンゴムの架橋剤としては各種のアルキ
ルフェノール樹脂を用いることができるが、パッケージ
分野等で要求される150℃以上の高いガラス転移温度
を有する絶縁硬化物を得るためには、フェノールノボラ
ックや、イミダゾール系の硬化剤を用いるのが好まし
い。特にフェノールノボラック型を塩基性の熱硬化促進
剤と併用した場合には、アクリロニトリルブタジエンゴ
ムも同時に架橋して三次元的な網掛け硬化物を形成でき
るため、より高いガラス転移温度を有する絶縁硬化物を
得ることができる。この場合、樹脂の硬化性や耐熱性を
考慮して、フェノールノボラック型及び塩基性の熱硬化
促進剤は、それぞれエポキシ樹脂100部に対して15
〜40重量%、塩基性の熱硬化促進剤2〜5重量%添加
することが好ましい。
Phenol novolak, imidazole, polyamines and the like can be used as a curing agent for polyfunctional and liquid bifunctional epoxy resins, and various alkylphenol resins can be used as a crosslinking agent for acrylonitrile butadiene rubber. Although it is possible, it is preferable to use a phenol novolak or an imidazole-based curing agent in order to obtain an insulating cured product having a high glass transition temperature of 150 ° C. or higher required in the field of packaging and the like. Especially when the phenol novolak type is used in combination with a basic thermosetting accelerator, the acrylonitrile-butadiene rubber can be simultaneously cross-linked to form a three-dimensional shaded cured product, so that the insulating cured product having a higher glass transition temperature. Can be obtained. In this case, in consideration of the curability and heat resistance of the resin, the phenol novolak type and the basic thermosetting accelerator are each added to 100 parts of the epoxy resin by 15 parts.
It is preferable to add 〜40% by weight and 2 to 5% by weight of a basic thermosetting accelerator.

【0013】[0013]

【実施例】実施例1 表面を離型剤で離型処理した厚さ25μmのアルミ箔で
あるセパニウムM25(サンアルミ社製、商品名)上
に、下記組成の樹脂組成物を乾燥後膜厚が50μmとな
るように1.0m/分の速度で塗工し、120℃、10
分の条件で乾燥して絶縁接着フィルムを作製した。 ・クレゾールノボラック型エポキシ樹脂: ESCN−195(住友化学株式会社製、商品名) …50重量部 ・ビスA型エポキシ樹脂: EP−828(油化シェルエポキシ株式会社製、商品名) …20重量部 ・アクリロニトリルブタジエンゴム: PNR−1H(JSR株式会社製、商品名) …7重量部 ・フェノールノボラック樹脂: PS−5805(群栄化学工業株式会社製、商品名) …10重量部 ・熱硬化促進剤: CP−66(旭電化工業株式会社製、商品名) …2重量部 ・水酸化アルミニウム: ハイジライトH−42M(昭和電工株式会社製、商品名) …10重量部 ・メチルエチルケトン …50重量部
EXAMPLE 1 A resin composition having the following composition was dried on Sepanium M25 (trade name, manufactured by Sun Aluminum Co., Ltd.), a 25-μm-thick aluminum foil whose surface was release-treated with a release agent. Is applied at a speed of 1.0 m / min so that the
Drying was performed under the conditions of minutes to prepare an insulating adhesive film. -Cresol novolak type epoxy resin: ESCN-195 (manufactured by Sumitomo Chemical Co., Ltd., trade name) ... 50 parts by weight-Bis A type epoxy resin: EP-828 (manufactured by Yuka Shell Epoxy Co., Ltd., trade name) ... 20 parts by weight -Acrylonitrile butadiene rubber: PNR-1H (manufactured by JSR Corporation, trade name) ... 7 parts by weight-Phenol novolak resin: PS-5805 (manufactured by Gunei Chemical Industry Co., Ltd., trade name) ... 10 parts by weight-Thermosetting accelerator : CP-66 (trade name, manufactured by Asahi Denka Kogyo Co., Ltd.) ... 2 parts by weight-Aluminum hydroxide: Heidilite H-42M (trade name, manufactured by Showa Denko KK) ... 10 parts by weight-Methyl ethyl ketone ... 50 parts by weight

【0014】実施例2 下記組成の樹脂組成物を実施例1と同様の方法で塗工し
て絶縁接着フィルムを作製した。 ・クレゾールノボラック型エポキシ樹脂: ESCN−195(住友化学株式会社製、商品名) …45重量部 ・ビスA型エポキシ樹脂: EP−828(油化シェルエポキシ株式会社製、商品名) …25重量部 ・アクリロニトリルブタジエンゴム: XER−31(JSR株式会社製、商品名) …10重量部 ・フェノールノボラック樹脂: HP−180R(日立化成工業株式会社製、商品名) …10重量部 ・熱硬化促進剤: CP−66(旭電化工業株式会社製、商品名) …2重量部 ・水酸化アルミニウム: ハイジライトH−42M(昭和電工株式会社製、商品名) …10重量部 ・メチルエチルケトン …50重量部
Example 2 A resin composition having the following composition was applied in the same manner as in Example 1 to produce an insulating adhesive film. -Cresol novolak type epoxy resin: ESCN-195 (manufactured by Sumitomo Chemical Co., Ltd., trade name) ... 45 parts by weight-Bis A type epoxy resin: EP-828 (manufactured by Yuka Shell Epoxy Co., Ltd., trade name) ... 25 parts by weight -Acrylonitrile butadiene rubber: XER-31 (trade name, manufactured by JSR Corporation) ... 10 parts by weight-Phenol novolak resin: HP-180R (trade name, manufactured by Hitachi Chemical Co., Ltd.) ... 10 parts by weight-Thermosetting accelerator: CP-66 (trade name, manufactured by Asahi Denka Kogyo Co., Ltd.) ... 2 parts by weight-Aluminum hydroxide: Heidilite H-42M (trade name, manufactured by Showa Denko KK) ... 10 parts by weight-Methyl ethyl ketone ... 50 parts by weight

【0015】実施例3 下記組成の樹脂組成物を実施例1と同様の方法で塗工し
て絶縁接着フィルムを作製した。 ・クレゾールノボラック型エポキシ樹脂: KRM−2650(旭電化工業株式会社製、商品名) …40重量部 ・ビスA型エポキシ樹脂: EP−815(油化シェルエポキシ株式会社製、商品名) …30重量部 ・アクリロニトリルブタジエンゴム: PNR−1H(JSR株式会社製、商品名) …5重量部 ・フェノールノボラック樹脂: PS−5805、(群栄化学工業株式会社製、商品名) …10重量部 ・熱硬化促進剤: CP−66(旭電化工業株式会社製、商品名) …2重量部 ・水酸化アルミニウム: ハイジライトH−42M(昭和電工株式会社製、商品名) …10重量部 ・メチルエチルケトン …50重量部
Example 3 An insulating adhesive film was prepared by applying a resin composition having the following composition in the same manner as in Example 1. -Cresol novolak epoxy resin: KRM-2650 (trade name, manufactured by Asahi Denka Kogyo Co., Ltd.) ... 40 parts by weight-Bis A type epoxy resin: EP-815 (trade name, manufactured by Yuka Shell Epoxy Co., Ltd.) ... 30 weight parts Part: Acrylonitrile butadiene rubber: PNR-1H (manufactured by JSR Corporation, trade name) ... 5 parts by weight-Phenol novolak resin: PS-5805, (manufactured by Gunei Chemical Industry Co., Ltd., trade name) ... 10 parts by weight-Thermosetting Accelerator: CP-66 (manufactured by Asahi Denka Kogyo Co., Ltd., trade name) ... 2 parts by weight-Aluminum hydroxide: Heidilite H-42M (manufactured by Showa Denko KK, trade name) ... 10 parts by weight-Methyl ethyl ketone ... 50 parts by weight Department

【0016】比較例1 以下の樹脂組成物を作製し、実施例1と同様の方法で塗
工して絶縁接着フィルムを作製した。 ・クレゾールノボラック型エポキシ樹脂: KRM−2650(旭電化工業株式会社製、商品名) …40重量部 ・ビスA型エポキシ樹脂:(25℃で固体) EP−1001(油化シェルエポキシ株式会社製、商品名) …30重量部 ・アクリロニトリルブタジエンゴム: PNR−1H(JSR株式会社製、商品名) …10重量部 ・フェノールノボラック樹脂: HP−180R(日立化成工業株式会社製、商品名) …10重量部 ・熱硬化促進剤CP−66(旭電化工業株式会社製、商品名) …2重量部 ・水酸化アルミニウム: ハイジライトH−42M(昭和電工株式会社製、商品名) …10重量部 ・メチルエチルケトン …50重量部
Comparative Example 1 The following resin composition was prepared and applied in the same manner as in Example 1 to prepare an insulating adhesive film. Cresol novolak type epoxy resin: KRM-2650 (manufactured by Asahi Denka Kogyo Co., Ltd., trade name) 40 parts by weight Bis A type epoxy resin: (solid at 25 ° C.) EP-1001 (manufactured by Yuka Shell Epoxy Co., Ltd.) 30 parts by weight-Acrylonitrile butadiene rubber: PNR-1H (trade name, manufactured by JSR Corporation) ... 10 parts by weight-Phenol novolak resin: HP-180R (trade name, manufactured by Hitachi Chemical Co., Ltd.) ... 10 parts by weight Part-Thermal curing accelerator CP-66 (made by Asahi Denka Kogyo Co., Ltd., trade name) ... 2 parts by weight-Aluminum hydroxide: Hijilite H-42M (manufactured by Showa Denko KK, trade name) ... 10 parts by weight-Methyl ethyl ketone ... 50 parts by weight

【0017】比較例2 以下の樹脂組成物を作製し、実施例1と同様の方法で塗
工して絶縁接着フィルムを作製した。 ・クレゾールノボラック型エポキシ樹脂: ESCN−195(住友化学株式会社製、商品名) …70重量部 ・アクリロニトリルブタジエンゴム: XER−31(JSR株式会社製、商品名) …20重量部 ・フェノールノボラック樹脂: ポイズ−5805(群栄化学工業株式会社製、商品名) …10重量 部 ・熱硬化促進剤:CP−66(旭電化工業株式会社製、商品名) …2重量部 ・水酸化アルミニウム: ハイジライトH−42M(昭和電工株式会社製、商品名) …10重量部 ・メチルエチルケトン …50重量部
Comparative Example 2 The following resin composition was prepared and applied in the same manner as in Example 1 to prepare an insulating adhesive film. -Cresol novolak type epoxy resin: ESCN-195 (manufactured by Sumitomo Chemical Co., Ltd., trade name) ... 70 parts by weight-Acrylonitrile butadiene rubber: XER-31 (manufactured by JSR Corporation, trade name) ... 20 parts by weight-Phenol novolak resin: Poise-5805 (manufactured by Gunei Chemical Industry Co., Ltd., trade name) ... 10 parts by weight-Thermosetting accelerator: CP-66 (manufactured by Asahi Denka Kogyo Co., Ltd., trade name) ... 2 parts by weight-Aluminum hydroxide: Heidilite H-42M (manufactured by Showa Denko KK, trade name) ... 10 parts by weight ・ Methyl ethyl ketone ... 50 parts by weight

【0018】以上のように作製したアディティブ用絶縁
接着フィルムの特性を以下の項目で評価した。 ・フィルム可とう性 塗工した絶縁接着フィルムの絶縁樹脂側を180°に折
り曲げて、折り目を付けた後に平面に戻し、折り目付近
のフィルムのクラックの発生状況を目視にて観察した。 ・ガラス転移温度 塗工した絶縁接着フィルムを170℃90分+180℃
120分の条件で加熱して硬化物を作製し、TMA引張
り法にてガラス転移温度を測定した。 ・めっきピール強度、層間絶縁抵抗 以下の方法で、多層プリント配線板特性評価用の試料を
作成して評価した。 1)第1の回路を形成した面に、絶縁接着フィルムの絶
縁樹脂が接着するようにして、真空下で加温加圧積層
(高温保持温度170℃、保持圧力3MPa、保持時間
90分)する。 2)真空加圧積層後、アルミ箔を除去する。次いで絶縁
樹脂表面を化学的に粗化するために70℃に加温したア
ルカリ性過マンガン酸カリウム(過マンガン酸量70g
/l)溶液で10分間処理し、硫酸ヒドロキシルアミン
中和液で5分間処理した。 3)粗化処理後に無電解めっき薄付け、電気めっき厚付
けにより導体形成を行った後、不要部分のめっき銅を除
去して第2の回路を形成した。 4)アフターキュア180℃/120分を実施して多層
プリント配線板の試料とし、めっきピール強度、層間絶
縁抵抗を評価した。これらの特性評価結果のまとめを表
1に示す。
The properties of the additive adhesive film produced as described above were evaluated by the following items. Film flexibility The insulating resin side of the coated insulating adhesive film was bent at 180 °, and after being creased, returned to a flat surface, and the occurrence of cracks in the film near the crease was visually observed.・ Glass transition temperature 170 ° C for 90 minutes + 180 ° C
A cured product was prepared by heating under the conditions of 120 minutes, and the glass transition temperature was measured by a TMA tension method. -Plating peel strength, interlayer insulation resistance A sample for evaluating the characteristics of a multilayer printed wiring board was prepared and evaluated by the following method. 1) Heat-pressing and laminating under vacuum (high-temperature holding temperature: 170 ° C., holding pressure: 3 MPa, holding time: 90 minutes) so that the insulating resin of the insulating adhesive film adheres to the surface on which the first circuit is formed. . 2) After laminating under vacuum pressure, the aluminum foil is removed. Next, alkaline potassium permanganate heated to 70 ° C. to chemically roughen the surface of the insulating resin (permanganate amount: 70 g)
/ L) solution for 10 minutes and a hydroxylamine sulfate neutralized solution for 5 minutes. 3) After the roughening treatment, a conductor was formed by electroless plating thinning and electroplating thickening, and then unnecessary portions of plated copper were removed to form a second circuit. 4) After-curing was performed at 180 ° C. for 120 minutes to obtain a sample of a multilayer printed wiring board, and the plating peel strength and the interlayer insulation resistance were evaluated. Table 1 summarizes the results of these characteristic evaluations.

【0019】[0019]

【表1】 [Table 1]

【0020】[0020]

【発明の効果】以上に説明したとおり、本発明によっ
て、ガラス転移温度を低下させることなくかつ、可とう
性に優れた絶縁接着フィルムとそれを用いた多層プリン
ト配線板並びにその製造方法をていきょうすることがで
きる。
As described above, according to the present invention, an insulating adhesive film excellent in flexibility without lowering the glass transition temperature, a multilayer printed wiring board using the same, and a method of manufacturing the same will be described. can do.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J004 AA02 AA05 AA13 AB05 CC02 FA05 5E314 AA32 AA41 AA47 BB02 BB11 BB13 CC15 DD02 DD08 FF06 GG26 5E346 AA12 AA43 CC08 CC09 CC41 EE38 EE39 GG13 GG28 HH07 HH08  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4J004 AA02 AA05 AA13 AB05 CC02 FA05 5E314 AA32 AA41 AA47 BB02 BB11 BB13 CC15 DD02 DD08 FF06 GG26 5E346 AA12 AA43 CC08 CC09 CC41 EE38 EE39 GG13 GG28 HH07 HH08

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】三官能以上の多官能のエポキシ樹脂と、2
5℃において液状で、かつ粘度が100ポイズ以下であ
る二官能のエポキシ樹脂ならびにアクリロニトリルブタ
ジエンゴムからなる絶縁接着フィルム。
(1) a trifunctional or higher polyfunctional epoxy resin;
An insulating adhesive film comprising a bifunctional epoxy resin which is liquid at 5 ° C. and has a viscosity of 100 poise or less and acrylonitrile butadiene rubber.
【請求項2】多官能エポキシ樹脂が30〜60重量%、
二官能エポキシ樹脂が15〜30重量%、アクリロニト
リルブタジエンゴムが5〜12重量%である請求項1に
記載の絶縁接着フィルム。
2. A polyfunctional epoxy resin comprising 30 to 60% by weight,
The insulating adhesive film according to claim 1, wherein the bifunctional epoxy resin is 15 to 30% by weight and the acrylonitrile butadiene rubber is 5 to 12% by weight.
【請求項3】内層回路を形成した内層回路基板と、その
上に形成した絶縁層と、絶縁層の表面に形成した外層回
路と、内層回路と外層回路とを接続するバイアホールか
らなる多層プリント配線板であって、絶縁層が、請求項
1または2に記載の絶縁接着フィルムで構成されている
プリント配線板。
3. A multilayer printed circuit comprising an inner circuit board on which an inner circuit is formed, an insulating layer formed thereon, an outer circuit formed on the surface of the insulating layer, and a via hole connecting the inner circuit and the outer circuit. A printed wiring board, wherein the insulating layer is made of the insulating adhesive film according to claim 1.
【請求項4】内層回路を形成した内層回路基板に、請求
項1または2に記載の絶縁接着フィルムを積層接着し、
内層回路に達するバイアホールをあけ、絶縁接着フィル
ムの表面に外層回路を形成すると共に、外層回路と内層
回路との電気的接続を行う多層プリント配線板の製造方
法。
4. The insulating adhesive film according to claim 1 is laminated and adhered to an inner circuit board on which an inner circuit is formed,
A method for manufacturing a multilayer printed wiring board in which a via hole reaching an inner layer circuit is formed, an outer layer circuit is formed on the surface of an insulating adhesive film, and an electrical connection is made between the outer layer circuit and the inner layer circuit.
JP33694999A 1999-11-29 1999-11-29 Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method Pending JP2001152108A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33694999A JP2001152108A (en) 1999-11-29 1999-11-29 Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33694999A JP2001152108A (en) 1999-11-29 1999-11-29 Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method

Publications (1)

Publication Number Publication Date
JP2001152108A true JP2001152108A (en) 2001-06-05

Family

ID=18304119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33694999A Pending JP2001152108A (en) 1999-11-29 1999-11-29 Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2001152108A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004123796A (en) * 2002-09-30 2004-04-22 Hitachi Chem Co Ltd Film adhesive and semiconductor device using the same
JP2008130592A (en) * 2006-11-16 2008-06-05 Hitachi Chem Co Ltd Manufacturing method of printed wiring board, and manufacturing method of multilayer printed wiring board
JP2012052126A (en) * 2011-10-24 2012-03-15 Hitachi Chem Co Ltd Film adhesive and semiconductor device using the same
KR101560121B1 (en) 2014-04-11 2015-10-13 파나소닉 아이피 매니지먼트 가부시키가이샤 Metal-foil-attached adhesive sheet, metal-foil-attached laminated board, metal-foil-attached multi-layer board, and method of manufacturing circuit board

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004123796A (en) * 2002-09-30 2004-04-22 Hitachi Chem Co Ltd Film adhesive and semiconductor device using the same
JP2008130592A (en) * 2006-11-16 2008-06-05 Hitachi Chem Co Ltd Manufacturing method of printed wiring board, and manufacturing method of multilayer printed wiring board
JP2012052126A (en) * 2011-10-24 2012-03-15 Hitachi Chem Co Ltd Film adhesive and semiconductor device using the same
KR101560121B1 (en) 2014-04-11 2015-10-13 파나소닉 아이피 매니지먼트 가부시키가이샤 Metal-foil-attached adhesive sheet, metal-foil-attached laminated board, metal-foil-attached multi-layer board, and method of manufacturing circuit board
JP2015203038A (en) * 2014-04-11 2015-11-16 パナソニックIpマネジメント株式会社 Adhesive sheet with metal foil, laminate with metal foil, multilayer substrate with metal foil, method for producing circuit board

Similar Documents

Publication Publication Date Title
JP4957552B2 (en) Manufacturing method of prepreg with carrier for printed wiring board, prepreg with carrier for printed wiring board, manufacturing method of thin double-sided board for printed wiring board, thin double-sided board for printed wiring board, and manufacturing method of multilayer printed wiring board
CN101522812B (en) Resin composition, insulating sheet with base, prepreg, multilayer printed wiring board and semiconductor device
JP2005154727A (en) Resin composition for interlayer insulation of multilayer printed wiring board, adhesive film and prepreg
JP2001152108A (en) Insulating adhesive film multi-layer printed-wiring board using the same and its manufacturing method
JPH03239390A (en) Metal core substrate and its manufacturing method
JP3329922B2 (en) Interlayer adhesive for multilayer printed wiring board, copper foil with the adhesive, and method for manufacturing multilayer printed wiring board using the same
JP2011021101A (en) Resin composition
JP3319934B2 (en) Metal foil with resin
JP3125582B2 (en) Manufacturing method of metal foil-clad laminate
JP2002252470A (en) Interlayer insulating film for printed wiring board and multilayer printed wiring board using the same
JP2000129086A (en) Epoxy resin composition, prepreg, resin-coated metallic foil and laminate
JP3412572B2 (en) Epoxy resin composition, prepreg, metal foil with resin, adhesive sheet, laminated board and multilayer board
JP4747619B2 (en) Coverlay film and flexible wiring board
JP2000104038A (en) Composition for adhesive sheet, adhesive sheet, adhesive sheet with metal foil and laminated sheet
JP4279161B2 (en) Ultra-thin flexible wiring board
JP3390306B2 (en) Prepreg with carrier film for printed wiring boards
JP2000129087A (en) Epoxy resin composition, prepreg, resin-coated metallic foil and laminate
JP3343330B2 (en) Method for producing insulating varnish, insulating varnish obtained by this method, and multilayer printed wiring board using this insulating varnish
JP3823649B2 (en) Prepreg, laminated board and printed wiring board using amide group-containing organic fiber substrate
JP3804812B2 (en) Method for producing insulating varnish
JP4661264B2 (en) Coverlay film and flexible wiring board
JP3056666B2 (en) Manufacturing method of multilayer printed wiring board
JP2000252623A (en) Insulating adhesive for additive plating
JP3013500B2 (en) Metal foil clad laminate
JP2001288285A (en) Method of manufacturing prepreg