JP2000240995A - Clean room - Google Patents

Abstract

(57) [Summary] [PROBLEMS] To provide a clean room in which the size of a work zone and a utility zone can be freely changed. SOLUTION: A work chamber 2, a utility zone 3, a supply chamber 4 provided above both the work zone 2 and the utility zone 3 for supplying air to the work zone 2, and a supply chamber 4 provided in the supply chamber 4, Side duct 18 having a plurality of openings 19
And a duct 20 connected to the opening 19 and supplying air to the utility zone 3.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a clean room for semiconductors. In particular, the present invention relates to a clean room in which a layout can be easily changed.

[0002]

2. Description of the Related Art FIG. 3 is a view showing the structure of a conventional clean room. This clean room 1 is work zone 2
And the utility zone 3 are individually circulated and air-conditioned. As shown in FIG. 3, the inside of the clean room 1 is roughly divided into a work zone 2 and a utility zone 3, and the semiconductor manufacturing apparatus 14 is installed over these two zones. A supply chamber 4 is provided above the work zone 2 and a return chamber 5 is provided below the work zone 2. Similarly, a supply chamber 6 is provided above the utility zone 3, and a return chamber 7 is provided below the utility zone 3. The supply chamber 4 and the return chamber 6 are connected via a blower 8 and a return line 11, and the supply chamber 5 and the return chamber 7 are connected via a blower 9 and a return line 13. Work zone 2
In the above, the air filter 10 is arranged on the entire ceiling, and the air blown out from the ceiling flows in the vertical direction, and the work zone 2,
After passing through the return chamber 6, it is circulated to the supply chamber 4 via the return line 11 and the blower 8 and is again blown out from the ceiling. Similarly, in the utility zone 3, the air filter 12 is arranged in a part of the ceiling, and the air blown out from the air filter 12 flows down, passes through the utility zone 3, the return chamber 7, and returns to the return line 13 and the blower 9. And returns to the supply chamber 5 through the air filter 12 again.
Blown out from.

[0003]

As described above, in the conventional clean room 1, the work zone 2 and the utility zone 3 are individually circulated and air-conditioned. However, in contrast to the utility zone 3 with low cleanliness, the work zone 2
In order to achieve high cleanliness and low concentration of gaseous impurities,
It is necessary to prevent cross-contamination such as gaseous impurities between the work zone 2 and the utility zone 3. Therefore, a partition wall 15 is provided between the work zone 2, the supply chamber 4, and the return chamber 6, and the utility zone 3, the supply chamber 5, and the return chamber 7. The partition wall 15 is fixed by beams 16 at the upper part of the clean room 1. Therefore, the movement of the partition wall 15 is not easy. Therefore, once the clean room is constructed, the size of each of the work zone 2 and the utility zone 3 is fixed by the partition wall 15. As a result, the semiconductor manufacturing apparatus 1 installed in the clean room 1
4 size is work zone 2 and utility zone 3
Will be limited by the size of If it becomes necessary to introduce a large-sized semiconductor manufacturing apparatus 14, another clean room must be newly constructed, which is a huge expense. In addition, if the partition wall 15 is to be moved, the beam 16 must be moved, and a large-scale construction relating to the entire clean room must be performed. In addition, the production line must be stopped during construction, resulting in a considerable cost burden.

The present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to provide a clean room in which the sizes of a work zone and a utility zone can be freely changed. .

[0005]

In order to achieve the above object, a first feature of the present invention is to provide a first zone, a second zone, and a first zone and a second zone. A clean room provided at least on both upper parts and having a chamber for supplying air to the first zone.

[0006] A second feature of the present invention is that a first zone,
A second zone, a chamber provided above both the first zone and the second zone, for supplying air to the first zone, and a side duct provided in the chamber and having a plurality of openings. And a duct connected to one of the openings to supply air to the second zone.

According to a third feature of the present invention, in the first or second feature of the present invention, the first zone is a work zone, and the second zone is a utility zone.

[0008] A fourth aspect of the present invention is the second aspect of the present invention, wherein the chamber and the duct supply air through a filter.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. FIG. 1 is a diagram showing a structure of a clean room according to an embodiment of the present invention, and FIG. 2 is a sectional view taken along line AA in FIG. The clean room 17 according to the embodiment of the present invention includes:
The inside is roughly divided into a work zone 2 and a utility zone 3, and each of them adopts a system of individually circulating air conditioning, and the semiconductor manufacturing apparatus 14 is installed over two zones. The work zone 2 is a place where semiconductor wafers are mainly handled, and the utility zone 3 is a place where maintenance of the semiconductor manufacturing apparatus 14 is mainly performed. The supply chamber 4 of the work zone 2 is provided in the entire upper part of the clean room 17, while the supply chamber 18 of the utility zone 3 is formed of a side duct and is disposed throughout the supply chamber 4 in the X direction. The return chamber 6 of the work zone 2 and the return zone 7 of the utility zone 3 are provided immediately below the respective zones. The side duct 18 has a plurality of openings 19, and the openings 19
Is connected to the duct 20 via the connection part 21. The duct 20 is suspended by the movable beam 22 and the clean room 17 is suspended.
Move in. The movable beam 22 travels along a rail 23 installed in the supply chamber 4. The supply chamber 4 and the return chamber 6 are connected via a blower 8 and a return line 11, and are connected to a side duct 18.
And return chamber 7 are blower 9, return line 1
3 are connected.

In the embodiment of the present invention, an air filter 10 is arranged on the entire ceiling in the work zone 2, and the air blown out from the ceiling flows in the vertical direction, passes through the work zone 2 and the return chamber 6, returns to the return line 11, The air is circulated to the supply chamber 4 through the outlet 8 and blown out from the ceiling again. On the other hand, in the utility zone 3, the air filter 12 is connected to the duct 20, and the air blown out of the air filter 12 flows down, passes through the utility zone 3, the return chamber 7, the return line 13, the blower 9 And returns to the side duct 18. Then, the air is blown out of the air filter 12 again through the duct 20 connected to the plurality of openings 19 of the side duct 18. Among the plurality of openings 19 of the side duct 18, the one to which the duct 20 is not connected is closed with a blind lid so that air does not flow out.

In the clean room 17 according to the embodiment of the present invention, the supply chamber 4 of the work zone 2 is provided.
Are provided on the entire upper part in the clean room 17. Therefore, the air filter 10 can be provided on the entire ceiling according to the size of the work zone 2. On the other hand, the side duct 18 of the utility zone 3 is provided in the supply chamber 4, that is, the entire upper X direction in the clean room 17. And the air filter 12 is a movable beam 2
2 can freely move in the X direction, and the side duct 18 can be adjusted to the position where the air filter 12 is installed.
Opening 19 and the duct 20 can be connected. Therefore,
Utility zone 3 as in work zone 2
It is possible to move and install the air filter 12 according to the size of the air filter. As described above, the air filters of the work zone 2 and the utility zone 3 can be freely moved according to the size of each zone.

Further, in the clean room 17 according to the embodiment of the present invention, the partition wall 24 for preventing cross-contamination between the work zone 2 and the utility zone 3 is provided between the work zone 2 and the return chamber 6, and between the utility zone 3 and the return chamber 7. Provided only between And the partition wall 24 is movable in the X direction,
Normally, it is supported by both sides of the clean room 17 in the X direction.

As described above, in the embodiment of the present invention, the supply chamber 4 of the work zone 2 is provided above both the work zone 2 and the utility zone 3 in the clean room 17, and the supply chamber of the utility zone 3 is provided inside the supply chamber 4. Is disposed. The side duct 18 has a plurality of openings 19 arranged in the X direction, and the opening 19 connects a duct 20 provided with the air filter 12 of the utility zone 3. The air filter 12 on the ceiling of the utility zone 3 can freely move in the X direction according to the size of the work zone 2 and the utility zone 3.
Further, the partition wall 24 is supported by the side surface of the clean room 17 in the X direction, and is freely movable in the X direction.

Therefore, according to the embodiment of the present invention,
The widths of the work zone and the utility zone can be freely changed according to the size of the equipment to be introduced into the clean room 17. That is, according to the embodiment of the present invention, the clean room 1 having a large degree of freedom in equipment layout is provided.
7 can be provided.

[0015]

According to the present invention, it is possible to provide a clean room whose layout can be freely changed according to the size of the equipment to be installed.

[Brief description of the drawings]

FIG. 1 is a diagram showing a structure of a clean room according to an embodiment of the present invention.

FIG. 2 is a sectional view taken along line AA of FIG.

FIG. 3 is a diagram showing a structure of a conventional clean room.

[Explanation of symbols]

 1, 17 Clean room 2 Work zone 3 Utility zone 4, 5 Supply chamber 6, 7 Return chamber 8, 9 Blower 10, 12 Air filter 11, 13 Return line 14 Semiconductor manufacturing equipment 15, 24 Partition wall 16 Beam 18 Side duct 19 Opening Part 20 duct 21 connecting part 22 movable beam 23 rail

Claims (4)

[Claims] At least a first zone, a second zone, and a chamber provided above both the first zone and the second zone and supplying air to the first zone are provided. A clean room characterized by comprising: 2. A first zone, a second zone, a chamber provided above both the first zone and the second zone, and supplying air to the first zone, A clean room characterized by comprising at least a side duct provided in a chamber and having a plurality of openings, and a duct connected to at least one of the openings and supplying air to the second zone. . 3. The clean room according to claim 1, wherein the first zone is a work zone, and the second zone is a utility zone. 4. The air supply to the chamber and the duct through a filter.
A clean room as described in.