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JP2000167980A - Metal laminated board employing low boiling point solvent varnish as precursor of adhesive - Google Patents

Metal laminated board employing low boiling point solvent varnish as precursor of adhesive

Info

Publication number
JP2000167980A
JP2000167980A JP34901398A JP34901398A JP2000167980A JP 2000167980 A JP2000167980 A JP 2000167980A JP 34901398 A JP34901398 A JP 34901398A JP 34901398 A JP34901398 A JP 34901398A JP 2000167980 A JP2000167980 A JP 2000167980A
Authority
JP
Japan
Prior art keywords
adhesive
metal
varnish
layer
boiling point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34901398A
Other languages
Japanese (ja)
Inventor
Koji Hirota
幸治 廣田
Minehiro Mori
峰寛 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Priority to JP34901398A priority Critical patent/JP2000167980A/en
Publication of JP2000167980A publication Critical patent/JP2000167980A/en
Pending legal-status Critical Current

Links

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  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve separation strength between an insulation layer and a metal layer by using thermoplastic resin employing varnish containing a solvent having a specific boiling point in an adhesive layer between the insulation layer and metal layer. SOLUTION: The metal laminated board uses thermoplastic resin having varnish as a precursor in an adhesive layer between an insulation layer and a metal layer. A varnish solvent is available in a boiling point of 170 deg.C or lower, more preferably, 150 deg.C or lower. For such a formation of the insulation layer, there is a method of applying and curing polyimide, polyamideimide, and amide varnish being an adhesive to the metal foil, and employing an adhesive sheet. In general, non-thermoplastic resin such as polyimide, polyamide, polyamideimide, nylon is used to the base film of an adhesive sheet. As metal of the metal layer, there are used stainless, Cu, Fe, Ni, Mo, Al, and the like, and adhesion between the metal layer and insulation layer is carried out by heat press, lamination, etc.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は絶縁層の両側に金属
層を積層したプリント配線板用金属積層板に関するもの
であり、詳しくは、絶縁層と金属層の接着剤としてポリ
イミド、ポリアミドイミド等の、前駆体が液状のワニス
であるものを用い、ワニスの溶剤に沸点が170℃以下
のものを用いることにより、乾燥温度の低減と樹脂の流
動性の向上を実現したものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal laminate for a printed wiring board in which a metal layer is laminated on both sides of an insulating layer. More specifically, the present invention relates to an adhesive between the insulating layer and the metal layer such as polyimide or polyamideimide. By using a liquid varnish as a precursor and using a varnish solvent having a boiling point of 170 ° C. or less, a reduction in drying temperature and an improvement in resin fluidity are realized.

【0002】[0002]

【従来の技術】従来よりプリント基板等に幅広く使用さ
れている金属積層板において、接着層に熱可塑性樹脂を
用いて、その前駆体であるワニスを金属箔または、絶縁
層に塗布、乾燥を行い、接着層を形成する方式は広く用
いられてきた。
2. Description of the Related Art In a metal laminate which has been widely used for a printed circuit board and the like, a varnish as a precursor thereof is applied to a metal foil or an insulating layer by using a thermoplastic resin for an adhesive layer and dried. The method of forming an adhesive layer has been widely used.

【0003】金属積層板においては、金属の剥離強度が
1.0kg/cm 以上であることが望ましいとされている。
また、金属積層板において金属層と絶縁層の接着温度
は、金属の酸化や、絶縁層の変質を避けることから、少
なくとも250℃以下の温度にすることが望まれてい
る。
[0003] In a metal laminate, it is desirable that the metal peel strength is 1.0 kg / cm or more.
Further, in the metal laminate, the bonding temperature between the metal layer and the insulating layer is desired to be at least 250 ° C. or less in order to avoid oxidation of the metal and deterioration of the insulating layer.

【0004】このような市場要求に対して、ワニスを塗
布しキュウアを行い接着層を形成する金属積層板では、
1.0kg/cm の剥離強度を確保するには、250℃以上
に接着温度を上げなければならなかった。これはワニス
には沸点が200℃以上の高沸点溶媒が用いられてきた
ためである。ワニスの溶媒を除去するには、乾燥温度を
200℃以上の高温にする必要が生じ、乾燥時に樹脂が
架橋し硬化することが避けられない状況にあった。熱可
塑性樹脂が分子間架橋すると、接着時における樹脂の流
動性が下がり、金属層や絶縁層との密着力が低下し、接
着強度が減少するという問題が発生する。接着強度の確
保のためには、接着温度を高くして樹脂の流動性を確保
する必要があった。
[0004] In response to such market demands, in a metal laminate plate in which a varnish is applied and cured to form an adhesive layer,
To ensure a peel strength of 1.0 kg / cm 2, the bonding temperature had to be raised to 250 ° C. or higher. This is because a high boiling point solvent having a boiling point of 200 ° C. or higher has been used for varnish. In order to remove the solvent of the varnish, it was necessary to set the drying temperature to a high temperature of 200 ° C. or higher, and it was inevitable that the resin would be crosslinked and hardened during drying. When the thermoplastic resin undergoes intermolecular cross-linking, the fluidity of the resin at the time of bonding decreases, the adhesion to the metal layer or the insulating layer decreases, and the problem that the bonding strength decreases occurs. In order to secure the adhesive strength, it was necessary to increase the adhesive temperature to secure the fluidity of the resin.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は金属積
層板において絶縁層と金属間の剥離強度を向上させるこ
とにある。
SUMMARY OF THE INVENTION An object of the present invention is to improve the peel strength between an insulating layer and a metal in a metal laminate.

【0006】[0006]

【課題を解決するための手段】本発明者等は、前記した
課題を解決すべく検討を行った結果、ワニスの溶媒の沸
点を170℃以下に、さらに好ましくは150℃以下に
して、ワニスの乾燥温度の低下をはかり、良好な接着強
度を得る方法を見いだした。すなわち、ワニスの乾燥温
度と、樹脂の硬化、架橋密度には関連性があり、乾燥温
度が高くなるほど樹脂の架橋密度が増える。そのため、
熱可塑性樹脂においては高温時における流動性が低下
し、接着時における樹脂の密着性が悪くなり、接着温度
を同一とした場合に接着強度が低下する。
Means for Solving the Problems The present inventors have conducted studies to solve the above-mentioned problems, and as a result, the varnish solvent has a boiling point of 170 ° C. or lower, more preferably 150 ° C. or lower. A method for obtaining a good adhesive strength by reducing the drying temperature was found. That is, there is a relationship between the drying temperature of the varnish and the curing and crosslinking density of the resin, and the higher the drying temperature, the higher the crosslinking density of the resin. for that reason,
In a thermoplastic resin, the fluidity at a high temperature is reduced, the adhesion of the resin at the time of bonding is deteriorated, and the bonding strength is reduced when the bonding temperature is the same.

【0007】ワニスの乾燥温度を低下させるには、ワニ
スの溶剤の沸点を低下させる必要がある。 現在、ワニ
スに用いられている溶剤の沸点は200℃以上のもので
あり、これから沸点を170℃以下に低下させることに
より、乾燥温度を低下させることができる。
To lower the drying temperature of the varnish, it is necessary to lower the boiling point of the varnish solvent. At present, the boiling point of the solvent used for the varnish is 200 ° C. or higher, and the drying temperature can be lowered by lowering the boiling point to 170 ° C. or lower.

【0008】本発明により、接着時における流動性の高
い熱可塑性樹脂が得られるので、高いピール強度を発現
する金属積層板を得ることが可能となる。すなわち、プ
リント基板、TAB基材等のパターン形成時に加工性に
優れ、高い接続信頼性を有する基板を得ることが可能と
なる。
According to the present invention, a thermoplastic resin having a high fluidity at the time of bonding can be obtained, so that a metal laminate exhibiting high peel strength can be obtained. That is, it is possible to obtain a substrate having excellent workability and high connection reliability when forming a pattern such as a printed circuit board or a TAB base material.

【0009】[0009]

【発明の実施の形態】以下に本発明を詳しく説明する。
本発明の金属積層板は絶縁層と金属層の接着層にワニス
を前駆体とする熱可塑性樹脂を用いることが基本とな
り、ワニスの溶剤の沸点が170℃以下に、さらに好ま
しくは150℃以下であればよい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
The metal laminate of the present invention is based on the use of a thermoplastic resin having a varnish as a precursor for the adhesive layer between the insulating layer and the metal layer, and the varnish solvent has a boiling point of 170 ° C or lower, more preferably 150 ° C or lower. I just need.

【0010】絶縁層の形成には、金属箔に接着層となる
ポリイミド、ポリアミドイミド、アミドワニスを塗布、
キュウアを行う方法や、接着シートを用いる方法があ
る。接着シートのベースフィルムには通常、非熱可塑性
樹脂が用いられ、具体的には、ポリイミド、ポリアミ
ド、ポリアミドイミド、ナイロン等が用いられる。さら
に具体的には非熱可塑性宇部興産社製ポリイミドフィル
ムUpilexシリーズ、鐘淵化学社製ポリイミドフィルム、
デュポン社製ポリイミドフィルムKaptonシリーズ、東レ
社製アミドフィルムアラミカシリーズ等が挙げられる。
In order to form the insulating layer, a metal foil is coated with polyimide, polyamide imide, or amide varnish to serve as an adhesive layer.
There are a method of curing and a method of using an adhesive sheet. A non-thermoplastic resin is usually used for the base film of the adhesive sheet, and specifically, polyimide, polyamide, polyamideimide, nylon, or the like is used. More specifically, non-thermoplastic Ube Industries product polyimide film Upilex series, Kanekachi Chemical company polyimide film,
Examples include a polyimide film Kapton series manufactured by DuPont and an amide film Aramica series manufactured by Toray.

【0011】積層する金属層としては種類を問わず、こ
れは多層積層板を形成する場合でも同様である。金属層
の金属として具体的には、ステンレス、Cu、Fe、N
i、Mo、Al等が挙げられる。金属層と絶縁層の接着
は熱プレス、ラミネート等により行われる。
Regardless of the type of metal layer to be laminated, the same applies to the case of forming a multilayer laminate. As the metal of the metal layer, specifically, stainless steel, Cu, Fe, N
i, Mo, Al and the like. The bonding between the metal layer and the insulating layer is performed by hot pressing, laminating, or the like.

【0012】[0012]

【実施例】次に本発明の実施例を示す。ただし、本発明
は、以下の実施例に何ら限定されるものではない。 実施例1 宇部興産社製ポリイミドフィルム、ユーピレックス50SG
A (厚さ50μm)に、N,N-ジメチルアセトアミド(DMAc)
を溶剤として用いた、三井化学製ポリアミド酸ワニスPA
A-A を塗布、乾燥させ、総厚み70μmの接着シートを作
成した。この接着シートを5mm 幅、70mm長に切断し、23
0 ℃、20kg/cm2、5 秒の条件で日立金属社製YEF 42鋼
(幅25mm、長さ50mm、厚さ0.15mm)に小型ボンディング
装置で、熱プレスを行った。こうして得られたサンプル
を引っ張り速度50mm/minの条件でピール強度を測定し
た。結果は表1のようであった。
Next, examples of the present invention will be described. However, the present invention is not limited to the following examples. Example 1 Ube Industries, Ltd. polyimide film, Upilex 50SG
A (50 μm thick) with N, N-dimethylacetamide (DMAc)
Polyamic acid varnish PA manufactured by Mitsui Chemicals using
AA was applied and dried to prepare an adhesive sheet having a total thickness of 70 μm. Cut this adhesive sheet into 5mm width and 70mm length,
Hot pressing was performed on a YEF 42 steel (width 25 mm, length 50 mm, thickness 0.15 mm) manufactured by Hitachi Metals, Ltd. at 0 ° C., 20 kg / cm 2 , and 5 seconds using a small bonding machine. The peel strength of the thus obtained sample was measured under the conditions of a tensile speed of 50 mm / min. The results were as shown in Table 1.

【0013】比較例1 宇部興産社製ポリイミドフィルム、ユーピレックス50SG
A (厚さ50μm)に、N-メチルピロリドン(NMP) を溶剤
として用いた、三井化学製ポリアミド酸ワニスPAA-A を
塗布、乾燥させ、総厚み70μmの接着シートを作成し
た。この接着シートを5mm 幅、70mm長に切断し、230
℃、20kg/cm2、5 秒の条件で日立金属社製YEF 42鋼(幅
25mm、長さ50mm、厚さ0.15mm)に小型ボンディング装置
で、熱プレスを行った。こうして得られたサンプルを引
っ張り速度50mm/minの条件でピール強度を測定した。結
果は表1のようであった。
Comparative Example 1 Ube Industries, Ltd. polyimide film, Upilex 50SG
A (50 μm thick) was coated with PAA-A, a polyamic acid varnish made by Mitsui Chemicals, using N-methylpyrrolidone (NMP) as a solvent, and dried to prepare an adhesive sheet having a total thickness of 70 μm. Cut this adhesive sheet into 5mm width and 70mm length,
Temperature, 20 kg / cm 2 , 5 seconds, Hitachi Metals YEF 42 steel (width
(25 mm, length 50 mm, thickness 0.15 mm) was hot pressed with a small bonding machine. The peel strength of the sample thus obtained was measured at a pulling speed of 50 mm / min. The results were as shown in Table 1.

【0014】[0014]

【表1】 [Table 1]

【0015】実施例2 米国オーリン社製銅箔、C7025 箔 (厚さ18μm) にN,N-
ジメチルホルムアミド(DMF) を溶剤として用いた三井化
学製ポリアミド酸ワニスPAA-Pmを塗布、乾燥を行い、総
厚さ30μmの接着剤付銅張積層板を作成した。この接着
剤付銅張積層板を5mm 幅、70mm長に切断し、230 ℃、20
kg/cm2、5 秒の条件で新日鐵社製ステンレス箔SUS304HT
A (幅25mm、長さ50mm、厚さ20μm) に小型ボンディン
グ装置で、熱プレスを行った。こうして得られたサンプ
ルを引っ張り速度50mm/minの条件でピール強度を測定し
た。結果は表2のようであった。
Example 2 Copper foil manufactured by Ohlin Co., USA, C7025 foil (18 μm thick) was coated with N, N-
A polyamic acid varnish PAA-Pm manufactured by Mitsui Chemicals using dimethylformamide (DMF) as a solvent was applied and dried to prepare an adhesive-coated copper-clad laminate having a total thickness of 30 μm. Cut this copper-clad laminate with adhesive into 5mm width and 70mm length,
kg / cm 2 , stainless steel foil SUS304HT manufactured by Nippon Steel under conditions of 5 seconds
A (25 mm wide, 50 mm long, 20 μm thick) was hot pressed with a small bonding machine. The peel strength of the sample thus obtained was measured at a pulling speed of 50 mm / min. The results were as shown in Table 2.

【0016】比較例2 米国オーリン社製銅箔、C7025 箔 (厚さ18μm) にN-メ
チルピロリドン(NMP)を溶剤として用いた三井化学製ポ
リアミド酸ワニスPAA-Pmを塗布、乾燥を行い、総厚さ30
μmの接着剤付銅張積層板を作成した。この接着剤付銅
張積層板を5mm幅、70mm長に切断し、230 ℃、20kg/c
m2、5 秒の条件で新日鐵社製ステンレス箔SUS304HTA
(幅25mm、長さ50mm、厚さ20μm) に小型ボンディング
装置で、熱プレスを行った。こうして得られたサンプル
を引っ張り速度50mm/minの条件でピール強度を測定し
た。結果は表2のようであった。
Comparative Example 2 A polyamic acid varnish PAA-Pm manufactured by Mitsui Chemicals using N-methylpyrrolidone (NMP) as a solvent was applied to copper foil and C7025 foil (18 μm thick) manufactured by Ohlin Co., USA, and dried. Thickness 30
A copper-clad laminate with an adhesive of μm was prepared. This copper-clad laminate with adhesive is cut into 5mm width and 70mm length, 230 ° C, 20kg / c
m 2, with 5 seconds of conditions new day Tetsusha made of stainless steel foil SUS304HTA
(25 mm in width, 50 mm in length, 20 μm in thickness) were hot pressed with a small bonding machine. The peel strength of the sample thus obtained was measured at a pulling speed of 50 mm / min. The results were as shown in Table 2.

【0017】[0017]

【表2】 [Table 2]

【0018】[0018]

【発明の効果】実施例に示すとおり、本発明の低沸点の
溶剤を用いるワニスを使用することにより、高い接着強
度を有する金属積層板が得られるので、プリント基板、
TAB基材等のファインパターン形成時にも加工性が良
く、接続信頼性に優れた製品を得ることが可能となる。
As shown in the examples, the use of the varnish using the low-boiling solvent of the present invention makes it possible to obtain a metal laminate having a high adhesive strength.
Even when a fine pattern such as a TAB substrate is formed, workability is good and a product excellent in connection reliability can be obtained.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】金属積層板の絶縁層と金属層の接着剤とし
て使用される熱可塑性樹脂において、その前駆体である
ワニスの溶媒の沸点が170℃以下のものを使用するこ
とを特徴とする金属積層板。
1. A thermoplastic resin used as an adhesive between an insulating layer and a metal layer of a metal laminate, wherein a solvent of a varnish as a precursor thereof has a boiling point of 170 ° C. or less. Metal laminate.
【請求項2】該溶媒がN,N-ジメチルアセトアミドである
ことを特徴とする請求項1に記載の金属積層板。
2. The metal laminate according to claim 1, wherein said solvent is N, N-dimethylacetamide.
【請求項3】該溶媒がN,N-ジメチルホルムアミドである
ことを特徴とする請求項1に記載の金属積層板。
3. The metal laminate according to claim 1, wherein said solvent is N, N-dimethylformamide.
JP34901398A 1998-12-08 1998-12-08 Metal laminated board employing low boiling point solvent varnish as precursor of adhesive Pending JP2000167980A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34901398A JP2000167980A (en) 1998-12-08 1998-12-08 Metal laminated board employing low boiling point solvent varnish as precursor of adhesive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34901398A JP2000167980A (en) 1998-12-08 1998-12-08 Metal laminated board employing low boiling point solvent varnish as precursor of adhesive

Publications (1)

Publication Number Publication Date
JP2000167980A true JP2000167980A (en) 2000-06-20

Family

ID=18400907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34901398A Pending JP2000167980A (en) 1998-12-08 1998-12-08 Metal laminated board employing low boiling point solvent varnish as precursor of adhesive

Country Status (1)

Country Link
JP (1) JP2000167980A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007132529A1 (en) 2006-05-17 2007-11-22 Pi R & D Co., Ltd. Metal composite film and process for producing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007132529A1 (en) 2006-05-17 2007-11-22 Pi R & D Co., Ltd. Metal composite film and process for producing the same

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