JP2000003038A - Visible light-curable resin composition and its use - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a visible light-curable resin compsn. capable of being handled under the condition of bright safelight and having high sensitivity by incorporating a photosensitizer contg. at least one specified organoboron compd., and specifying the absorbance of formed unexposed film a specified value or below. SOLUTION: The resin compsn. used in an environment irradiated with safelight having the max. wavelength selected from the range of 500-620 nm and high luminous efficiency contains a photosetting resin, a photoreaction initiator and a photosensitizer contg. at least one organoboron compd. represented by the formula. The absorbance of an unexposed coating formed from the compsn. is <=0.5 in the range of (the max. wavelength of the safelight) ±30 nm. In the formula, R1-R3 and R5-R7 are each H, a halogen, nitro or the like, R4 is H, cyano, an alkyl or the like and R8 and R9 are each a halogen, alkyl, aralkyl or the like.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a visible light curable resin composition containing a photosensitizer of an organoboron compound having a specific structure, which is used with a specific safety light.

[0002]

2. Description of the Related Art In recent years, in the field of information using a photopolymerization reaction or image recording, instead of a conventional recording method using ultraviolet light using a film original or the like, a manuscript electronically edited by a computer is directly output at a high output. A method of directly outputting and recording using a laser is being studied. This method has the advantage that the recording and image forming steps can be greatly simplified by direct writing with a laser.

At present, many high-power and stable laser light sources generally used have an output wavelength in the visible region. Specifically, the wavelength 488 nm and 51
Argon laser with stable oscillation line at 4.5 nm or YAG with emission line at 532 nm as second harmonic
Lasers and the like are widely used. Therefore, compounds having high sensitivity to these wavelengths have been desired, but conventionally used ultraviolet light-sensitive agents cannot be used due to low sensitivity in the visible region. Although the addition of a pyrylium salt or a thiopyrylium salt can improve the sensitivity in the visible region, the storage stability of the photosensitive layer is low and it has been difficult to use the photosensitive layer.

As compounds having photosensitivity in the visible region,
For example, 7-diethylamino-3-benzothiazoylcoumarin (common name: coumarin-6) or bis [3
-(7-diethylaminocoumaryl)] ketone (common name:
Ketocoumarin) is known, but since these have a maximum absorption wavelength of about 450 nm, they have a shorter wavelength than 488 nm of an argon laser and have insufficient sensitivity. Further, the 4-substituted-3-benzothiazoyl coumarin compound described in JP-A-4-18088 has high sensitivity at 488 nm of an argon laser,
At 4.5 nm or at 532 nm, which is the second harmonic of the YAG laser, there was almost no absorption, leaving room for improvement in sensitivity.

[0005] Further, European Patent No. 0619520, US Patent No. 5,498,641 and Japanese Patent Application Laid-Open No. H8-6245,
JP-A-7-225474, JP-A-7-21922
No. 3, JP-A-7-5885, JP-A-5-24
No. 1338 discloses a bispyrromethene-based boron compound. However, when this compound is used, there remains room for improvement in the sensitivity to the laser light and the storage stability of the photosensitive layer.

When the visible light curable resin composition to be cured with visible light as described above is used, a dark red colorant is coated on the outer tube or a dark red film is coated on the outer tube. Electric lights such as fluorescent lamps that are colored by being wound are used as safety lights (working lights). However, under such a dark red safety light environment, it is not easy to inspect the state of the coating film after application, and it is not easy to inspect the coating device, irradiation device, transport device, etc. There is a problem that work efficiency, product quality stability and the like are inferior. When a non-colored fluorescent lamp is used as a safety light, the working environment is bright and there is no problem.

[0007]

SUMMARY OF THE INVENTION An object of the present invention is to provide a visible light curable resin composition having excellent sensitivity which can be handled under bright safe light conditions.

[0008]

The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have developed a specific photocurable resin composition used with a specific safety light. As a result, they have found that the conventional problems can be solved, and have completed the present invention.

That is, the present invention relates to a visible light-curable resin composition which is used in an environment in which a safety light having a maximum wavelength selected from the range of 1,500 to 620 nm and high relative luminous efficiency is used. Visible light curing in which the product contains a photocurable resin (A), a photoreaction initiator (B) and a photosensitizer (C) containing at least one organic boron compound represented by the following general formula (1). Resin composition, wherein the absorbance of the unexposed film formed from the composition is 0.5
Visible light curable resin composition, characterized by the following,

[0010]

Embedded image

Wherein R ₁ , R ₂ , R ₃ , R ₅ , R ₆ and R ₇ are each independently a hydrogen atom, a halogen atom, a nitro group,
Cyano group, hydroxy group, amino group, carboxyl group,
Sulfonic acid group, alkyl group, halogenoalkyl group, alkoxyalkyl group, alkoxy group, alkoxyalkoxy group, aryloxy group, aralkyloxy group, acyl group, alkoxycarbonyl group, aminocarbonyl group, alkylaminocarbonyl group, dialkylaminocarbonyl group , Alkylcarbonylamino group, arylcarbonylamino group, arylaminocarbonyl group, aryloxycarbonyl group, aralkyl group, aryl group, heteroaryl group, alkylthio group, arylthio group, alkenyloxycarbonyl group, aralkyloxycarbonyl group, alkoxycarbonylalkoxy Carbonyl group, alkylcarbonylalkoxycarbonyl group, mono (hydroxyalkyl) aminocarbonyl group, di (hydroxyalkyl) amino Carbonyl group, mono (alkoxyalkyl) aminocarbonyl group, di (alkoxyalkyl)
An amino group or an alkenyl group, R _1,
At least one of R ₂ , R ₃ , R ₅ , R ₆ and R ₇ is an alkoxy group, an alkoxyalkoxy group, an aryloxy group or an aralkyloxy group, and R ₄ is a hydrogen atom, a cyano group or an alkyl group. Represents an aralkyl group, an aryl group, a heteroaryl group or an alkenyl group,
R ₈ and R ₉ are a halogen atom, an alkyl group, an aralkyl group,
Aryl group, heteroaryl group, alkoxy group, alkoxyalkoxy group, alkoxyalkoxyalkoxy group, halogenoalkyl group, alkylthioalkyl group, dialkylaminoalkyl group, alkylthioalkoxy group, dialkylaminoalkoxy group, dialkylaminoalkoxyalkoxy group, alkylthio group, Represents an alkoxyalkylthio group, an alkylthioalkylthio group, a dialkylaminoalkylthio group, an aralkyloxy group, an aryloxy group, an arylthio group, a heteroaryloxy group or a heteroarylthio group. However, when R ₈ and R ₉ are both halogen atoms, R ₁ , R ₂ , R ₃ ,
None of R ₅ , R ₆ , and R ₇ is an alkenyl group. ]

(2) The visible light-curable resin composition as described above, wherein the safety light is generated by a discharge lamp (mainly D-line having a light wavelength of 589 nm) containing sodium as a main component. A composition for a visible light curable material comprising the above visible light curable resin composition and a solvent; 4, a visible light curable material comprising the above visible light curable resin composition on a substrate It is about.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention relates to a curable resin composition having excellent curability with respect to visible light, and the safe light used in the present invention is applied to the visible light curable resin composition of the present invention. In addition to safety light that does not cause a curing reaction, the safety light to be used is a region with high relative luminous efficiency of human beings, so it feels very bright at the same illumination light intensity compared to conventional ones, so that safety workability, It has excellent effects on work efficiency, product quality stability, etc.

In the present invention, the term "composition for visible light curable material" refers to, for example, paints, inks, adhesives, printing materials, resist materials, and non-photosensitive films formed from these materials. Is what it means.

Conventionally, the safety light used is a fluorescent light colored red, but the emission spectrum of the fluorescent light has a wide wavelength range from ultraviolet light to visible light (FIG. 5). It hardens even the visible light-curable resin coating part that requires it, and it becomes impossible to form a clear resist pattern by the development process. For this reason, the working environment is further darkened because the intensity of the illumination light is reduced. There is such a problem. On the other hand, the above problem is solved because the safety light used in the present invention has a sharp wavelength like a sodium lamp, for example.

That is, the safety light used in the present invention is 50
It is a visible light with a large relative luminous efficiency having a maximum wavelength selected from the range of 0 to 620 nm, preferably 510 to 600 nm. This safety light can be obtained, for example, by using a discharge lamp that emits a light beam having a maximum wavelength in the above range by discharging in a gas such as sodium. Among these, sodium lamps mainly emit yellow D-rays with a wavelength of 589 nm from the lamps, and since they are monochromatic light, there are few chromatic aberrations, and objects can be seen sharply, so safety, work environment, etc. Excellent. FIG. 1 shows a spectral distribution diagram of the low-pressure sodium lamp.
As shown in the sodium lamp spectral distribution diagram, in addition to the D line which is the maximum wavelength of the sodium lamp, it has a high energy wavelength component (low wavelength region) to such an extent that the visible light curable resin composition is not adversely affected. It does not matter.

[0017] In addition, a high-energy wavelength component other than the D-line cut by applying a filter to the sodium lamp can also be used as safety light. FIG. 2 shows the spectral distribution of the sodium lamp from which high-energy wavelength components have been cut in this way. Examples of the filter include “Fantac FD-1081 Scarlet” and “Fantac FC-1431 Sunflower”
Yellow (trade name, manufactured by Kansai Paint Co., Ltd.), Lintec Lumicool Film No. 190
5 "(trade name, manufactured by Lintec Corporation).

As the safety light used in the present invention, it is preferable to use a sharp single light color having a light beam of 589 nm like a sodium lamp. A safe light having wavelength components distributed in the wavelength range of the visible light region and the infrared light region other than the above-mentioned range may be used. However, when using safety light having such a distributed wavelength component, the distributed wavelength component must be a safe light region that does not adversely affect (photosensitize) the visible light curable resin composition. is necessary.

Such a safe high-energy light wavelength region (low-wavelength region) relates to the energy intensity of the distributed light beam and the absorbance of the visible light curable resin composition in that region. Can be used when the composition has a small absorbance, and when the energy intensity of the light beam is small, the composition can have a relatively large absorbance than the former. It can have a high-energy light wavelength region to the extent that it does not adversely affect it. However, even if a normal fluorescent lamp having a maximum wavelength in the range of 500 to 620 nm is used as the safety light, the fluorescent light is 500 n
Since it has a large light energy intensity of less than m, particularly 400 to 499 nm, it cannot be used as a safe light of a visible light curable resin composition which is exposed to a visible light laser having an oscillation line at 488 nm or 532 nm.

The absorbance defined in the present invention is -log (I
/ I ₀ ). Here, I is the intensity of transmitted light of the coating obtained by applying the visible light curable resin composition on the surface of the transparent substrate and drying (removing the solvent), and I ₀ is a blank [sample (visible light curable resin composition) ) Is applied to a transparent substrate (eg, a polyethylene terephthalate sheet)].

How bright light is perceived by human eyes can be represented by relative luminous efficiency. The relative luminous efficiency is JI
As defined in SZ8113, 2005, under certain observation conditions, when it is determined that the monochromatic radiation of a certain wavelength λ has the same brightness as the radiation used as a reference for comparison, the monochromatic radiation of a wavelength λ is determined. It is defined as a value obtained by normalizing the reciprocal of the relative value of the radiance, usually, the maximum value when λ is changed to 1. FIG. 3 shows a relative luminous efficiency curve of 380 to 780 nm, which is a wavelength region of visible light. In FIG. 3, the vertical axis represents the ratio, with the maximum value of the relative luminous efficiency set to 100. From this curve, the conventional red wavelength range of 640 to
At 780 nm, the relative luminous efficiency is low, and it is perceived as dark by human eyes. For example, it can be seen that the radiation intensity must be further increased in order to feel the same brightness as the wavelength of 589 nm. The maximum value of the visibility is about 555 nm (JI
S-Z8113 2008).

The visible light curable resin composition of the present invention comprises a photocurable resin (A), a photoreaction initiator (B) (for example, a photoradical polymerization initiator, a photoacid generator, a photobase generator, etc.) and A visible light curable resin composition containing an organic boron compound having a specific structure and a photosensitizer (C), wherein the absorbance of an unexposed film formed from the composition is selected from the above range. The maximum wavelength of the safety light having the maximum wavelength in the range of ± 30 nm (-30 nm to +30 nm), preferably ± 20 n
m (−20 nm to +20 nm), and further ± 10 n
Any material can be used as long as it is 0.5 or less, preferably 0.2 or less, and more preferably 0.1 or less with respect to the range of m (−10 nm to +10 nm).

The photocurable resin (A) used in the present invention comprises:
It is not particularly limited as long as it is a commonly used photocurable resin having a photosensitive group that can be crosslinked by light irradiation. Examples of the resin include a compound having at least one ethylenically unsaturated double bond, a monomer,
Examples include prepolymers, oligomers such as dimers and trimers, mixtures thereof, and copolymers thereof. In addition, for example, urethane resin, epoxy resin, polyester resin, polyether resin, alkyd resin, polyvinyl chloride resin, fluorine resin, silicone resin, vinyl acetate resin, novolak resin Resin and a resin in which a photopolymerizable unsaturated group is bonded to two or more kinds of modified resins. Examples of the photopolymerizable unsaturated group include an acryloyl group, a methacryloyl group, a vinyl group, a styryl group, an allyl group, a cinnamoyl group, a cinnamylidene group, and an azide group.

In the above-mentioned photocurable resin (A), monofunctional and polyfunctional (meth) acrylates are generally used,
For example, an anionic photocurable resin containing a (meth) acryloyl group as a photosensitive group described in page 2, lower right column, line 6 to page 6, lower left column, line 16 of JP-A-3-223759, photosensitive resin Examples thereof include a photocurable resin containing a cinnamoyl group as a functional group, and a photocurable resin containing an allyl group as a photosensitive group. The photocurable resin (A) is preferably used in combination with the following photoradical polymerization initiator. These photocurable resins (A) may be used alone or may be mixed. In the publication, a photocurable resin component (a
As specific examples of the esterified product of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid described in 2) of the ethylenically unsaturated compound, polyethylene glycol di (meth) acrylate having a molecular weight of 300 to 1,000 can also be used.

In addition to the above-mentioned photocurable resin (A), a polymerization reaction, etherification reaction, pinacol transfer, silanol dehydration reaction, intramolecular dehydration condensation reaction, A compound that is cured (insolubilized) by a reaction such as a decomposition condensation reaction can be used. Examples of the compound include glycidyl ether type epoxy compounds such as bisphenol A type diglycidyl ether, (poly) ethylene glycol diglycidyl ether, trimethylolpropane diglycidyl ether, and 3,4-epoxycyclohexylmethyl-3,4-type.
Epoxycyclohexane carboxylate, dicyclopentadienedioxide, epoxycyclohexene carboxylic acid ethylene glycol diester, 1,3-bis [2- {3- (7-oxabicyclo [4.1.0] heptyl)} ethyl] -tetramethyl Disiloxane (J. Po
alicyclic epoxy compounds such as lym. Sci .: Part A: Polym. Chem. 28, 479, 1990), butylene glycol divinyl ether, trimethylol propane di (1-propenyl) methyl ether, trimethylol propane di ( 1-propenyl) butyl ether, trimethylolpropanedi (1-propenyl) octyl ether, trimethylolpropanedi (1-propenyl) phenyl ether, trimethylolpropanedi (1-propenyl) ether acetate, trimethylolpropanedi (1-propenyl) ) Ether acrylates and vinyl ether compounds such as trimethylolpropanedi (1-propenyl) -N-butyl carbonate (J. Polym. Sci .: Part A:
Polym. Chem. 34, 2051, 1996), dodecyl arene (DA), diethylene glycol dialen (DEG)
A), triethylene glycol dialen (TEGA),
1-tetrahydrofurfurylarene ether (THF
A), n-hexyloxy-1,2-propadiene (H
A) Alkoxyallene compounds such as 1,4-di-n-butoxy-1,2-butadiene (DBB), 1,4-diethoxy-1,2-butadiene, n-hexylpropadyl ether (HPE) ( J. Polym. Sci .: Part A:
Polym. Chem. 33, 2493, 1995), 3-ethyl-3
Phenoxymethyl oxetane, phenoxymethyl oxetane, methoxymethyl oxetane, 3-methyl-3-
Oxetane compounds such as methoxymethyl oxetane (
J. Polym. Sci .: Part A: Polym. Chem. 33, 1807, 1
995), 2-propylidene-4,5-dimethyl-
1,3-dioxolan, 2-propylidene-4-methyl-1,3-dioxolan, 3,9-dibutylidene-2,
Ketene acetal compounds such as 4,8,10-tetraoxaspiro [5.5] undecane (J. Polym. Sci .:
Part A: Polym. Chem. 34, 3091, 1996), bicycloorthoester compounds such as 1-phenyl-4-methyl-2,6,7-trioxabicyclo [2.2.2] octane (J. Polym. Sci .: Polym. Lett. Ed. 23, 35
9, 1985), propiolactone, butyrolactone,
Lactone compounds such as γ-valerolactone, γ-caprolactone, γ-caprylolactone, γ-laurylolactone, coumarin, aromatic vinyl compounds such as methoxy-α-methylstyrene, and heterocyclic vinyl compounds such as vinylcarbazole Compounds, melamine compounds such as hexamethylolmelamine and hexamethoxymelamine, copolymers of p-vinylphenol and p-vinylbenzylacetate, and other aromatic compounds such as trimethylolbenzene and tri (acetoxycarbonylmethyl) benzene Etc. can be given. These compounds may have a polymer structure as long as they are cured by protons of an acid.

Further, a compound which is cured (insolubilized) by a polymerization reaction or a condensation reaction using a base generated from a photobase generator as a catalyst, for example, a compound containing a functional group such as an epoxy group or a silanol group can be used.

Further, in addition to the above-mentioned compounds which are cured by a catalyst generated from a photoacid or base generator, if necessary, conventionally known acrylic resins, vinyl resins, polyester resins, alkyd resins, epoxy resins, Resins that do not contain unsaturated groups, such as phenolic resins, rubbers, and urethane resins, can be blended.

As the photoreaction initiator (B) used in the present invention, a photoradical polymerization initiator, a photoacid generator and a photobase generator can be used.

As the photo-radical polymerization initiator, it is possible to adjust the absorbance of the uncured film within the range of 0.5 or less within the range of ± 30 nm of the maximum wavelength of the safe light having the maximum wavelength selected from the above range. Known ones can be used. Examples thereof include aromatic carbonyl compounds such as benzophenone, benzoin methyl ether, benzoin isopropyl ether, benzyl, xanthone, thioxanthone, and anthraquinone; acetophenone, propiophenone, α-hydroxyisobutylphenone, α, α′-dichloro-. Acetophenones such as 4-phenoxyacetophenone, 1-hydroxy-1-cyclohexylacetophenone, diacetylacetophenone, and acetophenone; benzoyl peroxide, t-
Butylperoxy-2-ethylhexanoate, t-butyl hydroperoxide, di-t-butyldiperoxyisophthalate, 3,3 ′, 4,4′-tetra (t
Organic peroxides such as -butylperoxycarbonyl) benzophenone; diphenylhalonium salts such as diphenyliodobromide and diphenyliodonium chloride; organic halides such as carbon tetrabromide, chloroform and iodoform; 3-phenyl-5-isoxazolone , 2,4,6-tris (trichloromethyl) -1,
Heterocyclic and polycyclic compounds such as 3,5-triazinebenzanthrone; 2,2′-azo (2,4-dimethylvaleronitrile), 2,2-azobisisobutyronitrile, 1,1′- Azo compounds such as azobis (cyclohexane-1-carbonitrile) and 2,2′-azobis (2-methylbutyronitrile); iron-allene complexes (see European Patent No. 152377); titanocene compounds (Japanese Unexamined Patent Publication No. 221110) Bisimidazole compounds; N-arylglycidyl compounds; acridine compounds; combinations of aromatic ketones / aromatic amines; peroxyketals (see JP-A-6-321895). Among the above photoradical polymerization initiators, di-t-butyldiperoxyisophthalate, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, an iron-allene complex and a titanocene compound are It is preferable to use this one because of its high activity against crosslinking or polymerization.

The photoacid generator is a compound which generates an acid upon exposure to light, and cures the above compound using the generated acid as a catalyst. The absorbance of the uncured film is selected from the above range. A conventionally known one that can be adjusted to a range of 0.5 or less within a range of ± 30 nm of the maximum wavelength of the safety light having the maximum wavelength can be used. As long as it satisfies the above conditions,
Commonly used photoacid generators can be used. Specifically, for example, sulfonium salts, ammonium salts, phosphonium salts, iodonium salts, onium salts such as selenium salts, iron-allene complexes, silanol-metal chelate complexes, triazine compounds, diazidonaphthoquinone compounds, sulfone Acid esters, sulfonic imide esters and the like can be used. In addition, in addition to the above, Japanese Patent Application Laid-Open No.
Photo-acid generators described in -289218 can also be used.

The photobase generator is a compound that generates a base upon exposure to light, and cures the above compound using the generated base as a catalyst. The absorbance of the uncured film is selected from the above range. A conventionally known one that can be adjusted to a range of 0.5 or less within a range of ± 30 nm of the maximum wavelength of the safety light having the maximum wavelength can be used. As this, a photoacid generator generally used can be used as long as it satisfies the above conditions. Specifically, for example, nitrobenzyl carbamate compounds such as [(o-nitrobenzyl) oxy) carbonylcyclohexylamine (J. Am. Chem. So
c., Vol. 113, No. 11, 4305, 1991), N-[[1
-3,5-dimethoxyphenyl) -1-methyl-ethoxy] carbonyl] cyclohexylamine, N-[[1-
Photofunctional urethane compounds such as (3,5-dimethoxyphenyl) -1-methyl-ethoxy] carbonyl] pyridine (see J. Org. Chem., Vol. 55, No. 23, 5919, 1990).
Etc. can be used.

The mixing ratio of the photoreaction initiator is not critical, and can be varied in a wide range depending on the type. Generally, 100 parts by weight (solid content) of the photocurable resin is used.
0.1 to 25 parts by weight, preferably 0.2 to 10 parts by weight
Parts by weight. When used in a large amount exceeding 25 parts by weight, the stability of the resulting composition tends to decrease.

The organic boron compound represented by the general formula (1) as the photosensitizer (C) is excited by absorbing light in the visible light region of 400 to 700 nm, particularly light of 400 to 600 nm. And a compound having an interaction with the photocurable resin (A) and the photoreaction initiator (B). The term "interaction" used herein refers to the energy transfer from the excited organic boron compound represented by the general formula (1) used in the present invention to the photocurable resin (A) or photoreaction initiator (B). And electron transfer. From this, the organic boron compound represented by the general formula (1) having a unique structure is a very useful compound as a photosensitizer.

In the compound represented by the general formula (1) of the present invention, specific examples of R ₁ , R ₂ , R ₃ , R ₅ , R ₆ and R ₇ include a hydrogen atom; a nitro group; a cyano group; Hydroxy group; amino group; carboxyl group; sulfonic acid group;
Halogen atoms such as chlorine atom and bromine atom; methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, t-butyl group, n-pentyl group, isopentyl group, n-hexyl group, n-octyl group, 2-
An alkyl group such as an ethylhexyl group and a cyclohexyl group;
Chloromethyl group, dichloromethyl group, fluoromethyl group, trifluoromethyl group, pentafluoroethyl group,
A halogenoalkyl group such as a nonafluorobutyl group; an alkoxyalkyl group such as a methoxyethyl group, an ethoxyethyl group, an isopropyloxyethyl group, a 3-methoxypropyl group, and a 2-methoxybutyl group;

Methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, tert-butoxy, sec-butoxy, n-
Pentyloxy group, isopentyloxy group, tert-
Pentyloxy group, sec-pentyloxy group, cyclopentyloxy group, n-hexyloxy group, 1-methylpentyloxy group, 2-methylpentyloxy group, 3-
Methylpentyloxy group, 4-methylpentyloxy group, 1,1-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1,3-dimethylbutoxy group, 2,3-dimethylbutoxy group, 1,1,2- Trimethylpropoxy group, 1,2,2-trimethylpropoxy group, 1-ethylbutoxy group, 2-ethylbutoxy group, 1-ethyl-2-
Methylpropoxy group, cyclohexyloxy group, methylcyclopentyloxy group, n-heptyloxy group, 1-
Methylhexyloxy group, 2-methylhexyloxy group, 3-methylhexyloxy group, 4-methylhexyloxy group, 5-methylhexyloxy group, 1,1-dimethylpentyloxy group, 1,2-dimethylpentyloxy group 1,3-dimethylpentyloxy group, 1,4-dimethylpentyloxy group, 2,2-dimethylpentyloxy group, 2,3-dimethylpentyloxy group, 2,4-
Dimethylpentyloxy group, 3,3-dimethylpentyloxy group, 3,4-dimethylpentyloxy group, 1-ethylpentyloxy group, 2-ethylpentyloxy group,
3-ethylpentyloxy group, 1,1,2-trimethylbutoxy group, 1,1,3-trimethylbutoxy group, 1,
2,3-trimethylbutoxy group, 1,2,2-trimethylbutoxy group, 1,3,3-trimethylbutoxy group,
2,3,3-trimethylbutoxy group, 1-ethyl-1-
Methylbutoxy group, 1-ethyl-2-methylbutoxy group, 1-ethyl-3-methylbutoxy group, 2-ethyl-
1-methylbutoxy group, 2-ethyl-3-methylbutoxy group, 1-n-propylbutoxy group, 1-isopropylbutoxy group, 1-isopropyl-2-methylpropoxy group, methylcyclohexyloxy group, n-octyloxy group , 1-methylheptyloxy group, 2-methylheptyloxy group, 3-methylheptyloxy group, 4-methylheptyloxy group, 5-methylheptyloxy group, 6-
Methylheptyloxy group, 1,1-dimethylhexyloxy group, 1,2-dimethylhexyloxy group, 1,3-
Dimethylhexyloxy group, 1,4-dimethylhexyloxy group, 1,5-dimethylhexyloxy group, 2,2
-Dimethylhexyloxy group, 2,3-dimethylhexyloxy group, 2,4-dimethylhexyloxy group, 2,
5-dimethylhexyloxy group, 3,3-dimethylhexyloxy group, 3,4-dimethylhexyloxy group,
3,5-dimethylhexyloxy group, 4,4-dimethylhexyloxy group, 4,5-dimethylhexyloxy group, 1-ethylhexyloxy group, 2-ethylhexyloxy group, 3-ethylhexyloxy group, 4-ethylhexyloxy group A 1-n-propylpentyloxy group,
2-n-propylpentyloxy group, 1-isopropylpentyloxy group, 2-isopropylpentyloxy group, 1-ethyl-1-methylpentyloxy group, 1-ethyl-2-methylpentyloxy group, 1-ethyl-3 −
Methylpentyloxy group, 1-ethyl-4-methylpentyloxy group, 2-ethyl-1-methylpentyloxy group, 2-ethyl-2-methylpentyloxy group, 2-ethyl-3-methylpentyloxy group, 2 -Ethyl-4-
Methylpentyloxy group, 3-ethyl-1-methylpentyloxy group, 3-ethyl-2-methylpentyloxy group, 3-ethyl-3-methylpentyloxy group, 3-ethyl-4-methylpentyloxy group, 1 1,1,2-trimethylpentyloxy group, 1,1,3-trimethylpentyloxy group, 1,1,4-trimethylpentyloxy group, 1,2,2-trimethylpentyloxy group, 1,
2,3-trimethylpentyloxy group, 1,2,4-trimethylpentyloxy group, 1,3,4-trimethylpentyloxy group, 2,2,3-trimethylpentyloxy group, 2,2,4-trimethylpentyl Oxy group, 2,
3,4-trimethylpentyloxy group, 1,3,3-trimethylpentyloxy group, 2,3,3-trimethylpentyloxy group, 3,3,4-trimethylpentyloxy group, 1,4,4-trimethylpentyl Oxy group, 2,
4,4-trimethylpentyloxy group, 3,4,4-trimethylpentyloxy group, 1-n-butylbutoxy group, 1-isobutylbutoxy group, 1-sec-butylbutoxy group, 1-tert-butylbutoxy group, 2-te
rt-butylbutoxy group, 1-n-propyl-1-methylbutoxy group, 1-n-propyl-2-methylbutoxy group, 1-n-propyl-3-methylbutoxy group, 1-isopropyl-1-methylbutoxy Group, 1-isopropyl-2-methylbutoxy group, 1-isopropyl-3-methylbutoxy group, 1,1-diethylbutoxy group, 1,2-
Diethyl butoxy group, 1-ethyl-1,2-dimethylbutoxy group, 1-ethyl-1,3-dimethylbutoxy group,
1-ethyl-2,3-dimethylbutoxy group, 2-ethyl-1,1-dimethylbutoxy group, 2-ethyl-1,2-
Dimethylbutoxy group, 2-ethyl-1,3-dimethylbutoxy group, 2-ethyl-2,3-dimethylbutoxy group,
1,2-dimethylcyclohexyloxy group, 1,3-dimethylcyclohexyloxy group, 1,4-dimethylcyclohexyloxy group, ethylcyclohexyloxy group,
n-nonyloxy group, 3,5,5-trimethylhexyloxy group, n-decyloxy group, n-undecyloxy group, n-dodecyloxy group, n-pentadecanyloxy group, icosanyloxy group, 2-decalinoxy group, 4-
1 to 1 carbon atoms such as a (t-butyl) cyclohexyloxy group
20 linear alkoxy groups, or branched or cyclic alkoxy groups having 1 to 10 carbon atoms;

Alkoxyalkoxy groups such as methoxyethoxy, ethoxyethoxy, 3-methoxypropoxy and 3- (isopropyloxy) propoxy; phenoxy, 2-methylphenoxy, 4-methylphenoxy, 4-t- Aryloxy groups such as butylphenoxy group, 2-methoxyphenoxy group and 4-isopropylphenoxy group; benzyloxy group, phenethyloxy group,
3-phenylpropoxy group, 1-naphthylmethoxy group,
2-naphthylmethoxy group, 2-naphthylethoxy group, biphenylmethoxy group, 2-anthraquinoylmethoxy group, 4-ethylphenylmethoxy group, 4-p-isopropylphenylmethoxy group, 4-t-butylphenylmethoxy group, p -Isopropylphenylethoxy group, t-butylphenylethoxy group, 4-t-butylphenylethoxy group, tolylmethoxy group, tolylethoxy group, 2,3
-Dimethylphenylmethoxy group, 2,4-dimethylphenylmethoxy group, 2,5-dimethylphenylmethoxy group, 2,6-dimethylphenylmethoxy group, 2,4,6
-Trimethylphenylmethoxy, 2-chlorophenylmethoxy, 3-chlorophenylmethoxy, 4-chlorophenylmethoxy, 2-bromophenylmethoxy, 3-bromophenylmethoxy, 4-bromophenylmethoxy, 2-fluorophenylmethoxy Group, 3-
Fluorophenylmethoxy group, 4-fluorophenylmethoxy group, 2-methoxyphenylmethoxy group, 3-methoxyphenylmethoxy group, 4-methoxyphenylmethoxy group, 2-ethoxyphenylmethoxy group, 3-ethoxyphenylmethoxy group, 4-ethoxy Phenylmethoxy group, 2-n-propoxyphenylmethoxy group, 3-n-
Propoxyphenylmethoxy group, 4-n-propoxyphenylmethoxy group, 2-isopropoxyphenylmethoxy group, 3-isopropoxyphenylmethoxy group, 4-isopropoxyphenylmethoxy group, 2-n-butoxyphenylmethoxy group, 3-n -Butoxyphenylmethoxy group, 4-n-butoxyphenylmethoxy group, 2-isobutoxyphenylmethoxy group, 3-isobutoxyphenylmethoxy group, 4-isobutoxyphenylmethoxy group, 2
-T-butoxyphenylmethoxy group, 3-t-butoxyphenylmethoxy group, 4-t-butoxyphenylmethoxy group, 2,3-dimethylphenylethoxy group, 2,4-
Dimethylphenylethoxy group, 2,5-dimethylphenylethoxy group, 2,6-dimethylphenylethoxy group,
2,4,6-trimethylphenylethoxy group, 2-chlorophenylethoxy group, 3-chlorophenylethoxy group, 4-chlorophenylethoxy group, 2-bromophenylethoxy group, 3-bromophenylethoxy group, 4-bromophenylethoxy group, 2-fluorophenylethoxy group, 3-fluorophenylethoxy group, 4-fluorophenylethoxy group, 2-methoxyphenylethoxy group, 3-methoxyphenylethoxy group, 4-methoxyphenylethoxy group, 2-ethoxyphenylethoxy group,
3-ethoxyphenylethoxy group, 4-ethoxyphenylethoxy group, 2-n-propoxyphenylethoxy group, 3-n-propoxyphenylethoxy group, 4-n-
Propoxyphenylethoxy group, 2-isopropoxyphenylethoxy group, 3-isopropoxyphenylethoxy group, 4-isopropoxyphenylethoxy group, 2-n
-Butoxyphenylethoxy group, 3-n-butoxyphenylethoxy group, 4-n-butoxyphenylethoxy group, 2-isobutoxyphenylethoxy group, 3-isobutoxyphenylethoxy group, 4-isobutoxyphenylethoxy group, 2- t-butoxyphenylethoxy group, 3
-T-butoxyphenylethoxy group, 4-t-butoxyphenylethoxy group, fluoren-9-yloxy group,
9-methylfluoren-9-yloxy group, 9-ethylfluoren-9-yloxy group, 9-propylfluoren-9-yloxy group, 9-butylfluoren-9-yloxy group, 4-nitrobenzyloxy group, 4-cyano Benzyloxy group, 4-acetylbenzyloxy group,
2,4-dimethylbenzyloxy group, 2,3-dimethylbenzyloxy group, 2,5-dimethylbenzyloxy group, 2,6-dimethylbenzyloxy group, 3,5-dimethylbenzyloxy group, 2,4,6 An aralkyloxy group having 1 to 20 carbon atoms such as a trimethylbenzyloxy group;

Acyl groups such as formyl group, acetyl group, ethylcarbonyl group, n-propylcarbonyl group, isopropylcarbonyl group, isobutylcarbonyl group, t-butylcarbonyl group, isopentylcarbonyl group and benzylcarbonyl group; methoxycarbonyl group; Ethoxycarbonyl group, n-butoxycarbonyl group, n-hexyloxycarbonyl group, n-octyloxycarbonyl group,
n-decyloxycarbonyl group, cyclopentyloxycarbonyl group, cyclohexyloxycarbonyl group, 4
An alkoxycarbonyl group such as -methylcyclohexyloxycarbonyl group; an aminocarbonyl group; an alkyl group such as a methylaminocarbonyl group, an n-butylaminocarbonyl group, an n-hexylaminocarbonyl group, a cyclohexylaminocarbonyl group, a 4-methylcyclohexylaminocarbonyl group. An aminocarbonyl group;

Dimethylaminocarbonyl, diethylaminocarbonyl, di-n-butylaminocarbonyl, di-n-hexylaminocarbonyl, di-n-octylaminocarbonyl, N-isoamyl-N-methylaminocarbonyl, etc. Dialkylaminocarbonyl group; alkylcarbonylamino group such as acetylamino group, ethylcarbonylamino group, isobutylcarbonylamino group; phenylaminocarbonyl group, 4-methylphenylaminocarbonyl group, 2-methoxyphenylaminocarbonyl group, 4-n Arylaminocarbonyl groups such as -propylphenylaminocarbonyl group; phenylcarbonylamino group, 4-ethylphenylcarbonylamino group, 3-isopropylphenylcarbonylamino group, 2
Arylcarbonylamino groups such as -methoxyphenylcarbonylamino group; phenoxycarbonyl group, 4-methylphenoxycarbonyl group, 3-methylphenoxycarbonyl group, 2-methylphenoxycarbonyl group, 2,4
Aryloxycarbonyl groups such as -dimethylphenoxycarbonyl group, 2,6-dimethylphenoxycarbonyl group, 2,4,6-trimethylphenoxycarbonyl group, 4-phenylphenoxycarbonyl group;

Aralkyl groups such as benzyl and phenethyl; phenyl, 3-nitrophenyl, 4-cyanophenyl, 4-hydroxyphenyl, 2-methylphenyl, 3,5-dimethylphenyl, Trifluoromethylphenyl group, 4-chlorophenyl group, 4-methoxyphenyl group, 4- (dimethylamino) phenyl group,
Aryl groups such as naphthyl groups; pyrrolyl, thienyl, furanyl, oxazoyl, isoxazoyl, oxadiazoyl, thiadiazoyl, imidazoyl, benzothiazoyl, benzoxazoyl,
Benzimidazoyl group, benzofuranyl group, indo-3
A heteroaryl group such as -yl group; methylthio group, ethylthio group, n-propylthio group, isopropylthio group, n
Alkylthio groups such as -butylthio group, isobutylthio group, t-butylthio group, 3,5,5-trimethylhexylthio group; phenylthio group, 4-methylphenylthio group, 2-methoxyphenylthio group, 4-t-butyl Arylthio groups such as phenylthio group and naphthylthio group; alkenyloxycarbonyl groups such as allyloxycarbonyl group and 2-butenoxycarbonyl group; aralkyl groups such as benzyloxycarbonyl group, 4-methylbenzyloxycarbonyl group and phenethyloxycarbonyl group An oxycarbonyl group;

Alkoxycarbonylalkoxycarbonyl groups such as methoxycarbonylmethoxycarbonyl group, ethoxycarbonylmethoxycarbonyl group, n-propoxycarbonylmethoxycarbonyl group, isopropoxycarbonylmethoxycarbonyl group; methylcarbonylmethoxycarbonyl group and ethylcarbonylmethoxycarbonyl group; Alkylcarbonylalkoxycarbonyl group; mono (hydroxyalkyl) aminocarbonyl group such as hydroxyethylaminocarbonyl group, 2-hydroxypropylaminocarbonyl group, 3-hydroxypropylaminocarbonyl group; di (hydroxyethyl) aminocarbonyl group, di (2 -(Hydroxypropyl) aminocarbonyl group, di (3-hydroxypropyl) aminocarbonyl group, etc. Mono (alkoxyalkyl) aminocarbonyl groups such as methoxymethylaminocarbonyl, methoxyethylaminocarbonyl, ethoxymethylaminocarbonyl, ethoxyethylaminocarbonyl, and propoxyethylaminocarbonyl; di (methoxymethyl) ) Di (alkoxyalkyl) aminocarbonyl groups such as aminocarbonyl group, di (methoxyethyl) aminocarbonyl group, di (ethoxymethyl) aminocarbonyl group, di (ethoxyethyl) aminocarbonyl group and di (propoxyethyl) aminocarbonyl group A vinyl group, a propenyl group,
Alkenyl groups such as 1-butenyl group, 1-pentenyl group, 2-pentenyl group, 3-methyl-1-butenyl group, 2,2-dicyanovinyl group, 1,2,2-tricyanovinyl group and the like are mentioned. Can be.

At least one of R ₁ , R ₂ , R ₃ , R ₅ , R ₆ , and R ₇ represents an alkoxy group, an alkoxyalkoxy group, an aryloxy group, or an aralkyloxy group.

Specific examples of R ₄ include a hydrogen atom; a cyano group; a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group,
-Pentyl group, isopentyl group, n-hexyl group, n-
Alkyl groups such as octyl group, 2-ethylhexyl group and cyclohexyl group; aralkyl groups such as benzyl group and phenethyl group; phenyl group, 3-nitrophenyl group, 4-cyanophenyl group, 4-hydroxyphenyl group and 2-methylphenyl Group, 3,5-dimethylphenyl group, 3-trifluoromethylphenyl group, 4-chlorophenyl group, 4-
Aryl groups such as methoxyphenyl group, 4- (dimethylamino) phenyl group, and naphthyl group; pyrrolyl group, thienyl group, furanyl group, oxazoyl group, isoxazoyl group, oxadiazoyl group, thiadiazoyl group, imidazoyl group, benzothiazoyl group, benzoyl group An oxazoyl group,
Benzimidazoyl group, benzofuranyl group, indo-3
-Heteroaryl groups such as -yl group; vinyl group, propenyl group, 1-butenyl group, 1-pentenyl group, 2-pentenyl group, 3-methyl-1-butenyl group, 2,2-dicyanovinyl group, 1,2 And an alkenyl group such as a 2-tricyanovinyl group.

Specific examples of R ₈ and R ₉ include halogen atoms such as fluorine, chlorine and bromine; methyl, ethyl and n-
Alkyl groups such as propyl group, isopropyl group, n-butyl group, isobutyl group, t-butyl group, n-pentyl group, isopentyl group, n-hexyl group, n-octyl group, 2-ethylhexyl group, and cyclohexyl group; benzyl An aralkyl group such as a phenyl group or a phenethyl group;
Nitrophenyl group, 4-cyanophenyl group, 4-hydroxyphenyl group, 2-methylphenyl group, 3,5-dimethylphenyl group, 3-trifluoromethylphenyl group,
4-chlorophenyl group, 4-methoxyphenyl group, 4-
Aryl groups such as (dimethylamino) phenyl and naphthyl; pyrrolyl, thienyl, furanyl, oxazoyl, isoxazoyl, oxadiazoyl,
Heteroaryl groups such as thiadiazoyl, imidazoyl, benzothiazoyl, benzoxazoyl, benzoimidazoyl, benzofuranyl and indo-3-yl;

The above alkoxy groups; methoxyethoxy groups, ethoxyethoxy groups, 3-methoxypropoxy groups,
Alkoxyalkoxy groups such as 3- (isopropyloxy) propoxy group; examples of alkoxyalkoxyalkoxy groups include methoxymethoxymethoxy group, ethoxymethoxymethoxy group, propoxymethoxymethoxy group, butoxymethoxymethoxy group, methoxyethoxymethoxy group, ethoxyethoxy group; Methoxy group, propoxyethoxymethoxy group, butoxyethoxymethoxy group, methoxypropoxymethoxy group, ethoxypropoxymethoxy group,
Propoxypropoxymethoxy group, butoxypropoxymethoxy group, methoxybutoxymethoxy group, ethoxybutoxymethoxy group, propoxybutoxymethoxy group, butoxybutoxymethoxy group, methoxymethoxyethoxy group, ethoxymethoxyethoxy group, propoxymethoxyethoxy group, butoxymethoxyethoxy group, Methoxyethoxyethoxy, ethoxyethoxyethoxy, propoxyethoxyethoxy, butoxyethoxyethoxy, methoxypropoxyethoxy, ethoxypropoxyethoxy, propoxypropoxyethoxy, butoxypropoxyethoxy, methoxybutoxyethoxy, methoxybutoxyethoxy, methoxybutoxyethoxy Propoxybutoxyethoxy, butoxybutoxyethoxy, methoxymethoxypropoxy , Ethoxy methoxypropoxy group,
Propoxymethoxypropoxy, butoxymethoxypropoxy, methoxyethoxypropoxy, ethoxyethoxypropoxy, propoxyethoxypropoxy, butoxyethoxypropoxy, methoxypropoxypropoxy, ethoxypropoxypropoxy, propoxypropoxy, butoxypropoxy, butoxypropoxy Methoxybutoxypropoxy group, ethoxybutoxypropoxy group, propoxybutoxypropoxy group, butoxybutoxypropoxy group, methoxymethoxybutoxy group, ethoxymethoxybutoxy group, propoxymethoxybutoxy group, butoxymethoxybutoxy group,
Methoxyethoxybutoxy, ethoxyethoxybutoxy, propoxycyethoxybutoxy, butoxyethoxybutoxy, methoxypropoxybutoxy, ethoxypropoxybutoxy, propoxypropoxybutoxy, butoxypropoxybutoxy, methoxybutoxybutoxy, methoxybutoxybutoxy, methoxybutoxybutoxy A propoxybutoxybutoxy group, a butoxybutoxybutoxy group, a 4-ethylcyclohexyloxyethoxyethoxy group, a (2-ethyl-1-hexyloxy) ethoxypropoxy group, a 4- (3,5,5-trimethylhexyloxybutoxyethoxy group, A linear, branched or cyclic C1-C20 alkoxyalkoxyalkoxy group such as 6- (2- (2-decalyloxy) butoxy) n-hexyloxy group;

Halogenoalkyl groups such as chloromethyl group, dichloromethyl group, fluoromethyl group, trifluoromethyl group, pentafluoroethyl group and nonafluorobutyl group; 2-methylthioethyl group, 2-ethylthioethyl group, n-propylthioethyl group, 2-iso-propylthioethyl group, 2-n-butylthioethyl group, 2-
alkylthioalkyl groups such as iso-butylthioethyl group; 2-dimethylaminoethyl group, 2- (2-dimethylaminoethoxy) ethyl group, 4-dimethylaminobutyl group, 1-dimethylaminopropan-2-yl group, 3 Dialkylaminoalkyl groups such as -dimethylaminopropyl group, 2-di-iso-propylaminoethyl group, 2-di-n-butylaminoethyl group; 2-methylthioethoxy group, 2-ethylthioethoxy group, 2-n -Propylthioethoxy group, 2-iso-propylthioethoxy group, 2
Alkylthioalkoxy groups such as -n-butylthioethoxy group and 2-iso-butylthioethoxy group;

A 2-dimethylaminoethoxy group, 2- (2
-Dimethylaminoethoxy) ethoxy group, 4-dimethylaminobutoxy group, 1-dimethylaminopropane-2-
Yloxy group, 3-dimethylaminopropoxy group, 2-
Dimethylamino-2-methylpropoxy group, 2-diethylaminoethoxy group, 2- (2-diethylaminoethoxy) ethoxy group, 3-diethylaminopropoxy group, 1
Dialkylaminoalkoxy groups such as -diethylaminopropoxy group, 2-di-iso-propylaminoethoxy group, 2-di-n-butylaminoaminoethoxy group; dimethylaminoethoxyethoxy group, dimethylaminoethoxypropoxy group, diethylaminoethoxypropoxy group Dialkylaminoalkoxyalkoxy groups such as;

The above-mentioned aralkyloxy groups; aryloxy groups such as phenoxy, 2-methylphenoxy, 4-methylphenoxy, 4-t-butylphenoxy, 2-methoxyphenoxy and 4-iso-propylphenoxy; A methylthio group, an ethylthio group, an n-propylthio group, an iso-propylthio group, an n-butylthio group, an iso-butylthio group, a sec-butylthio group, t
-Butylthio group, n-pentylthio group, iso-pentylthio group, 1,2-dimethylpropylthio group, 1,1-
Alkylthio groups such as dimethylpropylthio group; alkoxyalkylthio groups such as methoxymethylthio group, methoxyethylthio group and ethoxyethylthio group; alkylthioalkylthio groups such as methylthiomethylthio group, methylthioethylthio group and ethylthioethylthio group; Dialkylaminoalkylthio groups such as dimethylaminoethylthio group and 4-dimethylaminobutylthio group; phenylthio group, 2-methylphenylthio group, 4-methylphenylthio group, 4-t-butylphenylthio group and 2-methoxyphenyl Arylthio groups such as thio group and 4-t-butylphenylthio group; heteroaryloxy groups such as pyrrolyloxy group, thienyloxy group, furanyloxy group and oxazoyloxy group; pyrrolylthio group, thienylthio group, furanylthio group, oxa group It can be exemplified heteroarylthio groups such as a ylthio group.

Table 1 shows specific examples of the organic boron compound represented by the general formula (1), but the present invention is not limited only to these examples.

[0049]

[Table 1]

[0050]

[Table 2]

[0051]

[Table 3]

[0052]

[Table 4]

The organoboron compound represented by the general formula (1) of the present invention can be produced by the following method. That is,
Known methods (eg, Aust. J. Chem., 1965, 11, 1835)
-45, Liebigs Ann. Chem., 1973, 146-60), the compound represented by the following general formula (2) is reacted with boron trihalide to thereby form the compound represented by the following general formula (3). After obtaining the compound, a halogen atom is finally substituted to obtain an organic boron compound represented by the general formula (1).

[0054]

Embedded image

[0055]

Embedded image (In the above formula, R _{1 to} R ₇ are the same as described above, and X represents a halogen atom.)

The compound represented by the general formula (1) of the present invention can be used in the visible light range of 400 to 700 nm, particularly 40.
It is a compound that is excited by absorbing light of 0 to 600 nm and has an interaction with a photocurable resin or a photoreaction initiator. The term “interaction” as used herein includes energy transfer and electron transfer from the excited compound of the present invention to the photocurable resin or photoreaction initiator. From this,
The compound of the present invention is a very useful compound as a photosensitizer.

The visible light curable resin composition of the present invention contains at least one organic boron compound represented by the general formula (1) as a photosensitizer (C).
It may contain other known photosensitizers.

The other known photosensitizers are not particularly limited as long as they are commonly used photosensitizers, but ketocoumarin, coumarin-6 and JP-A-4-18.
Coumarin compounds described in JP-A-088 / 88.

In this case, the content of the organic boron compound represented by the general formula (1) in the photosensitizer is not particularly limited. The content of the organic boron compound represented by the general formula (1) in the sensitizer is preferably 10% by weight or more, more preferably 20% by weight or more, and further preferably 30% by weight or more. , 50% by weight or more is particularly preferred.

The amount of the photosensitizer varies depending on the type and amount of the photosensitizer (C) and the type of the photocurable resin (A) to be interacted with. ) Ingredient 100
The amount of the photosensitizer (C) used is from 0.1 to 10 per part by weight.
Suitably, the amount is in the range of 0.3 to 5 parts by weight. If the amount of the present compound is less than 0.1 part by weight, the photosensitivity of the formed film tends to decrease,
When the amount is more than 0 parts by weight, it tends to be difficult to keep the composition in a uniform state from the viewpoint of solubility.

The visible light-curable resin composition used in the present invention may further contain, if necessary, a photopolymerizable unsaturated compound (resin) other than the above components. This includes, for example, methyl (meth) acrylate,
Ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (poly) ethylene glycol di (meth) acrylate, (poly) propylene glycol tri (meth) acrylate,
Examples include trimethylolpropane tri (meth) acrylate, glycerin tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, and pentaerythritol tri (meth) acrylate.

The above-mentioned other photopolymerizable unsaturated compound is preferably in the range of about 0 to 80% by weight, particularly about 5 to 50% by weight, based on the total weight (solid content) of the composition.

In the visible light curable resin composition of the present invention, if necessary, adhesion promoters, hydroquinone, 2,6-
Polymerization inhibitors such as di-t-butyl-p-cresol and N, N-diphenyl-p-phenylenediamine; organic resin fine particles such as rubber, vinyl polymer and unsaturated group-containing vinyl polymer; coloring pigment; Contains various pigments such as pigments, metal oxides such as cobalt oxide, plasticizers such as dibutyl phthalate, dioctyl phthalate, tricresyl phosphate, polyethylene glycol and polypropylene glycol, repelling inhibitors, fluidity regulators, etc. can do.

The above-mentioned adhesion promoters are used to improve the adhesion of the coating to the substrate, and include, for example, tetrazole, 1-phenyltetrazole, 5-aminotetrazole, 5-amino-1- Methyltetrazole, 5-amino-2-phenyltetrazole, 5-mercapto-1-phenyltetrazole, 5-
Tolazoles such as mercapto-1-methyltetrazole, 5-methylthiotetrazole and 5-chloro-1-phenyl-1H-tetrazole can be mentioned.

The visible light curable resin composition of the present invention can be prepared by using known photosensitive materials generally used, for example, paints, inks, adhesives, resist materials, and printing plate materials (plate making materials for plate and letterpress, offset printing). PS plate for use) It can be used for a wide range of applications such as information recording materials and relief image forming materials.

The dry film thickness (not including the solvent) formed from the visible light curable resin composition of the present invention is determined by the maximum wavelength at which the absorbance of the non-photosensitive film formed from the composition is selected from the above range. The wavelength may be set to be 0.5 or less within a range of ± 30 nm of the maximum wavelength of the safety light.
The range is 0 μm. The absorbance varies depending on the type and the amount of the photoreaction initiator, the photosensitizer and the like contained in the composition, but varies depending on the thickness of the film even with the same composition. That is, in the same composition, as the film thickness increases, the absorbance increases due to an increase in the concentration of the photopolymerization initiator and the photosensitizer contained in the film, and on the other hand, when the film thickness decreases, the absorbance increases. The absorbance is reduced due to the lower concentration of the above components. From these facts, by adjusting the film thickness to be formed, the absorbance can be adjusted to fall within the above-mentioned range.

Next, typical resist materials of the visible light curable resin composition of the present invention (for example, general negative curable resist materials and negative resist materials for electrodeposition coating) will be described.

As a general negative type curable resist material, for example, the visible light curable resin composition of the present invention is dispersed or dissolved in a solvent (including water). Fine dispersion) to prepare a photosensitive solution, and apply the solution on a support using a coating device such as a roller, a roll coater, or a spin coater, and then dry the solution with a negative resist material. Can be used as

Further, a cover coat layer can be provided in advance on the surface of the film before being exposed to visible light and cured.
The cover coat layer is formed in order to block oxygen in the air, prevent radicals generated by exposure from being deactivated by oxygen, and smoothly cure the coating by exposure.

As the cover coat layer, for example, a resin film (thickness: about 1 to 70 μm) such as a polyester resin such as polyethylene terephthalate, an acrylic resin, polyethylene, or a polyvinyl chloride resin is coated on the surface of the coating film. Polyvinyl alcohol, partially saponified polyvinyl acetate, polyvinyl alcohol-vinyl acetate copolymer, partially saponified polyvinyl acetate-vinyl acetate copolymer, polyvinyl pyrrolidone, water-soluble polysaccharide polymers such as pullulan, basic group Aqueous liquid containing acidic groups or bases, such as acrylic resins, polyester resins, vinyl resins, and epoxy resins, is dissolved or dispersed in water.
５5 μm) and dried to form a cover coat layer. This cover coat layer is preferably removed after exposing the coating film and before developing. The cover coat layer of the water-soluble polysaccharide polymer or the aqueous resin can be removed with a solvent such as water, an acidic aqueous solution, or a basic aqueous solution which dissolves or disperses the resin.

Solvents used for dissolving or dispersing the visible light curable resin composition include, for example, ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.) and esters (ethyl acetate, butyl acetate, methyl benzoate). , Methyl propionate, etc.), ethers (tetrahydrofuran, dioxane, dimethoxyethane, etc.), cellosolves (methyl cellosolve, ethyl cellosolve, diethylene glycol monomethyl ether, etc.),
Aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.), halogenated hydrocarbons (chloroform,
Trichloroethylene, dichloromethane, etc.), alcohols (ethyl alcohol, benzyl alcohol, etc.), others (dimethylformamide, dimethyl sulfoxide, etc.),
Water and the like.

The support may be, for example, a sheet of a metal such as aluminum, magnesium, copper, zinc, chromium, nickel, iron or an alloy thereof, a printed circuit board whose surface is treated with such a metal, or a plastic. , Glass or silicone wafers, carbon and the like.

When used as a negative resist material for electrodeposition coating, the visible light curable resin composition is first made into a water dispersion or an aqueous solution.

The water-dispersion or water-solubility of the visible light-curable resin composition is based on alkali (neutralizing agent) when an anionic group such as a carboxyl group is introduced into the photo-curable resin.
Or when a cationic group such as an amino group is introduced, neutralization with an acid (neutralizing agent). Examples of the alkali neutralizer used in this case include alkanolamines such as monoethanolamine, diethanolamine, and triethanolamine; alkylamines such as triethylamine, diethylamine, monoethylamine, diisopropylamine, trimethylamine, and diisobutylamine; Alkyl alkanolamines such as dimethylaminoethanol; alicyclic amines such as cyclohexylamine; alkali metal hydroxides such as sodium hydroxide and sodium hydroxide; ammonia; Further, examples of the acid neutralizing agent include monocarboxylic acids such as formic acid, acetic acid, lactic acid, and butyric acid. These neutralizing agents can be used alone or in combination. The amount of the neutralizing agent used is the amount of the ionic group 1 contained in the photosensitive resin composition.
0.2 to 1.0 equivalent, particularly 0.3 to 1.0 equivalent per equivalent
A range of 0.8 equivalents is desirable.

In order to further improve the fluidity of the water-soluble or water-dispersed resin component, a hydrophilic solvent such as methanol, ethanol, isopropanol, n-butanol, t- -Butanol, methoxyethanol, ethoxyethanol, butoxyethanol, diethylene glycol monomethyl ether, dioxane, tetrahydrofuran and the like can be added. The amount of the hydrophilic solvent used is generally
Up to 300 parts by weight per 100 parts by weight of resin solid component,
Preferably it can be up to 100 parts by weight.

In order to increase the amount of coating on the object to be coated, a hydrophobic solvent,
For example, petroleum solvents such as toluene and xylene; ketones such as methyl ethyl ketone and methyl isobutyl ketone; esters such as ethyl acetate and butyl acetate; alcohols such as 2-ethylhexyl alcohol and benzyl alcohol can also be added. The compounding amount of these hydrophobic solvents can be generally up to 200 parts by weight, preferably 100 parts by weight or less, per 100 parts by weight of the resin solid component.

The preparation of the visible light-curable resin composition as the electrodeposition paint can be carried out by a conventionally known method. For example, a water-soluble photocurable resin, a photoinitiator, a photosensitizer having a specific structure, and, if necessary, a solvent and other components are mixed well, and then water is added. Can be prepared.

The composition thus prepared is further diluted with water in a usual manner, for example, when the pH is in the range of 4 to 9 and the bath concentration (solids concentration) is 3 to 25% by weight, preferably Can be an electrodeposition coating (or electrodeposition bath) in the range of 5 to 15% by weight.

The electrodeposition paint prepared as described above is
The coating can be performed on the surface of the conductor to be coated as follows. That is, first, the pH and bath concentration of the bath are adjusted to the above ranges, and the bath temperature is adjusted to 15 to 40 ° C., preferably 1
Control at 5-30 ° C. Next, in the electrodeposition coating bath controlled in this way, the conductor to be coated is immersed in a conductor to be coated as an anode when the electrodeposition coating is of an anionic type and as a cathode when the electrodeposition coating is of a cationic type. Apply DC current. An appropriate energization time is 10 seconds to 5 minutes.

In the electrodeposition coating method, an object to be coated is coated with an electrodeposition coating material having a low glass transition temperature, then washed with water or washed and dried, and further coated with an electrodeposition coating material having a glass transition temperature of 20 ° C. or more. (See JP-A-2-20873), that is, double-coat electrodeposition coating can also be performed.

The resulting film thickness is a dry film thickness, generally 0.5
５０50 μm, preferably 1 to 15 μm. After the electrodeposition coating, the object to be coated is pulled up from the electrodeposition bath and washed with water, and then moisture and the like contained in the electrodeposition coating film are dried and removed with hot air or the like.

As the conductor, a conductive material such as metal, carbon, tin oxide or the like, or a material in which these are fixed to the surface of plastic or glass by lamination, plating or the like can be used.

A cover coat layer may be provided on the surface of the electrodeposition coating film before being exposed to visible light and cured. Examples of the cover coat layer include those described above. This cover coat layer is preferably removed before the electrodeposition coating film is developed. The cover coat layer using a water-soluble polysaccharide polymer or an aqueous resin can be removed with a solvent such as water, an acidic aqueous solution, or a basic aqueous solution that dissolves or disperses these resins.

The visible light resist material formed on the conductor surface as described above, and the visible light resist electrodeposition coating film obtained by electrodeposition coating are exposed to visible light according to an image and cured. An image can be formed by removing the non-exposed portion by a developing process.

The light source for curing the visible light curable material composition of the present invention is not particularly limited as long as it can cure the composition, and a conventionally known visible light source can be used. . Examples of the light source that emits visible light include ultrahigh-pressure, high-pressure, medium-pressure, and low-pressure mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, and tungsten lamps. Further, among these light sources, various lasers having an oscillation line in a visible region where ultraviolet rays are cut by an ultraviolet cut filter can be used. Among them, a laser having an oscillation line in an argon laser (488 nm) or a YAG-SHG laser (532 nm) is preferable.

The developing treatment is carried out by washing with an aqueous alkali solution when the non-exposed portion film is anionic, and with an aqueous acid solution having a pH of 5 or less when the non-exposed portion film is cationic. Alkaline aqueous solutions that can be neutralized with free carboxylic acids in the coating film, such as sodium hydroxide, sodium carbonate, sodium hydroxide, aqueous ammonia, etc., to give water solubility, and acid aqueous solutions are acetic acid, formic acid, lactic acid, etc. Can be used.

In the case of a photosensitive resin having no ionic group, development processing is performed by dissolving an unexposed portion using a solvent such as 1,1,1-trichloroethane, tricrene, methyl ethyl ketone, or methylene chloride. . The coated film after development is washed with water and dried with hot air or the like, so that a desired image is formed on the conductor. Also, if necessary,
After etching to remove the exposed conductor, the resist film is removed, and a printed circuit board can be manufactured.

The composition for a visible light-curable material of the present invention may be, for example, coated on a transparent resin film such as a polyester resin such as polyethylene terephthalate, an acrylic resin, polyethylene, or a polyvinyl chloride resin as a cover film layer. The composition of the present invention is applied using a roll coater, a blade coater, a curtain flow coater or the like, and is dried to form a resist film (dry film thickness of about 0.5 to 5 μm), and is then protected on the surface of the film. It can be used as a dry film resist with a film attached.

After the protective film is peeled off from the dry film resist, the resist film can be bonded to the support by thermocompression bonding so that the resist film comes into contact with the dry film resist to form a resist film. The resist film can be exposed to visible light, cured and developed according to the image in the same manner as the above-mentioned electrodeposition coating film to form an image. Further, in the dry film resist, a cover coat layer can be provided as necessary as described above. The cover coat layer may be formed by painting on the resist film, or may be formed by sticking on the resist film. The cover coat layer may or may not be removed before the development processing.

[0090]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail with reference to embodiments. In the examples and comparative examples, “parts” indicates “parts by weight”.

Example 1 Production Example of Photosensitive Liquid As a photocurable resin (polymer binder), an acrylic resin (resin acid value: 155 mg KOH / g, methyl methacrylate / butyl acrylate / acrylic acid = 40/40 /
20% by weight of glycidyl methacrylate reacted with 24 parts by weight of a photocurable resin (resin solid content 55% by weight,
Propylene glycol monomethyl ether organic solvent, resin acid value 50 mg KOH / g, number average molecular weight about 20,000) 10
To 0 part (solid content), 1 part of a photopolymerizable initiator (CGI-784, trade name, manufactured by Ciba Geigy, titanocene compound) and 0.5 part of a photosensitizer represented by 1-1 in Table 1 were added. A photosensitive solution was prepared by mixing.

The photosensitive solution was applied to a glass fiber reinforced epoxy substrate plated with copper in a dark room with a bar coater to a dry film thickness of 5 μm.
m and dried at 60 ° C. for 10 minutes to prepare a substrate having a resist film.

Next, the surface of the substrate having the resist film obtained above was irradiated with the sodium lamp of FIG. 1 for 24 hours so that the illuminance intensity became 40 lux. Then
After heating this at 120 ° C for 30 seconds in a dark room,
The resist film was completely dissolved in the aqueous sodium carbonate solution as a result of immersion in a 30% aqueous solution of sodium carbonate as a developing solution at 30 ° C. for 1 minute.

When the substrate having the resist film was irradiated with an argon laser of 1 mJ / m ² intensity, it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

After the unexposed substrate was allowed to stand at room temperature for 6 months and then irradiated with an argon laser of 1 mJ / m ² intensity in the same manner as described above, it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

The above photosensitive solution was applied to a transparent polyethylene terephthalate sheet with a bar coater so as to have a thickness of 5 μm, and dried at 60 ° C. for 10 minutes, and the absorbance of the film was measured. FIG. 4 shows the results. The vertical axis indicates absorbance and the horizontal axis indicates wavelength nm.

From the wavelength of the safety light in FIG. 1 and the absorbance curve in FIG. 4, it was confirmed that the safety light did not adversely affect the photosensitive solution, and that the safety light was bright light from the relative luminous efficiency curve in FIG. it can.

Examples 2-42 In Example 1, 1-2 to 1- of Table 1 were used as photosensitizers.
A photosensitive solution having the same composition as in Example 1 was obtained except for using the compound No. 42, and a resist film was formed on the substrate in the same manner as in Example 1.

Next, the surface of the substrate having the resist film (dry film thickness 5 μm) obtained above was irradiated with the sodium lamp of FIG. 1 for 24 hours so that the illuminance intensity became 40 lux. Then, in a dark room at 120 ° C. for 30 minutes.
After heating for 2 seconds, the resist film was completely dissolved in the aqueous solution of sodium carbonate as a result of immersion for 1 minute at 30 ° C. using a 1% aqueous solution of sodium carbonate as a developing solution. .

When the substrate having the above-mentioned resist film was irradiated with an argon laser having an intensity of 1 mJ / m ² , it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

After the unexposed substrate was left at room temperature for 6 months, it was irradiated with an argon laser of 1 mJ / m ^{2 in the same} manner as described above, and it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

Example 43 In Example 1, instead of 100 parts of the photocurable resin, 50 parts of the photocurable resin used in Example 1 and acrylic resin a
(Methyl acrylate / styrene / acrylic acid = 60 /
A photosensitive solution having the same composition as in Example 1 was prepared by using a mixture of 50 parts of a 30/10 radical copolymer, an acid value of about 80, and a number average molecular weight of 20,000. Using this, a resist film was formed on the substrate in the same manner as in Example 1.

Next, the surface of the substrate having the resist film (dry film thickness 8 μm) obtained above was irradiated with the sodium lamp of FIG. 1 for 24 hours so that the illuminance intensity became 40 lux. Then, in a dark room at 120 ° C. for 30 minutes.
After heating for 2 seconds, the resist film was completely dissolved in the aqueous solution of sodium carbonate as a result of immersion for 1 minute at 30 ° C. using a 1% aqueous solution of sodium carbonate as a developing solution. .

When the substrate having the resist film was irradiated with an argon laser having an intensity of 1 mJ / m ² , it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

After the unexposed substrate was allowed to stand at room temperature for 6 months and then irradiated with an argon laser of 1 mJ / m ² intensity as described above, it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

Example 44 In Example 43, 50 parts of an oxetane compound of the following structural formula (a) and a photoacid generator were replaced with 50 parts of an oxetane compound and a photoacid generator in place of 50 parts of the acrylic resin a and 1 part of the photoreaction initiator.
Using 10 parts of this compound, a photosensitive solution having the same composition as in Example 43 was prepared, and a resist film was formed on the substrate in the same manner.

[0107]

Embedded image

[0108]

Embedded image

Next, the surface of the substrate having the resist film (dry film thickness 5 μm) obtained above was irradiated with the sodium lamp of FIG. 1 for 24 hours so that the illuminance intensity became 40 lux. Then, in a dark room at 120 ° C. for 30 minutes.
After heating for 2 seconds, the resist film was completely dissolved in the aqueous solution of sodium carbonate as a result of immersion for 1 minute at 30 ° C. using a 1% aqueous solution of sodium carbonate as a developing solution. .

When the substrate having the above resist film was irradiated with an argon laser having an intensity of 1 mJ / m ² , it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

After the unexposed substrate was allowed to stand at room temperature for 6 months, it was irradiated with an argon laser of 1 mJ / m ^{2 in the same} manner as described above, and it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

Example 45 100 parts (solid content) of the photosensitive solution obtained in Example 43 was mixed and stirred with 7 parts of triethylamine, and then dispersed in deionized water to obtain a water-dispersed resin solution (solid content: 15%). Was. The resulting aqueous dispersion resin solution was used as an electrodeposition coating bath, anion electrodeposition coating was performed using a laminated copper plate as an anode to a dry film thickness of 10 μm, washed with water, dried at 80 ° C. for 5 minutes, and dried. A photosensitive layer for a coated film was obtained.

Next, the surface of the photosensitive layer thus obtained was irradiated with the sodium lamp shown in FIG. 1 for 24 hours so that the illuminance intensity became 40 lux. Next, this was heated in a dark room at 120 ° C. for 30 seconds, and then immersed in a 1% aqueous solution of sodium carbonate at 30 ° C. for 1 minute as a developing solution. As a result, the photosensitive layer was completely dissolved in the aqueous solution of sodium carbonate.
Photocuring by irradiation with a sodium lamp was satisfactory at all and was good.

Further, 1 mJ / m 2
Irradiation with a ^two- strength argon laser confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

Also, the photosensitive layer of the undeposited electrodeposition coating
After being left for a month, the resin was irradiated with an argon laser having an intensity of 1 mJ / m ^{2 in the same} manner as described above, and it was confirmed that the resin was quickly cured. Xenon lamp (cut the ultraviolet wavelength range) and the second harmonic (532
nm), similar results were obtained.

Example 46 Methyl acrylate / styrene / butyl acrylate /
Photocurable resin obtained by adding 15 parts of acrylic acid to a radical copolymer of glycidyl methacrylate / dimethylaminoethyl methacrylate = 20/10/22/30/18 (amine value: about 56, degree of unsaturation: 1.83) Mol / kg) 100 parts, photosensitizer 0.5 used in Example 1
Parts, 55 parts of trimethylolpropane triacrylate,
100 parts (solid content) of a photosensitive solution obtained by mixing 20 parts of the titanocene compound used in Example 1 was mixed with 3 parts of acetic acid, and then dispersed in deionized water to obtain a water-dispersed resin solution (solid content: 15%). I got The obtained water-dispersed resin solution was used as an electrodeposition coating bath, and the laminated copper plate was used as a cathode, and a cationic electrodeposition coating was performed so that the dry film thickness became 10 μm.
For 5 minutes to obtain an electrodeposition coating photosensitive layer.

Next, the surface of the photosensitive layer thus obtained was irradiated with the sodium lamp of FIG. 1 for 24 hours so that the illuminance intensity became 40 lux. Next, this was heated in a dark room at 120 ° C. for 30 seconds, and then immersed in a 2.38% aqueous solution of tetramethylammonium hydroxide for 1 minute at 30 ° C. as a developing solution. It was completely dissolved and was free from photocuring by irradiation with a sodium lamp.

Further, 1 mJ / m 2
Irradiation with a ^two- strength argon laser confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

The photosensitive layer of the undeposited electrodeposition coating film was coated at room temperature for 6 hours.
After being left for a month, the resin was irradiated with an argon laser having an intensity of 1 mJ / m ^{2 in the same} manner as described above, and it was confirmed that the resin was quickly cured. Xenon lamp (cut the ultraviolet wavelength range) and the second harmonic (532
nm), similar results were obtained.

Example 47 A substrate having a resist film in the same manner as in Example 1 except that a sodium lamp having the spectral distribution of FIG. 2 was used instead of the sodium lamp having the spectral distribution of FIG. It was created. Further, the obtained substrate was immersed in a 1% aqueous solution of sodium carbonate in the same manner as in Example 1, and as a result, the resist film dissolved in the aqueous solution of sodium carbonate and was excellent.

After the unexposed substrate was left at room temperature for 6 months, it was similarly irradiated with an argon laser of 1 mJ / m ² intensity. As a result, it was confirmed that the resin was quickly cured. Similar results were obtained by irradiation with a xenon lamp (cutting the ultraviolet wavelength region) and the second harmonic (532 nm) of a YAG laser.

Comparative Examples 1 to 45 Substrates having a resist coating were prepared in the same manner as in Examples 1 to 45, except that a fluorescent lamp was used instead of the sodium lamp. Further, the obtained substrate was immersed in a 1% aqueous solution of sodium carbonate in the same manner as in Example 1, and as a result, the resist film was not dissolved in the aqueous solution of sodium carbonate and was poor.

Comparative Example 46 An electrodeposition coated photosensitive layer was prepared in the same manner as in Example 46 except that a fluorescent lamp was used instead of the sodium lamp. Further, the obtained photosensitive layer was immersed in a 2.38% aqueous solution of tetramethylammonium hydroxide in the same manner as in Example 46. As a result, the resist film was not dissolved in the aqueous solution of tetramethylammonium hydroxide and was poor. FIG. 5 shows the spectral distribution of the fluorescent lamps used in Comparative Examples 1 to 46.

[0124]

According to the present invention, a visible light curable resin composition containing a specific compound as a photosensitizer is a composition having extremely high practical utility. Conventionally, in the field of information recording using the photolysis reaction, the method of directly outputting and recording the original electronically edited by a computer directly using a laser in the field of information recording using photolysis reaction, the stability of the photosensitive layer over time is low, and the sensitivity is low. , Solubility and storage stability.

However, the visible light-curable resin composition of the present invention has a very good compatibility between the photocurable resin (A) and the photosensitizer (C), and is dissolved in a general-purpose coating solution. A coated surface which is uniform on the body and has excellent storage stability over time can be obtained.

The organic boron compound photosensitizer (C) having a peculiar structure used in the present invention is an argon laser having stable oscillation lines at 488 nm and 514.5 nm, and a 532 nm as a second harmonic. YAG with bright line
Since it has extremely high sensitivity to general-purpose visible lasers such as lasers, photosensitive materials obtained using the visible light-curable resin composition of the present invention can be subjected to high-speed scanning exposure with such lasers. . When an image is formed by high-speed scanning exposure, an extremely fine high-resolution image can be obtained.

The visible light curable resin composition of the present invention can be applied and printed under bright environmental conditions without increasing the viscosity of the composition under environmental conditions of safe light irradiation.
It exerts a remarkable effect that is excellent in safety workability, work efficiency, product quality stability and the like.

[Brief description of the drawings]

FIG. 1 is a graph showing an example of a spectral distribution of a discharge lamp containing sodium as a main component of safety light that can be used in the present invention.

FIG. 2 is a graph showing a spectral distribution when the sodium discharge lamp shown in FIG. 1 is filtered.

FIG. 3 is a diagram showing a relative luminosity curve in a wavelength range of visible light of 380 to 780 nm.

FIG. 4 is a view showing an absorbance curve of a resist film used in Example 1.

FIG. 5 is a diagram showing a spectral distribution of a fluorescent lamp (daylight (D)).

Continuing from the front page (72) Inventor Hideo Kogure 4-17-1, Higashi-Hachiman, Hiratsuka-shi, Kanagawa Prefecture Inside Kansai Paint Co., Ltd. (72) Inventor Akira Ogiso 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture 72) Inventor Densumi Misawa 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Inside of Mitsui Chemicals Co., Ltd. 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Japan Mitsui Chemicals Co., Ltd. (72) Inventor Keisuke Takuma 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture BC51 BJ00 CA00 CA28 CA39 CC03 4H048 AA03 AB49 AB76 VA32. SA73 S A74 SA75 SA76 SA78 SA79 SA82 SA86 SA87 UA01 UA02 UA06 VA01 WA01 WA02 WA05 WA06 WA10

Claims (4)

[Claims] 1. A visible light curable resin composition used in an environment of irradiation of a safety light having a maximum wavelength selected from the range of 500 to 620 nm and high relative luminous efficiency, wherein the composition is a photocurable resin. A visible light curable resin composition comprising (A) a photoinitiator (B) and a photosensitizer (C) containing at least one organic boron compound represented by the following general formula (1). A visible light-curable resin composition, wherein the absorbance of an unphotosensitive film formed from the composition is 0.5 or less in a range of ± 30 nm of the maximum wavelength of the safe light. Embedded image [Wherein R ₁ , R ₂ , R ₃ , R ₅ , R ₆ , and R ₇ are each independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxy group, an amino group, a carboxyl group, a sulfonic acid group. , Alkyl group, halogenoalkyl group, alkoxyalkyl group, alkoxy group, alkoxyalkoxy group, aryloxy group, aralkyloxy group, acyl group, alkoxycarbonyl group, aminocarbonyl group, alkylaminocarbonyl group, dialkylaminocarbonyl group, alkylcarbonyl Amino group, arylcarbonylamino group, arylaminocarbonyl group, aryloxycarbonyl group, aralkyl group, aryl group, heteroaryl group, alkylthio group, arylthio group, alkenyloxycarbonyl group, aralkyloxycarbonyl group, alkoxycarbonyl Alkoxycarbonyl group, alkylcarbonyl alkoxycarbonyl group, mono (hydroxyalkyl) aminocarbonyl group, di (hydroxyalkyl) aminocarbonyl group, mono (alkoxyalkyl)
Represents an aminocarbonyl group, a di (alkoxyalkyl) aminocarbonyl group or an alkenyl group, and represents R ₁ , R ₂ , R
_At least one of ₃ , R ₅ , R ₆ and R ₇ is an alkoxy group, an alkoxyalkoxy group, an aryloxy group or an aralkyloxy group, and R ₄ is a hydrogen atom, a cyano group, an alkyl group, an aralkyl group, Represents an aryl group, a heteroaryl group or an alkenyl group, and R ₈ and R ₉ are a halogen atom, an alkyl group, an aralkyl group, an aryl group, a heteroaryl group, an alkoxy group, an alkoxyalkoxy group, an alkoxyalkoxyalkoxy group, a halogenoalkyl group, Alkylthioalkyl group, dialkylaminoalkyl group, alkylthioalkoxy group, dialkylaminoalkoxy group, dialkylaminoalkoxyalkoxy group, alkylthio group, alkoxyalkylthio group, alkylthioalkylthio group, dialkylaminoalkylthio group, arral Aryloxy represents group, an aryloxy group, an arylthio group, a heteroaryloxy group or a heteroarylthio group. However, when R ₈ and R ₉ are both halogen atoms, none of R ₁ , R ₂ , R ₃ , R ₅ , R ₆ , and R ₇ is an alkenyl group. ] 2. A discharge lamp mainly composed of sodium as a safety light (mainly a D line having a light wavelength of 589 nm).
The visible light curable resin composition according to claim 1, wherein 3. A composition for a visible light curable material, comprising the visible light curable resin composition according to claim 1 and a solvent. 4. A visible light curable material comprising the visible light curable resin composition according to claim 1 on a substrate.