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JP1684469S - 基板処理装置用天井ヒータ - Google Patents

基板処理装置用天井ヒータ

Info

Publication number
JP1684469S
JP1684469S JP2020020257F JP2020020257F JP1684469S JP 1684469 S JP1684469 S JP 1684469S JP 2020020257 F JP2020020257 F JP 2020020257F JP 2020020257 F JP2020020257 F JP 2020020257F JP 1684469 S JP1684469 S JP 1684469S
Authority
JP
Japan
Prior art keywords
substrate processing
processing equipment
ceiling heater
ceiling
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020020257F
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2020020257F priority Critical patent/JP1684469S/ja
Priority to TW110301195F priority patent/TWD217778S/zh
Priority to US29/773,979 priority patent/USD959393S1/en
Application granted granted Critical
Publication of JP1684469S publication Critical patent/JP1684469S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本願物品は、基板を処理する基板処理装置において、基板処理装置の処理室を加熱するためのヒータユニットの天井部に設置される天井ヒータである。
JP2020020257F 2020-09-24 2020-09-24 基板処理装置用天井ヒータ Active JP1684469S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2020020257F JP1684469S (ja) 2020-09-24 2020-09-24 基板処理装置用天井ヒータ
TW110301195F TWD217778S (zh) 2020-09-24 2021-03-09 基板處理裝置用置頂式加熱器
US29/773,979 USD959393S1 (en) 2020-09-24 2021-03-12 Ceiling heater for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020020257F JP1684469S (ja) 2020-09-24 2020-09-24 基板処理装置用天井ヒータ

Publications (1)

Publication Number Publication Date
JP1684469S true JP1684469S (ja) 2021-05-10

Family

ID=75801969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020020257F Active JP1684469S (ja) 2020-09-24 2020-09-24 基板処理装置用天井ヒータ

Country Status (3)

Country Link
US (1) USD959393S1 (ja)
JP (1) JP1684469S (ja)
TW (1) TWD217778S (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1684468S (ja) * 2020-09-24 2021-05-10 基板処理装置用天井ヒータ
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD1002596S1 (en) * 2021-12-14 2023-10-24 Advanide Holdings Pte. Ltd. RFID inlay

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US2417977A (en) * 1943-03-04 1947-03-25 French Jeannette Cook stove and range
USD312127S (en) * 1988-02-10 1990-11-13 Redring Electric Limited Electric heater element for use in a radiant heater for a glass ceramic hob
USD312126S (en) * 1988-02-10 1990-11-13 Redring Electric Limited Electric heater element for use in a radiant heater for a glass ceramic hob
USD323385S (en) * 1990-02-10 1992-01-21 Ceramaspeed Limited Radiant stove heater
AU112298S (en) * 1990-07-15 1991-09-30 E G O Elektro Gerate Blanc U Fischer A set of radiant heaters
US8796589B2 (en) * 2001-07-15 2014-08-05 Applied Materials, Inc. Processing system with the dual end-effector handling
JP4276813B2 (ja) * 2002-03-26 2009-06-10 株式会社日立国際電気 熱処理装置および半導体製造方法
JP2004200619A (ja) * 2002-12-20 2004-07-15 Kyocera Corp ウエハ支持部材
JP4380236B2 (ja) * 2003-06-23 2009-12-09 東京エレクトロン株式会社 載置台及び熱処理装置
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TWD125599S1 (zh) * 2006-09-28 2008-10-21 東京威力科創股份有限公司 半導體製造用加熱器
TWD125598S1 (zh) * 2006-09-28 2008-10-21 東京威力科創股份有限公司 半導體製造用加熱器
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Also Published As

Publication number Publication date
TWD217778S (zh) 2022-03-21
USD959393S1 (en) 2022-08-02

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