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ITMI20001453A0 - CATHODES FOR CATHODIC DEPOSITION OF GETTER ALLOYS AND PROCESS FOR THEIR PRODUCTION. - Google Patents

CATHODES FOR CATHODIC DEPOSITION OF GETTER ALLOYS AND PROCESS FOR THEIR PRODUCTION.

Info

Publication number
ITMI20001453A0
ITMI20001453A0 IT2000MI001453A ITMI20001453A ITMI20001453A0 IT MI20001453 A0 ITMI20001453 A0 IT MI20001453A0 IT 2000MI001453 A IT2000MI001453 A IT 2000MI001453A IT MI20001453 A ITMI20001453 A IT MI20001453A IT MI20001453 A0 ITMI20001453 A0 IT MI20001453A0
Authority
IT
Italy
Prior art keywords
cathodes
production
cathodic deposition
getter alloys
getter
Prior art date
Application number
IT2000MI001453A
Other languages
Italian (it)
Inventor
Alessandro Gallitognotta
Claudio Boffito
Luca Toia
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Priority to IT2000MI001453A priority Critical patent/IT1318061B1/en
Publication of ITMI20001453A0 publication Critical patent/ITMI20001453A0/en
Priority to AU2001270998A priority patent/AU2001270998A1/en
Priority to PCT/IT2001/000332 priority patent/WO2002000959A1/en
Publication of ITMI20001453A1 publication Critical patent/ITMI20001453A1/en
Application granted granted Critical
Publication of IT1318061B1 publication Critical patent/IT1318061B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/09—Mixtures of metallic powders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183—Composition or manufacture of getters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Physical Vapour Deposition (AREA)
IT2000MI001453A 2000-06-28 2000-06-28 CATHODES FOR CATHODIC DEPOSITION OF GETTER ALLOYS AND PROCESS FOR THEIR PRODUCTION. IT1318061B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT2000MI001453A IT1318061B1 (en) 2000-06-28 2000-06-28 CATHODES FOR CATHODIC DEPOSITION OF GETTER ALLOYS AND PROCESS FOR THEIR PRODUCTION.
AU2001270998A AU2001270998A1 (en) 2000-06-28 2001-06-26 Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof
PCT/IT2001/000332 WO2002000959A1 (en) 2000-06-28 2001-06-26 Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2000MI001453A IT1318061B1 (en) 2000-06-28 2000-06-28 CATHODES FOR CATHODIC DEPOSITION OF GETTER ALLOYS AND PROCESS FOR THEIR PRODUCTION.

Publications (3)

Publication Number Publication Date
ITMI20001453A0 true ITMI20001453A0 (en) 2000-06-28
ITMI20001453A1 ITMI20001453A1 (en) 2001-12-28
IT1318061B1 IT1318061B1 (en) 2003-07-21

Family

ID=11445361

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000MI001453A IT1318061B1 (en) 2000-06-28 2000-06-28 CATHODES FOR CATHODIC DEPOSITION OF GETTER ALLOYS AND PROCESS FOR THEIR PRODUCTION.

Country Status (3)

Country Link
AU (1) AU2001270998A1 (en)
IT (1) IT1318061B1 (en)
WO (1) WO2002000959A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833058B1 (en) 2000-10-24 2004-12-21 Honeywell International Inc. Titanium-based and zirconium-based mixed materials and sputtering targets
CN100550277C (en) 2001-05-01 2009-10-14 萨伊斯吉提斯公司 Discharge lamp
ITMI20012389A1 (en) 2001-11-12 2003-05-12 Getters Spa CABLE CATHODE WITH INTEGRATED GETTER FOR DISCHARGE LAMPS AND METHODS FOR ITS REALIZATION
GB2523583C (en) * 2014-02-28 2019-12-25 Castings Tech International Limited Forming a composite component
CN113136504B (en) * 2021-04-24 2022-07-19 杨阳 Getter alloy and application thereof, getter target material and getter film
CN115185169B (en) * 2022-09-07 2025-02-21 上海晶维材料科技有限公司 An adsorption pump with anti-powdering ability for space hydrogen atomic clock
US12281896B2 (en) 2022-09-15 2025-04-22 Honeywell International Inc. Stabilized evaporable getter for increased handleability

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB723306A (en) * 1949-03-17 1955-02-09 American Electro Metal Corp Method of manufacturing a titanium-rich alloy body
TW287117B (en) * 1994-12-02 1996-10-01 Getters Spa
US6673400B1 (en) * 1996-10-15 2004-01-06 Texas Instruments Incorporated Hydrogen gettering system

Also Published As

Publication number Publication date
ITMI20001453A1 (en) 2001-12-28
AU2001270998A1 (en) 2002-01-08
IT1318061B1 (en) 2003-07-21
WO2002000959A1 (en) 2002-01-03

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