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IT1391719B1 - Metodo, stazione ed apparecchiatura per la misura ottica mediante interferometria dello spessore di un oggetto - Google Patents

Metodo, stazione ed apparecchiatura per la misura ottica mediante interferometria dello spessore di un oggetto

Info

Publication number
IT1391719B1
IT1391719B1 ITBO2008A000694A ITBO20080694A IT1391719B1 IT 1391719 B1 IT1391719 B1 IT 1391719B1 IT BO2008A000694 A ITBO2008A000694 A IT BO2008A000694A IT BO20080694 A ITBO20080694 A IT BO20080694A IT 1391719 B1 IT1391719 B1 IT 1391719B1
Authority
IT
Italy
Prior art keywords
interferometry
station
thickness
equipment
optical measurement
Prior art date
Application number
ITBO2008A000694A
Other languages
English (en)
Inventor
Francesco Ziprani
Original Assignee
Marposs Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Marposs Spa filed Critical Marposs Spa
Priority to ITBO2008A000694A priority Critical patent/IT1391719B1/it
Priority to JP2011536032A priority patent/JP5762966B2/ja
Priority to US13/127,462 priority patent/US20110210691A1/en
Priority to PCT/EP2009/065172 priority patent/WO2010055144A1/en
Priority to ES09753099.2T priority patent/ES2532731T3/es
Priority to CN200980145472.3A priority patent/CN102216727B/zh
Priority to EP09753099.2A priority patent/EP2366093B1/en
Publication of ITBO20080694A1 publication Critical patent/ITBO20080694A1/it
Application granted granted Critical
Publication of IT1391719B1 publication Critical patent/IT1391719B1/it

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
ITBO2008A000694A 2008-11-17 2008-11-17 Metodo, stazione ed apparecchiatura per la misura ottica mediante interferometria dello spessore di un oggetto IT1391719B1 (it)

Priority Applications (7)

Application Number Priority Date Filing Date Title
ITBO2008A000694A IT1391719B1 (it) 2008-11-17 2008-11-17 Metodo, stazione ed apparecchiatura per la misura ottica mediante interferometria dello spessore di un oggetto
JP2011536032A JP5762966B2 (ja) 2008-11-17 2009-11-13 物体の厚さを干渉分析法によって光学的に計測するための方法、計測装置、及び、計測システム
US13/127,462 US20110210691A1 (en) 2008-11-17 2009-11-13 Method, measuring arrangement and apparatus for optically measuring by interferometry the thickness of an object
PCT/EP2009/065172 WO2010055144A1 (en) 2008-11-17 2009-11-13 Method, measuring arrangement and apparatus for optically measuring by interferometry the thickness of an object
ES09753099.2T ES2532731T3 (es) 2008-11-17 2009-11-13 Procedimiento, disposición de medición y aparato para medir de manera óptica mediante interferometría el grosor de un objeto
CN200980145472.3A CN102216727B (zh) 2008-11-17 2009-11-13 用于通过干涉法光学测量对象厚度的方法、测量配置以及设备
EP09753099.2A EP2366093B1 (en) 2008-11-17 2009-11-13 Method, measuring arrangement and apparatus for optically measuring by interferometry the thickness of an object

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITBO2008A000694A IT1391719B1 (it) 2008-11-17 2008-11-17 Metodo, stazione ed apparecchiatura per la misura ottica mediante interferometria dello spessore di un oggetto

Publications (2)

Publication Number Publication Date
ITBO20080694A1 ITBO20080694A1 (it) 2010-05-18
IT1391719B1 true IT1391719B1 (it) 2012-01-27

Family

ID=41728498

Family Applications (1)

Application Number Title Priority Date Filing Date
ITBO2008A000694A IT1391719B1 (it) 2008-11-17 2008-11-17 Metodo, stazione ed apparecchiatura per la misura ottica mediante interferometria dello spessore di un oggetto

Country Status (7)

Country Link
US (1) US20110210691A1 (it)
EP (1) EP2366093B1 (it)
JP (1) JP5762966B2 (it)
CN (1) CN102216727B (it)
ES (1) ES2532731T3 (it)
IT (1) IT1391719B1 (it)
WO (1) WO2010055144A1 (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5980476B2 (ja) * 2010-12-27 2016-08-31 株式会社荏原製作所 ポリッシング装置およびポリッシング方法
US20150022658A1 (en) * 2013-07-16 2015-01-22 University Of North Carolina At Charlotte Noise reduction techniques, fractional bi-spectrum and fractional cross-correlation, and applications
JP6473050B2 (ja) * 2015-06-05 2019-02-20 株式会社荏原製作所 研磨装置
JP7103906B2 (ja) * 2018-09-28 2022-07-20 株式会社ディスコ 厚み計測装置
CN110954007B (zh) * 2019-11-27 2022-06-07 长江存储科技有限责任公司 晶圆检测系统及检测方法
ES3028249T3 (en) * 2021-05-19 2025-06-18 Cargill Inc Sensor system, method and use for determining a thickness of a material body

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Publication number Priority date Publication date Assignee Title
FR2718231B1 (fr) * 1994-04-05 1996-06-21 Sofie Procédé et dispositif pour quantifier in situ la morphologie et l'épaisseur dans une zone localisée d'une couche superficielle en cours de traitement sur une structure à couches minces .
JPH1047926A (ja) * 1996-08-07 1998-02-20 Dainippon Screen Mfg Co Ltd 膜厚測定装置および膜厚測定方法
US5914785A (en) * 1998-02-04 1999-06-22 The University Of Tennesee Research Corporation Method and apparatus for making absolute range measurements
US6437868B1 (en) * 1999-10-28 2002-08-20 Agere Systems Guardian Corp. In-situ automated contactless thickness measurement for wafer thinning
JP2001141563A (ja) * 1999-11-17 2001-05-25 Toshiba Corp 分光測定方法と装置および温度測定装置と膜圧測定装置
JP4486217B2 (ja) * 2000-05-01 2010-06-23 浜松ホトニクス株式会社 厚み計測装置、及びそれを用いたウエットエッチング装置、ウエットエッチング方法
US6795655B1 (en) * 2000-10-09 2004-09-21 Meklyn Enterprises Limited Free-space optical communication system with spatial multiplexing
US6847454B2 (en) * 2001-07-16 2005-01-25 Scimed Life Systems, Inc. Systems and methods for processing signals from an interferometer by an ultrasound console
US6678055B2 (en) * 2001-11-26 2004-01-13 Tevet Process Control Technologies Ltd. Method and apparatus for measuring stress in semiconductor wafers
JP3852386B2 (ja) * 2002-08-23 2006-11-29 株式会社島津製作所 膜厚測定方法及び膜厚測定装置
JP2004226178A (ja) * 2003-01-21 2004-08-12 Susumu Nakatani 分光式厚さ計測装置。
JP2004264118A (ja) * 2003-02-28 2004-09-24 Toyota Motor Corp 薄膜のその場解析方法および装置
US7697145B2 (en) * 2003-05-28 2010-04-13 Duke University System for fourier domain optical coherence tomography
US7295330B2 (en) * 2003-07-11 2007-11-13 Chow Peter P Film mapping system
JP2006162366A (ja) * 2004-12-06 2006-06-22 Fujinon Corp 光断層映像装置
DE102005006723B3 (de) * 2005-02-03 2006-06-08 Universität Stuttgart Interferometrisches,konfokales Verfahren und interferometrische, konfokale Anordung für optische Datenspeicher, insbesondere Terabyte-Volumenspeicher
DE102006016131A1 (de) * 2005-09-22 2007-03-29 Robert Bosch Gmbh Interferometrische Messvorrichtung
WO2007033851A1 (de) * 2005-09-22 2007-03-29 Robert Bosch Gmbh Interferometrische schichtdickenbestimmung
JP5268239B2 (ja) * 2005-10-18 2013-08-21 キヤノン株式会社 パターン形成装置、パターン形成方法
JP4727517B2 (ja) * 2006-01-11 2011-07-20 富士フイルム株式会社 光源装置および光断層画像化装置
CN101294795B (zh) * 2007-04-25 2011-02-16 横河电机株式会社 测量薄膜厚度的装置和方法

Also Published As

Publication number Publication date
US20110210691A1 (en) 2011-09-01
JP5762966B2 (ja) 2015-08-12
ITBO20080694A1 (it) 2010-05-18
CN102216727B (zh) 2013-07-17
JP2012508875A (ja) 2012-04-12
WO2010055144A1 (en) 2010-05-20
EP2366093A1 (en) 2011-09-21
ES2532731T3 (es) 2015-03-31
EP2366093B1 (en) 2014-12-31
CN102216727A (zh) 2011-10-12

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