IT1089005B - ELEMENT SENSITIVE TO RADIATION CAPABLE OF DELAYING THE PROPATION OF THE FLAME - Google Patents

ELEMENT SENSITIVE TO RADIATION CAPABLE OF DELAYING THE PROPATION OF THE FLAME

Info

Publication number: IT1089005B
Authority: IT; Italy
Prior art keywords: propation; delaying; flame; radiation capable; element sensitive
Prior art date: 1976-10-27

Application number

IT2900877A

Other languages

Italian (it)

Original Assignee

Du Pont

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1976-10-27

Filing date

1977-10-26

Publication date

1985-06-10

1977-10-26 Application filed by Du Pont filed Critical Du Pont

1985-06-10 Application granted granted Critical

1985-06-10 Publication of IT1089005B publication Critical patent/IT1089005B/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Polymerisation Methods In General (AREA)
Non-Metallic Protective Coatings For Printed Circuits (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Compositions Of Macromolecular Compounds (AREA)
Macromonomer-Based Addition Polymer (AREA)

IT2900877A 1976-10-27 1977-10-26 ELEMENT SENSITIVE TO RADIATION CAPABLE OF DELAYING THE PROPATION OF THE FLAME IT1089005B (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US73597976A	1976-10-27	1976-10-27
US78090777A	1977-03-24	1977-03-24

Publications (1)

Publication Number	Publication Date
IT1089005B true IT1089005B (en)	1985-06-10

Family

ID=27112970

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IT2900877A IT1089005B (en)	1976-10-27	1977-10-26	ELEMENT SENSITIVE TO RADIATION CAPABLE OF DELAYING THE PROPATION OF THE FLAME

Country Status (9)

Country	Link
JP (1)	JPS5356018A (en)
CA (1)	CA1116919A (en)
CH (1)	CH630767A5 (en)
DE (1)	DE2747947C2 (en)
FR (1)	FR2369590A1 (en)
GB (1)	GB1588368A (en)
IT (1)	IT1089005B (en)
NL (1)	NL7711723A (en)
SE (1)	SE435106B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NO159729C (en) *	1978-11-01	1989-02-01	Coates Brothers & Co	PROCEDURE FOR MANUFACTURING A PATTERN METAL PATTERN ON A LAYER ELECTRIC CONDUCTIVE METAL BEARED BY A NON-CONDUCTIVE SUBSTRATE.
DE3136818C2 (en) *	1980-09-19	1990-08-02	Hitachi Chemical Co., Ltd., Tokio/Tokyo	Use of a photosensitive mixture and a photosensitive recording material for forming a solder mask
JPS5764734A (en) *	1980-10-08	1982-04-20	Hitachi Chem Co Ltd	Photosensitive resin composition and photosensitive element
DE3114931A1 (en) *	1981-04-13	1982-10-28	Hoechst Ag, 6000 Frankfurt	POLYMERIZABLE MIXTURE BY RADIATION AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
US4752553A (en) *	1982-04-01	1988-06-21	M&T Chemicals Inc.	High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (en) *	1982-10-14	1984-04-20	Sekisui Chem Co Ltd	Photopolymerizable composition for forming image
JPS63158157U (en) *	1987-04-07	1988-10-17
US5196296A (en) *	1989-10-06	1993-03-23	Nippon Steel Corporation	Epoxy acrylate resins and photosensitive resin compositions therefrom
EP0822448B1 (en) *	1996-08-02	2000-11-02	E.I. Du Pont De Nemours And Company	Flexible, flame-retardant, photoimageable composition for coating printed circuits
CN1324402C (en)	2001-10-30	2007-07-04	钟渊化学工业株式会社	Photosensitive resin composition and photosensitive films and laminates made by using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA614181A (en) *		1961-02-07	J. Mcgraw William	Photopolymerizable compositions, elements and processes
US3261686A (en) *	1963-04-23	1966-07-19	Du Pont	Photopolymerizable compositions and elements
DE1950120A1 (en) *	1968-10-09	1970-04-30	Du Pont	Heterogeneous photopolymerizable mass
US3682800A (en) *	1969-07-25	1972-08-08	Toray Industries	Method for producing acrylonitrile copolymers
US3657088A (en) *	1969-12-17	1972-04-18	Bayer Ag	Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) *	1969-12-19	1973-04-04	Mccall Corp	Crosslinked polymers and process therefor
US3887450A (en) *	1971-02-04	1975-06-03	Dynachem Corp	Photopolymerizable compositions containing polymeric binding agents
JPS498281A (en) *	1972-05-11	1974-01-24
JPS5537869B2 (en) *	1973-02-12	1980-09-30
JPS5335722B2 (en) *	1973-08-29	1978-09-28
DE2344680A1 (en) *	1973-09-05	1975-03-20	Bruno Prof Dr Vollmert	Photopolymerisable relief printing plates - copolymer of monounsatd. acids esters and nitroiles crosslinked by divinyl compounds
JPS5179342A (en) *	1974-12-26	1976-07-10	Fuji Photo Film Co Ltd

1977
- 1977-10-25 GB GB4444377A patent/GB1588368A/en not_active Expired
- 1977-10-25 CA CA000289448A patent/CA1116919A/en not_active Expired
- 1977-10-26 CH CH1304577A patent/CH630767A5/en not_active IP Right Cessation
- 1977-10-26 FR FR7732230A patent/FR2369590A1/en active Granted
- 1977-10-26 NL NL7711723A patent/NL7711723A/en not_active Application Discontinuation
- 1977-10-26 DE DE19772747947 patent/DE2747947C2/en not_active Expired
- 1977-10-26 SE SE7712054A patent/SE435106B/en not_active IP Right Cessation
- 1977-10-26 IT IT2900877A patent/IT1089005B/en active
- 1977-10-27 JP JP12823777A patent/JPS5356018A/en active Granted

Also Published As

Publication number	Publication date
SE435106B (en)	1984-09-03
CH630767A5 (en)	1982-06-30
NL7711723A (en)	1978-05-02
FR2369590B1 (en)	1981-11-13
CA1116919A (en)	1982-01-26
JPS5356018A (en)	1978-05-22
JPS5751655B2 (en)	1982-11-02
DE2747947C2 (en)	1983-12-22
SE7712054L (en)	1978-04-28
DE2747947A1 (en)	1978-05-03
GB1588368A (en)	1981-04-23
FR2369590A1 (en)	1978-05-26

Publication	Publication Date	Title
IT1094469B (en)	1985-08-02	GUANIDINE DERIVATIVES
BR7801360A (en)	1978-11-07	PHOTOGRAPHIC ELEMENT
IT1092170B (en)	1985-07-06	MORFOLINA DERIVATIVES
DK176878A (en)	1978-10-26	RADIATION SENSITIVE COPIES
DK176778A (en)	1978-10-26	RADIATION SENSITIVE COPIES
IT1075476B (en)	1985-04-22	PREPARATION OF N-FOSFON-METHYL-GLYCINE
IT1105291B (en)	1985-10-28	N-ALCHIL-N-ACYL DERIVATIVES OF THYENAMYCIN
IT1089005B (en)	1985-06-10	ELEMENT SENSITIVE TO RADIATION CAPABLE OF DELAYING THE PROPATION OF THE FLAME
SE422509B (en)	1982-03-08	TEMPERATURE SENSITIVE MANOVERDON
LU79609A1 (en)	1978-11-03	SOLAR CAPTOR
DK191877A (en)	1977-11-04	DERIVATIVES OF N-PHOSPHONOMETHYLGLYCIN
SE7707690L (en)	1978-04-16	TERMORELE OF BIMETAL
SE7800782L (en)	1978-07-25	SEMICONDUCTOR ELEMENT
IT1095261B (en)	1985-08-10	ENERGY ABSORPTION ELEMENT
IT1075834B (en)	1985-04-22	THIOUREA DERIVATIVES
BE867147A (en)	1978-11-17	SOLAR CAPTOR
IT1093710B (en)	1985-07-26	DERIVATIVES OF CHINAZOLINE
IT1076900B (en)	1985-04-27	Derivatives of quinoline
BR7801660A (en)	1978-10-17	FIXING ELEMENT
BE863417A (en)	1978-05-16	SOLAR CAPTOR
IT1086346B (en)	1985-05-28	COMPOUNDS OF THE AMINO-NAFTALIMIDICA SERIES
IT1090731B (en)	1985-06-26	BENZOTIADIAZINE COMPOUNDS
IT1078064B (en)	1985-05-08	COLESTERINE DERIVATIVES
IT1083017B (en)	1985-05-21	PHOTOCONDUCTOR ELEMENT
IT1095508B (en)	1985-08-10	SUPPORT ELEMENT