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HK40048936B - Flow cells and methods related to same - Google Patents

Flow cells and methods related to same Download PDF

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HK40048936B
HK40048936B HK62021038179.9A HK62021038179A HK40048936B HK 40048936 B HK40048936 B HK 40048936B HK 62021038179 A HK62021038179 A HK 62021038179A HK 40048936 B HK40048936 B HK 40048936B
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photodetector
support frame
cavity
flow cell
reaction
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HK62021038179.9A
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HK40048936A (en
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Arnaud Rival
Ali Agah
Tracy H. Fung
Dietrich Dehlinger
Poorya Sabounchi
Tarun Khurana
Craig M. Ciesla
M. Shane Bowen
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亿明达股份有限公司
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流动池及与其相关的方法Flow cells and related methods

相关申请的交叉引用Cross-reference to related applications

本专利申请要求于2018年9月14日提交的题为流动池及与其相关的方法的美国临时专利申请第62/731,785号的优先权。上述申请的全部内容通过引用在此并入本文。This patent application claims priority to U.S. Provisional Patent Application No. 62/731,785, filed September 14, 2018, entitled Flow Cell and Methods Therewith. The entire contents of the above application are incorporated herein by reference.

背景技术Background Technology

生物或化学研究中的各种方案设计在局部支撑表面或预定义反应室内进行大量受控实验。随后可观察或检测指定反应,后续的分析可有助于鉴定或揭示反应中涉及的物质的性质。例如,在一些多重鉴定中,具有可识别标记(例如,荧光标记)的未知分析物可在受控条件下暴露于数千种已知探针。每一种已知探针可设置到微板的相应孔中。观察孔中已知探针与未知分析物之间发生的任何化学反应,可以有助于鉴定或揭示分析物的性质。此类方案的其他示例包括已知的DNA测序过程,例如通过合成测序(SBS)或循环阵列测序。Various protocols in biological or chemical research are designed to conduct numerous controlled experiments on a locally supported surface or within a predefined reaction chamber. Specific reactions can then be observed or detected, and subsequent analysis can help identify or reveal the properties of the substances involved in the reaction. For example, in some multiplex identification schemes, an unknown analyte with an identifiable label (e.g., a fluorescent label) can be exposed to thousands of known probes under controlled conditions. Each known probe can be placed into a corresponding well in a microplate. Observing any chemical reactions occurring between the known probe and the unknown analyte in the well can help identify or reveal the properties of the analyte. Other examples of such protocols include known DNA sequencing procedures, such as sequencing by synthesis (SBS) or circular array sequencing.

在一些传统的荧光检测程序中,光学系统用于将激发光引导到荧光标记的分析物上,并检测可能从分析物中发出的荧光信号。然而,此类光学系统可能是相对昂贵的,并且涉及相对大的台面占地区域。例如,此类光学系统可包括透镜、过滤器和光源的布置。In some traditional fluorescence detection procedures, optical systems are used to direct excitation light onto a fluorescently labeled analyte and detect any fluorescence signals that may be emitted from the analyte. However, such optical systems can be relatively expensive and involve a relatively large stage footprint. For example, such optical systems may include the arrangement of lenses, filters, and light sources.

在其他建议的检测系统中,受控反应发生在局部支撑表面或流动池的预定义反应室中,该流动池不涉及检测荧光发射的大型光学组件支撑。流动池包含定位于支撑表面/反应室附近(例如,下方)的电子固态光检测器装置或成像器(例如,互补金属氧化物半导体(CMOS)光检测器装置或电荷耦联器件(CCD)光检测器装置),以检测反应产生的光发射。然而,此类提议的固相成像系统可能有一些限制。例如,此类系统的流动池可设计为一次性消耗品。因此,对于流动池来说,将其作为小型和廉价的装置可以会是有益的。在相对小型的流动池中,尽可以多地利用光检测设备的生物传感器有效区域和/或提供尽可以大的生物检测器有效区域可以是有益的。In other proposed detection systems, the controlled reaction occurs within a predefined reaction chamber on a localized support surface or in a flow cell that does not involve a large optical component support for detecting fluorescence emission. The flow cell contains an electronic solid-state photodetector or imager (e.g., a complementary metal-oxide-semiconductor (CMOS) photodetector or charge-coupled device (CCD) photodetector) positioned near (e.g., below) the support surface/reaction chamber to detect the light emission generated by the reaction. However, such proposed solid-state imaging systems may have some limitations. For example, the flow cell in such systems may be designed as a single-use consumable. Therefore, it may be advantageous for the flow cell to be a small and inexpensive device. In a relatively small flow cell, it may be beneficial to utilize as much of the biosensor's effective area as possible and/or provide the largest possible effective area for the biodetector.

许多现有的流动池设计不允许充分利用生物检测器的有效区域,因为流动池的盖子部分连接到有效区域,从而使试剂溶液(例如,具有荧光标记的分子的溶液)不能到达此类区域和/或阻止这些区域包含反应位点(例如,包含分析物)。此外,生物检测器有效区域通常由单个传感器提供,具有相对大的生物检测器有效区域的相对大型的传感器价格昂贵。许多现有的流动池设计也只提供有限数量的光检测设备的布线配置。Many existing flow cell designs do not allow for full utilization of the effective region of a biodetector because the flow cell cap portion is connected to the effective region, preventing reagent solutions (e.g., solutions of fluorescently labeled molecules) from reaching such regions and/or preventing these regions from containing reaction sites (e.g., containing analytes). Furthermore, the effective region of a biodetector is typically provided by a single sensor, and relatively large sensors with relatively large effective regions are expensive. Many existing flow cell designs also offer only a limited number of wiring configurations for optical detection devices.

发明内容Summary of the Invention

在本发明的一个方面,提供了一种流动池。流动池包含支撑框架,该支撑框架包括顶侧、背侧和从顶侧延伸到底侧的至少一个空腔。流动池还包含设置在至少一个空腔中的至少一个光检测设备,所述至少一个空腔包括有效区域和上表面。流动池还包括支撑材料,其设置在所述支撑框架与所述至少一个光检测设备的外围之间设置在所述至少一个空腔内,将所述支撑框架和所述至少一个光检测设备耦接在一起。流动池还包括至少一个光检测设备上方延伸的盖子,并在所述至少一个光检测设备的外围周围耦接到所述支撑框架的顶侧。所述盖子和至少一个光检测设备的至少上表面形成位于其间的流体通道。In one aspect of the invention, a flow cell is provided. The flow cell includes a support frame comprising a top side, a back side, and at least one cavity extending from the top side to a bottom side. The flow cell further includes at least one photodetector disposed within the at least one cavity, the at least one cavity including an effective region and an upper surface. The flow cell also includes a support material disposed within the at least one cavity between the support frame and the periphery of the at least one photodetector, coupling the support frame and the at least one photodetector together. The flow cell further includes a cap extending above the at least one photodetector and coupled to the top side of the support frame around the periphery of the at least one photodetector. The cap and at least the upper surface of the at least one photodetector form a fluid channel therebetween.

在一些示例中,支撑框架还包含从顶侧延伸到底侧的至少一个导电过孔。在一些这样的示例中,至少一个光检测设备包括至少一个固态光检测设备,所述至少一个固态光检测设备包含基础晶片部分、多个光传感器、电耦联到光传感器以传输基于光传感器所检测到的光子数据信号的设备电路、以及与多个光传感器相关联的多个光导。在一些这样的示例中,至少一个固态光检测设备的设备电路与支撑框架顶侧的至少一个导电过孔电耦联。In some examples, the support frame further includes at least one conductive via extending from the top side to the bottom side. In some such examples, at least one photodetector includes at least one solid-state photodetector comprising a base wafer portion, a plurality of photosensors, device circuitry electrically coupled to the photosensors to transmit photon data signals detected by the photosensors, and a plurality of light guides associated with the plurality of photosensors. In some such examples, the device circuitry of the at least one solid-state photodetector is electrically coupled to at least one conductive via on the top side of the support frame.

在一些示例中,盖子间接地耦联到支撑框架的顶侧。在一些示例中,至少一个空腔包括其中设置有多个光检测设备的空腔。在一些这样的示例中,多个光检测设备包括彼此间隔的不同的光检测设备,并且支撑材料进一步延伸到相邻的光检测设备之间。在一些其他这样的示例中,多个光检测设备包括至少两个集成式光检测设备,并且所述支撑材料在所述支撑框架和所述至少两个集成式光检测设备的外周之间延伸到。In some examples, the cover is indirectly coupled to the top side of the support frame. In some examples, at least one cavity includes a cavity in which multiple light detection devices are disposed. In some such examples, the multiple light detection devices include different light detection devices spaced apart from each other, and the support material further extends between adjacent light detection devices. In some other such examples, the multiple light detection devices include at least two integrated light detection devices, and the support material extends between the support frame and the outer periphery of the at least two integrated light detection devices.

在一些示例中,至少一个光检测设备包括多个光检测设备。在一些这样的示例中,至少一个空腔包括多个空腔,多个光检测设备中的每一个光检测设备设置在所述支撑框架中的不同空腔中。在一些示例中,至少一个光检测设备包括至少一个固态光检测设备,所述至少一个固态光检测设备包含基础晶片部分、多个光传感器、电耦联到所述光传感器以传输基于光传感器所检测到的光子数据信号的设备电路、以及与多个光传感器相关联的多个光导。在一些这样的示例中,至少一个空腔从顶侧到底侧延伸穿过支撑框架,所述设备电路包括延伸穿过基础晶片部分的过孔,所述流动池还包含还包括电触点,所述电触点至少部分地沿所述支撑框架的背侧设置并且电耦联到所述过孔。在一些其他这样的示例中,所述至少一个光检测设备还包含设置在多个光导上方形成其上表面的反应结构,反应结构包括定位在有效区域内的多个纳米孔。In some examples, at least one photodetector includes multiple photodetectors. In some such examples, at least one cavity includes multiple cavities, each of the multiple photodetectors being disposed in a different cavity within the support frame. In some examples, at least one photodetector includes at least one solid-state photodetector comprising a base wafer portion, multiple photosensors, device circuitry electrically coupled to the photosensors to transmit photon data signals detected by the photosensors, and multiple light guides associated with the multiple photosensors. In some such examples, at least one cavity extends through the support frame from top to bottom, the device circuitry including vias extending through the base wafer portion, and the flow cell further including electrical contacts disposed at least partially along the back side of the support frame and electrically coupled to the vias. In some other such examples, the at least one photodetector further includes a reaction structure disposed above the multiple light guides forming their upper surfaces, the reaction structure including multiple nanopores positioned within an effective region.

在一些示例中,至少一个空腔从顶侧到底侧仅部分延伸穿过支撑框架。在一些示例中,至少一个光检测设备包括至少一个互补金属氧化物半导体(CMOS)光传感器。In some examples, at least one cavity extends only partially through the support frame from the top to the bottom side. In some examples, at least one light detection device includes at least one complementary metal-oxide-semiconductor (CMOS) light sensor.

在一些示例中,流体通道在至少一个光检测设备的整个有效区域上方延伸。In some examples, the fluid channel extends over the entire effective area of at least one optical detection device.

在本发明的另一方面,提供了一种方法。该方法包括将支撑框架的上表面和基板的平面支撑表面附接,该支撑框架包括从其顶侧到底侧延伸的至少一个空腔。该方法进一步包括将至少一个光检测设备定位在至少一个空腔内,使得其顶侧定位在基板的平面支撑表面上,并且所述空腔的边缘部分在支撑框架与至少一个光检测设备的外周之间延伸,至少一个光检测设备包括有效区域和上表面。该方法还包含用支撑材料填充空腔的边缘部分以将支撑框架和至少一个光检测设备耦联在一起。该方法进一步包括分离支撑框架和基板。该方法还包含绕所述至少一个光检测设备的外周将盖子附接到所述支撑框架的顶侧以形成流动池,所述盖子在至少一个光检测设备上方延伸并在所述盖子与所述至少一个光检测设备的至少上表面之间形成流体通道。In another aspect of the invention, a method is provided. The method includes attaching an upper surface of a support frame to a planar support surface of a substrate, the support frame including at least one cavity extending from its top side to its bottom side. The method further includes positioning at least one photodetector within the at least one cavity such that its top side is positioned on the planar support surface of the substrate, and an edge portion of the cavity extends between the support frame and the outer periphery of the at least one photodetector, the at least one photodetector including an effective region and an upper surface. The method also includes filling the edge portion of the cavity with a support material to couple the support frame and the at least one photodetector together. The method further includes separating the support frame and the substrate. The method also includes attaching a cap around the outer periphery of the at least one photodetector to the top side of the support frame to form a flow pool, the cap extending above the at least one photodetector and forming a fluid channel between the cap and at least the upper surface of the at least one photodetector.

在一些示例中,所述至少一个光检测设备包括至少一个固态光检测设备,所述固态光检测设备包含形成背侧的基础晶片部分、多个光传感器、电耦联到光传感器以传输基于光传感器所检测到的光子数据信号的设备电路、以及与多个光传感器相关联的多个光导,并且所述支撑框架还包含从顶侧延伸到底侧的至少一个导电过孔,该方法还包括将至少一个固态光检测设备的设备电路电耦联到支撑框架的顶侧的至少一个导电过孔。In some examples, the at least one optical detection device includes at least one solid-state optical detection device comprising a base wafer portion forming a back side, a plurality of optical sensors, device circuitry electrically coupled to the optical sensors to transmit photon data signals based on the photons detected by the optical sensors, and a plurality of light guides associated with the plurality of optical sensors, and the support frame further includes at least one conductive via extending from the top side to the bottom side, the method further comprising electrically coupling the device circuitry of the at least one solid-state optical detection device to the at least one conductive via on the top side of the support frame.

在一些示例中,至少一个光检测设备包括至少一个固态光检测设备,该至少一个固态光检测设备包含形成背侧的基础晶片部分、多个光传感器、电耦联到光传感器以传输基于光传感器所检测到的光子数据信号的设备电路、以及与多个光传感器相关联的多个光导,所述设备电路包括通过基础晶片部分延伸到其背侧的过孔,并且所述方法还包括电耦联触点,所述电耦联触点至少部分地沿所述支撑架的背面布置到所述基片部分的背侧的过孔。In some examples, at least one optical detection device includes at least one solid-state optical detection device comprising a base wafer portion forming a back side, a plurality of optical sensors, device circuitry electrically coupled to the optical sensors to transmit photon data signals based on those detected by the optical sensors, and a plurality of light guides associated with the plurality of optical sensors. The device circuitry includes vias extending through the base wafer portion to its back side, and the method further includes electrically coupled contacts arranged at least partially along the back side of the support frame to the vias on the back side of the substrate portion.

在一些示例中,该方法还包括在附接盖子之前在所述至少一个光检测设备上形成反应结构,所述反应结构形成至少所述一个光检测设备的上表面并且包括定位于有效区域内的多个纳米孔。在一些这样的示例中,分离支撑架和基板使支撑材料的凹陷顶侧暴露出来,所述支撑材料的凹陷顶侧延伸到所述支撑框架的顶面和所述至少一个光检测设备的顶部之间,其中所述反应结构在所述支撑材料的凹陷顶侧和所述支撑框架的顶侧上延伸,并且其中所述反应结构形成平面顶表面,所述多个纳米孔从该平面顶表面延伸。In some examples, the method further includes forming a reactive structure on the at least one photodetector device prior to attaching the cap, the reactive structure forming an upper surface of at least one photodetector device and including a plurality of nanopores positioned within an effective region. In some such examples, separating the support frame and the substrate exposes a recessed top side of a support material extending between the top surface of the support frame and the top of the at least one photodetector device, wherein the reactive structure extends on the recessed top side of the support material and the top side of the support frame, and wherein the reactive structure forms a planar top surface from which the plurality of nanopores extend.

在一些示例中,该方法还包括获得至少一个光检测设备,所述获得至少一个光检测设备包括将至少一个互补金属氧化物半导体(CMOS)光传感器从多个集成的CMOS光传感器上切割下来。In some examples, the method further includes obtaining at least one light detection device, which includes cutting at least one complementary metal-oxide-semiconductor (CMOS) light sensor from a plurality of integrated CMOS light sensors.

在一些示例中,流体通道在至少一个光检测设备的整个有效区域上方延伸。In some examples, the fluid channel extends over the entire effective area of at least one optical detection device.

在本发明的另一方面,提供了另一种方法。该方法包括将第一支撑材料设置在支撑框架的至少一个空腔的底部部分上,所述至少一个空腔仅部分从支撑框架的顶侧向其底侧延伸。该方法进一步包括将至少一个光检测设备定位在至少一个空腔内并定位在所设置的第一支撑材料上方,使得所述至少一个空腔的边缘部分在支撑框架与至少一个光检测设备的外周之间延伸,所述至少一个光检测设备包括有效区域和上表面。该方法还包含用第二支撑材料填充空腔的边缘部分。该方法进一步包括围绕所述至少一个光检测设备的外围将盖子附于支撑架的顶侧以形成流动池,所述盖子在至少一个光检测设备上方延伸并在所述盖子与至少一个光检测设备的至少上表面之间形成流体通道。In another aspect of the invention, another method is provided. The method includes disposing a first support material on the bottom portion of at least one cavity of a support frame, said at least one cavity extending only partially from the top side to the bottom side of the support frame. The method further includes positioning at least one photodetector within the at least one cavity and above the disposed first support material, such that an edge portion of said at least one cavity extends between the support frame and the outer periphery of said at least one photodetector, said at least one photodetector including an effective region and a top surface. The method also includes filling the edge portion of the cavity with a second support material. The method further includes attaching a cap to the top side of the support frame around the periphery of said at least one photodetector to form a flow pool, said cap extending above said at least one photodetector and forming a fluid channel between said cap and at least the top surface of said at least one photodetector.

在一些示例中,流体通道在至少一个光检测设备的整个有效区域上方延伸。In some examples, the fluid channel extends over the entire effective area of at least one optical detection device.

应理解,前述方面和下文中更详细讨论的其他概念的所有组合(条件是此类概念不会互相矛盾)被认为是本发明主题的一部分并且实现了本文所公开的有点。It should be understood that all combinations of the foregoing aspects and other concepts discussed in more detail below (provided that such concepts do not contradict each other) are considered to be part of the subject matter of the invention and realize the advantages disclosed herein.

通过以下对本发明各个方面的详细描述,结合附图,本发明的这些和其他目标、特征和有点将变得显而易见。These and other objectives, features, and advantages of the invention will become apparent from the following detailed description of various aspects of the invention, taken in conjunction with the accompanying drawings.

附图说明Attached Figure Description

当参照附图阅读以下详细描述时,将更好地理解本发明的这些和其他特征、方面和优点,附图中不必按比例绘制,在附图中,相似的附图标记表示相似的方面,其中:These and other features, aspects, and advantages of the invention will be better understood when the following detailed description is read with reference to the accompanying drawings, which are not necessarily drawn to scale. In the drawings, similar reference numerals denote similar aspects, wherein:

图1在一个示例中说明了根据本发明的一个或多个方面的光检测设备的截面图。Figure 1 illustrates a cross-sectional view of a light detection device according to one or more aspects of the present invention in one example.

图2在一个示例中说明了根据本发明的一个或多个方面的另一种光检测设备的截面图。Figure 2 illustrates a cross-sectional view of another optical detection device according to one or more aspects of the present invention in one example.

图3在一个示例中说明了根据本发明的一个或多个方面的用于形成流动池的由支撑框架和基板组成的支撑结构。Figure 3 illustrates, in one example, a support structure consisting of a support frame and a substrate for forming a flow pool according to one or more aspects of the present invention.

图4在一个示例中说明了根据本发明的一个或多个方面将光检测设备定位于图3的支撑结构的空腔内。Figure 4 illustrates, in one example, the positioning of a light detection device within the cavity of the support structure of Figure 3 according to one or more aspects of the invention.

图5在一个示例中说明了根据本发明的一个或多个方面的定位于图3的支撑结构的空腔内的光检测设备的截面图。Figure 5 illustrates, in one example, a cross-sectional view of a light detection device positioned within a cavity of the support structure of Figure 3 according to one or more aspects of the present invention.

图6在一个示例中说明了根据本发明的一个或多个方面的定位于另一种支撑结构的空腔内的光检测设备的截面图。Figure 6 illustrates, in one example, a cross-sectional view of a light detection device positioned within a cavity of another support structure according to one or more aspects of the present invention.

图7在一个示例中说明了根据本发明的一个或多个方面的定位于另一种支撑结构的空腔内的光检测设备的截面图。Figure 7 illustrates, in one example, a cross-sectional view of a light detection device positioned within a cavity of another support structure according to one or more aspects of the present invention.

图8在一个示例中说明了根据本发明的一个或多个方面的定位于另一种支撑结构的空腔内的光检测设备的截面图。Figure 8 illustrates, in one example, a cross-sectional view of a light detection device positioned within a cavity of another support structure according to one or more aspects of the present invention.

图9在一个示例中说明了根据本发明的一个或多个方面用材料填充围绕定位于图4的支撑结构的空腔内的光检测设备的外围延伸的空腔。Figure 9 illustrates, in one example, a cavity extending outward from the periphery of a light detection device located within a cavity of a support structure of Figure 4, filled with material according to one or more aspects of the invention.

图10在一个示例中说明了根据本发明的一个或多个方面从图4的支撑结构的支撑框架中移除基板。Figure 10 illustrates, in one example, the removal of a substrate from the support frame of the support structure of Figure 4 according to one or more aspects of the present invention.

图11A在一个示例中说明了根据本发明的一个或多个方面的耦联在已移除基板的图4的支撑框架的多个空腔内的多个光检测设备的截面图。Figure 11A illustrates, in one example, a cross-sectional view of multiple photodetectors coupled within multiple cavities of the support frame of Figure 4 with the substrate removed, according to one or more aspects of the present invention.

图11B在一个示例中说明了根据本发明的一个或多个方面的耦联在图11A的支撑框架的空腔内的多个光检测设备的俯视图。Figure 11B illustrates, in one example, a top view of a plurality of optical detection devices coupled within a cavity of a support frame of Figure 11A according to one or more aspects of the invention.

图12A在一个示例中说明了根据本发明的一个或多个方面的耦联在已移除基板的支撑框架的空腔内的多个光检测设备的截面图。Figure 12A illustrates, in one example, a cross-sectional view of a plurality of photodetectors coupled within a cavity of a support frame with a removed substrate, according to one or more aspects of the present invention.

图12B在一个示例中说明了根据本发明的一个或多个方面的耦联在图12A的支撑框架的空腔内的多个光检测设备的俯视图。Figure 12B illustrates, in one example, a top view of a plurality of optical detection devices coupled within a cavity of a support frame of Figure 12A according to one or more aspects of the present invention.

图13A在一个示例中说明了根据本发明的一个或多个方面的耦联在已移除基板的支撑框架的另一个空腔内的多个光检测设备的截面图。Figure 13A illustrates, in one example, a cross-sectional view of a plurality of photodetectors coupled within another cavity of a support frame with the substrate removed, according to one or more aspects of the invention.

图13B在一个示例中说明了根据本发明的一个或多个方面的耦联在图13A的支撑框架的空腔内的多个光检测设备的俯视图。Figure 13B illustrates, in one example, a top view of a plurality of optical detection devices coupled within a cavity of a support frame of Figure 13A according to one or more aspects of the present invention.

图14在一个示例中说明了根据本发明的一个或多个方面的耦联在另一个支撑框架的空腔内的多个光检测设备的截面图。Figure 14 illustrates, in one example, a cross-sectional view of multiple optical detection devices coupled within a cavity of another support frame according to one or more aspects of the present invention.

图15A在一个示例中说明了根据本发明的一个或多个方面的光检测设备以及支撑框架的空腔内的填充材料的截面图。Figure 15A illustrates, in one example, a cross-sectional view of a light detection device according to one or more aspects of the present invention and the filling material within the cavity of a support frame.

图15B在一个示例中说明了根据本发明的一个或多个方面的有反应结构定位于其中的图15A的光检测设备以及支撑框架的空腔内的填充材料的截面图。Figure 15B illustrates, in one example, a cross-sectional view of the photodetector of Figure 15A in which a reactive structure according to one or more aspects of the present invention is positioned, and the filling material within the cavity of the support frame.

图16A在一个示例中说明了根据本发明的一个或多个方面的包含耦联在支撑框架的多个空腔内的多个光检测设备的中间流动池装置的截面图。Figure 16A illustrates, in one example, a cross-sectional view of an intermediate flow cell device comprising multiple optical detection devices coupled within multiple cavities of a support frame, according to one or more aspects of the present invention.

图16B-16D在一个示例中说明了在图16A的中间流动池装置上形成背侧接触。Figures 16B-16D illustrate, in one example, the formation of a back-side contact on the intermediate flow cell device of Figure 16A.

图17A在一个示例中说明了根据本发明的一个或多个方面的包含耦联在支撑框架的多个空腔内的多个光检测设备的另一种中间流动池装置的截面图。Figure 17A illustrates, in one example, a cross-sectional view of another intermediate flow cell device comprising multiple optical detection devices coupled within multiple cavities of a support frame, according to one or more aspects of the present invention.

图17B和17C在一个示例中说明了在图17A的中间流动池装置上形成背侧接触(backside contacts)。Figures 17B and 17C illustrate, in one example, the formation of backside contacts on the intermediate flow cell apparatus of Figure 17A.

图18A在一个示例中说明了根据本发明的一个或多个方面的包含耦联在支撑框架的多个空腔内的多个光检测设备的另一种中间流动池装置的截面图。Figure 18A illustrates, in one example, a cross-sectional view of another intermediate flow cell device comprising multiple optical detection devices coupled within multiple cavities of a support frame, according to one or more aspects of the present invention.

图18B和18C在一个示例中说明了图18A的中间流动池装置上形成背侧接触。Figures 18B and 18C illustrate, in one example, the formation of a back-side contact on the intermediate flow cell device of Figure 18A.

图19A在一个示例中说明了根据本发明的一个或多个方面另一种中间流动池装置包含耦联在支撑框架的多个空腔内的多个光检测设备的截面图。Figure 19A illustrates, in one example, a cross-sectional view of another intermediate flow cell device according to one or more aspects of the present invention, comprising a plurality of optical detection devices coupled within a plurality of cavities of a support frame.

图19B和19C在一个示例中说明了在图19A的中间流动池装置形成背侧接触。Figures 19B and 19C illustrate, in one example, the formation of a back-side contact in the intermediate flow cell device of Figure 19A.

图20在一个示例中说明了根据本发明的一个或多个方面的经由图19C的中间流动池装置形成的多个流动池。Figure 20 illustrates, in one example, a plurality of flow pools formed via the intermediate flow pool apparatus of Figure 19C according to one or more aspects of the present invention.

图21在一个示例中说明了根据本发明的一个或多个方面的图20的流动池的光检测设备的流体通道和有效区域。Figure 21 illustrates, in one example, the fluid channel and effective area of the optical detection device of Figure 20 with a flow cell according to one or more aspects of the present invention.

图22在一个示例中说明了根据本发明的一个或多个方面的可由图20的多个流动池形成的多个不同流动池。Figure 22 illustrates, in one example, multiple different flow cells that can be formed from the multiple flow cells of Figure 20 according to one or more aspects of the present invention.

具体实施方式Detailed Implementation

在下文中参考附图中所示的非限制性示例更详细地解释了本发明的多个方面及其特定示例、特征、优点和细节。省略已知材料、构建工具、处理方法等的描述以避免不必要地掩盖相关细节。然而,应理解,详细说明和具体实施例在描述了本发明的多个方面的同时,仅以说明方式给出,而不是以限制方式。在本发明概念的精神和/或范围内,各种替代、修改、添加和/或排列对于本领域技术人员来说是显而易见的。Various aspects of the invention, along with specific examples, features, advantages, and details thereof, are explained in more detail below with reference to the non-limiting examples shown in the accompanying drawings. Descriptions of known materials, construction tools, processing methods, etc., are omitted to avoid unnecessarily obscuring relevant details. However, it should be understood that the detailed descriptions and specific embodiments, while describing various aspects of the invention, are given by way of illustration only and not by way of limitation. Various substitutions, modifications, additions, and/or arrangements will be apparent to those skilled in the art within the spirit and/or scope of the inventive concept.

在本文整个公开内容中使用的近似语言可用于修饰任何能可允许地变化的定量表示,而不会导致与之相关的基本上功能发生变化。因此,用例如“约”或“基本上”之类的术语修饰的值不限于所指定的精确值。例如,这些术语可以指小于或等于±5%,例如小于或等于±2%,例如小于或等于±1%,例如小于或等于±0.5%,例如小于或等于±0.2%,例如小于或等于±0.1%,例如小于或等于±0.05%。在某些情况下,近似语言可以对应于测量该值的仪器的精度。The approximate language used throughout this disclosure can be used to modify any quantitative expression that can be permissibly varied without causing a fundamental change in the associated function. Therefore, values modified by terms such as “about” or “substantially” are not limited to the specified exact values. For example, these terms can refer to less than or equal to ±5%, such as less than or equal to ±2%, such as less than or equal to ±1%, such as less than or equal to ±0.5%, such as less than or equal to ±0.2%, such as less than or equal to ±0.1%, such as less than or equal to ±0.05%. In some cases, the approximate language may correspond to the precision of the instrument measuring the value.

本文所用的术语仅是为了描述特定示例,而并非旨在进行限制。除非上下文另有说明,本文所使用的单数形式“一种”、“一个”和“所述/该”也旨在包括复数形式。此外,对“一个示例”的引用并非旨在解释为排除也包含所述特征的其他示例的存在。此外,除非明确说明相反,术语“包括(comprising)”(以及任何形式的“包括(comprise)”,如“包括(comprises)”和“包括(comprising)”)、“具有(have)”(以及任何形式的“具有(have)”,如“具有(has)”和“(having)”)、“包含(include)”(以及任何形式的“包含(include)”,如“包含(includes)”和“包含(including)”)和“含有(contain)”(以及任何形式的“含有(contain)”,如“含有(contains)”和“含有(containing)”)用作开放式连接动词。“包括”、“具有”、“包含”或“含有”一个或多个步骤或要素的任何示例具有此类一个或多个步骤或要素,但不限于仅具有此类一个或多个步骤或要素。如本文所用的,术语“可以”和“可以是”表示在一组情况下发生的可以性;拥有指定的性质、特征或功能;和/或通过表达与另一个动词相关的一种或多种能力(ability)、能力(capability)或可以性来限定所限定的动词。因此,使用“可以”和“可以是”表示被修饰的术语显然是合适、能够或适合用于所表示的能力、功能或使用的,同时也考虑了在一些情况中被修饰的术语有可以是不合适、不能够或不适合的。在某些情况下,可以预期某个事件或能力,而在其他情况下该事件或能力无法发生——这种区别被术语“可以”和“可以是”所捕获。The terminology used herein is for the purpose of describing specific examples only and is not intended to be restrictive. Unless the context otherwise requires, the singular forms “a,” “an,” and “the” used herein are also intended to include the plural forms. Furthermore, references to “an example” are not intended to exclude the existence of other examples that also contain the described features. Additionally, unless explicitly stated otherwise, the terms “comprising” (and any form of “comprise,” such as “comprises” and “comprising”), “have” (and any form of “have,” such as “has” and “having”), “include” (and any form of “include,” such as “includes” and “including”), and “contain” (and any form of “contains,” such as “contains” and “containing”) are used as open-ended conjunctions. Any example of "including," "having," "comprising," or "containing" one or more steps or elements has one or more such steps or elements, but is not limited to having only one or more such steps or elements. As used herein, the terms "may" and "may be" indicate the possibility of occurrence in a set of circumstances; possessing a specified property, characteristic, or function; and/or defining the verb being modified by expressing one or more abilities, capabilities, or permissibility in relation to another verb. Thus, the use of "may" and "may be" indicates that the modified term is obviously appropriate, capable, or suitable for the expressed ability, function, or use, while also taking into account that in some cases the modified term may be inappropriate, incapable, or unsuitable. In some cases, an event or ability can be anticipated, while in others it cannot occur—this distinction is captured by the terms "may" and "may be."

如本文所用的,除非另有说明,术语“整个”(以及任何其他形式的“整个”)是指至少大部分,例如至少95%或至少99%。因此,除非另有说明,如本文所用的术语“整个”(以及任何其他形式的“整个”)不限于100%。如本文所用的,除非另有说明,术语“层”不限于材料的单个连续体。“层”可包括可以为相同或不同材料的多个子层,和/或可包括涂层、胶粘剂等。此外,本文所公开的流动池的一个或多个层(或子层)可进行修饰(例如,蚀刻、沉积有材料等)以提供本文所述的功能。As used herein, unless otherwise stated, the term "whole" (and any other form of "whole") means at least a majority, such as at least 95% or at least 99%. Therefore, unless otherwise stated, the term "whole" (and any other form of "whole") as used herein is not limited to 100%. As used herein, unless otherwise stated, the term "layer" is not limited to a single continuum of material. A "layer" can include multiple sublayers that may be the same or different materials, and/or may include coatings, adhesives, etc. Furthermore, one or more layers (or sublayers) of the flow cell disclosed herein may be modified (e.g., etched, deposited with material, etc.) to provide the functionality described herein.

本文所述的流动池可在用于学术或商业分析的各种生物或化学过程和系统中使用。更具体地,本文所述的流动池可在需要检测作为指定反应的指证的事件、性质、质量或特性的各种过程和系统中使用。例如,本文所述的流动池可包括光检测设备、生物传感器及其组件以及与生物传感器一起操作的生物测定系统或者与上述装置整合。The flow cell described herein can be used in a variety of biological or chemical processes and systems for academic or commercial analysis. More specifically, the flow cell described herein can be used in a variety of processes and systems where it is necessary to detect an event, property, quality, or characteristic as an indication of a specified reaction. For example, the flow cell described herein may include optical detection devices, biosensors and their components, and bioassay systems that operate with or are integrated with the aforementioned devices.

流动池可设为促进可个别地或共同地检测的多个指定反应。流动池可设为进行多个循环,在所述多个循环中多个指定反应并行发生。例如,流动池可用于通过酶操作和光或图像检测/获取的迭代周期来对密集的DNA特征序列进行测序。因此,可将流动池与一个或多个微流体通道连通耦联,该一个或多个微流体通道将反应溶液中的试剂或其他反应组分递送至流动池的反应位点。可以预定方式提供或隔开反应位点,如以均匀或重复的模式。可替代地,反应位点可以随机分布。每一个反应位点可以与一个或多个光导和一个或多个光传感器相关,该一个或多个光导和一个或多个光传感器检测来自相关反应位点的光。在一些流动池中,反应位点可以位于反应凹陷或反应室中,该反应凹陷可至少部分分隔其中的指定反应。A flow cell can be configured to facilitate the detection of multiple designated reactions individually or jointly. The flow cell can be configured to perform multiple cycles in which multiple designated reactions occur in parallel. For example, a flow cell can be used to sequence dense DNA signatures through iterative cycles of enzyme manipulation and light or image detection/acquisition. Therefore, the flow cell can be coupled to one or more microfluidic channels that deliver reagents or other reaction components from the reaction solution to the reaction sites within the flow cell. Reaction sites can be provided or spaced in a predetermined manner, such as in a uniform or repetitive pattern. Alternatively, reaction sites can be randomly distributed. Each reaction site can be associated with one or more photoconductors and one or more photosensors that detect light from the associated reaction site. In some flow cells, reaction sites can be located in reaction recesses or reaction chambers that at least partially separate the designated reactions therein.

如本文所用,“指定反应”包括目标化学或生物物质(如目标分析物)的化学、电、物理或光学性质(或质量)中至少一种的变化。在特定流动池中,指定反应是主动结合事件,例如荧光标记的生物分子与目标分析物的结合。更具体地,指定反应可以是化学转化、化学变化或化学相互作用。指定反应也可以是电性质的变化。在特定流动池中,指定反应包括荧光标记的分子与分析物的结合。分析物可为寡核苷酸,荧光标记的分子可为核苷酸。当将激发光引导到具有荧光核苷酸的寡核苷酸,并且荧光团发射可检测的荧光信号时,可检测指定反应。在可替代的流动池中,检测到的荧光是化学发光或生物发光的结果。指定反应还可例如通过将供体荧光团带到受体荧光团附近来增加荧光(或)共振能转移(FRET),通过将供体和受体荧光团分开来降低FRET,通过将猝灭剂与荧光团分开来提高荧光强度,或者通过将猝灭剂和荧光团共定位来减少荧光。As used herein, a “designated reaction” includes a change in at least one of the chemical, electrical, physical, or optical properties (or mass) of a target chemical or biological substance (such as a target analyte). In a specific flow cell, a designated reaction is an active binding event, such as the binding of a fluorescently labeled biomolecule to a target analyte. More specifically, a designated reaction can be a chemical transformation, chemical change, or chemical interaction. A designated reaction can also be a change in electrical properties. In a specific flow cell, a designated reaction includes the binding of a fluorescently labeled molecule to an analyte. The analyte can be an oligonucleotide, and the fluorescently labeled molecule can be a nucleotide. A designated reaction can be detected when excitation light is directed to an oligonucleotide containing a fluorescent nucleotide, and the fluorophore emits a detectable fluorescent signal. In alternative flow cells, the detected fluorescence is the result of chemiluminescence or bioluminescence. A designated reaction can also, for example, increase fluorescence (or) resonance energy transfer (FRET) by bringing the donor fluorophore closer to the acceptor fluorophore, decrease FRET by separating the donor and acceptor fluorophores, increase fluorescence intensity by separating the quencher from the fluorophore, or decrease fluorescence by co-localizing the quencher and the fluorophore.

如本文所用,“反应溶液”、“反应组分”或“反应剂”包括可用于获得至少一个指定反应的任何物质。例如,可能的反应组分包括例如试剂、酶、样品、其他生物分子和缓冲溶液。可将反应组分递送到本文公开的流动池中的反应位点和/或固定在反应位点处。反应组分可与另一种物质(如固定在流动池中的反应位点处的目标分析物)直接或间接地相互作用。As used herein, “reaction solution,” “reaction component,” or “reactant” includes any substance that can be used to obtain at least one specified reaction. Possible reaction components include, for example, reagents, enzymes, samples, other biomolecules, and buffer solutions. Reaction components may be delivered to and/or immobilized at reaction sites in the flow cell disclosed herein. Reaction components may interact directly or indirectly with another substance, such as a target analyte immobilized at a reaction site in the flow cell.

如本文所用,术语“反应位点”是可能会发生至少一种指定反应的局部区域。反应位点可包括反应结构或基板的支撑表面,其中基板可固定在其上。例如,反应位点可包括其上具有反应组分(如其上的核酸集落)的反应结构的表面(其可定位于流动池的通道中)。在一些流动池中,克隆中的核酸具有相同的序列,例如,其可为单链或双链模板的克隆拷贝。然而,在一些流动池中,反应位点可仅包含例如单链或双链形式的单个核酸分子。As used herein, the term "reaction site" is a localized region where at least one specified reaction may occur. A reaction site may include a support surface of a reaction structure or substrate to which the substrate may be anchored. For example, a reaction site may include a surface of a reaction structure having reaction components (such as nucleic acid colonies) thereon (which may be located within a channel of a flow cell). In some flow cells, the nucleic acids in the clones have the same sequence; for example, they may be clone copies of single-stranded or double-stranded templates. However, in some flow cells, the reaction site may contain only a single nucleic acid molecule, for example, in single-stranded or double-stranded form.

多个反应位点可沿流动池的反应结构随机分布,或者可以以预定方式(例如,在矩阵中并排,如微阵列)排列。反应位点还可包括至少部分限定设为分隔指定反应的空间区域或体积的反应室或凹陷。如本文所用,术语“反应室”或“反应凹陷”包括限定的支撑结构的空间区域(其通常与流体通道连通)。反应凹陷可至少部分与周围环境或其他空间区域隔开。例如,多个反应凹陷可通过共享的壁彼此隔开。作为更具体的示例,反应凹陷可为由检测器表面的内表面限定的凹痕、凹坑、孔、凹槽、空腔或凹处形成的纳米孔,并且具有开口或孔(即,为开口的)以使得该纳米孔与流体通道流体连通。Multiple reaction sites may be randomly distributed along the reaction structure of the flow cell, or they may be arranged in a predetermined manner (e.g., side-by-side in a matrix, such as a microarray). The reaction sites may also include reaction chambers or recesses that at least partially define spatial regions or volumes separating a specified reaction. As used herein, the terms "reaction chamber" or "reaction recess" include a spatial region of a defined support structure (which is typically in communication with a fluid channel). The reaction recess may be at least partially isolated from the surrounding environment or other spatial regions. For example, multiple reaction recesses may be separated from each other by a shared wall. As a more specific example, a reaction recess may be a nanopore formed by an indentation, pit, hole, groove, cavity, or recess defined by an inner surface of the detector surface, and has an opening or hole (i.e., an open structure) such that the nanopore is in fluid communication with a fluid channel.

在一些流动池中,流动池的反应结构的反应凹陷可针对固体(包括半固体)来设尺寸和形状,从而使固体可完全或部分插入其中。例如,可将反应凹陷的尺寸和形状设为容纳捕获微球。捕获微球上可具有克隆扩增的DNA或其他物质。可替代地,可将反应凹陷的尺寸和形状设为接收合适数量的球或固体基板。作为另一个示例,反应凹陷可用多孔凝胶或设为控制扩散或过滤可能流入反应凹陷的流体的物质来填充。In some flow cells, the reaction recesses of the flow cell's reaction structure can be sized and shaped to accommodate solids (including semi-solids), allowing the solid to be fully or partially inserted therein. For example, the reaction recesses can be sized and shaped to accommodate trapping microspheres. The trapping microspheres may have cloned and amplified DNA or other material on them. Alternatively, the reaction recesses can be sized and shaped to receive a suitable number of spheres or a solid substrate. As another example, the reaction recesses can be filled with porous gels or materials designed to control diffusion or filter fluids that may flow into the reaction recesses.

流动池的一个或多个光检测设备的光传感器(例如,光电二极管)可与相应的反应位点相关。当指定反应在相关的反应位点发生时,与反应位点相关的光传感器经由至少一个光导检测来自该相关的反应位点的光发射。在一些流动池中,多个光传感器(例如,光检测或摄像装置的若干像素)可与单个反应位点相关。在其他流动池中,单个光传感器(例如,单个像素)可与单个反应位点或一组反应位点相关。流动池的光传感器、反应位点和其他特征可设为使得至少一些光没有反射地被光传感器直接检测到。In a flow cell, one or more photodetectors (e.g., photodiodes) can be associated with corresponding reaction sites. When a specified reaction occurs at the associated reaction site, the photodetector associated with the reaction site detects light emission from that associated reaction site via at least one light guide. In some flow cells, multiple photodetectors (e.g., several pixels of a photodetector or camera) can be associated with a single reaction site. In other flow cells, a single photodetector (e.g., a single pixel) can be associated with a single reaction site or a group of reaction sites. The photodetectors, reaction sites, and other features of the flow cell can be configured such that at least some light is directly detected by the photodetectors without reflection.

如本文所用,“生物或化学物质”包括生物分子、目标样品、目标分析物和其他化合物。生物或化学物质可用于检测、识别或分析其他化合物,或用作中间体以研究或分析其他化合物。在特定流动池中,生物或化学物质包括生物分子。如本文所用,“生物分子”包括以下中的至少一种:生物聚合物、核苷酸、核酸、多核苷酸、寡核苷酸、蛋白质、酶、多肽、抗体、抗原、配体、受体、多糖、碳水化合物、聚磷酸盐、细胞、组织、有机体或其片段或任何其他生物活性化合物(如上述种类的类似物或模拟物)。在另一个示例中,生物或化学物质或生物分子包括用于耦联反应中以检测另一个反应的产物(如酶或试剂)的酶或试剂,如用于在焦磷酸测序反应中检测焦磷酸盐的酶或试剂。As used herein, “biological or chemical substance” includes biomolecules, target samples, target analytes, and other compounds. Biological or chemical substances can be used to detect, identify, or analyze other compounds, or as intermediates for studying or analyzing other compounds. In a specific flow cell, biological or chemical substances include biomolecules. As used herein, “biomolecule” includes at least one of the following: biopolymers, nucleotides, nucleic acids, polynucleotides, oligonucleotides, proteins, enzymes, peptides, antibodies, antigens, ligands, receptors, polysaccharides, carbohydrates, polyphosphates, cells, tissues, organisms, fragments thereof, or any other biologically active compound (such as analogs or mimics of the above classes). In another example, biological or chemical substances or biomolecules include enzymes or reagents used in a coupled reaction to detect the product (such as an enzyme or reagent) of another reaction, such as enzymes or reagents used to detect pyrophosphate in a pyrosequencing reaction.

生物分子、样品以及生物或化学物质可为天然或合成的,并且可悬浮在反应凹陷或区域内的溶液或混合物中。生物分子、样品以及生物或化学物质也可结合到固相或凝胶材料上。生物分子、样品以及生物或化学物质也可包含药物组合物。在一些情况中,目标生物分子、样品以及生物或化学物质可称为靶标、探针或分析物。Biomolecules, samples, and biological or chemical substances may be natural or synthetic and may be suspended in a solution or mixture within a reaction depression or region. Biomolecules, samples, and biological or chemical substances may also be bound to a solid or gel material. Biomolecules, samples, and biological or chemical substances may also contain pharmaceutical compositions. In some cases, the target biomolecule, sample, and biological or chemical substance may be referred to as a target, probe, or analyte.

如本文所用的,“流动池”包括包含在反应结构上方延伸的盖子,盖子与反应结构共同形成位于其间的流体通道,该流体通道与反应结构的多个反应位点连通;并且包括至少一个光检测设备,所述至少一个光检测设备设为检测在反应位点处或附近发生的指定反应。流动池可包括固态的光检测或“成像”装置(例如,CCD或CMOS光检测设备)。作为一个具体的示例,流动池可设为与具有集成泵的盒(cartridge)流体地和电耦联,所述盒(cartridge)可设为与生物测定系统流体耦联和/或电耦联。盒(cartridge)和/或生物测定系统可根据预定方案(例如,合成测序)将反应溶液递送到流动池的反应位点,并执行多个成像事件。例如,盒和/或生物测定系统可通过流动池的流体通道从而沿反应位点引导一种或多种反应溶液。至少一种反应溶液可包括具有相同或不同荧光标记的四种核苷酸。核苷酸可结合至流动池的反应位点,如结合至反应位点处的相应寡核苷酸。盒(cartridge)和/或生物测定系统随后可使用激发光源(例如,固态光源,如发光二极管(LEDs))使反应位点发光。激发光源可具有预定的波长或多个波长,包括波长范围。入射的激发光所激发的荧光标记可提供可被流动池的光传感器检测到的发射信号(例如,具有与激发光不同并且可能彼此不同的一个或多个波长的光)。As used herein, a "flow cell" includes a cap extending above a reaction structure, the cap and the reaction structure forming a fluid channel therebetween, the fluid channel communicating with multiple reaction sites of the reaction structure; and includes at least one photodetector configured to detect a specified reaction occurring at or near the reaction site. The flow cell may include a solid-state photodetector or "imaging" device (e.g., a CCD or CMOS photodetector). As a specific example, the flow cell may be fluidly and electrically coupled to a cartridge with an integrated pump, the cartridge being fluidly and/or electrically coupled to a bioassay system. The cartridge and/or bioassay system may deliver reaction solutions to the reaction sites of the flow cell according to a predetermined protocol (e.g., synthetic sequencing) and perform multiple imaging events. For example, the cartridge and/or bioassay system may guide one or more reaction solutions along the reaction site via the fluid channel of the flow cell. At least one reaction solution may include four nucleotides having the same or different fluorescent labels. Nucleotides may bind to the reaction sites of the flow cell, such as corresponding oligonucleotides binding to the reaction sites. The cartridge and/or bioassay system can then use an excitation source (e.g., a solid-state source such as light-emitting diodes (LEDs)) to cause the reaction site to emit light. The excitation source may have a predetermined wavelength or multiple wavelengths, including a wavelength range. The fluorescent label excited by the incident excitation light can provide an emission signal (e.g., light with one or more wavelengths that are different from and may be different from each other) that can be detected by the photosensor of the flow cell.

所公开的流动池可设为用于物理或化学分析以得到与其相关的任何信息或数据。特定的流动池可包括设为用于各种应用的核酸测序系统(或测序仪)部分,包括但不限于从头测序、全基因组或靶标基因区域及宏基因组学的再测序。测序系统可设为执行DNA或RNA分析。流动池可设为在其有效表面上执行大量平行反应以获得与反应相关的信息。The disclosed flow cell can be configured for physical or chemical analysis to obtain any related information or data. A specific flow cell may include portions of a nucleic acid sequencing system (or sequencer) configured for various applications, including but not limited to de novo sequencing, whole-genome or target gene region resequencing, and metagenomics. The sequencing system may be configured to perform DNA or RNA analysis. The flow cell may be configured to perform a large number of parallel reactions on its effective surface to obtain reaction-related information.

流动池可包括将溶液引导向一个或多个光检测设备上方的反应结构的有效区域/表面上的反应位点的一个或多个流体通道,如下文将进一步解释的。因此,在使用中,流动池可与例如可存储用于在流动池中进行指定反应的各种反应组分或反应物的流体存储系统(未示出)流体连通。流体存储系统还可存储用于洗涤或清洁流动池的一个或多个流体通道和/或稀释反应物的流体。例如,流体存储系统可包括多个储器以存储样品、试剂、酶、其他生物分子、缓冲溶液、水性溶液和非极性溶液等。此外,流体存储系统还可包括用于接收来自流动池的废产物的废料储器。A flow cell may include one or more fluid channels that guide the solution to reaction sites on an effective region/surface of a reaction structure above one or more photodetectors, as will be further explained below. Therefore, in use, the flow cell may be in fluid communication with, for example, a fluid storage system (not shown) that can store various reaction components or reactants used to carry out a specified reaction in the flow cell. The fluid storage system may also store fluids for washing or cleaning one or more fluid channels of the flow cell and/or diluting reactants. For example, the fluid storage system may include multiple reservoirs for storing samples, reagents, enzymes, other biomolecules, buffer solutions, aqueous solutions, and nonpolar solutions, etc. Furthermore, the fluid storage system may include a waste reservoir for receiving waste products from the flow cell.

图1示出了可在本发明的流动池中使用的光检测设备10的一个示例。光检测设备10可包括多个堆叠层(如基层或晶片14)和多个介电层以及在其上延伸的金属介电层。如图1所示,光检测设备10包括光传感器12的传感器阵列和光导18的光导阵列。光检测设备10还可包括沿光检测设备10的顶部部分20(包括在光导18的开口上方)延伸的反应结构20。光检测设备10可配置为使每一个光传感器12对应于或对准位于光检测设备10的上表面22上方的反应结构20的单个光导18和/或单个反应凹陷16(例如,纳米孔),从使得其仅从中接收光子。然而,在其他示例中,单个光传感器12可接收通过一个以上的光导18和/或来自一个以上的反应凹陷16的光子。单个光传感器12由此可形成一个像素或一个以上的像素。如图1所示,反应凹陷16可由例如反应结构20的上表面中的凹痕或者深度(或厚度)的变化来限定。Figure 1 illustrates an example of a photodetector 10 that can be used in the flow cell of the present invention. The photodetector 10 may include multiple stacked layers (such as a base layer or wafer 14) and multiple dielectric layers, as well as a metal dielectric layer extending thereon. As shown in Figure 1, the photodetector 10 includes a sensor array of photosensors 12 and a photoguide array of photoguides 18. The photodetector 10 may also include a reaction structure 20 extending along a top portion 20 of the photodetector 10 (including above the openings of the photoguides 18). The photodetector 10 may be configured such that each photosensor 12 corresponds to or aligns with a single photoguide 18 and/or a single reaction recess 16 (e.g., a nanopore) of the reaction structure 20 located above the upper surface 22 of the photodetector 10, so that it receives photons only therefrom. However, in other examples, a single photosensor 12 may receive photons through more than one photoguide 18 and/or from more than one reaction recess 16. A single photosensor 12 may thus form one or more pixels. As shown in Figure 1, the reaction depression 16 can be defined by, for example, a dent or a variation in depth (or thickness) in the upper surface of the reaction structure 20.

如图1所示,反应结构20(以及潜在的光传感器12)的光波导18和反应凹陷16的阵列可以以限定的重复图案提供,使得至少一些凹陷16和/或光导18(以及潜在的光传感器12)在限定的位置图案中彼此间隔相等。在其他示例中,反应凹陷16和/或光导18(以及潜在的光传感器12)可以随机图案提供,和/或反应凹陷16和/或光导18(以及潜在的光传感器12)中的至少一些可以彼此可变间隔。反应凹陷16的阵列之间的间隙区域可基本上为平面。如下文中进一步解释的,反应结构20的反应凹陷16的阵列可具有在其中提供的(例如固定在其表面上的)至少一个相应的反应位点。As shown in Figure 1, the array of optical waveguides 18 and reactive recesses 16 of the reactive structure 20 (and the potential photosensitive sensor 12) can be provided in a defined repeating pattern, such that at least some of the recesses 16 and/or waveguides 18 (and the potential photosensitive sensor 12) are equally spaced from each other in the defined positional pattern. In other examples, the reactive recesses 16 and/or waveguides 18 (and the potential photosensitive sensor 12) can be provided in a random pattern, and/or at least some of the reactive recesses 16 and/or waveguides 18 (and the potential photosensitive sensor 12) can be variably spaced from each other. The gap regions between the arrays of reactive recesses 16 can be substantially planar. As further explained below, the array of reactive recesses 16 of the reactive structure 20 can have at least one corresponding reactive site provided therein (e.g., fixed to its surface).

光检测设备10的光敏性区域被称为装置10的有效区域。因此,光检测设备10的有效区域包括包含光导18的区域,该光导18将光引导向光传感器12。光检测设备10的上表面22可以包括反应结构20,反应结构20上有一列反应凹陷16,其上/内至少有一个对应的反应位点,这些反应位点可用于/可用于试剂输送和反应(例如,对反应液中的分析物有反应)和流动池操作期间的光照。如图1所示,反应结构20可在光检测设备10的整个(例如,至少96%,或至少99%,或100%)有效区域上方延伸。在这样的结构中,反应结构20的上表面或检测器表面可限定光检测器10的有效表面,反应溶液可在该有效表面上方流动并与反应凹陷16上/中形成的反应位点相互作用。光检测器10的有效表面可包括凹陷16的表面以及在凹陷16之间和周围延伸的间隙区域。The photosensitizing region of the photodetector 10 is referred to as the effective region of the device 10. Therefore, the effective region of the photodetector 10 includes a region containing a light guide 18 that directs light toward the photosensor 12. The upper surface 22 of the photodetector 10 may include a reaction structure 20 having a row of reaction recesses 16, each having at least one corresponding reaction site on/within which it can be used for reagent delivery and reaction (e.g., reaction to an analyte in a reaction solution) and illumination during flow cell operation. As shown in FIG1, the reaction structure 20 may extend over the entire (e.g., at least 96%, or at least 99%, or 100%) effective region of the photodetector 10. In such a configuration, the upper surface or detector surface of the reaction structure 20 may define the effective surface of the photodetector 10 over which the reaction solution can flow and interact with the reaction sites formed on/within the reaction recesses 16. The effective surface of the photodetector 10 may include the surfaces of the recesses 16 and gap regions extending between and around the recesses 16.

反应结构20的暴露上表面(即,反应凹陷16的暴露上表面和/或在其间和其周围延伸的间隙区域)可包括光滑的平面/平的表面。在特定示例中,反应结构20的暴露上表面的间隙区域和/或反应凹陷16的暴露上表面可为光滑的平面/平的表面,这防止了反应溶液或任何其他生物或化学物质被捕获或留在其上和/或防止跳垫误差(pad hopping errors)。例如,反应结构20的暴露上表面可包括表面粗糙度微观测量范围,如小于或等于20μm,或者小于或等于1μm的表面粗糙度。在一些示例中,反应结构20可包括小于或等于100nm,或者小于或等于10nm的表面粗糙度。The exposed upper surface of the reaction structure 20 (i.e., the exposed upper surface of the reaction recess 16 and/or the gap region extending therebetween and around it) may include a smooth, planar/flat surface. In certain examples, the gap region of the exposed upper surface of the reaction structure 20 and/or the exposed upper surface of the reaction recess 16 may be a smooth, planar/flat surface, which prevents the reaction solution or any other biological or chemical substance from being trapped or retained thereon and/or prevents pad hopping errors. For example, the exposed upper surface of the reaction structure 20 may include a surface roughness micrometer range, such as less than or equal to 20 μm, or less than or equal to 1 μm. In some examples, the reaction structure 20 may include a surface roughness less than or equal to 100 nm, or less than or equal to 10 nm.

反应结构20可包括一层或多层。在一个示例中,反应结构20包含多个重叠层。反应结构20可包括如下的一个或多个层,其被配置成允许激发光信号和/或来自反应凹陷16中的反应位点的发射光信号(在用反应溶液处理之后)从其中通过,进入一个或多个相应的光导18的开口,并且潜在地连接到一个或多个对应的光传感器12(例如,取决于光导18的配置)。作为另一个示例,反应结构20可包括一层以上,该层可包括防止来自反应凹陷16中的特定反应位点的发射光的串扰或“共享”传播或传递到非对应的传感器12中。反应结构20可提供允许在其上固定目标化学品、生物分子或其他分析物的固体。例如,反应凹陷16上的每一个反应位点可包括固定在其暴露外表面上的生物分子簇。因此,反应结构20可包括允许将反应位点固定到反应凹陷16上的材料。反应结构20可进行物理或化学修饰以促进固定生物分子以形成反应位点和/或促进对其光发射的检测。可形成反应结构20的层的示例包括至少一个SiN层和至少一个TaO层。然而,反应结构20可包括不同的层(例如,不同的层、较少的层和/或额外的层)和/或不同材料。The reaction structure 20 may include one or more layers. In one example, the reaction structure 20 includes multiple overlapping layers. The reaction structure 20 may include one or more layers configured to allow excitation light signals and/or emitted light signals from reaction sites in the reaction recess 16 (after treatment with the reaction solution) to pass through therethrough, into openings of one or more corresponding light guides 18, and potentially connected to one or more corresponding photosensors 12 (e.g., depending on the configuration of the light guides 18). As another example, the reaction structure 20 may include more than one layer that may include layers that prevent crosstalk or “sharing” propagation or transmission of emitted light from specific reaction sites in the reaction recess 16 to non-corresponding sensors 12. The reaction structure 20 may provide a solid that allows the immobilization of target chemicals, biomolecules, or other analytes thereon. For example, each reaction site on the reaction recess 16 may include a cluster of biomolecules immobilized on its exposed outer surface. Thus, the reaction structure 20 may include a material that allows the immobilization of reaction sites onto the reaction recess 16. The reaction structure 20 may be physically or chemically modified to facilitate the immobilization of biomolecules to form reaction sites and/or to facilitate the detection of their light emission. Examples of layers that can form the reactive structure 20 include at least one SiN layer and at least one TaO layer. However, the reactive structure 20 may include different layers (e.g., different layers, fewer layers, and/or additional layers) and/or different materials.

光导18可包括配置为过滤激发光或包含激发光的波长的波长范围的滤光材料,并允许来自至少一个相应的反应凹陷16的至少一个反应位点的光发射(或者包含该光发射的波长范围)穿过并朝向至少一个对应的光传感器12传播。光导18可以是吸收滤光器(例如,有机吸收滤光器),使得滤光器材料吸收特定波长(或者波长范围),并允许至少一个预定波长(或者波长范围)由其中通过。阵列的光导18中的每一个可以包括基本上相同的滤光器材料,或者不同光导18可包括不同的滤光器材料。因此每一个光导18可以相对于装置10的周围材料(例如,介电材料)来设置以形成光导结构。例如,光导18可具有至少约20的折射率。在某些配置中,光导18可被配置为使得激发光的光密度(OD)或吸光度为至少约4OD。The light guide 18 may include a filter material configured to filter excitation light or a wavelength range containing the wavelength of the excitation light, and allow light emission (or a wavelength range containing the light emission) from at least one reaction site of at least one corresponding reaction recess 16 to pass through and propagate toward at least one corresponding photosensor 12. The light guide 18 may be an absorption filter (e.g., an organic absorption filter) such that the filter material absorbs a specific wavelength (or wavelength range) and allows at least one predetermined wavelength (or wavelength range) to pass through it. Each of the light guides 18 in the array may include substantially the same filter material, or different light guides 18 may include different filter materials. Thus, each light guide 18 may be positioned relative to the surrounding material (e.g., a dielectric material) of the device 10 to form a light guide structure. For example, the light guide 18 may have a refractive index of at least about 20. In some configurations, the light guide 18 may be configured such that the optical density (OD) or absorbance of the excitation light is at least about 4OD.

如图1所示,光检测设备10可包括在光传感器12检测到光发射(例如,光子)时传输或传导信号的电路24。如上文中所讨论的,光发射可从或由于反应结构20的反应凹陷16相关的至少一个反应位点发射,并且由至少一个光导18引导或通入相关的光传感器12。电路24可包括互相连接的导电元件(例如,导体、走线、过孔、互连线等),这些互相连接的导电元件能够传导电流,如传输基于检测到的光子的数据信号。例如,电路24可类似于或包括微电路装置。光检测设备10可包括具有电耦联到电路24的光传感器12的阵列的至少一个集成电路。光检测设备10内的电路24可设为用于信号扩增、数字化、存储和处理中的至少一个。电路24可以收集(并且潜在地分析)传感器12所检测到的光发射并生成用于将检测数据与生物测定系统通信的数据信号。电路24还可在光检测设备10中执行额外的模拟和/或数据信号处理。As shown in Figure 1, the photodetector 10 may include circuitry 24 for transmitting or conducting signals when the photosensor 12 detects light emission (e.g., photons). As discussed above, light emission may originate from or be associated with at least one reaction site of the reaction recess 16 of the reaction structure 20, and be guided or directed by at least one light guide 18 into the associated photosensor 12. Circuitry 24 may include interconnected conductive elements (e.g., conductors, traces, vias, interconnects, etc.) capable of conducting current, such as transmitting data signals based on detected photons. For example, circuitry 24 may resemble or include a microcircuit device. The photodetector 10 may include at least one integrated circuit having an array of photosensors 12 electrically coupled to circuitry 24. Circuitry 24 within the photodetector 10 may be configured for at least one of signal amplification, digitization, storage, and processing. Circuitry 24 may collect (and potentially analyze) the light emission detected by the sensor 12 and generate data signals for communicating the detection data with a bioassay system. Circuitry 24 may also perform additional analog and/or data signal processing within the photodetector 10.

如图1所示,光检测设备10的设备电路24可以可延伸到基础部分14附近或仅部分通过基础部分14。因此,基础部分14可以为从其中延伸通过的设备电路24的导电过孔或其他部分的空腔。基础部分14的背侧26可以形成光检测设备10的暴露的背侧表面26,其可以是设备电路24的空腔。换言之,设备电路24可完全定位于光检测设备10内的基础部分14的背侧26上方,使得设备电路24在基础部分14和/或装置10自身的背侧26处不可接近。然而,如图1所示,设备电路24可以延伸至光检测设备10的顶侧。例如,设备电路24可以延伸通过光检测设备10到达并且潜在延伸通过反应结构20。因此,可由反应结构20的暴露上表面(如果存在的话)形成的光检测设备10的顶侧可包括设备电路24,如图1所示。换言之,设备电路24在光检测设备10的顶侧(其可以是反应结构20的顶侧(如果存在的话))处可以是暴露的和可接近的,如图1所示。As shown in FIG1, the device circuit 24 of the photodetector 10 may extend to the vicinity of or only partially through the base portion 14. Therefore, the base portion 14 may be a cavity for conductive vias or other portions of the device circuit 24 extending therethrough. The back side 26 of the base portion 14 may form an exposed back surface 26 of the photodetector 10, which may be a cavity of the device circuit 24. In other words, the device circuit 24 may be completely positioned above the back side 26 of the base portion 14 within the photodetector 10, such that the device circuit 24 is inaccessible at the back side 26 of the base portion 14 and/or the device 10 itself. However, as shown in FIG1, the device circuit 24 may extend to the top side of the photodetector 10. For example, the device circuit 24 may extend through the photodetector 10 to and potentially through the reactive structure 20. Therefore, the top side of the photodetector 10, which may be formed by the exposed upper surface of the reactive structure 20 (if present), may include the device circuit 24, as shown in FIG1. In other words, the device circuit 24 may be exposed and accessible on the top side of the photodetector 10 (which may be the top side of the reaction structure 20, if present), as shown in Figure 1.

可使用集成电路制造工艺来制造光检测设备,如用于制造电荷耦联设备电路(CCD)或互补-金属氧化物半导体(CMOS)装置或电路的工艺。因此光检测设备可以包括,例如,一种或多种半导体材料,并且可为例如CMOS光检测设备(例如,CMOS图像传感器)或CCD传感器(另一种类型的图像传感器)的形式。如图1所示,在本申请的实施例中,光检测设备10是CMOS型图像传感器,但也可使用其他类型的传感器。例如,如图1所示,光检测设备10可以是基于半导体的,并且包括包含装置基础部分14(其可以是例如硅层或晶片)的多个堆叠层。Photodetector devices can be manufactured using integrated circuit manufacturing processes, such as those used to manufacture charge-coupled device (CCD) circuits or complementary metal-oxide-semiconductor (CMOS) devices or circuits. Therefore, photodetector devices can include, for example, one or more semiconductor materials, and can take the form of, for example, a CMOS photodetector device (e.g., a CMOS image sensor) or a CCD sensor (another type of image sensor). As shown in FIG1, in an embodiment of this application, photodetector 10 is a CMOS-type image sensor, but other types of sensors can also be used. For example, as shown in FIG1, photodetector 10 can be semiconductor-based and includes multiple stacked layers comprising a device base portion 14 (which can be, for example, a silicon layer or a wafer).

当设为CMOS-型光检测设备10时,“互补”方面是指在是在使用CMOS技术构建的集成电路(ICs)中同时包含n型和p型金属氧化物半导体场效应晶体管(MOSFETs)。每一个MOSFET均具有带有栅极电解质(如氧化物)的金属栅极(因此在名称中有“金属氧化物”部分)和位于栅极之下的半导体材料(对应于名称中的“半导体”)。当如图1所示设置光检测设备10时,光传感器12可通过例如栅极电耦联到电路24。When configured as a CMOS-type photodetector 10, the "complementary" aspect refers to the simultaneous inclusion of n-type and p-type metal-oxide-semiconductor field-effect transistors (MOSFETs) in an integrated circuit (IC) constructed using CMOS technology. Each MOSFET has a metal gate with a gate electrolyte (such as oxide) (hence the "metal-oxide" part in its name) and a semiconductor material located beneath the gate (corresponding to the "semiconductor" in its name). When the photodetector 10 is configured as shown in FIG1, the photosensor 12 can be electrically coupled to the circuit 24 via, for example, its gate.

对于基于半导体的光检测设备10,至少一些电路24可设在装置或基板层内,光导18可各自通过该装置或基板层延伸。每一个基板层可包括形成至少一部分设备电路24的互相连接的导电元件,介电材料围绕或邻近电路的导电元件。因此电路24的导电元件可以嵌入在介电材料内。光导18还可延伸通过介电材料,并且可与电路隔开。可使用各种金属元件和/或介电材料,如适合集成电路制造(例如,CMOS制造)的那些。例如,导电元件/电路24可以是金属元件,如W(钨)元件,Cu(铜)元件,Al(铝)元件或其组合,但应理解也可使用其他材料和结构。介电材料可以是低-k材料和/或含硅材料,如SiO2,但应理解也可使用其他介电材料和结构。For a semiconductor-based photodetector 10, at least some circuits 24 may be disposed within a device or substrate layer, and light guides 18 may each extend through the device or substrate layer. Each substrate layer may include interconnected conductive elements forming at least a portion of the device circuits 24, with dielectric material surrounding or adjacent to the conductive elements of the circuits. Thus, the conductive elements of the circuits 24 may be embedded within the dielectric material. The light guides 18 may also extend through the dielectric material and may be spaced apart from the circuits. Various metallic elements and/or dielectric materials may be used, such as those suitable for integrated circuit fabrication (e.g., CMOS fabrication). For example, the conductive elements/circuits 24 may be metallic elements such as W (tungsten) elements, Cu (copper) elements, Al (aluminum) elements, or combinations thereof, but it should be understood that other materials and structures may also be used. The dielectric material may be a low-k material and/or a silicon-containing material, such as SiO2 , but it should be understood that other dielectric materials and structures may also be used.

光检测设备10可以是集成电路芯片。例如,光检测设备10可作为在电子级硅(EGS)或其他半导体(如GaAs)的单个基础部分(例如,晶片)上提供的一大批多个光检测设备10来制造。因此多个这样制造的装置可以是一体的,并且相邻形成/排列和彼此非常近地定位。将晶片切割(即,切)成许多块,每一个均包含至少一个不同光检测设备10。如图1所示,单个不同光检测设备10可由多个整体的如此形成的晶片装置形成(即,切下)。或者,多个集成的相邻光检测设备10可由多个集成的如此形成的晶片装置形成(即,切下)。The photodetector 10 can be an integrated circuit chip. For example, the photodetector 10 can be manufactured as a large number of photodetectors 10 provided on a single base part (e.g., a wafer) of electronic-grade silicon (EGS) or other semiconductors (such as GaAs). Thus, multiple such manufactured devices can be integral and formed/arranged adjacently and positioned very close to each other. The wafer is cut (i.e., sliced) into many pieces, each containing at least one different photodetector 10. As shown in FIG1, a single different photodetector 10 can be formed (i.e., sliced) from multiple integral wafer devices thus formed. Alternatively, multiple integrated adjacent photodetectors 10 can be formed (i.e., sliced) from multiple integrated wafer devices thus formed.

图1说明了可用于本发明流动池中的光检测设备110的另一个示例。图2的光检测设备110类似于图1光检测设备10,因此以“1”开头的相似附图表面用于表示相似的组件、方面、功能、方法或功能,以上针对其的描述同样适用,为简洁和清楚起见不再重复。如图2所示,光检测设备110与光检测设备10的区别在于光检测设备110不包含定位在其上表面122上方的反应结构(形成反应凹陷和在其中并围绕其延伸的间隙区域)。相反,所制造或切割光检测设备110可以不含反应结构。反应结构可定位在切割光检测设备110的上表面122上,例如在如下文中进一步解释的对光检测设备110进行处理之后。Figure 1 illustrates another example of a photodetector 110 that can be used in the flow cell of the present invention. The photodetector 110 of Figure 2 is similar to the photodetector 10 of Figure 1; therefore, similar figures beginning with "1" are used to denote similar components, aspects, functions, methods, or features, to which the above description also applies, and will not be repeated for the sake of brevity and clarity. As shown in Figure 2, the difference between the photodetector 110 and the photodetector 10 is that the photodetector 110 does not include a reaction structure (forming a reaction recess and a gap region extending therein and around it) positioned above its upper surface 122. Instead, the manufactured or cut photodetector 110 may not contain a reaction structure. A reaction structure may be positioned on the upper surface 122 of the cut photodetector 110, for example, after processing the photodetector 110 as further explained below.

光检测设备110与光检测设备10的区别还在于电路124包含完全延伸通过基础晶片部分114的过孔128,如图2所示。因此,在基础晶片部分114和装置110自身的背侧126处暴露和可接近该过孔128。同样如图2所示,基础晶片部分114(以及装置110自身)的背侧126包含从基础晶片部分114的背侧126延伸的一个或多个间隔片部分130。至少一个间隔片部分130可与基础晶片部分114的背侧126上的过孔128隔开、定位于其附近或仅部分与其重叠。这样,可将至少一个间隔片部分130定位于基础晶片部分114的背侧126上,使得在基础晶片部分114和装置110自身的的背侧126暴露和可利用每一个过孔128的至少一部分。如图2所示,光检测设备110可包括沿基础晶片部分114的背侧126的相对侧面延伸的至少两个间隔片部分130。至少一个间隔片部分130可为基础晶片部分114提供结构支撑或刚性,因此装置10自身(其可能已受累于过孔128或被其削弱)。在一些光检测设备110中,至少一个间隔片部分130可以是电绝缘或不导电的(或者是半导体),以便不干扰传感器112和/或电路124的操作,例如。形成至少一个间隔片部分130的示例性材料包括但不限于玻璃、石英玻璃、水晶、硅、玻璃纤维、塑料、环氧树脂、陶瓷、介电复合材料、纸或其组合。The difference between the photodetector 110 and the photodetector 10 lies in that the circuit 124 includes a via 128 that extends completely through the base wafer portion 114, as shown in FIG2. Therefore, the via 128 is exposed and accessible on the back side 126 of both the base wafer portion 114 and the device 110 itself. Also as shown in FIG2, the back side 126 of the base wafer portion 114 (and the device 110 itself) includes one or more spacer portions 130 extending from the back side 126 of the base wafer portion 114. At least one spacer portion 130 may be spaced apart from, located near, or only partially overlapped with the via 128 on the back side 126 of the base wafer portion 114. Thus, at least one spacer portion 130 can be positioned on the back side 126 of the base wafer portion 114 such that at least a portion of each via 128 is exposed and usable on the back side 126 of both the base wafer portion 114 and the device 110 itself. As shown in FIG2, the photodetector 110 may include at least two spacer portions 130 extending along opposite sides of the back side 126 of the base wafer portion 114. At least one spacer portion 130 may provide structural support or rigidity to the base wafer portion 114, thus protecting the device 10 itself (which may be affected by or weakened by the via 128). In some photodetectors 110, at least one spacer portion 130 may be electrically insulating or non-conductive (or semiconductor) to avoid interfering with the operation of the sensor 112 and/or circuitry 124, for example. Exemplary materials forming at least one spacer portion 130 include, but are not limited to, glass, quartz glass, crystal, silicon, fiberglass, plastics, epoxy resins, ceramics, dielectric composites, paper, or combinations thereof.

如图3-5所示,可利用包含支撑框架34和支撑基板44的支撑结构32以形成本发明的流动池。支撑框架34可以限定上表面36、下表面38和在上下表面36/38之间延伸通过框架34的至少一个空腔40(例如,空隙或孔)。支撑结构32可包括任何数目的空腔44。如图3和4所示,支撑框架34可包括多个不同的隔开空腔40的阵列。空腔40的阵列可彼此隔开,使得一部分支撑框架34整个围绕每一个空腔40延伸,因此位于相邻空腔40之间。空腔40的阵列可以重复的(可能是均匀的)模式限定,使得空腔40均匀或一致地隔开。或者,空腔40的阵列可以是随机分布的,使得至少一些空腔40不均匀地隔开。如图5所示,每一个空腔40可由在上下表面36,38之间延伸的支撑框架34的内侧壁50形成。在一些配置中,限定空腔40的支撑框架34的内侧壁50可在上下表面36,38之间垂直延伸,使得空腔40的尺寸可以在上表面36和下表面38处限定出相同的尺寸和形状。As shown in Figures 3-5, a support structure 32 comprising a support frame 34 and a support substrate 44 can be used to form the flow pool of the present invention. The support frame 34 may define an upper surface 36, a lower surface 38, and at least one cavity 40 (e.g., a gap or hole) extending through the frame 34 between the upper and lower surfaces 36/38. The support structure 32 may include any number of cavities 44. As shown in Figures 3 and 4, the support frame 34 may include a plurality of different arrays of spaced cavities 40. The arrays of cavities 40 may be spaced apart from each other such that a portion of the support frame 34 extends entirely around each cavity 40, thus situated between adjacent cavities 40. The arrays of cavities 40 may be defined by a repeating (possibly uniform) pattern such that the cavities 40 are uniformly or consistently spaced. Alternatively, the arrays of cavities 40 may be randomly distributed such that at least some cavities 40 are non-uniformly spaced. As shown in Figure 5, each cavity 40 may be formed by an inner sidewall 50 of the support frame 34 extending between the upper and lower surfaces 36, 38. In some configurations, the inner wall 50 of the support frame 34 defining the cavity 40 may extend vertically between the upper and lower surfaces 36, 38, such that the cavity 40 may be defined with the same size and shape at the upper surface 36 and the lower surface 38.

每一个空腔40的尺寸和形状可配置为包括一个或多个光检测设备,如图4和5中所示的上述图2的光检测设备110。然而,如下文中进一步解释的,可在支撑框架34的空腔40内使用不同结构的一个或多个光检测设备,例如,但不限于,上文所述的图1的光检测设备10。此外,第一结构的至少一个光检测设备可用于支撑框架34的一个或多个第一空腔40,第二结构的至少一个光检测设备可用于支撑框架34的一个或多个第二空腔40。Each cavity 40 may be sized and shaped to include one or more photodetectors, such as the photodetector 110 of FIG2 described above, as shown in FIG4 and 5. However, as further explained below, one or more photodetectors of different structures may be used within the cavities 40 of the support frame 34, for example, but not limited to, the photodetector 10 of FIG1 described above. Furthermore, at least one photodetector of a first structure may be used in one or more first cavities 40 of the support frame 34, and at least one photodetector of a second structure may be used in one or more second cavities 40 of the support frame 34.

支撑框架34可以是基本上平面的。例如,支撑框架34上表面36和/或下表面38可以是平面的和平行的。在一些结构中,上表面36和/或下表面38可以是基本上光滑的,如包含亚微米尺度的表面粗糙度。在一些结构中,上表面36和/或下表面38可包括小于或等于50nm或者小于或等于10nm的表面粗糙度。在一些示例中,上表面36和/或下表面38可包括1-2nm范围内的表面粗糙度。如下文中进一步解释的,支撑框架34的上表面36可与光检测设备的反应结构的检测器表面(例如,装置的有效表面)合作以形成用于递送试剂溶液的流动池流路,或者反应结构、一个或多个其他层和/或盖子可定位于支撑框架34的上表面36和光检测设备的上部部分122上方。因此,支撑框架34的上表面36(以及反应结构的上表面)的平坦度/光滑度可以配置为使试剂流体流能够流动而不会夹带或截留流体。The support frame 34 may be substantially planar. For example, the upper surface 36 and/or lower surface 38 of the support frame 34 may be planar and parallel. In some configurations, the upper surface 36 and/or lower surface 38 may be substantially smooth, such as having a surface roughness on the submicron scale. In some configurations, the upper surface 36 and/or lower surface 38 may include a surface roughness of less than or equal to 50 nm or less than or equal to 10 nm. In some examples, the upper surface 36 and/or lower surface 38 may include a surface roughness in the range of 1-2 nm. As further explained below, the upper surface 36 of the support frame 34 may cooperate with the detector surface (e.g., the effective surface of the device) of the reaction structure of the photodetector to form a flow cell path for delivering a reagent solution, or the reaction structure, one or more other layers and/or cap may be positioned above the upper surface 36 of the support frame 34 and the upper portion 122 of the photodetector. Therefore, the flatness/smoothness of the upper surface 36 of the support frame 34 (and the upper surface of the reaction structure) may be configured to allow the reagent fluid flow to proceed without entraining or trapping fluid.

支撑框架34以及潜在的基板44可以是相对刚性的,以便牢固地将光检测设备110保持和耦联在空腔40内并防止光检测设备110在本发明的流动池制造、加工和/或使用过程中发生破坏性的扭曲/变形。在一些结构中,支撑框架34(以及可能的基板44)的杨氏模量为至少50GPa或至少70GPA。在一些结构中,支撑框架34(以及可能的基板44)的热膨胀系数(CTE)可为至少约20/℃或至少约30/℃。例如,支撑框架34可包含杨氏模量在70-80Gpa范围内且CTE在30-35/℃范围内的硼铝硅酸盐玻璃(例如,Eagle 玻璃)或由杨氏模量在160-170Gpa且CTE在35-40/℃范围内的硅组成。The support frame 34 and the potential substrate 44 can be relatively rigid to securely hold and couple the photodetector 110 within the cavity 40 and prevent destructive twisting/deformation of the photodetector 110 during the manufacture, processing, and/or use of the flow cell of the present invention. In some configurations, the support frame 34 (and the possible substrate 44) has a Young's modulus of at least 50 GPa or at least 70 GPa. In some configurations, the coefficient of thermal expansion (CTE) of the support frame 34 (and the possible substrate 44) can be at least about 20/°C or at least about 30/°C. For example, the support frame 34 can comprise borosilicate glass (e.g., Eagle glass) with a Young's modulus in the range of 70-80 GPa and a CTE in the range of 30-35/°C, or it can be composed of silicon with a Young's modulus in the range of 160-170 GPa and a CTE in the range of 35-40/°C.

在定位于光检测设备110的上部部分122上方的反应结构上的反应位点的形成过程中,可使支撑框架34与试剂溶液和/或其他材料/溶液接触。支撑框架34可包括与测序试剂(如用于DNA接枝、聚集、切割、合成和/或读取的测序试剂)不反应的一种或多种材料。例如,测序溶液可以是水性溶液和/或可由油组成。During the formation of reaction sites on the reaction structure positioned above the upper portion 122 of the photodetector 110, the support frame 34 may be brought into contact with reagent solutions and/or other materials/solutions. The support frame 34 may comprise one or more materials that do not react with sequencing reagents (such as sequencing reagents used for DNA grafting, aggregation, cutting, synthesis, and/or reading). For example, the sequencing solution may be an aqueous solution and/or may consist of oil.

在由其形成一个或多个流动池的过程中,支撑框架34可经历化学机械抛光(CMP)过程,如下文中进一步解释的。支撑框架34可包括与在由其形成一个或多个流动池的过程中与支撑框架34接触的CMP浆料和混合物不反应一种或多种材料。例如,CMP浆料或混合物可包括磨料颗粒和基础液体。在一些示例中,基础液体可包括水(例如,去离子水)和/或油。在一些示例中,磨料颗粒可包括氧化物,例如,如二氧化硅、二氧化铈和/或氧化铝。During the formation of one or more flow pools, the support frame 34 may undergo a chemical mechanical polishing (CMP) process, as further explained below. The support frame 34 may include one or more materials that do not react with the CMP slurry and mixture that comes into contact with it during the formation of the one or more flow pools. For example, the CMP slurry or mixture may include abrasive particles and a base liquid. In some examples, the base liquid may include water (e.g., deionized water) and/or oil. In some examples, the abrasive particles may include oxides, such as silica, cerium dioxide, and/or alumina.

支撑框架34可以使定位在每一个空腔40内的至少一个光检测设备110电绝缘,以便不干扰其光敏操作。支撑围绕/形成空腔40(在上下表面36,38之间延伸)的支撑框架34的部分的厚度/横截面的至少一部分可包括电绝缘(即,不导电)的材料(或者半导体材料)。例如,围绕/形成从上表面36延伸的空腔40的支撑框架34的部分的厚度/横截面的至少一部分,或隔开上下表面36,38的中间部分可包括电绝缘(即,不导电)的材料(或者半导体材料)。在一些结构中,支撑框架34可仅包括电绝缘材料。可形成支撑框架的至少一部分的示例性电绝缘材料包括硅、玻璃(例如,水晶、石英玻璃、玻璃纤维、硼硅酸盐玻璃(例如,碱土金属硼铝硅酸盐玻璃,如Eagle玻璃)、浮法硼硅酸盐玻璃(例如,33玻璃)或其他低自发荧光玻璃)、陶瓷、聚合物(例如,塑料、环氧树脂、硅电荷环氧树脂(silicon charged epoxy)或UV固化环氧树脂或粘合剂)、介电复合材料、纸或其组合。The support frame 34 can electrically insulate at least one photodetector 110 positioned within each cavity 40 so as not to interfere with its photosensitive operation. At least a portion of the thickness/cross-section of the portion supporting the support frame 34 surrounding/forming the cavity 40 (extending between the upper and lower surfaces 36, 38) may include an electrically insulating (i.e., non-conductive) material (or a semiconductor material). For example, at least a portion of the thickness/cross-section of the portion surrounding/forming the cavity 40 extending from the upper surface 36, or the intermediate portion separating the upper and lower surfaces 36, 38, may include an electrically insulating (i.e., non-conductive) material (or a semiconductor material). In some configurations, the support frame 34 may consist only of electrically insulating material. Exemplary electrical insulating materials that can form at least a portion of the support frame include silicon, glass (e.g., crystal, quartz glass, glass fiber, borosilicate glass (e.g., alkaline earth metal borosilicate glass, such as Eagle glass), float borosilicate glass (e.g., 33 glass) or other low self-fluorescence glass), ceramics, polymers (e.g., plastics, epoxy resins, silicon charged epoxy resins or UV-cured epoxy resins or adhesives), dielectric composites, paper, or combinations thereof.

然而,如下文中进一步解释的,支撑框架34的一部分可包括导电材料,如金属材料。例如,如下文中进一步解释的,支撑框架34可包括导电过孔,其延伸通过支撑框架34部分的厚度/横截面,该部分邻近于(例如,相邻于)在上下表面36,38之间延伸(并且在上下表面36,38处暴露)的空腔40。在一些结构中,支撑框架34的围绕/形成从上表面36和/或下表面34延伸的空腔40的厚度/横截面的一部分可包括导电材料(其可包括过孔的一部分)。However, as further explained below, a portion of the support frame 34 may include a conductive material, such as a metallic material. For example, as further explained below, the support frame 34 may include a conductive via extending through a portion of the thickness/cross-section of the support frame 34 adjacent to (e.g., adjacent to) a cavity 40 extending between (and exposed at) the upper and lower surfaces 36, 38. In some configurations, a portion of the thickness/cross-section of the support frame 34 surrounding/forming the cavity 40 extending from the upper surface 36 and/or the lower surface 34 may include a conductive material (which may include a portion of the via).

支撑框架34可包括多个视觉指示/标记45,如图4所示。视觉指示45可用于参考支撑框架34整体和/或其一部分或与其耦联的组件(如例如空腔40和定位于空腔40内的一个或多个光检测设备110,如下文中进一步解释)的位置和/或方向。这样,在将支撑框架34(以及与其耦联的组件,如下文中进一步解释)处理成一个或多个中间流动池装置和/或流动池装置(如下文中进一步解释)的过程中,视觉指示45可用作对准标记。例如,在形成一个或多个中间流动池装置和/或流动池装置的加盖和/或切下操作过程中,视觉指示45可用于对齐。The support frame 34 may include a plurality of visual indicators/markers 45, as shown in FIG4. The visual indicators 45 may be used to reference the position and/or orientation of the support frame 34 as a whole and/or a portion thereof, or components coupled thereto (such as, for example, cavity 40 and one or more photodetectors 110 positioned within cavity 40, as further explained below). Thus, the visual indicators 45 may serve as alignment marks during the processing of the support frame 34 (and its coupled components, as further explained below) into one or more intermediate flow cell devices and/or flow cell devices (as further explained below). For example, the visual indicators 45 may be used for alignment during capping and/or cutting operations to form one or more intermediate flow cell devices and/or flow cell devices.

视觉指示45可包括例如相对于人眼和/或成像装置(例如,数码相机)而言在视觉上不同于支撑框架34的任何材料。在一些示例中,视觉指示45可包括颜料、油漆、染料、发光材料、金属、氧化物或其组合。视觉指示45可包括与测序试剂和/或CMP浆料不反应的一种或多种材料。Visual indicator 45 may include any material that is visually different from the support frame 34 relative to the human eye and/or imaging device (e.g., a digital camera). In some examples, visual indicator 45 may include pigments, paints, dyes, luminescent materials, metals, oxides, or combinations thereof. Visual indicator 45 may include one or more materials that do not react with sequencing reagents and/or CMP slurry.

视觉指示45可设在支撑框架34下表面38(如图4所示)上、支撑框架34的上表面36上、至少部分嵌入在支撑框架34的上下表面36,38之间的支撑框架34的厚度内或其组合。可经由任何方法在支撑框架34形成视觉指示45。在一些示例中,可经由印刷法如喷涂法或平板印刷法在支撑框架34上形成视觉指示45。The visual indicator 45 may be disposed on the lower surface 38 of the support frame 34 (as shown in FIG. 4), on the upper surface 36 of the support frame 34, at least partially embedded within the thickness of the support frame 34 between the upper and lower surfaces 36, 38, or a combination thereof. The visual indicator 45 may be formed on the support frame 34 by any method. In some examples, the visual indicator 45 may be formed on the support frame 34 by printing methods such as spraying or lithography.

如图4和5所示,支撑结构32可包括耦联到基板或载体44的上表面46的支撑框架34的上表面36。支撑框架34和基板44可以是可移除地耦联或固定耦联的。在一些支撑结构32中,基板44可有与支撑框架34的材料相同或相似的材料组成。在一些其他支撑结构32,基板44可由与支撑框架34的材料不同的材料组成。基板44的上表面46可以是基本上光滑和平面的,使得支撑框架34的上表面36与基板44的上表面46平行,并且可能是基本共面的,如图5中所示。在一些结构中,基板44的上表面46可以限定与支撑框架34的上表面36相同或相似的表面光滑度。As shown in Figures 4 and 5, the support structure 32 may include the upper surface 36 of a support frame 34 coupled to the upper surface 46 of the substrate or carrier 44. The support frame 34 and the substrate 44 may be removably coupled or fixedly coupled. In some support structures 32, the substrate 44 may be composed of the same or similar material as the support frame 34. In some other support structures 32, the substrate 44 may be composed of a different material than the support frame 34. The upper surface 46 of the substrate 44 may be substantially smooth and planar, such that the upper surface 36 of the support frame 34 is parallel to and may be substantially coplanar with the upper surface 46 of the substrate 44, as shown in Figure 5. In some structures, the upper surface 46 of the substrate 44 may define a surface smoothness that is the same as or similar to that of the upper surface 36 of the support frame 34.

同样如图4和5所示,对于耦联到基板44的上表面46的支撑框架34的上表面3,至少一个切割光检测设备110可以“面朝下地”定位在空腔40内,使得至少一个光检测设备110的上表面122定位在或相邻于基板44的上表面46。这样,至少一个光检测设备的上表面122可以是与支撑框架34的上表面36基本上对齐的(例如,共面的)。类似地,如果至少一个切割光检测设备110包含在上表面122上方提供的反应结构(例如,与图1的光检测设备10一样),检测器的上表面/反应结构的有效表面可定位在或相邻于基板44的上表面46,间隙部分可以是与支撑框架34的上表面36基本上对齐的(例如,共面的)。As also shown in Figures 4 and 5, for the upper surface 3 of the support frame 34 coupled to the upper surface 46 of the substrate 44, at least one dicing light detection device 110 can be positioned "face down" within the cavity 40, such that the upper surface 122 of at least one light detection device 110 is positioned on or adjacent to the upper surface 46 of the substrate 44. Thus, the upper surface 122 of at least one light detection device can be substantially aligned with (e.g., coplanar) the upper surface 36 of the support frame 34. Similarly, if at least one dicing light detection device 110 includes a reaction structure provided above the upper surface 122 (e.g., as with the light detection device 10 of Figure 1), the effective surface of the detector's upper surface/reaction structure can be positioned on or adjacent to the upper surface 46 of the substrate 44, and the gap portion can be substantially aligned with (e.g., coplanar) the upper surface 36 of the support frame 34.

如图5中所示,支撑框架34可以比至少一个光检测设备110薄,使得其背侧126延伸穿过支撑框架34的下表面38。在一些其他支撑框架34结构中,支撑框架34的下表面38可以是与至少一个光检测设备110的背侧126持平或在其下方。至少一个光检测设备110可以限定与空腔40相比较小的相应尺寸。因此,切割至少一个光检测设备110可定位于支撑结构32的空腔40内,使得至少一个光检测设备110的外周与支撑框架34的内侧壁50隔开,如图5中所示。例如,空腔40的一部分可围绕至少一个光检测设备110的外围延伸以形成在支撑框架34的空腔40的内侧壁50和至少一个光检测设备110的外围之间延伸的沟槽或边缘空腔部分52支撑。As shown in FIG. 5, the support frame 34 may be thinner than at least one photodetector 110, such that its back side 126 extends through the lower surface 38 of the support frame 34. In some other support frame 34 configurations, the lower surface 38 of the support frame 34 may be flush with or below the back side 126 of at least one photodetector 110. At least one photodetector 110 may define a correspondingly smaller size compared to the cavity 40. Thus, cutting at least one photodetector 110 may position it within the cavity 40 of the support structure 32 such that the outer periphery of at least one photodetector 110 is spaced apart from the inner sidewall 50 of the support frame 34, as shown in FIG. 5. For example, a portion of the cavity 40 may extend around the periphery of at least one photodetector 110 to form a groove or edge cavity portion 52 supporting the cavity 40 of the support frame 34 and the periphery of at least one photodetector 110.

至少一个光检测设备110可以自由地直接位于空腔40中的基板44的上表面46。在一些这样的设置中,至少一个光检测设备110可通过工具或支撑构件机械地保持在空腔40中。At least one photodetector 110 may be freely located directly on the upper surface 46 of the substrate 44 within the cavity 40. In some such arrangements, at least one photodetector 110 may be mechanically held within the cavity 40 by means of tools or support members.

在图6中示出了根据本发明的另一个示例的支撑结构232。图6的支撑结构232类似于图3-5支撑结构32,因此以“2”开头的类似的附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。如图6中所示,支撑结构232与包含中介层构件或层248的支撑结构32的区别在于其将至少一个光检测设备210的上部部分122化学地耦联/结合空腔244内的基板244的上表面246。中介层248可以是任何临时或可移除的结合材料(例如,经由一个或多个化学、机械和/或辐照过程)。在一个示例中,中介层248可包括聚合物材料(例如,一种或多种环烯烃共聚物),其可以在溶剂浇铸的结合材料组合物中提供。例如,中介层248可包括Brewer Science,Inc.所售的临时结合材料,如220或305。在另一个示例中,中介层248可包括高UV吸收度脱模层和/或粘合剂层,如JSR Corporation出售的JSRELPAC TA系列临时结合材料。可通过旋涂、喷涂、染料狭缝涂布或层压到基板244的上表面246上形成中介层248。Figure 6 illustrates a support structure 232 according to another example of the invention. The support structure 232 of Figure 6 is similar to the support structure 32 of Figures 3-5; therefore, similar reference numerals beginning with “2” are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating to it above also apply, and will not be repeated for the sake of brevity and clarity. As shown in Figure 6, the support structure 232 differs from the support structure 32 which includes an interposer member or layer 248 in that it chemically couples/bonds the upper portion 122 of at least one photodetector 210 to the upper surface 246 of the substrate 244 within the cavity 244. The interposer 248 can be any temporary or removable bonding material (e.g., via one or more chemical, mechanical, and/or irradiation processes). In one example, the interposer 248 may comprise a polymeric material (e.g., one or more cyclic olefin copolymers) which may be provided in a solvent-cast bonding material composition. For example, the interposer 248 may comprise temporary bonding materials such as 220 or 305 sold by Brewer Science, Inc. In another example, the interposer 248 may include a high UV absorption release layer and/or an adhesive layer, such as the JSRELPAC TA series temporary bonding materials sold by JSR Corporation. The interposer 248 may be formed by spin coating, spraying, dye slot coating, or lamination onto the upper surface 246 of the substrate 244.

中介层248可包括在空腔240内的基板244的上表面246上方延伸的一个或多个材料层。因此,至少一个光检测设备110的上部部分122可以位于空腔244内的中介层248的上表面247上。中介层248还可在基板244的上表面246和支撑框架234的上表面236之间延伸,如图6中所示。因此支撑框架的顶侧236可以在中介层248的上表面247上方延伸,中介层248可以在基板244的顶侧246上方延伸。Intermediate layer 248 may include one or more material layers extending over the upper surface 246 of substrate 244 within cavity 240. Therefore, the upper portion 122 of at least one photodetector 110 may be located on the upper surface 247 of intermediate layer 248 within cavity 244. Intermediate layer 248 may also extend between the upper surface 246 of substrate 244 and the upper surface 236 of support frame 234, as shown in FIG6. Therefore, the top side 236 of support frame may extend over the upper surface 247 of intermediate layer 248, and intermediate layer 248 may extend over the top side 246 of substrate 244.

在图7中示出了根据本发明的另一个示例的支撑结构。图7的支撑结构332类似于图3-5的支撑结构32和图6的支撑结构232,因此以“3”开头的类似附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。如图7所示,支撑结构332与支撑结构32和支撑结构232的不同之处在于包含将基板344的上表面346与至少一个光检测设备110的上部部分122隔开的间隔片构件/层349。间隔层349可以仅在基板344的上表面346和支撑框架334的上表面336之间延伸,因此不会延伸穿过空腔340。由此方式,间隔层349将支撑框架334的上表面336从基板344的上表面346上抬起,其中至少一个光检测设备110的上部部分122覆盖在该基板344的表面346上。这样,间隔层349以从背侧126延伸到至少一个光检测设备110的上部部分122的方向上将至少一个光检测设备110的上部部分122与支撑框架224的上表面336隔开(即,在其上方)。间隔层349可包括与中介层248相同或相似的材料。可以通过旋涂、喷涂、染料狭缝涂布或层压形成间隔层349。尽管图7的支撑结构332示出为不包含中介层(例如,图6的支撑结构232的中介层248),但支撑结构332可包括在基板344的上表面346上方在基板344与支撑框架334之间并且跨越空腔340延伸的中介层。Figure 7 illustrates a support structure according to another example of the invention. The support structure 332 of Figure 7 is similar to the support structure 32 of Figures 3-5 and the support structure 232 of Figure 6; therefore, similar reference numerals beginning with "3" are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity. As shown in Figure 7, the support structure 332 differs from support structures 32 and 232 in that it includes a spacer member/layer 349 that separates the upper surface 346 of the substrate 344 from the upper portion 122 of at least one photodetector 110. The spacer layer 349 may extend only between the upper surface 346 of the substrate 344 and the upper surface 336 of the support frame 334, and therefore will not extend through the cavity 340. In this manner, the spacer layer 349 lifts the upper surface 336 of the support frame 334 from the upper surface 346 of the substrate 344, wherein the upper portion 122 of at least one photodetector 110 covers the surface 346 of the substrate 344. Thus, the spacer layer 349 spaces the upper portion 122 of at least one photodetector 110 from the upper surface 336 of the support frame 224 (i.e., above it) in a direction extending from the back side 126 to the upper portion 122 of at least one photodetector 110. The spacer layer 349 may comprise the same or similar material as the interposer layer 248. The spacer layer 349 may be formed by spin coating, spraying, dye slot coating, or lamination. Although the support structure 332 of FIG. 7 is shown without an interposer layer (e.g., the interposer layer 248 of the support structure 232 of FIG. 6), the support structure 332 may comprise an interposer layer extending above the upper surface 346 of the substrate 344 between the substrate 344 and the support frame 334 and across the cavity 340.

图8中示出了根据本发明的另一个示例的支撑结构432。图8的支撑结构432类似于图3-5的支撑结构32、图6的支撑结构232和图7的支撑结构332,因此以“4”开头的类似附图标记表示类似的组件、方面、功能、过程或功能,上面中涉及其的描述同样适用,为简洁和清楚起见不再重复。如图8所示,支撑结构432与支撑结构32、支撑结构232和支撑结构332的区别在于空腔440的侧壁450的结构。Figure 8 shows a support structure 432 according to another example of the invention. The support structure 432 of Figure 8 is similar to the support structure 32 of Figures 3-5, the support structure 232 of Figure 6, and the support structure 332 of Figure 7; therefore, similar reference numerals beginning with "4" denote similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity. As shown in Figure 8, the difference between support structure 432 and support structures 32, 232, and 332 lies in the structure of the sidewall 450 of the cavity 440.

如图8所示,每一个空腔440可由在上下表面436,438之间延伸的支撑框架434的内侧壁450形成。当限定空腔440的支撑框架434的内侧壁450从下表面438延伸到上表面436时,其可以向内延伸至空腔440的内部,使得与下表面438相比,上表面236处的空腔44的尺寸较小或较窄(即,下表面438处的每一个空腔440的开口大于其在上表面436处的开口。应注意,在上表面436处,侧壁450可以延伸至非常接近至少一个光检测设备110的外周,但仍与其隔开。相应地,当内侧壁450与至少一个光检测设备110的外周之间延伸的空腔440的边缘空腔部分452从下表面438延伸至上表面436时,其可以变窄。As shown in Figure 8, each cavity 440 may be formed by an inner wall 450 of a support frame 434 extending between upper and lower surfaces 436, 438. When the inner wall 450 of the support frame 434 defining the cavity 440 extends from the lower surface 438 to the upper surface 436, it may extend inward into the interior of the cavity 440 such that the size of the cavity 44 at the upper surface 436 is smaller or narrower than that at the lower surface 438 (i.e., the opening of each cavity 440 at the lower surface 438 is larger than its opening at the upper surface 436). It should be noted that at the upper surface 436, the sidewall 450 may extend very close to, but still spaced from, the outer periphery of at least one photodetector 110. Accordingly, the edge cavity portion 452 of the cavity 440 extending between the inner wall 450 and the outer periphery of at least one photodetector 110 may narrow as it extends from the lower surface 438 to the upper surface 436.

内侧壁450的形状或结构可由任何结构的支撑框架434和/或制造或加工技术形成。例如,支撑框架434可包括具有不同尺寸开口的多个支撑框架层,因此当堆叠耦联在一起时,开口形成空腔40。作为另一个示例,可通过蚀刻或以其他方式使支撑框架434成型或形成来形成内侧壁450的形状或结构。The shape or structure of the inner sidewall 450 may be formed by any structure of the support frame 434 and/or by manufacturing or processing techniques. For example, the support frame 434 may comprise multiple support frame layers with openings of different sizes, so that when stacked and coupled together, the openings form a cavity 40. As another example, the shape or structure of the inner sidewall 450 may be formed by etching or otherwise shaping or forming the support frame 434.

在一个示例中,内侧壁450可以向内朝向空腔440的内部以一定角度直线地从上表面436延伸至下表面434(即,平面的),如图8所示。在其他示例中,内侧壁450可以不是直线延伸的(即,平面的)。例如,内侧壁450可以直线地、曲线地或其组合地从下表面438延伸到上表面436,使得空腔440的的尺寸在上表面436处与下表面438相比较小或较窄。在一个这样的示例中,支撑框架434的内侧壁450的限定空腔440的部分可以沿支撑框架534的厚度的一部分垂直地从下表面438延伸到上表面436,另一部分可以从上由其以一定角度(即带角度的平面)直线地向内朝向空腔540内部地延伸至上表面436。In one example, the inner wall 450 may extend linearly (i.e., planar) inward toward the interior of the cavity 440 from the upper surface 436 to the lower surface 434, as shown in Figure 8. In other examples, the inner wall 450 may not extend linearly (i.e., planar). For example, the inner wall 450 may extend linearly, curvilinearly, or a combination thereof from the lower surface 438 to the upper surface 436, such that the size of the cavity 440 is smaller or narrower at the upper surface 436 compared to the lower surface 438. In one such example, a portion of the inner wall 450 of the support frame 534 defining the cavity 440 may extend perpendicularly from the lower surface 438 to the upper surface 436 along a portion of the thickness of the support frame 534, and another portion may extend linearly (i.e., an angled plane) from it inward toward the interior of the cavity 540 to the upper surface 436.

图9-11B说明了将单个不同的光检测设备110经由支撑/填充材料60耦联至图3-5的支撑结构32的支撑框架34的每一个空腔40。如图9所示,可从与支撑框架34的下表面38相邻的暴露侧面将支撑材料60引入到支撑框架34的侧壁50与光检测设备110的外周之间的边缘空腔部分52中。支撑材料60可以将支撑框架34和光检测设备110牢固地耦联在一起。具体地,如图11A和11B所示,支撑材料60可以围绕定位在空腔40内的光检测设备110的侧面的外周延伸。因此支撑材料60可以在定位于空腔40内的光检测设备的侧面的外周和空腔40的侧壁50之间延伸并将它们耦联在一起。在一些示例中,在将支撑材料60设置在每一个空腔40内之后,支撑框架34的下表面38、支撑材料60和/或每一个空腔40内的光检测设备110可经历一个或多个CMP操作。例如,支撑材料60和/或至少一个空腔40内的光检测设备110可以延伸至至少高于支撑框架34的下表面38的邻近部分(即在其上方),一个或多个CMP操作可以去除支撑材料60和/或光检测设备110的一部分以使支撑框架34的下表面38、支撑材料60和光检测设备110平整。Figures 9-11B illustrate how individual photodetectors 110 are coupled via support/fill material 60 to each cavity 40 of the support frame 34 of the support structure 32 of Figures 3-5. As shown in Figure 9, the support material 60 can be introduced from an exposed side adjacent to the lower surface 38 of the support frame 34 into the edge cavity portion 52 between the sidewall 50 of the support frame 34 and the outer periphery of the photodetector 110. The support material 60 can securely couple the support frame 34 and the photodetector 110 together. Specifically, as shown in Figures 11A and 11B, the support material 60 can extend around the outer periphery of the side of the photodetector 110 positioned within the cavity 40. Thus, the support material 60 can extend between the outer periphery of the side of the photodetector positioned within the cavity 40 and the sidewall 50 of the cavity 40 and couple them together. In some examples, after the support material 60 is disposed within each cavity 40, the lower surface 38 of the support frame 34, the support material 60, and/or the photodetector 110 within each cavity 40 may undergo one or more CMP operations. For example, the support material 60 and/or the photodetector 110 within at least one cavity 40 may extend at least above (i.e., above) the adjacent portion of the lower surface 38 of the support frame 34, and one or more CMP operations may remove a portion of the support material 60 and/or the photodetector 110 to flatten the lower surface 38 of the support frame 34, the support material 60, and the photodetector 110.

支撑材料60可以是能够流入或以其他方式引入边缘空腔部分52的任何处理(如以第一状态,例如液态或粉末态),并且将支撑框架34和空腔40内的光检测设备110牢固地耦联在一起(如以第二状态,例如,硬化或固化态)。支撑材料60可以是电绝缘或不导电的(或者半导体)以便不干扰光检测设备110的操作(例如,传感器112和/或电路124的操作)。在本发明的流动池的反应结构的形成、反应结构上的反应位点的形成、发光/检测和/或制备或清洁的过程中,可使支撑材料60与试剂溶液和/或其他材料/溶液接触。因此,支撑材料60可包括与测序试剂(如用于DNA接枝、聚集、切割、合成和/或读取的测序试剂)不反应的一种或多种材料。例如,测序试剂可包括水和/或油。支撑材料60的示例性材料包括硅、玻璃(例如,水晶、石英玻璃、玻璃纤维、硼硅酸盐玻璃(例如,碱土硼铝硅酸盐玻璃、如Eagle玻璃)、浮法硼硅酸盐玻璃(例如,33玻璃)或其他低自发荧光玻璃)、陶瓷、聚合物(例如,塑料、环氧树脂、硅电荷环氧树脂或UV固化环氧树脂或粘合剂)、介电复合材料或其组合。The support material 60 can be any processed material (e.g., in a first state, such as liquid or powder) capable of flowing into or otherwise introducing into the edge cavity portion 52, and securely couples the support frame 34 and the photodetector 110 within the cavity 40 together (e.g., in a second state, such as hardened or cured). The support material 60 can be electrically insulating or non-conductive (or semiconductor) so as not to interfere with the operation of the photodetector 110 (e.g., the operation of sensor 112 and/or circuitry 124). During the formation of the reaction structure of the flow cell of the present invention, the formation of reaction sites on the reaction structure, luminescence/detection, and/or preparation or cleaning, the support material 60 may be contacted with reagent solutions and/or other materials/solutions. Therefore, the support material 60 may include one or more materials that do not react with sequencing reagents (e.g., sequencing reagents for DNA grafting, aggregation, cutting, synthesis, and/or reading). For example, sequencing reagents may include water and/or oil. Exemplary materials for the support material 60 include silicon, glass (e.g., crystal, quartz glass, glass fiber, borosilicate glass (e.g., alkaline earth borosilicate glass, such as Eagle glass), float borosilicate glass (e.g., 33 glass) or other low self-fluorescence glass), ceramics, polymers (e.g., plastics, epoxy resins, silicone-charged epoxy resins or UV-cured epoxy resins or adhesives), dielectric composites or combinations thereof.

如图10-11B所示,在支撑材料60填充边缘空腔部分52并将支撑框架34和至少一个光检测设备110与至少一个空腔40固定耦联之后,可由其移除支撑结构32的剩余部分。例如,可从支撑框架34的上表面36、光检测设备110的上部部分122以及支撑材料60的上表面移除基板44以及与其相关的任何中介层和/或间隔层/构件,如图10所示。分离的支撑框架34、定位在至少一个空腔40内的至少一个光检测设备110以及设置的支撑材料60可包括中间流动池装置62,如图11A和11B所示。中间流动池装置62能够进一步加工成一个或多个流动池,如下文中进一步解释的。如上所述,尽管图2的光检测设备110以图9-11B的中间流动池装置62的支撑框架34的空腔40的阵列进行说明,其他结构的光检测设备如图1的光检测设备10类似地或同样可用于支撑框架34的至少一个空腔40内。As shown in Figures 10-11B, after the support material 60 fills the edge cavity portion 52 and securely couples the support frame 34 and at least one photodetector 110 to at least one cavity 40, the remaining portion of the support structure 32 can be removed. For example, the substrate 44 and any associated interlayers and/or spacers/components can be removed from the upper surface 36 of the support frame 34, the upper portion 122 of the photodetector 110, and the upper surface of the support material 60, as shown in Figure 10. The separated support frame 34, the at least one photodetector 110 positioned within at least one cavity 40, and the disposed support material 60 may include an intermediate flow cell device 62, as shown in Figures 11A and 11B. The intermediate flow cell device 62 can be further processed into one or more flow cells, as further explained below. As described above, although the optical detection device 110 of FIG2 is illustrated with an array of cavities 40 in the support frame 34 of the intermediate flow cell device 62 of FIG9-11B, optical detection devices with other structures as shown in FIG1 can be similarly or equally used in at least one cavity 40 of the support frame 34.

从支撑结构32的其他部分移除中间流动池装置62的方式或方法可以至少部分与支撑框架34和基板44(和/或与其相关的任何中介层和/或间隔层/构件)和/或其附接方式相关。在一些结构中,可将中间流动池装置62与支撑结构32的其余部分脱粘。在一些结构中,可以将基板44以及与其相关的任何中介层和/或间隔层/构件(如果存在的话)化学地和/或机械地从中间流动池装置62上蚀刻下来。在一些结构中,可经由例如在进行或不进行预处理(如切边或激光构图)的情况下进行鼓风、刀片插入、真空脱粘或机械提升而将基板44以及与其相关的任何中介层和/或间隔层/构件(如果存在的话)从中间流动池装置62上移除。The manner or method of removing the intermediate flow cell device 62 from the rest of the support structure 32 may be at least partially related to the support frame 34 and the substrate 44 (and/or any associated intermediaries and/or spacers/members) and/or their attachment. In some configurations, the intermediate flow cell device 62 may be debonded from the rest of the support structure 32. In some configurations, the substrate 44 and any associated intermediaries and/or spacers/members (if present) may be chemically and/or mechanically etched off the intermediate flow cell device 62. In some configurations, the substrate 44 and any associated intermediaries and/or spacers/members (if present) may be removed from the intermediate flow cell device 62 via, for example, blowering, blade insertion, vacuum debonding, or mechanical lifting with or without pretreatment (such as edge trimming or laser patterning).

如图9-11B所示,在一些结构中,单个不同光检测设备110可定位在支撑框架34的至少一个空腔40。如上所述和如图9-11B所示,在此类结构中,支撑材料60可设置在支撑框架34的侧壁50与各空腔40内的单个不同的光检测设备110的外周之间的边缘空腔部分52内,以将支撑框架34和单个不同光检测设备110耦联在一起。As shown in Figures 9-11B, in some configurations, individual photodetectors 110 may be positioned within at least one cavity 40 of the support frame 34. As described above and as shown in Figures 9-11B, in such configurations, support material 60 may be disposed within an edge cavity portion 52 between the sidewall 50 of the support frame 34 and the outer periphery of the individual photodetectors 110 within each cavity 40, to couple the support frame 34 and the individual photodetectors 110 together.

如图12A和12B所示,在一些其他结构的中间流动池装置662中,多个隔开的不同光检测设备110A,110B,110C可定位于支撑框架634的至少一个空腔640内。应注意,尽管在本文中使用了三个光检测设备110A,110B,110C来说明多个光检测设备的使用,但同样可使用任何数量的光检测设备(例如,两个光检测设备,三个光检测设备,四个光检测设备,五个光检测设备等)。图12A和12B的中间流动池装置662类似于图11A和11B的中间流动池装置62,因此以“6”开头而不是“1”的类似附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。As shown in Figures 12A and 12B, in some other configurations of the intermediate flow cell device 662, a plurality of spaced-apart photodetectors 110A, 110B, 110C may be positioned within at least one cavity 640 of the support frame 634. It should be noted that although three photodetectors 110A, 110B, 110C are used herein to illustrate the use of multiple photodetectors, any number of photodetectors (e.g., two, three, four, five, etc.) can also be used. The intermediate flow cell device 662 of Figures 12A and 12B is similar to the intermediate flow cell device 62 of Figures 11A and 11B; therefore, similar reference numerals beginning with “6” instead of “1” are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity.

如图12A和12B所示,在此类结构的中间流动池装置662中,支撑材料660可设置在支撑框架634的侧壁650和与其相邻和/或面对的多个隔开的不同光检测设备110A,110B,110C的外周侧之间的边缘空腔部分652内,以便将支撑框架634和光检测设备110A,110B,110C耦联在一起。此外,如图12A和12B所示,不同光检测设备110A,110B,110C可以彼此隔开,使得间隙或空腔640的内部装置部分653定位在相邻的不同光检测设备110A,110B,110C之间。支撑材料660可以定位在相邻的不同光检测设备110A,110B,110C之间的间隙部分652内以将装置110A,110B,110C耦联在一起并至支撑框架634。这样,支撑材料660可以延伸到位于空腔640内的间隔不同的光检测设备110A,110B,110C的外围。As shown in Figures 12A and 12B, in the intermediate flow pool device 662 of this type of structure, the support material 660 can be disposed within the edge cavity portion 652 between the sidewall 650 of the support frame 634 and the outer peripheral sides of a plurality of spaced-apart different photodetectors 110A, 110B, 110C adjacent to and/or facing it, so as to couple the support frame 634 and the photodetectors 110A, 110B, 110C together. Furthermore, as shown in Figures 12A and 12B, the different photodetectors 110A, 110B, 110C can be spaced apart from each other, such that the internal device portion 653 of the gap or cavity 640 is positioned between adjacent different photodetectors 110A, 110B, 110C. The support material 660 can be positioned within the gap portion 652 between adjacent different photodetectors 110A, 110B, 110C to couple the devices 110A, 110B, 110C together and to the support frame 634. In this way, the support material 660 can extend to the periphery of the photodetectors 110A, 110B, and 110C located at different intervals within the cavity 640.

如图13A和13B所示,在一些其他结构的中间流动池装置762中,多个整体的、耦联的或未隔开的不同光检测设备110A,110B,110C可定位于支撑框架734的至少一个空腔740内。图13A和13B的中间流动池装置762类似于图11A和11B的中间流动池装置62和图12A和12B的中间流动池装置662,因此以“7”开头而不是“1”或“6”的类似附图标记分别用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。As shown in Figures 13A and 13B, in some other configurations of the intermediate flow cell device 762, multiple integral, coupled, or unseparated different photodetectors 110A, 110B, 110C may be positioned within at least one cavity 740 of the support frame 734. The intermediate flow cell device 762 of Figures 13A and 13B is similar to the intermediate flow cell device 62 of Figures 11A and 11B and the intermediate flow cell device 662 of Figures 12A and 12B; therefore, similar reference numerals beginning with “7” instead of “1” or “6” are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity.

如图13A和13B所示,在此类配置的中间流动池装置762中,支撑材料760可布置在支撑框架734的侧壁750和与其相邻和/或面对的多个整体的、耦联的或未隔开的不同光检测设备110A,110B,110C的暴露的外周侧之间的边缘空腔部分752内以将支撑框架734和光检测设备110A,110B,110C耦联在一起。由于多个光检测设备110A,110B,110C是整体的、耦联的或未隔开的,空腔740不会在相邻的装置110A,110B,110C之间延伸(因此支撑材料760不会在相邻的装置110A,110B,110C之间延伸)。如上文中所讨论的,多个不同光检测设备110A,110B,110C可以作为多个整体的或耦联的不同光检测设备110A,110B,110C的晶片的一部分来制造。装置的晶片可以切成单个不同光检测设备(如图10-12B所示)和/或多个整体的或耦联的不同光检测设备(包括任何数量的个体不同装置)(如图13A和13B所示)。As shown in Figures 13A and 13B, in this type of intermediate flow cell device 762, support material 760 may be arranged within an edge cavity portion 752 between the sidewall 750 of the support frame 734 and the exposed peripheral sides of a plurality of integral, coupled, or unseparated photodetectors 110A, 110B, 110C adjacent to and/or facing it, to couple the support frame 734 and the photodetectors 110A, 110B, 110C together. Since the plurality of photodetectors 110A, 110B, 110C are integral, coupled, or unseparated, the cavity 740 does not extend between adjacent devices 110A, 110B, 110C (therefore, the support material 760 does not extend between adjacent devices 110A, 110B, 110C). As discussed above, multiple different photodetectors 110A, 110B, 110C can be manufactured as part of a wafer of multiple integral or coupled different photodetectors 110A, 110B, 110C. The wafer of the device can be diced into individual different photodetectors (as shown in Figures 10-12B) and/or multiple integral or coupled different photodetectors (including any number of individual different devices) (as shown in Figures 13A and 13B).

图14说明了经由框架834及其一个或多个空腔840内的至少一个光检测设备10形成但没有基础基板或任何相关的中介层和/或间隔层的中间流动池装置862。图14的中间流动池装置862类似于图11A和11B的中间流动池装置62、图12A和12B的中间流动池装置662和图13A和13B的中间流动池装置762,因此以“8”开头的类似附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。尽管在图15A和15B中的每一个空腔840中示出了仅单个光检测设备110,如上文中所讨论的,空腔840可包括多个隔开的光检测设备110,并且支撑材料860可以在相邻的隔开的光检测设备110之间延伸。此外,尽管在每一个空腔840中示出了图1的光检测设备10,如上文中所讨论的,同样可使用其他光检测设备10,如图2的光检测设备110。Figure 14 illustrates an intermediate flow cell device 862 formed via at least one photodetector 10 within a frame 834 and one or more cavities 840, but without a base substrate or any associated interlayer and/or spacer layer. The intermediate flow cell device 862 of Figure 14 is similar to the intermediate flow cell devices 62 of Figures 11A and 11B, 662 of Figures 12A and 12B, and 762 of Figures 13A and 13B; therefore, similar reference numerals beginning with “8” are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating thereto above also apply, and will not be repeated for the sake of brevity and clarity. Although only a single photodetector 110 is shown in each cavity 840 in Figures 15A and 15B, as discussed above, a cavity 840 may include multiple spaced photodetectors 110, and support material 860 may extend between adjacent spaced photodetectors 110. Furthermore, although the light detection device 10 of FIG1 is shown in each cavity 840, other light detection devices 10, such as the light detection device 110 of FIG2, can also be used as discussed above.

中间流动池装置862与中间流动池装置62、中间流动池装置662和中间流动池装置762的区别在于支撑框架834的空腔840的结构和支撑材料860。如图14所示,空腔840仅部分延伸通过支撑框架840的厚度。空腔840通过支撑框架840的一部分从其上表面836延伸至下表面838。因此支撑框架841的底部部分841在空腔840的下表面843和支撑框架840的下表面838之间延伸,如图14所示。The intermediate flow cell device 862 differs from intermediate flow cell devices 62, 662, and 762 in the structure of the cavity 840 of the support frame 834 and the support material 860. As shown in Figure 14, the cavity 840 extends only partially through the thickness of the support frame 840. The cavity 840 extends from the upper surface 836 to the lower surface 838 of the support frame 840 via a portion of it. Therefore, the bottom portion 841 of the support frame 841 extends between the lower surface 843 of the cavity 840 and the lower surface 838 of the support frame 840, as shown in Figure 14.

同样如图14所示,支撑材料860的底层或底部部分863可以在空腔840的下表面843的上方延伸,至少一个光检测设备10可定位于其上。这样,支撑材料860的底部部分863可以在至少一个光检测设备10的下表面26和对应空腔840的下表面843之间延伸。As also shown in Figure 14, the bottom layer or bottom portion 863 of the support material 860 can extend above the lower surface 843 of the cavity 840, on which at least one photodetector 10 can be positioned. Thus, the bottom portion 863 of the support material 860 can extend between the lower surface 26 of at least one photodetector 10 and the corresponding lower surface 843 of the cavity 840.

在一些示例中,最初可将支撑材料860设置在空腔840的下表面843上方以形成其底部部分863,并将至少一个光检测设备10置于其上,使得支撑材料860的底部部分863在对应的空腔840内原位耦联或以其他方式保持至少一个光检测设备10以进一步处理。例如,在将至少一个光检测设备10置于支撑材料860的底部部分863(例如,定位在支撑材料860的底部部分863的暴露的上表面上的至少一个光检测设备10的下表面26)上方/之上后,可将额外的支撑材料860引入到支撑框架834的侧壁850与至少一个光检测设备10的外周之间的边缘空腔部分852中和支撑材料860的(预先形成的)底部部分863的暴露部分上方。在一些其他示例中,支撑材料860的底部部分863可以不存在,至少一个光检测设备10可直接定位在支撑框架840的下表面838上(或者另一个层或材料可定位于其间)。In some examples, a support material 860 may initially be disposed above the lower surface 843 of a cavity 840 to form its bottom portion 863, and at least one photodetector 10 may be placed thereon, such that the bottom portion 863 of the support material 860 is in situ coupled within the corresponding cavity 840 or otherwise holds at least one photodetector 10 for further processing. For example, after at least one photodetector 10 is placed above/on the bottom portion 863 of the support material 860 (e.g., on the lower surface 26 of at least one photodetector 10 positioned on the exposed upper surface of the bottom portion 863 of the support material 860), additional support material 860 may be introduced into the edge cavity portion 852 between the sidewall 850 of the support frame 834 and the outer periphery of at least one photodetector 10 and above the exposed portion of the (pre-formed) bottom portion 863 of the support material 860. In some other examples, the bottom portion 863 of the support material 860 may be absent, and at least one photodetector 10 may be positioned directly on the lower surface 838 of the support frame 840 (or another layer or material may be positioned therebetween).

如图15A和15B所示,在形成中间流动池装置962之后,可将空腔940内的支撑材料960的上表面961暴露出来。图15A和15B的中间流动池装置962类似于图11A和11B的中间流动池装置62、图12A和12B的中间流动池装置662、图13A和13B的中间流动池装置762和图14的中间流动池装置862,因此以“9”开头的类似附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。例如,可经由从支撑框架934的上表面936、支撑材料960的上表面961个个横冲直撞119的上表面122移除或分离支撑基板以及任何相关的中介层和间隔层来形成中间流动池装置962。可替代地,如果空腔840仅部分延伸通过支撑框架834,则可在没有支撑基板的情况下形成中间流动池装置962。As shown in Figures 15A and 15B, after the intermediate flow pool device 962 is formed, the upper surface 961 of the support material 960 within the cavity 940 can be exposed. The intermediate flow pool device 962 of Figures 15A and 15B is similar to the intermediate flow pool device 62 of Figures 11A and 11B, the intermediate flow pool device 662 of Figures 12A and 12B, the intermediate flow pool device 762 of Figures 13A and 13B, and the intermediate flow pool device 862 of Figure 14. Therefore, similar reference numerals beginning with "9" are used to indicate similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity. For example, the intermediate flow pool device 962 can be formed by removing or separating the support substrate and any associated interlayers and spacers from the upper surface 936 of the support frame 934, the upper surface 961 of the support material 960, the upper surface 122 of the cross-section 119. Alternatively, if the cavity 840 extends only partially through the support frame 834, the intermediate flow pool device 962 can be formed without a support substrate.

如图15A和15B所示,支撑材料960的暴露的上表面961的至少一部分可以在支撑框架931的上表面/顶侧936和相邻的定位在对应空腔940内的至少一个光检测设备110的上部部分122之下和之间延伸。尽管在图15A和15B中仅示出了单个光检测设备110,但如上文中所讨论的,空腔940可包括多个隔开的光检测设备110,支撑材料960可以在相邻的隔开的光检测设备110之间延伸。在这样的示例中,支撑材料960的此部分的上表面961可以在相邻的光检测设备110的上部部分122之下和之间延伸。因此定位于整个对应空腔940内的支撑材料960的上表面961可以包括定位在支撑框架931的顶侧936和定位在对应空腔940内的至少一个光检测设备110的上部部分12下方的凹陷的顶侧表面部分。As shown in Figures 15A and 15B, at least a portion of the exposed upper surface 961 of the support material 960 may extend below and between the upper surface/top side 936 of the support frame 931 and the upper portion 122 of at least one adjacent photodetector 110 positioned within the corresponding cavity 940. Although only a single photodetector 110 is shown in Figures 15A and 15B, as discussed above, the cavity 940 may include a plurality of spaced photodetectors 110, and the support material 960 may extend between adjacent spaced photodetectors 110. In such an example, the upper surface 961 of this portion of the support material 960 may extend below and between the upper portions 122 of adjacent photodetectors 110. Thus, the upper surface 961 of the support material 960 positioned throughout the corresponding cavity 940 may include a recessed top side surface portion positioned below the top side 936 of the support frame 931 and below the upper portion 122 of at least one photodetector 110 positioned within the corresponding cavity 940.

在一些此类中间流动池装置962中,定位在对应空腔940内的至少一个光检测设备110的上部部分122可以不包括在其上延伸的反应结构,如图15A所示。如图15B所示,在一些此类中间流动池装置962中,反应结构120可定位于至少一个光检测设备110的上部部分122和对应空腔940内的支撑材料960的顶侧961的上方,填充在其任何凹陷部分中以形成平面的上表面,多个纳米孔16从该平面的上表面中延伸。In some such intermediate flow cell devices 962, the upper portion 122 of at least one photodetector 110 positioned within a corresponding cavity 940 may not include a reaction structure extending thereon, as shown in FIG15A. As shown in FIG15B, in some such intermediate flow cell devices 962, the reaction structure 120 may be positioned above the upper portion 122 of at least one photodetector 110 and the top side 961 of the support material 960 within the corresponding cavity 940, filling any of its recesses to form a planar upper surface from which a plurality of nanopores 16 extend.

应注意,反应结构120可在至少一个光检测设备110的整个有效区域上方定位在至少一个光检测设备110的上部部分122上。因此反应结构120的平面的上表面可以包括反应结构120的定位在对应空腔940内的支撑材料960上方的部分的上表面,并且反应结构120的间隙区域的上表面可定位于对应空腔940内的至少一个光检测设备110的上,因此可以是共面的。It should be noted that the reaction structure 120 may be positioned above the entire effective area of at least one photodetector 110 on the upper portion 122 of at least one photodetector 110. Therefore, the upper surface of the planar surface of the reaction structure 120 may include the upper surface of the portion of the reaction structure 120 positioned above the support material 960 within the corresponding cavity 940, and the upper surface of the gap region of the reaction structure 120 may be positioned above at least one photodetector 110 within the corresponding cavity 940, and thus may be coplanar.

同样如图15B所示,反应结构120可以进一步在支撑框架934的上表面936上方延伸。因此反应结构120的平面的上表面还可以在围绕对应空腔940的支撑框架934的上表面936的上方延伸。因此,反应结构120的定位在对应空腔40内的支撑材料960上方的部分的上表面、反应结构120的定位在围绕对应空腔940的支撑框架934的上表面936上方的部分的上表面和反应结构120的定位在对应空腔940内的至少一个光检测设备110上方的间隙区域的上表面可以是共面的。As also shown in Figure 15B, the reaction structure 120 can further extend above the upper surface 936 of the support frame 934. Therefore, the planar upper surface of the reaction structure 120 can also extend above the upper surface 936 of the support frame 934 surrounding the corresponding cavity 940. Thus, the upper surface of the portion of the reaction structure 120 positioned above the support material 960 within the corresponding cavity 40, the upper surface of the portion of the reaction structure 120 positioned above the upper surface 936 of the support frame 934 surrounding the corresponding cavity 940, and the upper surface of the gap region of the reaction structure 120 positioned above at least one photodetector 110 within the corresponding cavity 940 can be coplanar.

可用于形成反应结构120的层构建方法包括光刻、蚀刻(例如,反应离子蚀刻)、溅射、蒸发、浇铸(例如,旋涂)、化学气相沉积、电沉积、外延附生、热氧化、物理气相沉积等。在一些示例中,可使用阴影技术形成反应结构120。在一些示例中,可使用纳米光刻术如纳米光刻压印术(NIL)形成反应结构12。在一个示例中,可至少部分经由定位在支撑框架934的上表面936、至少一个光检测设备110的上部部分122和对应空腔940内的支撑材料960的顶侧961上方的一个或多个紫外光(UV)固化的树脂层经由一个或多个NIL相关工艺来形成反应结构120。Layer construction methods that can be used to form the reactive structure 120 include photolithography, etching (e.g., reactive ion etching), sputtering, evaporation, casting (e.g., spin coating), chemical vapor deposition, electrodeposition, epitaxial growth, thermal oxidation, physical vapor deposition, etc. In some examples, shading techniques can be used to form the reactive structure 120. In some examples, nanolithography such as nanoimprint lithography (NIL) can be used to form the reactive structure 120. In one example, the reactive structure 120 can be formed at least partially via one or more UV-curable resin layers positioned above the upper surface 936 of the support frame 934, the upper portion 122 of at least one photodetector 110, and the top side 961 of the support material 960 within the corresponding cavity 940 via one or more NIL-related processes.

在一个示例中,反应结构120可包括至少定位在光检测设备110的上部部分122上方的至少一个层,该光检测设备110的上部部分122设为具有反应凹陷16(例如,纳米孔)的阵列(如上文中针对图1所讨论的)。在另一个示例中,反应结构120的至少一个层可包括预先形成的反应凹陷16。任选地,可对反应结构120的至少一个层进行蚀刻以去除其的一部分,形成反应凹陷16的至少一部分。In one example, the reaction structure 120 may include at least one layer positioned above an upper portion 122 of the photodetector 110, the upper portion 122 being configured as an array of reaction recesses 16 (e.g., nanopores) as discussed above with respect to FIG. 1. In another example, at least one layer of the reaction structure 120 may include a pre-formed reaction recess 16. Optionally, at least one layer of the reaction structure 120 may be etched to remove a portion thereof, forming at least a portion of the reaction recess 16.

在一个其他示例中,可通过使反应结构120的至少一个层成型来形成具有反应凹陷16。例如,可将NIL材料至少设置在光检测设备110的上部部分122的上方。NIL材料可包括能够使用NIL技术进行压印的材料。例如,NIL材料可包括聚合物。随后可用具有在NIL层中形成反应凹陷16的特征模式的模具(也称模板)对NIL材料进行压印或铭印。在一些结构中,模具是透明的,从而允许UV或可见光通过其传播。在此类结构中,NIL材料可包括在将模具压入NIL此类中时通过UV或可见光固化的光固化聚合物。因此,NIL材料可以固化(例如,硬化)以形成反应凹陷16。该方法可与步进式闪光压印术(SFIL)相同或相似。在其他结构中,可通过施加热能和/或压力使NIL材料固化。In another example, the reaction depressions 16 can be formed by molding at least one layer of the reaction structure 120. For example, NIL material can be disposed at least above the upper portion 122 of the photodetector 110. The NIL material can include materials capable of being imprinted using NIL technology. For example, the NIL material can include polymers. The NIL material can then be imprinted or stamped with a mold (also called a template) having a characteristic pattern for forming the reaction depressions 16 in the NIL layer. In some structures, the mold is transparent, thereby allowing UV or visible light to propagate through it. In such structures, the NIL material can include a photocurable polymer that cures with UV or visible light when the mold is pressed into the NIL. Thus, the NIL material can be cured (e.g., hardened) to form the reaction depressions 16. This method can be the same as or similar to step flash imprinting (SFIL). In other structures, the NIL material can be cured by applying heat and/or pressure.

图16A-16D示出了一种在中间流动池装置1062的背侧上形成多个背侧电触点1072的示例性方法,该触点能够传输或传导来自对应空腔1040内的至少一个光检测设备110的电路124的数据信号(基于其光传感器116所检测到的光子),以便在用于经由该中间流动池装置1062形成的流动池时,将数据信号传输到生物检测器和/或生物测定系统。尽管中间流动池装置1062示出为具有图11A和11B的中间流动池装置62的结构,但中间流动池装置1062可有不同结构,如图12A和12B的中间流动池装置662的结构或图13A和13B的中间流动池装置762的结构,因此以“10”开头的类似附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。应注意,中间流动池装置1062的背侧上的背侧接触1072耦联到对应空腔1040内的至少一个光检测设备110的背侧过孔128。因此,尽管利用图2的光检测设备110示出了中间流动池装置1062,但同样可使用包括背侧过孔128的其他光检测设备结构。Figures 16A-16D illustrate an exemplary method of forming a plurality of back-side electrical contacts 1072 on the back side of an intermediate flow cell device 1062, which are capable of transmitting or conducting data signals (based on photons detected by the photosensor 116) from the circuitry 124 of at least one photodetector 110 within a corresponding cavity 1040, so as to transmit the data signals to a biodetector and/or bioassay system when used in a flow cell formed via the intermediate flow cell device 1062. Although the intermediate flow cell device 1062 is shown as having the structure of the intermediate flow cell device 62 of Figures 11A and 11B, the intermediate flow cell device 1062 may have different structures, such as the structure of the intermediate flow cell device 662 of Figures 12A and 12B or the structure of the intermediate flow cell device 762 of Figures 13A and 13B. Therefore, similar reference numerals beginning with "10" are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity. It should be noted that the back contact 1072 on the back side of the intermediate flow cell device 1062 is coupled to the back via 128 of at least one photodetector 110 within the corresponding cavity 1040. Therefore, although the intermediate flow cell device 1062 is shown using the photodetector 110 of FIG2, other photodetector structures including the back via 128 can also be used.

如图16A和16B所示,不导电的基板或材料1070定位于中间流动池装置1062的背侧上。同样如图16A和16B所示,基板1070的背侧1074包含与其耦联的多个暴露的导电的背侧接触1072。背侧接触1072可至少部分嵌入基板1070的背侧1074内。可为每一个空腔1040内的每一个光检测设备110的每一个背侧过孔128(即,唯一相关的过孔128)提供背侧接触1072(潜在地,独立和不同的背侧接触1072)。如图16B所示,相邻的背侧接触1072可彼此隔开,基板1070的一部分可以在其间延伸。As shown in Figures 16A and 16B, a non-conductive substrate or material 1070 is positioned on the back side of the intermediate flow cell device 1062. Also as shown in Figures 16A and 16B, the back side 1074 of the substrate 1070 includes a plurality of exposed conductive back side contacts 1072 coupled thereto. The back side contacts 1072 may be at least partially embedded within the back side 1074 of the substrate 1070. A back side contact 1072 (potentially, independent and distinct back side contacts 1072) may be provided for each back side via 128 (i.e., a uniquely associated via 128) of each photodetector 110 within each cavity 1040. As shown in Figure 16B, adjacent back side contacts 1072 may be spaced apart from each other, and a portion of the substrate 1070 may extend therebetween.

基板1070可包括任何不导电的材料或半导体材料,如聚合物(例如,环氧树脂)、硅、玻璃、陶瓷或其组合。背侧接触1072可包括任何导电材料,如金属(例如,铜)。在一些示例中,基板1070和背侧接触1072可包括印刷电路板。The substrate 1070 may comprise any non-conductive or semiconductor material, such as polymers (e.g., epoxy resin), silicon, glass, ceramics, or combinations thereof. The back contact 1072 may comprise any conductive material, such as a metal (e.g., copper). In some examples, the substrate 1070 and the back contact 1072 may comprise a printed circuit board.

如图16B所示,基板1070和/或背侧接触1072可包括通孔1076,该通孔至少部分与支撑框架1034的每一个空腔1040内的至少一个光检测设备110的背侧126对齐(例如,重叠)。因此,因此,通孔1076至少部分地与间隔片130(如果提供)和过孔128之间的开口/空间部分对齐(例如,重叠),过孔128延伸到每个腔1040内的至少一个光检测设备110的背面126处的基片部分114。As shown in FIG16B, the substrate 1070 and/or back contact 1072 may include a through-hole 1076, which is at least partially aligned (e.g., overlapped) with the back side 126 of at least one photodetector 110 within each cavity 1040 of the support frame 1034. Therefore, the through-hole 1076 is at least partially aligned (e.g., overlapped) with the opening/space portion between the spacer 130 (if provided) and the via 128, which extends to the substrate portion 114 at the back side 126 of at least one photodetector 110 within each cavity 1040.

如图16C所示,导电线或其他结构1080可在每一个空腔1040内的至少一个光检测设备110的过孔128和相邻或相关的背侧接触1072之间耦联。线1080可包括任何导电材料,如金属(例如,铜)。线1080能够将数据信号从至少一个光检测设备110的电路124的过孔128传输到背侧接触1072。因此每一个线1080可以从中间流动池装置1062的背侧上的对应触点1072延伸到和通过相邻或相关的通孔1076,并到达支撑框架1034的空腔1040内的光检测设备110的对应过孔128,如图16C所示。在一些示例中,线1080可向内的与通孔1076的内侧壁隔开。As shown in Figure 16C, conductive lines or other structures 1080 may be coupled between vias 128 of at least one photodetector 110 within each cavity 1040 and adjacent or associated back contacts 1072. Lines 1080 may comprise any conductive material, such as metals (e.g., copper). Lines 1080 are capable of transmitting data signals from vias 128 of circuitry 124 of at least one photodetector 110 to the back contacts 1072. Thus, each line 1080 may extend from a corresponding contact 1072 on the back side of the intermediate flow cell device 1062, through an adjacent or associated via 1076, and to a corresponding via 128 of the photodetector 110 within the cavity 1040 of the support frame 1034, as shown in Figure 16C. In some examples, lines 1080 may be spaced inwardly from the inner sidewall of the via 1076.

对于在对应过孔128和背侧接触1072之间耦联的线1080,该线1080可以被覆盖、密封/包裹在绝缘部分1082中,如图16D所示。绝缘部分1082可包括电绝缘材料,从而使线1080电绝缘。如图16D所示,绝缘部分1082可以覆盖暴露于通孔1076的每一个空腔1040内至少一个光检测设备110的背侧126的一部分(或者全部)。例如,绝缘部分1082可以在对应空腔1040内的每一个光检测设备110的间隔片130(如果提供的话)之间的空间上方延伸并填充该空间。For a line 1080 coupled between a corresponding via 128 and a back contact 1072, the line 1080 may be covered, sealed/wrapped in an insulating portion 1082, as shown in FIG16D. The insulating portion 1082 may include an electrically insulating material, thereby electrically insulating the line 1080. As shown in FIG16D, the insulating portion 1082 may cover a portion (or all) of the back side 126 of at least one photodetector 110 exposed within each cavity 1040 of the via 1076. For example, the insulating portion 1082 may extend over and fill the space between spacers 130 (if provided) of each photodetector 110 within the corresponding cavity 1040.

每一个绝缘部分1082还可以填充通孔1076,并且仅在与每一个空腔1040相关的背侧接触1072的一部分上延伸,以形成背侧接触1072的暴露部分。例如,绝缘部分1082可仅在背侧接触1072的与对应线1080耦联的一部分的上方延伸(并包裹线1080),例如背侧接触1072上与于对应通孔1076邻近(例如,相邻)的部分。因此,背侧接触1072上没有绝缘部分1082的部分(例如,远离对应通孔1076的部分)可仍保持暴露。背侧接触1072的暴露部分可耦联到另一个结构或装置以传输来自至少一个光检测设备110的数据信号。应注意,在形成绝缘部分1082之后,可将中间流动池装置1062切下以由其形成一个或多个流动池,如下文中进一步解释的。例如,可在光检测设备110上形成反应结构(如果不是已经形成的话)、在光检测设备110的反应结构上形成反应位点和/或加盖之前或之后将中间流动池装置1062切下。Each insulating portion 1082 may also fill the through-hole 1076 and extend only on a portion of the back contact 1072 associated with each cavity 1040 to form an exposed portion of the back contact 1072. For example, the insulating portion 1082 may extend only above (and wrap around) the portion of the back contact 1072 coupled to the corresponding line 1080, such as the portion of the back contact 1072 adjacent to (e.g., adjacent to) the corresponding through-hole 1076. Thus, portions of the back contact 1072 without the insulating portion 1082 (e.g., portions away from the corresponding through-hole 1076) may remain exposed. The exposed portions of the back contact 1072 may be coupled to another structure or device to transmit data signals from at least one photodetector 110. It should be noted that after the insulating portion 1082 is formed, the intermediate flow cell device 1062 may be cut off to form one or more flow cells, as further explained below. For example, a reaction structure may be formed on the photodetector 110 (if it has not already been formed), reaction sites may be formed on the reaction structure of the photodetector 110, and/or the intermediate flow cell device 1062 may be cut off before or after capping.

图17A-17C示出了另一种在中间流动池装置1162的背侧上形成多个背侧电触点1172的方法,该背侧电触点1172传输或传递来自对应空腔1140内的至少一个光检测设备110(基于其光传感器116所检测到的光子)的电路124的数据信号,如当用于经由该中间流动池装置1162形成的流动池时将数据信号传输到生物检测器和/或生物测定系统。形成图17A-17C的多个背侧电触点1172和中间流动池装置1162的方法类似于图16A-16D的方法和中间流动池装置1062,因此以“11”开头的类似的附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。Figures 17A-17C illustrate another method of forming a plurality of back-side electrical contacts 1172 on the back side of an intermediate flow cell device 1162, which transmit or transfer data signals from circuitry 124 of at least one photodetector 110 (based on photons detected by its photosensor 116) within a corresponding cavity 1140, such as when used to transmit data signals to a biodetector and/or bioassay system for use in a flow cell formed via the intermediate flow cell device 1162. The method of forming the plurality of back-side electrical contacts 1172 and the intermediate flow cell device 1162 of Figures 17A-17C is similar to the method and intermediate flow cell device 1062 of Figures 16A-16D; therefore, similar reference numerals beginning with "11" are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating thereto above also apply, and will not be repeated for the sake of brevity and clarity.

如图17A所示,在支撑框架1134的底侧1138上提供导电背侧接触1172。例如,背侧接触1172可至少部分嵌入到支撑框架1134的底侧1138中,如图17A所示。如图17A所示,相邻的背侧接触1172可彼此隔开,支撑框架1134的一部分可以在其间延伸。在一些示例中,背侧接触1172可包括支撑框架1134的空腔1140的底部部分(即,支撑框架1134的侧壁1150的用于形成空腔1140的部分)。在一个示例中,背侧接触1172和支撑框架1134可包括印刷电路板。如图17B所示,线1190可以从光检测设备110的对应过孔128通过其背侧122到达邻近(例如,相邻)的背侧接触1172。在将线耦联到过孔128和背侧接触1172之后,光检测设备110的整个背侧122和背侧接触1172上耦联到线1180的部分被绝缘部分1182覆盖,如图17C所示。线1180还完全被绝缘部分1182包裹。绝缘部分1182仅覆盖一部分背侧接触1172以留下其暴露的部分与另一个结构或装置匹配,从而传输来自至少一个光检测设备110的数据信号。应注意,在形成绝缘部分1182之后,可将中间流动池装置1162切下以由其形成一个或多个流动池,如下文中进一步解释的。例如,可在光检测设备110上形成反应结构(如果不是已经形成的话)、在光检测设备110的反应结构上形成反应位点和/或加盖之前或之后将中间流动池装置1162切下。As shown in FIG17A, a conductive back-side contact 1172 is provided on the bottom side 1138 of the support frame 1134. For example, the back-side contact 1172 may be at least partially embedded in the bottom side 1138 of the support frame 1134, as shown in FIG17A. As shown in FIG17A, adjacent back-side contacts 1172 may be spaced apart from each other, and a portion of the support frame 1134 may extend therebetween. In some examples, the back-side contact 1172 may include the bottom portion of the cavity 1140 of the support frame 1134 (i.e., the portion of the sidewall 1150 of the support frame 1134 that forms the cavity 1140). In one example, the back-side contact 1172 and the support frame 1134 may include a printed circuit board. As shown in FIG17B, a line 1190 may be accessible from a corresponding via 128 of the photodetector 110 through its back side 122 to an adjacent (e.g., adjacent) back-side contact 1172. After the wire is coupled to the via 128 and the back contact 1172, the portion of the back side 122 and back contact 1172 of the photodetector 110 coupled to the wire 1180 is covered by an insulating portion 1182, as shown in FIG17C. The wire 1180 is also completely wrapped by the insulating portion 1182. The insulating portion 1182 covers only a portion of the back contact 1172 to leave its exposed portion mating with another structure or device to transmit data signals from at least one photodetector 110. It should be noted that after the insulating portion 1182 is formed, the intermediate flow cell device 1162 may be cut off to form one or more flow cells, as further explained below. For example, the intermediate flow cell device 1162 may be cut off before or after forming a reaction structure on the photodetector 110 (if it has not already been formed), forming reaction sites on the reaction structure of the photodetector 110, and/or capping.

图18A-18C示出了另一种在中间流动池装置1262的背侧上形成多个背侧电触点1272的方法,该背侧电触点1272能传输或传导来自对应空腔1240内的至少一个光检测设备110(基于其光传感器116所检测到的光子)的电路124的数据信号,如当用于经由该中间流动池装置1262形成的流动池时将数据信号传输到生物检测器和/或生物测定系统。形成图18A-18C的多个背侧电触点1272和中间流动池装置1262的方法类似于图16A-16D的方法和中间流动池装置1062,因此以“12”开头的类似的附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。Figures 18A-18C illustrate another method of forming a plurality of back-side electrical contacts 1272 on the back side of an intermediate flow cell device 1262. These back-side electrical contacts 1272 can transmit or conduct data signals from circuitry 124 of at least one photodetector 110 (based on photons detected by its photosensor 116) within a corresponding cavity 1240, such as when used to transmit data signals to a biodetector and/or bioassay system when used in a flow cell formed via the intermediate flow cell device 1262. The method of forming the plurality of back-side electrical contacts 1272 and the intermediate flow cell device 1262 of Figures 18A-18C is similar to the method and intermediate flow cell device 1062 of Figures 16A-16D. Therefore, similar reference numerals beginning with "12" are used to denote similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity.

如图18A所示,中间流动池装置1262可在背侧126上没有间隔片的每一个空腔1240内包括至少一个光检测设备110。然而,在可替代的示例中,一个或多个空腔1240内的至少一个光检测设备110可包括在背侧126上的间隔片(如图2所示)。如图18A所示,光检测设备110的电路124的过孔128可在背侧126暴露。在一个示例中,如图18A所示,光检测设备110的背侧126处的过孔128的暴露端可与支撑框架1234的背侧1238和/或背侧是基本上对齐的(即,共面的)。As shown in Figure 18A, the intermediate flow cell device 1262 may include at least one photodetector 110 within each cavity 1240 without spacers on the back side 126. However, in an alternative example, at least one photodetector 110 within one or more cavities 1240 may include spacers on the back side 126 (as shown in Figure 2). As shown in Figure 18A, vias 128 of the circuitry 124 of the photodetector 110 may be exposed on the back side 126. In one example, as shown in Figure 18A, the exposed end of the via 128 at the back side 126 of the photodetector 110 may be substantially aligned (i.e., coplanar) with the back side 1238 and/or the back side of the support frame 1234.

如图18B所示,多个导电互连触点(intercontacts)1278可定位于中间流动池装置1262的背侧上方。互连触点(intercontacts)1278可包括任何导电材料,如金属(例如,铜),以便从相关联的光检测设备110传输数据信号。每一个互连触点1278均电耦联到光检测设备110的背侧126处的对应过孔128的暴露端表面,并且在光检测设备110的通道1252内的填充材料1260的背侧1265和支撑框架1234的背侧1238的一部分的上方延伸。如图18B所示,支撑框架1234的背侧1238上的相邻的互连触点(intercontacts)1278可彼此隔开,一部分支撑框架1234可以在其间延伸。类似地,光检测设备110的背侧126上的相邻的互连触点(intercontacts)1278可彼此隔开。As shown in Figure 18B, a plurality of conductive interconnects 1278 may be positioned above the back side of the intermediate flow cell device 1262. The interconnects 1278 may comprise any conductive material, such as a metal (e.g., copper), to transmit data signals from the associated photodetector 110. Each interconnect 1278 is electrically coupled to the exposed end surface of a corresponding via 128 at the back side 126 of the photodetector 110 and extends above the back side 1265 of the filler material 1260 within the channel 1252 of the photodetector 110 and a portion of the back side 1238 of the support frame 1234. As shown in Figure 18B, adjacent interconnects 1278 on the back side 1238 of the support frame 1234 may be spaced apart from each other, and a portion of the support frame 1234 may extend therebetween. Similarly, adjacent interconnects 1278 on the back side 126 of the optical detection device 110 may be spaced apart from each other.

通过电耦联到光检测设备110的过孔128的定位于支撑框架1234的背侧1238上的互连触点(intercontacts)1278、填充材料1260的背侧1265和光检测设备110的背侧126,多个背侧接触1272可定位于一部分互连触点(intercontacts)1278的上方(例如之上),使它们电耦联,如图18C所示。在一些示例中,背侧接触1272可定位在互连触点(intercontacts)1278的(完全或部分)定位在支撑框架1234和/或填充材料1260上方的部分上,如图18C所示。Through interconnect contacts 1278 located on the back side 1238 of the support frame 1234, the back side 1265 of the filler material 1260, and the back side 126 of the photodetector 110, a plurality of back side contacts 1272 may be positioned above (e.g., above) a portion of the interconnect contacts 1278, thus electrically coupling them, as shown in FIG18C. In some examples, the back side contacts 1272 may be positioned on the portion of the interconnect contacts 1278 ( wholly or partially) located above the support frame 1234 and/or the filler material 1260, as shown in FIG18C.

同样如图18C所示,绝缘材料1282还可定位在互连触点(intercontacts)1278上方。绝缘材料1282可以在互连触点(intercontacts)1278的暴露表面区域上方延伸。绝缘材料1282还可在光检测设备110的背侧126上方和相邻的互连触点(intercontacts)1278与背侧接触1272之间的支撑框架1238的底侧1238的上方延伸。这样,绝缘材料1282可以覆盖或包裹中间流动池装置1262的背侧但不包裹背侧接触1272。因此背侧接触1272的暴露部分能与另一个结构或装置匹配以从至少一个光检测设备110向其传输数据信号。应注意,在形成绝缘材料1282和背侧接触1272之后,可将中间流动池装置1262切下以由其形成一个或多个流动池,如下文中进一步解释的。例如,可在光检测设备110上形成反应结构(如果不是已经形成的话)、在光检测设备110的反应结构上形成反应位点和/或加盖之前或之后将中间流动池装置1262切下。As also shown in Figure 18C, the insulating material 1282 may also be positioned above the interconnecting contacts 1278. The insulating material 1282 may extend above the exposed surface area of the interconnecting contacts 1278. The insulating material 1282 may also extend above the back side 126 of the photodetector 110 and above the bottom side 1238 of the support frame 1238 between adjacent interconnecting contacts 1278 and the back contact 1272. Thus, the insulating material 1282 may cover or wrap the back side of the intermediate flow cell device 1262 but not the back contact 1272. Therefore, the exposed portion of the back contact 1272 can be matched with another structure or device to transmit data signals from at least one photodetector 110 to it. It should be noted that after the insulating material 1282 and the back contact 1272 are formed, the intermediate flow cell device 1262 may be cut off to form one or more flow cells, as further explained below. For example, a reaction structure may be formed on the photodetector 110 (if it has not already been formed), reaction sites may be formed on the reaction structure of the photodetector 110, and/or the intermediate flow cell device 1262 may be cut off before or after capping.

图19A-19C示出了一种在中间流动池装置1362的背侧上形成多个背侧电触点1372/1398的方法,该多个背侧电触点1372/1398能够从对应空腔1340内的至少一个光检测设备10(基于其光传感器16所检测到的光子)的电路24传输或传导数据信号,从而在用于经由该中间流动池装置1362形成的流动池时将数据信号传输到生物检测器和/或生物测定系统。形成图19A-19C的多个背侧电触点1372和中间流动池装置1362的方法类似于图16A-16D的方法和中间流动池装置1062、图17A-17C的方法和中间流动池装置1162和图18A-18C的方法和中间流动池装置1262,因此以“13”开头的类似的附图标记用于表示类似的组件、方面、功能、过程或功能,上文中涉及其的描述同样适用,为简洁和清楚起见不再重复。此外,尽管在每一个空腔1340中示出了图1的光检测设备10,但如上文中所讨论的,同样可使用其他光检测设备,如图2的光检测设备110。应注意,没有延伸通过其基础晶片部分14的光检测设备可有利地用于支撑框架1362和中间流动池装置1362的形成。Figures 19A-19C illustrate a method for forming a plurality of back-side electrical contacts 1372/1398 on the back side of an intermediate flow cell device 1362, which are capable of transmitting or conducting data signals from circuit 24 of at least one photodetector 10 (based on photons detected by its photosensor 16) within a corresponding cavity 1340, thereby transmitting data signals to a biodetector and/or bioassay system when used for a flow cell formed via the intermediate flow cell device 1362. The method of forming the plurality of back-side electrical contacts 1372 and intermediate flow cell device 1362 of Figures 19A-19C is similar to that of Figures 16A-16D and intermediate flow cell device 1062, Figures 17A-17C and intermediate flow cell device 1162, and Figures 18A-18C and intermediate flow cell device 1262. Therefore, similar reference numerals beginning with "13" are used to indicate similar components, aspects, functions, processes, or features, and the descriptions relating to them above also apply, and will not be repeated for the sake of brevity and clarity. Furthermore, although the photodetector device 10 of Figure 1 is shown in each cavity 1340, other photodetector devices, such as the photodetector device 110 of Figure 2, can also be used as discussed above. It should be noted that photodetector devices that do not extend through their base wafer portion 14 can advantageously be used for the formation of the support frame 1362 and intermediate flow cell device 1362.

如图19A所示,中间流动池装置1362包括具有从上表面1336延伸至下表面1338的多个导电过孔1384的支撑框架1224。过孔1384可以包括任何导电材料,如金属(例如,铜),以传输来自相关的光检测设备110的数据信号。暴露支撑框架1334的底侧1338(即中间流动池装置1362的背侧)的一部分过孔1384,并由其形成背侧电触点部分1372,如图19A所示。类似地,同样如图19A所示,暴露支撑框架1334的顶侧1336(即,中间流动池装置1362的前侧)的一部分过孔1384并由其形成前侧电触点部分1373。背侧电触点部分1372和/或者前侧电触点部分1373相比于在其间延伸的过孔1384的中间部分可以是扩大的(例如,限定更大的横截面面积)。As shown in FIG19A, the intermediate flow cell device 1362 includes a support frame 1224 having a plurality of conductive vias 1384 extending from an upper surface 1336 to a lower surface 1338. The vias 1384 may comprise any conductive material, such as a metal (e.g., copper), to transmit data signals from an associated photodetector 110. A portion of the vias 1384 on the bottom side 1338 of the support frame 1334 (i.e., the back side of the intermediate flow cell device 1362) is exposed, forming a back-side electrical contact portion 1372, as shown in FIG19A. Similarly, also as shown in FIG19A, a portion of the vias 1384 on the top side 1336 of the support frame 1334 (i.e., the front side of the intermediate flow cell device 1362) is exposed, forming a front-side electrical contact portion 1373. The back side electrical contact portion 1372 and/or the front side electrical contact portion 1373 may be enlarged (e.g., defining a larger cross-sectional area) compared to the middle portion of the via 1384 extending therebetween.

支撑框架1334的相邻过孔1384可以彼此隔开,支撑框架1334的一部分可以在它们之间延伸。例如,相邻的前侧电触点部分1373可以彼此间隔开,支撑框架1334的在支撑框架1334的顶侧1336处的一部分可以在其间延伸,如图19A所示。类似地,相邻的背侧电触点部分1372可以彼此间隔开,支撑框架1334的在支撑框架1334的底侧1338处的一部分可以在其间延伸。Adjacent vias 1384 of the support frame 1334 may be spaced apart from each other, and a portion of the support frame 1334 may extend between them. For example, adjacent front-side electrical contact portions 1373 may be spaced apart from each other, and a portion of the support frame 1334 at its top side 1336 may extend therebetween, as shown in FIG19A. Similarly, adjacent back-side electrical contact portions 1372 may be spaced apart from each other, and a portion of the support frame 1334 at its bottom side 1338 may extend therebetween.

如图19B所示,多个导电互连触点1386可以定位在中间流动池装置1362的前侧以将支撑框架1334的每一个空腔1340内的至少一个光检测设备10的设备电路24电耦联到支撑框架1334的过孔1384的电触点部分1386。每一个互连触点138可以在光检测设备10的顶侧22上包含电路24的暴露部分的部分上方、支撑材料1360的顶侧上相邻于边缘空腔部分1352内的光检测设备10的部分上方和过孔1384的前侧电触点部分137的暴露的上表面的部分上方延伸。因此互连触点138可以将空腔1340内的至少一个光检测设备的电路24电耦联至通过支撑框架1334延伸的过孔1384,由此将来自至少一个光检测设备10的数据信号通过其传输(即传导)并到达背侧电触点部分1373。As shown in Figure 19B, a plurality of conductive interconnecting contacts 1386 may be positioned on the front side of the intermediate flow cell device 1362 to electrically couple the device circuit 24 of at least one photodetector 10 within each cavity 1340 of the support frame 1334 to the electrical contact portion 1386 of the via 1384 of the support frame 1334. Each interconnecting contact 138 may extend over the portion of the top side 22 of the photodetector 10 containing the exposed portion of the circuit 24, over the portion of the photodetector 10 adjacent to the edge cavity portion 1352 on the top side of the support material 1360, and over the portion of the exposed upper surface of the front electrical contact portion 137 of the via 1384. Thus, the interconnecting contact 138 can electrically couple the circuit 24 of at least one photodetector within the cavity 1340 to the via 1384 extending through the support frame 1334, thereby transmitting (i.e., conducting) data signals from at least one photodetector 10 through it to the back electrical contact portion 1373.

在图19C中,绝缘材料部分1382可以定位在互连触点1386上方。绝缘材料1382可以至少在互连触点1386的暴露表面区域上方延伸。绝缘材料1382也可以在支撑框架1334的顶侧1336上方在相邻的互连触点1386之间延伸。这样,绝缘材料1382可以在中间流动池装置1262的顶侧覆盖或包裹其至少一部分导电组件或部分。绝缘材料1382可包括基本上为平面和/或光滑的暴露的上表面1383,如图19C所示。例如,绝缘材料1382的上表面1383可以包括/定义亚微米尺度的表面粗糙度。在一些这样的示例中,绝缘材料1382的上表面1383可以包括/限定小于或等于50nm,或小于或等于10nm的表面粗糙度。在一个示例中,绝缘材料1382的上表面1383可包括或限定1-2nm范围内的表面粗糙度。In Figure 19C, the insulating material portion 1382 may be positioned above the interconnecting contact 1386. The insulating material 1382 may extend at least over the exposed surface area of the interconnecting contact 1386. The insulating material 1382 may also extend between adjacent interconnecting contacts 1386 above the top side 1336 of the support frame 1334. Thus, the insulating material 1382 may cover or enclose at least a portion of the conductive components or portions of the intermediate flow cell device 1262 on its top side. The insulating material 1382 may include a substantially planar and/or smooth exposed upper surface 1383, as shown in Figure 19C. For example, the upper surface 1383 of the insulating material 1382 may include/define a submicron-scale surface roughness. In some such examples, the upper surface 1383 of the insulating material 1382 may include/define a surface roughness less than or equal to 50 nm, or less than or equal to 10 nm. In one example, the upper surface 1383 of the insulating material 1382 may include or define a surface roughness in the range of 1-2 nm.

背侧接触1372的暴露部分可与另一个结构或装置配合以传输来自各个光检测设备10的数据信号。在图19C中,导电引线或球1398(例如,部分球形)或可以定位在过孔1384的背侧电触点部分1373的暴露表面上方(例如,在其上)以将空腔1340内的至少一个光检测设备10的信号传输或传导至例如生物传感器和/或生物测定系统。球1398可以包括任何导电材料,例如金属焊料。每一个球1398可以在相应的背侧电触点部分1373的暴露表面上方、相邻于相应的背侧电触点部分1373的支撑材料1360的暴露下表面上方以及光检测设备10上与对应的背侧电触点部分1373相关的背侧26的一部分上方延伸,如图19C所示。球1398可包括球栅布置(BGA)型表面安装包装结构的中间流动池装置1362(以及最终由其形成的一个或多个流动池)。The exposed portion of the back contact 1372 can cooperate with another structure or device to transmit data signals from the respective photodetectors 10. In FIG. 19C, conductive leads or balls 1398 (e.g., partially spherical) may be positioned above (e.g., on) the exposed surface of the back contact portion 1373 of the via 1384 to transmit or conduct signals from at least one photodetector 10 within the cavity 1340 to, for example, a biosensor and/or a bioassay system. The balls 1398 may comprise any conductive material, such as metal solder. Each ball 1398 may extend above the exposed surface of the corresponding back contact portion 1373, above the exposed lower surface of the support material 1360 adjacent to the corresponding back contact portion 1373, and above a portion of the back side 26 associated with the corresponding back contact portion 1373 on the photodetector 10, as shown in FIG. 19C. Sphere 1398 may include intermediate flow pool device 1362 (and one or more flow pools ultimately formed therefrom) of a ball grid arrangement (BGA) type surface mount packaging structure.

可由本文公开的中间流动池装置形成至少一个流动池,例如通过在光检测设备上形成反应结构,在光检测设备的反应结构上形成反应位点,将光检测设备加盖,和/或切割中间流动池装置。此外,通过将中间流动池切成包括至少一个光检测设备、在其上方延伸的盖子和在光检测设备和盖子之间形成的流体通道的一个或多个离散的池,可以经由中间流动池形成至少一个流动池。如上所述,例如,支撑框架1334可以包括视觉指示以帮助在加盖和/或切割操作过程中对齐。At least one flow cell can be formed from the intermediate flow cell device disclosed herein, for example, by forming a reaction structure on a photodetector, forming reaction sites on the reaction structure of the photodetector, capping the photodetector, and/or cutting the intermediate flow cell device. Furthermore, at least one flow cell can be formed via the intermediate flow cell by cutting the intermediate flow cell into one or more discrete cells comprising at least one photodetector, a cap extending above it, and a fluid channel formed between the photodetector and the cap. As described above, for example, the support frame 1334 may include visual indicators to aid in alignment during the capping and/or cutting operations.

在一些示例中,可在形成电耦联至其至少一个光检测设备的背侧接触之前,经由中间流动池形成一个或多个流动池。例如,可由图19A中间流动池装置1362、图16A的中间流动池装置1062、图17A的中间流动池装置1162、图18A的中间流动池装置1262或图19B或19C中的间流动池装置1362形成至少一个流动池1302。在一些其他示例中,可在形成电耦联至其至少一个光检测设备的背侧接触之后,经由中间流动池形成一个或多个流动池。例如,可由图16D中的中间流动池装置1062、图17C的的中间流动池装置1162、图18C的的中间流动池装置1262或图19C的中间流动池装置1362形成至少一个流动池1302。In some examples, one or more flow cells may be formed via an intermediate flow cell before forming a back contact electrically coupled to at least one of its photodetectors. For example, at least one flow cell 1302 may be formed by the intermediate flow cell device 1362 of FIG. 19A, the intermediate flow cell device 1062 of FIG. 16A, the intermediate flow cell device 1162 of FIG. 17A, the intermediate flow cell device 1262 of FIG. 18A, or the intermediate flow cell device 1362 of FIG. 19B or 19C. In some other examples, one or more flow cells may be formed via an intermediate flow cell after forming a back contact electrically coupled to at least one of its photodetectors. For example, at least one flow cell 1302 may be formed by the intermediate flow cell device 1062 of FIG. 16D, the intermediate flow cell device 1162 of FIG. 17C, the intermediate flow cell device 1262 of FIG. 18C, or the intermediate flow cell device 1362 of FIG. 19C.

图20示出了由图19C的中间流动池装置1362形成的一个或多个流动池1302。尽管示出了使用图19B的中间流动池装置1362形成图20的一个或多个流动池1302,但同样可采用例如图16A或16D的中间流动池装置1062、图17A或17C的中间流动池装置1162、图18A、18B或18C的中间流动池装置1262或图19A或19B的中间流动池装置1362。Figure 20 illustrates one or more flow cells 1302 formed by the intermediate flow cell device 1362 of Figure 19C. Although the intermediate flow cell device 1362 of Figure 19B is shown to form one or more flow cells 1302 of Figure 20, the same can also be used, for example, the intermediate flow cell device 1062 of Figure 16A or 16D, the intermediate flow cell device 1162 of Figure 17A or 17C, the intermediate flow cell device 1262 of Figure 18A, 18B or 18C, or the intermediate flow cell device 1362 of Figure 19A or 19B.

如图20所示,盖子/覆盖物1396可以在中间流动池装置1362的前侧/顶侧上方延伸。例如,盖子1396的下表面1397可以贴附到中间流动池装置1362的暴露的上表面,如绝缘材料1382的上表面1383,如图20所示。这样,盖子1396可以在定位在每一个空腔1340内的至少一个光检测设备10的上部部分20上方延伸,该光检测设备10可包括具有如上所述的检测器表面的反应结构。As shown in Figure 20, the cover/cover 1396 may extend over the front/top side of the intermediate flow cell device 1362. For example, the lower surface 1397 of the cover 1396 may be attached to an exposed upper surface of the intermediate flow cell device 1362, such as the upper surface 1383 of the insulating material 1382, as shown in Figure 20. In this way, the cover 1396 may extend over the upper portion 20 of at least one photodetector 10 positioned within each cavity 1340, the photodetector 10 including a reaction structure having a detector surface as described above.

如图20所示,盖子1396的下表面1397可在定位在每一个空腔1340内的至少一个光检测设备10的上部部分22上方隔开,使得在其间形成流体通道1390。每一个流体通道1390设为(例如,使其尺寸和形状设为)沿相关的至少一个光检测设备10的反应结构20的检测器表面引导流体,如反应溶液。如图20所示,流体通道1390的侧面可由绝缘材料1382和/或前侧电触点部分1386限定。流体通道1390的区域可以基本上与每一个对应空腔1340的至少一个光检测设备10对齐/重叠。例如,流体通道1390的区域可以是与每一个对应空腔1340的至少一个光检测设备10的有效区域基本上对齐和一致/相符的,如图20所示。在一些其他示例中,流体通道1390的区域可以与每一个对应空腔1340的至少一个光检测设备10的有效区域对齐并延伸到该区域外面,如图21所示。如上所述,支撑框架1334可包括视觉指示以帮助对准盖子1396的位置。As shown in Figure 20, the lower surface 1397 of the cover 1396 may be spaced above the upper portion 22 of at least one photodetector 10 positioned within each cavity 1340, thereby forming a fluid channel 1390 therebetween. Each fluid channel 1390 is configured (e.g., sized and shaped such that it guides fluid, such as a reaction solution, along the detector surface of the reaction structure 20 of the associated at least one photodetector 10. As shown in Figure 20, the sides of the fluid channel 1390 may be defined by an insulating material 1382 and/or a front electrical contact portion 1386. The region of the fluid channel 1390 may be substantially aligned/overlapping with at least one photodetector 10 of each corresponding cavity 1340. For example, the region of the fluid channel 1390 may be substantially aligned and consistent/conform to the effective region of at least one photodetector 10 of each corresponding cavity 1340, as shown in Figure 20. In some other examples, the region of the fluid channel 1390 may be aligned with and extend beyond the effective region of at least one photodetector 10 of each corresponding cavity 1340, as shown in Figure 21. As described above, the support frame 1334 may include visual indicators to help align the position of the cover 1396.

在一些示例中,流体通道1390可包括例如约50-400μm范围内或者在约80-200μm范围内的高度(在盖子1396的下表面1397和至少一个光检测设备10的上部部分22(例如,其检测器表面之间延伸)。在一个示例中,流体通道1390的高度为约100μm。盖子1362的厚度可为例如约300μm至约1000μm。In some examples, the fluid channel 1390 may include a height in the range of about 50-400 μm or about 80-200 μm (extending between the lower surface 1397 of the cover 1396 and the upper portion 22 of at least one photodetector 10, e.g., its detector surface). In one example, the height of the fluid channel 1390 is about 100 μm. The thickness of the cover 1362 may be, for example, about 300 μm to about 1000 μm.

在一些其他示例中,盖子1396可以经由不同于绝缘材料1382和/或前侧电触点1386的中间层/部分间接地耦联到至少一个光检测设备10、支撑材料1360和/或支撑框架1334的上表面,其可以至少部分限定或不限定流体通道1390的侧面。在其他示例中,盖子1362可以直接耦联到至少一个光检测设备10、支撑材料1360和/或支撑框架1334的上表面(例如,其绝缘材料或其过孔1384,如经由低自发荧光粘合剂与其直接结合)。在这样的示例中,盖子1362可包括侧壁部分,其将在至少一个光检测设备10上方延伸的盖子1396的下表面1397在至少一个光检测设备10的上部部分22上面隔开。这样的盖子1362的侧壁部分可以限定流体通道1390的侧面。In some other examples, the cover 1396 may be indirectly coupled to the upper surface of at least one photodetector 10, support material 1360, and/or support frame 1334 via an intermediate layer/part different from the insulating material 1382 and/or the front electrical contacts 1386, which may at least partially define or not define the side of the fluid channel 1390. In other examples, the cover 1362 may be directly coupled to the upper surface of at least one photodetector 10, support material 1360, and/or support frame 1334 (e.g., its insulating material or its vias 1384, such as via a low self-fluorescent adhesive). In such an example, the cover 1362 may include a sidewall portion that spaces the lower surface 1397 of the cover 1396 extending above at least one photodetector 10 over the upper portion 22 of at least one photodetector 10. Such a sidewall portion of the cover 1362 may define the side of the fluid channel 1390.

同样如图20所示,盖子1362可包括至少一个口1362,其设为与流体通道1390以及可能的其他口(未示出)流体流体接合。例如,其他口可以来自包括反应溶液或另一种生物或化学物质的盒(cartridge)或工作站。在一些示例中,盖子1362可包括在每一个流体通道1390内相关联的至少两个口1392作为流体通道1390的入口和出口。在一些示例中,至少两个口1392的直径可以是约750μm。至少一个口1362允许试剂流体或溶液流入相关联的流体通道1390,并且可能由其中通过。如上文中所解释的,在流体通道1390中在试剂溶液和上部部分22上的反应结构20的检测器表面上的反应位点之间发生化学反应。当通过盖子1362发光时,流动池1302的光检测设备10能够感知在流体通道1390中发生的化学反应并产生响应于该反应的信号。如上文中所解释的,信号可以通过光检测设备10的电路24传导到背侧接触1372(以及球触点1398,如果提供的话)。因此盖子1362可以包括对从流动池1302外部向流体通道1390传播/传播到流体通道1390中的激发光来说透明的材料。应注意,激发光可以任何角度和沿相同或不同的角度接近盖子1362。在一些示例中,盖子1362可包括至少对激发光来说光学透明并且具有低自发荧光或无自发荧光的材料,例如但不限于,环烯烃共聚物(COC)。As also shown in Figure 20, the cover 1362 may include at least one port 1362 configured to fluidly engage with the fluid channel 1390 and possibly other ports (not shown). For example, the other ports may originate from a cartridge or workstation containing a reaction solution or another biological or chemical substance. In some examples, the cover 1362 may include at least two ports 1392 associated within each fluid channel 1390 as an inlet and outlet for the fluid channel 1390. In some examples, the diameter of the at least two ports 1392 may be approximately 750 μm. At least one port 1362 allows reagent fluid or solution to flow into and possibly through the associated fluid channel 1390. As explained above, a chemical reaction occurs in the fluid channel 1390 between the reagent solution and the reaction site on the detector surface of the reaction structure 20 on the upper portion 22. When light is emitted through the cover 1362, the photodetector 10 of the flow cell 1302 is able to sense the chemical reaction occurring in the fluid channel 1390 and generate a signal in response to that reaction. As explained above, the signal can be transmitted via circuitry 24 of the photodetector 10 to the back contact 1372 (and ball contact 1398, if provided). Therefore, the cover 1362 may comprise a material transparent to excitation light propagating from outside the flow cell 1302 into/from the fluid channel 1390. It should be noted that the excitation light can approach the cover 1362 at any angle and at the same or different angles. In some examples, the cover 1362 may comprise a material that is at least optically transparent to the excitation light and has low or no autofluorescence, such as, but not limited to, cyclic olefin copolymers (COCs).

如图20所示,反应结构20可在将盖子1362附接到中间流动池装置1362之前或之后定位在每一个光检测设备10上部部分22上。如上文中和下文中进一步所解释的,每一个光检测设备10的上部部分22的反应结构20的检测器表面可在每一个对应的光检测设备10的整个有效区域上方延伸。如上文中所讨论的,反应结构20的检测器表面可包括延伸到反应结构20中的纳米孔16和在纳米孔16之间并围绕纳米孔16延伸的平面间隙表面。As shown in Figure 20, the reaction structure 20 may be positioned on the upper portion 22 of each photodetector 10 before or after the cap 1362 is attached to the intermediate flow cell device 1362. As further explained above and below, the detector surface of the reaction structure 20 on the upper portion 22 of each photodetector 10 may extend over the entire effective area of each corresponding photodetector 10. As discussed above, the detector surface of the reaction structure 20 may include nanopores 16 extending into the reaction structure 20 and planar gap surfaces extending between and around the nanopores 16.

可对每一个光检测设备10的检测器表面进行功能化(例如,以适合进行指定反应的方式进行化学或物理修饰)。例如,可对检测器表面进行功能化并且可使其包括位于纳米孔16上/内的其上固定有一个或多个分子的至少一个反应位点。反应位点可包括设为引发反应和/或形成响应于激发光而产生或发射光信号的反应产物的生物或化学物质。在特定的示例中,反应位点可以包括固定在纳米孔16内的检测器表面上的生物分子(例如,寡核苷酸)的簇或集落。例如,在用反应溶液处理之后,反应位点可以响应于入射激发光而产生光发射。可从任何发光系统或来源(未示出)发射或产生激发光,该发光系统或来源可以是或不是流动池1302的一部分。在一些示例中,发光系统可以发射特定波长或特定多个波长的激发光,该激发光激发反应位点的生物或化学物质(例如,由反应溶液引发的反应和/或由反应溶液在反应位点114形成的反应产物)。The detector surface of each photodetector 10 can be functionalized (e.g., chemically or physically modified in a manner suitable for carrying out a specified reaction). For example, the detector surface can be functionalized and can include at least one reaction site located on/within a nanopore 16 on which one or more molecules are immobilized. The reaction site can include a biological or chemical substance configured to initiate a reaction and/or form a reaction product that generates or emits a light signal in response to excitation light. In a particular example, the reaction site can include clusters or colonies of biomolecules (e.g., oligonucleotides) immobilized on the detector surface within the nanopore 16. For example, after treatment with a reaction solution, the reaction site can generate light emission in response to incident excitation light. Excitation light can be emitted or generated from any light-emitting system or source (not shown), which may or may not be part of the flow cell 1302. In some examples, the light-emitting system can emit excitation light of a specific wavelength or a specific number of wavelengths that excites the biological or chemical substance at the reaction site (e.g., a reaction initiated by a reaction solution and/or a reaction product formed by the reaction solution at the reaction site 114).

最初,光检测设备10的反应结构20的纳米孔16的反应位点可以不包括指定反应。如上文中所讨论的,反应位点可包括固定到纳米孔16的下表面和/或侧表面上的检测器表面的生物或化学物质。在特定示例中,反应位点位于至少一个相应的光传感器18的开口附近,使得在通过用反应溶液处理而发生指定反应之后从反应位点发出的指定或预定的光发射传播通过反应结构20、通过至少一个相应的光传感器18并传播到至少一个相应的光传感器12。Initially, the reaction sites of the nanopores 16 of the reaction structure 20 of the photodetector 10 may not include a designated reaction. As discussed above, the reaction sites may include biological or chemical substances attached to the detector surface on the lower and/or side surfaces of the nanopores 16. In a particular example, the reaction sites are located near the opening of at least one corresponding photosensor 18, such that after a designated reaction occurs by treatment with a reaction solution, the emission of designated or predetermined light from the reaction sites propagates through the reaction structure 20, through at least one corresponding photosensor 18, and to at least one corresponding photosensor 12.

单个反应位点的生物或化学物质可以是相似或相同的(例如,具有共有序列的分析物(例如,寡核苷酸)集落)。然而,在其他示例中,单个反应位点和/或纳米孔16可包括不同的生物或化学物质。在指定反应之前,反应位点可包括至少一个分析物(例如,目标分析物)。例如,分析物可以是寡核苷酸或其集落(例如,目标寡核苷酸)。寡核苷酸可具有有效的共有序列并与预定或特定的荧光标记的生物分子(如荧光标记的核苷酸)结合。The biological or chemical substance at a single reaction site can be similar or identical (e.g., a colony of an analyte (e.g., an oligonucleotide) with a shared sequence). However, in other examples, a single reaction site and/or nanopore 16 may comprise a different biological or chemical substance. Prior to the specified reaction, the reaction site may comprise at least one analyte (e.g., a target analyte). For example, the analyte may be an oligonucleotide or a colony thereof (e.g., a target oligonucleotide). The oligonucleotide may have a valid shared sequence and bind to a predetermined or specific fluorescently labeled biomolecule (e.g., a fluorescently labeled nucleotide).

然而,在指定反应之前,荧光标记的生物分子的荧光团不会加入或结合到反应位点114处的生物或化学物质(例如,寡核苷酸)中。为实现指定反应(即,将荧光标记的生物分子加入到反应位点114的生物或化学物质中),流动池1303可将反应溶液流提供到流体通道1390中,从而进入反应结构20。反应溶液可以是任何溶液。在一些示例中,反应溶液可包括液体。例如,反应溶液可以是水性溶液。在一个实施方式中,反应溶液包含一种或多种核苷酸,它们中的至少一些是荧光标记的,反应溶液还包含一种或多种生物分子,如聚合物酶,其将核苷酸加入反应位点的生长的寡核苷酸中,从而用荧光标记的核苷酸来标记寡核苷酸。在该实施方式中,流动池1302可提供洗涤溶液以去除没有加入到寡核苷酸中的任何游离核苷酸。随后可用激发光照射反应位点,在那些加入了荧光标记的核苷酸的反应位点中引发荧光。未加入荧光标记的核苷酸的反应位点在入射激发光下不发光。However, prior to the designated reaction, the fluorophore of the fluorescently labeled biomolecule is not added to or bound to the biological or chemical substance (e.g., oligonucleotide) at reaction site 114. To achieve the designated reaction (i.e., adding the fluorescently labeled biomolecule to the biological or chemical substance at reaction site 114), flow cell 1303 may provide a flow of reaction solution into fluid channel 1390, thereby entering reaction structure 20. The reaction solution can be any solution. In some examples, the reaction solution may include a liquid. For example, the reaction solution may be an aqueous solution. In one embodiment, the reaction solution contains one or more nucleotides, at least some of which are fluorescently labeled, and the reaction solution also contains one or more biomolecules, such as polymerases, which add nucleotides to the growing oligonucleotide at the reaction site, thereby labeling the oligonucleotide with the fluorescently labeled nucleotide. In this embodiment, flow cell 1302 may provide a washing solution to remove any free nucleotides not added to the oligonucleotide. The reaction site may then be irradiated with excitation light, initiating fluorescence in those reaction sites where fluorescently labeled nucleotides have been added. Reaction sites where no fluorescently labeled nucleotides have been added do not emit light under incident excitation light.

如图20和21所示,由于盖子1390(直接或间接地)连接到与每一个空腔1340相关的支撑框架1334和/或支撑材料1360的区域,每一个流体通道1390的区域设为整个在反应结构20的检测器表面上方延伸,使得每一个流体通道1390横跨对应空腔1340的至少一个光检测设备10的整个(例如,至少95%或至少99%或100%)有效区域1306。由于流体通道1390与每一个对应空腔1340或多个对应空腔1340的至少一个光检测设备10的有效区域1306对齐或延伸通过该有效区域1306,因此流动池1302可以包括每一个对应空腔1340内的至少一个光检测设备10的约100%的有效区域1306可用于或可供试剂递送和发光。在一个示例中,对应空腔1340的光检测设备10的模具尺寸可以是约8mm x 9mm,其有效区域1306可以是约7mmx 8mm。然而,光检测设备10的模具尺寸和/或有效区域1306可在例如至多约25mm x 25mm范围内。如上所述,每一个流体通道1390能够与每一个对应空腔1340或多个空腔1340的至少一个光检测设备10的有效区域1306对齐或延伸通过至少一个光检测设备10的有效区域1306(以及至少一个光检测设备10自身)。因此,流体通道1390的面积可大于每一个对应空腔1340或多个对应空腔1340的至少一个光检测设备10的有效区域1306。As shown in Figures 20 and 21, since the cover 1390 is (directly or indirectly) connected to the area of the support frame 1334 and/or support material 1360 associated with each cavity 1340, the area of each fluid channel 1390 is configured to extend entirely above the detector surface of the reaction structure 20, such that each fluid channel 1390 spans the entire (e.g., at least 95% or at least 99% or 100%) effective area 1306 of at least one photodetector 10 in the corresponding cavity 1340. Because the fluid channel 1390 is aligned with or extends through the effective area 1306 of at least one photodetector 10 in each or multiple corresponding cavities 1340, the flow cell 1302 may include approximately 100% of the effective area 1306 of at least one photodetector 10 within each corresponding cavity 1340 for reagent delivery and luminescence. In one example, the mold size of the photodetector 10 corresponding to cavity 1340 can be approximately 8 mm x 9 mm, and its effective area 1306 can be approximately 7 mm x 8 mm. However, the mold size and/or effective area 1306 of the photodetector 10 can be, for example, up to approximately 25 mm x 25 mm. As described above, each fluid channel 1390 can be aligned with or extend through the effective area 1306 of at least one photodetector 10 in each or multiple cavities 1340 (and at least one photodetector 10 itself). Therefore, the area of the fluid channel 1390 can be larger than the effective area 1306 of at least one photodetector 10 in each or multiple cavities 1340.

可由本文公开的中间流动池装置形成多个流动池1302。例如,图20和22示出了一个或多个离散的流动池1302的形成,它们可由中间流动池装置1362形成。如图20所示,中间流动池装置1362可在切割线1304处切下以独立的中间流动池装置1362的部分分成一个或多个独立和不同的流动池。应注意,可在将盖子1396耦联到中间流动池装置中间流动池装置1362之后或之前切下该中间流动池装置1362。类似地,可在形成光检测设备10的上表面上形成其反应结构20和/或纳米孔16上/中的反应位点之后或之前切下中间流动池装置1362表面。作为另一个示例,可在形成流动池背侧电触点(如球触点1398)之后或之前切下中间流动池装置1362。如上所述,支撑框架1334可包括视觉指示以帮助在切割中间流动池装置1362的过程中对齐。Multiple flow cells 1302 can be formed from the intermediate flow cell device disclosed herein. For example, Figures 20 and 22 illustrate the formation of one or more discrete flow cells 1302, which can be formed from the intermediate flow cell device 1362. As shown in Figure 20, the intermediate flow cell device 1362 can be cut at the cutting line 1304 to divide it into one or more independent and distinct flow cells as individual portions of the intermediate flow cell device 1362. It should be noted that the intermediate flow cell device 1362 can be cut off after or before the cap 1396 is coupled to it. Similarly, the surface of the intermediate flow cell device 1362 can be cut off after or before the formation of its reaction structure 20 and/or reaction sites on/in the nanopores 16 on the upper surface of the photodetector 10. As another example, the intermediate flow cell device 1362 can be cut off after or before the formation of the back-side electrical contacts (such as ball contacts 1398) of the flow cell. As described above, the support frame 1334 may include visual indicators to help align the intermediate flow pool device 1362 during the cutting process.

如图22所示,可将中间流动池装置1362切下以形成多个独立和不同流动池1302A,1302B,1302C。应注意,尽管在本文中使用三个流动池1302A,1302B,1302C示出了从中间流动池装置形成流动池,但同样可使用任何数量的流动池可以(例如,一个流动池,两个流动池,三个流动池,四个流动池,五个流动池等)。切割流动池1302A,1302B,1302C可包括相同数量和/或结构的光检测设备10/空腔1340,或者可包括不同数量和/或结构的光检测设备10/空腔1340。例如,从中间流动池装置1362形成的第一切割流动池1302A可包括单个空腔1340(流体通道1390定位于在其整个(例如,至少95%或至少99%或100%)有效区域上方),该单个空腔1340包括的第一结构(例如,光检测设备10和/或光检测设备110)的第一数量的光检测设备(例如,一个或多个光检测设备),如图22所示。也可由中间流动池装置1362形成第二切割流动池1302B,其包括一对空腔1340(流体通道1390定位于在其整个(例如,至少95%或至少99%或100%)有效区域上方),该空腔1340包括第二结构(例如,光检测设备10和/或光检测设备110)的第二数量的光检测设备(例如,一个或多个光检测设备)。第二切割流动池1302B的光检测设备的第二数量和/或第二结构可与第一切割流动池1302A相同或不同。同样如图22所示,还可由中间流动池装置1362形成第三切割流动池1302C,其可包括三个或更多个空腔1340(流体通道1390定位于在其整个(例如,至少95%或至少99%或100%)有效区域上方),该空腔1340包括第三结构(例如,光检测设备10和/或光检测设备110)的第三数量的光检测设备(例如,一个或多个光检测设备)。第三切割流动池1302C的光检测设备的第三数量和/或第三结构可与第一切割流动池1302A和第二切割流动池1302B相同或不同。这样,可通过空腔1340的数量和/或结构(以及由此得到的其至少一个光检测设备10的数量和/或结构)来测定或设置由中间流动池装置1462形成的不同流动池1302A,1302B,1302C的感知吞吐量,该空腔1340从中间流动池装置1362切下以形成不同流动池1302A,1302B,1302C。As shown in Figure 22, the intermediate flow cell device 1362 can be cut to form multiple independent and different flow cells 1302A, 1302B, 1302C. It should be noted that although three flow cells 1302A, 1302B, 1302C are used herein to illustrate the formation of flow cells from the intermediate flow cell device, any number of flow cells can be used (e.g., one flow cell, two flow cells, three flow cells, four flow cells, five flow cells, etc.). Cutting the flow cells 1302A, 1302B, 1302C may include the same number and/or structure of photodetector devices 10/cavities 1340, or may include different numbers and/or structures of photodetector devices 10/cavities 1340. For example, a first cut flow pool 1302A formed from the intermediate flow pool device 1362 may include a single cavity 1340 (fluid channels 1390 positioned over its entire (e.g., at least 95% or at least 99% or 100%) effective area), the single cavity 1340 including a first structure (e.g., light detection device 10 and/or light detection device 110) and a first number of light detection devices (e.g., one or more light detection devices), as shown in FIG22. A second cut flow pool 1302B may also be formed from the intermediate flow pool device 1362, which includes a pair of cavities 1340 (fluid channels 1390 positioned over its entire (e.g., at least 95% or at least 99% or 100%) effective area), the cavity 1340 including a second structure (e.g., light detection device 10 and/or light detection device 110) and a second number of light detection devices (e.g., one or more light detection devices). The second number and/or second structure of the photodetectors in the second cutting flow cell 1302B may be the same as or different from that in the first cutting flow cell 1302A. Similarly, as shown in FIG22, a third cutting flow cell 1302C may also be formed by the intermediate flow cell device 1362, which may include three or more cavities 1340 (fluid channels 1390 are positioned over their entire (e.g., at least 95% or at least 99% or 100%) effective area), each cavity 1340 including a third number of photodetectors (e.g., one or more photodetectors) with a third structure (e.g., photodetector 10 and/or photodetector 110). The third number and/or third structure of the photodetectors in the third cutting flow cell 1302C may be the same as or different from that in the first cutting flow cell 1302A and the second cutting flow cell 1302B. Thus, the sensing throughput of different flow cells 1302A, 1302B, 1302C formed by the intermediate flow cell device 1462 (which is cut from the intermediate flow cell device 1362 to form different flow cells 1302A, 1302B, 1302C) can be determined or set by the number and/or structure of the cavities 1340 (and the number and/or structure of at least one optical detection device 10 therefrom).

应当理解,以上描述仅是示例性的,而非限制性的。例如,上述示例(和/或其多方面)可彼此结合使用。此外,可进行许多修改以使特定的情况或材料适应各个示例的教导而不背离其范围。尽管在本文中描述了材料的尺寸和类型,它们旨在限定各示例中的一些的参数,但它们绝不是限定到所有示例并且仅为例示性的。当阅读以上说明时,许多其他示例对于本领域技术人员将是显而易见的。因此,应当参照所附权利要求书以及此类权利要求享有的全部等效范围来确定各种示例的范围。It should be understood that the above description is exemplary only and not restrictive. For example, the above examples (and/or aspects thereof) may be used in combination with each other. Furthermore, many modifications may be made to adapt a particular situation or material to the teachings of the various examples without departing from their scope. Although the dimensions and types of materials are described herein, they are intended to define some parameters in the various examples, but they are by no means limiting to all examples and are merely illustrative. Many other examples will be apparent to those skilled in the art upon reading the above description. Therefore, the scope of the various examples should be determined by reference to the appended claims and the full scope of equivalents enjoyed by such claims.

在所附权利要求中,术语“包括(including)”和“其中(in which)”用作对应术语“包括(comprising)”和“其中(wherein)”的简洁英语等价物。此外,在以下权利要求中,术语“第一”、“第二”和“第三”仅用作参考标记,并非旨在对其目标强加数量、结构或其他要求。本文中术语“基于”的形式包括其中要素部分基于的关系以及要素完全基于的关系。术语“限定”的形式包括要素被部分限定的关系以及其中要素被完全限定的关系。此外,以下权利要求书的限制不是以装置加功能的格式写的,也不旨在基于35U.S.C.§112第六段进行解释,除非且直到这样的权利要求限制明确使用“用于……的装置”一词,然后才是进一步结构的功能腔的陈述。应理解不一定所有的上述对象或优点都可以根据任何特定的示例来实现。因此,例如,那些本领域技术人员将认识到,本文描述的装置、系统和方法可以实现或优化本文所教导的一个优点或一组优点的方式实施或进行,而不必实现本文所教导或建议的其他目的或优点。In the appended claims, the terms “including” and “in which” are used as concise English equivalents to the corresponding terms “comprising” and “wherein”. Furthermore, in the following claims, the terms “first,” “second,” and “third” are used only as reference marks and are not intended to impose quantity, structure, or other requirements on their objectives. The term “based on” in this document includes relationships where an element is partially based and relationships where an element is completely based. The term “defined” in this document includes relationships where an element is partially defined and relationships where an element is completely defined. Furthermore, the limitations of the following claims are not written in the form of means plus function, nor are they intended to be interpreted based on paragraph 6 of 35 U.S.C. § 112, unless and until such a claim limitation expressly uses the term “means for…” before a statement of a functional cavity for further construction. It should be understood that not all of the foregoing objects or advantages can be achieved according to any particular example. Therefore, for example, those skilled in the art will recognize that the means, systems, and methods described herein can be implemented or carried out in a manner that achieves or optimizes one or more advantages taught herein, without necessarily achieving other objects or advantages taught or suggested herein.

尽管仅结合有限数量的示例详细描述了本发明,但是应当容易地理解,本发明不限于这种公开的示例。而是,可以对本发明进行修改以结合在前文中未描述但与本发明的精神和范围相称的任何数量的变型、变更、替换或等同布置。另外,尽管已经描述了各种示例,但是应当理解,本发明的方面可以仅包括一个示例或所描述的示例中的一些。同样,尽管一些公开内容被描述为具有一定数量的要素,但是应当理解,可以以少于或大于该一定数量的要素来实施示例。Although the invention has been described in detail with reference to only a limited number of examples, it should be readily understood that the invention is not limited to such disclosed examples. Rather, modifications can be made to the invention to incorporate any number of variations, alterations, substitutions, or equivalent arrangements not described above but commensurate with the spirit and scope of the invention. Furthermore, although various examples have been described, it should be understood that aspects of the invention may include only one example or some of the examples described. Similarly, although some disclosures are described as having a certain number of elements, it should be understood that the examples may be implemented with fewer or more than that number of elements.

应理解,前述概念和下文中更详细讨论的附加概念的所有组合(假设这样的概念并不相互矛盾)被认为是本文公开的发明主题的一部分。特别地,出现在本发明的结尾处的要求保护的主题的所有组合被认为是本文公开的发明主题的一部分。It should be understood that all combinations of the foregoing concepts and the additional concepts discussed in more detail below (assuming that such concepts do not contradict each other) are considered part of the inventive subject matter disclosed herein. In particular, all combinations of the claimed subject matter appearing at the end of this invention are considered part of the inventive subject matter disclosed herein.

Claims (20)

1.流动池,包括:1. A flow cell, comprising: a)支撑框架,其包括顶侧、底侧和从所述顶侧向所述底侧延伸的至少一个空腔,其中所述支撑框架还包括从所述顶侧向所述底侧延伸的至少一个导电过孔;a) A support frame including a top side, a bottom side, and at least one cavity extending from the top side to the bottom side, wherein the support frame further includes at least one conductive via extending from the top side to the bottom side. b)至少一个光检测设备,其设置于所述至少一个空腔内,其中所述至少一个光检测设备包含:b) At least one optical detection device disposed within the at least one cavity, wherein the at least one optical detection device comprises: i)上表面;及i) the upper surface; and ii)至少一个固态光检测设备,其包含形成背侧的基础晶片部分、多个光传感器、与所述多个光传感器相关联的多个光导以及电耦联到所述多个光传感器以传输基于所述多个光传感器所检测到的光子数据信号的设备电路,ii) At least one solid-state photodetector comprising a base wafer portion forming a back side, a plurality of photosensors, a plurality of photoconductors associated with the plurality of photosensors, and device circuitry electrically coupled to the plurality of photosensors to transmit photon data signals detected by the plurality of photosensors. 其中所述设备电路进一步包含通过所述基础晶片部分延伸的过孔,并且The device circuitry further includes vias extending through the base wafer portion, and 其中所述至少一个光检测设备与所述支撑框架的顶侧的至少一个导电过孔电耦联;The at least one optical detection device is electrically coupled to at least one conductive via on the top side of the support frame; c)支撑材料,其设置在所述支撑框架和所述至少一个光检测装置的外围之间的至少一个空腔内,将所述支撑框架和所述至少一个光检测设备耦联在一起;c) A support material disposed in at least one cavity between the periphery of the support frame and the at least one photodetector, thereby coupling the support frame and the at least one photodetector together; d)盖子,其在所述至少一个光检测设备上延伸并且围绕所述至少一个光检测装置的外围耦联到所述支撑框架的顶侧,d) A cover that extends from the at least one light detection device and is coupled to the top side of the support frame around the periphery of the at least one light detection device. 其中在所述盖子和所述至少一个光检测设备的至少上表面之间形成流体通道;A fluid channel is formed between the cover and at least the upper surface of the at least one optical detection device; e)电触点,其至少部分沿所述支撑框架的底侧设置并电耦联到所述支撑框架中的至少一个导电过孔。e) An electrical contact, which is at least partially disposed along the bottom side of the support frame and electrically coupled to at least one conductive via in the support frame. 2.权利要求1所述的流动池,其中所述至少一个光检测设备还包括设置在形成所述至少一个光检测设备的上表面的多个光导上方的反应结构。2. The flow cell of claim 1, wherein the at least one photodetector further comprises a reaction structure disposed above a plurality of photoguides forming the upper surface of the at least one photodetector. 3.权利要求2所述的流动池,其中所述反应结构包括位于所述至少一个光检测设备的上表面上的有效区域内的多个纳米孔。3. The flow cell of claim 2, wherein the reaction structure comprises a plurality of nanopores located within an effective region on the upper surface of the at least one photodetector. 4.权利要求1所述的流动池,其中所述盖子间接地耦联到所述支撑框架的顶侧。4. The flow tank of claim 1, wherein the cover is indirectly coupled to the top side of the support frame. 5.权利要求1所述的流动池,其中所述至少一个光检测设备包括多个光检测设备,所述多个光检测设备设置在所述至少一个空腔内。5. The flow cell of claim 1, wherein the at least one photodetector comprises a plurality of photodetectors disposed within the at least one cavity. 6.权利要求5所述的流动池,其中所述多个光检测设备包括彼此间隔开的不同的光检测设备,并且其中所述支撑材料进一步在相邻的光检测设备之间延伸。6. The flow cell of claim 5, wherein the plurality of photodetectors comprises different photodetectors spaced apart from each other, and wherein the support material further extends between adjacent photodetectors. 7.权利要求6所述的流动池,其中所述多个光检测设备包括至少两个集成式光检测设备。7. The flow cell of claim 6, wherein the plurality of photodetectors comprises at least two integrated photodetectors. 8.权利要求1所述的流动池,其中所述至少一个光检测设备包括多个光检测设备,其中所述至少一个空腔包括多个空腔,并且其中所述多个光检测设备中的每一个光检测设备设置在所述多个空腔的不同空腔中。8. The flow cell of claim 1, wherein the at least one photodetector comprises a plurality of photodetectors, wherein the at least one cavity comprises a plurality of cavities, and wherein each of the plurality of photodetectors is disposed in a different cavity of the plurality of cavities. 9.权利要求1所述的流动池,其中所述至少一个空腔从所述顶侧延伸穿过所述支撑框架到所述底侧。9. The flow cell of claim 1, wherein the at least one cavity extends from the top side through the support frame to the bottom side. 10.权利要求1所述的流动池,其中所述至少一个空腔仅部分地从所述顶侧向所述底侧延伸穿过所述支撑框架。10. The flow cell of claim 1, wherein the at least one cavity extends only partially from the top side to the bottom side through the support frame. 11.权利要求1所述的流动池,其中所述至少一个光检测设备包括至少一个互补金属氧化物半导体(CMOS)光传感器。11. The flow cell of claim 1, wherein the at least one photodetector comprises at least one complementary metal-oxide-semiconductor (CMOS) photosensor. 12.权利要求1所述的流动池,其中所述流动通道在所述至少一个光检测设备的整个有效区域上延伸。12. The flow cell of claim 1, wherein the flow channel extends over the entire effective area of the at least one photodetector. 13.方法,包括:13. Methods, including: a)将支撑框架的上表面和基板的平面支撑表面附接,所述支撑框架包括:a) Attaching the upper surface of the support frame to the planar support surface of the substrate, the support frame comprising: i.从其顶侧延伸到底侧的至少一个空腔,和i. at least one cavity extending from its top side to its bottom side, and ii.从所述顶侧到所述底侧延伸的至少一个导电过孔;ii. At least one conductive via extending from the top side to the bottom side; b)将至少一个光检测设备定位于所述至少一个空腔内,使其顶侧定位在所述基板的平面支撑表面上,并且所述空腔的边缘部分在所述支撑框架与所述至少一个光检测设备的外周之间延伸,所述至少一个光检测设备包括有效区域和上表面,其中所述至少一个光检测设备包含至少一个固态光检测设备,所述至少一个光检测设备包含形成背侧的基础晶片部分、多个光传感器、与所述多个光传感器相关联的多个光导以及电耦联到所述多个光传感器以传输基于所述多个光传感器所检测到的光子数据信号的设备电路,b) Positioning at least one photodetector within the at least one cavity, with its top side positioned on the planar support surface of the substrate, and an edge portion of the cavity extending between the support frame and the outer periphery of the at least one photodetector, the at least one photodetector including an effective region and a top surface, wherein the at least one photodetector comprises at least one solid-state photodetector, the at least one photodetector including a base wafer portion forming a back side, a plurality of photosensors, a plurality of photoconductors associated with the plurality of photosensors, and device circuitry electrically coupled to the plurality of photosensors to transmit photon data signals detected by the plurality of photosensors. 其中所述设备电路包含通过所述基础晶片部分延伸到其背侧的过孔,The device circuitry includes vias extending through the base wafer portion to its back side. 其中所述设备与所述支撑框架的顶侧的至少一个导电过孔电耦联;The device is electrically coupled to at least one conductive via on the top side of the support frame. c)将所述空腔的边缘部分用支撑材料填充以将所述支撑框架和所述至少一个光检测设备耦联在一起;c) Fill the edge portion of the cavity with a support material to couple the support frame and the at least one photodetector together; d)分离所述支撑框架和所述基板;d) Separate the support frame and the substrate; e)围绕所述至少一个光检测设备的外周将盖子附接到所述支撑框架的顶侧以形成流动池,所述盖子在所述至少一个光检测设备上方延伸并在所述盖子与所述至少一个光检测设备的至少上表面之间形成流体通道;e) Attach a cover to the top side of the support frame around the outer periphery of the at least one optical detection device to form a flow pool, the cover extending above the at least one optical detection device and forming a fluid channel between the cover and at least the upper surface of the at least one optical detection device; f)将所述至少一个固态光检测设备的设备电路与所述支撑框架的顶侧的至少一个导电过孔电耦联;和f) Electrically couple the device circuitry of the at least one solid-state optical detection device to at least one conductive via on the top side of the support frame; and g)将至少部分地沿支撑框架的底侧设置的触点电耦联到所述基础晶片部分的背侧的过孔。g) Electrically couple contacts, at least partially along the bottom side of the support frame, to vias on the back side of the base wafer portion. 14.权利要求13所述的方法,还包括在附接所述盖子之前在所述至少一个光检测设备上形成反应结构,所述反应结构形成所述至少一个光检测设备的上表面并且包括定位于所述有效区域内的多个纳米孔。14. The method of claim 13, further comprising forming a reactive structure on the at least one photodetector prior to attaching the cap, the reactive structure forming an upper surface of the at least one photodetector and including a plurality of nanopores located within the effective region. 15.权利要求14所述的方法,其中分离所述支撑框架和所述基板暴露所述支撑材料的凹陷顶侧,所述支撑材料在所述支撑框架的顶侧下方并且在所述支撑框架的顶侧与所述至少一个光检测设备的顶部之间延伸,其中所述反应结构在所述支撑材料的凹陷顶侧和所述支撑框架的顶侧上延伸,并且其中所述反应结构形成平面的上表面,所述多个纳米孔从该平面的上表面延伸。15. The method of claim 14, wherein separating the support frame and the substrate exposes a recessed top side of the support material, the support material extending below the top side of the support frame and between the top side of the support frame and the top of the at least one photodetector, wherein the reactive structure extends on the recessed top side of the support material and the top side of the support frame, and wherein the reactive structure forms an upper surface of a plane from which the plurality of nanopores extend. 16.权利要求13所述的方法,还包括获得所述至少一个光检测设备,并且其中所述至少一个光检测设备包括将至少一个互补金属氧化物半导体(CMOS)光传感器从多个集成CMOS光传感器上切下来。16. The method of claim 13, further comprising obtaining the at least one optical detection device, wherein the at least one optical detection device comprises cutting at least one complementary metal-oxide-semiconductor (CMOS) optical sensor from a plurality of integrated CMOS optical sensors. 17.权利要求13所述的方法,其中所述流体通道在所述至少一个光检测设备的整个有效区域上方延伸。17. The method of claim 13, wherein the fluid channel extends over the entire effective area of the at least one optical detection device. 18.一种制造根据权利要求1所述的流动池的方法,包括:18. A method for manufacturing a flow cell according to claim 1, comprising: 将第一支撑材料设置在支撑框架的至少一个空腔的底部部分上,所述至少一个空腔从其顶侧到其底侧仅部分延伸通过所述支撑框架;A first support material is disposed on the bottom portion of at least one cavity of the support frame, the at least one cavity extending only partially through the support frame from its top side to its bottom side; 将至少一个光检测设备定位在所述至少一个空腔内并且在所述设置的第一支撑材料上,使得所述至少一个空腔的边缘部分在所述支撑框架与所述至少一个光检测设备的外周之间延伸,所述至少一个光检测设备包括有效区域和上表面;At least one optical detection device is positioned within the at least one cavity and on the provided first support material, such that the edge portion of the at least one cavity extends between the support frame and the outer periphery of the at least one optical detection device, the at least one optical detection device including an effective area and an upper surface; 用第二支撑材料填充所述空腔的边缘部分;和The edge portion of the cavity is filled with a second support material; and 围绕所述至少一个光检测设备的外围将盖子附接到所述支撑框架的顶侧以形成流动池,所述盖子在所述至少一个光检测设备上方延伸、并在所述盖子与所述至少一个光检测设备的至少上表面之间形成流体通道。A cover is attached to the top side of the support frame around the periphery of the at least one optical detection device to form a flow pool, the cover extending above the at least one optical detection device and forming a fluid channel between the cover and at least the upper surface of the at least one optical detection device. 19.权利要求18所述的方法,其中所述流体通道在所述至少一个光检测设备的整个有效区域上方延伸。19. The method of claim 18, wherein the fluid channel extends over the entire effective area of the at least one optical detection device. 20.权利要求18所述的方法,进一步包括切割所述支撑框架。20. The method of claim 18, further comprising cutting the support frame.
HK62021038179.9A 2018-09-14 2019-09-09 Flow cells and methods related to same HK40048936B (en)

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