HK40003934B - Photonic stucture-based devices and compositions for use in luminescent imaging of multiple sites within a pixel, and methods of using the same - Google Patents
Photonic stucture-based devices and compositions for use in luminescent imaging of multiple sites within a pixel, and methods of using the sameInfo
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Description
相关申请的交叉引用CROSS-REFERENCE TO RELATED APPLICATIONS
本申请要求2016年4月22日提交的且标题为“PHOTONIC STRUCTURE-BASEDDEVICES AND COMPOSITIONS FOR USE IN LUMINESCENT IMAGING OF MULTIPLE SITESWITHIN A PIXEL,AND METHODS OF USING THE SAME”美国临时专利申请号62/326,568的利益,该临时专利申请的全部内容通过引用被并入本文。This application claims the benefit of U.S. Provisional Patent Application No. 62/326,568, filed April 22, 2016, and entitled “PHOTONIC STRUCTURE-BASED DEVICES AND COMPOSITIONS FOR USE IN LUMINESCENT IMAGING OF MULTIPLE SITES WITHIN A PIXEL, AND METHODS OF USING THE SAME,” which is incorporated herein by reference in its entirety.
领域field
本申请一般涉及发光成像。This application relates generally to luminescence imaging.
背景background
由行业领跑者开发的某些最先进的测序工具依赖于各种“合成测序(SBS)”化学物质来确定多核苷酸序列,例如DNA或RNA序列。测序可以涉及使用发光成像例如荧光显微镜检查系统以通过它们每个的荧光标记的发射波长来识别核苷酸或相同核苷酸的局部化聚簇。尽管在开发中的一些SBS化学物质可能需要仅仅一种染料,但在商业系统中通常使用多种荧光染料(多达4种),以便唯一地识别多核苷酸中的核苷酸,例如DNA中的A、G、C和T核苷酸。Some of the most advanced sequencing tools developed by industry leaders rely on various "synthesis sequencing (SBS)" chemistries to determine polynucleotide sequences, such as DNA or RNA sequences. Sequencing can involve the use of luminescent imaging, such as fluorescence microscopy systems, to identify nucleotides or localized clusters of identical nucleotides by the emission wavelength of each of their fluorescent labels. Although some SBS chemistries in development may require only one dye, multiple fluorescent dyes (up to 4) are typically used in commercial systems to uniquely identify nucleotides in a polynucleotide, such as A, G, C, and T nucleotides in DNA.
概述Overview
本发明的实施例提供了用于在像素内的多个位点的发光成像中使用的基于光子结构的设备和组成物以及使用其的方法。Embodiments of the present invention provide photonic structure-based devices and compositions for use in luminescent imaging of multiple sites within a pixel, and methods of using the same.
依据一个方面,提供了一种用于在发光成像中使用的设备。该设备可以包括成像像素阵列和布置在成像像素阵列上的光子结构。该设备还可以包括布置在光子结构上的特征阵列。特征阵列的第一特征可以布置在成像像素阵列的第一像素上,并且特征阵列的第二特征可以布置在第一像素上并在空间上从第一特征移位。第一发光体可布置在第一特征内或之上,以及第二发光体可布置在第二特征内或之上。该设备还可以包括辐射源,该辐射源被配置为在第一时间产生具有第一特性的第一光子,并且被配置为在第二时间产生具有第二特性的第二光子。第二特性可以不同于第一特性,以及第二时间可以不同于第一时间。第一像素可以选择性地接收由第一发光体在第一时间响应于第一光子而发射的冷光,并且可以选择性地接收由第二发光体在第二时间响应于第二光子而发射的冷光。According to one aspect, a device for use in luminescent imaging is provided. The device may include an imaging pixel array and a photonic structure arranged on the imaging pixel array. The device may also include a feature array arranged on the photonic structure. A first feature of the feature array may be arranged on a first pixel of the imaging pixel array, and a second feature of the feature array may be arranged on the first pixel and spatially displaced from the first feature. A first light emitter may be arranged within or above the first feature, and a second light emitter may be arranged within or above the second feature. The device may also include a radiation source configured to generate a first photon having a first characteristic at a first time, and configured to generate a second photon having a second characteristic at a second time. The second characteristic may be different from the first characteristic, and the second time may be different from the first time. The first pixel may selectively receive luminescence emitted by the first light emitter in response to the first photon at the first time, and may selectively receive luminescence emitted by the second light emitter in response to the second photon at the second time.
可选地,具有第一特性的第一光子在第一时间在光子结构内产生第一谐振图案,第一谐振图案相对于第二发光体选择性地激发第一发光体。可选地,具有第二特性的第二光子在第二时间在光子结构内产生第二谐振图案,第二谐振图案相对于第一发光体选择性地激发第二发光体。Optionally, a first photon having a first characteristic generates a first resonant pattern within the photonic structure at a first time, and the first resonant pattern selectively excites the first light emitter relative to the second light emitter. Optionally, a second photon having a second characteristic generates a second resonant pattern within the photonic structure at a second time, and the second resonant pattern selectively excites the second light emitter relative to the first light emitter.
此外或替代地,成像像素阵列、光子结构和特征阵列可选地彼此单片地集成。Additionally or alternatively, the imaging pixel array, the photonic structure, and the feature array are optionally monolithically integrated with one another.
此外或替代地,光子结构可选地包括光子晶体、光子超晶格、微腔阵列或等离子体纳米天线阵列。Additionally or alternatively, the photonic structure optionally comprises a photonic crystal, a photonic superlattice, a microcavity array, or a plasmonic nanoantenna array.
此外或替代地,特征阵列可选地包括多个阱。第一特征可以包括第一阱,第一发光体布置在该第一阱中,以及第二特征可以包括第二阱,第二发光体布置在该第二阱中。替代地,特征阵列可选地包括多个柱。第一特征可以包括第一发光体布置在其上的第一柱,以及第二特征可以包括第二发光体布置在其上的第二柱。Additionally or alternatively, the feature array may optionally include a plurality of wells. The first feature may include a first well in which the first light emitter is disposed, and the second feature may include a second well in which the second light emitter is disposed. Alternatively, the feature array may optionally include a plurality of pillars. The first feature may include a first pillar on which the first light emitter is disposed, and the second feature may include a second pillar on which the second light emitter is disposed.
此外或替代地,第一和第二特性可选地独立地选自由波长、偏振和角度组成的组。例如,第一特性可选地包括第一线偏振,以及第二特性可选地包括不同于第一线偏振的第二线偏振。可选地,第一线偏振实质上正交于第二线偏振,或者可选地,第一线偏振相对于第二线偏振旋转在约15度和约75度之间的角度。此外或替代地,第一特性可选地可以包括第一波长,以及第二特性可选地可以包括不同于第一波长的第二波长。Additionally or alternatively, the first and second characteristics may optionally be independently selected from the group consisting of wavelength, polarization, and angle. For example, the first characteristic may optionally include a first linear polarization, and the second characteristic may optionally include a second linear polarization different from the first linear polarization. Optionally, the first linear polarization is substantially orthogonal to the second linear polarization, or alternatively, the first linear polarization is rotated relative to the second linear polarization by an angle between about 15 degrees and about 75 degrees. Additionally or alternatively, the first characteristic may optionally include a first wavelength, and the second characteristic may optionally include a second wavelength different from the first wavelength.
此外或替代地,辐射源可选地包括光学部件。可选地,该设备还包括控制器,该控制器耦合到光学部件并且被配置为控制光学部件以便将第一特性施加在第一光子上并且被配置为将第二特性施加在第二光子上。可选地,光学部件包括双折射材料,该双折射材料被配置为通过控制器响应于第一控制信号而将第一光子旋转到第一线偏振,并且被配置为通过控制器响应于第二控制信号而将第二光子旋转到第二线偏振。Additionally or alternatively, the radiation source optionally includes an optical component. Optionally, the apparatus further includes a controller coupled to the optical component and configured to control the optical component so as to impart a first characteristic to the first photon and a second characteristic to the second photon. Optionally, the optical component includes a birefringent material configured to rotate the first photon to a first linear polarization in response to a first control signal by the controller, and to rotate the second photon to a second linear polarization in response to a second control signal by the controller.
此外或替代地,第一和第二光子可选地每个以彼此实质上相同的角度照射光子结构。此外或替代地,第一和第二光子可选地每个以近似垂直于光子结构的主表面的角度照射光子结构。此外或替代地,第一和第二光子可选地每个以近似平行于光子结构的主表面的角度照射光子结构。Additionally or alternatively, the first and second photons optionally each strike the photonic structure at substantially the same angle as one another. Additionally or alternatively, the first and second photons optionally each strike the photonic structure at an angle approximately perpendicular to a major surface of the photonic structure. Additionally or alternatively, the first and second photons optionally each strike the photonic structure at an angle approximately parallel to a major surface of the photonic structure.
此外或替代地,第二特征可选地从第一特征横向移位。Additionally or alternatively, the second feature is optionally laterally displaced from the first feature.
此外或替代地,特征阵列的第三特征可选地布置在第一像素上,并且在空间上从第一和第二特征中的每一个移位。该设备还可选地可包括布置在第三特征内或之上的第三发光体。辐射源可选地可以被配置成在第三时间产生具有第三特性的第三光子。可选地,第三特性可以不同于第一和第二特性,并且第三时间可以不同于第一和第二时间。可选地,第一像素选择性地接收由第三发光体在第三时间响应于第三光子而发射的冷光。此外或替代地,特征阵列的第四特征可选地布置在第一像素上,并且在空间上从第一、第二和第三特征中的每一个移位。该设备可选地还包括布置在第四特征内或之上的第四发光体。辐射源可选地被配置成在第四时间产生具有第四特性的第四光子。可选地,第四特性可以不同于第一、第二和第三特性,并且第四时间可以不同于第一、第二和第三时间。第一像素选择性地接收由第四发光体在第四时间响应于第四光子而发射的冷光。可选地,第一发光体耦合到第一核酸,第二发光体耦合到第二核酸,第三发光体耦合到第三核酸,以及第四发光体耦合到第四核酸。Additionally or alternatively, a third feature of the array of features is optionally disposed on the first pixel and spatially displaced from each of the first and second features. The device may further optionally include a third light emitter disposed within or above the third feature. The radiation source may optionally be configured to generate a third photon having a third characteristic at a third time. Optionally, the third characteristic may be different from the first and second characteristics, and the third time may be different from the first and second times. Optionally, the first pixel selectively receives luminescence emitted by the third light emitter in response to the third photon at the third time. Additionally or alternatively, a fourth feature of the array of features is optionally disposed on the first pixel and spatially displaced from each of the first, second, and third features. The device may further include a fourth light emitter disposed within or above the fourth feature. The radiation source may optionally be configured to generate a fourth photon having a fourth characteristic at a fourth time. Optionally, the fourth characteristic may be different from the first, second, and third characteristics, and the fourth time may be different from the first, second, and third times. The first pixel selectively receives luminescence emitted by the fourth light emitter in response to the fourth photon at the fourth time. Optionally, a first luminophore is coupled to the first nucleic acid, a second luminophore is coupled to the second nucleic acid, a third luminophore is coupled to the third nucleic acid, and a fourth luminophore is coupled to the fourth nucleic acid.
此外或替代地,特征阵列的第三特征可选地布置在成像像素阵列的第二像素上,并且特征阵列的第四特征可选地布置在第二像素上并在空间上从第三特征移位。该设备可选地还包括布置在第三特征内或之上的第三发光体,以及布置在第四特征内或之上的第四发光体。可选地,第二像素选择性地接收由第三发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光。可选地,第二像素选择性地接收由第四发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光。可选地,第一发光体耦合到第一核酸,第二发光体耦合到第二核酸,第三发光体耦合到第三核酸,以及第四发光体耦合到第四核酸。Additionally or alternatively, a third feature of the feature array is optionally disposed on a second pixel of the imaging pixel array, and a fourth feature of the feature array is optionally disposed on the second pixel and spatially displaced from the third feature. The device optionally further comprises a third luminophore disposed within or above the third feature, and a fourth luminophore disposed within or above the fourth feature. Optionally, the second pixel selectively receives cold light emitted by the third luminophore in response to the first photon at a first time or in response to the second photon at a second time. Optionally, the second pixel selectively receives cold light emitted by the fourth luminophore in response to the first photon at a first time or in response to the second photon at a second time. Optionally, the first luminophore is coupled to the first nucleic acid, the second luminophore is coupled to the second nucleic acid, the third luminophore is coupled to the third nucleic acid, and the fourth luminophore is coupled to the fourth nucleic acid.
此外或替代地,第一和第二特征可选地每个具有实质上圆形的横截面。此外或替代地,光子结构可选地包括六边形晶格,并且可选地成像像素是矩形的。Additionally or alternatively, the first and second features optionally each have a substantially circular cross-section.Additionally or alternatively, the photonic structure optionally comprises a hexagonal lattice, and optionally the imaging pixels are rectangular.
此外或替代地,辐射源可选地被配置成用第一和第二光子泛光照射(floodilluminate)光子结构。此外或替代地,辐射源可选地包括激光器。此外或替代地,第一和第二光子可选地独立地具有在约300nm和约800nm之间的波长。Additionally or alternatively, the radiation source is optionally configured to flood illuminate the photonic structure with the first and second photons. Additionally or alternatively, the radiation source optionally comprises a laser. Additionally or alternatively, the first and second photons optionally independently have a wavelength between about 300 nm and about 800 nm.
此外或替代地,第一发光体可选地耦合到第一核苷酸,以及第二发光体可选地耦合到第二核酸。此外或替代地,该设备可选地包括至少一个微流控特征,该微流控特征与特征阵列接触并且被配置为向第一特征和第二特征提供一种或更多种分析物的流。Additionally or alternatively, a first luminophore is optionally coupled to the first nucleotide, and a second luminophore is optionally coupled to the second nucleic acid. Additionally or alternatively, the device optionally includes at least one microfluidic feature in contact with the feature array and configured to provide a flow of one or more analytes to the first feature and the second feature.
此外或替代地,第一发光体可选地耦合到待测序的第一多核苷酸,以及第二发光体可选地耦合到待测序的第二多核苷酸。可选地,第一多核苷酸耦合到第一特征,并且可选地第二多核苷酸耦合到第二特征。此外或替代地,设备可选地还可以包括第一聚合酶,第一聚合酶将第一核酸添加到与第一多核苷酸互补并耦合的第三多核苷酸。第一核酸可选地可以耦合到第一发光体。设备可选地还可以包括第二聚合酶,第二聚合酶将第二核酸添加到与第二多核苷酸互补并耦合的第四多核苷酸。第二核酸可选地可以耦合到第二发光体。可选地,设备还可以包括使包括第一核酸和第二核酸以及第一聚合酶和第二聚合酶的第一液体流动到第一特征和第二特征内或在第一特征和第二特征之上流动的通道。Additionally or alternatively, a first luminophore is optionally coupled to a first polynucleotide to be sequenced, and a second luminophore is optionally coupled to a second polynucleotide to be sequenced. Alternatively, the first polynucleotide is coupled to a first feature, and optionally the second polynucleotide is coupled to a second feature. Additionally or alternatively, the apparatus may further comprise a first polymerase that adds a first nucleic acid to a third polynucleotide that is complementary to and coupled to the first polynucleotide. The first nucleic acid may optionally be coupled to the first luminophore. The apparatus may further comprise a second polymerase that adds a second nucleic acid to a fourth polynucleotide that is complementary to and coupled to the second polynucleotide. The second nucleic acid may optionally be coupled to the second luminophore. Alternatively, the apparatus may further comprise a channel for flowing a first liquid comprising the first and second nucleic acids and the first and second polymerases into or over the first and second features.
依据另一方面,提供了一种用于在发光成像中使用的方法。该方法可以包括提供成像像素阵列,以及提供布置在成像像素阵列上的光子结构。该方法还可以包括提供布置在光子结构上的特征阵列。特征阵列的第一特征可以布置在成像像素阵列的第一像素上,并且特征阵列的第二特征可以布置在第一像素上并在空间上从第一特征移位。该方法还可以包括提供布置在第一特征内或之上的第一发光体,以及提供布置在第二特征内或之上的第二发光体。该方法还可以包括由辐射源在第一时间产生具有第一特性的第一光子,以及由辐射源在第二时间产生具有第二特性的第二光子。第二特性可以不同于第一特性,以及第二时间可以不同于第一时间。该方法还可以包括由第一像素选择性地接收由第一发光体在第一时间响应于第一光子而发射的冷光;以及由第一像素选择性地接收由第二发光体在第二时间响应于第二光子而发射的冷光。According to another aspect, a method for use in luminescence imaging is provided. The method may include providing an imaging pixel array and providing a photonic structure disposed on the imaging pixel array. The method may also include providing an array of features disposed on the photonic structure. A first feature of the array of features may be disposed on a first pixel in the imaging pixel array, and a second feature of the array of features may be disposed on the first pixel and spatially displaced from the first feature. The method may also include providing a first luminophore disposed within or above the first feature, and providing a second luminophore disposed within or above the second feature. The method may also include generating, by a radiation source, a first photon having a first characteristic at a first time, and generating, by the radiation source, a second photon having a second characteristic at a second time. The second characteristic may be different from the first characteristic, and the second time may be different from the first time. The method may also include selectively receiving, by the first pixel, luminescence emitted by the first luminophore in response to the first photon at the first time; and selectively receiving, by the first pixel, luminescence emitted by the second luminophore in response to the second photon at the second time.
可选地,具有第一特性的第一光子在第一时间在光子结构内产生第一谐振图案,第一谐振图案相对于第二发光体选择性地激发第一发光体。可选地,具有第二特性的第二光子在第二时间在光子结构内产生第二谐振图案,第二谐振图案相对于第一发光体选择性地激发第二发光体。Optionally, a first photon having a first characteristic generates a first resonant pattern within the photonic structure at a first time, and the first resonant pattern selectively excites the first light emitter relative to the second light emitter. Optionally, a second photon having a second characteristic generates a second resonant pattern within the photonic structure at a second time, and the second resonant pattern selectively excites the second light emitter relative to the first light emitter.
此外或替代地,成像像素阵列、光子结构和特征阵列可选地彼此单片地集成。Additionally or alternatively, the imaging pixel array, the photonic structure, and the feature array are optionally monolithically integrated with one another.
此外或替代地,光子结构可选地包括光子晶体、光子超晶格、微腔阵列或等离子体纳米天线阵列。Additionally or alternatively, the photonic structure optionally comprises a photonic crystal, a photonic superlattice, a microcavity array, or a plasmonic nanoantenna array.
此外或替代地,特征阵列可选地包括多个阱。第一特征可选地可以包括第一阱,第一发光体布置在该第一阱中,以及第二特征可选地可以包括第二阱,第二发光体布置在该第二阱中。替代地,特征阵列可以包括多个柱。第一特征可选地可包括第一发光体布置在其上的第一柱,以及第二特征可选地可以包括第二发光体布置在其上的第二柱。Additionally or alternatively, the feature array may optionally include a plurality of wells. The first feature may optionally include a first well in which the first light emitter is disposed, and the second feature may optionally include a second well in which the second light emitter is disposed. Alternatively, the feature array may include a plurality of pillars. The first feature may optionally include a first pillar on which the first light emitter is disposed, and the second feature may optionally include a second pillar on which the second light emitter is disposed.
此外或替代地,第一和第二特性可选地可以独立地选自由波长、偏振和角度组成的组。例如,第一特性可选地可以包括第一线偏振,以及第二特性可选地可以包括不同于第一线偏振的第二线偏振。可选地,第一线偏振可以实质上正交于第二线偏振,或者可以相对于第二线偏振旋转在约15度和约75度之间的角度。此外或替代地,第一特性可选地包括第一波长,以及第二特性可选地包括不同于第一波长的第二波长。Additionally or alternatively, the first and second characteristics may optionally be independently selected from the group consisting of wavelength, polarization, and angle. For example, the first characteristic may optionally include a first linear polarization, and the second characteristic may optionally include a second linear polarization different from the first linear polarization. Alternatively, the first linear polarization may be substantially orthogonal to the second linear polarization, or may be rotated relative to the second linear polarization by an angle between about 15 degrees and about 75 degrees. Additionally or alternatively, the first characteristic may optionally include a first wavelength, and the second characteristic may optionally include a second wavelength different from the first wavelength.
此外或替代地,辐射源可选地包括光学部件。该方法可选地还包括控制光学部件,以便将第一特性施加在第一光子上,并且将第二特性施加在第二光子上。可选地,光学部件包括双折射材料,该双折射材料通过控制器响应于第一控制信号而将第一光子旋转到第一线偏振,并且通过控制器响应于第二控制信号而将第二光子旋转到第二线偏振。Additionally or alternatively, the radiation source optionally includes an optical component. The method optionally further includes controlling the optical component to impart a first characteristic to the first photon and a second characteristic to the second photon. Optionally, the optical component includes a birefringent material that rotates the first photon to a first linear polarization in response to a first control signal by the controller, and rotates the second photon to a second linear polarization in response to a second control signal by the controller.
此外或替代地,第一和第二光子可选地每个以彼此实质上相同的角度照射光子结构。此外或替代地,第一和第二光子可选地每个以近似垂直于光子结构的主表面的角度照射光子结构,或者第一和第二光子可选地每个以近似平行于光子结构的主表面的角度照射光子结构。Additionally or alternatively, the first and second photons optionally each strike the photonic structure at substantially the same angle to one another. Additionally or alternatively, the first and second photons optionally each strike the photonic structure at an angle approximately perpendicular to a major surface of the photonic structure, or the first and second photons optionally each strike the photonic structure at an angle approximately parallel to a major surface of the photonic structure.
此外或替代地,第二特征可选地从第一特征横向移位。Additionally or alternatively, the second feature is optionally laterally displaced from the first feature.
此外或替代地,特征阵列的第三特征可选地布置在第一像素上,并且在空间上从第一和第二特征中的每一个移位。可选地,该方法还包括提供布置在第三特征内或之上的第三发光体,并在第三时间产生具有第三特性的第三光子。第三特性可选地可以不同于第一和第二特性,以及第三时间可选地可以不同于第一和第二时间。该方法可选地还可以包括由第一像素选择性地接收由第三发光体在第三时间响应于第三光子而发射的冷光。可选地,特征阵列的第四特征布置在第一像素上,并且在空间上从第一、第二和第三特征中的每一个移位。该方法可选地还包括提供布置在第四特征内或之上的第四发光体,以及在第四时间产生具有第四特性的第四光子。第四特性可选地可以不同于第一、第二和第三特性,以及第四时间可选地可以不同于第一、第二和第三时间。该方法可选地还可以包括由第一像素选择性地接收由第四发光体在第四时间响应于第四光子而发射的冷光。可选地,第一发光体耦合到第一核酸,第二发光体耦合到第二核酸,第三发光体耦合到第三核酸,以及第四发光体耦合到第四核酸。Additionally or alternatively, a third feature of the array of features is optionally disposed on the first pixel and spatially displaced from each of the first and second features. Optionally, the method further includes providing a third light emitter disposed within or above the third feature and generating a third photon having a third characteristic at a third time. The third characteristic may optionally be different from the first and second characteristics, and the third time may optionally be different from the first and second times. The method may further include selectively receiving, by the first pixel, luminescent light emitted by the third light emitter at the third time in response to the third photon. Optionally, a fourth feature of the array of features is disposed on the first pixel and spatially displaced from each of the first, second, and third features. The method may further include providing a fourth light emitter disposed within or above the fourth feature and generating a fourth photon having a fourth characteristic at a fourth time. The fourth characteristic may optionally be different from the first, second, and third characteristics, and the fourth time may optionally be different from the first, second, and third times. The method may further include selectively receiving, by the first pixel, luminescent light emitted by the fourth light emitter at the fourth time in response to the fourth photon. Optionally, a first luminophore is coupled to the first nucleic acid, a second luminophore is coupled to the second nucleic acid, a third luminophore is coupled to the third nucleic acid, and a fourth luminophore is coupled to the fourth nucleic acid.
此外或替代地,特征阵列的第三特征可选地可以布置在成像像素阵列的第二像素上,并且特征阵列的第四特征布置在第二像素上并在空间上从第三特征移位。该方法可选地还包括提供布置在第三特征内或之上的第三发光体,以及提供布置在第四特征内或之上的第四发光体。该方法可选地还包括由第二像素选择性地接收由第三发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光;以及由第二像素选择性地接收由第四发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光。可选地,第一发光体耦合到第一核酸,第二发光体耦合到第二核酸,第三发光体耦合到第三核酸,以及第四发光体耦合到第四核酸。In addition or alternatively, the third feature of the feature array can optionally be arranged on the second pixel of the imaging pixel array, and the fourth feature of the feature array is arranged on the second pixel and spatially shifted from the third feature. The method optionally also includes providing a third luminophore arranged in or on the third feature, and providing a fourth luminophore arranged in or on the fourth feature. The method optionally also includes selectively receiving, by the second pixel, luminescent light emitted by the third luminophore in response to the first photon at a first time or in response to the second photon at a second time; and selectively receiving, by the second pixel, luminescent light emitted by the fourth luminophore in response to the first photon at a first time or in response to the second photon at a second time. Optionally, the first luminophore is coupled to the first nucleic acid, the second luminophore is coupled to the second nucleic acid, the third luminophore is coupled to the third nucleic acid, and the fourth luminophore is coupled to the fourth nucleic acid.
此外或替代地,第一和第二特征可选地每个具有实质上圆形的横截面。此外或替代地,光子结构可选地包括六边形晶格,并且成像像素可选地是矩形的。Additionally or alternatively, the first and second features optionally each have a substantially circular cross-section.Additionally or alternatively, the photonic structure optionally comprises a hexagonal lattice, and the imaging pixels optionally are rectangular.
此外或替代地,该方法可选地包括用第一和第二光子泛光照射光子结构。此外或替代地,该方法可选地包括用激光器产生第一和第二光子。此外或替代地,第一和第二光子独立地具有在约300nm和约800nm之间的波长。Additionally or alternatively, the method optionally includes flooding the photonic structure with the first and second photons. Additionally or alternatively, the method optionally includes generating the first and second photons with a laser. Additionally or alternatively, the first and second photons independently have a wavelength between about 300 nm and about 800 nm.
此外或替代地,第一发光体可选地耦合到第一核酸,以及第二发光体可选地耦合到第二核酸。此外或替代地,该方法可选地包括提供与特征阵列接触的至少一个微流控特征以及通过至少一个微流控特征使一种或更多种分析物流到第一特征和第二特征。Additionally or alternatively, a first luminophore is optionally coupled to the first nucleic acid, and a second luminophore is optionally coupled to the second nucleic acid. Additionally or alternatively, the method optionally includes providing at least one microfluidic feature in contact with the feature array and flowing one or more analytes to the first feature and the second feature through the at least one microfluidic feature.
此外或替代地,第一发光体可选地耦合到待测序的第一多核苷酸,以及第二发光体可选地耦合到待测序的第二多核苷酸。可选地,第一多核苷酸耦合到第一特征,以及第二多核苷酸可选地耦合到第二特征。此外或替代地,该方法可选地包括由第一聚合酶将第一核酸添加到与第一多核苷酸互补并耦合的第三多核苷酸。第一核酸可选地可以耦合到第一发光体。该方法可选地还包括由第二聚合酶将第二核酸添加到与第二多核苷酸互补并耦合的第四多核苷酸。第二核酸可选地可以耦合到第二发光体。可选地,该方法还包括通过通道使包括第一核酸和第二核酸以及第一聚合酶和第二聚合酶的第一液体流动到第一特征和第二特征内或在第一特征和第二特征之上流动。Additionally or alternatively, the first luminophore is optionally coupled to a first polynucleotide to be sequenced, and the second luminophore is optionally coupled to a second polynucleotide to be sequenced. Alternatively, the first polynucleotide is coupled to a first feature, and the second polynucleotide is optionally coupled to a second feature. Additionally or alternatively, the method optionally includes adding a first nucleic acid to a third polynucleotide that is complementary to and coupled to the first polynucleotide by a first polymerase. The first nucleic acid may optionally be coupled to the first luminophore. The method optionally also includes adding a second nucleic acid to a fourth polynucleotide that is complementary to and coupled to the second polynucleotide by a second polymerase. The second nucleic acid may optionally be coupled to a second luminophore. Alternatively, the method further includes flowing a first liquid comprising the first and second nucleic acids and the first and second polymerases into or over the first and second features through a channel.
依据另一方面,提供了一种用于在发光成像中使用的设备。该设备可以包括成像像素阵列和布置在成像像素阵列上的光子结构。该设备还可以包括布置在光子结构上的特征阵列。特征阵列的第一特征可以布置在成像像素阵列的第一像素上,并且特征阵列的第二特征可以布置在第一像素上并在空间上从第一特征移位。光子结构可以被调整以对比于第二偏振的光用第一偏振的光选择性地照射第一特征。光子结构可以被调整以对比于第一偏振的光用第二偏振的光选择性地照射第二特征。According to another aspect, a device for use in luminescence imaging is provided. The device may include an imaging pixel array and a photonic structure disposed on the imaging pixel array. The device may also include a feature array disposed on the photonic structure. A first feature of the feature array may be disposed on a first pixel of the imaging pixel array, and a second feature of the feature array may be disposed on the first pixel and spatially displaced from the first feature. The photonic structure may be adjusted to selectively illuminate the first feature with light of a first polarization as opposed to light of a second polarization. The photonic structure may be adjusted to selectively illuminate the second feature with light of a second polarization as opposed to light of the first polarization.
可选地,该设备还包括辐射源,该辐射源被配置成在第一时间产生具有第一偏振的第一光子,并且被配置成在第二时间产生具有第二偏振的第二光子。Optionally, the apparatus further comprises a radiation source configured to generate a first photon having a first polarization at a first time and configured to generate a second photon having a second polarization at a second time.
此外或替代地,该设备可选地还包括布置在第一特征内或之上的第一发光体和布置在第二特征内或之上的第二发光体。Additionally or alternatively, the apparatus optionally further comprises a first light emitter disposed within or on the first feature and a second light emitter disposed within or on the second feature.
此外或替代地,该设备可选地还包括布置在第一特征内或之上的第一目标分析物和布置在第二特征内或之上的第二目标分析物。第一目标分析物可选地可以不同于第二目标分析物。第一和第二目标分析物可选地包括具有不同序列的核酸。In addition or alternatively, the device optionally further comprises a first target analyte disposed within or on the first feature and a second target analyte disposed within or on the second feature. The first target analyte may optionally be different from the second target analyte. The first and second target analytes optionally comprise nucleic acids having different sequences.
附图的简要说明BRIEF DESCRIPTION OF THE DRAWINGS
图1A示意性地示出了用于在像素内的位点的发光成像中使用的示例性基于光子结构的设备的透视图。FIG1A schematically illustrates a perspective view of an exemplary photonic structure-based device for use in luminescent imaging of a site within a pixel.
图1B示意性地示出了在设备阵列例如图1A所示的设备阵列内的示例性位点阵列的透视图,其中每个位点对应于一个像素。FIG. 1B schematically illustrates a perspective view of an exemplary array of sites within a device array, such as the device array shown in FIG. 1A , where each site corresponds to a pixel.
图1C示意性地示出了示例性设备例如图1A所示的设备的截面图。FIG. 1C schematically illustrates a cross-sectional view of an exemplary device, such as the device shown in FIG. 1A .
图2A示意性地示出了图1B所示的位点阵列的示例性激发的透视图。FIG. 2A schematically illustrates a perspective view of an exemplary excitation of the array of sites shown in FIG. 1B .
图2B示意性地示出了响应于例如图2A所示的激发的在例如图1A和1C所示的设备阵列内的模拟示例性场强。2B schematically illustrates simulated exemplary field strengths within an array of devices such as shown in FIGs. 1A and 1C in response to an excitation such as shown in FIG. 2A .
图3A示意性地示出了例如在此提供的示例性位点阵列的透视图,其中多个位点对应于一个像素。FIG3A schematically illustrates a perspective view of an exemplary array of sites, such as provided herein, where multiple sites correspond to one pixel.
图3B示意性地示出了例如在此提供的设备的截面图,其中如图3A所示多个位点对应于一个像素。FIG3B schematically illustrates a cross-sectional view of a device such as provided herein, wherein a plurality of sites corresponds to one pixel as shown in FIG3A .
图4A示意性地示出了使用例如在此提供的扫描聚焦光束照明对图3A所示的位点阵列的选定位点进行的示例性激发的透视图。4A schematically illustrates a perspective view of exemplary excitation of selected sites of the array of sites shown in FIG. 3A using scanning focused beam illumination, such as provided herein.
图4B示意性地示出了使用例如本文提供的多激光干涉照明对图3A所示的位点阵列的选定位点进行的示例性激发的透视图。4B schematically illustrates a perspective view of exemplary excitation of selected sites of the array of sites shown in FIG. 3A using multi-laser interference illumination, such as provided herein.
图5示意性地示出了示例性光子结构例如可以被包括在例如在此提供并在图3A-3B中所示的设备中。FIG5 schematically illustrates an exemplary photonic structure such as may be included in devices such as provided herein and shown in FIG3A-3B.
图6A-6D示意性地示出了对于辐射源的在例如图5所示的光子结构内的示例性模拟场强,该辐射源在不同时间分别产生具有彼此不同的特性的光子。6A-6D schematically illustrate exemplary simulated field intensities within a photonic structure such as that shown in FIG. 5 for a radiation source that generates photons having mutually different characteristics at different times.
图7A示意性地示出了例如在此提供并在图3A-3B中所示的示例性的基于光子结构的设备的平面图,该设备包括每像素第一和第二位点(例如簇)。7A schematically illustrates a plan view of an exemplary photonic structure-based device, such as provided herein and shown in FIGs. 3A-3B, comprising first and second sites (eg, clusters) per pixel.
图7B示意性地示出了对于辐射源的在例如在此提供并在图7A和3A-3B中所示的设备阵列内的示例性模拟场强,该辐射源在第一时间产生具有选择性地激发第一位点的第一特性的光子。7B schematically illustrates exemplary simulated field strengths within an array of devices such as provided herein and shown in FIGs. 7A and 3A-3B for a radiation source that generates photons having a first characteristic that selectively excites a first site at a first time.
图7C示意性地示出了对于辐射源的在例如在此提供并在图7A和3A-3B中所示的设备阵列内的示例性模拟场强,该辐射源在第二时间产生具有选择性地激发第二位点的第二特性的光子。7C schematically illustrates exemplary simulated field intensities within an array of devices, such as provided herein and shown in FIGs. 7A and 3A-3B, for a radiation source that generates photons having a second characteristic that selectively excites a second site at a second time.
图7D示意性地示出了由例如在此提供并分别在图7B和7C中所示的第一和第二位点的选择性激发产生的示例性串扰项。FIG. 7D schematically illustrates exemplary crosstalk terms resulting from selective excitation of first and second sites, such as provided herein and shown in FIGs. 7B and 7C, respectively.
图8A示意性地示出了例如在此提供并在图3A-3B中所示的示例性的基于光子结构的设备的平面图,该设备包括每像素第一、第二和第三位点(例如簇)。8A schematically illustrates a plan view of an exemplary photonic structure-based device, such as provided herein and shown in FIGs. 3A-3B, comprising first, second, and third sites (eg, clusters) per pixel.
图8B示意性地示出了对于辐射源的在例如在此提供并在图8A和3A-3B中所示的设备阵列内的示例性模拟场强,该辐射源在第一时间产生具有选择性地激发第一位点的第一特性的光子。8B schematically illustrates exemplary simulated field strengths within an array of devices such as provided herein and shown in FIGs. 8A and 3A-3B for a radiation source that generates photons having a first characteristic that selectively excites a first site at a first time.
图8C示意性地示出了对于辐射源的在例如在此提供并在图8A和3A-3B中所示的设备阵列内的示例性模拟场强,该辐射源在第二时间产生具有选择性地激发第二位点的第二特性的光子。8C schematically illustrates exemplary simulated field intensities within an array of devices, such as provided herein and shown in FIGs. 8A and 3A-3B, for a radiation source that generates photons having a second characteristic that selectively excites a second site at a second time.
图8D示意性地示出了对于辐射源的在例如在此提供并在图8A和3A-3B中所示的设备阵列内的示例性模拟场强,该辐射源在第三时间产生具有选择性地激发第三位点的第三特性的光子。8D schematically illustrates exemplary simulated field intensities within an array of devices, such as provided herein and shown in FIGs. 8A and 3A-3B, for a radiation source that generates photons having a third characteristic that selectively excites a third site at a third time.
图8E示意性地示出了根据一些实施例的由例如在此提供并分别在图8B-8D中所示的第一、第二和第三位点的选择性激发产生的示例性串扰项。8E schematically illustrates exemplary crosstalk terms resulting from selective excitation of first, second, and third sites, such as provided herein and shown in FIGs. 8B-8D, respectively, according to some embodiments.
图9A-9D分别示意性地示出了使用在不同时间产生具有不同特性的光子的辐射源的在例如在此提供并在图3A-3B中所示的设备阵列内的第一、第二、第三和第四位点的示例性选择性激发的透视图。9A-9D schematically illustrate perspective views of exemplary selective excitation of first, second, third, and fourth sites, respectively, within a device array such as provided herein and shown in FIGs. 3A-3B using a radiation source that produces photons having different characteristics at different times.
图10示出了在此提供的用于在发光成像中使用的方法中的步骤的示例性流程。FIG10 shows an exemplary flow diagram of steps in the methods provided herein for use in luminescence imaging.
图11示出了可用于制备例如本文所提供的设备或组成物的步骤的示例性顺序。FIG. 11 illustrates an exemplary sequence of steps that can be used to prepare, for example, a device or composition provided herein.
图12示出了可用于制备例如本文所提供的设备或组成物的步骤的示例性顺序。FIG12 illustrates an exemplary sequence of steps that can be used to prepare, for example, a device or composition provided herein.
图13示出了用于在例如本文提供的发光成像中使用的示例性设备。FIG. 13 illustrates an exemplary apparatus for use in luminescence imaging, such as provided herein.
详细描述Detailed description
本发明的实施例提供了用于在像素内的多个位点的发光成像中使用的基于光子结构的设备和组成物以及使用其的方法。Embodiments of the present invention provide photonic structure-based devices and compositions for use in luminescent imaging of multiple sites within a pixel, and methods of using the same.
首先,将定义一些示例性术语,后面是用于在发光成像中使用的本发明的基于光子结构的设备和组成物以及使用其的方法的示例性实施例的进一步描述。First, some exemplary terms will be defined, followed by a further description of exemplary embodiments of the present invention's photonic structure-based devices and compositions, and methods of using the same, for use in luminescence imaging.
如本文所使用的,术语“光子结构”意指包括一种或更多种光学透明材料的周期性结构,其选择性地影响具有特定特性例如波长、角度和偏振的辐射的传播。例如,光子结构可以选择性地使具有这种特性例如在该波长、该角度和该偏振下的辐射传播通过该结构或者在相同角度或不同角度下传播出该结构,并且这种辐射的场强可以具有在光子结构内的选定的图案。此外,该结构可以选择性地抑制具有不同特性例如在不同的波长、角度和/或偏振下的辐射传播通过该结构或者在不同角度下传播出该结构,和/或这种辐射的场强可以具有在光子结构内的不同的选定图案。光子结构的材料可以包括在一维或更多维中例如在一维中、在两维中或在三维中分布的特征。光子结构的特征的形状、尺寸和分布以及材料的折射率可以被调整,以便选择可以传播通过光子结构或在一角度下传播到光子结构之外的特定辐射特性,例如波长、角度或偏振,和/或以便在光子结构内选择这样的辐射的场强的图案。示例性光子结构包括但不限于光子晶体、光子超晶格、微腔阵列和等离子体纳米天线阵列。As used herein, the term "photonic structure" means a periodic structure comprising one or more optically transparent materials that selectively affects the propagation of radiation having specific characteristics, such as wavelength, angle, and polarization. For example, a photonic structure can selectively allow radiation having such characteristics, such as at a certain wavelength, angle, and polarization, to propagate through the structure or to exit the structure at the same angle or at different angles, and the field intensity of such radiation can have a selected pattern within the photonic structure. Furthermore, the structure can selectively inhibit radiation having different characteristics, such as at different wavelengths, angles, and/or polarizations, from propagating through the structure or from propagating out of the structure at different angles, and/or the field intensity of such radiation can have different selected patterns within the photonic structure. The material of the photonic structure can include features distributed in one or more dimensions, such as in one, two, or three dimensions. The shape, size, and distribution of the features of the photonic structure, as well as the refractive index of the material, can be adjusted to select specific radiation characteristics, such as wavelength, angle, or polarization, that can propagate through the photonic structure or out of the photonic structure at a certain angle, and/or to select the pattern of field intensity of such radiation within the photonic structure. Exemplary photonic structures include, but are not limited to, photonic crystals, photonic superlattices, microcavity arrays, and plasmonic nanoantenna arrays.
如在这里使用的,术语“光子晶体”、“PhC”、“光子晶格”、“光子晶体晶格”和“PhC晶格”意指包括一种或更多种材料的光子结构,所述材料包括在光的波长的数量级的折射率的周期性变化。例如,光子结构可以包括在三维中延伸、例如具有长度、宽度和厚度的材料。该材料可以具有两个主表面,每个主表面位于由长度和宽度限定的平面内,并且通过厚度从彼此分离。该材料可以在两维或更多维中被图案化,以便限定光子带结构,在该光子带结构中,具有特定特性(例如波长、角度或偏振)的辐射可以通过光子晶体传播或以一角度传播到光子晶体外,和/或以便在光子晶体内选择这种辐射的场强的图案。图案可以包括例如多个特征,例如被限定在材料内的例如穿过材料的一个或两个主表面的阱或柱,材料不存在于该特征内或之间,例如在阱内或在柱之间。在特征内或之间的空间可以填充有一种或更多种额外材料,其可以分别具有不同于该材料的折射率和不同于彼此的折射率的折射率。传播或不传播通过光子结构或在一角度下传播或不传播到光子结构之外的辐射的特定特性例如波长、角度或偏振可以基于该材料的折射率和布置在特征内或特征之间的任何额外材料的折射率,以及可以基于特征的特性,例如特征的形状、尺寸和分布。这些特征可以都是彼此相同的形状、尺寸和/或分布。As used herein, the terms "photonic crystal," "PhC," "photonic lattice," "photonic crystal lattice," and "PhC lattice" mean a photonic structure comprising one or more materials comprising a periodic variation in a refractive index on the order of the wavelength of light. For example, a photonic structure may comprise a material extending in three dimensions, e.g., having a length, a width, and a thickness. The material may have two major surfaces, each lying in a plane defined by the length and the width, and separated from each other by the thickness. The material may be patterned in two or more dimensions so as to define a photonic band structure in which radiation having specific characteristics (e.g., wavelength, angle, or polarization) may propagate through the photonic crystal or out of the photonic crystal at an angle, and/or so as to select a pattern of field strengths of such radiation within the photonic crystal. The pattern may comprise, for example, a plurality of features, such as wells or pillars defined within the material, e.g., through one or both major surfaces of the material, with material not present within or between the features, e.g., within the wells or between the pillars. The spaces within or between the features can be filled with one or more additional materials, which can each have a refractive index that is different from the refractive index of the material and different from the refractive index of each other. The specific characteristics of radiation that propagates or does not propagate through the photonic structure or propagates or does not propagate out of the photonic structure at a certain angle, such as wavelength, angle, or polarization, can be based on the refractive index of the material and the refractive index of any additional materials arranged within or between the features, as well as on the characteristics of the features, such as the shape, size, and distribution of the features. The features can all have the same shape, size, and/or distribution as each other.
如在本文所使用的,术语“光子结构”和“PhC超晶格”意指选择性地影响具有第一和第二特性例如在第一和第二波长、角度或偏振下的辐射(与具有第三特性例如在第三波长、角度或偏振下的辐射比较)的传播的光子结构。例如,具有第一特性的辐射的场强可以具有第一图案,并且具有第二特性的辐射的场强可以具有不同于第一图案的第二图案。第三波长可以出现在电磁光谱中的第一和第二波长之间。例如,光子结构可以选择性地使具有第一和第二特性例如在第一和第二波长、角度或偏振下的辐射传播通过光子结构或在一角度下传播到光子结构之外,并且具有第一和第二特性的辐射的场强的图案可选地可以彼此不同。例如,光子超晶格可以选择性地抑制具有第一和第二特性例如在第一和第二波长、角度或偏振下的辐射传播通过光子超晶格或者在一角度下传播到光子超晶格之外。例如,光子超晶格可以选择性地使具有第三特性例如在第三波长、角度或偏振下的辐射传播通过光子超晶格或者在一角度下传播到光子超晶格之外。例如,光子超晶格可以选择性地抑制具有第三特性例如在第三波长、角度或偏振下的辐射传播通过该结构或者在一角度下传播到该结构之外。材料可以包括在一维或更多维中例如在一维中、在两维中或在三维中分布的特征。特征的形状、尺寸和分布以及材料的折射率可以被调整,以便选择可以传播通过光子超晶格或在一角度下传播到光子超晶格之外的辐射的特定特性例如波长、角度或偏振以及这样的特性的场强的图案,以及以便选择实质上不传播通过光子超晶格或在一角度下传播到光子超晶格之外的辐射的特定特性。As used herein, the terms "photonic structure" and "PhC superlattice" mean a photonic structure that selectively affects the propagation of radiation having a first and a second characteristic, such as at a first and a second wavelength, angle, or polarization, as compared to radiation having a third characteristic, such as at a third wavelength, angle, or polarization. For example, the field intensity of the radiation having the first characteristic can have a first pattern, and the field intensity of the radiation having the second characteristic can have a second pattern that is different from the first pattern. The third wavelength can occur between the first and second wavelengths in the electromagnetic spectrum. For example, the photonic structure can selectively cause radiation having the first and second characteristics, such as at a first and a second wavelength, angle, or polarization, to propagate through the photonic structure or out of the photonic structure at an angle, and the patterns of the field intensity of the radiation having the first and second characteristics can optionally be different from each other. For example, the photonic superlattice can selectively inhibit radiation having the first and second characteristics, such as at a first and a second wavelength, angle, or polarization, from propagating through the photonic superlattice or out of the photonic superlattice at an angle. For example, a photonic superlattice can selectively allow radiation having a third characteristic, such as at a third wavelength, angle, or polarization, to propagate through the photonic superlattice or out of the photonic superlattice at an angle. For example, a photonic superlattice can selectively inhibit radiation having a third characteristic, such as at a third wavelength, angle, or polarization, from propagating through the structure or out of the structure at an angle. The material can include features distributed in one or more dimensions, such as in one dimension, in two dimensions, or in three dimensions. The shape, size, and distribution of the features, as well as the refractive index of the material, can be adjusted to select patterns of specific characteristics of radiation, such as wavelength, angle, or polarization, and field strengths of such characteristics, that can propagate through the photonic superlattice or out of the photonic superlattice at an angle, and to select specific characteristics of radiation that do not substantially propagate through the photonic superlattice or out of the photonic superlattice at an angle.
说明性地,光子超晶格可以包括在三维中延伸(例如具有长度、宽度和厚度)的材料。该材料可以具有两个主表面,每个主表面位于由长度和宽度限定的平面内,并且通过厚度从彼此分离。材料可以在两维或更多维中被图案化,以便限定光子带结构,光子带结构允许具有至少第一和第二特性例如波长、角度或偏振的辐射在由长度和宽度限定的平面内传播或在一角度传播到该平面之外,并且抑制具有第三特性例如第三波长、角度或偏振的至少辐射在材料内传播或在一角度下传播到材料之外。图案可以包括例如多个特征,例如被限定在材料内的例如穿过材料的一个或两个主表面的阱或柱,材料不存在于该特征内或之间,例如在阱内或在柱之间。在特征内或之间的空间可以填充有一种或更多种额外材料,其可以分别具有不同于该材料的折射率和不同于彼此的折射率的折射率。通过光子超晶格传播或不传播或在一角度下传播或不传播到光子超晶格之外的辐射的特定特性可以基于该材料的折射率和布置在特征内或特征之间的任何额外材料的折射率,以及可以基于特征的特性,例如特征的形状、尺寸和分布。一些特征可选地可以在至少一个特性例如形状、尺寸或分布上不同于其他特征。对于关于可在本发明的设备、组成物和方法中使用的示例性光子超晶格的另外的细节,见2016年3月24日提交的且标题为“Photonic Superlattice-Based Devices and Compositions for Use in Luminescent Imaging,and Methods ofUsing the Same”美国临时专利申请62/312,704,该专利申请的全部内容通过引用被并入本文。Illustratively, a photonic superlattice can include a material extending in three dimensions (e.g., having a length, width, and thickness). The material can have two major surfaces, each of which lies in a plane defined by the length and width and separated from each other by the thickness. The material can be patterned in two or more dimensions to define a photonic band structure that allows radiation having at least a first and a second characteristic, such as a wavelength, angle, or polarization, to propagate within the plane defined by the length and width or to propagate outside the plane at an angle, and inhibits at least radiation having a third characteristic, such as a third wavelength, angle, or polarization, from propagating within the material or to propagate outside the material at an angle. The pattern can include, for example, a plurality of features, such as wells or pillars defined within the material, such as through one or both major surfaces of the material, with material not present within or between the features, such as within the wells or between the pillars. The spaces within or between the features can be filled with one or more additional materials, which can each have a refractive index different from that of the material and different from that of each other. The specific characteristics of radiation that propagates or does not propagate through the photonic superlattice or propagates or does not propagate outside the photonic superlattice at an angle can be based on the refractive index of the material and the refractive index of any additional material arranged within or between the features, as well as on characteristics of the features, such as the shape, size, and distribution of the features. Some features can optionally be different from other features in at least one characteristic, such as shape, size, or distribution. For additional details about exemplary photonic superlattices that can be used in the devices, compositions, and methods of the present invention, see U.S. Provisional Patent Application No. 62/312,704, filed on March 24, 2016, entitled “Photonic Superlattice-Based Devices and Compositions for Use in Luminescent Imaging, and Methods of Using the Same,” the entire contents of which are incorporated herein by reference.
如在本文所使用的,“微腔阵列”意指支持多个(例如至少两个、至少三个或至少四个)谐振的光子微谐振器的周期性二维布置,这些谐振可以通过改变激发源的特性(例如激发源的波长、偏振或角度)而独立于彼此被激发。对于关于可在本发明的设备、组成物和方法中使用的示例性微腔阵列的另外的细节,见Altug等人的“Polarization control andsensing with twodimensional coupled photonic crystal microcavity arrays”(Opt.Lett.30:1422-1428(2011)),其全部内容通过引用被并入本文。As used herein, a "microcavity array" means a periodic, two-dimensional arrangement of photonic microresonators that supports multiple (e.g., at least two, at least three, or at least four) resonances that can be excited independently of one another by varying the properties of an excitation source (e.g., the wavelength, polarization, or angle of the excitation source). For additional details on exemplary microcavity arrays that can be used in the devices, compositions, and methods of the present invention, see Altug et al., "Polarization control and sensing with two-dimensional coupled photonic crystal microcavity arrays," Opt. Lett. 30:1422-1428 (2011), the entire contents of which are incorporated herein by reference.
如在本文所使用的,“等离子体纳米天线阵列”意指支持多个(例如至少两个、至少三个或至少四个)谐振的等离子体纳米结构的周期性二维布置,这些谐振可以通过改变激发源的特性例如偏振源的波长、偏振或角度而独立于彼此被激发。对于关于可在本发明的设备、组成物和方法中使用的示例性等离子体纳米天线的另外的细节,见Regmi等人的“Nanoscale volume confinement and fluorescence enhancement with doublenanohole aperture”(Scientific Reports 5:15852-1-5(2015)),其全部内容通过引用被并入本文。As used herein, a "plasmonic nanoantenna array" means a periodic, two-dimensional arrangement of plasmonic nanostructures that supports multiple (e.g., at least two, at least three, or at least four) resonances that can be excited independently of one another by varying the properties of an excitation source, such as the wavelength, polarization, or angle of a polarization source. For additional details regarding exemplary plasmonic nanoantennas that can be used in the devices, compositions, and methods of the present invention, see Regmi et al., "Nanoscale volume confinement and fluorescence enhancement with double nanohole aperture," Scientific Reports 5:15852-1-5 (2015), the entire contents of which are incorporated herein by reference.
光子结构的一种或更多种材料可以是或包括“介电材料”,意指光学透明的并且是电绝缘体的流体、固体或半固体材料。流体介电材料的例子包括气体例如空气、氮气和氩气以及液体,例如水、含水溶剂和有机溶剂。固体介电材料的例子包括玻璃(例如无机玻璃例如硅石或改性或功能化玻璃)和聚合物(例如丙烯酸树脂、聚苯乙烯、苯乙烯和其它材料的共聚物、聚丙烯、聚乙烯、聚丁烯、聚氨酯类、TEFLONTM、环烯、聚酰亚胺或尼龙)。半固体介电材料的例子包括凝胶,例如水凝胶。此外或替代地,光子结构的一种或更多种材料可以是或包括光学透明的固体半导体材料。The one or more materials of the photonic structure may be or include a "dielectric material," meaning a fluid, solid, or semisolid material that is optically transparent and an electrical insulator. Examples of fluid dielectric materials include gases such as air, nitrogen, and argon, and liquids such as water, aqueous solvents, and organic solvents. Examples of solid dielectric materials include glass (e.g., inorganic glass such as silica or modified or functionalized glass) and polymers (e.g., acrylic resins, polystyrene, copolymers of styrene and other materials, polypropylene, polyethylene, polybutylene, polyurethanes, TEFLON ™ , cycloolefins, polyimides, or nylon). Examples of semisolid dielectric materials include gels, such as hydrogels. Additionally or alternatively, the one or more materials of the photonic structure may be or include an optically transparent solid semiconductor material.
如在本文使用的,术语“凝胶”预期意指可渗透液体和气体的半固体或半刚性材料。通常,凝胶材料在液体被吸进时可以膨胀并且在液体通过干燥被移除时可以收缩。示例性凝胶包括但不限于具有胶态结构的那些凝胶,例如琼脂糖或水凝胶;聚合物网状结构,例如明胶;或交联聚合物结构,例如聚丙烯酰胺、SFA(见例如US 2011/0059865,其全部内容通过引用被并入本文)或PAZAM(见例如US 2014/0079923,其全部内容通过引用被并入本文)。特别有用的凝胶材料将符合它存在于其中的阱或其他凹特征的形状。As used herein, the term "gel" is intended to mean a semisolid or semirigid material that is permeable to liquids and gases. Typically, a gel material can expand when liquid is drawn in and can shrink when the liquid is removed by drying. Exemplary gels include, but are not limited to, those having a colloidal structure, such as agarose or a hydrogel; a polymer network structure, such as gelatin; or a cross-linked polymer structure, such as polyacrylamide, SFA (see, e.g., US 2011/0059865, the entire contents of which are incorporated herein by reference) or PAZAM (see, e.g., US 2014/0079923, the entire contents of which are incorporated herein by reference). Particularly useful gel materials will conform to the shape of the well or other concave feature in which it is present.
如在本文使用的,术语“阱”意指在具有被表面的脉间区(interstitial region)完全围绕的表面开口(孔)的材料中的分立凹特征。阱可以具有特性,例如尺寸(例如体积、直径和深度)、横截面形状(例如圆形、椭圆形、三角形、正方形、多边形、星形的(具有任何合适数量的顶点)、不规则的或具有被介电材料分离的同心阱)和分布(例如在介电材料内的阱的空间位置,例如规则地间隔开的或周期性位置,或不规则地间隔开的或非周期性位置)。阱的横截面可以是但不一定需要是沿着阱的长度是均匀的。As used herein, the term "well" means a discrete concave feature in a material having a surface opening (pore) that is completely surrounded by an interstitial region of the surface. Wells can have characteristics such as size (e.g., volume, diameter, and depth), cross-sectional shape (e.g., circular, elliptical, triangular, square, polygonal, star-shaped (with any suitable number of vertices), irregular, or with concentric wells separated by dielectric material), and distribution (e.g., the spatial location of the well within the dielectric material, such as regularly spaced or periodic locations, or irregularly spaced or non-periodic locations). The cross-section of a well can be, but does not necessarily need to be, uniform along the length of the well.
如在本文使用的,术语“柱”意指从材料的表面突出的并被表面的脉间区完全围绕的分立凸特征。柱可以具有特性,例如尺寸(例如体积、直径和深度)、形状(例如圆形、椭圆形、三角形、正方形、多边形、星形(具有任何合适数量的顶点)、不规则的或具有被介电材料隔开的同心柱)和分布(例如,从介电材料的表面突出的柱的空间位置,例如规则地间隔开的或周期性位置,或不规则地间隔开的或非周期性位置)。柱的横截面可以是但不一定需要是沿柱的长度是均匀的。As used herein, the term "pillar" means a discrete convex feature protruding from the surface of a material and completely surrounded by the interpulsal region of the surface. Pillars can have characteristics such as size (e.g., volume, diameter, and depth), shape (e.g., circular, elliptical, triangular, square, polygonal, star-shaped (with any suitable number of vertices), irregular, or having concentric pillars separated by dielectric material), and distribution (e.g., the spatial location of the pillars protruding from the surface of the dielectric material, such as regularly spaced or periodic locations, or irregularly spaced or non-periodic locations). The cross-section of the pillar can be, but does not necessarily need to be, uniform along the length of the pillar.
如在本文使用的,术语“表面”意指与另一种材料接触的材料的一部分或层。As used herein, the term "surface" means a portion or layer of a material that is in contact with another material.
如在本文使用的,术语“脉间区”意指在材料中或在表面中的区域,其分离材料或表面的区域。例如,脉间区可以将光子结构的一个特征与光子结构的另一特征分离,或者脉间区可以将阵列的一个位点与阵列的另一位点分离。As used herein, the term "interpulse region" means a region in a material or in a surface that separates regions of the material or surface. For example, an interpulse region can separate one feature of a photonic structure from another feature of the photonic structure, or an interpulse region can separate one site of an array from another site of the array.
如在本文使用的,术语“发光”意指发射冷体辐射,以及术语“发光体”意指发光的物品。术语“发光”被规定为不同于白炽光,白炽光是作为热的结果从材料发射的辐射。通常,当能量源将原子的电子从它的最低能量基态转移到较高能量激发态时,冷光产生;然后,电子以辐射的形式返回能量,所以它可落回到它的基态。一种特别有用的类型的发光物品是当能量由激发辐射提供时发射冷体辐射的发光物品。这样的物品可以被称为“光致发光的”。光致发光物品的例子包括在激发辐射之后相对快速地(例如,小于1毫秒)发射冷体辐射的“荧光”物品以及在激发辐射之后相对缓慢地(例如,大于或等于1毫秒)发射冷体辐射的“磷光”物品。光致发光可以被感知为由物品在一波长下的辐射的发射,其为在另一波长下照射该物品的结果。另一有用类型的发光物品是当能量由化学或生物反应提供时发射冷体辐射的物品。这样的物品可以被称为“化学发光的”。As used herein, the term "luminescent" means emitting cold-body radiation, and the term "luminophoric" means an article that emits light. The term "luminescent" is intended to be distinguished from incandescence, which is radiation emitted from a material as a result of heat. Generally, cold light is produced when an energy source transfers an atom's electron from its lowest-energy ground state to a higher-energy excited state; the electron then returns energy in the form of radiation so it can fall back to its ground state. A particularly useful type of luminescent article is one that emits cold-body radiation when energy is provided by excitation radiation. Such articles may be referred to as "photoluminescent." Examples of photoluminescent articles include "fluorescent" articles, which emit cold-body radiation relatively quickly (e.g., less than 1 millisecond) after the excitation radiation, and "phosphorescent" articles, which emit cold-body radiation relatively slowly (e.g., greater than or equal to 1 millisecond) after the excitation radiation. Photoluminescence can be perceived as the emission of radiation by an article at one wavelength as a result of irradiating the article at another wavelength. Another useful type of luminescent article is one that emits cold-body radiation when energy is provided by a chemical or biological reaction. Such articles may be referred to as "chemiluminescent."
可以在本文阐述的方法中检测多种信号中的任一个,包括例如光信号,例如辐射吸收率、冷光发射、冷光寿命、冷光偏振等;瑞利散射和/或米式散射;等等。可以在本文阐述的方法中检测的示例性标记包括但不限于荧光团、发光体、发色团、纳米颗粒(例如金、银、碳纳米管)等。Any of a variety of signals can be detected in the methods described herein, including, for example, optical signals, such as radiation absorptivity, luminescent emission, luminescent lifetime, luminescent polarization, etc.; Rayleigh scattering and/or Mie scattering; etc. Exemplary labels that can be detected in the methods described herein include, but are not limited to, fluorophores, luminophores, chromophores, nanoparticles (e.g., gold, silver, carbon nanotubes), etc.
如在本文使用的,术语“特征”意指在材料的结构或组成物例如固体支持架中的独特变化。可选地,该变化也在材料的结构或组成物中重复。特征的集合可以在材料中或上形成阵列或晶格。示例性特征包括但不限于阱、柱、脊、通道、承载分析物的位点、多层材料的层、具有与在材料中或上的其他区域的化学成分不同的化学成分的材料中或上的区域等。特征可以具有特性,例如尺寸(例如体积、直径和深度)、形状(例如圆形、椭圆形、三角形、正方形、多边形、星形的(具有任何合适数量的顶点)、不规则的或具有被介电材料分离的同心特征)和分布(例如,特征在介电材料内的空间位置,例如规则地间隔开的或周期性位置,或不规则地间隔开的或非周期性位置)。特征的横截面可以是但不一定需要是沿着特征的长度是均匀的。As used herein, the term "feature" means a unique change in the structure or composition of a material, such as a solid support. Optionally, the change is also repeated in the structure or composition of the material. The set of features can form an array or lattice in or on a material. Exemplary features include, but are not limited to, wells, columns, ridges, channels, sites for carrying analytes, layers of multilayer materials, regions in or on a material having a chemical composition different from the chemical composition of other regions in or on a material, etc. Features can have characteristics, such as size (such as volume, diameter, and depth), shape (such as circular, elliptical, triangular, square, polygonal, star-shaped (with any suitable number of vertices), irregular or with concentric features separated by dielectric materials) and distribution (such as, the spatial position of features in a dielectric material, such as regularly spaced or periodic positions, or irregularly spaced or non-periodic positions). The cross section of a feature can be, but does not necessarily need to be, uniform along the length of the feature.
如在本文使用的,术语“位点”意指分子或细胞(或其它分析物)的特定物种的在阵列中的位置。位点可仅包含单个分子(或细胞或其它分析物)或它可包含相同物种的若干分子(或细胞或其它分析物)的群体。在一些实施例中,在附着特定分析物之前,位点存在于材料上。在其他实施方案中,通过将分子或细胞(或其他分析物)附着到材料上来创建位点。阵列的位点通常是离散的。离散的位点可以是邻接的或它们彼此之间可具有距离。应该理解,位点是一种特征。特征可以起晶格、阵列或这两者的部件的作用。As used herein, the term "site" refers to the position of a particular species of molecule or cell (or other analyte) in an array. A site may comprise only a single molecule (or cell or other analyte) or it may comprise a population of several molecules (or cells or other analytes) of the same species. In some embodiments, the site exists on the material before attaching a specific analyte. In other embodiments, the site is created by attaching molecules or cells (or other analytes) to the material. The sites of an array are typically discrete. Discrete sites may be adjacent or they may have a distance between each other. It should be understood that a site is a feature. A feature may function as a component of a lattice, an array, or both.
如在本文使用的,术语“阵列”意指可以根据相对位置彼此区分开的位点的群体。As used herein, the term "array" means a population of sites that can be distinguished from one another based on relative position.
如在本文所使用的,术语“间距”当参考晶格(例如光子结构)或阵列的特征被使用时意欲指晶格或阵列的相邻特征的中心到中心间距。特征的图案可以按照平均间距来表征。图案可以是有序的,使得在平均间距周围的变化的系数很小,或图案可以是随机的,在这种情况下变化的系数可以是相对大的。在任一情况下,平均间距可以是例如至少大约在光谱的一个或更多个区域中的光的波长的数量级。例如,间距可以对应于在可见光谱(约380-700nm)、UV光谱(小于约380nm至约10nm)和IR光谱(大于约700nm至约1mm)中的一个或更多个中的波长。在光子结构中,特征可以在不同方向上具有彼此不同的间距。例如,在光子超晶格中,不同类型的特征可以具有彼此不同的间距和图案。例如,一种类型的特征(例如在第一晶格中)的间距可以不同于另一种类型的特征(例如在第二晶格中)的间距。As used herein, the term "spacing" when used with reference to features of a lattice (e.g., a photonic structure) or array is intended to refer to the center-to-center spacing of adjacent features of the lattice or array. The pattern of features can be characterized in terms of an average spacing. The pattern can be ordered, such that the coefficient of variation around the average spacing is small, or the pattern can be random, in which case the coefficient of variation can be relatively large. In either case, the average spacing can be, for example, at least on the order of the wavelength of light in one or more regions of the spectrum. For example, the spacing can correspond to a wavelength in one or more of the visible spectrum (approximately 380-700 nm), the UV spectrum (less than about 380 nm to about 10 nm), and the IR spectrum (greater than about 700 nm to about 1 mm). In a photonic structure, features can have different spacings from one another in different directions. For example, in a photonic superlattice, different types of features can have different spacings and patterns from one another. For example, the spacing of one type of feature (e.g., in a first lattice) can be different from the spacing of another type of feature (e.g., in a second lattice).
如在本文使用的,术语“随机”可用于指表面上的位置的空间分布,例如布置。例如,光子结构或光子超晶格的一个或更多个特征(例如阱或柱)可以随机地间隔开,使得可以具有彼此相同的类型或不同的类型的最近邻特征具有在彼此之间的可变间距。可选地,在彼此相同的类型或不同的类型的特征之间的间距可以是有序的,例如,形成规则图案,例如直线栅格或六边形栅格。As used herein, the term "random" may be used to refer to the spatial distribution, e.g., arrangement, of locations on a surface. For example, one or more features (e.g., wells or pillars) of a photonic structure or photonic superlattice may be randomly spaced such that nearest neighbor features, which may be of the same type or of different types, have variable spacing between each other. Alternatively, the spacing between features of the same type or of different types may be ordered, e.g., forming a regular pattern, such as a rectilinear grid or a hexagonal grid.
如在本文中使用的,术语“核苷酸”或“核酸”预期意指包括糖和至少一个磷酸基团的分子,并且可选地还包括核碱基。缺少核碱基的核苷酸可以被称为“脱碱基的”。核苷酸包括脱氧核糖核苷酸、改性脱氧核糖核苷酸、核糖核苷酸、改性核糖核苷酸、肽核苷酸、改性肽核苷酸、改性磷酸糖骨架核苷酸及其混合物。核苷酸的例子包括腺苷一磷酸(AMP)、腺苷二磷酸(ADP)、腺苷三磷酸(ATP)、胸苷一磷酸(TMP)、胸苷二磷酸(TDP)、胸苷三磷酸(TTP)、胞苷一磷酸(CMP)、胞苷二磷酸(CDP)、胞苷三磷酸(CTP)、鸟苷二磷酸(GDP)、鸟苷三磷酸(GTP)、尿苷一磷酸(UMP)、尿苷二磷酸(UDP)、尿苷三磷酸(UTP)、脱氧腺苷一磷酸(dAMP)、脱氧腺苷二磷酸(dADP)、脱氧腺苷三磷酸(dATP)、脱氧胸苷一磷酸(dTMP)、脱氧胸苷二磷酸(dTDP)、脱氧胸苷三磷酸(dTTP)、脱氧胞苷二磷酸(dCDP)、脱氧胞苷三磷酸(dCTP)、脱氧鸟苷一磷酸(dGMP)、脱氧鸟苷二磷酸(dGDP)、脱氧鸟苷三磷酸(dGTP)、脱氧尿苷一磷酸(dUMP)、脱氧尿苷二磷酸(dUDP)、脱氧尿苷三磷酸(dUTP)、可逆阻断腺苷三磷酸(rbATP)、可逆阻断胸苷三磷酸(rbTTP)、可逆阻断胞苷三磷酸(rbCTP)以及可逆阻断鸟苷三磷酸(rbGTP)。对于可逆阻断核苷三磷酸(rbNTP)的更多细节,见美国专利公布号2013/0079322,其全部内容通过引用被并入本文。As used in this article, the term "nucleotide" or "nucleic acid" is intended to mean a molecule comprising a sugar and at least one phosphate group, and optionally also comprises a core base. Nucleotides lacking a core base can be referred to as "abasic". Nucleotides include deoxyribonucleotides, modified deoxyribonucleotides, ribonucleotides, modified ribonucleotides, peptide nucleotides, modified peptide nucleotides, modified phosphate sugar backbone nucleotides and mixtures thereof. The example of nucleotides includes adenosine monophosphate (AMP), adenosine diphosphate (ADP), adenosine triphosphate (ATP), thymidine monophosphate (TMP), thymidine diphosphate (TDP), thymidine triphosphate (TTP), cytidine monophosphate (CMP), cytidine diphosphate (CDP), cytidine triphosphate (CTP), guanosine diphosphate (GDP), guanosine triphosphate (GTP), uridine monophosphate (UMP), uridine diphosphate (UDP), uridine triphosphate (UTP), deoxyadenosine monophosphate (dAMP), deoxyadenosine diphosphate (dADP), deoxyadenosine triphosphate (dATP), deoxythymidine monophosphate (d [0014] In some embodiments, the present invention relates to a reversible nucleoside triphosphate (rbNTP), adenosine triphosphate (adenosine triphosphate (adenosine triphosphate), deoxythymidine diphosphate (dTDP), deoxythymidine triphosphate (dTTP), deoxycytidine diphosphate (dCDP), deoxycytidine triphosphate (dCTP), deoxyguanosine monophosphate (dGMP), deoxyguanosine diphosphate (dGDP), deoxyguanosine triphosphate (dGTP), deoxyuridine monophosphate (dUMP), deoxyuridine diphosphate (dUDP), deoxyuridine triphosphate (dUTP), reversibly blocked adenosine triphosphate (rbATP), reversibly blocked thymidine triphosphate (rbTTP), reversibly blocked cytidine triphosphate (rbCTP), and reversibly blocked guanosine triphosphate (rbGTP). For more details on reversibly blocked nucleoside triphosphates (rbNTPs), see U.S. Patent Publication No. 2013/0079322, the entire contents of which are incorporated herein by reference.
术语“核苷酸”或“核酸”还意欲包括任何核苷酸类似物,其是包括改性核碱基、糖和/或磷酸盐部分的一种类型的核苷酸。可被包括在多核苷酸——不管是否具有天然骨干或类似结构——中的示例性改性核碱基包括次黄嘌呤核苷、黄嘌呤(xathanine)、次黄嘌呤(hypoxathanine)、异胞嘧啶、异鸟嘌呤、2-氨基嘌呤、5-甲基胞嘧啶、5-羟甲基胞嘧啶、2-氨基腺嘌呤、6-甲基腺嘌呤、6-甲基鸟嘌呤、2-丙基鸟嘌呤、2-丙基腺嘌呤、2-硫代尿嘧啶、2-硫代胸腺嘧啶、2-硫代胞嘧啶、15-卤代尿嘧啶、15-卤代胞嘧啶、5-丙炔基尿嘧啶、5-丙炔基胞嘧啶、6-偶氮尿嘧啶、6-偶氮胞嘧啶、6-偶氮胸腺嘧啶、5-尿嘧啶、4-硫尿嘧啶、8-卤腺嘌呤或鸟嘌呤、8-氨基腺嘌呤或鸟嘌呤、8-巯基腺嘌呤或鸟嘌呤、8-硫代腺嘌呤或鸟嘌呤、8-羟基腺嘌呤或鸟嘌呤、5-卤代尿嘧啶或胞嘧啶、7-甲基鸟嘌呤、7-甲基腺嘌呤、8-氮鸟嘌呤、8-氮腺嘌呤、7-脱氮鸟嘌呤、7-脱氮腺嘌呤、3-脱氮鸟嘌呤、3-脱氮腺嘌呤或相似物。如在本领域中已知的,某些核苷酸类似物不能被合并到多核苷酸中,例如核苷酸类似物,例如腺苷5’-磷硫酸盐。The term "nucleotide" or "nucleic acid" is also intended to include any nucleotide analogs, which are a type of nucleotide that includes a modified nucleobase, sugar, and/or phosphate moiety. Exemplary modified nucleobases that can be included in a polynucleotide, whether or not having a natural backbone or similar structure, include inosine, xanthine (xathanine), hypoxathanine (hypoxathanine), isocytosine, isoguanine, 2-aminopurine, 5-methylcytosine, 5-hydroxymethylcytosine, 2-aminoadenine, 6-methyladenine, 6-methylguanine, 2-propylguanine, 2-propyladenine, 2-thiouracil, 2-thiothymine, 2-thiocytosine, 15-halouracil, 15-halocytosine, 2-thiothymine, 2-thiocytosine, 15-halouracil ... In some embodiments, the polynucleotides may be nucleotides containing 5'- thiouracil, 5'- thiouracil, 5'- thiouracil, 6 ...
如在本文使用的,术语“多核苷酸”指包括相互结合的核苷酸序列的分子。多核苷酸的例子包括脱氧核糖核酸(DNA)、核糖核酸(RNA)及其类似物。多核苷酸可以是核苷酸的单链序列例如RNA或单链DNA、核苷酸的双链序列例如双链DNA,或者可以包括核苷酸的单链和双链序列的混合物。双链DNA(dsDNA)包括基因组DNA以及PCR和扩增产物。单链DNA(ssDNA)可以转化为dsDNA,反之亦然。多核苷酸中的核苷酸的精确序列可以是已知的或未知的。下面是多核苷酸的例子:基因或基因片段(例如探针、引物、表达序列标签(EST)或基因表达系列分析(SAGE)标签)、基因组DNA、基因组DNA片段、外显子、内含子、信使RNA(mRNA)、转移RNA、核糖体RNA、核糖核酸酶、cDNA、重组多核苷酸、合成多核苷酸、支链多核苷酸、质粒、媒介、任何序列的隔离DNA、任何序列的隔离RNA、核酸探针、引物或任何前述项的扩增拷贝。As used herein, the term "polynucleotide" refers to a molecule comprising a sequence of nucleotides bound to each other. Examples of polynucleotides include deoxyribonucleic acid (DNA), ribonucleic acid (RNA) and analogs thereof. A polynucleotide can be a single-stranded sequence of nucleotides such as RNA or single-stranded DNA, a double-stranded sequence of nucleotides such as double-stranded DNA, or can include a mixture of single-stranded and double-stranded sequences of nucleotides. Double-stranded DNA (dsDNA) includes genomic DNA and PCR and amplification products. Single-stranded DNA (ssDNA) can be converted to dsDNA, and vice versa. The precise sequence of nucleotides in a polynucleotide can be known or unknown. The following are examples of polynucleotides: a gene or gene fragment (e.g., a probe, primer, expressed sequence tag (EST) or serial analysis of gene expression (SAGE) tag), genomic DNA, a genomic DNA fragment, exons, introns, messenger RNA (mRNA), transfer RNA, ribosomal RNA, ribonuclease, cDNA, recombinant polynucleotide, synthetic polynucleotide, branched polynucleotide, plasmid, vector, isolated DNA of any sequence, isolated RNA of any sequence, nucleic acid probe, primer, or an amplified copy of any of the foregoing.
如在本文使用的,“化学耦合”预期意指在第一构件和第二构件之间的附接。在一些实施例中,这种附接在所附接的构件被使用的条件下通常是不可逆的。在其他实施例中,这种附接是可逆的,但持续至少一段时间,在这段时间中,它用于在本文阐述的分析或制备技术的一个或更多个步骤(例如检测聚合物的亚单位的分析步骤)。这种附接可以通过化学键例如通过共价键、氢键、离子键、偶极-偶极键、伦敦分散力或其任何合适的组合来形成。共价键只是可适当地用于将第一构件耦合到第二构件的附接的一个例子。其他例子包括在寡核苷酸之间的双链体、肽-肽相互作用和半抗原-抗体相互作用例如链霉抗生素蛋白-生物素、链霉抗生素蛋白-脱硫生物素和地高辛-抗地高辛。在一个实施例中,可以通过将第一多核苷酸与抑制第一多核苷酸从第二多核苷酸的分离的第二多核苷酸杂交来形成附接。可选地,可以使用物理或生物相互作用例如在第一蛋白质和第二蛋白质之间的相互作用来形成附接,该相互作用抑制第一蛋白质从第二蛋白质的分离。如在本文使用的,“聚合酶”预期意指具有通过将核苷酸聚合成多核苷酸而组合多核苷酸的活性位点的酶。聚合酶可以结合引物单链多核苷酸模板,并且可以顺序地向生长引物添加核苷酸以形成具有与模板的序列互补的序列的多核苷酸。As used herein, "chemical coupling" is intended to mean the attachment between the first component and the second component. In some embodiments, this attachment is generally irreversible under the conditions in which the attached component is used. In other embodiments, this attachment is reversible, but lasts for at least a period of time, during which time it is used for one or more steps of the analysis or preparation techniques set forth herein (e.g., an analysis step for detecting the subunits of a polymer). This attachment can be formed by chemical bonds, such as by covalent bonds, hydrogen bonds, ionic bonds, dipole-dipole bonds, London dispersion forces, or any suitable combination thereof. A covalent bond is just an example of an attachment that can be suitably used to couple the first component to the second component. Other examples include duplexes, peptide-peptide interactions, and hapten-antibody interactions between oligonucleotides, such as streptavidin-biotin, streptavidin-desthiobiotin, and digoxin-anti-digoxin. In one embodiment, attachment can be formed by hybridizing a first polynucleotide with a second polynucleotide that inhibits the separation of the first polynucleotide from the second polynucleotide. Alternatively, attachment can be formed using a physical or biological interaction, such as an interaction between a first protein and a second protein that inhibits separation of the first protein from the second protein. As used herein, "polymerase" is intended to mean an enzyme having an active site that assembles polynucleotides by polymerizing nucleotides into polynucleotides. A polymerase can bind to a primer single-stranded polynucleotide template and can sequentially add nucleotides to the growing primer to form a polynucleotide having a sequence complementary to that of the template.
如在本文使用的,术语“近似”或“大约”意指在规定值的10%内。As used herein, the term "approximately" or "about" means within 10% of a stated value.
在本文提供了包括光子结构的组成物和设备,其例如用于可选地在激发的法线入射下在多个激发和/或冷光发射带中的来自分析物(例如DNA簇)的单色或多色发光信号增强。例如,在CMOS成像阵列的顶部上的光子芯片和微流控芯片的单片集成可用于减小DNA测序仪的尺寸,例如使DNA测序仪小型化。基于CMOS的测序设备的吞吐量可能受到成像像素的大小的限制。例如,相对大的像素尺寸可能对从单个DNA分子或相同分子的簇提供足够的信号收集是有用的。虽然可以将像素做得更小以增加吞吐量,但是这种尺寸减小可能减小满阱容量,并且可能增加在像素之间的串扰,从而降低成像和测序的信噪比(SNR)。这种方法也可能例如通过增加成像阵列的工程量以及这种成像阵列与光子和/或微流控部件的集成来增加制造成像阵列的成本。Provided herein are compositions and devices including photonic structures, for example, for enhancing the monochromatic or polychromatic luminescent signal from an analyte (e.g., a DNA cluster) in a plurality of excitation and/or cold light emission bands, optionally under the normal incidence of excitation. For example, the monolithic integration of a photonic chip and a microfluidic chip on top of a CMOS imaging array can be used to reduce the size of a DNA sequencer, for example, miniaturizing a DNA sequencer. The throughput of a sequencing device based on CMOS may be limited by the size of imaging pixels. For example, a relatively large pixel size may be useful for providing enough signal collection from a single DNA molecule or a cluster of identical molecules. Although pixels can be made smaller to increase throughput, this size reduction may reduce full well capacity and may increase crosstalk between pixels, thereby reducing the signal-to-noise ratio (SNR) of imaging and sequencing. This method may also, for example, increase the cost of manufacturing an imaging array by increasing the engineering effort of the imaging array and the integration of this imaging array with photons and/or microfluidic components.
通过提供每设备多个测试位点来增加吞吐量的可选方式可以涉及引入每像素多个发光位点(例如DNA簇、微阵列反应室等)。例如,在特定实施例中,本发明的组成物、设备和方法可以通过使用激发源在彼此不同的时间选择性地激发不同的位点并在每个这样的时间获得相应的图像使用成像像素来使多个位点成像,每个位点可以包括相应的分析物。说明性地,可以提供成像像素阵列,并且可以在每个这样的成像像素上布置多个位点。相对于在每个给定像素上仅布置一个位点的配置,本发明的每像素多位点配置可以显著增加使用给定像素阵列可以被成像的位点的数量。然而,如果布置在给定成像像素上的所有位点彼此同时被激发,则像素将接收来自每个这样的位点的彼此同时的发光,因而阻碍基于电信号来区分开来自一个这样的位点的发光和来自另一个这样的位点的发光的能力,像素响应于接收到这样的发光而产生该电信号。An alternative approach to increasing throughput by providing multiple test sites per device can involve introducing multiple luminescent sites per pixel (e.g., DNA clusters, microarray reaction chambers, etc.). For example, in particular embodiments, the compositions, devices, and methods of the present invention can image multiple sites using imaging pixels by selectively exciting different sites at different times from one another using an excitation source and obtaining a corresponding image at each such time, each site may include a corresponding analyte. Illustratively, an array of imaging pixels can be provided, and multiple sites can be arranged on each such imaging pixel. The multi-site per pixel configuration of the present invention can significantly increase the number of sites that can be imaged using a given pixel array relative to a configuration in which only one site is arranged on each given pixel. However, if all sites arranged on a given imaging pixel are excited simultaneously with each other, the pixel will receive simultaneous luminescence from each such site, thereby hindering the ability to distinguish luminescence from one such site from luminescence from another such site based on an electrical signal that the pixel generates in response to receiving such luminescence.
可以使用例如这里提供的光学技术,以便在给定时间选择性地仅激发布置在给定成像像素上的多个位点中的单个位点,以便响应于当时仅来自该位点的发光而获得来自该像素的电信号,并且随后在第二时间激发在该成像像素上的多个位点中的第二位点,以便响应于来自该第二位点的发光而获得来自该像素的第二电信号。因此,基于在这两个时间从成像像素获得的电信号,可以将来自这两个位点的发光彼此区分开来。因此,本发明的组成物、设备和方法可以提供比在成像阵列中的像素的数量更大的数量的位点的发光成像,例如像素的数量的整数倍n,其中n大于或等于2、3、4、5或大于5。Optical techniques, such as those provided herein, can be used to selectively excite only a single site among a plurality of sites arranged on a given imaging pixel at a given time to obtain an electrical signal from the pixel in response to luminescence from only that site at that time, and subsequently excite a second site among a plurality of sites on the imaging pixel at a second time to obtain a second electrical signal from the pixel in response to luminescence from the second site. Thus, based on the electrical signals obtained from the imaging pixel at these two times, the luminescence from the two sites can be distinguished from each other. Thus, the compositions, apparatus, and methods of the present invention can provide luminescence imaging of a greater number of sites than the number of pixels in the imaging array, such as an integer multiple n of the number of pixels, where n is greater than or equal to 2, 3, 4, 5, or greater than 5.
如本文所提供的,通过在彼此不同的时间选择性地将激发光子引导位点中的相应的位点,可以选择性地激发布置在成像像素上的不同位点。例如,聚焦激光束可以在彼此不同的时间在不同的位点之上被扫描,以便在这样的时间选择性地激发不同位点中的位点,像素在这样的时间响应于来自被激发的特定位点的发光而产生电信号。作为另一个例子,位点可以在第一时间用任何合适数量的相互干涉的激光束被照射以便在第一时间产生选择性地激发位点之一的第一光强度图案,并且可以在第二时间用任何合适数量的相互干涉的激光束被照射以便在第二时间产生选择性地激发位点中的另一个的第二光强度图案。像素可以响应于来自相应位点的发光而在第一和第二时间产生相应的电信号。作为又一示例,这些位点可以布置在光子结构之上或内,光子结构布置在成像像素上。光子结构可以被配置成在第一时间响应于用具有第一特性的光子照射而选择性地激发像素上的位点之一,并且在第二时间响应于用具有第二特性的光子照射而选择性地激发像素上的位点中的另一个。像素可以响应于来自相应位点的发光而在第一和第二时间产生相应电信号。As provided herein, different sites arranged on an imaging pixel can be selectively excited by selectively directing excitation photons to corresponding sites in the sites at different times. For example, a focused laser beam can be scanned over different sites at different times to selectively excite sites in the different sites at such times, and the pixel generates an electrical signal at such times in response to luminescence from the specific site being excited. As another example, the site can be irradiated with any suitable number of mutually interfering laser beams at a first time to generate a first light intensity pattern that selectively excites one of the sites at the first time, and can be irradiated with any suitable number of mutually interfering laser beams at a second time to generate a second light intensity pattern that selectively excites another of the sites at the second time. The pixel can generate corresponding electrical signals at the first and second times in response to luminescence from the corresponding site. As another example, the sites can be arranged on or within a photonic structure, and the photonic structure is arranged on the imaging pixel. The photonic structure can be configured to selectively excite one of the sites on the pixel in response to irradiation with photons having a first characteristic at a first time, and to selectively excite another of the sites on the pixel in response to irradiation with photons having a second characteristic at a second time. The pixels may generate corresponding electrical signals at first and second times in response to luminescence from corresponding sites.
本发明的基于光子结构的设备、组成物和方法与先前已知的落射荧光显微术和显微镜扫描系统(例如在例如由Illumina有限公司(加州圣地亚哥)生产的市场上可买到的测序平台中的那些系统)兼容,在一些情况下,这些系统可以使用在法线下激发并在各种光谱窗口中在法线入射下成像的多种荧光染料。这种染料可以与核苷酸耦合,以便便于对多核苷酸例如DNA进行测序。然而,应当认识到,本发明的基于光子结构的设备、组成物和方法可适当地在任何类型的发光成像或任何其他合适的应用中使用,并且不限于在对多核苷酸例如DNA进行测序中使用。The photonic structure-based devices, compositions and methods of the present invention are compatible with previously known epifluorescence microscopy and microscope scanning systems (such as those in commercially available sequencing platforms produced, for example, by Illumina, Inc. (San Diego, California), which, in some cases, can use a variety of fluorescent dyes that are excited under normal light and imaged under normal incidence in various spectral windows. Such dyes can be coupled to nucleotides to facilitate sequencing of polynucleotides such as DNA. However, it should be appreciated that the photonic structure-based devices, compositions and methods of the present invention can be suitably used in any type of luminescence imaging or any other suitable application, and are not limited to use in sequencing of polynucleotides such as DNA.
先前已成功地利用介电基板的图案化来控制多核苷酸簇的大小和均匀性,并增加此类簇的密度,以便提高测序的吞吐量。见例如通过引用被并入本文的美国专利申请公布号2014/0243224 A1。然而,簇尺寸的减小导致所收集的多色荧光信号的数量的显著减少。例如,当DNA簇中的所标记的核苷酸的数量减少(例如降低到单分子水平或成像系统的分辨率限制)时,来自大采样区域的微弱多色荧光信号的检测可能变得越来越困难。因此,显著的荧光信号增强能够有助于促进核苷酸鉴定和增加下一代SBS系统的吞吐量。Previously, the patterning of dielectric substrates has been successfully utilized to control the size and uniformity of polynucleotide clusters, and to increase the density of such clusters, so as to improve the throughput of sequencing. See, for example, U.S. Patent Application Publication No. 2014/0243224 A1, which is incorporated herein by reference. However, the reduction in cluster size causes a significant reduction in the quantity of collected multicolor fluorescent signals. For example, when the number of labeled nucleotides in the DNA cluster is reduced (for example, reduced to the single molecule level or the resolution limit of the imaging system), the detection of the faint multicolor fluorescent signals from a large sampling area may become increasingly difficult. Therefore, significant fluorescence signal enhancement can contribute to promoting nucleotide identification and increasing the throughput of next-generation SBS systems.
例如,在荧光标记的生物分子附近的例如高折射率电介质的材料的周期性图案化可以通过创建具有在光波长的数量级的折射率的周期性变化的一维或二维波导来增强荧光信号。这种波导——其可以被称为光子晶体(PhC)、光子晶格、光子晶体晶格或PhC晶格——可以支持高Q谐振模,该高Q谐振模可以通过谐振地增强荧光团激发、荧光收集或两者来增强荧光信号。对于使用PhC晶格的单色荧光信号增强的例子,见下面的参考文献,其中每个文献的全部内容通过引用被并入本文:Cunningham等人的美国专利号7,768,640;Estrada等人的“Small volume excitation and enhancement of dye fluorescence ona 2D photonic crystal surface”(Opt.Express 18:3693-3699(2010));Zhen等人的“Enabling enhanced emission and low-threshold lasing of organic moleculesusing special Fano resonances of macroscopic photonic crystals”(PNAS 110:13711-13716(2013));Kaji等人的“Fabrication of two-dimensional Ta2O5photoniccrystal slabs with ultra-low background emission toward highly sensitivefluorescence spectroscopy”(Opt.Express 19:1422-1428(2011));以及Pokhriyal等人的“Photonic crystal enhanced fluorescence using a quartz substrate to reducelimits of detection”(Opt.Express 18:24793-24808(2010))。For example, periodic patterning of a material, such as a high-refractive-index dielectric, near fluorescently labeled biomolecules can enhance the fluorescence signal by creating a one- or two-dimensional waveguide with a periodic variation in refractive index on the order of the wavelength of light. Such a waveguide—which may be referred to as a photonic crystal (PhC), a photonic lattice, a photonic crystal lattice, or a PhC lattice—can support high-Q resonant modes that can enhance the fluorescence signal by resonantly enhancing fluorophore excitation, fluorescence collection, or both. For examples of monochromatic fluorescence signal enhancement using PhC lattices, see the following references, each of which is incorporated herein by reference in its entirety: U.S. Pat. No. 7,768,640 to Cunningham et al.; “Small volume excitation and enhancement of dye fluorescence on a 2D photonic crystal surface” (Opt. Express 18:3693-3699 (2010)) to Estrada et al.; “Enabling enhanced emission and low-threshold lasing of organic molecules using special Fano resonances of macroscopic photonic crystals” (PNAS 110:13711-13716 (2013)) to Zhen et al.; “Fabrication of two-dimensional Ta 2 O 5 photonic crystal slabs with ultra-low background emission toward highly sensitive fluorescence spectroscopy” (Opt. Express 19:1422-1428 (2011)) to Kaji et al.; and “Photonic crystal slabs with ultra-low background emission toward highly sensitive fluorescence spectroscopy” (Opt. Express 19:1422-1428 (2011)) to Pokhriyal et al. enhanced fluorescence using a quartz substrate to reduce limits of detection” (Opt. Express 18:24793-24808(2010)).
PhC晶格也可在多色荧光信号增强中使用。例如,使用PhC通过在不同波长处的激发的谐振增强来实现双激发荧光信号增强,该谐振增强需要激发源的入射角的调节以匹配由PhC支持的谐振。对于另外的细节,见Lu等人的美国专利号8,344,333,其全部内容通过引入被并入本文。然而,因为Lu等人描述的信号增强方案通过调节照射角度在反荧光模式(trans-fluorescence mode)中操作,这样的方案对于依赖于所有感兴趣波长的固定入射角处的多色外延照射(例如法线或接近法线入射角)的成像或测序平台是不方便的。PhC lattices can also be used in multicolor fluorescence signal enhancement. For example, dual excitation fluorescence signal enhancement is achieved using PhC by resonant enhancement of excitation at different wavelengths, which requires adjustment of the incident angle of the excitation source to match the resonance supported by the PhC. For additional details, see U.S. Patent No. 8,344,333 to Lu et al., the entire contents of which are incorporated herein by reference. However, because the signal enhancement scheme described by Lu et al. operates in trans-fluorescence mode by adjusting the illumination angle, such a scheme is inconvenient for imaging or sequencing platforms that rely on multicolor epitaxial illumination at fixed incident angles for all wavelengths of interest (e.g., normal or near-normal angles of incidence).
图1A示意性地示出了用于在像素内的对位点的发光成像中使用的示例性基于光子结构的设备的透视图。图1A所示的设备包括成像像素,例如基于互补金属氧化物半导体(CMOS)的图像传感器;布置在成像像素上的光子结构,例如PhC层;以及在布置在PhC层上的第三材料内限定的纳米阱。PhC层可包括具有n1的折射率的第一材料(用黑色示出)和在第一材料内限定并填充有具有n2的折射率的第二材料(用白色示出)的均匀形状和尺寸的阱的规则图案,其中n1和n2彼此不同。包括一个或更多个发光体例如分别耦合到发光体的一个或更多个分析物例如分别耦合到发光体的一个或更多个核苷酸的位点可以布置在纳米阱内。发光体可布置在PhC层的近场中,并由激发波长例如具有合适特性的光子(在图1A中被示为大的指向下的箭头)短暂地激发。成像像素可以适当地电耦合到检测电路(未具体示出),其可以被配置成接收和分析由成像像素响应于由发光体产生的发光而产生的电信号。尽管成像像素在图1A中被示为在每一侧上具有1.75μm的尺寸,但是应当认识到,可以使用任何合适尺寸的成像像素。Figure 1A schematically illustrates a perspective view of an exemplary photonic structure-based device for use in luminescent imaging of sites within a pixel. The device shown in Figure 1A includes an imaging pixel, such as a complementary metal oxide semiconductor (CMOS)-based image sensor; a photonic structure, such as a PhC layer, disposed on the imaging pixel; and nanowells defined within a third material disposed on the PhC layer. The PhC layer may include a first material having a refractive index of n1 (shown in black) and a regular pattern of wells of uniform shape and size defined within the first material and filled with a second material having a refractive index of n2 (shown in white), where n1 and n2 differ from each other. Sites comprising one or more luminophores, such as one or more analytes, such as one or more nucleotides, respectively coupled to the luminophores, may be disposed within the nanowells. The luminophores may be disposed in the near field of the PhC layer and transiently excited by an excitation wavelength, such as a photon with appropriate characteristics (shown as a large downward-pointing arrow in Figure 1A). The imaging pixels may be suitably electrically coupled to detection circuitry (not specifically shown) that may be configured to receive and analyze electrical signals generated by the imaging pixels in response to luminescence generated by the luminophores. Although the imaging pixels are shown in FIG1A as having dimensions of 1.75 μm on each side, it will be appreciated that any suitable size of imaging pixels may be used.
可选地,可以提供任何合适数量的这种设备的阵列。例如,图1B示意性地示出了在设备阵列例如图1A所示的设备阵列内的示例性位点阵列的透视图,其中每个位点(被表示为黑色圆圈)对应于像素(被表示为矩形)。也就是说,图1B所示的示例性阵列包括针对每个像素的一个位点。另外,每个这样的设备可以包括任何合适数量和类型的材料。例如,图1C示意性地示出了例如图1A所示的示例性设备的截面图。在图1A-1C所示的设备的示例性实施例中,PhC层可以布置在例如本领域中已知的任何合适的成像像素上。PhC层可以包括被图案化以便限定光子晶体的第一材料,例如氮化硅(SiN)。诸如氧化钽(TaO)的第二材料可以布置在PhC层上。纳米阱可以被限定在第三材料例如SiN中,而第四材料如TaO可以被布置在纳米阱上。如图1A-1C所示,可以在每个成像像素上布置单个纳米阱。因此,每个成像像素可以从布置在该像素上的纳米阱内的发光体接收发光,并响应于接收到这种发光而产生合适的电信号。Alternatively, an array of any suitable number of such devices may be provided. For example, FIG. 1B schematically illustrates a perspective view of an exemplary array of sites within an array of devices, such as the array of devices shown in FIG. 1A , wherein each site (represented as a black circle) corresponds to a pixel (represented as a rectangle). That is, the exemplary array shown in FIG. 1B includes one site for each pixel. In addition, each such device may include any suitable number and type of materials. For example, FIG. 1C schematically illustrates a cross-sectional view of an exemplary device, such as that shown in FIG. 1A . In exemplary embodiments of the devices shown in FIG. 1A-1C , a PhC layer may be disposed on, for example, any suitable imaging pixel known in the art. The PhC layer may include a first material, such as silicon nitride (SiN), patterned to define a photonic crystal. A second material, such as tantalum oxide (TaO), may be disposed on the PhC layer. Nanowells may be defined in a third material, such as SiN, and a fourth material, such as TaO, may be disposed on the nanowells. As shown in FIG. 1A-1C , a single nanowell may be disposed on each imaging pixel. Thus, each imaging pixel can receive luminescence from a luminophore within a nanowell disposed above the pixel and generate an appropriate electrical signal in response to receiving such luminescence.
例如,图2A示意性地示出了图1B所示的位点阵列的示例性激发的透视图。说明性地,可以用来自单个光源(例如激光器)的均匀(平顶)照明来照射位点阵列。这种照射适当地可以在这样的位点(例如在图1A和1C示出)之下的PhC中激发一个或更多个谐振模。例如,图2B示意性地示出了响应于例如图2A所示的激发的在例如图1A和1C所示的设备阵列内的模拟示例性场强。可以调整PhC的特征,以便提供在紧接着在纳米阱200下方的位置上提供相对高的场强,因而选择性地激发布置在该纳米阱内的位点处的发光体。For example, FIG2A schematically illustrates a perspective view of an exemplary excitation of the array of sites shown in FIG1B. Illustratively, the array of sites can be illuminated with uniform (top-hat) illumination from a single light source (e.g., a laser). Such illumination can appropriately excite one or more resonant modes in a PhC beneath such sites (e.g., shown in FIG1A and FIG1C). For example, FIG2B schematically illustrates simulated exemplary field strengths within an array of devices, such as those shown in FIG1A and FIG1C, in response to excitation such as that shown in FIG2A. The characteristics of the PhC can be adjusted to provide a relatively high field strength immediately below nanowell 200, thereby selectively exciting the luminophores at the sites disposed within the nanowell.
如在本文所提供的,通过在彼此不同的时间选择性地激发这样的位点中的不同位点,位点的数量可以增加为成像像素的数量的整数倍n>1。例如,图3A示意性地示出了例如在此提供的示例性位点阵列的透视图,其中多个位点对应于一个像素。在图3A所示的非限制性示例中,提供每像素(被表示为矩形)四个位点(分别被表示为具有彼此不同填充的圆),尽管应当认识到,可以提供每像素任何合适数量的位点,例如每像素2个或更多个位点、每像素3个或更多个位点、每像素4个或更多个位点、或者每像素5个或更多个位点。可以使用任何合适的特征来提供这样的位点。例如,图3B示意性地示出了例如在此提供的设备的截面图,其中多个位点对应于例如图3A所示的像素。在图3A-3B所示的设备的示例性实施例中,可选的光子结构可以布置在例如本领域已知的任何合适的成像像素上。可选的光子晶体可以包括布置在成像像素上的第一材料,例如氮化硅(SiN);布置在第一材料上的第二材料,例如二氧化硅(SiO2);以及包括第三材料(例如SiN)和第四材料(例如SiO2)的图案的光子晶体。第五材料例如氧化钽(TaO)可以布置在PhC层上。诸如多个纳米阱的多个特征可以被限定在诸如SiO2的第六材料中,并且诸如TaO的第七材料可以布置在多个纳米阱上。如图3A-3B所示,多个特征例如多个纳米阱可以布置在每个成像像素上。因此,每个成像像素可以在不同时间从布置在每个这样的特征内或之上例如在该像素之上的每个这样的纳米阱内的发光体接收发光,并且在这样的不同时间响应于接收到这样的发光而产生合适的电信号。成像像素、可选的光子结构和特征可选地可以彼此单片地集成。As provided herein, by selectively exciting different ones of such sites at different times from one another, the number of sites can be increased to an integer multiple n>1 of the number of imaging pixels. For example, FIG3A schematically illustrates a perspective view of an exemplary array of sites, for example, provided herein, wherein a plurality of sites corresponds to one pixel. In the non-limiting example shown in FIG3A , four sites (represented as circles having different fills from one another) are provided per pixel (represented as rectangles), although it will be appreciated that any suitable number of sites per pixel may be provided, for example, 2 or more sites per pixel, 3 or more sites per pixel, 4 or more sites per pixel, or 5 or more sites per pixel. Such sites may be provided using any suitable features. For example, FIG3B schematically illustrates a cross-sectional view of an apparatus, for example, provided herein, wherein a plurality of sites corresponds to the pixels, for example, shown in FIG3A . In the exemplary embodiment of the apparatus shown in FIG3A-3B , an optional photonic structure may be arranged on, for example, any suitable imaging pixel known in the art. The optional photonic crystal may include a first material, such as silicon nitride (SiN), disposed on the imaging pixel; a second material, such as silicon dioxide ( SiO2 ), disposed on the first material; and a photonic crystal comprising a pattern of a third material (e.g., SiN) and a fourth material (e.g., SiO2 ). A fifth material, such as tantalum oxide (TaO), may be disposed on the PhC layer. A plurality of features, such as a plurality of nanowells, may be defined in a sixth material, such as SiO2 , and a seventh material, such as TaO, may be disposed on the plurality of nanowells. As shown in Figures 3A-3B, a plurality of features, such as a plurality of nanowells, may be disposed on each imaging pixel. Thus, each imaging pixel may receive luminescence from a luminophore disposed within or above each such feature, such as within each such nanowell above the pixel, at different times and generate appropriate electrical signals in response to receiving such luminescence at such different times. The imaging pixel, the optional photonic structure, and the features may optionally be monolithically integrated with one another.
应当认识到,图3B所示的可选的光子结构被规定为是示例性的,而不是限制性的。例如,光子结构可以包括光子晶体或光子结构或微腔阵列或等离子体纳米天线阵列。It should be appreciated that the optional photonic structures shown in Figure 3B are intended to be exemplary, rather than limiting. For example, the photonic structure may include a photonic crystal or a photonic structure or a microcavity array or a plasmonic nanoantenna array.
例如参考图3A-3B,可以使用任何合适的技术来选择性地激发例如这里提供的位点。例如,光子结构可选地可以被省略,并且在给定像素上的位点可以通过将光子引导到这样的位点来选择性地被激发。说明性地,聚焦激光束可以在彼此不同的时间在不同的位点之上被扫描,以便在这样的时间选择性地激发不同位点中的位点,像素在这样的时间响应于来自正被激发的特定位点的发光而产生电信号。例如,图4A示意性地示出了使用例如在本文提供的扫描聚焦光束照明对图3A所示的位点阵列的选定位点进行的示例性激发的透视图。说明性地,可以使用高精度自由空间光束控制或者通过样本操纵以与在Hahn等人的“Laser scanning lithography for surface micropatterning on hydrogels”(Adv.Mater.17:2939-2942(2005))中所描述的或在Brakenhoff等人的“Confocal lightscanning microscopy with high-aperture immersion lenses”(J.Microsc.117:219-232(1997))中所描述的方式类似的方式实现激发光束的精确控制,这两个文献的全部内容通过引用被并入本文。For example, with reference to Figures 3A-3B, any suitable technique can be used to selectively excite sites such as those provided herein. For example, the photonic structure can optionally be omitted, and sites on a given pixel can be selectively excited by directing photons to such sites. Illustratively, a focused laser beam can be scanned over different sites at different times relative to one another so as to selectively excite sites in different sites at such times, with the pixels generating electrical signals at such times in response to luminescence from the specific sites being excited. For example, Figure 4A schematically illustrates a perspective view of an exemplary excitation of selected sites of the array of sites shown in Figure 3A using, for example, scanning focused beam illumination provided herein. Illustratively, precise control of the excitation beam can be achieved using high-precision free-space beam steering or by sample manipulation in a manner similar to that described in Hahn et al., “Laser scanning lithography for surface micropatterning on hydrogels” (Adv. Mater. 17:2939-2942 (2005)) or in Brakenhoff et al., “Confocal lightscanning microscopy with high-aperture immersion lenses” (J. Microsc. 117:219-232 (1997)), the entire contents of both of which are incorporated herein by reference.
作为另一个例子,位点可以在第一时间用任何合适数量的相互干涉的激光束被照射以便在第一时间产生选择性地激发位点之一的第一光强度图案,并且可以在第二时间用任何合适数量的相互干涉的激光束被照射以便在第二时间产生选择性地激发位点中的另一个的第二光强度图案。像素可以响应于来自相应位点的发光而在第一和第二时间产生相应电信号。例如,图4B示意性地示出了使用例如本文提供的多激光干涉照明对图3A所示的位点阵列的选定位点进行的示例性激发的透视图。可以使用与在van Wolferen等人的“Laser interference lithography”(在Lithography:Principles,Processes andMaterials中,第133-148页,Theodore Hennessy,Ed.,Nova Science Publishers,Inc.(2011))中或在He等人的“Polarization control in flexible interferencelithography for nano-patterning of different photonic structures withoptimized contrast”(Optics Express 11518-11525(May 4,2015))中所述的多激光干涉照明类似的多激光干涉照明来选择性地照射这些位点,其中每个文献的全部内容通过引用被并入本文。As another example, a site can be illuminated at a first time with any suitable number of mutually interfering laser beams to produce a first light intensity pattern that selectively excites one of the sites at the first time, and can be illuminated at a second time with any suitable number of mutually interfering laser beams to produce a second light intensity pattern that selectively excites another of the sites at the second time. The pixels can generate corresponding electrical signals at the first and second times in response to luminescence from the corresponding sites. For example, FIG4B schematically illustrates a perspective view of an exemplary excitation of selected sites of the array of sites shown in FIG3A using, for example, multi-laser interference illumination as provided herein. These sites can be selectively illuminated using multi-laser interferometry illumination similar to that described in van Wolferen et al., “Laser interference lithography” (in Lithography: Principles, Processes and Materials, pp. 133-148, Theodore Hennessy, Ed., Nova Science Publishers, Inc. (2011)) or in He et al., “Polarization control in flexible interference lithography for nano-patterning of different photonic structures with optimized contrast” (Optics Express 11518-11525 (May 4, 2015)), the entire contents of each of which are incorporated herein by reference.
作为又一例子,这些位点可以布置在光子结构之上或内,光子结构布置在成像像素上。光子结构可以被配置成在第一时间响应于用具有第一特性的光子照射而选择性地激发像素上的位点之一,并且在第二时间响应于用具有第二特性的光子照射而选择性地激发像素上的位点中的另一个。像素可以响应于来自相应位点的发光而在第一和第二时间产生相应电信号。例如,图5示意性地示出了例如可以被包括在例如这里提供并在图3A、3B中示出的设备中的示例性光子结构。在图5所示的特定实施例中,光子结构可以包括光子晶体(PhC),但是应当认识到,光子结构可以包括光子超晶格或微腔阵列或等离子体纳米天线阵列。图5所示的示例性PhC包括在材料内限定的特征的六边形阵列,其中在特征之间的间距ΛPhC具有激发波长λ激发的波长的量级。As another example, the sites can be arranged on or within a photonic structure that is arranged on an imaging pixel. The photonic structure can be configured to selectively excite one of the sites on the pixel in response to illumination with photons having a first characteristic at a first time, and to selectively excite another of the sites on the pixel in response to illumination with photons having a second characteristic at a second time. The pixel can generate corresponding electrical signals at the first and second times in response to luminescence from the corresponding site. For example, Figure 5 schematically illustrates an exemplary photonic structure that can be included in, for example, a device provided herein and shown in Figures 3A, 3B. In the specific embodiment shown in Figure 5, the photonic structure can include a photonic crystal (PhC), but it will be appreciated that the photonic structure can include a photonic superlattice or a microcavity array or a plasmonic nanoantenna array. The exemplary PhC shown in Figure 5 includes a hexagonal array of features defined within the material, wherein the spacing ΛPhC between the features is on the order of the wavelength of the excitation wavelength λexcitation .
可以调整光子结构,例如PhC(例如,可以选择PhC的特征),使得具有彼此不同的特性的光子可以选择性地激发在PhC内的不同谐振。光子结构设计参数可以在计算上被调整,以便例如使用有限差分时域(FDTD)、严格耦合波分析(RCWA)和平面波展开(PWE)中的一个或更多个来将谐振调整到发光体的相应期望位置和/或激发或发射峰值。设计优化可以采用多参数扫描或自优化算法来最大化期望在期望物理区域和/或光谱区域中的发光信号,例如荧光信号。例如,光子结构将包括的材料的折射率、高场强被期望的空间位置和波长——对于该波长,期望光子结构选择性地支持谐振——可以以计算方式被定义,并且FDTD、RCWA、PWE或任何其他合适的优化程序的任何合适的组合可被使用,以便调整结构的其他参数,例如在结构内的特征的尺寸、形状和分布,以便探究结构的设计参数空间,并且识别使结构的光谱和空间特征与期望发光体位置和/或激发或发射波长对准的参数的组合。Photonic structures, such as PhCs, can be tuned (e.g., features of the PhC can be selected) so that photons with distinct properties can selectively excite different resonances within the PhC. Photonic structure design parameters can be computationally tuned to adjust the resonances to the desired locations and/or excitation or emission peaks of the emitters, for example, using one or more of finite-difference time-domain (FDTD), rigorous coupled-wave analysis (RCWA), and plane-wave expansion (PWE). Design optimization can employ multi-parameter sweeps or self-optimization algorithms to maximize a desired luminescence signal, such as a fluorescence signal, within a desired physical and/or spectral region. For example, the refractive index of the material the photonic structure will comprise, the desired spatial location of high field intensity, and the wavelength for which the photonic structure is desired to selectively support resonances can be computationally defined, and any suitable combination of FDTD, RCWA, PWE, or any other suitable optimization program can be used to adjust other parameters of the structure, such as the size, shape, and distribution of features within the structure, in order to explore the design parameter space of the structure and identify a combination of parameters that aligns the structure's spectral and spatial features with the desired emitter location and/or excitation or emission wavelength.
例如,图6A-6D示意性地示出了对于辐射源的在例如图5所示的光子晶体内的示例性模拟场强,该辐射源在不同时间分别产生具有彼此不同的特性的光子。模拟光子晶体包括在位于SiO2衬底的顶部上的Ta2O5膜中的气孔的六边形阵列。更具体地,图6A示出了对于在第一时间具有第一偏振(例如X偏振)的光子的在图5的示例性光子晶体内的模拟场强;图6B示出了对于在第二时间具有第二偏振(例如Y偏振)的光子的在该光子晶体内的模拟场强;图6C示出了对于在第三时间具有第三偏振(例如RX偏振)的光子的在该光子晶体内的模拟场强;以及图6D示出了对于在第四时间具有第四偏振(例如RY偏振)的光子的在该光子晶体内的模拟场强。基于图6A-6D,可以理解,通过改变光子的偏振,可以激发在光子晶体内的场强的不同图案。应当认识到,按照场强的不同图案,改变光子的其他特性,例如光子的波长或角度,在光子晶体内的场强的不同图案可以类似地被激发。可以通过适当地调整光子结构的特征并适当地改变在彼此不同的时间照射该结构的光子的特性来获得任何合适类型的光子结构例如光子晶体、光子超晶格、微腔阵列或等离子体纳米天线阵列的场强的图案的类似差异。For example, Figures 6A-6D schematically illustrate exemplary simulated field intensities within a photonic crystal, such as that shown in Figure 5, for a radiation source that generates photons having different characteristics at different times. The simulated photonic crystal includes a hexagonal array of pores in a Ta 2 O 5 film located on top of a SiO 2 substrate. More specifically, Figure 6A shows the simulated field intensities within the exemplary photonic crystal of Figure 5 for a photon having a first polarization (e.g., X polarization) at a first time; Figure 6B shows the simulated field intensities within the photonic crystal for a photon having a second polarization (e.g., Y polarization) at a second time; Figure 6C shows the simulated field intensities within the photonic crystal for a photon having a third polarization (e.g., RX polarization) at a third time; and Figure 6D shows the simulated field intensities within the photonic crystal for a photon having a fourth polarization (e.g., RY polarization) at a fourth time. Based on Figures 6A-6D, it can be understood that by changing the polarization of the photons, different patterns of field intensities within the photonic crystal can be excited. It will be appreciated that by varying other properties of the photons, such as their wavelength or angle, different patterns of field intensity within a photonic crystal can be similarly excited according to different patterns of field intensity. Similar variations in the pattern of field intensity can be achieved for any suitable type of photonic structure, such as a photonic crystal, a photonic superlattice, a microcavity array, or a plasmonic nanoantenna array, by appropriately adjusting the characteristics of the photonic structure and appropriately varying the properties of the photons that illuminate the structure at different times relative to one another.
在一些实施例中,本发明的设备、组成物和方法可以提供多个发光体,包括分别与在彼此不同的时间激发的场强的不同图案在空间上重叠的位点。例如,图7A示意性地示出了例如在此提供并在图3A-3B中示出的示例性的基于光子结构的设备的平面图,该设备包括每像素第一和第二位点(例如簇)。该设备可以包括成像像素阵列、布置在成像像素阵列上的光子结构;以及布置在光子结构上的特征阵列。光子结构可以例如包括光子晶体、光子超晶格、微腔阵列或等离子体纳米天线阵列。成像像素阵列、光子结构和特征阵列可选地可以彼此单片地集成。在一个非限制性示例中,光子结构可以包括六边形晶格,并且成像像素可以是矩形的。In some embodiments, the devices, compositions and methods of the present invention can provide a plurality of light emitters comprising sites that spatially overlap with different patterns of field intensities excited at different times relative to one another. For example, Figure 7A schematically illustrates a plan view of an exemplary photonic structure-based device, such as provided herein and illustrated in Figures 3A-3B, comprising first and second sites (e.g., clusters) per pixel. The device can include an array of imaging pixels, a photonic structure disposed on the array of imaging pixels; and an array of features disposed on the photonic structure. The photonic structure can, for example, include a photonic crystal, a photonic superlattice, a microcavity array, or an array of plasmonic nanoantennas. The array of imaging pixels, the photonic structure, and the array of features can optionally be monolithically integrated with one another. In one non-limiting example, the photonic structure can include a hexagonal lattice, and the imaging pixels can be rectangular.
特征阵列的第一特征可以布置在成像像素阵列的第一像素上,并且特征阵列的第二特征可以布置在第一像素上并在空间上从第一特征移位。例如,在图7A所示的非限制性示例中,第一特征(被称为“簇1”)和第二特征(被称为“簇2”)彼此布置在同一像素上。第二特征可以以例如图7A所示的方式从第一特征横向移位。在一个示例中,第一和第二特征分别位于像素上方的金属遮光孔的右下角和左上角处。第一发光体可布置在第一特征内或之上,以及第二发光体可布置在第二特征内或之上。例如,在一些实施例中,特征阵列可以包括多个阱;第一特征可以包括第一阱,第一发光体布置在该第一阱中,第二特征可以包括第二阱,第二发光体布置在该第二阱中,例如以与图3B所示的方式类似的方式。在其他实施例中,特征阵列可以包括多个柱;第一特征可以包括第一发光体布置在其上的第一柱,以及第二特征可以包括第二发光体布置在其上的第二柱。说明性地,第一和第二特征(例如,阱或柱)每个可以具有实质上圆形的横截面。A first feature of the feature array can be arranged over a first pixel of the imaging pixel array, and a second feature of the feature array can be arranged over the first pixel and spatially displaced from the first feature. For example, in the non-limiting example shown in FIG7A , a first feature (referred to as "Cluster 1") and a second feature (referred to as "Cluster 2") are arranged over the same pixel. The second feature can be laterally displaced from the first feature, such as in the manner shown in FIG7A . In one example, the first and second features are located at the lower right and upper left corners, respectively, of a metal light shield above the pixel. A first light emitter can be arranged within or above the first feature, and a second light emitter can be arranged within or above the second feature. For example, in some embodiments, the feature array can include a plurality of wells; the first feature can include a first well in which the first light emitter is arranged, and the second feature can include a second well in which the second light emitter is arranged, such as in a manner similar to that shown in FIG3B . In other embodiments, the feature array can include a plurality of pillars; the first feature can include a first pillar on which the first light emitter is arranged, and the second feature can include a second pillar on which the second light emitter is arranged. Illustratively, the first and second features (e.g., wells or pillars) can each have a substantially circular cross-section.
该设备还可以包括辐射源,该辐射源被配置为在第一时间产生具有第一特性的第一光子,并且被配置为在第二时间产生具有第二特性的第二光子,第二特性不同于第一特性,第二时间不同于第一时间。与在这里参照图4A-4B描述的实施例相反,辐射源不需要一定被配置成在不同时间选择性地将辐射引导到不同的位点。相反,在一些实施例中,辐射源可以被配置成分别在第一时间和第二时间用第一和第二光子泛光照射光子结构,并且光子结构的特征可以选择性地将辐射引导到不同的位点。此外或替代地,辐射源可以包括激光器。可选地,由辐射源发射的第一和第二光子可以在光谱的光学范围内,例如,第一和第二光子独立地具有在约300nm和约800nm之间的波长。The device may also include a radiation source configured to generate a first photon having a first characteristic at a first time and configured to generate a second photon having a second characteristic at a second time, the second characteristic being different from the first characteristic and the second time being different from the first time. In contrast to the embodiments described herein with reference to Figures 4A-4B, the radiation source need not necessarily be configured to selectively direct radiation to different locations at different times. Instead, in some embodiments, the radiation source may be configured to flood illuminate the photonic structure with first and second photons at a first time and a second time, respectively, and the characteristics of the photonic structure may selectively direct radiation to different locations. In addition or alternatively, the radiation source may include a laser. Optionally, the first and second photons emitted by the radiation source may be within the optical range of the spectrum, for example, the first and second photons independently have a wavelength between about 300 nm and about 800 nm.
在一些实施例中,光子结构可以被调整成对比于第二偏振的光用第一偏振的光选择性地照射第一特征,并且可以被调整成对比于第一偏振的光用第二偏振的光选择性地照射第二特征。例如,该设备可以包括布置在第一特征内或之上的第一发光体和布置在第二特征内或之上的第二发光体。说明性地,该设备可以包括布置在第一特征内或之上的第一目标分析物和布置在第二特征内或之上的第二目标分析物,其中第一目标分析物不同于第二目标分析物。可选地,第一和第二目标分析物可以包括具有不同序列的核酸。In some embodiments, the photonic structure can be adjusted to selectively illuminate a first feature with light of a first polarization as opposed to light of a second polarization, and can be adjusted to selectively illuminate a second feature with light of a second polarization as opposed to light of the first polarization. For example, the device can include a first luminophore disposed within or on the first feature and a second luminophore disposed within or on the second feature. Illustratively, the device can include a first target analyte disposed within or on the first feature and a second target analyte disposed within or on the second feature, wherein the first target analyte is different from the second target analyte. Alternatively, the first and second target analytes can include nucleic acids having different sequences.
在一些实施例中,第一像素可以选择性地接收由第一发光体在第一时间响应于第一光子而发射的冷光,并且可以选择性地接收由第二发光体在第二时间响应于第二光子而发射的冷光。例如,具有第一特性的第一光子可以在第一时间在光子结构内产生第一谐振图案,第一谐振图案相对于第二发光体选择性地激发第一发光体。说明性地,图7B示意性地示出了对于辐射源的在例如在此提供并在图7A和3A-3B中示出的设备阵列内的示例性模拟场强,该辐射源在第一时间产生具有选择性地激发第一位点的第一特性的光子。可以看到,具有第一特性的光子产生在第一特征处比在第二特征处明显更强的场强的空间图案,且因此可以在第一时间相对于第二发光体选择性地激发第一发光体。因此,成像像素可以在第一时间产生电信号,该电信号实质上对应于布置在第一特征内或之上的第一发光体的选择性激发。In some embodiments, a first pixel can selectively receive luminescence emitted by a first light emitter in response to a first photon at a first time, and can selectively receive luminescence emitted by a second light emitter in response to a second photon at a second time. For example, a first photon having a first characteristic can generate a first resonant pattern within a photonic structure at a first time, the first resonant pattern selectively exciting the first light emitter relative to the second light emitter. Illustratively, FIG7B schematically illustrates exemplary simulated field intensities for a radiation source within an array of devices, such as those provided herein and shown in FIG7A and 3A-3B, that generates photons having a first characteristic that selectively excites a first light source at a first time. As can be seen, the photons having the first characteristic generate a spatial pattern of field intensities that are significantly stronger at the first feature than at the second feature, and thus can selectively excite the first light emitter relative to the second light emitter at the first time. Thus, the imaging pixel can generate an electrical signal at a first time that substantially corresponds to the selective excitation of the first light emitter disposed within or on the first feature.
另外,具有第二特性的第二光子可以在第二时间在光子结构内产生第二谐振图案,第二谐振图案相对于第一发光体选择性地激发第二发光体。说明性地,图7C示意性地示出了对于辐射源的例如在此提供并在图7A和3A-3B中示出的设备阵列内的示例性模拟场强,该辐射源在第二时间产生具有选择性地激发第二位点的第二特性的光子。可以看到,具有第二特性的光子产生在第二特征处比在第一特征处明显更强的场强的空间图案,且因此可以在第二时间相对于第一发光体选择性地激发第二发光体。因此,成像像素可以在第二时间产生电信号,该电信号实质上对应于布置在第二特征内或之上的第二发光体的选择性激发。因此,在特定像素的检测区域内的两个或更多个发光体可以使用在不同时间施加到发光体上的激发光的空间图案来彼此区分开。激发事件的空间和时间分离的这个组合可以允许像素在它的检测区域内区分开两个或更多个发光体。Additionally, a second photon having a second characteristic can generate a second resonant pattern within the photonic structure at a second time, the second resonant pattern selectively exciting the second luminophore relative to the first luminophore. Illustratively, FIG7C schematically illustrates exemplary simulated field intensities within the array of devices, such as those provided herein and shown in FIG7A and FIG3A-3B, for a radiation source generating photons having a second characteristic that selectively excites a second site at a second time. As can be seen, the photons having the second characteristic generate a spatial pattern of field intensities that are significantly stronger at the second feature than at the first feature, and thus can selectively excite the second luminophore relative to the first luminophore at the second time. Consequently, the imaging pixel can generate an electrical signal at the second time that substantially corresponds to the selective excitation of the second luminophore disposed within or on the second feature. Thus, two or more luminophores within a detection region of a particular pixel can be distinguished from one another using spatial patterns of excitation light applied to the luminophores at different times. This combination of spatial and temporal separation of excitation events can allow a pixel to distinguish between two or more luminophores within its detection region.
注意,尽管第一发光体可以在第一时间相对于第二发光体选择性地被激发,例如在图7B中所示的,但是第二发光体仍然可以在第一时间在比第一发光体小的程度上被激发。类似地,尽管第二发光体可以在第二时间相对于第一发光体选择性地被激发,例如在图7C中所示的,但是第一发光体仍然可以在第二时间在比第二发光体小的程度上被激发。在第一时间的第二发光体的这种激发和在第二时间的第一发光体的这种激发可以被称为“串扰”。图7D示意性地示出了由例如在此提供和分别在图7B和7C中示出的第一和第二位点的选择性激发产生的示例性串扰项。可以调整光子结构和/或第一和第二光子的每个特性,以便将串扰降低到来自第一和第二发光体的相应发光可以适当地彼此区分开来的水平。Note that although a first luminophore may be selectively excited relative to a second luminophore at a first time, such as shown in FIG7B , the second luminophore may still be excited to a lesser extent than the first luminophore at the first time. Similarly, although a second luminophore may be selectively excited relative to a first luminophore at a second time, such as shown in FIG7C , the first luminophore may still be excited to a lesser extent than the second luminophore at the second time. This excitation of the second luminophore at the first time and this excitation of the first luminophore at the second time may be referred to as “crosstalk.” FIG7D schematically illustrates an exemplary crosstalk term resulting from the selective excitation of first and second sites, such as provided herein and shown in FIG7B and FIG7C , respectively. The photonic structure and/or each of the characteristics of the first and second photons may be adjusted to reduce the crosstalk to a level at which the respective luminescence from the first and second luminophores can be properly distinguished from one another.
在例如图7B和7C所示的实施例中,第一和第二光子的第一和第二特性可以独立地选自由波长、偏振和角度组成的组。说明性地,第一特性可以包括第一线偏振,并且第二特性可以包括不同于第一线偏振的第二线偏振。作为一个例子,第一线偏振可以实质上正交于第二线偏振。说明性地,使用具有第一线偏振(例如X偏振)的光子产生图7B所示的场强的图案,该图案选择性地激发在第一特征内或之上的第一发光体;并且使用具有实质上正交于第一线偏振的第二线偏振例如Y偏振的光子产生图7C所示的场强的图案,该图案选择性地激发在第二特征内或之上的第二发光体。然而,应当认识到,在第一时间和第二时间的光子可以具有任何合适的偏振。例如,第一线偏振可以相对于第二线偏振旋转在约15度和约75度之间的角度,例如以便产生场强的其它图案,如在这里参考图6A-6D所述的。作为另一个例子,偏振轴可以顺时针旋转30度,并且旋转的X偏振光束和Y偏振光束(RX偏振光束和RY偏振光束)可以被使用。另外,应当认识到,在第一时间和第二时间的光子可以分别具有任何其他合适的特性。例如,在第一时间的光子的第一特性可以包括第一波长,以及在第二时间的光子的第二特性可以包括不同于第一波长的第二波长。In embodiments such as those shown in Figures 7B and 7C, the first and second characteristics of the first and second photons can be independently selected from the group consisting of wavelength, polarization, and angle. Illustratively, the first characteristic can include a first linear polarization, and the second characteristic can include a second linear polarization different from the first linear polarization. As an example, the first linear polarization can be substantially orthogonal to the second linear polarization. Illustratively, photons having a first linear polarization (e.g., X polarization) are used to produce the pattern of field intensities shown in Figure 7B, which selectively excites a first light emitter within or above a first feature; and photons having a second linear polarization, such as Y polarization, which is substantially orthogonal to the first linear polarization, are used to produce the pattern of field intensities shown in Figure 7C, which selectively excites a second light emitter within or above a second feature. However, it should be recognized that the photons at the first time and the second time can have any suitable polarization. For example, the first linear polarization can be rotated by an angle between about 15 degrees and about 75 degrees relative to the second linear polarization, for example, to produce other patterns of field intensities, as described herein with reference to Figures 6A-6D. As another example, the polarization axis can be rotated 30 degrees clockwise, and the rotated X-polarized beam and Y-polarized beam (RX polarized beam and RY polarized beam) can be used. In addition, it should be appreciated that the photons at the first time and the second time can each have any other suitable characteristics. For example, the first characteristic of the photon at the first time can include a first wavelength, and the second characteristic of the photon at the second time can include a second wavelength different from the first wavelength.
在第一时间和第二时间产生的第一和第二光子的特性可以以任何合适的方式被控制。例如,在一些实施例中,设备的辐射源可以包括光学部件和耦合到该光学部件的控制器。控制器适当地可以被配置成控制光学部件以便将第一特性施加在第一光子上,并且被配置成将第二特性施加在第二光子上。例如,在相应光子特性包括偏振的实施例中,光学部件可以包括双折射材料,该双折射材料被配置为通过控制器响应于第一控制信号而将第一光子旋转到第一线偏振,并且被配置为通过控制器响应于第二控制信号而将第二光子旋转到第二线偏振。在相应光子特性包括波长的实施例中,光学部件可以包括可以被调节以便通过控制器响应于控制信号来控制到达光子结构的光子的波长的、布置在光子的路径中的电子地可调的滤光器,或者可以包括可以被调节以便通过控制器响应于控制信号来控制由辐射源在给定时间产生的光子的波长的辐射源的一部分。在相应光子特性包括角度的实施例中,光学部件可以包括可以被调节以便通过控制器响应于控制信号来控制到达光子结构的光子的角度的反射或透射光学器件,例如透镜和/或反射镜。应当认识到,一次可以改变多于一个的光子特性。例如,可以调节光子的波长、角度和偏振中的两个或更多个的任何适当组合,以便相对于布置在像素上的另一个发光体选择性地激发布置在该像素上的给定发光体。The properties of the first and second photons generated at the first time and the second time can be controlled in any suitable manner. For example, in some embodiments, the radiation source of the device may include an optical component and a controller coupled to the optical component. The controller may be suitably configured to control the optical component so as to impose the first property on the first photon and to impose the second property on the second photon. For example, in embodiments where the corresponding photon properties include polarization, the optical component may include a birefringent material that is configured to rotate the first photon to a first linear polarization by the controller in response to a first control signal, and is configured to rotate the second photon to a second linear polarization by the controller in response to a second control signal. In embodiments where the corresponding photon properties include wavelength, the optical component may include an electronically tunable filter arranged in the path of the photons that can be adjusted to control the wavelength of the photons reaching the photonic structure by the controller in response to the control signal, or may include a portion of the radiation source that can be adjusted to control the wavelength of the photons generated by the radiation source at a given time by the controller in response to the control signal. In embodiments where the corresponding photon characteristic includes an angle, the optical component may include reflective or transmissive optics, such as lenses and/or mirrors, that can be adjusted by the controller in response to a control signal to control the angle of the photons reaching the photonic structure. It should be appreciated that more than one photon characteristic can be varied at a time. For example, any suitable combination of two or more of the wavelength, angle, and polarization of the photons can be adjusted to selectively excite a given light emitter disposed at a pixel relative to another light emitter disposed at the pixel.
在一些实施例中,第一和第二光子可以以任何合适的角度照射光子结构。例如,第一和第二光子每个可以以彼此实质上相同的角度、说明性地以近似垂直于光子结构的主表面的角度或者以近似平行于光子结构的主表面的角度照射光子结构。In some embodiments, the first and second photons can strike the photonic structure at any suitable angle. For example, the first and second photons can each strike the photonic structure at substantially the same angle as one another, illustratively at an angle approximately perpendicular to a major surface of the photonic structure, or at an angle approximately parallel to a major surface of the photonic structure.
在例如图7A-7D所示的实施例中,应当认识到,特征阵列的其他特征可以布置在其他像素上。例如,特征阵列的第三特征可以布置在成像像素阵列的第二像素上,并且特征阵列的第四特征可以布置在第二像素上并在空间上从第三特征移位。该设备还可以包括布置在第三特征内或之上的第三发光体,以及布置在第四特征内或之上的第四发光体。例如,如果第三发光体可以被第一光子或第二光子激发,则第二像素可以选择性地接收由第三发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光。例如,如果第四发光体可以被第一光子或第二光子激发,则第二像素可以选择性地接收由第四发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光。In embodiments such as those shown in Figures 7A-7D, it will be appreciated that other features of the feature array can be arranged on other pixels. For example, a third feature of the feature array can be arranged on a second pixel of the imaging pixel array, and a fourth feature of the feature array can be arranged on the second pixel and spatially displaced from the third feature. The device can also include a third light emitter arranged within or on the third feature, and a fourth light emitter arranged within or on the fourth feature. For example, if the third light emitter can be excited by a first photon or a second photon, the second pixel can selectively receive cold light emitted by the third light emitter at a first time in response to the first photon or at a second time in response to the second photon. For example, if the fourth light emitter can be excited by a first photon or a second photon, the second pixel can selectively receive cold light emitted by the fourth light emitter at a first time in response to the first photon or at a second time in response to the second photon.
还应该认识到,可以提供每像素任何合适数量的位点。说明性地,例如在图3A-3B和7A-7D中所示的设备可选地还可以包括特征阵列的第三特征,该第三特征布置在第一像素上并且在空间上从第一和第二特征中的每一个移位。该设备可以包括布置在第三特征内或之上的第三发光体。辐射源可以被配置成在第三时间产生具有第三特性的第三光子,第三特性不同于第一和第二特性,第三时间不同于第一和第二时间。第一像素可以选择性地接收由第三发光体在第三时间响应于第三光子而发射的冷光。例如,图8A示意性地示出了例如在此提供并且在图3A-3B中示出的示例性的基于光子结构的设备的平面图,该设备包括每像素(被表示为圆)的第一、第二和第三位点(例如簇)。以与上面参考图6A-6D和7A-7C描述的方式类似的方式,光子结构可以分别在第一、第二和第三时间用具有第一、第二和第三特性的光子照射,以便分别在这样的时间激发在第一、第二和第三位点处的第一、第二和第三发光体。It will also be appreciated that any suitable number of sites per pixel may be provided. Illustratively, the device, for example, shown in Figures 3A-3B and 7A-7D, may optionally further include a third feature of the feature array, the third feature being arranged on the first pixel and spatially displaced from each of the first and second features. The device may include a third illuminant arranged within or above the third feature. The radiation source may be configured to generate a third photon having a third characteristic at a third time, the third characteristic being different from the first and second characteristics, the third time being different from the first and second times. The first pixel may selectively receive cold light emitted by the third illuminant in response to the third photon at the third time. For example, Figure 8A schematically illustrates a plan view of an exemplary photonic structure-based device, for example, provided herein and shown in Figures 3A-3B, comprising first, second, and third sites (e.g., clusters) per pixel (represented as circles). In a manner similar to that described above with reference to Figures 6A-6D and 7A-7C, the photonic structure can be illuminated with photons having first, second, and third characteristics at the first, second, and third times, respectively, so as to excite the first, second, and third light emitters at the first, second, and third locations, respectively, at such times.
例如,图8B示意性地示出了对于辐射源的在例如在此提供并且在图8A和3A-3B中示出的设备阵列内的示例性模拟场强,该辐射源在第一时间产生具有选择性地激发第一位点的第一特性的光子。图8C示意性地示出了对于辐射源的在这种设备阵列内的示例性模拟场强,该辐射源在第二时间产生具有选择性地激发第二位点的第二特性的光子。图8D示意性地示出了对于辐射源的在这种设备阵列内的示例性模拟场强,辐射源在第三时间产生具有选择性地激发第三位点的第三特性的光子。作为一个例子,第一特性可以包括第一线偏振,例如Y偏振,第二特性可以包括第二线偏振,例如RY偏振,并且第三特性可以包括第三线偏振,例如RX偏振。注意,一个或更多个这样的偏振可以彼此正交,但不需要一定彼此正交。例如,RX偏振和RY偏振彼此正交,并且每一个都与Y偏振成在大约15度和大约75度之间的角度,例如45度。例如,第一线偏振可以相对于第二线偏振旋转在约15度和约75度之间的角度,例如以便产生场强的其它图案,如在这里参考图6A-6D所述的。作为另一个例子,偏振轴可以顺时针旋转30度,并且旋转的X偏振光束和Y偏振光束(RX偏振光束和RY偏振光束)可以被使用。另外注意,以与上面参考图7D描述的方式类似的方式,在第一时间选择性地激发第一位点也可以在较小程度上激发第二和/或第三位点,在第二时间选择性地激发第二位点也可以激发第一和/或第三位点,和/或在第三时间选择性地激发第三位点也可以激发第一和/或第二位点。图8E示意性地示出了根据一些实施例的由例如在此提供以及分别在图8B-8D中示出的第一、第二和第三位点的选择性激发产生的示例性串扰项。可以调整光子结构和/或第一和第二光子的相应特性,以便将串扰降低到来自第一和第二发光体的相应冷光可以彼此适当地被区分开来的水平。For example, FIG8B schematically illustrates exemplary simulated field intensities within a device array, such as those provided herein and illustrated in FIG8A and 3A-3B, for a radiation source generating photons having a first characteristic that selectively excites a first site at a first time. FIG8C schematically illustrates exemplary simulated field intensities within such a device array for a radiation source generating photons having a second characteristic that selectively excites a second site at a second time. FIG8D schematically illustrates exemplary simulated field intensities within such a device array for a radiation source generating photons having a third characteristic that selectively excites a third site at a third time. As an example, the first characteristic can include a first linear polarization, such as a Y polarization, the second characteristic can include a second linear polarization, such as a R Y polarization, and the third characteristic can include a third linear polarization, such as a R X polarization. Note that one or more of these polarizations can be orthogonal to each other, but need not necessarily be. For example, the R X polarization and the R Y polarization can be orthogonal to each other and each form an angle between approximately 15 degrees and approximately 75 degrees, such as 45 degrees, with the Y polarization. For example, the first linear polarization can be rotated by an angle between about 15 degrees and about 75 degrees relative to the second linear polarization, for example, to produce other patterns of field intensity, as described herein with reference to Figures 6A-6D. As another example, the polarization axis can be rotated 30 degrees clockwise, and rotated X-polarized and Y-polarized beams (RX-polarized and RY-polarized beams) can be used. Also note that, in a manner similar to that described above with reference to Figure 7D, selectively exciting the first site at a first time can also excite the second and/or third sites to a lesser extent, selectively exciting the second site at a second time can also excite the first and/or third sites, and/or selectively exciting the third site at a third time can also excite the first and/or second sites. Figure 8E schematically illustrates exemplary crosstalk terms generated by selective excitation of the first, second, and third sites, for example, as provided herein and shown in Figures 8B-8D, respectively, according to some embodiments. The photonic structure and/or the respective properties of the first and second photons can be adjusted to reduce the crosstalk to a level at which the respective cold light from the first and second luminophores can be appropriately distinguished from each other.
本发明的设备适当地还可以包括布置在每个像素上的更多数量的位点。例如,例如上面参考图3A-3B和8A-8E所述的设备可选地还可以包括特征阵列的第四特征,该第四特征布置在第一像素上并且在空间上从第一、第二和第三特征中的每一个移位。该设备还可以包括布置在第四特征内或之上的第四发光体。辐射源可以被配置成在第四时间产生具有第四特性的第四光子,第四特性不同于第一、第二和第三特性,第四时间不同于第一、第二和第三时间。第一像素可以选择性地接收由第四发光体在第四时间响应于第四光子而发射的冷光。说明性地,图9A-9D分别示意性地示出了使用在不同时间产生具有不同特性的光子的辐射源对在例如在此提供和在图3A-3B中所示的设备阵列内的第一、第二、第三和第四位点进行的示例性选择性激发的透视图。例如,以例如图9A所示的方式,在第一时间可以用具有第一特性(例如第一偏振,例如X偏振)的光子照射光子结构,以便选择性地激发布置在每个像素上的第一位点。随后,以例如图9B所示的方式,在第二时间可以用具有第二特性(例如第二偏振,例如XY偏振)的光子照射光子结构,以便选择性地激发布置在每个像素上的第二位点。随后,以例如图9C所示的方式,在第三时间可以用具有第三特性(例如第三偏振,例如YX偏振)的光子照射光子结构,以便选择性地激发布置在每个像素上的第三位点。随后,以例如图9D所示的方式,在第四时间可以用具有第四特性(例如第四偏振,例如Y偏振)的光子照射光子结构。像素可以分别在第一时间、第二时间、第三时间和第四时间产生电信号,基于这些电信号,布置在这样的像素上的第一、第二、第三和第四位点可以彼此被区分开。The device of the present invention may also include a greater number of sites arranged at each pixel. For example, the device described above with reference to Figures 3A-3B and 8A-8E may optionally further include a fourth feature of the feature array, which is arranged at the first pixel and spatially displaced from each of the first, second, and third features. The device may also include a fourth luminescent body arranged within or above the fourth feature. The radiation source may be configured to generate a fourth photon having a fourth characteristic at a fourth time, the fourth characteristic being different from the first, second, and third characteristics, and the fourth time being different from the first, second, and third times. The first pixel may selectively receive luminescence emitted by the fourth luminescent body in response to the fourth photon at the fourth time. Illustratively, Figures 9A-9D each schematically illustrate perspective views of exemplary selective excitation of the first, second, third, and fourth sites within the device array, such as provided herein and shown in Figures 3A-3B, using a radiation source that generates photons having different characteristics at different times. For example, in the manner shown in Figure 9A, the photonic structure may be illuminated at a first time with photons having a first characteristic (e.g., a first polarization, such as X polarization) to selectively excite the first site arranged at each pixel. Subsequently, in a manner such as shown in FIG9B , the photonic structure may be irradiated with photons having a second characteristic (e.g., a second polarization, such as XY polarization) at a second time so as to selectively excite a second site arranged on each pixel. Subsequently, in a manner such as shown in FIG9C , the photonic structure may be irradiated with photons having a third characteristic (e.g., a third polarization, such as YX polarization) at a third time so as to selectively excite a third site arranged on each pixel. Subsequently, in a manner such as shown in FIG9D , the photonic structure may be irradiated with photons having a fourth characteristic (e.g., a fourth polarization, such as Y polarization) at a fourth time. The pixel may generate electrical signals at a first time, a second time, a third time, and a fourth time, respectively, based on which the first, second, third, and fourth sites arranged on such a pixel may be distinguished from each other.
本发明的组成物、设备和方法可适当地被使用,以便在法线入射照明下产生在SBS测序荧光信号增强中的发光图像。例如,该设备还可包括至少一个微流控特征,该微流控特征与特征阵列接触并且被配置为向第一特征和第二特征提供一种或更多种分析物的流。此外或可选地,本发明的组成物、设备和方法可以使用任何合适数量的激发波长来增强任何合适数量的发光体的激发效率,例如可以增强在4通道SBS化学方案中的四个谐振波长(λ1、λ2、λ3和λ4)下的四个不同激发源的激发效率,或者可以增强在2通道SBS化学方案中的两个激发波长(λ1和λ2)下的激发效率,或者可以增强在1通道SBS化学方案中的一个激发波长(λ1)下的激发效率。示例性的4信道、3信道、2信道或1信道SBS方案例如在美国专利号2013/0079232A1(通过引用被并入本文)中被描述,并且可以被修改以供本文阐述的设备和方法使用。例如,再次参考例如参考图7A-7D描述的实施例,其中第一和第二发光体布置在第一像素上,第一发光体可以耦合到第一核酸,以及第二发光体可以耦合到第二核酸。作为另一个例子,参考参照图7A-7D描述的可选实施例,其中第一和第二发光体布置在第一像素上,以及第三和第四发光体布置在第二像素上,第一发光体可以耦合到第一核酸,第二发光体可以耦合到第二核酸,第三发光体耦合到第三核酸,以及第四发光体可以耦合到第四核酸。作为又一个例子,再次参考参照图9A、9D描述的说明性实施例,第一发光体可以耦合到第一核酸,第二发光体可以耦合到第二核酸,第三发光体可以耦合到第三核酸,以及第四发光体可以耦合到第四核酸。例如,在用于在使用发光成像对DNA进行测序时使用的组成物中,第一发光体可以耦合到A,第二发光体可以耦合到G,第三发光体可以耦合到C,以及第四发光体可以耦合到T。作为另一个例子,在用于在使用发光成像对RNA进行测序时使用的组成物中,第一发光体可以耦合到A,第二发光体可以耦合到G,第三发光体可以耦合到C,以及第四发光体可以耦合到U。The compositions, apparatus and methods of the present invention can be suitably used to produce luminescent images in SBS sequencing fluorescence signal enhancement under normal incidence illumination. For example, the device can further include at least one microfluidic feature in contact with the feature array and configured to provide a flow of one or more analytes to the first feature and the second feature. Additionally or alternatively, the compositions, apparatus and methods of the present invention can use any suitable number of excitation wavelengths to enhance the excitation efficiency of any suitable number of luminophores, such as the excitation efficiency of four different excitation sources at four resonant wavelengths (λ 1 , λ 2 , λ 3 and λ 4 ) in a 4-channel SBS chemistry scheme, or the excitation efficiency at two excitation wavelengths (λ 1 and λ 2 ) in a 2-channel SBS chemistry scheme, or the excitation efficiency at one excitation wavelength (λ 1 ) in a 1-channel SBS chemistry scheme can be enhanced. Exemplary 4-channel, 3-channel, 2-channel or 1-channel SBS scheme is for example described in U.S. Patent No. 2013/0079232A1 (incorporated herein by reference), and can be modified to use for the equipment and method of setting forth herein.For example, again with reference to the embodiment described for example with reference to Figure 7A-7D, wherein the first and second luminophores are arranged on the first pixel, the first luminophore can be coupled to the first nucleic acid, and the second luminophore can be coupled to the second nucleic acid.As another example, with reference to the optional embodiment described with reference to Figure 7A-7D, wherein the first and second luminophores are arranged on the first pixel, and the third and fourth luminophores are arranged on the second pixel, the first luminophore can be coupled to the first nucleic acid, the second luminophore can be coupled to the second nucleic acid, the third luminophore can be coupled to the third nucleic acid, and the fourth luminophore can be coupled to the fourth nucleic acid.As another example, again with reference to the illustrative embodiment described with reference to Figure 9A, 9D, the first luminophore can be coupled to the first nucleic acid, the second luminophore can be coupled to the second nucleic acid, the third luminophore can be coupled to the third nucleic acid, and the fourth luminophore can be coupled to the fourth nucleic acid. For example, in a composition for use in sequencing DNA using luminescence imaging, the first luminophore may be coupled to A, the second luminophore may be coupled to G, the third luminophore may be coupled to C, and the fourth luminophore may be coupled to T. As another example, in a composition for use in sequencing RNA using luminescence imaging, the first luminophore may be coupled to A, the second luminophore may be coupled to G, the third luminophore may be coupled to C, and the fourth luminophore may be coupled to U.
在例如在此提供的、例如参考图3A-3B、7A-7D、8A-8E或9A-9D所述的设备中,第一发光体可以耦合到待测序的第一多核苷酸,以及第二发光体可以耦合到待测序的第二多核苷酸。例如,第一多核苷酸可以耦合到第一特征,以及第二多核苷酸可以耦合到第二特征。设备还可包括第一聚合酶,其将第一核酸添加到与第一多核苷酸互补并耦合的第三多核苷酸,第一核酸耦合到第一发光体。设备还可包括第二聚合酶,其将第二核酸添加到与第二多核苷酸互补并耦合的第四多核苷酸,第二核酸耦合到第二发光体。设备还可以包括使包括第一核酸和第二核酸以及第一聚合酶和第二聚合酶的第一液体流动到第一特征和第二特征内或在第一特征和第二特征之上流动的通道。例如,第一和第二多核苷酸可以耦合到布置在第一像素上并且使用合适的SBS方案被测序的第一和第二特征。第一和第二发光体可以分别耦合到例如使用第一和第二聚合酶而分别合并到第一和第二多核苷酸中的第一和第二核酸。在将第一和第二核酸合并到第一和第二多核苷酸中的SBS步骤之后,第一和第二发光体可以以例如本文所提供的方式在彼此不同的时间选择性地被发光地成像,以便响应于在第一多核苷酸处的第一发光体的存在(即,第一核酸到第一多核苷酸中的合并)和响应于在第二多核苷酸处的第二发光体的存在(即,第二核酸到第二多核苷酸中的合并)而获得相应电信号。In devices such as those provided herein, such as those described with reference to Figures 3A-3B, 7A-7D, 8A-8E, or 9A-9D, a first luminophore can be coupled to a first polynucleotide to be sequenced, and a second luminophore can be coupled to a second polynucleotide to be sequenced. For example, the first polynucleotide can be coupled to a first feature, and the second polynucleotide can be coupled to a second feature. The device may further include a first polymerase that adds a first nucleic acid to a third polynucleotide that is complementary to and coupled to the first polynucleotide, the first nucleic acid being coupled to the first luminophore. The device may further include a second polymerase that adds a second nucleic acid to a fourth polynucleotide that is complementary to and coupled to the second polynucleotide, the second nucleic acid being coupled to the second luminophore. The device may further include a channel for flowing a first liquid comprising the first and second nucleic acids and the first and second polymerases into or over the first and second features. For example, the first and second polynucleotides can be coupled to first and second features disposed on a first pixel and sequenced using a suitable SBS protocol. The first and second luminophores can be coupled to first and second nucleic acids, respectively, that are incorporated into the first and second polynucleotides, respectively, using, for example, first and second polymerases. Following the SBS step of incorporating the first and second nucleic acids into the first and second polynucleotides, the first and second luminophores can be selectively imaged luminescently at different times from one another, e.g., in a manner as provided herein, so as to obtain corresponding electrical signals in response to the presence of the first luminophore at the first polynucleotide (i.e., incorporation of the first nucleic acid into the first polynucleotide) and in response to the presence of the second luminophore at the second polynucleotide (i.e., incorporation of the second nucleic acid into the second polynucleotide).
应当认识到,可以使用任何合适的方法,以便使用给定的像素在多个位点使发光体成像。例如,图10示出了在此提供的用于在发光成像中使用的方法中的步骤的示例性流程。图10所示的方法1000可以包括提供成像像素阵列(1001)。例如,成像像素阵列是在市场上可获得的。图10所示的方法1000还可以包括提供布置在成像像素阵列上的光子结构(1002)。例如,可以使用例如本领域中已知的材料制造和图案化技术的任何合适组合来将光子晶体、光子超晶格、微腔阵列或等离子体纳米天线阵列布置在成像像素阵列上。It will be appreciated that any suitable method may be used to image a luminophore at multiple locations using a given pixel. For example, FIG10 shows an exemplary flow of steps in a method provided herein for use in luminescence imaging. The method 1000 shown in FIG10 may include providing an imaging pixel array (1001). For example, the imaging pixel array is commercially available. The method 1000 shown in FIG10 may also include providing a photonic structure (1002) arranged on the imaging pixel array. For example, a photonic crystal, a photonic superlattice, a microcavity array, or a plasmonic nanoantenna array may be arranged on the imaging pixel array using any suitable combination of material fabrication and patterning techniques, such as those known in the art.
图10所示的方法1000还可以包括提供布置在光子结构上的特征阵列(1003)。例如,可以使用例如本领域中已知的材料制造和图案化技术的任何合适的组合来将阱或柱的阵列布置在光子结构上。特征阵列可以与光子晶体和像素阵列配准,使得整数数量n>2的特征布置在每个像素上。例如,特征阵列的第一特征可以布置在成像像素阵列的第一像素上,并且特征阵列的第二特征可以布置在第一像素上并在空间上从第一特征移位。例如,第二特征可以从第一特征横向移位。在一个非限制性示例中,光子结构包括六边形晶格,并且成像像素是矩形的。第一和第二特征例如第一和第二柱或阱可选地每个可以具有实质上圆形的横截面。可选地,成像像素阵列、光子结构和特征阵列可以彼此单片地集成,例如,可以例如使用一系列CMOS处理步骤而被制备为单一结构。The method 1000 shown in FIG10 may also include providing an array of features arranged on the photonic structure (1003). For example, an array of wells or pillars may be arranged on the photonic structure using any suitable combination of material fabrication and patterning techniques known in the art. The array of features may be aligned with the photonic crystal and the pixel array such that an integer number n>2 of features is arranged on each pixel. For example, a first feature of the array of features may be arranged on a first pixel of an imaging pixel array, and a second feature of the array of features may be arranged on the first pixel and spatially displaced from the first feature. For example, the second feature may be laterally displaced from the first feature. In one non-limiting example, the photonic structure includes a hexagonal lattice and the imaging pixels are rectangular. The first and second features, such as first and second pillars or wells, may optionally each have a substantially circular cross-section. Optionally, the imaging pixel array, the photonic structure, and the array of features may be monolithically integrated with each other, for example, and may be fabricated as a single structure, for example, using a series of CMOS processing steps.
图10所示的方法1000还可以包括提供布置在第一特征内或之上的第一发光体(1004),以及提供布置在第二特征内或之上的第二发光体(1005)。例如,特征阵列可以包括多个阱。第一特征可以包括第一阱,第一发光体布置在该第一阱中,以及第二特征可以包括第二阱,第二发光体布置在该第二阱中。作为另一个例子,特征阵列可以包括多个柱。第一特征可以包括第一发光体布置在其上的第一柱,以及第二特征可以包括第二发光体布置在其上的第二柱。可选地,第一和第二发光体可以分别直接或间接地耦合到第一和第二特征。作为一个非限制性例子,第一和第二发光体可以分别耦合到第一和第二核酸和/或可以耦合到以例如在本文其它地方所述的方式被测序的第一和第二多核苷酸。The method 1000 shown in Figure 10 can also include providing a first luminophore (1004) disposed within or on a first feature, and providing a second luminophore (1005) disposed within or on a second feature. For example, the feature array can include a plurality of wells. The first feature can include a first well in which the first luminophore is disposed, and the second feature can include a second well in which the second luminophore is disposed. As another example, the feature array can include a plurality of columns. The first feature can include a first column on which the first luminophore is disposed, and the second feature can include a second column on which the second luminophore is disposed. Optionally, the first and second luminophores can be coupled directly or indirectly to the first and second features, respectively. As a non-limiting example, the first and second luminophores can be coupled to the first and second nucleic acids, respectively, and/or can be coupled to the first and second polynucleotides that are sequenced, for example, in a manner described elsewhere herein.
图10所示的方法1000还可以包括由辐射源在第一时间产生具有第一特性的第一光子(1006)。具有第一特性的第一光子可以在第一时间在光子结构内产生第一谐振图案,第一谐振图案相对于第二发光体选择性地激发第一发光体。图10所示的方法1000由辐射源在第二时间产生具有第二特性的第二光子(1007)。第二特性可以不同于第一特性,以及第二时间可以不同于第一时间。在一个示例中,步骤1006和1007可以分别包括用第一和第二光子泛光照射光子结构和/或可以包括用激光器产生第一和第二光子。可选地,第一和第二光子可以在光谱的可见光范围内和/或独立地可以具有在约300nm和约800nm之间的波长。The method 1000 shown in Figure 10 may also include generating, by a radiation source, a first photon having a first characteristic at a first time (1006). The first photon having the first characteristic may generate a first resonant pattern within the photonic structure at the first time, the first resonant pattern selectively exciting the first light emitter relative to the second light emitter. The method 1000 shown in Figure 10 generates, by the radiation source, a second photon having a second characteristic at a second time (1007). The second characteristic may be different from the first characteristic, and the second time may be different from the first time. In one example, steps 1006 and 1007 may respectively include flooding the photonic structure with the first and second photons and/or may include generating the first and second photons with a laser. Optionally, the first and second photons may be in the visible range of the spectrum and/or independently may have a wavelength between about 300 nm and about 800 nm.
具有第二特性的第二光子可以在第二时间在光子结构内产生第二谐振图案,第二谐振图案相对于第一发光体选择性地激发第二发光体。示例性的辐射源、光子特性和谐振图案在本文的其他地方被描述。说明性地,第一和第二光子特性可以独立地选自由波长、偏振和角度组成的组。作为一个例子,第一光子特性可以包括第一线偏振,并且第二光子特性可以包括不同于第一线偏振的第二线偏振。可选地,第一线偏振实质上正交于第二线偏振。替代地,第一线偏振可以相对于第二线偏振旋转在约15度和约75度之间的角度。作为另一个例子,第一光子特性可以包括第一波长,以及第二光子特性可以包括不同于第一波长的第二波长。A second photon having a second characteristic can produce a second resonant pattern within the photonic structure at a second time, the second resonant pattern selectively exciting the second light emitter relative to the first light emitter. Exemplary radiation sources, photon characteristics, and resonant patterns are described elsewhere herein. Illustratively, the first and second photon characteristics can be independently selected from the group consisting of wavelength, polarization, and angle. As an example, the first photon characteristic can include a first linear polarization, and the second photon characteristic can include a second linear polarization different from the first linear polarization. Optionally, the first linear polarization is substantially orthogonal to the second linear polarization. Alternatively, the first linear polarization can be rotated relative to the second linear polarization by an angle between about 15 degrees and about 75 degrees. As another example, the first photon characteristic can include a first wavelength, and the second photon characteristic can include a second wavelength different from the first wavelength.
可选地,第一和第二光子每个以彼此实质上相同的角度照射光子结构。例如,第一和第二光子每个可以以近似垂直于光子结构的主表面的角度照射光子结构。或者例如,第一和第二光子每个以近似平行于光子结构的主表面的角度照射光子结构。在一些实施例中,辐射源可以包括光学部件,并且方法1000可以还包括控制光学部件,以便将第一特性施加在第一光子上,并且被配置为将第二特性施加在第二光子上。说明性地,光学部件可以包括双折射材料,该双折射材料通过控制器响应于第一控制信号而将第一光子旋转到第一线偏振,并且通过控制器响应于第二控制信号而将第二光子旋转到第二线偏振。此外或替代地,光学部件可以通过控制器响应于控制信号来控制第一和第二光子的波长或角度。Optionally, the first and second photons each strike the photonic structure at substantially the same angle as each other. For example, the first and second photons may each strike the photonic structure at an angle approximately perpendicular to a major surface of the photonic structure. Or, for example, the first and second photons may each strike the photonic structure at an angle approximately parallel to a major surface of the photonic structure. In some embodiments, the radiation source may include an optical component, and method 1000 may further include controlling the optical component so as to impose a first characteristic on the first photon and being configured to impose a second characteristic on the second photon. Illustratively, the optical component may include a birefringent material that rotates the first photon to a first linear polarization by a controller in response to a first control signal, and rotates the second photon to a second linear polarization by the controller in response to a second control signal. Additionally or alternatively, the optical component may control the wavelength or angle of the first and second photons by the controller in response to the control signal.
图10中示出的方法1000还可以包括由第一像素选择性地接收由第一发光体在第一时间响应于第一光子而发射的冷光(1008),以及由第一像素选择性地接收由第二发光体在第二时间响应于第二光子而发射的冷光(1009)。以例如如在本文其它地方所述的方式,第一像素可以在第一和第二时间产生相应的电信号,基于该电信号,第一和第二发光体可以彼此被区分开。The method 1000 shown in FIG10 may further include selectively receiving, by the first pixel, luminescent light emitted by the first light emitter in response to the first photon at a first time (1008), and selectively receiving, by the first pixel, luminescent light emitted by the second light emitter in response to the second photon at a second time (1009). The first pixel may generate corresponding electrical signals at the first and second times, and the first and second light emitters may be distinguished from each other based on the electrical signals, for example, in a manner as described elsewhere herein.
任何合适数量的特征例如三个或四个特征可以以例如在这里参照图3A-3B、7A-7D、8A-8E或9A-9D描述的方式布置在第一像素上。例如,特征阵列的第三特征可选地可以布置在第一像素上,并且在空间上从第一和第二特征中的每一个移位,并且方法1000还可以包括提供布置在第三特征内或之上的第三发光体;在第三时间产生具有第三特性的第三光子,第三特性不同于第一和第二特性,第三时间不同于第一和第二时间;以及由第一像素选择性地接收由第三发光体在第三时间响应于第三光子而发射的冷光。可选地,特征阵列的第四特征可以布置在第一像素上,并且在空间上从第一、第二和第三特征中的每一个移位,并且方法1000还可以包括提供布置在第四特征内或之上的第四发光体;在第四时间产生具有第四特性的第四光子,第四特性不同于第一、第二和第三特性,第四时间不同于第一、第二和第三时间;以及由第一像素选择性地接收由第四发光体在第四时间响应于第四光子而发射的冷光。在一个非限制性例子中,第一发光体可耦合到第一核酸,第二发光体可耦合到第二核酸,第三发光体可耦合到第三核酸,以及第四发光体可耦合到第四核酸。Any suitable number of features, such as three or four features, can be arranged on the first pixel in a manner, such as described herein with reference to Figures 3A-3B, 7A-7D, 8A-8E, or 9A-9D. For example, a third feature of the array of features can optionally be arranged on the first pixel and spatially displaced from each of the first and second features, and method 1000 can further include providing a third luminophore arranged within or on the third feature; generating a third photon having a third characteristic at a third time, the third characteristic being different from the first and second characteristics, the third time being different from the first and second times; and selectively receiving, by the first pixel, luminescent light emitted by the third luminophore at the third time in response to the third photon. Alternatively, a fourth feature of the feature array can be disposed on the first pixel and spatially displaced from each of the first, second, and third features, and method 1000 can further include providing a fourth luminophore disposed within or on the fourth feature; generating a fourth photon having a fourth characteristic at a fourth time, the fourth characteristic being different from the first, second, and third characteristics, the fourth time being different from the first, second, and third times; and selectively receiving, by the first pixel, luminescent light emitted by the fourth luminophore at the fourth time in response to the fourth photon. In one non-limiting example, the first luminophore can be coupled to the first nucleic acid, the second luminophore can be coupled to the second nucleic acid, the third luminophore can be coupled to the third nucleic acid, and the fourth luminophore can be coupled to the fourth nucleic acid.
此外或替代地,任何合适数量的特征例如两个、三个、四个或多于四个特征可以布置在第二像素上。例如,特征阵列的第三特征可以布置在成像像素阵列的第二像素上;特征阵列的第四特征可布置在第二像素上并在空间上从第三特征移位;方法1000还可以包括提供布置在第三特征内或之上的第三发光体;以及提供布置在第四特征内或之上的第四发光体。方法1000还可以包括由第二像素选择性地接收由第三发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光;以及由第二像素选择性地接收由第四发光体在第一时间响应于第一光子或在第二时间响应于第二光子而发射的冷光。在一个非限制性例子中,第一发光体可耦合到第一核酸,第二发光体可耦合到第二核酸,第三发光体可耦合到第三核酸,以及第四发光体可耦合到第四核酸。In addition or alternatively, any suitable number of features, such as two, three, four, or more than four features, can be arranged on the second pixel. For example, a third feature of the feature array can be arranged on the second pixel of the imaging pixel array; a fourth feature of the feature array can be arranged on the second pixel and spatially displaced from the third feature; method 1000 can also include providing a third luminophore arranged within or on the third feature; and providing a fourth luminophore arranged within or on the fourth feature. Method 1000 can also include selectively receiving, by the second pixel, luminescent light emitted by the third luminophore in response to the first photon at a first time or in response to the second photon at a second time; and selectively receiving, by the second pixel, luminescent light emitted by the fourth luminophore in response to the first photon at a first time or in response to the second photon at a second time. In one non-limiting example, the first luminophore can be coupled to the first nucleic acid, the second luminophore can be coupled to the second nucleic acid, the third luminophore can be coupled to the third nucleic acid, and the fourth luminophore can be coupled to the fourth nucleic acid.
方法1000可适合于SBS方案中的发光成像。例如,方法1000可以包括提供与特征阵列接触的至少一个微流控特征,以及通过至少一个微流控特征使一种或更多种分析物流到第一和第二特征。作为另一个例子,第一发光体可以耦合到第一核苷酸,以及第二发光体可以耦合到第二核苷酸。此外或替代地,第一发光体可以耦合到待测序的第一多核苷酸,以及第二发光体可以耦合到待测序的第二多核苷酸。第一多核苷酸可以耦合到第一特征,以及第二多核苷酸可以耦合到第二特征。方法1000还可包括由第一聚合酶将第一核苷酸添加到与第一多核苷酸互补并耦合的第三多核苷酸,第一核苷酸耦合到第一发光体。方法1000还可包括由第二聚合酶将第二核苷酸添加到与第二多核苷酸互补并耦合的第四多核苷酸,第二核苷酸耦合到第二发光体。方法1000还可以包括通过通道使包括第一和第二核苷酸以及第一和第二聚合酶的第一液体流动到第一和第二特征内或在第一和第二特征之上流动。Method 1000 may be suitable for luminescent imaging in an SBS scheme. For example, method 1000 may include providing at least one microfluidic feature in contact with a feature array, and flowing one or more analytes to first and second features via the at least one microfluidic feature. As another example, a first luminophore may be coupled to a first nucleotide, and a second luminophore may be coupled to a second nucleotide. Additionally or alternatively, the first luminophore may be coupled to a first polynucleotide to be sequenced, and the second luminophore may be coupled to a second polynucleotide to be sequenced. The first polynucleotide may be coupled to the first feature, and the second polynucleotide may be coupled to the second feature. Method 1000 may also include adding a first nucleotide to a third polynucleotide complementary to and coupled to the first polynucleotide by a first polymerase, the first nucleotide coupled to the first luminophore. Method 1000 may also include adding a second nucleotide to a fourth polynucleotide complementary to and coupled to the second polynucleotide by a second polymerase, the second nucleotide coupled to the second luminophore. Method 1000 may also include flowing a first liquid comprising the first and second nucleotides and the first and second polymerases through a channel into or over the first and second features.
如在本文其他地方所提到的,可以使用材料处理和图案化技术的任何合适组合来制备本发明的设备和方法。例如,图11示出了可用于制备例如本文所提供的设备或组成物的步骤的示例性顺序。说明性地,可以使用两个纳米压印光刻步骤、随后是共形电介质沉积步骤来制备例如在本文参考图3A-3B所述的设备或组成物。例如,在图11的步骤(a),第一光学透明材料例如电介质或半导体例如聚合物(例如树脂)可以布置在基板例如玻璃基板上。在图11的步骤(b),可以使用纳米压印光刻术来图案化第一材料,例如以便限定多个特征,例如阱或柱。在图11的步骤(c),第三光学透明材料例如具有比第一材料更高的折射率的电介质或半导体材料可以布置(例如共形地涂覆)在第一材料内限定的特征上。在图11的步骤(d),第四光学透明材料例如电介质或半导体例如聚合物(例如树脂)可以布置在第三材料上。在图11的步骤(e),可以使用纳米压印光刻术来图案化第四材料,例如以便限定多个阱或纳米阱。第四材料可选地填充例如在图11的步骤(e)中所示的光子结构内的空间。包括一个或更多个发光体的第二材料(未特别示出)可以布置在阱或纳米阱内,例如可以布置在光子结构上。尽管图11示出了每像素单个阱的制备,但是应当理解,可以例如通过改变在第二纳米压印步骤中形成的特征的分布和尺寸来容易制备每像素多个阱。As mentioned elsewhere in this article, any suitable combination of material processing and patterning techniques can be used to prepare the apparatus and method of the present invention. For example, Figure 11 shows an exemplary order of steps that can be used to prepare an apparatus or composition such as provided herein. Illustratively, two nanoimprint lithography steps, followed by a conformal dielectric deposition step, can be used to prepare an apparatus or composition such as described herein with reference to Figures 3A-3B. For example, in step (a) of Figure 11, a first optically transparent material such as a dielectric or semiconductor such as a polymer (such as a resin) can be arranged on a substrate such as a glass substrate. In step (b) of Figure 11, nanoimprint lithography can be used to pattern the first material, such as to define multiple features, such as wells or pillars. In step (c) of Figure 11, a third optically transparent material such as a dielectric or semiconductor material with a higher refractive index than the first material can be arranged (such as conformally coated) on the features defined in the first material. In step (d) of Figure 11, a fourth optically transparent material such as a dielectric or semiconductor such as a polymer (such as a resin) can be arranged on the third material. In step (e) of Figure 11 , nanoimprint lithography can be used to pattern the fourth material, for example, to define a plurality of wells or nanowells. The fourth material optionally fills a space within the photonic structure, for example, as shown in step (e) of Figure 11 . A second material (not specifically shown) comprising one or more luminophores can be arranged within the well or nanowell, for example, on the photonic structure. Although Figure 11 shows the preparation of a single well per pixel, it will be understood that multiple wells per pixel can be easily prepared, for example, by varying the distribution and size of the features formed in the second nanoimprint step.
作为另一个例子,可以使用两个光刻步骤、两个RIE步骤、电介质沉积和CMP的组合来制备例如在本文参考图3A-3B所述的设备或组成物。例如,图12示出了可用于制备例如本文所提供的设备或组成物的步骤的另一示例性顺序。在图12的步骤(a),第一光学透明材料例如电介质或半导体例如聚合物(例如树脂)可以布置在基板例如玻璃基板上。在图12的步骤(b),可使用光刻法、后面是反应离子蚀刻(RIE)来图案化第一材料,例如以便限定多个特征,例如阱或柱。在图12的步骤(c),第三光学透明材料例如具有比第一材料更高的折射率的电介质或半导体材料可以布置(例如共形地涂覆)在第一材料内限定的特征上。在图12的步骤(d),第四光学透明材料例如电介质或半导体例如聚合物(例如树脂)可以布置在第三材料上。在图12的步骤(e),可以例如使用化学机械抛光(CMP)来平坦化第四材料。在图12的步骤(f),可以使用光刻术、后面是RIE来图案化第四材料,例如以便限定多个阱或纳米阱。第四材料可选地填充例如在图12的步骤(f)中所示的光子结构内的空间。包括一个或更多个发光体的第二材料(未特别示出)可以布置在阱或纳米阱内,例如可以布置在光子结构上。尽管图12示出了每像素单个阱的制备,但是应当理解,可以例如通过改变在第二光刻和RIE步骤中形成的特征的分布和尺寸来容易制备每像素多个阱。As another example, a combination of two photolithography steps, two RIE steps, dielectric deposition, and CMP can be used to prepare devices or compositions such as those described herein with reference to Figures 3A-3B. For example, Figure 12 shows another exemplary sequence of steps that can be used to prepare devices or compositions such as those provided herein. In step (a) of Figure 12, a first optically transparent material, such as a dielectric or semiconductor, such as a polymer (e.g., a resin), can be arranged on a substrate, such as a glass substrate. In step (b) of Figure 12, photolithography, followed by reactive ion etching (RIE), can be used to pattern the first material, such as to define multiple features, such as wells or pillars. In step (c) of Figure 12, a third optically transparent material, such as a dielectric or semiconductor material having a higher refractive index than the first material, can be arranged (e.g., conformally coated) on the features defined within the first material. In step (d) of Figure 12, a fourth optically transparent material, such as a dielectric or semiconductor, such as a polymer (e.g., a resin), can be arranged on the third material. In step (e) of Figure 12, chemical mechanical polishing (CMP) can be used, for example, to flatten the fourth material. In step (f) of Figure 12 , a fourth material can be patterned using photolithography followed by RIE, for example, to define a plurality of wells or nanowells. The fourth material optionally fills a space within the photonic structure, for example, as shown in step (f) of Figure 12 . A second material (not specifically shown) comprising one or more luminophores can be arranged within the wells or nanowells, for example, on the photonic structure. Although Figure 12 illustrates the preparation of a single well per pixel, it will be appreciated that multiple wells per pixel can be readily prepared, for example, by varying the distribution and size of the features formed in the second photolithography and RIE steps.
应该理解,本发明的设备可适当地在各种应用中的任一个中使用,例如用于发光成像。例如,图13示出了例如这里提供的在发光成像中使用的示例性设备。图13示出了包括光子结构1310、光学部件1330、成像像素1350和检测电路1340的示例性设备。光子结构1310包括具有第一折射率的第一材料(由对角线图案指示)和具有不同于第一折射率的第二折射率的第二材料(由水平地划线的图案指示)。第一材料可以包括第一和第二主表面1311、1312以及通过第一和第二主表面中的至少一个限定的第一和第二多个特征,例如阱1313、1314。第一多个特征1313中的特征(例如阱)可以在至少一个特性上不同于第二多个特征1314中的特征(例如阱),例如可以在形状、尺寸或分布上不同。例如,在图13所示的示例性光子结构1310中,与第二多个特征1314中的特征相比,第一多个特征1313中的特征(例如阱)在尺寸(例如宽度)上和在分布(例如间距)上不同。在图13所示的非限制性例子中,第二材料可以布置在第一和第二多个特征例如阱1313、1314内或之间,并且可以包括第一和第二发光体1321、1322。例如,第一和第二发光体1321、1322中的一些可以位于第一多个特征(例如阱1313)内或之间,而第一和第二发光体1321、1322中的另一些可以位于第二多个特征(例如阱1314)内或之间。在例如上面参考图3A-3B讨论的其他实施例中,第二材料可以布置在第一和第二多个特征上。说明性地,第一材料可以包括聚合物或玻璃或其他合适的材料,或者第二材料可以包括流体或凝胶或其他合适的材料。可选地,光子结构1310还包括具有不同于第一和第二折射率的第三折射率的第三材料,以例如在本文参考图3A-3B所述的方式,第三材料布置在第一和第二多个特征中的至少一个上,第二材料布置在第三材料上。可选地,第一发光体1321可以耦合到第一核酸,以及第二发光体1322可以耦合到不同于第一核酸的第二核酸。It should be understood that the devices of the present invention may be suitably used in any of a variety of applications, such as for luminescent imaging. For example, Figure 13 shows an exemplary device for use in luminescent imaging, such as provided herein. Figure 13 shows an exemplary device including a photonic structure 1310, an optical component 1330, an imaging pixel 1350, and a detection circuit 1340. The photonic structure 1310 includes a first material having a first refractive index (indicated by a diagonal pattern) and a second material having a second refractive index different from the first refractive index (indicated by a horizontally crossed pattern). The first material may include first and second major surfaces 1311, 1312 and a first and second plurality of features, such as wells 1313, 1314, defined by at least one of the first and second major surfaces. The features (e.g., wells) in the first plurality of features 1313 may differ from the features (e.g., wells) in the second plurality of features 1314 in at least one characteristic, such as may differ in shape, size, or distribution. For example, in the exemplary photonic structure 1310 shown in FIG13 , the features (e.g., wells) in the first plurality of features 1313 differ in size (e.g., width) and distribution (e.g., spacing) compared to the features in the second plurality of features 1314. In the non-limiting example shown in FIG13 , a second material can be disposed within or between the first and second pluralities of features, such as wells 1313, 1314, and can include first and second luminophores 1321, 1322. For example, some of the first and second luminophores 1321, 1322 can be located within or between the first plurality of features (e.g., well 1313), while other of the first and second luminophores 1321, 1322 can be located within or between the second plurality of features (e.g., well 1314). In other embodiments, such as those discussed above with reference to FIG3A-3B , the second material can be disposed on both the first and second pluralities of features. Illustratively, the first material can include a polymer, glass, or other suitable material, or the second material can include a fluid, gel, or other suitable material. Optionally, the photonic structure 1310 further comprises a third material having a third refractive index different from the first and second refractive indices, the third material being disposed on at least one of the first and second plurality of features, and the second material being disposed on the third material, in a manner such as described herein with reference to Figures 3A-3B. Optionally, the first luminophore 1321 can be coupled to a first nucleic acid, and the second luminophore 1322 can be coupled to a second nucleic acid different from the first nucleic acid.
光子结构1310可以响应于在第一时间用具有第一特性的光子照射而选择性地支持第一谐振图案,第一发光体1321可以响应于该照射而发射第一波长λ1。光子结构1310可以响应于在第二时间用具有第二特性的光子照射而选择性地支持第二谐振图案,第二发光体1322可以响应于该照射而发射第二波长λ2。第一和第二波长可选地可以彼此不同,例如,可选地可以由不在光子结构内选择性地谐振的第一非传播波长彼此分开。光学部件1330可以布置在第一材料的第一主表面1311和第二主表面1312之一上,例如在第一主表面1311之上并且可选地在与第一主表面1311间隔开的一段距离处。光学部件1330可以被配置成在第一时间用第一光子照射光子结构1310,并且在第二时间用第二光子照射光子结构1310。在图13所示的示例性设备中,以近似垂直于第一材料的第一主表面1311的角度用第一和第二光子照射光子结构1310,但是应当理解,可以适当地使用任何其他角度,例如在本文公开的角度。The photonic structure 1310 can selectively support a first resonant pattern in response to illumination with photons having a first characteristic at a first time, and the first light emitter 1321 can emit a first wavelength λ 1 in response to the illumination. The photonic structure 1310 can selectively support a second resonant pattern in response to illumination with photons having a second characteristic at a second time, and the second light emitter 1322 can emit a second wavelength λ 2 in response to the illumination. The first and second wavelengths can optionally be different from each other, for example, and can optionally be separated from each other by a first non-propagating wavelength that does not selectively resonate within the photonic structure. The optical component 1330 can be disposed on one of the first major surface 1311 and the second major surface 1312 of the first material, for example, above the first major surface 1311 and optionally at a distance from the first major surface 1311. The optical component 1330 can be configured to illuminate the photonic structure 1310 with the first photons at a first time and with the second photons at a second time. In the exemplary apparatus shown in FIG. 13 , the photonic structure 1310 is illuminated with first and second photons at angles approximately perpendicular to the first major surface 1311 of the first material, but it will be appreciated that any other angles, such as those disclosed herein, may be suitably used.
光子结构1310可以布置在成像像素1350上,成像像素1350可以包括被配置为分别在第一时间和第二时间对所接收的第一波长λ1和第二波长λ2成像的图像传感器。像素1350可以与光子结构1310间隔开,或者可以与光子结构1310接触,例如可以布置成与第二主表面1312接触。说明性地,像素1350可以包括与光子结构1310接触的基于互补金属氧化物半导体(CMOS)的图像传感器。可以适当地电耦合到像素1350的检测电路1340可以被配置为接收和分析来自在第一和第二时间的像素1350的电信号。在第一和第二发光体分别耦合到第一和第二核酸的非限制性例子中,检测电路1340可以被配置为基于在第一和第二时间的电信号例如以例如在本文其它地方所述的方式来识别第一和第二核酸中的哪个被耦合到特定的多核苷酸,其耦合到光子结构。可以使用其他成像像素,例如CCD摄像机的像素。在Bentley等人的(Nature 456:53-59(2008))PCT公布号WO 91/06678、WO 04/018497或WO07/123744、美国专利号7,057,026、7,329,492、7,211,414、7,315,019或7,405,281以及美国专利申请公布号2008/0108082中阐述了示例性检测器,其中每个文献的全部内容通过引用被并入本文。The photonic structure 1310 can be arranged on an imaging pixel 1350, which can include an image sensor configured to image the received first wavelength λ 1 and second wavelength λ 2 at a first time and a second time, respectively. The pixel 1350 can be spaced apart from the photonic structure 1310, or can be in contact with the photonic structure 1310, for example, can be arranged to be in contact with the second major surface 1312. Illustratively, the pixel 1350 can include an image sensor based on a complementary metal oxide semiconductor (CMOS) in contact with the photonic structure 1310. The detection circuit 1340, which can be appropriately electrically coupled to the pixel 1350, can be configured to receive and analyze electrical signals from the pixel 1350 at the first and second times. In a non-limiting example in which the first and second luminophores are coupled to the first and second nucleic acids, respectively, the detection circuit 1340 can be configured to identify which of the first and second nucleic acids is coupled to a specific polynucleotide, which is coupled to the photonic structure, based on the electrical signals at the first and second times, for example, in a manner described elsewhere herein. Other imaging pixels can be used, such as pixels of a CCD camera. Exemplary detectors are described in PCT Publication Nos. WO 91/06678, WO 04/018497, or WO 07/123744, U.S. Pat. Nos. 7,057,026, 7,329,492, 7,211,414, 7,315,019, or 7,405,281, and U.S. Patent Application Publication No. 2008/0108082, all of which are incorporated herein by reference in their entirety.
例如在本文提供的设备还可以将辐射传输到光子结构,以便适当地激发其中的发光体。例如,设备1300还可以包括被配置成产生由光学部件1330传输到光子结构的辐射的宽带激发源例如发光二极管(LED)或者窄带激发源例如激光器。For example, the devices provided herein can also transmit radiation to the photonic structure to appropriately excite the luminophore therein. For example, the device 1300 can also include a broadband excitation source, such as a light emitting diode (LED), or a narrowband excitation source, such as a laser, configured to generate radiation transmitted by the optical component 1330 to the photonic structure.
注意,本发明的设备例如在图13中示出的设备1300可选地可以包括例如在本文其它地方描述的一个或更多个微流控特征。例如,设备1300可选地可以包括至少一个微流控特征,该微流控特征与光子结构接触,并且被配置成提供一种或更多种分析物在布置在像素之上的第一和第二多个特征内、之间或之上的流动。这种分析物可选地可以包括用于核酸测序的一种或更多种试剂,例如核苷酸、核酸或聚合酶。Note that the apparatus of the present invention, such as the apparatus 1300 shown in FIG13 , may optionally include one or more microfluidic features, such as those described elsewhere herein. For example, the apparatus 1300 may optionally include at least one microfluidic feature that contacts the photonic structure and is configured to provide for the flow of one or more analytes within, between, or over the first and second plurality of features disposed above the pixels. Such analytes may optionally include one or more reagents for nucleic acid sequencing, such as nucleotides, nucleic acids, or polymerases.
因此,本文提供了包括光子结构的设备、组成物和方法,该光子结构可以在比在发光成像中使用的像素的数量更大数量的位点处提供单色或多色发光信号增强,例如所述设备、组成物和方法与先前已知的荧光显微镜扫描系统例如在市场上从例如Illumina有限公司可购得的测序平台兼容。例如,本发明的设备、组成物和方法的一些实施例可以产生被分开在光的波长的量级上的距离的激发“热点”。可以例如通过适当地选择光子结构晶格特征(例如对称性)和/或激发光束的波长、角度和/或偏振状态来调整这些高强度谐振特征(例如,Fano或导模谐振)的空间分布。将发光体(例如,耦合到这种发光体的生物分子)放置在这种光子结构附近可以增强发光信号,但是谐振地增强发光体激发、发光收集或两者。因此,光子结构是用于例如使用均匀照明来实现来自在单个像素之上的多个成像位点的发光信号增强的有吸引力的平台,其中可以通过在不同时间控制激发光束的特性来实现选择性成像位点激发。光子结构可以被调整以减少例如在这里参考图7D和8E所描述的串扰项。可选地,可以省略光子结构,并且可以例如使用自由空间光学器件或多激光干涉来将激发光束引导到成像位点中的选定的成像位点。Thus, provided herein are devices, compositions, and methods comprising photonic structures that can provide monochromatic or multicolor luminescence signal enhancement at a greater number of sites than the number of pixels used in luminescence imaging, for example, the devices, compositions, and methods are compatible with previously known fluorescence microscope scanning systems, such as sequencing platforms commercially available from, for example, Illumina, Inc. For example, some embodiments of the devices, compositions, and methods of the present invention can generate excitation "hot spots" separated by distances on the order of the wavelength of light. The spatial distribution of these high-intensity resonant features (e.g., Fano or guided mode resonances) can be adjusted, for example, by appropriately selecting photonic structure lattice features (e.g., symmetry) and/or the wavelength, angle, and/or polarization state of the excitation beam. Placing a luminophore (e.g., a biomolecule coupled to such a luminophore) near such a photonic structure can enhance the luminescence signal, but resonantly enhances luminophore excitation, luminescence collection, or both. Thus, photonic structures are attractive platforms for achieving luminescence signal enhancement from multiple imaging sites on a single pixel, for example, using uniform illumination, where selective imaging site excitation can be achieved by controlling the characteristics of the excitation beam at different times. The photonic structure can be adjusted to reduce crosstalk terms such as described herein with reference to Figures 7D and 8E. Alternatively, the photonic structure can be omitted and the excitation beam can be directed to selected ones of the imaging sites using, for example, free space optics or multi-laser interferometry.
其它可选的实施例Other optional embodiments
虽然上面描述了本发明的各种说明性例子,对于本领域的技术人员来说将明显的是,可以在其中做出各种改变和修改而不偏离本发明。例如,尽管上面参考与测序多核苷酸(例如DNA或RNA)相关的发光成像讨论了某些组成物、系统和方法,但是应当理解,本文的组成物、系统和方法可适当地适合于在与任何合适的对象相关的发光成像。所附的权利要求旨在涵盖落在本发明的真实精神和范围内的所有这样的改变和修改。Although various illustrative examples of the present invention have been described above, it will be apparent to those skilled in the art that various changes and modifications may be made therein without departing from the present invention. For example, although certain compositions, systems, and methods have been discussed above with reference to luminescent imaging associated with sequencing polynucleotides (e.g., DNA or RNA), it will be understood that the compositions, systems, and methods herein may be suitably adapted for luminescent imaging associated with any suitable object. The appended claims are intended to encompass all such changes and modifications that fall within the true spirit and scope of the present invention.
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| HK40003934B true HK40003934B (en) | 2022-03-18 |
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