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GB9121008D0 - Multiple source evaporation for alloy production - Google Patents

Multiple source evaporation for alloy production

Info

Publication number
GB9121008D0
GB9121008D0 GB919121008A GB9121008A GB9121008D0 GB 9121008 D0 GB9121008 D0 GB 9121008D0 GB 919121008 A GB919121008 A GB 919121008A GB 9121008 A GB9121008 A GB 9121008A GB 9121008 D0 GB9121008 D0 GB 9121008D0
Authority
GB
United Kingdom
Prior art keywords
multiple source
alloy production
source evaporation
evaporation
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB919121008A
Other versions
GB2248457A (en
GB2248457B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SECR DEFENCE
Original Assignee
SECR DEFENCE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SECR DEFENCE filed Critical SECR DEFENCE
Publication of GB9121008D0 publication Critical patent/GB9121008D0/en
Publication of GB2248457A publication Critical patent/GB2248457A/en
Application granted granted Critical
Publication of GB2248457B publication Critical patent/GB2248457B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
GB9121008A 1989-04-21 1991-10-03 Multiple source evaporation for bulk alloy production Expired - Fee Related GB2248457B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8909088A GB2230792A (en) 1989-04-21 1989-04-21 Multiple source physical vapour deposition.

Publications (3)

Publication Number Publication Date
GB9121008D0 true GB9121008D0 (en) 1991-12-11
GB2248457A GB2248457A (en) 1992-04-08
GB2248457B GB2248457B (en) 1993-05-05

Family

ID=10655463

Family Applications (2)

Application Number Title Priority Date Filing Date
GB8909088A Withdrawn GB2230792A (en) 1989-04-21 1989-04-21 Multiple source physical vapour deposition.
GB9121008A Expired - Fee Related GB2248457B (en) 1989-04-21 1991-10-03 Multiple source evaporation for bulk alloy production

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB8909088A Withdrawn GB2230792A (en) 1989-04-21 1989-04-21 Multiple source physical vapour deposition.

Country Status (4)

Country Link
EP (1) EP0469050A1 (en)
JP (1) JPH04505478A (en)
GB (2) GB2230792A (en)
WO (1) WO1990012485A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2230792A (en) * 1989-04-21 1990-10-31 Secr Defence Multiple source physical vapour deposition.
GB2248852A (en) * 1990-10-16 1992-04-22 Secr Defence Vapour deposition
GB2262539A (en) * 1991-12-16 1993-06-23 Secr Defence Titanium containing magnesium alloy produced by vapour quenching.
GB2267913A (en) * 1991-12-16 1993-12-22 Secr Defence Titanium containing magnesium alloy produced by vapour quenching
US5253266A (en) * 1992-07-20 1993-10-12 Intevac, Inc. MBE effusion source with asymmetrical heaters
GB9302978D0 (en) * 1993-02-15 1993-03-31 Secr Defence Diffusion barrier layers
BE1010720A3 (en) * 1996-10-30 1998-12-01 Centre Rech Metallurgique Method and device for the continuous coating of a substrate in movement by means of a metal alloy in vapour phase
US6830626B1 (en) * 1999-10-22 2004-12-14 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum
DE10256038A1 (en) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg A steamer
JP2009149916A (en) * 2006-09-14 2009-07-09 Ulvac Japan Ltd Vacuum vapor processing apparatus
US20130129938A1 (en) * 2010-01-06 2013-05-23 Direct Vapor Technologies International Method for the co-evaporation and deposition of materials with differing vapor pressures
DE102014109195A1 (en) * 2014-07-01 2016-01-07 Aixtron Se Apparatus and method for generating a vapor from multiple liquid or solid sources for a CVD or PVD device
DE102014109196A1 (en) * 2014-07-01 2016-01-07 Aixtron Se Apparatus for generating a vapor from a solid or liquid source for a CVD or PVD device
CN106191785B (en) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 Crucible, evaporation coating device and deposition system
JP7465761B2 (en) * 2020-08-25 2024-04-11 キヤノントッキ株式会社 Crucible, evaporation source and deposition device
EP4053303A1 (en) 2021-03-01 2022-09-07 Carl Zeiss Vision International GmbH Vapor deposition method for coating a spectacle lens, physical vapor deposition system and crucible for physical vapor deposition

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB990288A (en) * 1961-09-05 1965-04-28 Ibm Improved method of depositing silicon monoxide films
CH430073A (en) * 1961-09-29 1967-02-15 Philips Nv Process for the production of light-absorbing, colored, transparent layers on objects
US3361591A (en) * 1964-04-15 1968-01-02 Hughes Aircraft Co Production of thin films of cadmium sulfide, cadmium telluride or cadmium selenide
NL6504932A (en) * 1965-04-17 1966-10-18
FR1534681A (en) * 1966-06-15 1968-08-02 Michel A Braguier Continuous zinc metallization process of a strip of dielectric material
GB1206586A (en) * 1966-09-07 1970-09-23 Mini Of Technology Vacuum deposition process of forming alloys
GB1292544A (en) * 1970-02-04 1972-10-11 Gen Electric Co Ltd Improvements in or relating to the manufacture of electroluminescent devices
US3751310A (en) * 1971-03-25 1973-08-07 Bell Telephone Labor Inc Germanium doped epitaxial films by the molecular beam method
GB2084197B (en) * 1980-09-23 1984-02-22 Univ Delaware Deposition material by vacuum evaporation
GB2230792A (en) * 1989-04-21 1990-10-31 Secr Defence Multiple source physical vapour deposition.

Also Published As

Publication number Publication date
EP0469050A1 (en) 1992-02-05
WO1990012485A2 (en) 1990-11-01
GB2248457A (en) 1992-04-08
GB2248457B (en) 1993-05-05
WO1990012485A3 (en) 1990-11-29
JPH04505478A (en) 1992-09-24
GB2230792A (en) 1990-10-31
GB8909088D0 (en) 1989-06-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940420