GB907211A - Vapour phase oxidation of halides - Google Patents
Vapour phase oxidation of halidesInfo
- Publication number
- GB907211A GB907211A GB3622757A GB3622757A GB907211A GB 907211 A GB907211 A GB 907211A GB 3622757 A GB3622757 A GB 3622757A GB 3622757 A GB3622757 A GB 3622757A GB 907211 A GB907211 A GB 907211A
- Authority
- GB
- United Kingdom
- Prior art keywords
- reaction
- fed
- reactants
- particle size
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003647 oxidation Effects 0.000 title abstract 5
- 238000007254 oxidation reaction Methods 0.000 title abstract 5
- 150000004820 halides Chemical class 0.000 title abstract 3
- 238000006243 chemical reaction Methods 0.000 abstract 11
- 239000000376 reactant Substances 0.000 abstract 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 5
- 239000001301 oxygen Substances 0.000 abstract 5
- 229910052760 oxygen Inorganic materials 0.000 abstract 5
- 239000002245 particle Substances 0.000 abstract 5
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 abstract 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 4
- 239000007795 chemical reaction product Substances 0.000 abstract 3
- 239000007789 gas Substances 0.000 abstract 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000005049 silicon tetrachloride Substances 0.000 abstract 2
- 239000004408 titanium dioxide Substances 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 abstract 1
- 229910052770 Uranium Inorganic materials 0.000 abstract 1
- 238000007792 addition Methods 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 150000001649 bromium compounds Chemical class 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 150000004694 iodide salts Chemical class 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 abstract 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052752 metalloid Inorganic materials 0.000 abstract 1
- 150000002738 metalloids Chemical class 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 abstract 1
- 230000001706 oxygenating effect Effects 0.000 abstract 1
- 239000011541 reaction mixture Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Compounds Of Iron (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
<PICT:0907211/III/1> <PICT:0907211/III/2> <PICT:0907211/III/3> In the production of metal or metalloid oxides by vapour phase oxidation of halides, the halide and the oxygenating gas are introduced to an empty reaction chamber either in adjacent streams or as a mixture, at least one of the reactants being admitted with such kinetic energy and with a Reynolds number of above 50,000, so that or near the point of injection there will be re-entrained in the incoming reactants sufficient of the reaction products, returning in the opposite direction to the reactant inflow, that the heat derived therefrom will preheat the incoming reactants to reaction temperature without the supply of auxiliary heat; the reaction chamber must be sufficiently wide not to impede the recirculatory flow and it is preferable that the recirculatory flow is enhanced by withdrawing reaction products from the same end of the reaction chamber as that to which the reactants are fed. The reaction vessel, normally cylindrical, generally has a diameter at least 20 times the diameter of the inlet orifice delivering the gas at high velocity. As shown in Fig. 1, a thermally insulated reaction vessel 1 is provided with a burner 10 to which reactants, for example titanium tetrachloride and oxygen are fed through inlets 11 and 12 respectively; reaction products are withdrawn through line 14. A burner 18 is provided at the opposite end of the furnace to preheat the furnace initially to reaction temperature. According to an example, titanium tetrachloride at 150 DEG C. was fed with oxygen at 170 DEG C. to a reaction vessel which reached a steady state operating temperature of 1050 DEG -1100 DEG C. Titanium dioxide of 2-5 micron mean particle size was recovered. Burners may be either as shown in Fig. 2 where the two reactants are fed through lines 34 and 35 to mix prior to ejection through an orifice 36, or as shown in Fig. 3 where a concentric nozzle is shown, air being admitted through a line 45, whilst titanium tetrachloride is fed by the central tube 37. The particle size of the titanium tetrachloride may be controlled by additions of water vapour to the reaction mixture, or, where the reactants are fed separately, to the oxygen containing gases. Silicon tetrachloride may also be premixed with the titanium tetrachloride vapours to modify the particle size of the titanium dioxide. Further examples relate to the oxidation of silicon tetrachloride, introduced at 120 DEG C., with oxygen fed at 100 DEG C., whereby at a reaction temperature of 1020 DEG C., silicon dioxide of 50 millimicron particle size was obtained, and to the oxidation of ferric chloride, containing 3% by volume of free chlorine, which was introduced at 350 DEG C. together with oxygen at 100 DEG C. into a reaction chamber preheated to 900 DEG C.; the reaction heat was maintained autogenously at 700 DEG -750 DEG C. and ferric oxide of 2-3 microns particle size was recovered. Reference is also made to the production of oxides by oxidation of the chlorides, bromides or iodides of Ti, Si, Al, Nb, Fe, Cr, Zr, V, Sn, and U or mixtures thereof.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL113022D NL113022C (en) | 1957-11-20 | ||
| GB3622757A GB907211A (en) | 1957-11-20 | 1957-11-20 | Vapour phase oxidation of halides |
| DEB51142A DE1194827B (en) | 1957-11-20 | 1958-11-19 | Process for the oxidation of halides in the vapor phase |
| CH6640158A CH378297A (en) | 1957-11-20 | 1958-11-20 | Vapor phase oxidation process |
| US338982A US3350171A (en) | 1957-11-20 | 1964-01-20 | Vapour phase oxidation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3622757A GB907211A (en) | 1957-11-20 | 1957-11-20 | Vapour phase oxidation of halides |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB907211A true GB907211A (en) | 1962-10-03 |
Family
ID=10386156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3622757A Expired GB907211A (en) | 1957-11-20 | 1957-11-20 | Vapour phase oxidation of halides |
Country Status (4)
| Country | Link |
|---|---|
| CH (1) | CH378297A (en) |
| DE (1) | DE1194827B (en) |
| GB (1) | GB907211A (en) |
| NL (1) | NL113022C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3406012A (en) * | 1965-06-16 | 1968-10-15 | Pittsburgh Plate Glass Co | Process for classifying pigmentary metal oxide |
| US20130283636A1 (en) * | 2010-11-26 | 2013-10-31 | Owen Potter | Gas-particle processor |
| CN114538507A (en) * | 2022-01-24 | 2022-05-27 | 龙佰禄丰钛业有限公司 | Method for controlling particle size of titanium white chloride semi-finished product |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2923182A1 (en) * | 1979-06-08 | 1980-12-18 | Degussa | METHOD FOR THE PYROGENIC PRODUCTION OF FINE-PARTICLE OXIDE OF A MATAL AND / OR A METALOID |
| US4462979A (en) * | 1982-02-25 | 1984-07-31 | E. I. Du Pont De Nemours And Company | Process for preparing soft TiO2 agglomerates |
| DE3913260A1 (en) * | 1988-05-19 | 1989-11-23 | Degussa | SPHERICAL, HYDROPHILIC SILICA, METHOD FOR THE PRODUCTION AND USE THEREOF |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE554633C (en) * | 1925-07-26 | 1932-07-14 | Comstock & Wescott | Process for the extraction of iron oxide |
| DE918028C (en) * | 1941-01-07 | 1954-09-16 | Erwin Maier | Production of finely divided oxides, sulfides, etc. Like., In particular metal oxides |
| CH221309A (en) * | 1941-12-03 | 1942-05-31 | Hans Dr Preis | Process and device for the production of a finely divided oxide of those elements of group IVa of the periodic table which are capable of forming volatile chlorides. |
| NL145503C (en) * | 1948-02-20 |
-
0
- NL NL113022D patent/NL113022C/xx active
-
1957
- 1957-11-20 GB GB3622757A patent/GB907211A/en not_active Expired
-
1958
- 1958-11-19 DE DEB51142A patent/DE1194827B/en active Pending
- 1958-11-20 CH CH6640158A patent/CH378297A/en unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3406012A (en) * | 1965-06-16 | 1968-10-15 | Pittsburgh Plate Glass Co | Process for classifying pigmentary metal oxide |
| US20130283636A1 (en) * | 2010-11-26 | 2013-10-31 | Owen Potter | Gas-particle processor |
| US9146055B2 (en) * | 2010-11-26 | 2015-09-29 | Owen Potter | Gas-particle processor |
| US9670012B2 (en) | 2010-11-26 | 2017-06-06 | Owen Potter | Gas-particle processor |
| CN114538507A (en) * | 2022-01-24 | 2022-05-27 | 龙佰禄丰钛业有限公司 | Method for controlling particle size of titanium white chloride semi-finished product |
| CN114538507B (en) * | 2022-01-24 | 2024-04-16 | 龙佰禄丰钛业有限公司 | A method for controlling the particle size of semi-finished titanium dioxide chloride |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1194827B (en) | 1965-06-16 |
| CH378297A (en) | 1964-06-15 |
| NL113022C (en) |
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