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GB907211A - Vapour phase oxidation of halides - Google Patents

Vapour phase oxidation of halides

Info

Publication number
GB907211A
GB907211A GB3622757A GB3622757A GB907211A GB 907211 A GB907211 A GB 907211A GB 3622757 A GB3622757 A GB 3622757A GB 3622757 A GB3622757 A GB 3622757A GB 907211 A GB907211 A GB 907211A
Authority
GB
United Kingdom
Prior art keywords
reaction
fed
reactants
particle size
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3622757A
Inventor
Alan Edward Callow
William Hughes
James Dennis Groves
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
British Titan Products Co Ltd
British Titan Ltd
Original Assignee
British Titan Products Co Ltd
British Titan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL113022D priority Critical patent/NL113022C/xx
Application filed by British Titan Products Co Ltd, British Titan Ltd filed Critical British Titan Products Co Ltd
Priority to GB3622757A priority patent/GB907211A/en
Priority to DEB51142A priority patent/DE1194827B/en
Priority to CH6640158A priority patent/CH378297A/en
Publication of GB907211A publication Critical patent/GB907211A/en
Priority to US338982A priority patent/US3350171A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/20Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • C01G23/07Producing by vapour phase processes, e.g. halide oxidation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Compounds Of Iron (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)

Abstract

<PICT:0907211/III/1> <PICT:0907211/III/2> <PICT:0907211/III/3> In the production of metal or metalloid oxides by vapour phase oxidation of halides, the halide and the oxygenating gas are introduced to an empty reaction chamber either in adjacent streams or as a mixture, at least one of the reactants being admitted with such kinetic energy and with a Reynolds number of above 50,000, so that or near the point of injection there will be re-entrained in the incoming reactants sufficient of the reaction products, returning in the opposite direction to the reactant inflow, that the heat derived therefrom will preheat the incoming reactants to reaction temperature without the supply of auxiliary heat; the reaction chamber must be sufficiently wide not to impede the recirculatory flow and it is preferable that the recirculatory flow is enhanced by withdrawing reaction products from the same end of the reaction chamber as that to which the reactants are fed. The reaction vessel, normally cylindrical, generally has a diameter at least 20 times the diameter of the inlet orifice delivering the gas at high velocity. As shown in Fig. 1, a thermally insulated reaction vessel 1 is provided with a burner 10 to which reactants, for example titanium tetrachloride and oxygen are fed through inlets 11 and 12 respectively; reaction products are withdrawn through line 14. A burner 18 is provided at the opposite end of the furnace to preheat the furnace initially to reaction temperature. According to an example, titanium tetrachloride at 150 DEG C. was fed with oxygen at 170 DEG C. to a reaction vessel which reached a steady state operating temperature of 1050 DEG -1100 DEG C. Titanium dioxide of 2-5 micron mean particle size was recovered. Burners may be either as shown in Fig. 2 where the two reactants are fed through lines 34 and 35 to mix prior to ejection through an orifice 36, or as shown in Fig. 3 where a concentric nozzle is shown, air being admitted through a line 45, whilst titanium tetrachloride is fed by the central tube 37. The particle size of the titanium tetrachloride may be controlled by additions of water vapour to the reaction mixture, or, where the reactants are fed separately, to the oxygen containing gases. Silicon tetrachloride may also be premixed with the titanium tetrachloride vapours to modify the particle size of the titanium dioxide. Further examples relate to the oxidation of silicon tetrachloride, introduced at 120 DEG C., with oxygen fed at 100 DEG C., whereby at a reaction temperature of 1020 DEG C., silicon dioxide of 50 millimicron particle size was obtained, and to the oxidation of ferric chloride, containing 3% by volume of free chlorine, which was introduced at 350 DEG C. together with oxygen at 100 DEG C. into a reaction chamber preheated to 900 DEG C.; the reaction heat was maintained autogenously at 700 DEG -750 DEG C. and ferric oxide of 2-3 microns particle size was recovered. Reference is also made to the production of oxides by oxidation of the chlorides, bromides or iodides of Ti, Si, Al, Nb, Fe, Cr, Zr, V, Sn, and U or mixtures thereof.
GB3622757A 1957-11-20 1957-11-20 Vapour phase oxidation of halides Expired GB907211A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL113022D NL113022C (en) 1957-11-20
GB3622757A GB907211A (en) 1957-11-20 1957-11-20 Vapour phase oxidation of halides
DEB51142A DE1194827B (en) 1957-11-20 1958-11-19 Process for the oxidation of halides in the vapor phase
CH6640158A CH378297A (en) 1957-11-20 1958-11-20 Vapor phase oxidation process
US338982A US3350171A (en) 1957-11-20 1964-01-20 Vapour phase oxidation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3622757A GB907211A (en) 1957-11-20 1957-11-20 Vapour phase oxidation of halides

Publications (1)

Publication Number Publication Date
GB907211A true GB907211A (en) 1962-10-03

Family

ID=10386156

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3622757A Expired GB907211A (en) 1957-11-20 1957-11-20 Vapour phase oxidation of halides

Country Status (4)

Country Link
CH (1) CH378297A (en)
DE (1) DE1194827B (en)
GB (1) GB907211A (en)
NL (1) NL113022C (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3406012A (en) * 1965-06-16 1968-10-15 Pittsburgh Plate Glass Co Process for classifying pigmentary metal oxide
US20130283636A1 (en) * 2010-11-26 2013-10-31 Owen Potter Gas-particle processor
CN114538507A (en) * 2022-01-24 2022-05-27 龙佰禄丰钛业有限公司 Method for controlling particle size of titanium white chloride semi-finished product

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2923182A1 (en) * 1979-06-08 1980-12-18 Degussa METHOD FOR THE PYROGENIC PRODUCTION OF FINE-PARTICLE OXIDE OF A MATAL AND / OR A METALOID
US4462979A (en) * 1982-02-25 1984-07-31 E. I. Du Pont De Nemours And Company Process for preparing soft TiO2 agglomerates
DE3913260A1 (en) * 1988-05-19 1989-11-23 Degussa SPHERICAL, HYDROPHILIC SILICA, METHOD FOR THE PRODUCTION AND USE THEREOF

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE554633C (en) * 1925-07-26 1932-07-14 Comstock & Wescott Process for the extraction of iron oxide
DE918028C (en) * 1941-01-07 1954-09-16 Erwin Maier Production of finely divided oxides, sulfides, etc. Like., In particular metal oxides
CH221309A (en) * 1941-12-03 1942-05-31 Hans Dr Preis Process and device for the production of a finely divided oxide of those elements of group IVa of the periodic table which are capable of forming volatile chlorides.
NL145503C (en) * 1948-02-20

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3406012A (en) * 1965-06-16 1968-10-15 Pittsburgh Plate Glass Co Process for classifying pigmentary metal oxide
US20130283636A1 (en) * 2010-11-26 2013-10-31 Owen Potter Gas-particle processor
US9146055B2 (en) * 2010-11-26 2015-09-29 Owen Potter Gas-particle processor
US9670012B2 (en) 2010-11-26 2017-06-06 Owen Potter Gas-particle processor
CN114538507A (en) * 2022-01-24 2022-05-27 龙佰禄丰钛业有限公司 Method for controlling particle size of titanium white chloride semi-finished product
CN114538507B (en) * 2022-01-24 2024-04-16 龙佰禄丰钛业有限公司 A method for controlling the particle size of semi-finished titanium dioxide chloride

Also Published As

Publication number Publication date
DE1194827B (en) 1965-06-16
CH378297A (en) 1964-06-15
NL113022C (en)

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