GB904009A - A process and apparatus for the separation and recovery of unused starting materialsand secondary reaction products remaining after the production of ultra-pure siliconby the reduction of chlorinated silanes with hydrogen - Google Patents
A process and apparatus for the separation and recovery of unused starting materialsand secondary reaction products remaining after the production of ultra-pure siliconby the reduction of chlorinated silanes with hydrogenInfo
- Publication number
- GB904009A GB904009A GB33374/60A GB3337460A GB904009A GB 904009 A GB904009 A GB 904009A GB 33374/60 A GB33374/60 A GB 33374/60A GB 3337460 A GB3337460 A GB 3337460A GB 904009 A GB904009 A GB 904009A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silanes
- hydrogen
- chlorinated
- hydrogen chloride
- cooled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000004756 silanes Chemical class 0.000 title abstract 12
- 239000001257 hydrogen Substances 0.000 title abstract 7
- 229910052739 hydrogen Inorganic materials 0.000 title abstract 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000007795 chemical reaction product Substances 0.000 title 1
- 238000011084 recovery Methods 0.000 title 1
- 238000010517 secondary reaction Methods 0.000 title 1
- 238000000926 separation method Methods 0.000 title 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Chemical class Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract 5
- 229910000041 hydrogen chloride Chemical class 0.000 abstract 5
- 238000001816 cooling Methods 0.000 abstract 4
- 239000007789 gas Substances 0.000 abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 2
- 239000003463 adsorbent Substances 0.000 abstract 2
- 238000001035 drying Methods 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- 239000007787 solid Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229910003910 SiCl4 Inorganic materials 0.000 abstract 1
- 229910003822 SiHCl3 Inorganic materials 0.000 abstract 1
- -1 SiHCl3 or SiCl4 Chemical class 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 230000004888 barrier function Effects 0.000 abstract 1
- 239000011324 bead Substances 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 1
- 239000001569 carbon dioxide Substances 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 239000005457 ice water Substances 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N methyl alcohol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 1
- 239000003921 oil Substances 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 229910052763 palladium Inorganic materials 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 239000000741 silica gel Substances 0.000 abstract 1
- 229910002027 silica gel Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
In the production of ultra-pure silicon by reduction of chlorinated silanes, e.g. SiHCl3 or SiCl4, the residual gaseous mixture of hydrogen, silanes, chlorinated silanes and hydrogen chloride is cooled to a temperature higher than the liquefying temperature of hydrogen chloride (-85 DEG C.) to liquefy most of the silanes and chlorinated silanes, and passed through at least one more cooling trap charged with an adsorbent for adsorbing the remaining silanes and chlorinated silanes. The hydrogen and hydrogen chloride mixture may then be washed with water, which may be very pure, to dissolve out the hydrogen chloride. The gases entering helical tube 3 at 2, where they are pre-cooled by gases passing through tube 8 from cooling trap 1, pass into <PICT:0904009/III/1> tube 4, containing metal strips 4a to produce eddying in the gas stream, and are cooled by a solid carbon dioxide-methyl alcohol mixture 6. Silanes and chlorinated silanes are collected at 7 and the remaining gases pass out through tube 8 to further cooling traps 10, 11, charged with an adsorbent, e.g. silica gel. Alternative traps 16, 17 are provided so that traps 10, 11 may be regenerated by passage of hydrogen and the process carried out continuously. The hydrogen chloride is washed out in vessel 25 by water supplied through reservoir 23. The hydrogen is dried in a drying tower 26 filled with glass beads, and compressed in compressor 27. Remaining water is condensed in condenser 28 cooled by ice water, oxygen is removed by passing the hydrogen over a heated platinum or palladium catalyst, and final drying of the hydrogen is effected in trap 30 charged with liquid air or solid carbon dioxide. Silanes and chlorinated silanes may be removed from the first cooling trap by a siphon 35 to a vessel 36, protected from the atmosphere by a barrier device 40 which contains mercury or an oil, and a safety vessel, 42 to prevent this liquid entering vessel 36.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES65158A DE1129937B (en) | 1959-09-28 | 1959-09-28 | Process and arrangement for the recovery of the unconsumed starting materials in the production of hyperpure silicon by means of the reduction of silanes by hydrogen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB904009A true GB904009A (en) | 1962-08-22 |
Family
ID=7497806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB33374/60A Expired GB904009A (en) | 1959-09-28 | 1960-09-28 | A process and apparatus for the separation and recovery of unused starting materialsand secondary reaction products remaining after the production of ultra-pure siliconby the reduction of chlorinated silanes with hydrogen |
Country Status (3)
| Country | Link |
|---|---|
| CH (1) | CH390887A (en) |
| DE (1) | DE1129937B (en) |
| GB (1) | GB904009A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3933985A (en) * | 1971-09-24 | 1976-01-20 | Motorola, Inc. | Process for production of polycrystalline silicon |
| US4165363A (en) * | 1972-02-26 | 1979-08-21 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for the production of chlorosilanes |
| US4217334A (en) * | 1972-02-26 | 1980-08-12 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for the production of chlorosilanes |
| US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| EP1264798A4 (en) * | 2000-08-02 | 2005-07-20 | Mitsubishi Materials Polycryst | Process for producing disilicon hexachloride |
| CN101569817B (en) * | 2008-05-30 | 2011-06-15 | 中蓝晨光化工研究院有限公司 | Tail gas recycling method in trichlorosilane production |
| CN102180470A (en) * | 2011-04-07 | 2011-09-14 | 赵志军 | Method for recycling silicon tetrachloride as by-product of polycrystalline silicon |
| CN117205905A (en) * | 2023-09-28 | 2023-12-12 | 新特能源股份有限公司 | Adsorbent regeneration treatment method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2918060A1 (en) * | 1979-05-04 | 1980-11-13 | Siemens Ag | Residual gas recovery in silicon deposition by thermal decomposition - by condensing chloro-silane cpds. and freezing hydrogen chloride, leaving purified hydrogen |
| DE2918066A1 (en) * | 1979-05-04 | 1980-11-13 | Siemens Ag | METHOD FOR PRODUCING SILICON BY GAS PHASE DEPOSITION WITH REUSE OF THE RESIDUAL GASES |
| DE2918078A1 (en) * | 1979-05-04 | 1980-11-13 | Siemens Ag | Chloro-silane, hydrogen and hydrogen chloride recovery - from gas residue from silicon deposition process by freezing chloro-silane and hydrogen chloride |
-
1959
- 1959-09-28 DE DES65158A patent/DE1129937B/en active Pending
-
1960
- 1960-09-05 CH CH1001160A patent/CH390887A/en unknown
- 1960-09-28 GB GB33374/60A patent/GB904009A/en not_active Expired
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3933985A (en) * | 1971-09-24 | 1976-01-20 | Motorola, Inc. | Process for production of polycrystalline silicon |
| US4165363A (en) * | 1972-02-26 | 1979-08-21 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for the production of chlorosilanes |
| US4217334A (en) * | 1972-02-26 | 1980-08-12 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for the production of chlorosilanes |
| US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| EP1264798A4 (en) * | 2000-08-02 | 2005-07-20 | Mitsubishi Materials Polycryst | Process for producing disilicon hexachloride |
| CN101569817B (en) * | 2008-05-30 | 2011-06-15 | 中蓝晨光化工研究院有限公司 | Tail gas recycling method in trichlorosilane production |
| CN102180470A (en) * | 2011-04-07 | 2011-09-14 | 赵志军 | Method for recycling silicon tetrachloride as by-product of polycrystalline silicon |
| CN102180470B (en) * | 2011-04-07 | 2012-11-21 | 赵志军 | Method for recycling silicon tetrachloride as by-product of polycrystalline silicon |
| CN117205905A (en) * | 2023-09-28 | 2023-12-12 | 新特能源股份有限公司 | Adsorbent regeneration treatment method |
Also Published As
| Publication number | Publication date |
|---|---|
| CH390887A (en) | 1965-04-30 |
| DE1129937B (en) | 1962-05-24 |
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