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GB8819949D0 - Semiconductor devices - Google Patents

Semiconductor devices

Info

Publication number
GB8819949D0
GB8819949D0 GB888819949A GB8819949A GB8819949D0 GB 8819949 D0 GB8819949 D0 GB 8819949D0 GB 888819949 A GB888819949 A GB 888819949A GB 8819949 A GB8819949 A GB 8819949A GB 8819949 D0 GB8819949 D0 GB 8819949D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor devices
semiconductor
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB888819949A
Other versions
GB2222306B (en
GB2222306A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GE Healthcare UK Ltd
Original Assignee
GE Healthcare UK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GE Healthcare UK Ltd filed Critical GE Healthcare UK Ltd
Priority to GB8819949A priority Critical patent/GB2222306B/en
Publication of GB8819949D0 publication Critical patent/GB8819949D0/en
Publication of GB2222306A publication Critical patent/GB2222306A/en
Application granted granted Critical
Publication of GB2222306B publication Critical patent/GB2222306B/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/62Fin field-effect transistors [FinFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/024Manufacture or treatment of FETs having insulated gates [IGFET] of fin field-effect transistors [FinFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/025Manufacture or treatment of FETs having insulated gates [IGFET] of vertical IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/63Vertical IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6729Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/62Fin field-effect transistors [FinFET]
    • H10D30/6218Fin field-effect transistors [FinFET] of the accumulation type
GB8819949A 1988-08-23 1988-08-23 Field effect transistor devices Expired GB2222306B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8819949A GB2222306B (en) 1988-08-23 1988-08-23 Field effect transistor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8819949A GB2222306B (en) 1988-08-23 1988-08-23 Field effect transistor devices

Publications (3)

Publication Number Publication Date
GB8819949D0 true GB8819949D0 (en) 1988-09-21
GB2222306A GB2222306A (en) 1990-02-28
GB2222306B GB2222306B (en) 1992-08-12

Family

ID=10642533

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8819949A Expired GB2222306B (en) 1988-08-23 1988-08-23 Field effect transistor devices

Country Status (1)

Country Link
GB (1) GB2222306B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2789931B2 (en) * 1991-05-27 1998-08-27 日本電気株式会社 Semiconductor device
US5828101A (en) * 1995-03-30 1998-10-27 Kabushiki Kaisha Toshiba Three-terminal semiconductor device and related semiconductor devices
WO1997016854A1 (en) * 1995-11-01 1997-05-09 Amo Gmbh Semiconductor component with prismatic channel area
DE19846063A1 (en) * 1998-10-07 2000-04-20 Forschungszentrum Juelich Gmbh Method of manufacturing a double-gate MOSFET
DE10250984A1 (en) 2002-10-29 2004-05-19 Hahn-Meitner-Institut Berlin Gmbh Field effect transistor and method for its production
DE10339529A1 (en) * 2003-08-21 2005-03-24 Hahn-Meitner-Institut Berlin Gmbh Vertical nano-transistor, method for its manufacture and memory arrangement
US7652320B2 (en) * 2005-03-03 2010-01-26 Macronix International Co., Ltd. Non-volatile memory device having improved band-to-band tunneling induced hot electron injection efficiency and manufacturing method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3673471A (en) * 1970-10-08 1972-06-27 Fairchild Camera Instr Co Doped semiconductor electrodes for mos type devices
EP0166261A3 (en) * 1984-06-27 1989-01-11 Energy Conversion Devices, Inc. Static field-induced semiconductor devices
DE3504234A1 (en) * 1984-09-06 1986-03-13 Siemens AG, 1000 Berlin und 8000 München FIELD EFFECT SEMICONDUCTOR COMPONENT
JPS62229873A (en) * 1986-03-29 1987-10-08 Hitachi Ltd Manufacture of thin film semiconductor device
GB2211022B (en) * 1987-10-09 1991-10-09 Marconi Electronic Devices A semiconductor device and a process for making the device

Also Published As

Publication number Publication date
GB2222306B (en) 1992-08-12
GB2222306A (en) 1990-02-28

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Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PE20 Patent expired after termination of 20 years

Expiry date: 20080822