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GB8606846D0 - Composition - Google Patents

Composition

Info

Publication number
GB8606846D0
GB8606846D0 GB868606846A GB8606846A GB8606846D0 GB 8606846 D0 GB8606846 D0 GB 8606846D0 GB 868606846 A GB868606846 A GB 868606846A GB 8606846 A GB8606846 A GB 8606846A GB 8606846 D0 GB8606846 D0 GB 8606846D0
Authority
GB
United Kingdom
Prior art keywords
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB868606846A
Other versions
GB2173918A (en
GB2173918B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik LIL Ltd
Original Assignee
Laporte Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB858508333A external-priority patent/GB8508333D0/en
Application filed by Laporte Industries Ltd filed Critical Laporte Industries Ltd
Priority to GB08606846A priority Critical patent/GB2173918B/en
Publication of GB8606846D0 publication Critical patent/GB8606846D0/en
Publication of GB2173918A publication Critical patent/GB2173918A/en
Application granted granted Critical
Publication of GB2173918B publication Critical patent/GB2173918B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08606846A 1985-03-29 1986-03-19 Stripping solutions for positive photoresists Expired GB2173918B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08606846A GB2173918B (en) 1985-03-29 1986-03-19 Stripping solutions for positive photoresists

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB858508333A GB8508333D0 (en) 1985-03-29 1985-03-29 Composition for integated circuits
GB08606846A GB2173918B (en) 1985-03-29 1986-03-19 Stripping solutions for positive photoresists

Publications (3)

Publication Number Publication Date
GB8606846D0 true GB8606846D0 (en) 1986-04-23
GB2173918A GB2173918A (en) 1986-10-22
GB2173918B GB2173918B (en) 1988-11-02

Family

ID=26289067

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08606846A Expired GB2173918B (en) 1985-03-29 1986-03-19 Stripping solutions for positive photoresists

Country Status (1)

Country Link
GB (1) GB2173918B (en)

Families Citing this family (2)

* Cited by examiner, โ€  Cited by third party
Publication number Priority date Publication date Assignee Title
DE4303923A1 (en) * 1993-02-10 1994-08-11 Microparts Gmbh Process for removing plastics from microstructures
CN100334508C (en) * 2003-01-10 2007-08-29 ๅ‰ๅŸˆไป Photoresist demoulding coposition and model forming method by using said composition

Also Published As

Publication number Publication date
GB2173918A (en) 1986-10-22
GB2173918B (en) 1988-11-02

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19970319