GB201300133D0 - Laminated materials, methods and apparatus for making same, and uses thereof - Google Patents

Laminated materials, methods and apparatus for making same, and uses thereof

Info

Publication number: GB201300133D0
Authority: GB; United Kingdom
Prior art keywords: methods; making same; laminated materials; laminated; materials
Prior art date: 2012-10-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

GBGB1300133.4A

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

NITRIDE SOLUTIONS Inc

Original Assignee

Morgan Crucible Co PLC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2012-10-25

Filing date

2013-01-04

Publication date

2013-02-20

2013-01-04 Application filed by Morgan Crucible Co PLC filed Critical Morgan Crucible Co PLC

2013-02-20 Publication of GB201300133D0 publication Critical patent/GB201300133D0/en

Status Ceased legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
- H01J2237/3137—Plasma-assisted co-operation
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Organic Chemistry (AREA)
Analytical Chemistry (AREA)
Physical Vapour Deposition (AREA)
Combustion & Propulsion (AREA)
Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Cell Electrode Carriers And Collectors (AREA)
Battery Electrode And Active Subsutance (AREA)
Laminated Bodies (AREA)

GBGB1300133.4A 2012-10-25 2013-01-04 Laminated materials, methods and apparatus for making same, and uses thereof Ceased GB201300133D0 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US201261718575P	2012-10-25	2012-10-25

Publications (1)

Publication Number	Publication Date
GB201300133D0 true GB201300133D0 (en)	2013-02-20

Family

ID=47747979

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GBGB1300133.4A Ceased GB201300133D0 (en)	2012-10-25	2013-01-04	Laminated materials, methods and apparatus for making same, and uses thereof

Country Status (5)

Country	Link
EP (1)	EP2912205A2 (en)
JP (1)	JP2016504485A (en)
KR (1)	KR20150079749A (en)
GB (1)	GB201300133D0 (en)
WO (1)	WO2014063970A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP3366804B1 (en) *	2017-02-22	2022-05-11	Satisloh AG	Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5227203A (en) *	1992-02-24	1993-07-13	Nkk Corporation	Ion-plating method and apparatus therefor
AUPM365594A0 (en) *	1994-02-02	1994-02-24	Australian National University, The	Method and apparatus for coating a substrate
DE4412906C1 (en) *	1994-04-14	1995-07-13	Fraunhofer Ges Forschung	Ion-assisted vacuum coating
JPH10265946A (en) *	1997-03-27	1998-10-06	Toyo Metallizing Co Ltd	Evaporation apparatus and thin film manufacturing method using the same
DE10111515A1 (en) *	2001-02-19	2002-08-14	Fraunhofer Ges Forschung	Plasma coating device used for coating metallic strip material in the manufacture of photovoltaic cells and modules comprises a hollow cathode
GB2395059B (en)	2002-11-05	2005-03-16	Imp College Innovations Ltd	Structured silicon anode
US20090188790A1 (en)	2008-01-18	2009-07-30	4D-S Pty. Ltd.	Concentric hollow cathode magnetron sputter source
DE102008064134B4 (en) *	2008-12-19	2016-07-21	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Process for coating objects by means of a low-pressure plasma
WO2011074439A1 (en)	2009-12-16	2011-06-23	東洋紡績株式会社	Negative electrode for lithium ion secondary battery, and lithium ion secondary battery using same
KR20140082738A (en) *	2011-09-29	2014-07-02	니트라이드 솔루션즈 인크.	Inorganic materials, methods and apparatus for making same, and uses thereof

2013
- 2013-01-04 GB GBGB1300133.4A patent/GB201300133D0/en not_active Ceased
- 2013-10-16 EP EP13779559.7A patent/EP2912205A2/en not_active Withdrawn
- 2013-10-16 JP JP2015538376A patent/JP2016504485A/en active Pending
- 2013-10-16 KR KR1020157013533A patent/KR20150079749A/en not_active Withdrawn
- 2013-10-16 WO PCT/EP2013/071640 patent/WO2014063970A2/en not_active Ceased

Also Published As

Publication number	Publication date
KR20150079749A (en)	2015-07-08
JP2016504485A (en)	2016-02-12
WO2014063970A2 (en)	2014-05-01
WO2014063970A3 (en)	2014-07-24
EP2912205A2 (en)	2015-09-02

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GB201300133D0 (en)	2013-02-20	Laminated materials, methods and apparatus for making same, and uses thereof
GB201117229D0 (en)	2011-11-16	Inorganic materials, methods and apparatus for making same, and uses thereof
HK1162379B (en)	2013-05-10	Scrummaging machine and scrummaging apparatus therefor
SMT202400416T1 (en)	2024-11-15	Splitting apparatus
GB201209873D0 (en)	2012-07-18	Equipment-transport apparatus and methods
GB201200103D0 (en)	2012-02-15	Apparatus and methods
GB201209619D0 (en)	2012-07-11	Composition, apparatus, kit and method and uses thereof
AU2012905388A0 (en)	2013-01-10	Apparatus
AU2012903063A0 (en)	2012-08-02	Apparatus

Legal Events

Date	Code	Title	Description
2014-04-02	COOA	Change in applicant's name or ownership of the application	Owner name: NITRIDE SOLUTIONS, INC. Free format text: FORMER OWNER: MORGAN ADVANCED MATERIALS PLC
2014-06-18	AT	Applications terminated before publication under section 16(1)
2014-06-25	CAT	Correction to former announced terminated application (before grant)	Free format text: GB1300133.4 WAS ANNOUNCED AS TERMINATED BEFORE SECTION 16 PUBLICATION IN JOURNAL NUMBER 6526 ON 18TH JUNE 2014. THIS TERMINATION WAS MADE IN ERROR AND THE APPLICATION HAS NOW BEEN REINSTATED.
2014-07-23	AT	Applications terminated before publication under section 16(1)