GB201207766D0 - Dielectric capacitor - Google Patents
Dielectric capacitorInfo
- Publication number
- GB201207766D0 GB201207766D0 GBGB1207766.5A GB201207766A GB201207766D0 GB 201207766 D0 GB201207766 D0 GB 201207766D0 GB 201207766 A GB201207766 A GB 201207766A GB 201207766 D0 GB201207766 D0 GB 201207766D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrode
- dielectric layer
- dielectric
- coated onto
- structured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000003990 capacitor Substances 0.000 title abstract 3
- 238000000231 atomic layer deposition Methods 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 abstract 1
- 229910002113 barium titanate Inorganic materials 0.000 abstract 1
- 239000002041 carbon nanotube Substances 0.000 abstract 1
- 229910021393 carbon nanotube Inorganic materials 0.000 abstract 1
- 229910001084 galinstan Inorganic materials 0.000 abstract 1
- 229910000449 hafnium oxide Inorganic materials 0.000 abstract 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 239000004408 titanium dioxide Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/10—Metal-oxide dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/1209—Ceramic dielectrics characterised by the ceramic dielectric material
- H01G4/1218—Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates
- H01G4/1227—Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates based on alkaline earth titanates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/01—Manufacture or treatment
- H10D1/041—Manufacture or treatment of capacitors having no potential barriers
- H10D1/042—Manufacture or treatment of capacitors having no potential barriers using deposition processes to form electrode extensions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
- H10D1/711—Electrodes having non-planar surfaces, e.g. formed by texturisation
- H10D1/716—Electrodes having non-planar surfaces, e.g. formed by texturisation having vertical extensions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
- H10D62/119—Nanowire, nanosheet or nanotube semiconductor bodies
- H10D62/121—Nanowire, nanosheet or nanotube semiconductor bodies oriented parallel to substrates
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Semiconductor Memories (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
A method of manufacturing a dielectric capacitor comprising providing a first electrode having a structured surface, a dielectric layer coated onto the first electrode, and a second electrode coated onto the dielectric layer; where the structured surface comprises a random array of tubes, wires or rods which extend from the substrate surface, and where the dielectric layer is deposited by atomic layer deposition. Also disclosed is a dielectric capacitor comprising a structured electrode of randomly arranged carbon nanotubes extending from a substrate surface; a dielectric layer coated onto the structured electrode; and a second electrode coated onto the dielectric layer. The structured surface may have a spacing to length ratio with a maximum of 1:30. The dielectric layer may comprise one or more of hafnium oxide, titanium dioxide, barium titanate. The second electrode may be aluminium, titanium nitride, platinum, ruffinium or galinstan. The dielectric coating may be provided as a two layer coating, the first coating provided by plasma-enhanced atomic layer deposition and a second by thermal atomic layer deposition.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1207766.5A GB201207766D0 (en) | 2012-05-03 | 2012-05-03 | Dielectric capacitor |
| PCT/GB2013/051048 WO2013164576A1 (en) | 2012-05-03 | 2013-04-25 | Dielectric capacitor |
| GB1307443.0A GB2501823B8 (en) | 2012-05-03 | 2013-04-25 | Dielectric Capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1207766.5A GB201207766D0 (en) | 2012-05-03 | 2012-05-03 | Dielectric capacitor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB201207766D0 true GB201207766D0 (en) | 2012-06-13 |
Family
ID=46330749
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB1207766.5A Ceased GB201207766D0 (en) | 2012-05-03 | 2012-05-03 | Dielectric capacitor |
| GB1307443.0A Active GB2501823B8 (en) | 2012-05-03 | 2013-04-25 | Dielectric Capacitor |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1307443.0A Active GB2501823B8 (en) | 2012-05-03 | 2013-04-25 | Dielectric Capacitor |
Country Status (2)
| Country | Link |
|---|---|
| GB (2) | GB201207766D0 (en) |
| WO (1) | WO2013164576A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9349789B1 (en) | 2014-12-09 | 2016-05-24 | International Business Machines Corporation | Coaxial carbon nanotube capacitor for eDRAM |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6911373B2 (en) * | 2002-09-20 | 2005-06-28 | Intel Corporation | Ultra-high capacitance device based on nanostructures |
| US20050167655A1 (en) * | 2004-01-29 | 2005-08-04 | International Business Machines Corporation | Vertical nanotube semiconductor device structures and methods of forming the same |
| WO2005094440A2 (en) * | 2004-03-18 | 2005-10-13 | Nanosys Inc. | Nanofiber surface based capacitors |
| CN101573772B (en) * | 2006-10-04 | 2011-10-05 | Nxp股份有限公司 | MIM capacitor |
| US8424177B2 (en) * | 2006-10-04 | 2013-04-23 | Stmicroelectronics (Crolles 2) Sas | MIM capacitor with enhanced capacitance |
| JP2011522394A (en) * | 2007-12-31 | 2011-07-28 | エータモタ・コーポレイション | End contact type vertical carbon nanotube transistor |
| US8603195B2 (en) * | 2009-08-24 | 2013-12-10 | Applied Materials, Inc. | 3D approach on battery and supercapitor fabrication by initiation chemical vapor deposition techniques |
| US8405189B1 (en) * | 2010-02-08 | 2013-03-26 | Lockheed Martin Corporation | Carbon nanotube (CNT) capacitors and devices integrated with CNT capacitors |
| CA2712051A1 (en) * | 2010-08-12 | 2012-02-12 | The Governors Of The University Of Alberta | Method of fabricating a carbon nanotube array |
-
2012
- 2012-05-03 GB GBGB1207766.5A patent/GB201207766D0/en not_active Ceased
-
2013
- 2013-04-25 WO PCT/GB2013/051048 patent/WO2013164576A1/en not_active Ceased
- 2013-04-25 GB GB1307443.0A patent/GB2501823B8/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| GB2501823B8 (en) | 2022-08-03 |
| WO2013164576A1 (en) | 2013-11-07 |
| GB2501823A8 (en) | 2022-08-03 |
| GB201307443D0 (en) | 2013-06-05 |
| GB2501823B (en) | 2016-04-20 |
| GB2501823A (en) | 2013-11-06 |
| GB2501823C (en) | 2016-08-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| COOA | Change in applicant's name or ownership of the application |
Owner name: DYSON TECHNOLOGY LIMITED Free format text: FORMER OWNERS: DYSON TECHNOLOGY LIMITED;THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE, |
|
| AT | Applications terminated before publication under section 16(1) |