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GB1334051A - Sputtering - Google Patents

Sputtering

Info

Publication number
GB1334051A
GB1334051A GB1334051DA GB1334051A GB 1334051 A GB1334051 A GB 1334051A GB 1334051D A GB1334051D A GB 1334051DA GB 1334051 A GB1334051 A GB 1334051A
Authority
GB
United Kingdom
Prior art keywords
electrodes
evacuable
electrode
sputtering apparatus
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ELECTRICAL RESEARCH ASS
Original Assignee
ELECTRICAL RESEARCH ASS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ELECTRICAL RESEARCH ASS filed Critical ELECTRICAL RESEARCH ASS
Publication of GB1334051A publication Critical patent/GB1334051A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1334051 R.F. sputtering apparatus ELECTRICAL RESEARCH ASSOCIATION 11 June 1971 [12 March 1970j 11981/70 Heading C7F Sputtering apparatus includes a pair of target electrodes 21 connected to opposite terminals of a R.F. supply source and located within an evacuable enclosure, the electrodes being electrically isolated by an intervening wall 13 which separates the electric fields associated with the two electrodes. As shown, the chamber is evacuable via 4, and each electrode 20 is in a separate enclosure 13 provided with its own magnetic field coil 14; electrode 21 is cooled by passage of water through 22; 20 is the target material. Workpiece holders 16 are water-cooled via 17; electrodes 21 have shielding on each which is electrically interconnected but not earthed, Fig.5, (not shown). The two chambers may be separately evacuable, and an elongated substrate holder may move past both electrodes for successive coating of substrates or moving strip.
GB1334051D 1970-03-12 1970-03-12 Sputtering Expired GB1334051A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1198170 1970-03-12

Publications (1)

Publication Number Publication Date
GB1334051A true GB1334051A (en) 1973-10-17

Family

ID=9996223

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1334051D Expired GB1334051A (en) 1970-03-12 1970-03-12 Sputtering

Country Status (1)

Country Link
GB (1) GB1334051A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2423065A1 (en) * 1978-04-12 1979-11-09 Battelle Memorial Institute PROCESS FOR MANUFACTURING ELECTRODES FOR FUEL CELLS, DEVICE FOR IMPLEMENTING THE PROCESS AND ELECTRODES RESULTING FROM THIS PROCESS
GB2138449A (en) * 1983-04-22 1984-10-24 White Eng Co Method for pure ion plating using magnetic fields

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2423065A1 (en) * 1978-04-12 1979-11-09 Battelle Memorial Institute PROCESS FOR MANUFACTURING ELECTRODES FOR FUEL CELLS, DEVICE FOR IMPLEMENTING THE PROCESS AND ELECTRODES RESULTING FROM THIS PROCESS
GB2138449A (en) * 1983-04-22 1984-10-24 White Eng Co Method for pure ion plating using magnetic fields

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees