GB1263582A - Improvements in or relating to thin film deposition - Google Patents
Improvements in or relating to thin film depositionInfo
- Publication number
- GB1263582A GB1263582A GB4618569A GB4618569A GB1263582A GB 1263582 A GB1263582 A GB 1263582A GB 4618569 A GB4618569 A GB 4618569A GB 4618569 A GB4618569 A GB 4618569A GB 1263582 A GB1263582 A GB 1263582A
- Authority
- GB
- United Kingdom
- Prior art keywords
- chamber
- discharge
- evaporant
- source
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000427 thin-film deposition Methods 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 2
- 239000010409 thin film Substances 0.000 abstract 2
- UKUVVAMSXXBMRX-UHFFFAOYSA-N 2,4,5-trithia-1,3-diarsabicyclo[1.1.1]pentane Chemical compound S1[As]2S[As]1S2 UKUVVAMSXXBMRX-UHFFFAOYSA-N 0.000 abstract 1
- WBFMCDAQUDITAS-UHFFFAOYSA-N arsenic triselenide Chemical compound [Se]=[As][Se][As]=[Se] WBFMCDAQUDITAS-UHFFFAOYSA-N 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000002459 sustained effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1,263,582. Vacuum vapour deposition. BARR & STROUD Ltd. Aug.21, 1970 [Sept. 19, 1969], No.46185/69. Heading C7F. A method of depositing a thin film on a surface by evaporation within a vacuum chamber which includes a discharge source of electromagnetic energy for effecting cleaning of a said surface includes the steps of reducing the pressure within the chamber to approximately 10<SP>-5</SP> Torr, energizing said energy source, leaking gas into the chamber to raise the pressure therein to approximately 5 x 10<SP>-5</SP> Torr to enable a discharge from said source to be sustained; during said discharge heating the evaporant and confining heated evaporant in an enclosure, and releasing said heated evaporant after a predetermined time whereby the evaporant is deposited in thin film form on the surface. One or more layers may be deposited; substrates mentioned are glass, Si, Ge, arsenic triselenide and arsenic trisulphide; the coating may be MgF 2 or Al and the atmosphere air. The discharge source of electromagnetic energy may comprise a R.F. generator of 200 watts output at 10-20 MHz in conjunction with an amplifier and quarter-wavelength aerial; the latter may be outside a non-conducting, e.g. glass, chamber or inside a metal coating chamber. D.C. coils may be mounted outside the chamber to give a magnetic bottle effect to prevent discharge of R. F. energy via the chamber walls.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4618569A GB1263582A (en) | 1969-09-19 | 1969-09-19 | Improvements in or relating to thin film deposition |
| NL7013403A NL141582B (en) | 1969-09-19 | 1970-09-10 | METHOD AND DEVICE FOR DEPOSITING A THIN LAYER ON A SURFACE. |
| CH1352170A CH532128A (en) | 1969-09-19 | 1970-09-11 | Process for vapor deposition of a thin layer |
| DE19702045198 DE2045198B2 (en) | 1969-09-19 | 1970-09-12 | METHOD AND DEVICE FOR GENERATING THIN COATINGS ON SURFACES BY EVAPORATING THE SUBSTANCE FORMING THE COATING IN VACUUM |
| FR7034073A FR2062402A5 (en) | 1969-09-19 | 1970-09-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4618569A GB1263582A (en) | 1969-09-19 | 1969-09-19 | Improvements in or relating to thin film deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1263582A true GB1263582A (en) | 1972-02-09 |
Family
ID=10440203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4618569A Expired GB1263582A (en) | 1969-09-19 | 1969-09-19 | Improvements in or relating to thin film deposition |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH532128A (en) |
| DE (1) | DE2045198B2 (en) |
| FR (1) | FR2062402A5 (en) |
| GB (1) | GB1263582A (en) |
| NL (1) | NL141582B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4061800A (en) * | 1975-02-06 | 1977-12-06 | Applied Materials, Inc. | Vapor desposition method |
| WO1997042648A1 (en) * | 1996-05-09 | 1997-11-13 | Applied Materials, Inc. | Recessed coil for generating a plasma |
| US6254746B1 (en) | 1996-05-09 | 2001-07-03 | Applied Materials, Inc. | Recessed coil for generating a plasma |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3518197A1 (en) * | 1985-05-21 | 1986-11-27 | Heinrich 7413 Gomaringen Grünwald | METHOD FOR REMOVING METALIONS FROM BODIES OF GLASS, CERAMIC MATERIALS AND OTHER AMORPHOUS MATERIALS AND CRYSTALLINE MATERIALS |
-
1969
- 1969-09-19 GB GB4618569A patent/GB1263582A/en not_active Expired
-
1970
- 1970-09-10 NL NL7013403A patent/NL141582B/en unknown
- 1970-09-11 CH CH1352170A patent/CH532128A/en not_active IP Right Cessation
- 1970-09-12 DE DE19702045198 patent/DE2045198B2/en active Pending
- 1970-09-21 FR FR7034073A patent/FR2062402A5/fr not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4061800A (en) * | 1975-02-06 | 1977-12-06 | Applied Materials, Inc. | Vapor desposition method |
| WO1997042648A1 (en) * | 1996-05-09 | 1997-11-13 | Applied Materials, Inc. | Recessed coil for generating a plasma |
| US6254746B1 (en) | 1996-05-09 | 2001-07-03 | Applied Materials, Inc. | Recessed coil for generating a plasma |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2045198A1 (en) | 1971-04-01 |
| DE2045198B2 (en) | 1972-06-22 |
| NL7013403A (en) | 1971-03-23 |
| NL141582B (en) | 1974-03-15 |
| CH532128A (en) | 1972-12-31 |
| FR2062402A5 (en) | 1971-06-25 |
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