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GB1039475A - Light-sensitive material for use in the production of printing plates - Google Patents

Light-sensitive material for use in the production of printing plates

Info

Publication number
GB1039475A
GB1039475A GB2821664A GB2821664A GB1039475A GB 1039475 A GB1039475 A GB 1039475A GB 2821664 A GB2821664 A GB 2821664A GB 2821664 A GB2821664 A GB 2821664A GB 1039475 A GB1039475 A GB 1039475A
Authority
GB
United Kingdom
Prior art keywords
production
light
sensitive material
printing plates
july
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2821664A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1039475A publication Critical patent/GB1039475A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1,039,475. Etching. KALLE A.G. July 8, 1964 [July 12, 1963], No. 28216/64. Heading B6J. [Also in Division G2] A copper etching solution comprises an aqueous solution of 45% ferric nitrate and 5% calcium acetate.
GB2821664A 1963-07-12 1964-07-08 Light-sensitive material for use in the production of printing plates Expired GB1039475A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0050208 1963-07-12

Publications (1)

Publication Number Publication Date
GB1039475A true GB1039475A (en) 1966-08-17

Family

ID=7225526

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2821664A Expired GB1039475A (en) 1963-07-12 1964-07-08 Light-sensitive material for use in the production of printing plates

Country Status (7)

Country Link
AT (1) AT248472B (en)
BE (1) BE650332A (en)
CH (1) CH433988A (en)
DE (1) DE1447011A1 (en)
GB (1) GB1039475A (en)
NL (1) NL139108B (en)
SE (1) SE306013B (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3969118A (en) * 1973-06-20 1976-07-13 Hoechst Aktiengesellschaft Light-sensitive o-quinone diazide containing copying layer
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition
US4296194A (en) * 1977-04-12 1981-10-20 Vickers Limited Positive-working light sensitive diazo materials with azo dye
US4564581A (en) * 1981-06-19 1986-01-14 Sericol Group Limited Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator
WO1986007473A1 (en) * 1985-06-03 1986-12-18 Fairmount Chemical Co., Inc. Contrast enhancement layer
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US4882260A (en) * 1986-06-16 1989-11-21 Tokyo Ohka Kogyo Co., Ltd. Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023328B1 (en) * 1971-06-25 1975-08-07
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3969118A (en) * 1973-06-20 1976-07-13 Hoechst Aktiengesellschaft Light-sensitive o-quinone diazide containing copying layer
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition
US4296194A (en) * 1977-04-12 1981-10-20 Vickers Limited Positive-working light sensitive diazo materials with azo dye
US4564581A (en) * 1981-06-19 1986-01-14 Sericol Group Limited Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US5399463A (en) * 1985-05-02 1995-03-21 Ciba-Geigy Corporation Process of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizer
WO1986007473A1 (en) * 1985-06-03 1986-12-18 Fairmount Chemical Co., Inc. Contrast enhancement layer
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4882260A (en) * 1986-06-16 1989-11-21 Tokyo Ohka Kogyo Co., Ltd. Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product

Also Published As

Publication number Publication date
SE306013B (en) 1968-11-11
DE1447011A1 (en) 1969-01-02
NL139108B (en) 1973-06-15
CH433988A (en) 1967-04-15
NL6407379A (en) 1965-01-13
BE650332A (en) 1965-01-11
AT248472B (en) 1966-07-25

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