GB0424532D0 - Plasma system - Google Patents
Plasma systemInfo
- Publication number
- GB0424532D0 GB0424532D0 GB0424532A GB0424532A GB0424532D0 GB 0424532 D0 GB0424532 D0 GB 0424532D0 GB 0424532 A GB0424532 A GB 0424532A GB 0424532 A GB0424532 A GB 0424532A GB 0424532 D0 GB0424532 D0 GB 0424532D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- plasma system
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Priority Applications (19)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0424532A GB0424532D0 (en) | 2004-11-05 | 2004-11-05 | Plasma system |
| KR1020077010259A KR101192974B1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| EA200701007A EA010367B1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| CNA2005800370794A CN101049054A (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| EA200701008A EA010940B1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| US11/718,618 US20090065485A1 (en) | 2004-11-05 | 2005-11-03 | Plasma System |
| KR1020127005108A KR101212967B1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| CN2005800369617A CN101049053B (en) | 2004-11-05 | 2005-11-03 | Process and apparatus for plasma treatment of surfaces |
| EP08165637A EP2154937A2 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| PCT/GB2005/004245 WO2006048649A1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| KR1020077010288A KR101157410B1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| US11/718,610 US20090142514A1 (en) | 2004-11-05 | 2005-11-03 | Plasma System |
| EP05799889.0A EP1808056B1 (en) | 2004-11-05 | 2005-11-03 | Plasma process |
| EP20050800147 EP1808057A1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| JP2007539632A JP5180585B2 (en) | 2004-11-05 | 2005-11-03 | Plasma processing apparatus and method |
| CN201110180474.5A CN102355789B (en) | 2004-11-05 | 2005-11-03 | A process for plasma treating a surface |
| PCT/GB2005/004246 WO2006048650A1 (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| JP2007539631A JP2008519411A (en) | 2004-11-05 | 2005-11-03 | Plasma system |
| JP2012007447U JP3182293U (en) | 2004-11-05 | 2012-12-10 | A device for generating non-equilibrium atmospheric pressure plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0424532A GB0424532D0 (en) | 2004-11-05 | 2004-11-05 | Plasma system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB0424532D0 true GB0424532D0 (en) | 2004-12-08 |
Family
ID=33523272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB0424532A Ceased GB0424532D0 (en) | 2004-11-05 | 2004-11-05 | Plasma system |
Country Status (2)
| Country | Link |
|---|---|
| CN (2) | CN101049054A (en) |
| GB (1) | GB0424532D0 (en) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130041810A (en) * | 2010-07-21 | 2013-04-25 | 다우 코닝 프랑스 | Plasma treatment of substrates |
| CN103609203A (en) * | 2011-04-27 | 2014-02-26 | 道康宁法国公司 | Plasma treatment of substrates |
| US10225919B2 (en) | 2011-06-30 | 2019-03-05 | Aes Global Holdings, Pte. Ltd | Projected plasma source |
| TWI461113B (en) * | 2011-08-24 | 2014-11-11 | Nat Univ Tsing Hua | Atmospheric pressure plasma jet device |
| US20140248444A1 (en) * | 2011-11-09 | 2014-09-04 | Centre National De La Recherche Scientifique | Plasma Treatment Of Substrates |
| DE102014221521A1 (en) * | 2014-10-23 | 2016-05-12 | Tesa Se | Apparatus for the plasma treatment of surfaces and a method for treating surfaces with plasma |
| CN106304599B (en) * | 2016-09-29 | 2022-09-13 | 成都真火科技有限公司 | Sealing structure for high-power laminar arc plasma beam generator |
| CN109308987A (en) * | 2017-07-26 | 2019-02-05 | 东芝存储器株式会社 | Plasma processing apparatus, semiconductor manufacturing apparatus, and manufacturing method of semiconductor device |
| PE20211340A1 (en) * | 2018-11-16 | 2021-07-26 | Plasma Water Solutions Llc | METHOD, REACTION CHAMBER AND SYSTEM FOR THE TREATMENT OF LIQUIDS IN A CONTINUOUS FORM |
| EP4028575A1 (en) * | 2019-09-10 | 2022-07-20 | UCL Business Ltd | Plasma jet deposition process |
| CN111947151A (en) * | 2020-08-07 | 2020-11-17 | 合肥中科远望环保科技有限公司 | Gas composite plasma torch |
| CN114126182B (en) * | 2021-11-12 | 2023-05-30 | 中国人民解放军空军工程大学 | High-efficiency plasma synthetic jet exciter based on steam pressure enhancement |
| CN119342673B (en) * | 2024-10-21 | 2025-10-14 | 上海科技大学 | A plasma spray gun device compatible with near-atmospheric pressure photoelectron spectroscopy |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB549486A (en) * | 1940-04-12 | 1942-11-26 | Firestone Tire & Rubber Co | Improvements in or relating to electrical discharge devices and process of making the same |
| DE1417102A1 (en) * | 1957-06-26 | 1968-10-03 | Berghaus Elektrophysik Anst | Process for the oxidation of substances under the influence of electrical gas and glow discharges |
| DE1464755B2 (en) * | 1962-07-09 | 1970-09-10 | Kabushiki Kaisha Hitachi Seisakusho, Tokio | Device for generating a plasma jet by means of a high-frequency gas discharge |
| EP0063273B1 (en) * | 1981-04-02 | 1986-02-12 | The Perkin-Elmer Corporation | Discharge system for plasma processing |
| CN2060711U (en) * | 1990-03-22 | 1990-08-22 | 哈尔滨微电脑焊接设备技术开发公司 | D.c. impulse tungar argon arc-plasma arc welding machine |
| JPH0817171B2 (en) * | 1990-12-31 | 1996-02-21 | 株式会社半導体エネルギー研究所 | Plasma generator and etching method using the same |
| US5798146A (en) * | 1995-09-14 | 1998-08-25 | Tri-Star Technologies | Surface charging to improve wettability |
| US5893985A (en) * | 1997-03-14 | 1999-04-13 | The Lincoln Electric Company | Plasma arc torch |
| US6406759B1 (en) * | 1998-01-08 | 2002-06-18 | The University Of Tennessee Research Corporation | Remote exposure of workpieces using a recirculated plasma |
| DE29919142U1 (en) * | 1999-10-30 | 2001-03-08 | Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen | Plasma nozzle |
| CN1261233C (en) * | 2000-10-04 | 2006-06-28 | 陶氏康宁爱尔兰有限公司 | Method and apparatus for forming a coating |
| CN1158003C (en) * | 2001-10-25 | 2004-07-14 | 华中科技大学 | Capillary plasma generator |
| TW200409669A (en) * | 2002-04-10 | 2004-06-16 | Dow Corning Ireland Ltd | Protective coating composition |
| TW200308187A (en) * | 2002-04-10 | 2003-12-16 | Dow Corning Ireland Ltd | An atmospheric pressure plasma assembly |
| SE523135C2 (en) * | 2002-09-17 | 2004-03-30 | Smatri Ab | Plasma spraying device |
-
2004
- 2004-11-05 GB GB0424532A patent/GB0424532D0/en not_active Ceased
-
2005
- 2005-11-03 CN CNA2005800370794A patent/CN101049054A/en active Pending
- 2005-11-03 CN CN2005800369617A patent/CN101049053B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101049054A (en) | 2007-10-03 |
| CN101049053A (en) | 2007-10-03 |
| CN101049053B (en) | 2011-12-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AT | Applications terminated before publication under section 16(1) |