[go: up one dir, main page]

GB0401298D0 - Arc deposition apparatus and method - Google Patents

Arc deposition apparatus and method

Info

Publication number
GB0401298D0
GB0401298D0 GB0401298A GB0401298A GB0401298D0 GB 0401298 D0 GB0401298 D0 GB 0401298D0 GB 0401298 A GB0401298 A GB 0401298A GB 0401298 A GB0401298 A GB 0401298A GB 0401298 D0 GB0401298 D0 GB 0401298D0
Authority
GB
United Kingdom
Prior art keywords
deposition apparatus
arc deposition
arc
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0401298A
Other versions
GB2410255A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanofilm Technologies International Ltd
Original Assignee
Nanofilm Technologies International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanofilm Technologies International Ltd filed Critical Nanofilm Technologies International Ltd
Priority to GB0401298A priority Critical patent/GB2410255A/en
Publication of GB0401298D0 publication Critical patent/GB0401298D0/en
Priority to CN 200510005561 priority patent/CN1648281A/en
Priority to SG200500260A priority patent/SG113572A1/en
Publication of GB2410255A publication Critical patent/GB2410255A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB0401298A 2004-01-21 2004-01-21 Arc deposition method and apparatus Withdrawn GB2410255A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB0401298A GB2410255A (en) 2004-01-21 2004-01-21 Arc deposition method and apparatus
CN 200510005561 CN1648281A (en) 2004-01-21 2005-01-19 Arc coating deposition method and apparatus
SG200500260A SG113572A1 (en) 2004-01-21 2005-01-19 Arc deposition apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0401298A GB2410255A (en) 2004-01-21 2004-01-21 Arc deposition method and apparatus

Publications (2)

Publication Number Publication Date
GB0401298D0 true GB0401298D0 (en) 2004-02-25
GB2410255A GB2410255A (en) 2005-07-27

Family

ID=31971217

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0401298A Withdrawn GB2410255A (en) 2004-01-21 2004-01-21 Arc deposition method and apparatus

Country Status (3)

Country Link
CN (1) CN1648281A (en)
GB (1) GB2410255A (en)
SG (1) SG113572A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115074678A (en) * 2022-06-20 2022-09-20 肇庆市科润真空设备有限公司 Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120193227A1 (en) * 2011-02-02 2012-08-02 Tryon Brian S Magnet array for a physical vapor deposition system
JP7097172B2 (en) * 2017-11-21 2022-07-07 キヤノントッキ株式会社 Sputtering equipment
EP3938557B1 (en) * 2019-03-15 2023-09-06 Nanofilm Technologies International Limited Improved cathode arc source
CN111910156A (en) * 2020-05-27 2020-11-10 广东鼎泰机器人科技有限公司 Target feeding mechanism of coating machine
CN111876744B (en) * 2020-05-27 2025-12-16 广东鼎泰机器人科技有限公司 Coating machine
JP7739250B2 (en) * 2022-11-07 2025-09-16 株式会社神戸製鋼所 Arc evaporation source
CN116904937B (en) * 2023-05-16 2025-09-19 航天材料及工艺研究所 Preparation method of inner surface arc ion plating

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69416963T2 (en) * 1993-12-17 1999-09-16 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Device for coating sheets in a vacuum
DE60224984T2 (en) * 2002-04-22 2009-02-12 Pivot A.S. Arc coating with rotary cathodes
JP4014982B2 (en) * 2002-09-19 2007-11-28 株式会社神戸製鋼所 Rod target for arc evaporation source, manufacturing method thereof, and arc evaporation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115074678A (en) * 2022-06-20 2022-09-20 肇庆市科润真空设备有限公司 Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device

Also Published As

Publication number Publication date
CN1648281A (en) 2005-08-03
GB2410255A (en) 2005-07-27
SG113572A1 (en) 2005-08-29

Similar Documents

Publication Publication Date Title
TWI371501B (en) Deposition apparatus and deposition method
GB0417328D0 (en) Apparatus and method
GB0425008D0 (en) Method and apparatus
GB0406336D0 (en) Apparatus and method
GB2421367B (en) Lighting apparatus and method
EP1975979A4 (en) Coating apparatus and coating method
GB2412393B (en) Apparatus and method
GB0507538D0 (en) Apparatus and method
GB0409691D0 (en) Apparatus and method
GB0419915D0 (en) Apparatus and method
EP1650788A4 (en) Vapor deposition apparatus and vapor deposition method
GB0416471D0 (en) Apparatus and method
GB0500418D0 (en) Communications apparatus and method therefor
SG129340A1 (en) Deposition apparatus and methods
GB0421389D0 (en) Material deposition apparatus and method
GB0401298D0 (en) Arc deposition apparatus and method
GB0403238D0 (en) Apparatus and method
GB0504159D0 (en) Apparatus and method
TWI368184B (en) Drawing apparatus and drawing method
GB0402428D0 (en) Apparatus and method
AP2007003949A0 (en) Apparatus and method
GB2414492B (en) Apparatus and method
SG114701A1 (en) Continuous arc deposition apparatus and method with multiple available targets
PL1753563T3 (en) Melting apparatus and method
GB0411721D0 (en) Method and apparatus

Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)