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FR3114169B1 - Filtre optique et procédé de fabrication correspondant - Google Patents

Filtre optique et procédé de fabrication correspondant Download PDF

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Publication number
FR3114169B1
FR3114169B1 FR2009213A FR2009213A FR3114169B1 FR 3114169 B1 FR3114169 B1 FR 3114169B1 FR 2009213 A FR2009213 A FR 2009213A FR 2009213 A FR2009213 A FR 2009213A FR 3114169 B1 FR3114169 B1 FR 3114169B1
Authority
FR
France
Prior art keywords
pads
periodic array
optical filter
support layer
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2009213A
Other languages
English (en)
Other versions
FR3114169A1 (fr
Inventor
Neel Olivier Le
Stéphane Zoll
Stéphane Monfray
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics Crolles 2 SAS
STMicroelectronics France SAS
Original Assignee
STMicroelectronics SA
STMicroelectronics Crolles 2 SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA, STMicroelectronics Crolles 2 SAS filed Critical STMicroelectronics SA
Priority to FR2009213A priority Critical patent/FR3114169B1/fr
Priority to US17/469,286 priority patent/US12429639B2/en
Priority to CN202122190497.6U priority patent/CN216434426U/zh
Priority to CN202111062406.9A priority patent/CN114167534A/zh
Publication of FR3114169A1 publication Critical patent/FR3114169A1/fr
Application granted granted Critical
Publication of FR3114169B1 publication Critical patent/FR3114169B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/203—Filters having holographic or diffractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H10F77/337—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors using interference filters, e.g. multilayer dielectric filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/50—Encapsulations or containers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481—Constructional features, e.g. arrangements of optical elements
    • G01S7/4816—Constructional features, e.g. arrangements of optical elements of receivers alone
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optical Filters (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Filtre optique (FLT1) comportant : une couche de support (CS) comprenant un premier matériau (MAT1), un réseau périodique (RP) de plots disposés sur la couche de support selon un motif périodique paramétré par des dimensions caractéristiques (H, D, P), les plots comprenant un deuxième matériau (MAT2), une couche comprenant un troisième matériau (MAT3) englobant le réseau périodique de plots et recouvrant la couche de support, le troisième matériau ayant un indice optique différent d’un indice optique du deuxième matériau. Dans lequel les dimensions caractéristiques du réseau périodique de plots sont inférieures à une longueur d’onde parasite et configurées pour réfléchir sélectivement la lumière à la longueur d’onde parasite sur le réseau périodique de plots. Figure pour l’abrégé : Fig 1E
FR2009213A 2020-09-11 2020-09-11 Filtre optique et procédé de fabrication correspondant Active FR3114169B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR2009213A FR3114169B1 (fr) 2020-09-11 2020-09-11 Filtre optique et procédé de fabrication correspondant
US17/469,286 US12429639B2 (en) 2020-09-11 2021-09-08 Optical filter and corresponding manufacturing method
CN202122190497.6U CN216434426U (zh) 2020-09-11 2021-09-10 光学滤波器、电子设备以及车辆
CN202111062406.9A CN114167534A (zh) 2020-09-11 2021-09-10 光学滤波器及其对应的制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2009213A FR3114169B1 (fr) 2020-09-11 2020-09-11 Filtre optique et procédé de fabrication correspondant
FR2009213 2020-09-11

Publications (2)

Publication Number Publication Date
FR3114169A1 FR3114169A1 (fr) 2022-03-18
FR3114169B1 true FR3114169B1 (fr) 2023-06-23

Family

ID=74758840

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2009213A Active FR3114169B1 (fr) 2020-09-11 2020-09-11 Filtre optique et procédé de fabrication correspondant

Country Status (2)

Country Link
US (1) US12429639B2 (fr)
FR (1) FR3114169B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3114189A1 (fr) * 2020-09-11 2022-03-18 Stmicroelectronics (Crolles 2) Sas Dispositif électronique comprenant une région semiconductrice photosensible et procédé de fabrication correspondant

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5726805A (en) * 1996-06-25 1998-03-10 Sandia Corporation Optical filter including a sub-wavelength periodic structure and method of making
US6035089A (en) 1997-06-11 2000-03-07 Lockheed Martin Energy Research Corporation Integrated narrowband optical filter based on embedded subwavelength resonant grating structures
US6510263B1 (en) 2000-01-27 2003-01-21 Unaxis Balzers Aktiengesellschaft Waveguide plate and process for its production and microtitre plate
US20040120644A1 (en) * 2000-07-18 2004-06-24 Chou Stephen Y Method of making subwavelength resonant grating filter
US6532326B1 (en) * 2000-09-21 2003-03-11 Ut-Battelle, Llc Transverse-longitudinal integrated resonator
WO2009061861A2 (fr) * 2007-11-05 2009-05-14 Lightsmyth Technologies Inc. Réseaux optiques à efficacité élevée avec impératifs d'épaisseur réduits et couches correspondantes d'impédance
FR2965067B1 (fr) * 2010-09-17 2013-07-19 Onera (Off Nat Aerospatiale) Filtre spectral passe bande a forte selectivite et polarisation controlee
JP6072022B2 (ja) * 2011-07-01 2017-02-01 トロピグラス テクノロジーズ リミテッド スペクトル選択性パネル
FR2985576B1 (fr) * 2012-01-05 2014-10-17 Ulis Detecteur infrarouge comportant un boitier integrant au moins un reseau de diffraction
DE102017210101A1 (de) * 2017-06-16 2018-12-20 Robert Bosch Gmbh Filtereinrichtung für einen optischen Sensor
EP3546903A3 (fr) 2018-03-09 2020-01-15 Samsung Electronics Co., Ltd. Filtre de lumière et spectromètre le comprenant
CN114167534A (zh) 2020-09-11 2022-03-11 意法半导体有限公司 光学滤波器及其对应的制造方法

Also Published As

Publication number Publication date
FR3114169A1 (fr) 2022-03-18
US12429639B2 (en) 2025-09-30
US20220082743A1 (en) 2022-03-17

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