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FR3111637B1 - Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique - Google Patents

Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique Download PDF

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Publication number
FR3111637B1
FR3111637B1 FR2006364A FR2006364A FR3111637B1 FR 3111637 B1 FR3111637 B1 FR 3111637B1 FR 2006364 A FR2006364 A FR 2006364A FR 2006364 A FR2006364 A FR 2006364A FR 3111637 B1 FR3111637 B1 FR 3111637B1
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France
Prior art keywords
methods
low dielectric
dielectric loss
compositions
forming
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Active
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FR2006364A
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English (en)
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FR3111637A1 (fr
Inventor
Neal Pfeiffenberger
Brendan Mcgrail
Jon Scholte
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Arkema France SA
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Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR2006364A priority Critical patent/FR3111637B1/fr
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to US18/010,477 priority patent/US20230220216A1/en
Priority to IL299079A priority patent/IL299079A/en
Priority to EP21733797.1A priority patent/EP4168461A1/fr
Priority to PCT/EP2021/066396 priority patent/WO2021255161A1/fr
Priority to JP2022577728A priority patent/JP2023532213A/ja
Priority to CN202180057342.5A priority patent/CN116034121B/zh
Priority to TW110122155A priority patent/TWI820435B/zh
Priority to KR1020237001837A priority patent/KR20230027193A/ko
Publication of FR3111637A1 publication Critical patent/FR3111637A1/fr
Application granted granted Critical
Publication of FR3111637B1 publication Critical patent/FR3111637B1/fr
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1818—C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1063—Esters of polycondensation macromers of alcohol terminated polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1065—Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D135/02—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C09D171/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C09D171/12—Polyphenylene oxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/18—Fireproof paints including high temperature resistant paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/42—Housings not intimately mechanically associated with radiating elements, e.g. radome
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/08—Polymers of acrylic acid esters, e.g. PMA, i.e. polymethylacrylate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Details Of Aerials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

L'invention concerne des compositions photodurcissables et des procédés pour produire un matériau diélectrique haute fréquence 3D pour une utilisation en tant qu'isolant dans un circuit tel que, par exemple, un composant RF haute performance tel que, par exemple, une antenne pour une transmission électromagnétique, un filtre, une ligne de transmission, ou une interconnexion haute fréquence. Les structures de circuits haute fréquence ont une perte diélectrique très faible aux fréquences d’exploitation (1 à 60 GHz).
FR2006364A 2020-06-18 2020-06-18 Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique Active FR3111637B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR2006364A FR3111637B1 (fr) 2020-06-18 2020-06-18 Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique
IL299079A IL299079A (en) 2020-06-18 2021-06-17 Compositions and processes of forming 3d printable materials capable of low dielectric loss
EP21733797.1A EP4168461A1 (fr) 2020-06-18 2021-06-17 Compositions et procédés de formation de matériaux imprimables en 3d capables d'une faible perte diélectrique
PCT/EP2021/066396 WO2021255161A1 (fr) 2020-06-18 2021-06-17 Compositions et procédés de formation de matériaux imprimables en 3d capables d'une faible perte diélectrique
US18/010,477 US20230220216A1 (en) 2020-06-18 2021-06-17 Compositions and processes of forming 3d printable materials capable of low dielectric loss
JP2022577728A JP2023532213A (ja) 2020-06-18 2021-06-17 低い誘電損失を可能にする３ｄ印刷可能材料を形成する方法及び組成物
CN202180057342.5A CN116034121B (zh) 2020-06-18 2021-06-17 形成能够实现低介电损耗的可3d打印材料的组合物和方法
TW110122155A TWI820435B (zh) 2020-06-18 2021-06-17 形成能夠具有低介電損失之可3d列印材料的組成物及方法
KR1020237001837A KR20230027193A (ko) 2020-06-18 2021-06-17 낮은 유전 손실이 가능한 3d 인쇄 가능한 재료를 형성하는 조성물 및 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2006364A FR3111637B1 (fr) 2020-06-18 2020-06-18 Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique
FR2006364 2020-06-18

Publications (2)

Publication Number Publication Date
FR3111637A1 FR3111637A1 (fr) 2021-12-24
FR3111637B1 true FR3111637B1 (fr) 2022-09-02

Family

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FR2006364A Active FR3111637B1 (fr) 2020-06-18 2020-06-18 Compositions et procédés de formation de matériaux imprimables 3d capables d’une faible perte diélectrique

Country Status (9)

Country Link
US (1) US20230220216A1 (fr)
EP (1) EP4168461A1 (fr)
JP (1) JP2023532213A (fr)
KR (1) KR20230027193A (fr)
CN (1) CN116034121B (fr)
FR (1) FR3111637B1 (fr)
IL (1) IL299079A (fr)
TW (1) TWI820435B (fr)
WO (1) WO2021255161A1 (fr)

Families Citing this family (4)

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Publication number Priority date Publication date Assignee Title
US12334630B2 (en) 2021-11-09 2025-06-17 Space Exploration Technologies Corp. Radome assembly having nodeless cells
CN114316174B (zh) * 2021-12-29 2023-10-03 重庆交通大学 高分子量线型聚氨酯丙烯酸酯预聚物、介电弹性体及制备
EP4455250A1 (fr) 2023-04-20 2024-10-30 Merck Patent GmbH Procédé de fabrication d'un dispositif haute fréquence, utilisation d'un milieu cristal liquide polymérisable pour la fabrication d'un dispositif haute fréquence et dispositif haute fréquence
TWI893817B (zh) * 2024-05-22 2025-08-11 台光電子材料股份有限公司 樹脂組合物及由其製成的物品

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US6627704B2 (en) * 1999-12-01 2003-09-30 General Electric Company Poly(arylene ether)-containing thermoset composition, method for the preparation thereof, and articles derived therefrom
JP2003119231A (ja) * 2001-10-09 2003-04-23 Mitsubishi Rayon Co Ltd 光ディスク用活性エネルギー線硬化性組成物および光ディスク
EP1500315A1 (fr) * 2002-04-26 2005-01-26 E.I. Du Pont De Nemours And Company Materiau dielectrique a faible perte pour plaquettes de circuits imprimes et mise sous boitier de microcircuits integres
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JP2025522456A (ja) * 2022-06-16 2025-07-15 セラジェニックス・コーポレーション 光硬化性組成物および放射線を対象に送達する方法

Also Published As

Publication number Publication date
TWI820435B (zh) 2023-11-01
IL299079A (en) 2023-02-01
CN116034121B (zh) 2025-09-19
CN116034121A (zh) 2023-04-28
EP4168461A1 (fr) 2023-04-26
KR20230027193A (ko) 2023-02-27
FR3111637A1 (fr) 2021-12-24
TW202212389A (zh) 2022-04-01
US20230220216A1 (en) 2023-07-13
WO2021255161A1 (fr) 2021-12-23
JP2023532213A (ja) 2023-07-27

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