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FR3010414B1 - Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs - Google Patents

Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs

Info

Publication number
FR3010414B1
FR3010414B1 FR1451492A FR1451492A FR3010414B1 FR 3010414 B1 FR3010414 B1 FR 3010414B1 FR 1451492 A FR1451492 A FR 1451492A FR 1451492 A FR1451492 A FR 1451492A FR 3010414 B1 FR3010414 B1 FR 3010414B1
Authority
FR
France
Prior art keywords
films obtained
block copolymer
copolymer composition
thick films
obtaining nano
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1451492A
Other languages
English (en)
Other versions
FR3010414A1 (fr
Inventor
Christophe Navarro
Xavier Chevalier
Celia Nicolet
Ilias Iliopoulos
Raluca Tiron
Guillaume Fleury
Georges Hadziioannou
Christophe Couderc
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Original Assignee
Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR1358628A external-priority patent/FR3010412B1/fr
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to FR1451492A priority Critical patent/FR3010414B1/fr
Priority to CN201480049607.7A priority patent/CN105518089B/zh
Priority to EP14183748.4A priority patent/EP2845888A1/fr
Priority to SG11201601687YA priority patent/SG11201601687YA/en
Priority to PCT/EP2014/068957 priority patent/WO2015032904A1/fr
Priority to US14/481,421 priority patent/US20150073094A1/en
Priority to TW103131002A priority patent/TWI633135B/zh
Priority to TW106131044A priority patent/TW201823321A/zh
Priority to JP2014182834A priority patent/JP6199263B2/ja
Priority to KR20140120316A priority patent/KR20150029599A/ko
Publication of FR3010414A1 publication Critical patent/FR3010414A1/fr
Priority to US14/809,722 priority patent/US20150328661A1/en
Publication of FR3010414B1 publication Critical patent/FR3010414B1/fr
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
    • B05D3/0453—After-treatment
    • B05D3/046—Curing or evaporating the solvent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • C08J2353/02—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers of vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

La présente invention concerne un procédé d'obtention de films nano-structurés obtenus à partir de copolymères à blocs présentant un indice de dispersité compris entre 1,1 et 2, bornes incluses, sans défauts de nano-structuration, sur une surface, pour que cette surface traitée puisse être utilisée en tant que masques pour des applications en microélectronique.
FR1451492A 2013-09-09 2014-02-25 Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs Expired - Fee Related FR3010414B1 (fr)

Priority Applications (11)

Application Number Priority Date Filing Date Title
FR1451492A FR3010414B1 (fr) 2013-09-09 2014-02-25 Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs
CN201480049607.7A CN105518089B (zh) 2013-09-09 2014-09-05 用于制造由嵌段共聚物成分获得的厚的纳米结构化膜的方法
EP14183748.4A EP2845888A1 (fr) 2013-09-09 2014-09-05 Procédé de production de films épais nanostructurés obtenus à partir d'une composition de copolymère bloc
SG11201601687YA SG11201601687YA (en) 2013-09-09 2014-09-05 Process for producing thick nanostructured films obtained from a block copolymer composition
PCT/EP2014/068957 WO2015032904A1 (fr) 2013-09-09 2014-09-05 Procédé de fabrication de films nanostructurés épais obtenus à partir d'une composition de copolymères à blocs
TW103131002A TWI633135B (zh) 2013-09-09 2014-09-09 由嵌段共聚物組成物製備厚奈米結構化膜之方法
US14/481,421 US20150073094A1 (en) 2013-09-09 2014-09-09 Process for producing thick nanostructured films obtained from a block copolymer composition
TW106131044A TW201823321A (zh) 2013-09-09 2014-09-09 由嵌段共聚物組成物製備厚奈米結構化膜之方法
JP2014182834A JP6199263B2 (ja) 2013-09-09 2014-09-09 ブロックコポリマー組成物から得られる厚いナノ構造フィルムを製造するための方法
KR20140120316A KR20150029599A (ko) 2013-09-09 2014-09-11 블록 공중합체 조성물에서 수득한 후층 나노구조 필름의 제조 방법
US14/809,722 US20150328661A1 (en) 2013-09-09 2015-07-27 Process for producing thick nanostructured films obtained from a block copolymer composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1358628A FR3010412B1 (fr) 2013-09-09 2013-09-09 Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs
FR1451492A FR3010414B1 (fr) 2013-09-09 2014-02-25 Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs

Publications (2)

Publication Number Publication Date
FR3010414A1 FR3010414A1 (fr) 2015-03-13
FR3010414B1 true FR3010414B1 (fr) 2015-09-25

Family

ID=51483348

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1451492A Expired - Fee Related FR3010414B1 (fr) 2013-09-09 2014-02-25 Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs

Country Status (9)

Country Link
US (2) US20150073094A1 (fr)
EP (1) EP2845888A1 (fr)
JP (1) JP6199263B2 (fr)
KR (1) KR20150029599A (fr)
CN (1) CN105518089B (fr)
FR (1) FR3010414B1 (fr)
SG (1) SG11201601687YA (fr)
TW (2) TWI633135B (fr)
WO (1) WO2015032904A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119220676A (zh) 2014-06-12 2024-12-31 东丽株式会社 前列腺癌的检测试剂盒或装置以及检测方法
FR3032712A1 (fr) * 2015-02-18 2016-08-19 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3032714A1 (fr) * 2015-02-18 2016-08-19 Arkema France Procede de reduction du temps d'assemblage des films ordonnes de copolymeres a blocs
FR3032713A1 (fr) * 2015-02-18 2016-08-19 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3042794B1 (fr) * 2015-10-23 2020-03-27 Arkema France Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres di-blocs
JP2018154760A (ja) * 2017-03-17 2018-10-04 東芝メモリ株式会社 パターン形成材料及びパターン形成方法
FR3075800B1 (fr) * 2017-12-21 2020-10-09 Arkema France Couches anti adhesives pour les procedes d'impression par transfert

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FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
CN101375162A (zh) * 2006-01-27 2009-02-25 阿科玛法国公司 高光学纯度共聚物膜
EP2019120B1 (fr) * 2006-05-16 2016-04-13 Nippon Soda Co., Ltd. Copolymères séquencés
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JP2008231233A (ja) * 2007-03-20 2008-10-02 Kyoto Univ 高分子薄膜、パターン基板、磁気記録用パターン媒体及びこれらの製造方法
US7732533B2 (en) * 2007-08-31 2010-06-08 Micron Technology, Inc. Zwitterionic block copolymers and methods
JP5281386B2 (ja) * 2008-12-22 2013-09-04 株式会社日立製作所 高分子薄膜及びパターン媒体並びにこれらの製造方法
FR2974094A1 (fr) * 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
FR2974072B1 (fr) 2011-04-15 2014-06-13 Oreal Dispositif de stockage et de distribution de produits a plusieurs compartiments
WO2013036555A1 (fr) * 2011-09-06 2013-03-14 Cornell University Copolymères séquencés et procédé de formation de motifs lithographiques les utilisant
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JP5752655B2 (ja) * 2012-09-10 2015-07-22 株式会社東芝 パターン形成方法
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US8859433B2 (en) * 2013-03-11 2014-10-14 International Business Machines Corporation DSA grapho-epitaxy process with etch stop material

Also Published As

Publication number Publication date
CN105518089A (zh) 2016-04-20
WO2015032904A1 (fr) 2015-03-12
EP2845888A1 (fr) 2015-03-11
JP2015071756A (ja) 2015-04-16
US20150328661A1 (en) 2015-11-19
TW201823321A (zh) 2018-07-01
US20150073094A1 (en) 2015-03-12
CN105518089B (zh) 2020-11-10
TWI633135B (zh) 2018-08-21
KR20150029599A (ko) 2015-03-18
TW201520247A (zh) 2015-06-01
FR3010414A1 (fr) 2015-03-13
SG11201601687YA (en) 2016-04-28
JP6199263B2 (ja) 2017-09-20

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