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FR3005371B1 - Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii - Google Patents

Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii

Info

Publication number
FR3005371B1
FR3005371B1 FR1354112A FR1354112A FR3005371B1 FR 3005371 B1 FR3005371 B1 FR 3005371B1 FR 1354112 A FR1354112 A FR 1354112A FR 1354112 A FR1354112 A FR 1354112A FR 3005371 B1 FR3005371 B1 FR 3005371B1
Authority
FR
France
Prior art keywords
iii
chalcogenisation
formation
semiconductor layer
thermal treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1354112A
Other languages
English (en)
Other versions
FR3005371A1 (fr
Inventor
Cedric Broussillou
Sylvie Bodnar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Electricite de France SA
Original Assignee
Nexcis SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nexcis SAS filed Critical Nexcis SAS
Priority to FR1354112A priority Critical patent/FR3005371B1/fr
Priority to CN201480036695.7A priority patent/CN105531803B/zh
Priority to EP14727872.5A priority patent/EP2992549A1/fr
Priority to PCT/FR2014/051030 priority patent/WO2014177809A1/fr
Priority to JP2016511119A priority patent/JP6467581B2/ja
Priority to US14/888,786 priority patent/US20160079454A1/en
Publication of FR3005371A1 publication Critical patent/FR3005371A1/fr
Application granted granted Critical
Publication of FR3005371B1 publication Critical patent/FR3005371B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/10—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated heated by hot air or gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02614—Transformation of metal, e.g. oxidation, nitridation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
    • F27D2007/063—Special atmospheres, e.g. high pressure atmospheres
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F27D2019/0093—Maintaining a temperature gradient
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Photovoltaic Devices (AREA)
  • Recrystallisation Techniques (AREA)
  • Crystallography & Structural Chemistry (AREA)
FR1354112A 2013-05-03 2013-05-03 Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii Active FR3005371B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1354112A FR3005371B1 (fr) 2013-05-03 2013-05-03 Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii
CN201480036695.7A CN105531803B (zh) 2013-05-03 2014-04-30 通过热处理和硫族化i-iii前导层形成i-iii-vi2半导体层
EP14727872.5A EP2992549A1 (fr) 2013-05-03 2014-04-30 Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii
PCT/FR2014/051030 WO2014177809A1 (fr) 2013-05-03 2014-04-30 Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii
JP2016511119A JP6467581B2 (ja) 2013-05-03 2014-04-30 Ｉ−ｉｉｉ金属前駆体の熱処理およびカルコゲン化によるｉ−ｉｉｉ−ｖｉ２半導体層の形成
US14/888,786 US20160079454A1 (en) 2013-05-03 2014-04-30 Formation of a i-iii-vi2 semiconductor layer by heat treatment and chalcogenization of an i-iii metallic precursor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1354112A FR3005371B1 (fr) 2013-05-03 2013-05-03 Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii

Publications (2)

Publication Number Publication Date
FR3005371A1 FR3005371A1 (fr) 2014-11-07
FR3005371B1 true FR3005371B1 (fr) 2015-05-29

Family

ID=48746027

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1354112A Active FR3005371B1 (fr) 2013-05-03 2013-05-03 Formation d'une couche semi-conductrice i-iii-vi2 par traitement thermique et chalcogenisation d'un precurseur metallique i-iii

Country Status (6)

Country Link
US (1) US20160079454A1 (fr)
EP (1) EP2992549A1 (fr)
JP (1) JP6467581B2 (fr)
CN (1) CN105531803B (fr)
FR (1) FR3005371B1 (fr)
WO (1) WO2014177809A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6586238B2 (ja) * 2016-01-13 2019-10-02 メカロ カンパニー リミテッドＭｅｃａｒｏ Ｃｏ．，Ｌｔｄ． Ｃｉｇｓ光吸収層を含む太陽電池及びその製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11135811A (ja) * 1997-10-28 1999-05-21 Yazaki Corp Ｃｉｓ系太陽電池モジュール及びその製造方法
US7700464B2 (en) * 2004-02-19 2010-04-20 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from nanoflake particles
US20070111367A1 (en) * 2005-10-19 2007-05-17 Basol Bulent M Method and apparatus for converting precursor layers into photovoltaic absorbers
US20090215224A1 (en) * 2008-02-21 2009-08-27 Film Solar Tech Inc. Coating methods and apparatus for making a cigs solar cell
US8008198B1 (en) * 2008-09-30 2011-08-30 Stion Corporation Large scale method and furnace system for selenization of thin film photovoltaic materials
CN102498576A (zh) * 2009-02-15 2012-06-13 纳米太阳能公司 由平衡前体形成的太阳能电池吸收层
EP2221876A1 (fr) * 2009-02-24 2010-08-25 General Electric Company Couche absorbante pour cellules photovoltaïques à film mince et cellule solaire fabriquée à partir de celle-ci
TW201042065A (en) * 2009-05-22 2010-12-01 Ind Tech Res Inst Methods for fabricating copper indium gallium diselenide (CIGS) compound thin films
WO2011028957A2 (fr) * 2009-09-02 2011-03-10 Brent Bollman Procédés et dispositifs pour le traitement d'une couche de précurseur dans un environnement de groupe via
US8889469B2 (en) * 2009-12-28 2014-11-18 Aeris Capital Sustainable Ip Ltd. Multi-nary group IB and VIA based semiconductor
US20110284134A1 (en) * 2010-05-20 2011-11-24 Nichols Beth M Chalcogenide-based materials and methods of making such materials under vacuum using post-chalcogenization techniques
WO2012107256A1 (fr) * 2011-02-10 2012-08-16 Empa Processus de production de pellicules au chalcogénure absorbant la lumière

Also Published As

Publication number Publication date
CN105531803A (zh) 2016-04-27
JP2016524319A (ja) 2016-08-12
CN105531803B (zh) 2018-11-27
JP6467581B2 (ja) 2019-02-13
US20160079454A1 (en) 2016-03-17
WO2014177809A1 (fr) 2014-11-06
EP2992549A1 (fr) 2016-03-09
FR3005371A1 (fr) 2014-11-07

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