[go: up one dir, main page]

FR3083229B1 - Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux - Google Patents

Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux Download PDF

Info

Publication number
FR3083229B1
FR3083229B1 FR1855809A FR1855809A FR3083229B1 FR 3083229 B1 FR3083229 B1 FR 3083229B1 FR 1855809 A FR1855809 A FR 1855809A FR 1855809 A FR1855809 A FR 1855809A FR 3083229 B1 FR3083229 B1 FR 3083229B1
Authority
FR
France
Prior art keywords
substrates
stack
densification
gaseous phase
porous annular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1855809A
Other languages
English (en)
Other versions
FR3083229A1 (fr
Inventor
Stephane Goujard
Jean-Francois Potin
Franck Lamouroux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Ceramics SA
Original Assignee
Safran Ceramics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Safran Ceramics SA filed Critical Safran Ceramics SA
Priority to FR1855809A priority Critical patent/FR3083229B1/fr
Priority to PCT/FR2019/051584 priority patent/WO2020002841A1/fr
Publication of FR3083229A1 publication Critical patent/FR3083229A1/fr
Application granted granted Critical
Publication of FR3083229B1 publication Critical patent/FR3083229B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502Flow conditions in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/60Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
    • C04B2235/614Gas infiltration of green bodies or pre-forms
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/9607Thermal properties, e.g. thermal expansion coefficient
    • C04B2235/9623Ceramic setters properties
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16DCOUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
    • F16D2250/00Manufacturing; Assembly
    • F16D2250/0092Tools or machines for producing linings
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16DCOUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
    • F16D65/00Parts or details
    • F16D65/02Braking members; Mounting thereof
    • F16D65/12Discs; Drums for disc brakes
    • F16D65/125Discs; Drums for disc brakes characterised by the material used for the disc body

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un procédé de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux (20) présentant un passage central, les substrats étant disposés dans une enceinte (10) délimitée par une paroi chauffée (10a) et agencés en au moins une première et une deuxième pile de substrats, chaque pile de substrats définissant un volume interne (21) formé par les passages centraux des substrats empilés, la première pile étant plus proche de la paroi que la deuxième pile, le procédé comprenant au moins une étape d'injection dans le volume interne de chaque pile de substrats d'une phase gazeuse comprenant un précurseur gazeux d'un matériau de matrice à déposer au sein de la porosité des substrats, et la quantité de matière de précurseur gazeux injectée par unité de temps dans la deuxième pile est supérieure à la quantité de matière de précurseur gazeux injectée par unité de temps dans la première pile.
FR1855809A 2018-06-27 2018-06-27 Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux Active FR3083229B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR1855809A FR3083229B1 (fr) 2018-06-27 2018-06-27 Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
PCT/FR2019/051584 WO2020002841A1 (fr) 2018-06-27 2019-06-27 Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1855809 2018-06-27
FR1855809A FR3083229B1 (fr) 2018-06-27 2018-06-27 Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux

Publications (2)

Publication Number Publication Date
FR3083229A1 FR3083229A1 (fr) 2020-01-03
FR3083229B1 true FR3083229B1 (fr) 2020-09-11

Family

ID=63896305

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1855809A Active FR3083229B1 (fr) 2018-06-27 2018-06-27 Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux

Country Status (2)

Country Link
FR (1) FR3083229B1 (fr)
WO (1) WO2020002841A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3132717B1 (fr) * 2022-02-16 2024-02-16 Safran Landing Systems Outillage des plateaux multipiles pour un flux semi-forcé

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2125058T3 (es) * 1994-11-16 1999-02-16 Goodrich Co B F Producto, procedimiento y aparato de infiltracion/deposito quimico en fase vapor con gradiente de presion.
FR2733254B1 (fr) * 1995-04-18 1997-07-18 Europ Propulsion Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires
US7476419B2 (en) * 1998-10-23 2009-01-13 Goodrich Corporation Method for measurement of weight during a CVI/CVD process
FR2821859B1 (fr) 2001-03-06 2004-05-14 Snecma Moteurs Procede pour la densification par infiltration chimique en phase vapeur de substrats poreux ayant un passage central
FR2834713B1 (fr) 2002-01-15 2004-04-02 Snecma Moteurs Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur

Also Published As

Publication number Publication date
FR3083229A1 (fr) 2020-01-03
WO2020002841A1 (fr) 2020-01-02

Similar Documents

Publication Publication Date Title
US20070117383A1 (en) Precursor material delivery system with staging volume for atomic layer deposition
US20220406625A1 (en) Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
RU2167217C2 (ru) Способ химической инфильтрации в паровой фазе для уплотнения пористых субстратов, расположенных кольцеобразно штабелями
EP0832863B1 (fr) Produit, procédé et appareil d'infiltration/dépôt chimique en phase vapeur à gradient de pression
JP4960264B2 (ja) 化学蒸気浸透により薄い多孔質基体を高密度化する方法、及び当該基体のローディング装置
US20150152553A1 (en) ALD Coating System
US11512024B2 (en) Method for densifying porous annular substrates by chemical vapour infiltration
FR3083229B1 (fr) Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
JP2010509573A5 (fr)
Riha et al. Design and implementation of an integral wall-mounted quartz crystal microbalance for atomic layer deposition
Muneshwar et al. AxBAxB… pulsed atomic layer deposition: Numerical growth model and experiments
TW201040311A (en) Atomic layer deposition apparatus
JP2022531053A (ja) シーリングされた炉
CN101328577A (zh) 一种化学气相沉积制备飞机碳刹车盘的方法
CN102433547A (zh) 成膜装置和成膜方法
IE811017L (en) Chemical vapor deposition of films on silicon wafers
CN104105815A (zh) 用于沉积碳膜的设备以及用于沉积碳膜的方法
WO2023093455A1 (fr) Mécanisme de distribution d'admission et dispositif de réaction cvd le comprenant
FR3114588B1 (fr) Procédé de fabrication d’une barrière environnementale
US20240247372A1 (en) Sublimation gas supply system and sublimation gas supply method with buffer tank
FR3084672B1 (fr) Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
US12024774B2 (en) Apparatus for supplying gas and apparatus for processing substrate using the same
Choo et al. Simulation‐based design and experimental evaluation of a spatially controllable CVD reactor
KR20160110586A (ko) 기판처리장치의 가스공급 제어방법
Rybáčková et al. Computational study of productive and non-productive cycles in fluoroalkene metathesis

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20200103

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6

PLFP Fee payment

Year of fee payment: 7

PLFP Fee payment

Year of fee payment: 8