FR3058161B1 - Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement - Google Patents
Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement Download PDFInfo
- Publication number
- FR3058161B1 FR3058161B1 FR1660427A FR1660427A FR3058161B1 FR 3058161 B1 FR3058161 B1 FR 3058161B1 FR 1660427 A FR1660427 A FR 1660427A FR 1660427 A FR1660427 A FR 1660427A FR 3058161 B1 FR3058161 B1 FR 3058161B1
- Authority
- FR
- France
- Prior art keywords
- surface treatment
- controlled atmosphere
- moving substrate
- treatment installation
- sizing method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000009434 installation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 238000004381 surface treatment Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45593—Recirculation of reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32834—Exhausting
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1660427A FR3058161B1 (fr) | 2016-10-27 | 2016-10-27 | Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement |
| KR1020197014455A KR102441291B1 (ko) | 2016-10-27 | 2017-10-16 | 제어된 분위기에서 이동하는 기판의 표면을 처리하는 설비 및 그의 크기를 규정하는 방법 |
| JP2019523775A JP7014790B2 (ja) | 2016-10-27 | 2017-10-16 | 制御雰囲気において移動する基板の表面を処理するための設備およびそのサイズを画定するための方法 |
| BR112019008332-4A BR112019008332B1 (pt) | 2016-10-27 | 2017-10-16 | Instalação de tratamento de superfície de um substrato móvel em uma atmosfera controlada e método para definição da dimensão da mesma |
| CN201780066726.7A CN109923240B (zh) | 2016-10-27 | 2017-10-16 | 在受控气氛中处理移动基材的表面的设备及其尺寸的限定方法 |
| PCT/FR2017/052827 WO2018078237A1 (fr) | 2016-10-27 | 2017-10-16 | Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement |
| EP17792127.7A EP3532652B1 (fr) | 2016-10-27 | 2017-10-16 | Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement |
| US16/344,303 US12125681B2 (en) | 2016-10-27 | 2017-10-27 | Facility for treating the surface of a moving substrate in a controlled atmosphere, and method for defining the size thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1660427 | 2016-10-27 | ||
| FR1660427A FR3058161B1 (fr) | 2016-10-27 | 2016-10-27 | Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR3058161A1 FR3058161A1 (fr) | 2018-05-04 |
| FR3058161B1 true FR3058161B1 (fr) | 2018-11-16 |
Family
ID=57681637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1660427A Expired - Fee Related FR3058161B1 (fr) | 2016-10-27 | 2016-10-27 | Installation de traitement de surface d'un substrat en mouvement sous atmosphere controlee, et son procede de dimensionnement |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR3058161B1 (fr) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5486249B2 (ja) * | 2009-09-11 | 2014-05-07 | 富士フイルム株式会社 | 成膜方法 |
| EP2762608B1 (fr) * | 2013-01-31 | 2019-10-02 | Applied Materials, Inc. | Séparation de gaz par une paroi de séparation réglable |
| FR3035122B1 (fr) * | 2015-04-20 | 2017-04-28 | Coating Plasma Ind | Procede de traitement de surface d'un film en mouvement et installation pour la mise en oeuvre de ce procede |
-
2016
- 2016-10-27 FR FR1660427A patent/FR3058161B1/fr not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| FR3058161A1 (fr) | 2018-05-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PLFP | Fee payment |
Year of fee payment: 2 |
|
| PLSC | Publication of the preliminary search report |
Effective date: 20180504 |
|
| PLFP | Fee payment |
Year of fee payment: 3 |
|
| CA | Change of address |
Effective date: 20180927 |
|
| CD | Change of name or company name |
Owner name: COATING PLASMA INNOVATION, FR Effective date: 20180927 |
|
| PLFP | Fee payment |
Year of fee payment: 4 |
|
| PLFP | Fee payment |
Year of fee payment: 5 |
|
| PLFP | Fee payment |
Year of fee payment: 6 |
|
| ST | Notification of lapse |
Effective date: 20230606 |