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FR2912397B1 - Installation d'affinage de silicium. - Google Patents

Installation d'affinage de silicium.

Info

Publication number
FR2912397B1
FR2912397B1 FR0753256A FR0753256A FR2912397B1 FR 2912397 B1 FR2912397 B1 FR 2912397B1 FR 0753256 A FR0753256 A FR 0753256A FR 0753256 A FR0753256 A FR 0753256A FR 2912397 B1 FR2912397 B1 FR 2912397B1
Authority
FR
France
Prior art keywords
facility
silicon refining
refining
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0753256A
Other languages
English (en)
Other versions
FR2912397A1 (fr
Inventor
Christophe Lafon
Roger Boen
Lionel Bruguiere
Christophe Girold
Florent Lemort
Armand Bonnetier
Pascal Rivat
Gobbo Jean Pierre Del
Daniel Delage
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EFD Induction SAS
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
EFD Induction SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0753256A priority Critical patent/FR2912397B1/fr
Application filed by Commissariat a lEnergie Atomique CEA, EFD Induction SAS filed Critical Commissariat a lEnergie Atomique CEA
Priority to CN2008800050944A priority patent/CN101646621B/zh
Priority to PCT/FR2008/050220 priority patent/WO2008104702A2/fr
Priority to EP08762072A priority patent/EP2118005A2/fr
Priority to JP2009549842A priority patent/JP5415285B2/ja
Priority to US12/527,036 priority patent/US20130133373A1/en
Priority to AU2008220638A priority patent/AU2008220638B2/en
Publication of FR2912397A1 publication Critical patent/FR2912397A1/fr
Application granted granted Critical
Publication of FR2912397B1 publication Critical patent/FR2912397B1/fr
Priority to ZA2009/06337A priority patent/ZA200906337B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225—Refining
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
    • C03B5/021—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by induction heating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/06—Crucible or pot furnaces heated electrically, e.g. induction crucible furnaces with or without any other source of heat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details specially adapted for crucible or pot furnaces
    • F27B14/10—Crucibles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/121—The active layers comprising only Group IV materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
FR0753256A 2007-02-14 2007-02-14 Installation d'affinage de silicium. Expired - Fee Related FR2912397B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR0753256A FR2912397B1 (fr) 2007-02-14 2007-02-14 Installation d'affinage de silicium.
PCT/FR2008/050220 WO2008104702A2 (fr) 2007-02-14 2008-02-12 Installation d'affinage de silicium
EP08762072A EP2118005A2 (fr) 2007-02-14 2008-02-12 Installation d'affinage de silicium
JP2009549842A JP5415285B2 (ja) 2007-02-14 2008-02-12 シリコン精製装置
CN2008800050944A CN101646621B (zh) 2007-02-14 2008-02-12 硅提纯设备
US12/527,036 US20130133373A1 (en) 2007-02-14 2008-02-12 Silicon refining equipment
AU2008220638A AU2008220638B2 (en) 2007-02-14 2008-02-12 Silicon refining equipment
ZA2009/06337A ZA200906337B (en) 2007-02-14 2009-09-11 Silicon refining equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0753256A FR2912397B1 (fr) 2007-02-14 2007-02-14 Installation d'affinage de silicium.

Publications (2)

Publication Number Publication Date
FR2912397A1 FR2912397A1 (fr) 2008-08-15
FR2912397B1 true FR2912397B1 (fr) 2009-05-08

Family

ID=38543853

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0753256A Expired - Fee Related FR2912397B1 (fr) 2007-02-14 2007-02-14 Installation d'affinage de silicium.

Country Status (8)

Country Link
US (1) US20130133373A1 (fr)
EP (1) EP2118005A2 (fr)
JP (1) JP5415285B2 (fr)
CN (1) CN101646621B (fr)
AU (1) AU2008220638B2 (fr)
FR (1) FR2912397B1 (fr)
WO (1) WO2008104702A2 (fr)
ZA (1) ZA200906337B (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2981740B1 (fr) * 2011-10-20 2018-03-23 Francewafer Installation de purification d'un materiau
CN105276980B (zh) * 2014-05-28 2017-11-03 国核华清（北京）核电技术研发中心有限公司 陶瓷坩埚
US10069535B2 (en) 2016-12-08 2018-09-04 At&T Intellectual Property I, L.P. Apparatus and methods for launching electromagnetic waves having a certain electric field structure
US11912608B2 (en) 2019-10-01 2024-02-27 Owens-Brockway Glass Container Inc. Glass manufacturing

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2009459A1 (de) * 1970-02-28 1971-09-09 Consortium Elektrochem Ind Verfahren zur Herstellung von Sihciumformkorpern
DE3732073A1 (de) * 1987-09-23 1989-04-06 Siemens Ag Hochreine innenauskleidung fuer einen elektroniederschachtofen
JP3205352B2 (ja) * 1990-05-30 2001-09-04 川崎製鉄株式会社 シリコン精製方法及び装置
JPH09142823A (ja) * 1995-11-29 1997-06-03 Kawasaki Steel Corp 金属シリコンの精製方法および精製装置
FR2751738B1 (fr) * 1996-07-25 1998-08-28 Commissariat Energie Atomique Four de fusion par induction directe en creuset froid
JPH10182133A (ja) * 1996-12-26 1998-07-07 Kawasaki Steel Corp シリコン精製方法
DE19962449C2 (de) * 1999-12-22 2003-09-25 Heraeus Quarzglas Quarzglastiegel und Verfahren für seine Herstellung
FR2871151B1 (fr) * 2004-06-07 2006-08-11 Centre Nat Rech Scient Cnrse Installation d'affinage de silicium

Also Published As

Publication number Publication date
JP5415285B2 (ja) 2014-02-12
ZA200906337B (en) 2010-11-24
US20130133373A1 (en) 2013-05-30
AU2008220638A1 (en) 2008-09-04
FR2912397A1 (fr) 2008-08-15
WO2008104702A2 (fr) 2008-09-04
AU2008220638B2 (en) 2012-10-25
CN101646621B (zh) 2013-11-06
WO2008104702A3 (fr) 2008-11-06
JP2010517924A (ja) 2010-05-27
EP2118005A2 (fr) 2009-11-18
CN101646621A (zh) 2010-02-10

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Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 9

ST Notification of lapse

Effective date: 20161028