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FR2971369B1 - Procede de fabrication d'une monocouche autoassemblee d'injection - Google Patents

Procede de fabrication d'une monocouche autoassemblee d'injection

Info

Publication number
FR2971369B1
FR2971369B1 FR1100349A FR1100349A FR2971369B1 FR 2971369 B1 FR2971369 B1 FR 2971369B1 FR 1100349 A FR1100349 A FR 1100349A FR 1100349 A FR1100349 A FR 1100349A FR 2971369 B1 FR2971369 B1 FR 2971369B1
Authority
FR
France
Prior art keywords
manufacturing
sam
monolayer
self
assembled injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1100349A
Other languages
English (en)
Other versions
FR2971369A1 (fr
Inventor
Mohammed Benwadih
Jamal Tallal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR1100349A priority Critical patent/FR2971369B1/fr
Priority to EP12704322.2A priority patent/EP2671268A1/fr
Priority to US13/983,159 priority patent/US9459526B2/en
Priority to JP2013552311A priority patent/JP6018584B2/ja
Priority to PCT/IB2012/050491 priority patent/WO2012104809A1/fr
Priority to KR1020137023344A priority patent/KR101946287B1/ko
Publication of FR2971369A1 publication Critical patent/FR2971369A1/fr
Application granted granted Critical
Publication of FR2971369B1 publication Critical patent/FR2971369B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thin Film Transistor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Fuel-Injection Apparatus (AREA)
  • Micromachines (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
FR1100349A 2011-02-04 2011-02-04 Procede de fabrication d'une monocouche autoassemblee d'injection Expired - Fee Related FR2971369B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1100349A FR2971369B1 (fr) 2011-02-04 2011-02-04 Procede de fabrication d'une monocouche autoassemblee d'injection
EP12704322.2A EP2671268A1 (fr) 2011-02-04 2012-02-02 Procede de fabrication d'une monocouche autoassemblee d'injection
US13/983,159 US9459526B2 (en) 2011-02-04 2012-02-02 Process for manufacturing a self-assembled injection monolayer
JP2013552311A JP6018584B2 (ja) 2011-02-04 2012-02-02 注入自己組織化単分子層を製造するための方法
PCT/IB2012/050491 WO2012104809A1 (fr) 2011-02-04 2012-02-02 Procede de fabrication d'une monocouche autoassemblee d'injection
KR1020137023344A KR101946287B1 (ko) 2011-02-04 2012-02-02 자기조립 주입 단분자막의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1100349A FR2971369B1 (fr) 2011-02-04 2011-02-04 Procede de fabrication d'une monocouche autoassemblee d'injection

Publications (2)

Publication Number Publication Date
FR2971369A1 FR2971369A1 (fr) 2012-08-10
FR2971369B1 true FR2971369B1 (fr) 2013-03-08

Family

ID=45607796

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1100349A Expired - Fee Related FR2971369B1 (fr) 2011-02-04 2011-02-04 Procede de fabrication d'une monocouche autoassemblee d'injection

Country Status (6)

Country Link
US (1) US9459526B2 (fr)
EP (1) EP2671268A1 (fr)
JP (1) JP6018584B2 (fr)
KR (1) KR101946287B1 (fr)
FR (1) FR2971369B1 (fr)
WO (1) WO2012104809A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10273577B2 (en) 2015-11-16 2019-04-30 Applied Materials, Inc. Low vapor pressure aerosol-assisted CVD
US10163629B2 (en) 2015-11-16 2018-12-25 Applied Materials, Inc. Low vapor pressure aerosol-assisted CVD
US9859128B2 (en) 2015-11-20 2018-01-02 Applied Materials, Inc. Self-aligned shielding of silicon oxide
US9875907B2 (en) 2015-11-20 2018-01-23 Applied Materials, Inc. Self-aligned shielding of silicon oxide
US10074559B1 (en) 2017-03-07 2018-09-11 Applied Materials, Inc. Selective poreseal deposition prevention and residue removal using SAM
KR102091427B1 (ko) * 2018-10-08 2020-04-23 한밭대학교 산학협력단 유기반도체의 전하 주입과 추출 향상을 위한 비대칭 유기반도체층과 전극의 결합 구조와 그 유기전자소자 제조방법
KR102434781B1 (ko) * 2020-11-30 2022-08-22 한국과학기술원 초박형 하이드로젤 스킨 3d 플라즈모닉 복합 구조체

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3032931C2 (de) * 1980-09-02 1982-07-29 Robert Bürkle GmbH & Co, 7290 Freudenstadt Verfahren und Anordnung zur Herstellung von Mehrschicht-Leiterplatten
GB0309355D0 (en) * 2003-04-24 2003-06-04 Univ Cambridge Tech Organic electronic devices incorporating semiconducting polymer
JP2005135975A (ja) * 2003-10-28 2005-05-26 Seiko Epson Corp 電極の形成方法、並びに圧電体デバイス、強誘電体デバイス、及び電子機器
WO2006049976A2 (fr) * 2004-10-28 2006-05-11 University Of Iowa Research Foundation Procedes de generation, dans des conditions moderees, de surfaces au silicium façonnees
GB0701909D0 (en) * 2007-01-31 2007-03-14 Imp Innovations Ltd Deposition Of Organic Layers
JP5407242B2 (ja) * 2007-09-28 2014-02-05 大日本印刷株式会社 エレクトロルミネッセンス素子
JP5543367B2 (ja) * 2007-12-19 2014-07-09 スリーエム イノベイティブ プロパティズ カンパニー マイクロコンタクトプリンティング用のインク溶液
JP2009218295A (ja) * 2008-03-07 2009-09-24 Ricoh Co Ltd 薄膜トランジスタ、その製造方法、アクティブマトリクス型薄膜トランジスタアレイ及びアクティブマトリクス駆動表示装置
JP2010080467A (ja) * 2008-09-24 2010-04-08 Ricoh Co Ltd 薄膜トランジスタ、薄膜トランジスタの製造方法、アクティブマトリクス型薄膜トランジスタアレイ、及びアクティブマトリクス駆動表示装置
JP5481893B2 (ja) * 2009-03-18 2014-04-23 株式会社リコー 有機トランジスタアクティブ基板、有機トランジスタアクティブ基板の製造方法および有機トランジスタアクティブ基板を用いた電気泳動ディスプレイ

Also Published As

Publication number Publication date
WO2012104809A1 (fr) 2012-08-09
US9459526B2 (en) 2016-10-04
JP6018584B2 (ja) 2016-11-02
FR2971369A1 (fr) 2012-08-10
EP2671268A1 (fr) 2013-12-11
KR20140026374A (ko) 2014-03-05
US20130316541A1 (en) 2013-11-28
JP2014511022A (ja) 2014-05-01
KR101946287B1 (ko) 2019-02-11

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