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FR2739975B1 - METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER - Google Patents

METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER

Info

Publication number
FR2739975B1
FR2739975B1 FR9512312A FR9512312A FR2739975B1 FR 2739975 B1 FR2739975 B1 FR 2739975B1 FR 9512312 A FR9512312 A FR 9512312A FR 9512312 A FR9512312 A FR 9512312A FR 2739975 B1 FR2739975 B1 FR 2739975B1
Authority
FR
France
Prior art keywords
silicon wafer
manufacturing components
manufacturing
components
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9512312A
Other languages
French (fr)
Other versions
FR2739975A1 (en
Inventor
Philippe Gayet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
STMicroelectronics lnc USA
Original Assignee
SGS Thomson Microelectronics SA
SGS Thomson Microelectronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SGS Thomson Microelectronics SA, SGS Thomson Microelectronics Inc filed Critical SGS Thomson Microelectronics SA
Priority to FR9512312A priority Critical patent/FR2739975B1/en
Publication of FR2739975A1 publication Critical patent/FR2739975A1/en
Application granted granted Critical
Publication of FR2739975B1 publication Critical patent/FR2739975B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/5442Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54426Marks applied to semiconductor devices or parts for alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54453Marks applied to semiconductor devices or parts for use prior to dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
FR9512312A 1995-10-16 1995-10-16 METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER Expired - Fee Related FR2739975B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9512312A FR2739975B1 (en) 1995-10-16 1995-10-16 METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9512312A FR2739975B1 (en) 1995-10-16 1995-10-16 METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER

Publications (2)

Publication Number Publication Date
FR2739975A1 FR2739975A1 (en) 1997-04-18
FR2739975B1 true FR2739975B1 (en) 1998-03-06

Family

ID=9483712

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9512312A Expired - Fee Related FR2739975B1 (en) 1995-10-16 1995-10-16 METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER

Country Status (1)

Country Link
FR (1) FR2739975B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10342776B4 (en) * 2003-09-16 2008-09-04 Qimonda Ag Method for determining correction values for the adjustment of a semiconductor wafer in a projection apparatus for the photolithographic structuring of a metal layer
CN102315141B (en) * 2010-07-07 2013-06-12 北大方正集团有限公司 Photoetching registration mark protective device and metal sputtering technological method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5169491A (en) * 1991-07-29 1992-12-08 Micron Technology, Inc. Method of etching SiO2 dielectric layers using chemical mechanical polishing techniques
US5451261A (en) * 1992-09-11 1995-09-19 Matsushita Electric Industrial Co., Ltd. Metal film deposition apparatus and metal film deposition method
JPH07161600A (en) * 1993-12-02 1995-06-23 Sony Corp Position measurement method

Also Published As

Publication number Publication date
FR2739975A1 (en) 1997-04-18

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Legal Events

Date Code Title Description
ST Notification of lapse