FR2739975B1 - METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER - Google Patents
METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFERInfo
- Publication number
- FR2739975B1 FR2739975B1 FR9512312A FR9512312A FR2739975B1 FR 2739975 B1 FR2739975 B1 FR 2739975B1 FR 9512312 A FR9512312 A FR 9512312A FR 9512312 A FR9512312 A FR 9512312A FR 2739975 B1 FR2739975 B1 FR 2739975B1
- Authority
- FR
- France
- Prior art keywords
- silicon wafer
- manufacturing components
- manufacturing
- components
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/5442—Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9512312A FR2739975B1 (en) | 1995-10-16 | 1995-10-16 | METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9512312A FR2739975B1 (en) | 1995-10-16 | 1995-10-16 | METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2739975A1 FR2739975A1 (en) | 1997-04-18 |
| FR2739975B1 true FR2739975B1 (en) | 1998-03-06 |
Family
ID=9483712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR9512312A Expired - Fee Related FR2739975B1 (en) | 1995-10-16 | 1995-10-16 | METHOD FOR MANUFACTURING COMPONENTS ON A SILICON WAFER |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2739975B1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10342776B4 (en) * | 2003-09-16 | 2008-09-04 | Qimonda Ag | Method for determining correction values for the adjustment of a semiconductor wafer in a projection apparatus for the photolithographic structuring of a metal layer |
| CN102315141B (en) * | 2010-07-07 | 2013-06-12 | 北大方正集团有限公司 | Photoetching registration mark protective device and metal sputtering technological method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5169491A (en) * | 1991-07-29 | 1992-12-08 | Micron Technology, Inc. | Method of etching SiO2 dielectric layers using chemical mechanical polishing techniques |
| US5451261A (en) * | 1992-09-11 | 1995-09-19 | Matsushita Electric Industrial Co., Ltd. | Metal film deposition apparatus and metal film deposition method |
| JPH07161600A (en) * | 1993-12-02 | 1995-06-23 | Sony Corp | Position measurement method |
-
1995
- 1995-10-16 FR FR9512312A patent/FR2739975B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| FR2739975A1 (en) | 1997-04-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |